CA1052665A - Fluid agitation cleaning system - Google Patents
Fluid agitation cleaning systemInfo
- Publication number
- CA1052665A CA1052665A CA254,579A CA254579A CA1052665A CA 1052665 A CA1052665 A CA 1052665A CA 254579 A CA254579 A CA 254579A CA 1052665 A CA1052665 A CA 1052665A
- Authority
- CA
- Canada
- Prior art keywords
- fluid
- chamber
- carriers
- agitation
- piston
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000012530 fluid Substances 0.000 title claims abstract description 43
- 238000013019 agitation Methods 0.000 title claims abstract description 40
- 238000004140 cleaning Methods 0.000 title claims abstract description 22
- 230000007246 mechanism Effects 0.000 claims abstract description 44
- 239000004065 semiconductor Substances 0.000 claims description 17
- 239000007921 spray Substances 0.000 claims description 12
- 238000001035 drying Methods 0.000 claims description 7
- 238000005507 spraying Methods 0.000 claims description 2
- 239000000969 carrier Substances 0.000 claims 10
- 206010013786 Dry skin Diseases 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000005530 etching Methods 0.000 abstract description 7
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 4
- 235000012431 wafers Nutrition 0.000 description 21
- 238000000034 method Methods 0.000 description 18
- 239000002904 solvent Substances 0.000 description 17
- 230000008569 process Effects 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 6
- 229920001971 elastomer Polymers 0.000 description 5
- 239000000806 elastomer Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000011282 treatment Methods 0.000 description 5
- 230000004907 flux Effects 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000012670 alkaline solution Substances 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 238000005304 joining Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000010420 art technique Methods 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000009428 plumbing Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C3/00—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material
- B05C3/02—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material
- B05C3/04—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material with special provision for agitating the work or the liquid or other fluent material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G3/00—Apparatus for cleaning or pickling metallic material
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0736—Methods for applying liquids, e.g. spraying
- H05K2203/0746—Local treatment using a fluid jet, e.g. for removing or cleaning material; Providing mechanical pressure using a fluid jet
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/14—Related to the order of processing steps
- H05K2203/1476—Same or similar kind of process performed in phases, e.g. coarse patterning followed by fine patterning
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/15—Position of the PCB during processing
- H05K2203/1509—Horizontally held PCB
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Weting (AREA)
- Drying Of Solid Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/586,769 US4015615A (en) | 1975-06-13 | 1975-06-13 | Fluid application system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1052665A true CA1052665A (en) | 1979-04-17 |
Family
ID=24347045
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA254,579A Expired CA1052665A (en) | 1975-06-13 | 1976-06-10 | Fluid agitation cleaning system |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4015615A (en:Method) |
| JP (1) | JPS51151077A (en:Method) |
| CA (1) | CA1052665A (en:Method) |
| DE (1) | DE2624156C1 (en:Method) |
| FR (1) | FR2324376A1 (en:Method) |
| GB (1) | GB1531937A (en:Method) |
| IT (1) | IT1063279B (en:Method) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2043491B (en) * | 1979-02-09 | 1982-12-22 | Moulton Successors | Plate processing equipment |
| JPS58135644A (ja) * | 1982-01-14 | 1983-08-12 | Seiko Epson Corp | ウエツト処理装置 |
| US4633893A (en) * | 1984-05-21 | 1987-01-06 | Cfm Technologies Limited Partnership | Apparatus for treating semiconductor wafers |
| US4738272A (en) * | 1984-05-21 | 1988-04-19 | Mcconnell Christopher F | Vessel and system for treating wafers with fluids |
| US4577650A (en) * | 1984-05-21 | 1986-03-25 | Mcconnell Christopher F | Vessel and system for treating wafers with fluids |
| US4740249A (en) * | 1984-05-21 | 1988-04-26 | Christopher F. McConnell | Method of treating wafers with fluid |
