NL2030535B1 - Method to control the solid content of a development liquid for developing a relief precursor, associated washer apparatus, and associated system - Google Patents
Method to control the solid content of a development liquid for developing a relief precursor, associated washer apparatus, and associated system Download PDFInfo
- Publication number
- NL2030535B1 NL2030535B1 NL2030535A NL2030535A NL2030535B1 NL 2030535 B1 NL2030535 B1 NL 2030535B1 NL 2030535 A NL2030535 A NL 2030535A NL 2030535 A NL2030535 A NL 2030535A NL 2030535 B1 NL2030535 B1 NL 2030535B1
- Authority
- NL
- Netherlands
- Prior art keywords
- liquid
- amount
- precursor
- washer
- relief
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3071—Process control means, e.g. for replenishing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
Abstract
A method to control the solid content of a development liquid (L) in a washer configured to develop an exposed relief precursor using the development liquid (L), said method comprising the steps: 5 determining of a value representative for an amount of material to be removed from a relief precursor during development in the washer; and based on the determined value, controlling an amount of fresh development liquid to be added to the development liquid (L) in the washer and/or an amount of used development liquid to be removed from the washer.
Description
Method to control the solid content of a development liquid for developing a relief precursor, associated washer apparatus, and associated system
The field of the invention relates to a method and an apparatus for developing an exposed relief precursor using a development liquid. Particular embodiments relate to a method and an apparatus for treating a relief precursor with a solvent and/or an aqueous solution (including pure or tap water) in order to remove uncured material and generate a relief structure.
Typically. relief precursors are subjected to exposure to electromagnetic radiation (preferably UV light) either through an ablated mask layer or through a mask film and afterwards the soluble or meltable material is removed in a developer, such as a washer apparatus or a thermal development apparatus.
Washer apparatuses for relief precursors, such as printing plate precursors, are known. The washer apparatus uses a development liquid to partially remove material from the precursor and in most cases brushes are used to increase the efficiency. The material to be removed comprises the ingredients of the photopolymer layer (e.g. polymers, monomers, cross-linkers, initiators, additives, dyes, pigments, stabilizers, fillers, emulsifiers, detergents etc.) as well as the ingredients of additional layers like a mask layer (e.g. pigments like carbon black, light absorbers, polymers, monomers, additives, stabilizers, fillers, emulsifiers, detergents etc.) or an intermediate layer (e.g. polymers, monomers, cross-linkers, additives, stabilizers, fillers. emulsifiers, detergents etc.). Typically, the quality of the relief depends on the temperature of the developing liquid and the solid content. When the solid content gets too high, residues of the removed material tend to remain on the relief and on parts of the equipment. Thus, the development liquid gradually loses its effectiveness as more exposed relief precursors are developed.
To address this problem, it is known to monitor the solid content in the development liquid and when it reaches a predetermined value the used development liquid is partially removed and fresh liquid is added to the system. The amount of solvent or aqueous solution to be drained and added may be significant and can also change the temperature of the developing liquid in the washer. There is a need to improve the effectiveness of the development liquid in a more efficient way.
One object of some embodiments of the disclosure is to provide a method which can maintain the effectiveness of the development liquid for developing exposed relief precursors.
According to a first aspect the present disclosure relates to a method to control the solid content of a development liquid in a washer configured to develop an exposed relief precursor using the development liquid, the method comprising the steps: - determining of a value representative for an amount of material to be removed from a relief precursor during development in the washer; and - based on the determined value, controlling an amount of fresh development liquid to be added to the development liquid in the washer and/or an amount of used development liquid to be removed from the washer.
The quality of the relief precursor depends on the solid content in the development liquid. When the solid content in the development liquid is too high, residues of the removed material can remain on the relief precursor and/or the washer. By determining of a value representative for an amount of material to be removed from a relief precursor during development in the washer, a future amount of solid content can be predicted. Thus, such determined value allows to anticipate the impact of a future development on the solid content by controlling an amount of fresh development liquid to be added to the development liquid in the washer and/or an amount of used development liquid to be removed from the washer, based on the determined value. Thanks to this method the effectiveness of the development liquid can be kept at a roughly constant level however numerous the exposed relief precursors to be developed are. In addition, the effectiveness of the development liquid is controlled in a targeted manner by taking the material to be removed into account. As such the effectiveness of the development liquid is adapted according to various different exposed relief precursors to be developed, while keeping the high quality of the relief precursors eventually obtained. The development liquid is not under-effective to prevent an exposed relief precursors from being completely developed. Nor is the development liquid excessively fresh and potent to create unnecessary waste. In this way less development liquid may be needed during the production, making it more ecologically friendly and more sustainable. In addition, the production process of the relief precursors can be streamlined.
The method according to the present disclosure may comprise one or more of the following features, under all technically possible combinations:
- the method further comprises setting a target value for the solid content in the liquid; wherein the controlling comprises determining of an amount of fresh development liquid to be added to the washer to approach the target value for the solid content, based on the determined value.
The target value for the solid content is typically an optimal value for the solid content. By controlling the amount of the fresh development liquid to be added so that the solid content can be as near the optimal value as possible, the removal of the material can be as efficient as possible. - the method further comprises determining a value representative for the solid content of the development liquid in the washer, wherein the controlling comprises determining of an amount of fresh development liquid to be added to the washer to keep the solid content within a predetermined range, based on the determined value and the determined value representative for the solid content.
By determining the solid content in the development liquid as well as the amount of material to be removed, a more precise evaluation of how much fresh development liquid is needed can be made.
Adding the adapted amount of the fresh development liquid accordingly can achieve a good result of material removal while avoiding wasting the fresh development liquid. - the determining of the value representative for the solid content of the development liquid uses a measurement, such as a viscosity measurement for example by a pressure sensor, a density measurement, a transmission measurement, an optical measurement, a spectroscopic measurement, a turbidity measurement, or a combination thereof. - the step of determining the value representative for the solid content and the step of controlling are repeated until the determined solid content is within a predetermined range.
