CA2286149A1 - Process for producing metal oxide and organo-metal oxide compositions - Google Patents
Process for producing metal oxide and organo-metal oxide compositions Download PDFInfo
- Publication number
- CA2286149A1 CA2286149A1 CA002286149A CA2286149A CA2286149A1 CA 2286149 A1 CA2286149 A1 CA 2286149A1 CA 002286149 A CA002286149 A CA 002286149A CA 2286149 A CA2286149 A CA 2286149A CA 2286149 A1 CA2286149 A1 CA 2286149A1
- Authority
- CA
- Canada
- Prior art keywords
- metal oxide
- organo
- dried
- drying agent
- equal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 229910044991 metal oxide Inorganic materials 0.000 title claims abstract description 315
- 238000000034 method Methods 0.000 title claims abstract description 186
- 230000008569 process Effects 0.000 title claims abstract description 182
- 150000004706 metal oxides Chemical class 0.000 title claims abstract description 173
- 239000000203 mixture Substances 0.000 title claims abstract description 83
- 239000002274 desiccant Substances 0.000 claims abstract description 101
- 239000012702 metal oxide precursor Substances 0.000 claims abstract description 33
- 229910001507 metal halide Inorganic materials 0.000 claims abstract description 13
- 150000005309 metal halides Chemical class 0.000 claims abstract description 11
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical group CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 claims description 91
- 239000007787 solid Substances 0.000 claims description 81
- 238000001035 drying Methods 0.000 claims description 50
- 239000003795 chemical substances by application Substances 0.000 claims description 39
- 238000006460 hydrolysis reaction Methods 0.000 claims description 33
- 239000002243 precursor Substances 0.000 claims description 32
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 28
- 230000008014 freezing Effects 0.000 claims description 26
- 238000007710 freezing Methods 0.000 claims description 26
- 239000007788 liquid Substances 0.000 claims description 22
- 230000008018 melting Effects 0.000 claims description 19
- 238000002844 melting Methods 0.000 claims description 19
- 230000003301 hydrolyzing effect Effects 0.000 claims description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 13
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims description 12
- 239000000843 powder Substances 0.000 claims description 11
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 239000008187 granular material Substances 0.000 claims description 4
- 239000000835 fiber Substances 0.000 claims description 3
- -1 organometallic halides Chemical class 0.000 abstract description 5
- 229910001868 water Inorganic materials 0.000 description 171
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 138
- 238000006243 chemical reaction Methods 0.000 description 56
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 50
- 239000005055 methyl trichlorosilane Substances 0.000 description 48
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 43
- 229910001510 metal chloride Inorganic materials 0.000 description 42
- 239000003517 fume Substances 0.000 description 36
- 239000000047 product Substances 0.000 description 34
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 32
- 229910000077 silane Inorganic materials 0.000 description 32
- 238000012546 transfer Methods 0.000 description 32
- 239000000499 gel Substances 0.000 description 27
- 239000011521 glass Substances 0.000 description 26
- 229910052751 metal Inorganic materials 0.000 description 19
- 239000002184 metal Substances 0.000 description 18
- 230000007062 hydrolysis Effects 0.000 description 16
- 229910001873 dinitrogen Inorganic materials 0.000 description 15
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 14
- 230000005587 bubbling Effects 0.000 description 14
- 229910052757 nitrogen Inorganic materials 0.000 description 14