| US4856544A (en) * | 1984-05-21 | 1989-08-15 | Cfm Technologies, Inc. | Vessel and system for treating wafers with fluids |
| JPS61251135A (ja) * | 1985-04-30 | 1986-11-08 | Toshiba Corp | 自動現像装置 |
| KR890001502B1 (ko) * | 1985-06-24 | 1989-05-06 | 씨.에프.엠 테크늘러지즈 인코포레이티드 | 반도체 웨이퍼 흐름 처리공정 및 그 장치 |
| EP0284698A1 (en) * | 1987-04-01 | 1988-10-05 | Alberto Borondo Serrano | Improvements on setting chambers for concrete parts |
| JPH01129403U (en:Method) * | 1988-02-26 | 1989-09-04 | ||
| US5107880A (en) * | 1990-03-07 | 1992-04-28 | Pathway Systems, Inc. | Disk cleaning apparatus |
| EP0608363A1 (en) | 1991-10-04 | 1994-08-03 | Cfmt, Inc. | Ultracleaning of involuted microparts |
| DE4319046A1 (de) * | 1993-06-08 | 1994-12-15 | Miele & Cie | Traggestell für Leiterplatten |
| US5678115A (en) * | 1996-05-15 | 1997-10-14 | Eastman Kodak Company | Method and apparatus for processing a photosensitive material |
| WO1998035765A1 (en) * | 1997-02-18 | 1998-08-20 | Scp Global Technologies | Multiple stage wet processing chamber |
| US6926017B2 (en) | 1998-01-09 | 2005-08-09 | Entegris, Inc. | Wafer container washing apparatus |
| US7216655B2 (en) * | 1998-01-09 | 2007-05-15 | Entegris, Inc. | Wafer container washing apparatus |
| US6543461B2 (en) * | 1999-02-11 | 2003-04-08 | Nova Measuring Instruments Ltd. | Buffer system for a wafer handling system field of the invention |
| DE10131808A1 (de) * | 2001-06-30 | 2003-06-05 | Patrizius Payarolla | Aufnahmevorrichtung für Profilrahmen |
| US6892740B2 (en) * | 2002-01-22 | 2005-05-17 | Teh Kean Khoon | Method and apparatus for transferring chips |
| US7146991B2 (en) * | 2002-01-23 | 2006-12-12 | Cinetic Automation Corporation | Parts washer system |
| US7338565B2 (en) * | 2003-08-21 | 2008-03-04 | Cinetic Automation Corporation | Housingless washer |
| US7353832B2 (en) * | 2003-08-21 | 2008-04-08 | Cinetic Automation Corporation | Housingless washer |
| US20090229639A1 (en) * | 2008-03-14 | 2009-09-17 | Seagate Technology Llc | Particle Purge System |
| US10490429B2 (en) | 2014-11-26 | 2019-11-26 | Applied Materials, Inc. | Substrate carrier using a proportional thermal fluid delivery system |
| CN104588356B (zh) * | 2014-12-18 | 2017-04-19 | 吉安市优特利科技有限公司 | 一种铝壳锂电池清洗方法 |
| CN114904840B (zh) * | 2022-07-18 | 2022-11-08 | 山东沂光集成电路有限公司 | 集成电路用半导体加工的铝合金零部件清洗处理设备 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1114591A (en) * | 1913-01-31 | 1914-10-20 | Nellie G De Laney | Dish-washing machine. |
| DE1403669A1 (de) * | 1960-06-24 | 1968-10-24 | Siemens Elektrogeraete Gmbh | Einrichtung zur Reinigung von Gegenstaenden |
| DE1403671A1 (de) * | 1960-08-04 | 1968-10-24 | Siemens Elektorgeraete Gmbh | Geschirrspuele |
| DE1503853A1 (de) * | 1965-05-03 | 1969-05-29 | Neff Werke | Geschirrspuelmaschine |
| DE1442600A1 (de) * | 1965-10-15 | 1969-08-28 | Bergwerksverband Gmbh | Anstroemboden fuer Wirbelbetten |
| US3765431A (en) * | 1969-10-16 | 1973-10-16 | Western Electric Co | Apparatus for handling and maintaining the orientation of a matrix of miniature electrical devices |
| US3640792A (en) * | 1970-08-07 | 1972-02-08 | Rca Corp | Apparatus for chemically etching surfaces |
| US3716021A (en) * | 1971-03-10 | 1973-02-13 | Ferro Corp | Applicator mechanism for particulate material |
| JPS5110944B2 (en:Method) * | 1971-08-23 | 1976-04-07 | ||
| US3762426A (en) * | 1972-04-26 | 1973-10-02 | Ibm | Semiconductor chip separation apparatus |
| US3851758A (en) * | 1972-04-26 | 1974-12-03 | Ibm | Semiconductor chip fixture |
| SE375248B (en:Method) * | 1973-08-08 | 1975-04-14 | Uddeholms Ab |
-
1975
- 1975-06-13 US US05/586,769 patent/US4015615A/en not_active Expired - Lifetime
-
1976
- 1976-04-16 FR FR7611973A patent/FR2324376A1/fr active Granted
- 1976-05-05 GB GB18384/76A patent/GB1531937A/en not_active Expired
- 1976-05-13 IT IT23207/76A patent/IT1063279B/it active
- 1976-05-25 JP JP51059725A patent/JPS51151077A/ja active Granted
- 1976-05-29 DE DE2624156A patent/DE2624156C1/de not_active Expired
- 1976-06-10 CA CA254,579A patent/CA1052665A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2324376A1 (fr) | 1977-04-15 |
| JPS5622369B2 (en:Method) | 1981-05-25 |
| DE2624156B2 (de) | 1981-01-29 |
| DE2624156A1 (de) | 1976-12-30 |
| DE2624156C1 (de) | 1981-10-01 |
| IT1063279B (it) | 1985-02-11 |
| GB1531937A (en) | 1978-11-15 |
| FR2324376B1 (en:Method) | 1979-04-20 |
| JPS51151077A (en) | 1976-12-25 |
| US4015615A (en) | 1977-04-05 |
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