KR101290271B1 - 평판 인쇄판의 제판방법 - Google Patents

평판 인쇄판의 제판방법 Download PDF

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Publication number
KR101290271B1
KR101290271B1 KR1020087011570A KR20087011570A KR101290271B1 KR 101290271 B1 KR101290271 B1 KR 101290271B1 KR 1020087011570 A KR1020087011570 A KR 1020087011570A KR 20087011570 A KR20087011570 A KR 20087011570A KR 101290271 B1 KR101290271 B1 KR 101290271B1
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KR
South Korea
Prior art keywords
plate
acid
rubber
coating
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020087011570A
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English (en)
Korean (ko)
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KR20080068070A (ko
Inventor
담 마크 반
Original Assignee
아그파 그래픽스 엔브이
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Application filed by 아그파 그래픽스 엔브이 filed Critical 아그파 그래픽스 엔브이
Publication of KR20080068070A publication Critical patent/KR20080068070A/ko
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Publication of KR101290271B1 publication Critical patent/KR101290271B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
KR1020087011570A 2005-11-18 2006-11-09 평판 인쇄판의 제판방법 Expired - Fee Related KR101290271B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
EP05110918.9 2005-11-18
EP05110918.9A EP1788443B1 (en) 2005-11-18 2005-11-18 Method of making a lithographic printing plate
US74114005P 2005-12-01 2005-12-01
US60/741,140 2005-12-01
PCT/EP2006/068303 WO2007057348A1 (en) 2005-11-18 2006-11-09 Method of making a lithographic printing plate

Publications (2)

Publication Number Publication Date
KR20080068070A KR20080068070A (ko) 2008-07-22
KR101290271B1 true KR101290271B1 (ko) 2013-07-29

Family

ID=36950332

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087011570A Expired - Fee Related KR101290271B1 (ko) 2005-11-18 2006-11-09 평판 인쇄판의 제판방법

Country Status (10)

Country Link
US (1) US8119330B2 (enExample)
EP (2) EP1788443B1 (enExample)
JP (1) JP2009516222A (enExample)
KR (1) KR101290271B1 (enExample)
CN (1) CN101331433B (enExample)
AU (1) AU2006314571B2 (enExample)
BR (1) BRPI0616819B1 (enExample)
ES (1) ES2479066T3 (enExample)
PL (1) PL1788443T3 (enExample)
WO (1) WO2007057348A1 (enExample)

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WO2010006948A1 (en) 2008-07-16 2010-01-21 Agfa Graphics Nv A method and apparatus for preparing lithographic printing plate precursors
EP2186637B1 (en) 2008-10-23 2012-05-02 Agfa Graphics N.V. A lithographic printing plate
US20110177456A1 (en) * 2010-01-21 2011-07-21 Mathias Jarek Method of making lithographic printing plates
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JP5711168B2 (ja) 2012-02-27 2015-04-30 富士フイルム株式会社 平版印刷版原版および平版印刷版の作製方法
JP5715975B2 (ja) 2012-02-29 2015-05-13 富士フイルム株式会社 平版印刷版原版および平版印刷版の製造方法
WO2013182328A1 (en) 2012-06-05 2013-12-12 Agfa Graphics Nv A lithographic printing plate precursor
CN105308504B (zh) 2013-06-14 2019-12-03 爱克发有限公司 平版印刷版前体
EP2883699B1 (en) 2013-12-11 2017-05-03 Agfa Graphics Nv A lithographic printing plate precursor and monomer
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EP3429848B1 (en) 2016-03-16 2021-08-18 Agfa Nv Method for processing a lithographic printing plate
EP3392709A1 (en) 2017-04-21 2018-10-24 Agfa Nv A lithographic printing plate precursor
EP3431290B1 (en) 2017-07-20 2021-09-08 Agfa Nv A lithographic printing plate precursor
EP3441223B1 (en) 2017-08-07 2024-02-21 Eco3 Bv A lithographic printing plate precursor
EP3474073B1 (en) 2017-10-17 2022-12-07 Agfa Offset Bv A method for making a printing plate
ES2881270T3 (es) 2017-12-08 2021-11-29 Agfa Nv Procedimiento de fabricación de una plancha de impresión litográfica
EP3768514A1 (en) 2018-03-22 2021-01-27 Agfa Nv A lithographic printing plate precursor
EP3793829B1 (en) 2018-05-14 2023-07-12 Agfa Offset Bv A lithographic printing plate precursor
EP3587112B1 (en) 2018-06-21 2024-04-03 Eco3 Bv A lithographic printing plate precursor
EP3587113B1 (en) 2018-06-21 2023-01-04 Agfa Offset Bv A lithographic printing plate precursor
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor
EP3650938A1 (en) 2018-11-09 2020-05-13 Agfa Nv A lithographic printing plate precursor
EP3894958A1 (en) 2018-12-10 2021-10-20 Agfa Nv A lithographic printing plate precursor
EP3686011A1 (en) 2019-01-23 2020-07-29 Agfa Nv A lithographic printing plate precursor
EP3815900A1 (en) 2019-10-31 2021-05-05 Agfa Nv A lithographic printing plate precursor and method for making hydrophobic resin particles
EP3875271B1 (en) 2020-03-04 2025-10-15 Eco3 Bv A lithographic printing plate precursor
EP3892469B1 (en) 2020-04-10 2023-11-08 Eco3 Bv Lithographic printing plate precursor
EP3928983B1 (en) 2020-06-24 2023-09-27 Eco3 Bv A lithographic printing plate precursor
CN115666949B (zh) 2020-06-24 2025-07-01 易客发有限公司 平版印版前体、其制备方法以及制备平版印版的方法
CN115697708A (zh) 2020-06-24 2023-02-03 爱克发胶印有限公司 平版印刷版前体
EP3960455B1 (en) 2020-08-31 2025-08-06 Eco3 Bv A lithographic printing plate precursor, a method for making a lithographic printing plate precursor and a method for making a lithographic printing plate
CN116324620B (zh) 2020-10-09 2025-08-08 易客发有限公司 平版印刷版前体
EP4035897A1 (en) 2021-01-28 2022-08-03 Agfa Offset Bv A lithographic printing plate precursor
EP4129682B1 (en) 2021-08-05 2025-10-01 Eco3 Bv A lithographic printing plate precursor
NL2030535B1 (en) * 2022-01-13 2023-07-25 Xsys Prepress N V Method to control the solid content of a development liquid for developing a relief precursor, associated washer apparatus, and associated system
EP4223534A1 (en) 2022-02-07 2023-08-09 Agfa Offset Bv A lithographic printing plate precursor
EP4461539A1 (en) 2023-05-10 2024-11-13 Eco3 Bv A negative-working lithographic printing plate precursor

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EP2772805A1 (en) 2014-09-03
PL1788443T3 (pl) 2014-12-31
BRPI0616819A2 (pt) 2011-07-05
US20080286695A1 (en) 2008-11-20
ES2479066T3 (es) 2014-07-23
EP1788443B1 (en) 2014-07-02
KR20080068070A (ko) 2008-07-22
US8119330B2 (en) 2012-02-21
EP1788443A1 (en) 2007-05-23
AU2006314571A1 (en) 2007-05-24
BRPI0616819B1 (pt) 2018-03-27
CN101331433B (zh) 2010-12-01
AU2006314571B2 (en) 2011-08-25

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