CA2723827A1 - Procede de depot electrochimique d'un metal sur un substrat - Google Patents

Procede de depot electrochimique d'un metal sur un substrat Download PDF

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Publication number
CA2723827A1
CA2723827A1 CA2723827A CA2723827A CA2723827A1 CA 2723827 A1 CA2723827 A1 CA 2723827A1 CA 2723827 A CA2723827 A CA 2723827A CA 2723827 A CA2723827 A CA 2723827A CA 2723827 A1 CA2723827 A1 CA 2723827A1
Authority
CA
Canada
Prior art keywords
nickel
silica particles
nickel layer
metal
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA2723827A
Other languages
English (en)
Inventor
Hermann-Josef Middeke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atotech Deutschland GmbH and Co KG
Original Assignee
Atotech Deutschland GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG
Publication of CA2723827A1 publication Critical patent/CA2723827A1/fr
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C25D15/02—Combined electrolytic and electrophoretic processes with charged materials
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C25D13/02—Electrophoretic coating characterised by the process with inorganic material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Laminated Bodies (AREA)
  • Cell Electrode Carriers And Collectors (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
CA2723827A 2008-07-15 2009-07-10 Procede de depot electrochimique d'un metal sur un substrat Abandoned CA2723827A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08075637.2 2008-07-15
EP08075637A EP2145986B1 (fr) 2008-07-15 2008-07-15 Solution et procédé pour le dépôt électrochimique d'un métal sur un substrat
PCT/EP2009/005192 WO2010006800A1 (fr) 2008-07-15 2009-07-10 Procédé de dépôt électrochimique d'un métal sur un substrat

Publications (1)

Publication Number Publication Date
CA2723827A1 true CA2723827A1 (fr) 2010-01-21

Family

ID=40010705

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2723827A Abandoned CA2723827A1 (fr) 2008-07-15 2009-07-10 Procede de depot electrochimique d'un metal sur un substrat

Country Status (12)

Country Link
US (1) US20110132766A1 (fr)
EP (1) EP2145986B1 (fr)
JP (1) JP5674655B2 (fr)
KR (1) KR20110039438A (fr)
CN (1) CN102066622B (fr)
AT (1) ATE462025T1 (fr)
BR (1) BRPI0915785A2 (fr)
CA (1) CA2723827A1 (fr)
DE (1) DE602008000878D1 (fr)
ES (1) ES2339614T3 (fr)
PL (1) PL2145986T3 (fr)
WO (1) WO2010006800A1 (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
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US20110155582A1 (en) 2009-11-18 2011-06-30 Tremmel Robert A Semi-Bright Nickel Plating Bath and Method of Using Same
EP2551375A1 (fr) * 2011-07-26 2013-01-30 Atotech Deutschland GmbH Composition de bain pour placage autocatalytique de nickel
US8871077B2 (en) * 2011-10-14 2014-10-28 GM Global Technology Operations LLC Corrosion-resistant plating system
JP6024714B2 (ja) * 2013-10-03 2016-11-16 トヨタ自動車株式会社 成膜用ニッケル溶液およびこれを用いた成膜方法
DE102014207778B3 (de) 2014-04-25 2015-05-21 Kiesow Dr. Brinkmann GmbH & Co. KG Verwendung einer Mischung zur Verwendung in einem galvanischen Bad oder eines galvanischen Bades zur Herstellung einer Glanznickelschicht sowie Verfahren zur Herstellung eines Artikels mit einer Glanznickelschicht
US20170096732A1 (en) * 2014-06-23 2017-04-06 Hewlett-Packard Development Company, L.P. Multilayer coatings on substrates
ES2774793T3 (es) * 2014-10-24 2020-07-22 Basf Se Partículas pesticidas orgánicas
CN104790004A (zh) * 2015-03-11 2015-07-22 嘉兴敏惠汽车零部件有限公司 镀镍和\或铬部件及其制造方法
JP6524939B2 (ja) * 2016-02-26 2019-06-05 豊田合成株式会社 ニッケルめっき皮膜及びその製造方法
EP3456870A1 (fr) * 2017-09-13 2019-03-20 ATOTECH Deutschland GmbH Bain et procédé de remplissage d'une tranchée ou d'un accès d'interconnexion verticale d'une pièce à usiner, de nickel ou d'un alliage de nickel
PL238262B1 (pl) * 2017-12-04 2021-08-02 Zakl Wyrobow Galanteryjnych Spolka Z Ograniczona Odpowiedzialnoscia Sposób elektrochemicznego wytwarzania wielowarstwowych powłok metalicznych, zwłaszcza niklowych, o zwiększonej odporności na korozję
CN108914173B (zh) * 2018-07-13 2021-03-23 中国科学院金属研究所 一种含有二氧化硅颗粒的铁镍复合镀层的制备方法
CN109183131B (zh) * 2018-07-16 2020-06-16 东南大学 一种SiO2基复合超疏水金属表面的制备方法
CN112899741B (zh) * 2021-01-21 2022-03-15 长春理工大学 在金属表面加工二氧化硅-镍复合疏水耐腐蚀涂层的方法
CN113436775B (zh) * 2021-06-23 2022-11-08 中国核动力研究设计院 一种无衬底超薄镍-63放射源的制备方法
CN115012008B (zh) * 2022-03-31 2023-09-19 九牧厨卫股份有限公司 一种提高附着力的环保复合涂镀层及其制备方法

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BE1002885A7 (fr) * 1989-03-03 1991-07-16 Centre Rech Metallurgique Produit en acier pourvu d'un revetement composite et procede de depot d'un tel revetement.
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JPH05331693A (ja) * 1992-05-27 1993-12-14 Mitsubishi Heavy Ind Ltd 電気めっき鋼板及びその製造方法
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CN1394988A (zh) * 2002-08-20 2003-02-05 中国科学院电子学研究所 单槽法镀多层镍工艺
CN100513650C (zh) * 2003-11-21 2009-07-15 关西工程有限会社 镀镍金属线材、经拉丝加工的金属线材、电镀装置及方法
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DE102004021092A1 (de) 2004-04-29 2005-11-24 Degussa Ag Verwendung einer kationischen Siliciumdioxid-Dispersion als Textilveredlungsmittel
CL2007000734A1 (es) * 2006-03-22 2008-05-02 Grace W R & Co Revestimiento de oxido inorganico transparente producido al preparar composicion de revestimiento que comprende particulas de oxido inorganico y polimero, aplicar composicion sobre sustrato, formar revestimiento y calentar el revestimiento para elimi
DE102007012578A1 (de) 2006-09-01 2008-03-06 Bühler PARTEC GmbH Kationisch stabilisierte wässrige Silicadispersion, Verfahren zu deren Herstellung und deren Verwendung

Also Published As

Publication number Publication date
ATE462025T1 (de) 2010-04-15
JP2011528063A (ja) 2011-11-10
EP2145986B1 (fr) 2010-03-24
PL2145986T3 (pl) 2010-09-30
WO2010006800A1 (fr) 2010-01-21
CN102066622A (zh) 2011-05-18
US20110132766A1 (en) 2011-06-09
KR20110039438A (ko) 2011-04-18
ES2339614T3 (es) 2010-05-21
JP5674655B2 (ja) 2015-02-25
EP2145986A1 (fr) 2010-01-20
DE602008000878D1 (de) 2010-05-06
CN102066622B (zh) 2013-03-27
BRPI0915785A2 (pt) 2015-11-10

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Legal Events

Date Code Title Description
EEER Examination request

Effective date: 20140703

FZDE Discontinued

Effective date: 20160711