Compared with the single step of determining the solid content then controlling it, their iteration until a target range is reached achieves a guaranteed result of material removal. - the step of determining of a value representative for an amount of material to be removed from an exposed relief precursor is using image related data and/or relief precursor related data and/or processing related data. The image related data is related to an image to be printed with the exposed and developed relief precursor, such as a surface area of a mask through which the relief precursor has been exposed, an amount of mask pixels of the relief precursor, amounts of different tonal values used in the image, or a combination thereof. For example, in a portion of the image a first tonal value may be used, and in another portion a second tonal value may be used. In order to know how much material is removed, the percentage of the surface area of the image where the first tonal value is used and the percentage of the surface area of the image where the second tonal value is used, may be taken into account. Indeed, the relief depth and thus the removed material, may depend on the tonal value. Relief precursor related data may include e.g. a type of plate and/or a density of the material to be removed and/or a thickness of the relief precursor and/or a relief depth and/or a relief shoulder angle. Processing related data may include a dimension and/or shape of printing features of the exposed relief precursor, e.g. a relief depth and/or a relief shoulder angle of printing features of the exposed relief precursor after washing; one or more exposure parameters, such as light intensity and/or exposure time and/or dose and/or number of exposure cycles, etc. It is noted that some parameters, such as the relief depth may be dependent on the type of plate and/or on the processing.
By using image data, the amount of material removed or to be removed can be predicted before the relief precursor enters a washer apparatus for the material removal. Consequently, adding the fresh development liquid and/or removing the used development liquid can be more targeted. In addition, according to the optional embodiment more information on how much material has been removed and/or is to be removed can be calculated more precisely, making adding / removing the development liquid more targeted. - the step of determining of a value representative for an amount of material to be removed from an exposed relief precursor uses an amount of mask pixels of the relief precursor.
Mask pixels of the relief precursor can provide detailed information on how much material has been removed and/or is to be removed. As such adjusting the development liquid, such as adding fresh one or removing used one can be more targeted at various relief precursors. - the step of determining of a value representative for an amount of material to be removed from an exposed relief precursor takes into account the amounts of different tonal values used in an image used to produce the exposed relief precursor.
Different tonal values in the image used to produce the exposed relief precursor can lead to different amounts of material removed / to be removed. By taking the amounts of different tonal values and optionally the typical relief depth in these areas into account, a more precise adjustment of the amount of the development liquid can be achieved. -the step of controlling an amount of fresh development liquid to be added to the development liquid in the washer and/or an amount of used development liquid to be removed from the washer is further based on any one of the following or a combination thereof: a target value or range for the solid content, a measured value of the solid content, a maximum allowed value for the solid content, a volume of the liquid in the washer, a maximum volume of the liquid in the washer, a minimum volume of liquid in the washer. 5 - the step of controlling an amount of fresh development liquid to be added to the development liquid in the washer is based on the multiplication of a non-transparent surface area of a mask through which the relief precursor has been exposed. a relief depth, and a density of the material.
With this multiplication the precise amount of material that has been removed or is to be removed can be calculated. Consequently, the amount of the fresh development liquid can be calculated precisely. - the controlling comprises controlling the amount of fresh liquid to be added based on the determined value and controlling an amount of development liquid to be removed from the washer based on the amount of liquid to be added.
On the effectiveness of the development liquid, the amount of the fresh development liquid to be added may have an impact on the amount of the used development liquid to be removed. Vice versa, the amount of the used development liquid to be removed may have an impact on the amount of the fresh development liquid to be added. By taking one into consideration when adjusting the other, a more accurate control of the solid content in the development liquid can be obtained. - adding the controlled amount of liquid to be added prior to or during or after the developing of the relief precursor in the washer. - the controlled amount of liquid to be added is added in one or more steps.
This changes the power of the development liquid in a more gradual manner rather than suddenly if all the fresh development liquid is added in a lump. - the controlled amount of liquid to be added is added proportionally to the progress of the developing of the relief precursor in the washer.
The adapted addition of the development liquid according to the development of the relief precursor maintains the best effectiveness of the development liquid along the development process.
- the method further comprises removing in steps or continuously the used development liquid before, during or after the adding of fresh liquid. - the method further comprises measuring the temperature of the development liquid in the washer, wherein the controlling is further based on the measured temperature.
Temperature has an impact on the effectiveness of the development liquid, in particular on the speed of the removal. By measuring its temperature and then controlling the adding of the fresh development liquid and/or the removal of the used development liquid, a better control on the effectiveness of the development liquid can be achieved. - the method further comprises controlling the heating of the development liquid, preferably within a pre-determined range of temperature. - the method further comprises controlling the heating of the fresh development liquid before adding it into the development liquid in the washer.
The development liquid already in the washer may have a temperature different from the fresh development liquid to be added into it. Adjusting the temperature of the fresh development liquid before adding it to the washer, in particular by pre-heating the fresh development liquid before adding it to the washer, avoids abrupt changes to the temperature of the development liquid in the washer, thus keeping the developing condition in the washer relatively constant. - the method further comprising controlling the removal of solid parts from the development liquid, wherein the removal of solid parts is based on the determined value representative for the solid content.
The present disclosure also relates to a computer program product comprising instructions which, when the program is executed by a computer, cause the computer to carry out the method as described above.
According to a second aspect the present disclosure relates to a washer apparatus configured to develop a relief precursor. The apparatus comprises a development means and a control unit. The development means is configured to remove an amount of material from the relief precursor using a development liquid. The control unit is configured to determine a value representative for an amount of material to be removed from the relief precursor. The control unit is also configured to control, based on the determined value, an amount of fresh development liquid to be added in the washer apparatys and/or an amount of used development liquid to be removed from the washer apparatus.
