TW373086B - Organometallics for lightwave optical circuit applications - Google Patents

Organometallics for lightwave optical circuit applications

Info

Publication number
TW373086B
TW373086B TW086119273A TW86119273A TW373086B TW 373086 B TW373086 B TW 373086B TW 086119273 A TW086119273 A TW 086119273A TW 86119273 A TW86119273 A TW 86119273A TW 373086 B TW373086 B TW 373086B
Authority
TW
Taiwan
Prior art keywords
oxide
organometallics
optical circuit
burner
disclosed
Prior art date
Application number
TW086119273A
Other languages
Chinese (zh)
Inventor
Heather Boek
Elizabeth Ann Boylan
Michael Sean Dobbins
Gray Loren Lewis
Richard Orr Maschmeyer
Anne Tietz Lisa
Maurice Truesdale Garlton
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Application granted granted Critical
Publication of TW373086B publication Critical patent/TW373086B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C30/00—Alloys containing less than 50% by weight of each constituent
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Optical Integrated Circuits (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)

Abstract

A method for forming an oxide soot layer on a planar substrate is disclosed which includes producing a halide free gas stream containing a plurality of organometallic compounds in vapor form which are capable of being converted through flame hydrolysis to their oxide form. The gas stream is mixed with a gaseous fuel mixture to form a common vapor stream which is passed into the flame of a burner to form a mixture of oxide soot particles which are deposited on a planar support positioned in a horizontal plane above the burner. The oxide particles are utilized in the formation of optical circuits. Apparatus for carrying out the process is also disclosed.
TW086119273A 1996-12-16 1997-12-16 Organometallics for lightwave optical circuit applications TW373086B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3290496P 1996-12-16 1996-12-16

Publications (1)

Publication Number Publication Date
TW373086B true TW373086B (en) 1999-11-01

Family

ID=21867491

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086119273A TW373086B (en) 1996-12-16 1997-12-16 Organometallics for lightwave optical circuit applications

Country Status (7)

Country Link
EP (1) EP0946436A4 (en)
JP (1) JP2001506221A (en)
KR (1) KR20000057597A (en)
AU (1) AU717947B2 (en)
CA (1) CA2274478A1 (en)
TW (1) TW373086B (en)
WO (1) WO1998027018A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001524064A (en) 1996-12-16 2001-11-27 コーニング インコーポレイテッド Germanium-doped silica-forming feedstock and method
JP2002512169A (en) * 1998-04-22 2002-04-23 コーニング・インコーポレーテッド Method for producing ultra-low expansion silica titania glass
US6783898B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
US6319634B1 (en) 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6782716B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6265115B1 (en) 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
US20020005051A1 (en) 2000-04-28 2002-01-17 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
EP1335829B1 (en) * 2000-10-26 2011-10-05 NeoPhotonics Corporation Multilayered optical structures
US6606883B2 (en) 2001-04-27 2003-08-19 Corning Incorporated Method for producing fused silica and doped fused silica glass
EP1888810A2 (en) * 2004-12-10 2008-02-20 Koninklijke Philips Electronics N.V. Substrate temperature control for combustion chemical vapor deposition
US20110290316A1 (en) * 2010-05-28 2011-12-01 Daniel Warren Hawtof Light scattering inorganic substrates by soot deposition

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS578506A (en) * 1980-06-18 1982-01-16 Nippon Telegr & Teleph Corp <Ntt> Formation of optical guide
JPS6090305A (en) * 1983-10-24 1985-05-21 Nippon Telegr & Teleph Corp <Ntt> Manufacture of optical waveguide
JPS60108338A (en) * 1983-11-15 1985-06-13 Nippon Telegr & Teleph Corp <Ntt> Manufacture of base material for optical fiber
JPH0474728A (en) * 1990-07-12 1992-03-10 Sumitomo Electric Ind Ltd Production of quartz light-waveguide and apparatus therefor
US5043002A (en) * 1990-08-16 1991-08-27 Corning Incorporated Method of making fused silica by decomposing siloxanes
US5116400A (en) * 1990-09-20 1992-05-26 Corning Incorporated Apparatus for forming a porous glass preform
US5154744A (en) * 1991-08-26 1992-10-13 Corning Incorporated Method of making titania-doped fused silica
US5231056A (en) * 1992-01-15 1993-07-27 Micron Technology, Inc. Tungsten silicide (WSix) deposition process for semiconductor manufacture
JP3001406B2 (en) * 1995-11-09 2000-01-24 日本電気株式会社 Manufacturing method of optical waveguide
JP2001524064A (en) * 1996-12-16 2001-11-27 コーニング インコーポレイテッド Germanium-doped silica-forming feedstock and method

Also Published As

Publication number Publication date
AU717947B2 (en) 2000-04-06
WO1998027018A1 (en) 1998-06-25
JP2001506221A (en) 2001-05-15
AU5200298A (en) 1998-07-15
EP0946436A1 (en) 1999-10-06
EP0946436A4 (en) 2001-02-07
KR20000057597A (en) 2000-09-25
CA2274478A1 (en) 1998-06-25

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