- 239000005049 silicon tetrachloride Substances 0.000 description 14
- 238000001291 vacuum drying Methods 0.000 description 14
- 230000008901 benefit Effects 0.000 description 11
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 10
- 230000000704 physical effect Effects 0.000 description 10
- 239000002244 precipitate Substances 0.000 description 10
- 238000009834 vaporization Methods 0.000 description 10
- 230000008016 vaporization Effects 0.000 description 10
- 239000007791 liquid phase Substances 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 239000012374 esterification agent Substances 0.000 description 8
- 229910017974 NH40H Inorganic materials 0.000 description 7
- 239000006227 byproduct Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 238000001556 precipitation Methods 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000013019 agitation Methods 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 150000001298 alcohols Chemical class 0.000 description 5
- 150000004703 alkoxides Chemical class 0.000 description 5
- 150000004820 halides Chemical class 0.000 description 5
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 4
- 239000000908 ammonium hydroxide Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 4
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 4
- 239000011572 manganese Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 125000002524 organometallic group Chemical group 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 230000037361 pathway Effects 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000004964 aerogel Substances 0.000 description 3
- 238000005054 agglomeration Methods 0.000 description 3
- 230000002776 aggregation Effects 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 125000003636 chemical group Chemical group 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 150000002009 diols Chemical class 0.000 description 3
- 238000005243 fluidization Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- 239000010955 niobium Substances 0.000 description 3
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 239000012744 reinforcing agent Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000007790 solid phase Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 238000000194 supercritical-fluid extraction Methods 0.000 description 3
- 239000002562 thickening agent Substances 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N caprylic alcohol Natural products CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000010924 continuous production Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000002808 molecular sieve Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 150000003138 primary alcohols Chemical class 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 238000000518 rheometry Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- 235000019351 sodium silicates Nutrition 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000005051 trimethylchlorosilane Substances 0.000 description 2
- 239000011240 wet gel Substances 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 2
- BHHYHSUAOQUXJK-UHFFFAOYSA-L zinc fluoride Chemical compound F[Zn]F BHHYHSUAOQUXJK-UHFFFAOYSA-L 0.000 description 2
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 description 1
- 229910015844 BCl3 Inorganic materials 0.000 description 1
- 229910021592 Copper(II) chloride Inorganic materials 0.000 description 1
- 229910021594 Copper(II) fluoride Inorganic materials 0.000 description 1
- 229910018069 Cu3N Inorganic materials 0.000 description 1
- 229910021577 Iron(II) chloride Inorganic materials 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 229910021380 Manganese Chloride Inorganic materials 0.000 description 1
- GLFNIEUTAYBVOC-UHFFFAOYSA-L Manganese chloride Chemical compound Cl[Mn]Cl GLFNIEUTAYBVOC-UHFFFAOYSA-L 0.000 description 1