The washer apparatus according to the present disclosure may comprise one or more of the following features, under all technically possible combinations: - the development means comprises a tank storing development liquid, one or more brushes, and a liquid circulating means configured to circulate liquid from the tank to the one or more brushes and back to the tank. - the development liquid contains a solid content, the washer apparatus further comprising a measurement device configured to measure a value representative for the solid content of the development liquid, and wherein the control unit is configured to take into account the measured solid content to control the amount of fresh development liquid to be added in the washer apparatus and/or the amount of used development liquid to be removed from the washer apparatus. - the control unit is configured to set a target value for the solid content in the development liquid and to determine an amount of fresh development liquid to be added to the washer apparatus to approach the target value for the solid content, based on the determined value. - the measurement device is configured to determine a value representative for the solid content of the development liquid in the washer, the control unit being configured to determine an amount of fresh development liquid to be added to the washer to keep the solid content within a predetermined range, based on the determined value and the determined value representative for the solid content. - the measurement device comprises a viscosity measurement device, for example by a pressure sensor, a density measurement device, a transmission measurement device, an optical measurement device, a spectroscopic measurement device, a turbidity measurement device, or any combination thereof. - the control unit is configured, for determining a value representative for an amount of material to be removed from an exposed relief precursor, to use image related data and/or relief precursor related data and/or processing related data. For examples of such data reference is made to the examples given above for embodiments of the method.
- the control unit is configured to control the amount of fresh development liquid to be added to the development liquid in the washer and/or the amount of used development liquid to be removed from the washer, based further on any one of the following or a combination thereof: a target value or range for the solid content. a measured value of the solid content, a maximum allowed value for the solid content, a volume of the liquid in the washer, a maximum volume of the liquid in the washer, a minimum volume of liquid in the washer. - the control unit is configured to control the amount of fresh liquid to be added based on the determined value and to control an amount of development liquid to be removed from the washer based on the amount of liquid to be added. - the control unit is configured to add the controlled amount of liquid to be added in one or more steps. - the control unit is so configured that the controlled amount of liquid to be added is added proportionally to the progress of the developing of the relief precursor in the washer. - the washer apparatus further comprises a temperature measurement module configured to measure the temperature of the development liquid in the washer apparatus, the control unit being configured to base the controlling further on the measured temperature. - the washer apparatus further comprises a heater and/or cooler for heating and/or cooling the development liquid, wherein the control unit is configured to control the heater so that the temperature of the development liquid is within a pre-determined range of temperature. - the washer apparatus further comprises a solid part remover, wherein the control unit is configured to control the removal of solid parts from the development liquid by the solid part remover based on the determined value representative for the solid content.
According to a third aspect the present disclosure relates to a system configured to manufacture a relief precursor, comprising an imaging means, an exposure means, and a washer apparatus as described above. The imaging means is configured to image a mask layer of a relief precursor using image information. The exposure means is configured to expose the relief precursor to electromagnetic radiation.
The system according to the present disclosure may comprise one or more of the following features, under all technically possible combinations: - the system comprises further treatment means such as a drying means, a means to expose the relief precursor to electromagnetic radiation, a cutting means, a mounting means, a heating means, a means to apply a liquid, or any combination thereof. - when the control unit is configured, for determining a value representative for an amount of material to be removed from an exposed relief precursor, to use image data such as a surface area of a mask through which the relief precursor has been exposed, and optionally further to use a type of plate and/or a relief depth and/or a relief shoulder angle and/or a density of the material and/or a thickness of the relief precursor, the control unit is also configured receive the image data from the imaging means.
The accompanying drawings are used to illustrate presently preferred non limiting exemplary embodiments of the method, the apparatus, and the system of the present disclosure. The above and other advantages of the features and objects of the invention will become more apparent and the invention will be better understood from the following detailed description when read in conjunction with the accompanying drawings, in which: - Figure 1 is a schematic illustration of the system according to an embodiment; - Figure 2 is a schematic illustration of a washer apparatus according to an embodiment; - Figure 3 shows schematically a further exemplary embodiment of a washer apparatus; - Figure 4 shows an embodiment of the development means; and - Figure 5 shows a perspective view of the development means according to one embodiment of the present disclosure.
Figure 1 illustrates a system 4 configured to manufacture a printing pate or sleeve from a relief precursor. The system 4 comprises an imaging means 6 configured to image a mask layer of a relief precursor using image information, e.g. a laser imaging means. The system 4 comprises an exposure means 8 configured to expose the relief precursor to electromagnetic radiation, The system 4 also comprises at least a washer apparatus 10, and optionally a further treatment means 12. The further treatment means 12 for example comprises a drying means configured to reduce the moisture or liquid content of the relief precursor. The further treatment means 12 for example comprises a means configured to expose the relief precursor to electromagnetic radiation. The further treatment means 12 for example comprises a cutting means configured to cut the relief precursor. The further treatment means 12 for example comprises a mounting means configured to mount the relief precursor onto another structure. The further treatment means 12 for example comprises a heating means configured to increase the temperature of the relief precursor. The further treatment means 12 for example comprises a means configured to apply a liquid on the relief precursor. The further treatment means 12 may comprise any combination of the particular means mentioned above.
Figure 2 shows a washer apparatus 10 configured to develop a relief precursor P. The washer apparatus 10 comprises a development means 2000 configured to remove an amount of material from the relief precursor P using a development liquid L. The washer apparatus 10 comprises a control unit 1000 configured to determine a value representative for an amount of material to be removed from the relief precursor P. The control unit 1000 is also configured to control, based on this determined value, an amount of fresh development liquid L to be added in the washer apparatus 10 and/or an amount of used development liquid L to be removed from the washer apparatus 10.
The control unit 1000 may determine a value representative for an amount of material to be removed from an exposed relief precursor using image data, i.e. data used related to an image that needs to be printed with the printing plate or sleeve resulting from the relief precursor. Image data is typically also used by the imaging means 6 of Figure 1 in order to determine which part of the mask layer needs to be imaged. Image data may include e.g. a surface area of a mask through which the relief precursor has been exposed and/or an amount of mask pixels of the relief precursor and/or amounts of different tonal values used in the image. However, the image data could also be the original image data, e.g. a pdf file or a raster image process file such as a tiff file. The control unit 1000 may further use precursor related data and/or processing related data to determine a value representative for an amount of material to be removed from an exposed relief precursor. Examples of precursor related data are: a type of plate and/or a density of the material and/or a thickness of the relief precursor.
