DE602008000878D1 - Lösung und Verfahren zur elektrochemischen Abscheidung eines Metalls auf ein Substrat - Google Patents

Lösung und Verfahren zur elektrochemischen Abscheidung eines Metalls auf ein Substrat

Info

Publication number
DE602008000878D1
DE602008000878D1 DE602008000878T DE602008000878T DE602008000878D1 DE 602008000878 D1 DE602008000878 D1 DE 602008000878D1 DE 602008000878 T DE602008000878 T DE 602008000878T DE 602008000878 T DE602008000878 T DE 602008000878T DE 602008000878 D1 DE602008000878 D1 DE 602008000878D1
Authority
DE
Germany
Prior art keywords
solution
silica particles
substrate
metal
quaternized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602008000878T
Other languages
German (de)
English (en)
Inventor
Hermann-Josef Middeke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atotech Deutschland GmbH and Co KG
Original Assignee
Atotech Deutschland GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG
Publication of DE602008000878D1 publication Critical patent/DE602008000878D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C25D15/02—Combined electrolytic and electrophoretic processes with charged materials
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C25D13/02—Electrophoretic coating characterised by the process with inorganic material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Laminated Bodies (AREA)
  • Cell Electrode Carriers And Collectors (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
DE602008000878T 2008-07-15 2008-07-15 Lösung und Verfahren zur elektrochemischen Abscheidung eines Metalls auf ein Substrat Active DE602008000878D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP08075637A EP2145986B1 (fr) 2008-07-15 2008-07-15 Solution et procédé pour le dépôt électrochimique d'un métal sur un substrat

Publications (1)

Publication Number Publication Date
DE602008000878D1 true DE602008000878D1 (de) 2010-05-06

Family

ID=40010705

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602008000878T Active DE602008000878D1 (de) 2008-07-15 2008-07-15 Lösung und Verfahren zur elektrochemischen Abscheidung eines Metalls auf ein Substrat

Country Status (12)

Country Link
US (1) US20110132766A1 (fr)
EP (1) EP2145986B1 (fr)
JP (1) JP5674655B2 (fr)
KR (1) KR20110039438A (fr)
CN (1) CN102066622B (fr)
AT (1) ATE462025T1 (fr)
BR (1) BRPI0915785A2 (fr)
CA (1) CA2723827A1 (fr)
DE (1) DE602008000878D1 (fr)
ES (1) ES2339614T3 (fr)
PL (1) PL2145986T3 (fr)
WO (1) WO2010006800A1 (fr)

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US20110155582A1 (en) 2009-11-18 2011-06-30 Tremmel Robert A Semi-Bright Nickel Plating Bath and Method of Using Same
EP2551375A1 (fr) * 2011-07-26 2013-01-30 Atotech Deutschland GmbH Composition de bain pour placage autocatalytique de nickel
US8871077B2 (en) * 2011-10-14 2014-10-28 GM Global Technology Operations LLC Corrosion-resistant plating system
JP6024714B2 (ja) * 2013-10-03 2016-11-16 トヨタ自動車株式会社 成膜用ニッケル溶液およびこれを用いた成膜方法
DE102014207778B3 (de) 2014-04-25 2015-05-21 Kiesow Dr. Brinkmann GmbH & Co. KG Verwendung einer Mischung zur Verwendung in einem galvanischen Bad oder eines galvanischen Bades zur Herstellung einer Glanznickelschicht sowie Verfahren zur Herstellung eines Artikels mit einer Glanznickelschicht
US20170096732A1 (en) * 2014-06-23 2017-04-06 Hewlett-Packard Development Company, L.P. Multilayer coatings on substrates
ES2774793T3 (es) * 2014-10-24 2020-07-22 Basf Se Partículas pesticidas orgánicas
CN104790004A (zh) * 2015-03-11 2015-07-22 嘉兴敏惠汽车零部件有限公司 镀镍和\或铬部件及其制造方法
JP6524939B2 (ja) * 2016-02-26 2019-06-05 豊田合成株式会社 ニッケルめっき皮膜及びその製造方法
EP3456870A1 (fr) * 2017-09-13 2019-03-20 ATOTECH Deutschland GmbH Bain et procédé de remplissage d'une tranchée ou d'un accès d'interconnexion verticale d'une pièce à usiner, de nickel ou d'un alliage de nickel
PL238262B1 (pl) * 2017-12-04 2021-08-02 Zakl Wyrobow Galanteryjnych Spolka Z Ograniczona Odpowiedzialnoscia Sposób elektrochemicznego wytwarzania wielowarstwowych powłok metalicznych, zwłaszcza niklowych, o zwiększonej odporności na korozję
CN108914173B (zh) * 2018-07-13 2021-03-23 中国科学院金属研究所 一种含有二氧化硅颗粒的铁镍复合镀层的制备方法
CN109183131B (zh) * 2018-07-16 2020-06-16 东南大学 一种SiO2基复合超疏水金属表面的制备方法
CN112899741B (zh) * 2021-01-21 2022-03-15 长春理工大学 在金属表面加工二氧化硅-镍复合疏水耐腐蚀涂层的方法
CN113436775B (zh) * 2021-06-23 2022-11-08 中国核动力研究设计院 一种无衬底超薄镍-63放射源的制备方法
CN115012008B (zh) * 2022-03-31 2023-09-19 九牧厨卫股份有限公司 一种提高附着力的环保复合涂镀层及其制备方法

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Also Published As

Publication number Publication date
ATE462025T1 (de) 2010-04-15
JP2011528063A (ja) 2011-11-10
EP2145986B1 (fr) 2010-03-24
PL2145986T3 (pl) 2010-09-30
WO2010006800A1 (fr) 2010-01-21
CN102066622A (zh) 2011-05-18
US20110132766A1 (en) 2011-06-09
KR20110039438A (ko) 2011-04-18
ES2339614T3 (es) 2010-05-21
JP5674655B2 (ja) 2015-02-25
CA2723827A1 (fr) 2010-01-21
EP2145986A1 (fr) 2010-01-20
CN102066622B (zh) 2013-03-27
BRPI0915785A2 (pt) 2015-11-10

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