- 229910021570 Manganese(II) fluoride Inorganic materials 0.000 description 1
- 229910003178 Mo2C Inorganic materials 0.000 description 1
- 229910015224 MoCl2 Inorganic materials 0.000 description 1
- 229910019742 NbB2 Inorganic materials 0.000 description 1
- 229910005093 Ni3C Inorganic materials 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 229910021587 Nickel(II) fluoride Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 241000157653 Psora Species 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910020175 SiOH Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910006853 SnOz Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910033181 TiB2 Inorganic materials 0.000 description 1
- 229910003074 TiCl4 Inorganic materials 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- RHQDFWAXVIIEBN-UHFFFAOYSA-N Trifluoroethanol Chemical compound OCC(F)(F)F RHQDFWAXVIIEBN-UHFFFAOYSA-N 0.000 description 1
- 229910021551 Vanadium(III) chloride Inorganic materials 0.000 description 1
- 229910021552 Vanadium(IV) chloride Inorganic materials 0.000 description 1
- 229910009454 Y(OH)3 Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910007379 Zn3N2 Inorganic materials 0.000 description 1
- 229910007932 ZrCl4 Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 229910021502 aluminium hydroxide Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 229910001567 cementite Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- JJLJMEJHUUYSSY-UHFFFAOYSA-L copper(II) hydroxide Inorganic materials [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 1
- GWFAVIIMQDUCRA-UHFFFAOYSA-L copper(ii) fluoride Chemical compound [F-].[F-].[Cu+2] GWFAVIIMQDUCRA-UHFFFAOYSA-L 0.000 description 1
- AEJIMXVJZFYIHN-UHFFFAOYSA-N copper;dihydrate Chemical compound O.O.[Cu] AEJIMXVJZFYIHN-UHFFFAOYSA-N 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- CTNMMTCXUUFYAP-UHFFFAOYSA-L difluoromanganese Chemical compound F[Mn]F CTNMMTCXUUFYAP-UHFFFAOYSA-L 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229910001679 gibbsite Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000000017 hydrogel Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- HWSZZLVAJGOAAY-UHFFFAOYSA-L lead(II) chloride Chemical compound Cl[Pb]Cl HWSZZLVAJGOAAY-UHFFFAOYSA-L 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 235000012254 magnesium hydroxide Nutrition 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000011565 manganese chloride Substances 0.000 description 1
- 235000002867 manganese chloride Nutrition 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- DBJLJFTWODWSOF-UHFFFAOYSA-L nickel(ii) fluoride Chemical compound F[Ni]F DBJLJFTWODWSOF-UHFFFAOYSA-L 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229960004063 propylene glycol Drugs 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 150000003333 secondary alcohols Chemical class 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003509 tertiary alcohols Chemical class 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(II) oxide Inorganic materials [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- JTJFQBNJBPPZRI-UHFFFAOYSA-J vanadium tetrachloride Chemical compound Cl[V](Cl)(Cl)Cl JTJFQBNJBPPZRI-UHFFFAOYSA-J 0.000 description 1
- HQYCOEXWFMFWLR-UHFFFAOYSA-K vanadium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[V+3] HQYCOEXWFMFWLR-UHFFFAOYSA-K 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/16—Preparation of silica xerogels
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/32—Methods for preparing oxides or hydroxides in general by oxidation or hydrolysis of elements or compounds in the liquid or solid state or in non-aqueous solution, e.g. sol-gel process
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/16—Preparation of silica xerogels
- C01B33/163—Preparation of silica xerogels by hydrolysis of organosilicon compounds, e.g. ethyl orthosilicate