Examples of processing related data are: a dimension and/or shape of printing features of the exposed relief precursor, e.g. a relief depth and/or a relief shoulder angle; exposure parameters, such as light intensity, exposure time, dose, number of exposure cycles, etc.
Optionally, the controlling of an amount of fresh development liquid to be added to the development liquid in the washer and/or an amount of used development liquid to be removed from the washer is farther based on any one of the following or a combination thereof: a target value or range for the solid content, a measured value of the solid content, a maximum allowed value for the solid content,
a volume of the development liquid in the washer, a maximum volume of the development liquid in the washer, a minimum volume of liquid in the washer.
For example. the controlling of an amount of tresh development liquid to be added to the development liquid in the washer is based on the multiplication of a non-transparent surface area of the mask through which the relief precursor has been exposed, an estimated average relief depth, and a density of the material.
Figure 3 illustrates schematically a more detailed embodiment of a washer apparatus 10 configured to develop a relief precursor, comprising a development means 2000 and a control unit 1000. The development means 2000 comprises a tank 900 storing the development liquid. The development means 2000 also comprises at least one brush 450. The development means 2000 also comprises a liquid circulating means 910 configured to circulate a liquid from the tank 900 to the one or more brushes 450 and back to the tank 900. Typically, the liquid circulating means 910 comprises a pump 911. The development means 2000 is configured to remove an amount of material from the relief precursor using the development liquid which is circulated through the washer 10, with the help of the at least one brush 450. The control unit 1000 is configured to determine a value representative for an amount of material to be removed from the relief precursor, and to control, based on the determined value, an amount of fresh development liquid to be added in the washer apparatus 10 and/or an amount of used development liquid to be removed from the washer apparatus 10.
The washer apparatus 10 further comprises a measurement device 800 configured to measure a value representative for a solid content of the development liquid. The control unit 1000 may be configured to take into account the measured solid content to control the amount of fresh development liquid to be added in the washer apparatus 10 and/or the amount of used development liquid to be removed from the washer apparatus 10. For example, the control unit 1000 may be configured to set a target value for the solid content in the development liquid and to determine an amount of fresh development liquid to be added to the washer apparatus 10 e.g. to approach a target value for the solid content or to keep the solid content within a predetermined range, taking into account the determined value which predicts how much the solid content will further increase during the development of a next relief precursor to be developed. The measurement device 800 may comprise a viscosity measurement device able to measure the viscosity of the development liquid L in the washer, for example by a pressure sensor, a density measurement device able to measure the density of the development liquid in the washer, a transmission measurement device able to measure the light transmission through the development, an optical measurement device able to measure an optical property of the development liquid, a spectroscopic measurement device able to measure the properties of light over a specific portion of the electromagnetic spectrum, a turbidity measurement device able to measure the turbidity of the development liquid L, or any combination of the devices mentioned in this paragraph. In a particular example, the measurement device 800 comprises a tube with a certain length and inner diameter, and is further configured to measure the pressure needed to push the development liquid through the tube. In this way a measure representative for the viscosity, and thus for the solid content, is obtained.
The solid content in a liquid is normally expressed in g/m? or g/l or wi%. The measurement device 800 may be suitable for a development liquid L made of solvent, a solvent mixture, an aqueous solution, or essentially of water. The solid content in water does not have to be dissolved, but could remain in water to turn the development liquid L into an emulsion or a suspension. The solid content of such solutions, emulsions or dispersions may be measured according to ISO 1625:1998 procedures. The measurement device 800 can also be suitable for a development liquid L made of liquid other than water, for example essentially made of a solvent. The solid content will at least partially dissolve in the development liquid L, but can also precipitate in the washer, for example on the bottom of the washer or floating in the development liquid L at the surface where it may be removed.
As explained in connection with Figure 1, the control unit 1000 may further use image related data and/or precursor related data and/or processing related data to determine the value representative for an amount of material to be removed from an exposed relief precursor. Indeed, also precursor related data and/or processing related data may have an impact on the amount of material that needs to be removed, and thus on the future solid content. Also, development means related data may be taken into account, e.g. a volume of the liquid in the washer apparatus, a maximum volume of the liquid inthe washer apparatus, a minimum volume of liquid in the washer apparatus.
This image data includes for example a surface area of a mask through which the relief precursor has been exposed. The cured area of the photosensitive layer of the relief precursor will resist the development liquid L, and the uncured area of the photosensitive layer of the relief precursor which will be gradually removed by the development liquid L. The control unit 1000 can calculate the value representative for the amount of material to be removed from the exposed relief precursor based on the uncured area of the photosensitive layer. In such an embodiment, preferably the control unit 1000 is configured to receive the image data from the imaging means 6.
As an alternative or in addition, relief precursor related data and/or processing data may be used, including e.g. a type of the plate and/or a relief depth and/or a relief shoulder angle and/or a density of the material of the photosensitive layer and/or of the mask layer, and/or a thickness of the relief precursor. In this way the control unit 1000 is able to estimate more precisely the amount of material removed or to be removed. Preferably the estimation of the amount of material is a three-dimensional calculation. Through the image data (first two dimensions), the relief depth (the third dimension), as well as the shoulder angle of the plate, the volume of the material removed or to be removed can be obtained. Then by multiplying the volume of the material by the density of the material (for example determined by the type of the plate), the mass of the material removed or to be removed can be accurately calculated.
According to one embodiment the calculation of the amount of the fresh development liquid to be added to the washer is based on the multiplication of the non-transparent mask area (the surface area of the mask through which the relief precursor has been exposed), a relief depth, and a density of the material, divided by the target value for the solid content in the development liquid L.
