CA2274478A1 - Composes organometalliques pour des applications de circuits optiques a onde lumineuse - Google Patents
Composes organometalliques pour des applications de circuits optiques a onde lumineuse Download PDFInfo
- Publication number
- CA2274478A1 CA2274478A1 CA002274478A CA2274478A CA2274478A1 CA 2274478 A1 CA2274478 A1 CA 2274478A1 CA 002274478 A CA002274478 A CA 002274478A CA 2274478 A CA2274478 A CA 2274478A CA 2274478 A1 CA2274478 A1 CA 2274478A1
- Authority
- CA
- Canada
- Prior art keywords
- burner
- vapor
- oxide soot
- common
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C30/00—Alloys containing less than 50% by weight of each constituent
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Optical Integrated Circuits (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Compositions (AREA)
Abstract
Une pluralité de composés organométalliques (12-18) sont transformés en vapeurs et mélangés avec des gaz de combustion (32-38) pour former un flux de vapeur qui s'écoule dans un tuyau (40). Ce flux de vapeur brûle dans un brûleur (42) pour former de la suie (50), qui se dépose sur un substrat (60) en rotation et forme ainsi une couche d'oxyde compacte.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US3290496P | 1996-12-16 | 1996-12-16 | |
US60/032,904 | 1996-12-16 | ||
PCT/US1997/020433 WO1998027018A1 (fr) | 1996-12-16 | 1997-11-07 | Composes organometalliques pour des applications de circuits optiques a onde lumineuse |
Publications (1)
Publication Number | Publication Date |
---|---|
CA2274478A1 true CA2274478A1 (fr) | 1998-06-25 |
Family
ID=21867491
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002274478A Abandoned CA2274478A1 (fr) | 1996-12-16 | 1997-11-07 | Composes organometalliques pour des applications de circuits optiques a onde lumineuse |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP0946436A4 (fr) |
JP (1) | JP2001506221A (fr) |
KR (1) | KR20000057597A (fr) |
AU (1) | AU717947B2 (fr) |
CA (1) | CA2274478A1 (fr) |
TW (1) | TW373086B (fr) |
WO (1) | WO1998027018A1 (fr) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001524064A (ja) | 1996-12-16 | 2001-11-27 | コーニング インコーポレイテッド | ゲルマニウム添加シリカ形成供給原料および方法 |
JP2002512169A (ja) * | 1998-04-22 | 2002-04-23 | コーニング・インコーポレーテッド | 超低膨張シリカチタニアガラスの製造方法 |
US6783898B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Projection lithography photomask blanks, preforms and method of making |
US6319634B1 (en) | 1999-03-12 | 2001-11-20 | Corning Incorporated | Projection lithography photomasks and methods of making |
US6242136B1 (en) | 1999-02-12 | 2001-06-05 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
US6782716B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
US6265115B1 (en) | 1999-03-15 | 2001-07-24 | Corning Incorporated | Projection lithography photomask blanks, preforms and methods of making |
US20020005051A1 (en) | 2000-04-28 | 2002-01-17 | Brown John T. | Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same |
EP1335829B1 (fr) * | 2000-10-26 | 2011-10-05 | NeoPhotonics Corporation | Structures optiques multicouche |
US6606883B2 (en) | 2001-04-27 | 2003-08-19 | Corning Incorporated | Method for producing fused silica and doped fused silica glass |
EP1888810A2 (fr) * | 2004-12-10 | 2008-02-20 | Koninklijke Philips Electronics N.V. | Reglage de la temperature du substrat pour le depot chimique en phase vapeur par combustion |
US20110290316A1 (en) * | 2010-05-28 | 2011-12-01 | Daniel Warren Hawtof | Light scattering inorganic substrates by soot deposition |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS578506A (en) * | 1980-06-18 | 1982-01-16 | Nippon Telegr & Teleph Corp <Ntt> | Formation of optical guide |
JPS6090305A (ja) * | 1983-10-24 | 1985-05-21 | Nippon Telegr & Teleph Corp <Ntt> | 光導波路の製造方法 |
JPS60108338A (ja) * | 1983-11-15 | 1985-06-13 | Nippon Telegr & Teleph Corp <Ntt> | 光フアイバ母材の製造方法 |
JPH0474728A (ja) * | 1990-07-12 | 1992-03-10 | Sumitomo Electric Ind Ltd | 石英系光導波路の製造方法および装置 |
US5043002A (en) * | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
US5116400A (en) * | 1990-09-20 | 1992-05-26 | Corning Incorporated | Apparatus for forming a porous glass preform |
US5154744A (en) * | 1991-08-26 | 1992-10-13 | Corning Incorporated | Method of making titania-doped fused silica |
US5231056A (en) * | 1992-01-15 | 1993-07-27 | Micron Technology, Inc. | Tungsten silicide (WSix) deposition process for semiconductor manufacture |
JP3001406B2 (ja) * | 1995-11-09 | 2000-01-24 | 日本電気株式会社 | 光導波路の製造方法 |
JP2001524064A (ja) * | 1996-12-16 | 2001-11-27 | コーニング インコーポレイテッド | ゲルマニウム添加シリカ形成供給原料および方法 |
-
1997
- 1997-11-07 KR KR1019990705377A patent/KR20000057597A/ko not_active Application Discontinuation
- 1997-11-07 EP EP97946917A patent/EP0946436A4/fr not_active Withdrawn
- 1997-11-07 WO PCT/US1997/020433 patent/WO1998027018A1/fr not_active Application Discontinuation
- 1997-11-07 JP JP52769698A patent/JP2001506221A/ja active Pending
- 1997-11-07 CA CA002274478A patent/CA2274478A1/fr not_active Abandoned
- 1997-11-07 AU AU52002/98A patent/AU717947B2/en not_active Ceased
- 1997-12-16 TW TW086119273A patent/TW373086B/zh active
Also Published As
Publication number | Publication date |
---|---|
TW373086B (en) | 1999-11-01 |
AU717947B2 (en) | 2000-04-06 |
WO1998027018A1 (fr) | 1998-06-25 |
JP2001506221A (ja) | 2001-05-15 |
AU5200298A (en) | 1998-07-15 |
EP0946436A1 (fr) | 1999-10-06 |
EP0946436A4 (fr) | 2001-02-07 |
KR20000057597A (ko) | 2000-09-25 |
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Legal Events
Date | Code | Title | Description |
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FZDE | Dead |