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G1/00—Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
- C01G1/02—Oxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/10—Solid density
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/11—Powder tap density
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/20—Powder free flowing behaviour
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/831,564 | 1997-04-09 | ||
| US08/831,564 US6071486A (en) | 1997-04-09 | 1997-04-09 | Process for producing metal oxide and organo-metal oxide compositions |
| PCT/US1998/007109 WO1998045210A1 (en) | 1997-04-09 | 1998-04-09 | Process for producing metal oxide and organo-metal oxide compositions |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2286149A1 true CA2286149A1 (en) | 1998-10-15 |
Family
ID=25259349
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002286149A Abandoned CA2286149A1 (en) | 1997-04-09 | 1998-04-09 | Process for producing metal oxide and organo-metal oxide compositions |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6071486A (enExample) |
| EP (1) | EP0973691B1 (enExample) |
| JP (1) | JP2001518873A (enExample) |
| KR (1) | KR100529979B1 (enExample) |
| CN (1) | CN1204048C (enExample) |
| AU (1) | AU6894898A (enExample) |
| BR (1) | BR9808518A (enExample) |
| CA (1) | CA2286149A1 (enExample) |
| DE (1) | DE69810094T2 (enExample) |
| WO (1) | WO1998045210A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999036480A1 (en) * | 1998-01-15 | 1999-07-22 | Cabot Corporation | Method of preparing treated silica |
| US6159540A (en) * | 1998-01-15 | 2000-12-12 | Cabot Corporation | Polyfunctional organosilane treatment of silica |
| DE69915590T2 (de) * | 1998-01-15 | 2004-08-05 | Cabot Corp., Boston | Verfahren zur herstellung von organisch modifizierter kieselgel |
| US6174926B1 (en) | 1999-01-13 | 2001-01-16 | Cabot Corporation | Method of preparing organically modified silica |
| US6444609B1 (en) * | 2000-08-15 | 2002-09-03 | Aer Energy Resources, Inc. | Manganese-based oxygen reduction catalyst, metal-air electrode including said catalyst and methods for making the same |
| USH2121H1 (en) * | 2000-10-13 | 2005-08-02 | The United States Of America As Represented By The Secretary Of The Navy | High surface area, nanoscale, mesoporous manganese oxides with controlled solid-pore architectures and method for production thereof |
| AU2003233738A1 (en) * | 2002-06-05 | 2003-12-22 | University Technologies International Inc. | Oxygen reduction catalyst |
| US7157073B2 (en) | 2003-05-02 | 2007-01-02 | Reading Alloys, Inc. | Production of high-purity niobium monoxide and capacitor production therefrom |
| JP4773355B2 (ja) | 2003-05-19 | 2011-09-14 | キャボット コーポレイション | ニオブ酸化物及び酸素が低減したニオブ酸化物の製造方法 |
| US7771877B2 (en) | 2003-12-31 | 2010-08-10 | Lg Chem, Ltd. | Electrode active material powder with size dependent composition and method to prepare the same |
| US20060194910A1 (en) * | 2004-05-19 | 2006-08-31 | Nobuo Miyatake | Stabilization of polymers with zinc oxide nanoparticles |
| US7482382B2 (en) * | 2004-05-19 | 2009-01-27 | The Texas A&M University System | Process for preparing nano-sized metal oxide particles |
| US20070004840A1 (en) * | 2004-05-19 | 2007-01-04 | Texas A&M University | Zinc oxide polymer nanocomposites and methods of producing zinc oxide polymer nanocomposites |
| US8344054B2 (en) * | 2007-07-24 | 2013-01-01 | The Texas A & M University System | Polymer nanocomposites including dispersed nanoparticles and inorganic nanoplatelets |
| DE102008046444A1 (de) | 2008-09-09 | 2010-03-11 | Evonik Röhm Gmbh | Fassadenplatte, System und Verfahren zur Energiegewinnung |
| WO2011020671A1 (de) | 2009-08-20 | 2011-02-24 | Evonik Röhm Gmbh | Dämmplatte aus kunststoff, system und verfahren zur wärmedämmung |
| CN101698583B (zh) * | 2009-11-13 | 2012-08-22 | 航天特种材料及工艺技术研究所 | 一种多组元气凝胶复合材料及其制备方法 |