Further, the control unit 1000 may be configured to control the amount of fresh liquid to be added based on the determined value and to control an amount of development liquid to be removed from the washer based on the amount of development liquid to be added. In other words, the removal of liquid may be made dependent on the amount of fresh liquid that is added, e.g. so that the volume of liquid in the washer apparatus 10 stays below a maximum volume. The control unit 1000 may be configured to add the controlled amount of development liquid to be added in one or more steps. For example, the control unit 1000 may be configured so that the controlled amount of development liquid to be added is added proportionally to the progress of the developing of the relief precursor in the washer.
For the adding of fresh liquid to the tank 900, a first control valve 914 may be provided. The first control valve 914 is controlled by the control unit 1000 in order to control the amount of fresh liquid that is added. For the removing of development liquid from the tank 900, a second control valve 916 may be provided. The second control valve 916 is controlled by the control unit 1000 in order to control the amount of fresh liquid that is to be removed.
The washer apparatus 10 may further comprise a temperature measurement module 810 configured to measure the temperature of the development liquid in the washer apparatus 10. The control unit 1000 may then be configured to base the controlling further on the measured temperature. Optionally, the washer apparatus 10 may comprise a heater and/or cooler (not shown) for heating and/or cooling the development liquid. For example, the control unit 1000 may be configured to control the heater so that the temperature of the development liquid in the tank 900 is within a pre-determined range of temperature. Optionally, the washer apparatus 10 may comprise a solid part remover to remove solid part from the development liquid. The control unit 1000 may then be configured to control the removal of solid parts from the development liquid by the solid part remover based on the determined value representative for the solid content.
Figure 4 illustrates in detail an exemplary embodiment of a development means 2000 for treating a relief precursor P with a liquid L. The apparatus 100 comprises a treatment compartment 400 with a treatment means 450 comprising a plurality of liquid application rollers 450a, 450b, 450c. A transport system similar to the transport system illustrated in the Figure 5 (explained below) may be used to move a transport bar (not shown) with a coupled relief precursor P through the treatment compartment 400 in a transport direction Tf. The treatment means 450 is configured to treat a relief precursor P with a liquid L and to remove pieces from the relief precursor P. The development means 2000 further comprises a liquid collection system 900 configured to receive liquid L and pieces S from the treatment means 450. Only a couple of pieces S are shown in a schematic way but the skilled person understands that many more pieces will be present. The liquid collection system 900 is for example further configured to separate pieces S having dimensions larger than predefined minimum dimensions from the liquid L. This may be achieved by using one or more sieves. The pieces S may comprise e.g. cured and/or non-cured particles, residues, film portions, flocs, gel-like pieces, etc., but may also comprise any other undesirable part such as a screw or a nut or a bristle.
The liquid collection system 900 is further configured to allow at least some of said pieces S to be dissolved at least partially in the liquid L, not only during treatment but also when the liquid L is in a static state after or before a treatment of the relief precursor P with the treatment means 450, i.e. both when the treatment means 450 are operational and non-operational. Screws will not be dissolved, but especially non-cured particles, polymer particles and other pieces removed from the relief precursor may be dissolved. Preferably, as illustrated in Figure 4, the liquid collection system 900 is configured to maintain a majority of the separated pieces S in a submerged state in the liquid
L, both when the treatment means 450 are operational and non-operational.
The treatment means 450 comprises one or more pre-washing members 450a, one or more main washing members 450b downstream of the pre-washing members 450a, and one or more cleaning members 450c, downstream of the main washing members 450b. It is noted that in other embodiments of the invention only pre-washing members 450a and/or main washing members 450b may be provided.
The liquid collection system 900 is further configured for carrying liquid L to an outlet 930 and for recirculating liquid directly to the treatment means 450, see arrow R.
The apparatus further comprises liquid circulation means (not shown), such as a pump or suction means, configured to cause, in operation a flow of liquid of at least 10 litre per minute, preferably at least 30 litre per minute. Such flow speeds from the tank 900 to the treatment means 450 can guarantee a good washing of the precursor P with an efficient removal of unexposed material.
Preferably, the liquid collection system 900 is part of a liquid circulation system configured to circulate the collected liquid back to the treatment means 450. In the example of the Figure 4, the liquid used for the pre-washing and the liquid used for the main washing is sent to a separate device 2100 for being cleaned or otherwise treated, e.g. a distillation apparatus, before being returned to an inlet 940 of the treatment compartment 400, as fresh liquid Ln. The adding of fresh liquid Ln may be control with a control valve as in figure 3. Also the removal of liquid at 930 may be controlled using a control valve as in Figure 3.
This inlet 940 is arranged such that the fresh liquid Ln is used by the one or more cleaning members 450c. As an alternative, the liquid used for the pre-washing is recirculated directly to the treatment means 450 without being cleaned or otherwise treated, whilst the liquid used for the main washing is sent to a separate device 2100 for being cleaned or otherwise treated. e.g. a distillation apparatus, before being returned to an inlet 940 of the treatment compartment 400, as fresh liquid Ln. This inlet 940 is arranged such that the fresh liquid Ln is used by the one or more cleaning members 450c.
In another embodiment, no separate cleaning device 2100 is present, and the liquid removed at 930 is disposed of. Fresh liquid may then be added from a fresh liquid tank.
According to an embodiment the tank 900 for example comprises a floater (not shown in the Figures) able to indicate the volume of liquid in the tank 900.
The development liquid L contains a solid content. Optionally, the development means 2000 further comprises a measurement device (not shown in Figure 4) configured to measure a value representative for the solid content of the development liquid L. As illustrated in the Figure 3, the measurement device may for example placed in the tank 900.
As in the embodiment of Figure 3, a control unit 1000 may be provided to control various components of the development means. For example the control unit may control the amount of fresh development liquid Ln to be added and/or the amount of used development liquid to be removed at 930. Optionally, the control unit may be configured to take into account the measured solid content.
