BRPI0616819B1 - Método para a produção de uma placa para impressão litográfica - Google Patents
Método para a produção de uma placa para impressão litográfica Download PDFInfo
- Publication number
- BRPI0616819B1 BRPI0616819B1 BRPI0616819-1A BRPI0616819A BRPI0616819B1 BR PI0616819 B1 BRPI0616819 B1 BR PI0616819B1 BR PI0616819 A BRPI0616819 A BR PI0616819A BR PI0616819 B1 BRPI0616819 B1 BR PI0616819B1
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- Prior art keywords
- precursor
- acid
- gum
- unit
- solution
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- 235000019832 sodium triphosphate Nutrition 0.000 description 1
- HFQQZARZPUDIFP-UHFFFAOYSA-M sodium;2-dodecylbenzenesulfonate Chemical compound [Na+].CCCCCCCCCCCCC1=CC=CC=C1S([O-])(=O)=O HFQQZARZPUDIFP-UHFFFAOYSA-M 0.000 description 1
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- SEEPANYCNGTZFQ-UHFFFAOYSA-N sulfadiazine Chemical class C1=CC(N)=CC=C1S(=O)(=O)NC1=NC=CC=N1 SEEPANYCNGTZFQ-UHFFFAOYSA-N 0.000 description 1
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- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical group C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
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- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- 150000003626 triacylglycerols Chemical class 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- 150000003627 tricarboxylic acid derivatives Chemical class 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000004953 trihalomethyl group Chemical group 0.000 description 1
- JLEXUIVKURIPFI-UHFFFAOYSA-N tris phosphate Chemical compound OP(O)(O)=O.OCC(N)(CO)CO JLEXUIVKURIPFI-UHFFFAOYSA-N 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05110918.9 | 2005-11-18 | ||
| EP05110918.9A EP1788443B1 (en) | 2005-11-18 | 2005-11-18 | Method of making a lithographic printing plate |
| US74114005P | 2005-12-01 | 2005-12-01 | |
| US60/741,140 | 2005-12-01 | ||
| PCT/EP2006/068303 WO2007057348A1 (en) | 2005-11-18 | 2006-11-09 | Method of making a lithographic printing plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BRPI0616819A2 BRPI0616819A2 (pt) | 2011-07-05 |
| BRPI0616819B1 true BRPI0616819B1 (pt) | 2018-03-27 |
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| BRPI0616819-1A BRPI0616819B1 (pt) | 2005-11-18 | 2006-11-09 | Método para a produção de uma placa para impressão litográfica |
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| EP (2) | EP1788443B1 (enExample) |
| JP (1) | JP2009516222A (enExample) |
| KR (1) | KR101290271B1 (enExample) |
| CN (1) | CN101331433B (enExample) |
| AU (1) | AU2006314571B2 (enExample) |
| BR (1) | BRPI0616819B1 (enExample) |
| ES (1) | ES2479066T3 (enExample) |
| PL (1) | PL1788443T3 (enExample) |
| WO (1) | WO2007057348A1 (enExample) |
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| JP4288123B2 (ja) * | 2003-09-03 | 2009-07-01 | 富士フイルム株式会社 | 光重合性平版印刷版の製版装置 |
| JP2005084092A (ja) * | 2003-09-04 | 2005-03-31 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JP4644458B2 (ja) | 2003-09-30 | 2011-03-02 | 富士フイルム株式会社 | 平版印刷版原版および平版印刷方法 |
| ATE378174T1 (de) | 2004-01-23 | 2007-11-15 | Fujifilm Corp | Lithographiedruckplattenvorläufer und lithographisches druckverfahren |
| CN100573342C (zh) | 2004-05-19 | 2009-12-23 | 爱克发印艺公司 | 制造光聚合物印版的方法 |
| CN1984778B (zh) | 2004-07-08 | 2010-12-29 | 爱克发印艺公司 | 阴片热敏平版印刷版前体的制备方法 |
| US20080254389A1 (en) * | 2004-10-01 | 2008-10-16 | Agfa Graphics Nv | Method of Making Lithographic Printing Plates |
| JP4792326B2 (ja) * | 2005-07-25 | 2011-10-12 | 富士フイルム株式会社 | 平版印刷版の作製方法および平版印刷版原版 |
-
2005
- 2005-11-18 PL PL05110918T patent/PL1788443T3/pl unknown
- 2005-11-18 ES ES05110918.9T patent/ES2479066T3/es not_active Expired - Lifetime
- 2005-11-18 EP EP05110918.9A patent/EP1788443B1/en not_active Expired - Lifetime
- 2005-11-18 EP EP14163143.2A patent/EP2772805A1/en not_active Withdrawn
-
2006
- 2006-11-09 AU AU2006314571A patent/AU2006314571B2/en not_active Ceased
- 2006-11-09 CN CN2006800422613A patent/CN101331433B/zh not_active Expired - Fee Related
- 2006-11-09 BR BRPI0616819-1A patent/BRPI0616819B1/pt not_active IP Right Cessation
- 2006-11-09 JP JP2008540585A patent/JP2009516222A/ja active Pending
- 2006-11-09 WO PCT/EP2006/068303 patent/WO2007057348A1/en not_active Ceased
- 2006-11-09 US US12/093,376 patent/US8119330B2/en not_active Expired - Fee Related
- 2006-11-09 KR KR1020087011570A patent/KR101290271B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009516222A (ja) | 2009-04-16 |
| WO2007057348A1 (en) | 2007-05-24 |
| CN101331433A (zh) | 2008-12-24 |
| EP2772805A1 (en) | 2014-09-03 |
| PL1788443T3 (pl) | 2014-12-31 |
| BRPI0616819A2 (pt) | 2011-07-05 |
| US20080286695A1 (en) | 2008-11-20 |
| ES2479066T3 (es) | 2014-07-23 |
| EP1788443B1 (en) | 2014-07-02 |
| KR101290271B1 (ko) | 2013-07-29 |
| KR20080068070A (ko) | 2008-07-22 |
| US8119330B2 (en) | 2012-02-21 |
| EP1788443A1 (en) | 2007-05-23 |
| AU2006314571A1 (en) | 2007-05-24 |
| CN101331433B (zh) | 2010-12-01 |
| AU2006314571B2 (en) | 2011-08-25 |
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