| US10822807B2 (en) | 2019-02-18 | 2020-11-03 | Royal Building Products (Usa) Inc. | Assembly for improved insulation |
| WO2025071811A1 (en) | 2023-09-29 | 2025-04-03 | Dow Global Technologies Llc | Silicone – acrylic binder for thermal insulation coatings to provide resistance to corrosion under insulation |
| WO2025071812A1 (en) | 2023-09-29 | 2025-04-03 | Dow Global Technologies Llc | Silicone - acrylic binder for liquid applied thermal insulation coating compositions to resist corrosion under insulation |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2269059A (en) * | 1938-05-14 | 1942-01-06 | Corning Glass Works | Method of preparing finely comminuted oxides |
| US2765242A (en) * | 1952-02-29 | 1956-10-02 | Du Pont | Process of making reinforced silica gel and esterified silica gel |
| US2739075A (en) * | 1952-03-06 | 1956-03-20 | Du Pont | Product and process |
| US2832794A (en) * | 1952-11-05 | 1958-04-29 | Allied Chem & Dye Corp | Hydrolysis of organosilanes |
| US2901460A (en) * | 1956-02-07 | 1959-08-25 | Gen Electric | Halosilane hydrolysis with tetrahydrofuran and water |
| FR1568817A (enExample) * | 1967-11-30 | 1969-05-30 | ||
| US3652214A (en) * | 1968-08-06 | 1972-03-28 | Nat Petro Chemicals Co Inc | Preparation of silica gels |
| DE2313073C2 (de) * | 1973-03-16 | 1984-11-29 | Istvan Prof. Dr. 6600 Saarbruecken Halasz | Verfahren zur chemischen Modifizierung von Oberflächen anorganischer Festkörper und deren Verwendung |
| DE2414478C3 (de) * | 1974-03-26 | 1978-07-13 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler, 6000 Frankfurt | Aerogelartige strukturierte Kieselsäure und Verfahren zu ihrer Herstellung |
| JPS6144711A (ja) * | 1984-08-03 | 1986-03-04 | Agency Of Ind Science & Technol | 微粒状シリカの製法 |
| DE3429671A1 (de) * | 1984-08-11 | 1986-02-20 | Basf Ag, 6700 Ludwigshafen | Verfahren zur herstellung von aerogelen |
| JPS6168314A (ja) * | 1984-09-07 | 1986-04-08 | Agency Of Ind Science & Technol | 多孔性シリカ、アルミナ、チタニアおよびジルコニアの製造方法 |
| US4561872A (en) * | 1984-10-22 | 1985-12-31 | Corning Glass Works | Method for making glass or ceramic article |
| FR2585973A1 (fr) * | 1985-08-06 | 1987-02-13 | Centre Nat Rech Scient | Gel monolithique et poudre d'oxydes d'elements de transition, procede de fabrication du gel et procede de preparation de couches minces de ces oxydes |
| JPS6252119A (ja) * | 1985-08-29 | 1987-03-06 | Tokuyama Soda Co Ltd | シリカ粒子の製造方法 |
| US4810415A (en) * | 1985-09-24 | 1989-03-07 | Dresser Industries, Inc. | Process for manufacturing ultra pure silica and resulting encapsulated products |
| DE3616133A1 (de) * | 1985-09-25 | 1987-11-19 | Merck Patent Gmbh | Kugelfoermige sio(pfeil abwaerts)2(pfeil abwaerts)-partikel |
| JPS62171914A (ja) * | 1986-01-25 | 1987-07-28 | Agency Of Ind Science & Technol | 微小球シリカの製造方法 |
| JPS6374911A (ja) * | 1986-09-19 | 1988-04-05 | Shin Etsu Chem Co Ltd | 微細球状シリカの製造法 |
| EP0372251B1 (de) * | 1988-11-22 | 1992-03-11 | Degussa Aktiengesellschaft | Verfahren zur Herstellung von Kieselsäuren |
| US5158758A (en) * | 1989-04-24 | 1992-10-27 | International Minerals & Chemical Corp. | Production of silica having high specific surface area |
| US5017540A (en) * | 1989-09-15 | 1991-05-21 | Sandoval Junior E | Silicon hydride surface intermediates for chemical separations apparatus |
| US4983369A (en) * | 1989-11-22 | 1991-01-08 | Allied-Signal Inc. | Process for forming highly uniform silica spheres |
| IT1240673B (it) * | 1990-04-24 | 1993-12-17 | Tenav | Microsfere di aerogels di ossidi inorganici a stretta distribuzione dei diametri dei pori e metodo per la loro preparazione |
| US5409683A (en) * | 1990-08-23 | 1995-04-25 | Regents Of The University Of California | Method for producing metal oxide aerogels |
| EP0497966B1 (en) * | 1990-08-23 | 1997-10-29 | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA as represented by Lawrence Livermore National Laboratory | A METHOD FOR PRODUCING METAL OXIDE AEROGELS HAVING DENSITIES LESS THAN 0.02 g/cm?3 |