This for instance happens when the solid content in the development liquid L increases as more relief precursors are processed by the development means 2000, such that more fresh development liquid needs to be added to the development means 2000.
According to one embodiment the control unit 1000 is configured to set a target value for the solid content in the development liquid L. The target value for the solid content is for example for solvents and solvent mixtures is comprised between 0.1 to 15 wt%, preferably between 0,1 to 10 wt%, more preferably between 0,1 and 5 wt% and most preferably between 0,1 and 3 wt%. For water and aqueous solutions the solid content is in the range of 0,1 to 20 wt%. preferably between 0.1 to 15 wt%, more preferably between 0,1 and 10 wt% and most preferably between 0,1 and 8 wt%.
Preferably, the control unit 1000 is also configured to determine an amount of fresh development liquid L to be added to the washer apparatus 10 to approach the target value for the solid content, based on the determined value.
The control unit 1000 may be configured to determine a value representative for an amount of material to be removed from the exposed relief precursor, using image related data and/or relief precursor related data and/or processing data, as explained above in connection with Figure 3.
According to one embodiment, the control unit 1000 is configured to control the amount of fresh development liquid to be added to the development liquid L in the washer and/or the amount of used development liquid to be removed from the washer, based on any one of the following or a combination thereof: a target value or range for the solid content, a measured value of the solid content, a maximum allowed value for the solid content, a volume of the liquid in the washer, a maximum volume of the liquid in the washer. a minimum volume of liquid in the washer.
According to one embodiment the control unit 1000 is configured to control the amount of the fresh development liquid to be added to the development means 2000 based on the determined value representative for an amount of material to be removed from the relief precursor and to control the amount of the development liquid L to be removed from the washer based on the amount of the development liquid L to be added.
According to one embodiment the control unit 1000 is configured to calculate the amount of the development liguid L to be added to the washer based on a self-learning algorithm. In this way the fresh development liquid L to be added to the washer can be better predicted based on previous operations.
According to one embodiment the control unit 1000 is contigured to control the amount of the development liquid L to be added, wherein the controlling may comprise adding the amount in one or more steps. For example, the control unit 1000 may be so configured that the amount of the development liquid L to be added is added proportionally to the progress of the developing of the relief precursor in the development means 2000.
According to an embodiment where the development means 2000 comprises a solid content measurement device 800, the development means 2000 may also comprise a solid part remover (not represented on the Figures). In this embodiment the control unit 1000 is configured to control the removal of solid parts from the development liquid L by the solid part remover based on the determined value representative for the solid content. The solid part remover is for example the second sieve means in patent application WO 2021/224342 in the name of the applicant which is included herein by reference. The solid part remover may involve the use of all kinds of filters to remove particles and droplets. For solutions for example membranes which are permeable for the solvents may be employed taking advantage of osmose. The solid part remover is for example arranged in the liquid circulating means such that the solid content of the development liquid L is reduced before the development liquid L is distributed back again to the tank 900. The solid part remover is for example configured to remove at least a part of the solid content floating on top of the development liquid L in the tank 900. The solid part remover is particularly suitable when the development liquid is water. According to one embodiment the control unit 1000 is able to indicate when the solid parts on the solid part remover need to be reduced.
According to one embodiment the development means 2000 comprises a temperature measurement module (not shown in Figure 4 but indicated with reference numeral 810 in Figure 3) contigured to measure the temperature of the development liquid L in the washer apparatus 10. In this embodiment when controlling the amount of the fresh development liquid to be added in the washer apparatus 10 and/or the amount of used development liquid to be removed from the washer apparatus 10, the control unit 1000 is configured to base the controlling further on the measured temperature.
According to an embodiment the washer apparatus 10 comprises a heater and/or a cooler (not represented on the Figures) configured to heat and/or to cool the development liquid L. The control unit 1000 is configured to control the heater and/or the cooler so that the temperature of the development liquid L is within a pre-determined range of temperature. According to an embodiment the heater and/or the cooler is placed in the tank 900. According to an embodiment the heater and/or the cooler is placed upstream of the tank 900 and the development liquid L is heated and/or cooled before flowing into the tank 900. The heater and/or the cooler is particularly advantageous for certain development liquids, for example for certain solvents, which prefer a certain temperature range for optimal performance. According to an embodiment the control unit 1000 is configured to heat/cool the development liquid L so that it is at a temperature below the flash point of the development liquid
L.
Figure 5 illustrates schematically an apparatus for treating a relief precursor, such as a printing plate precursor P. The apparatus is for instance a washing apparatus for washing a relief precursor with a liquid. However, also other treatments are possible such as brushing, rinsing, spraying, drying, irradiating, developing, heating, cooling, removing of material of the relief precursor, treating the relief precursor with gases or liquids, sanding the relief precursor, cutting the relief precursor, treating it with electromagnetic waves, or combinations thereof.
The apparatus comprises a transport system 210, 220, 230 with at least one, preferably at least two, and even more preferably at least three transport bars 100 intended to be coupled to a relief precursor.
For example, four transport bars 100 may be provided to the transport system 210, 220, 230 as illustrated in the Figure 5. The transport bar 100 is coupled to a leading edge 3 of the relief precursor
P and preferably extends over more than the entire length of the leading edge 3, such that end parts of the transport bar 100 can be coupled to a transport mechanism of the transport system 210, 220.
It is noted that it is also possible to couple a plurality of relief precursors to the transport bar 100.
Preferably, the length of the transport bar 100 is between 100 mm and 1000 mm, more preferably between 1900 mm and 4000 mm.
The apparatus comprises a plate coupling station 300 configured for coupling a relief precursor P to a transport bar 100, a treatment compartment 400 configured for treating the relief precursor whilst the transport bar 100 to which the relief precursor P is coupled. is moved through the treatment compartment 400, and a plate decoupling station 500 configured for decoupling the treated relief precursor P from the transport bar 100. Preferably, the transport system 210, 220, 230 is configured to automatically move each transport bar 100, after being coupled to a relief precursor P in the plate coupling station 300, from the plate coupling station 300 through the treatment station 400 to the plate decoupling station 500, and, after being decoupled from a treated relief precursor P, from the plate decoupling station 500 back to the plate coupling station 300, such that the transport bar 100 moves in a closed loop through the development means 2000. In the illustrated example of the Figure 5, four transport bars 100 circulate in the development means 2000. However, the invention also cover embodiments where the transport bars are brought back manually from the plate decoupling station 500 tO the plate coupling station 300.
In a preferred embodiment, each transport bar 100 is provided with a plurality of penetration elements 110 (here in the form of pins or rods), and the plate coupling station 300 is configured to engage the plurality of penetration elements 110 in an area near the leading edge 3 of the relief precursor P. In the Figure 5, the relief precursor P has a leading edge 3, a trailing edge 4, both perpendicular to a forward transport direction Tf of the relief precursor P through the apparatus, and two side edges 1, 2 parallel to the forward transport direction Tf. An area near the leading edge 3 of the relief precursor P is coupled to the plurality of penetration elements 110 of the transport bar 100.
The plurality of penetration elements 110 preferably have sharp tips, and the plate coupling station 300 is preferably configured to cause a penetration of the plurality of penetration elements 110 at least partially into or through an unperforated area near the leading edge 3 of the relief precursor P.
However, it is noted that according to another exemplary embodiment, the apparatus of the Figure 5 may also be used with transport bars 100 which are provided with a plurality of penetration elements 110 which do not have a sharp tip. For example, the area near the leading edge 3 of the relief precursor P may be pre-perforated before bringing the relief precursor P to the plate coupling station 300, such that the plurality of penetration elements 110 can be arranged through pre-perforated holes in the area near the leading edge 3.
The treatment compartment 400 has an inlet side 410 and an outlet side 420. A transport bar 100 with a coupled relief precursor P is moved through the treatment compartment 400 from the inlet side 410 to the outlet side 420, wherein the transport bar 100 moves in the forward transport direction
Tf. Between the outlet side 420 of the treatment compartment 400 and the plate decoupling station 500, there is provided a plate discharge zone 600. A relief precursor P is pulled by the transport system fully out of the treatment compartment 400 in the plate discharge zone 600 before being decoupled from the transport bar 100 in the decoupling station 500. In that way, when the relief precursor P is decoupled from the transport bar 100, the relief precursor P can be discharged in the plate discharge zone 600. At the bottom of the plate discharge zone 600 there may be provided a removal means configured to remove a treated relief precursor P after being decoupled from the transport bar 100 in the plate decoupling station 500. In the illustrated embodiment, the removal means 700 is a trolley configured for receiving the treated relief precursor P in the plate discharge zone 600, and for being moved out of the plate discharge zone 600, such that it can be easily transported away of the plate discharge zone. For example, if the development means 2000 is a washer, an operator may transport the washed relief precursor P to a dryer in order to dry the washed relief precursor. In other non-illustrated embodiments, the removal means 700 may be a carrier, a robot, a moving belt, at least one rotating drum, etc. Also such devices can be configured to move a treated relief precursor P out of the plate discharge zone 600 after being decoupled in the plate decoupling station 500.
In the embodiment of the Figure 5, the transport system comprises a forward transport mechanism which comprises first transport mechanism 210 on one side of the development means 2000, and a second transport mechanism 220 on the other side of the development means 2000. The transport mechanism 210, 220 is configured to transport the transport bar 100 with a coupled relief precursor
P at least from the inlet side 410 to the outlet side 420 of the treatment compartment 400, and optionally from the outlet side 420 to the plate decoupling station 500, in the forward transport direction Tf. To that end, a first outer end 101 of the transport bar 100 is coupled with the first forward transport mechanism 210, and a second outer end 102 of the transport bar 100 is coupled with the second forward transport mechanism 220. The transport system 210 may comprise a bar coupling means 215 configured to couple the transport bar 100, and more in particular the first outer end 101 and the second outer end 102 of the transport bar to the first and second forward transport mechanism 210, 220. k is understood that the second outer end 102 and the second transport mechanism 220 may be embodied in a similar manner. The bar coupling means 215 may be configured e.g. for pushing or moving the transport bar 100 in the direction of the first and second forward transport mechanism, in order to cause a coupling of the outer ends 101 and 102 of the transport bar 100 to the forward transport mechanism 210, 220. In the embodiment of the Figure 5, the treatment compartment 400 has a first and second opposite lateral side 430, 440 extending in the forward transport direction Tf, and the first and second forward transport mechanism 210, 220 extend atthe first and second opposite lateral side 430, 440 of the treatment compartment 400, respectively.
The transport system further comprises a backward transport mechanism 230 configured to transport the transport bar 100 from the plate decoupling station 500 back to the plate coupling station 300. In the illustrated embodiment of the Figure 5, the backward transport mechanism 230 is located at an upper side of the development means 2000. However, in other embodiments, the backward transport mechanism 230 could be arranged in a lower portion of the development means 2000, below the forward transport mechanism 210, 220. A backward transport mechanism 230 may comprise any one of the following: one or more belts, one or more chains, one or more lead screws, a linear motor, or combinations thereof. In the Figure 5, the backward transport mechanism 230 is arranged centrally above the treatment compartment 400. However, the backward transport mechanism 230 could also be realized with a first and second backward transport mechanism located at opposite lateral sides of the treatment compartment 400 above or below the first and second forward transport mechanism 210, 220. Alternatively, the backward transport mechanism may be located at a lateral side of the treatment compartment, and optionally the transport bar may be rotated and transported backward in a vertical position. However. in order to reduce the footprint of the apparatus the backward transport mechanism is preferably located above or below the first and second forward transport mechanism
210, 220. As illustrated in the Figure 5, the backward transport mechanism 230 is located partly above the treatment compartment 400, and the transport system further comprises an upward transport mechanism 250 configured to move a decoupled transport bar 100 in the plate decoupling station 500 upward towards the backward transport mechanism 230. For example, the upward wansport mechanism 250 may move the transport bar 100 in an upward direction Tu, typically a vertical direction, towards the backward transport mechanism 230 which moves the transport bar 100 in a backward transport direction Tb opposite to the forward transport direction Tt, back to the plate coupling station 300. The upward transport mechanism 250 may comprise any one or more of the following: magnetic means, electromagnetic means, clamping means, vacuum means, linear motors, chains, belts, lead screws, piston or combinations thereof. In other embodiments where the backward transport mechanism 230 is located below the forward transport mechanism, there may be provided a downward transport mechanism. The downward transport mechanism may comprise any one or more of the following: magnetic means, electromagnetic means, clamping means, vacuum means, linear motors, chains, belts, lead screws, piston or combinations thereof, or occur simply by gravity.