| US5106604A (en) * | 1991-03-12 | 1992-04-21 | Pradyot Agaskar | Use of metal salts in the synthesis of oligomeric hydrogensilsesquioxanes via hydrolysis/condensation reactions |
| US5206189A (en) * | 1991-10-25 | 1993-04-27 | Instituto Guido Donegani S.P.A. | Sol-gel method for the preparation of monolithic multicomponent oxide glasses |
| EP0585456B1 (en) * | 1992-02-18 | 1997-05-07 | Matsushita Electric Works Ltd | Process for producing hydrophobic aerogel |
| US5565142A (en) * | 1992-04-01 | 1996-10-15 | Deshpande; Ravindra | Preparation of high porosity xerogels by chemical surface modification. |
| CA2135875A1 (en) * | 1992-05-20 | 1993-11-25 | Kenneth G. Sharp | Process for making inorganic gels |
| US5395805A (en) * | 1993-03-25 | 1995-03-07 | Regents Of The University Of California | Method for making monolithic metal oxide aerogels |
| US5420168A (en) * | 1993-04-01 | 1995-05-30 | The Regents Of The University Of California | Method of low pressure and/or evaporative drying of aerogel |
| US5376449A (en) * | 1993-07-09 | 1994-12-27 | Martin Marietta Energy Systems, Inc. | Silica powders for powder evacuated thermal insulating panel and method |
| WO1995017347A1 (en) * | 1993-12-23 | 1995-06-29 | Ppg Industries, Inc. | Silica aerogel produced under subcritical conditions |
| US5470802A (en) * | 1994-05-20 | 1995-11-28 | Texas Instruments Incorporated | Method of making a semiconductor device using a low dielectric constant material |
| DE4422912A1 (de) * | 1994-06-30 | 1996-01-11 | Hoechst Ag | Xerogele, Verfahren zu ihrer Herstellung, sowie ihre Verwendung |
| US5473826A (en) * | 1994-08-19 | 1995-12-12 | Yazaki Corporation | Process for drying sol-gel derived porous bodies at elevated subcritical temperatures and pressures |
| DE4437424A1 (de) * | 1994-10-20 | 1996-04-25 | Hoechst Ag | Aerogelhaltige Zusammensetzung, Verfahren zu ihrer Herstellung sowie ihre Verwendung |
| US5807494A (en) * | 1994-12-15 | 1998-09-15 | Boes; Ralph Ulrich | Gel compositions comprising silica and functionalized carbon products |
| US5876686A (en) * | 1995-06-28 | 1999-03-02 | E. I. Du Pont De Nemours And Company | Process for making inorganic oxide gels in fluorocarbon solvents |
| WO1997022652A1 (en) * | 1995-12-20 | 1997-06-26 | E.I. Du Pont De Nemours And Company | Rapid process for making silica gel and silicate polymer and low density gels made thereby |
-
1997
- 1997-04-09 US US08/831,564 patent/US6071486A/en not_active Expired - Fee Related
-
1998
- 1998-04-09 AU AU68948/98A patent/AU6894898A/en not_active Abandoned
- 1998-04-09 DE DE69810094T patent/DE69810094T2/de not_active Expired - Lifetime
- 1998-04-09 CA CA002286149A patent/CA2286149A1/en not_active Abandoned
- 1998-04-09 JP JP54312398A patent/JP2001518873A/ja not_active Ceased
- 1998-04-09 WO PCT/US1998/007109 patent/WO1998045210A1/en not_active Ceased
- 1998-04-09 EP EP98914643A patent/EP0973691B1/en not_active Expired - Lifetime
- 1998-04-09 KR KR10-1999-7009294A patent/KR100529979B1/ko not_active Expired - Fee Related
- 1998-04-09 CN CNB988055031A patent/CN1204048C/zh not_active Expired - Fee Related
- 1998-04-09 BR BR9808518-2A patent/BR9808518A/pt active Search and Examination
Also Published As
| Publication number | Publication date |
|---|---|
| WO1998045210A1 (en) | 1998-10-15 |
| CN1258262A (zh) | 2000-06-28 |
| US6071486A (en) | 2000-06-06 |
| AU6894898A (en) | 1998-10-30 |
| CN1204048C (zh) | 2005-06-01 |
| KR20010006214A (ko) | 2001-01-26 |
| DE69810094D1 (de) | 2003-01-23 |
| BR9808518A (pt) | 2000-10-31 |
| JP2001518873A (ja) | 2001-10-16 |
| EP0973691B1 (en) | 2002-12-11 |
| DE69810094T2 (de) | 2003-09-25 |
| KR100529979B1 (ko) | 2005-11-22 |
| EP0973691A1 (en) | 2000-01-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| FZDE | Discontinued |