In the embodiment of the Figure 5, the treatment compartment 400 of the Figure 4 may be implemented. The plurality of liquid application rollers 450a, 450b, 450c may be arranged with their axis parallel to the transport bar 100. The first and second transport mechanisms 210, 220 extend perpendicular on the axis A of the liquid application rollers 450a, 450b, 450c, at a first and second side of the liquid application rollers, respectively.
The apparatus of Figure 5 further comprises a control unit 1000 which may be implemented as described above in connection with Figures 2-4. Further the control unit 1000 may be configured to control the forward. backward and upward transport mechanisms 210, 220, 230, 250.
A relief precursor generally comprises a support layer made of a first material and an additional layer made of a second material which is different from said first material. The support layer may be a flexible metal, a natural or artificial polymer, paper or combinations thereof. Preferably the support layer is a flexible metal or polymer film or sheet. In case of a flexible metal, the support layer could comprise a thin film, a sieve like structure, a mesh like structure, a woven or non-woven structure or a combination thereof. Steel, copper, nickel or aluminium sheets are preferred and may be about 50 to 1000 pm thick. In case of a polymer film, the film is dimensionally stable but bendable and may be made for example from polyalkylenes, polyesters, polyethylene terephthalate, polybutylene terephthalate, polyamides und polycarbonates, polymers reinforced with woven, nonwoven or layered fibres (e.g. glass fibres, Carbon fibres, polymer fibres) or combinations thereof. Preferably polyethylene and polyester foils are used and their thickness may be in the range of about 100 to 300 um, preferably in the range of 100 to 200 um.
A relief precursor may carry at least one additional layer. For example, the additional layer may be any one of the following: a direct engravable layer (e.g. by laser), a solvent or water developable layer, a thermally developable layer, a photosensitive layer, a combination of a photosensitive layer and a mask layer. Optionally there may be provided one or more further additional layers on top of additional layer. Such one or more further additional layers may comprise a cover layer at the top of all other layers which is removed before the imageable layer is imaged. The one or more additional layers may comprise a relief layer, and an anti-halation layer between the support layer and the relief layer or at a side of the support layer which is opposite of the relief layer. The one or more additional layers may comprise a relief layer, an imageable layer, and one or more barrier layers between the relief layer and the imageable layer which prevent diffusion of oxygen. Between the different layers described above one or more adhesion layers may be located which ensure proper adhesion of the different layers.
In a preferred embodiment the relief precursor comprises a support layer made of a polyester of polymer material. and an additional layer made of a directly engravable material such as a resin material. The optional layer may then be a laser ablative layer. In an exemplary embodiment the relief precursor may contain at least a dimensionally stable support layer, a relief layer and an imageable mask layer. Optionally, further layers may be present. There may be a cover layer at the top of all other layers which is removed before the imageable mask layer is imaged. There may be an anti-halation layer between the support layer and the relief layer or it may be located at the side of the support layer which is opposite of the relief layer. There may be one or more barrier layers between the relief layer and the imageable mask layer which prevent diffusion of oxygen. Between the different layers described above one or more adhesion layers may be located which ensure proper adhesion of the different layers. One or more layers may be removable by treatment with a development liquid. The development liquids used may be the same or different for different layers.
Preferably the development liquids used are different.
In a preferred embodiment the relief precursor comprises a photosensitive layer and a mask layer.
The mask layer may be ablated or changed in transparency during the treatment and forms a mask with transparent and non-transparent areas. Preferably the mask layer and/or the barrier layer are removed in the pre-washing section of the apparatus because they may comprise material which could cause problems in further process steps or during use of the final relief. Underneath of transparent areas of the mask the photosensitive layer undergoes a change in solubility and/or fluidity upon irradiation. The change is used to generate the relief by removing parts of the photosensitive layer in one or more subsequent steps. The change in solubility and/or fluidity may be achieved by photo-induced polymerization and/or crosslinking, rendering the irradiated areas less soluble. In other cases the electromagnetic radiation may cause breaking of bonds or cleavage of protective groups rendering the irradiated areas more soluble. Preferably a process using photo-induced crosslinking and/or polymerization is used.
Development liquids which may be used in embodiments of the present disclosure include amongst others: water, aqueous solutions, solvents, and combinations thereof. The nature of the development liguid used is guided by the nature of the precursor employed. H the layer to be removed is soluble, emulsifiable or dispersible in water or aqueous solutions, water or aqueous solutions might be used.
If the layer is soluble, emulsifiable or dispersible in organic solvents or mixtures, organic solvents or mixtures may be used. In the case of organically developable precursors different organic solvents or their mixtures may be used.
The development liquids may be water or aqueous solutions which may contain other ingredients e.g. salts, acids, bases, emulsifiers, dispersion aids, viscosity regulators, surfactants, or combinations thereof. Salts, acids and bases may be used to control the pH of the development liquid. Emulsifiers and dispersion aids may be used to enhance the capacity of material uptake of the development liquids and stabilise such emulsions and dispersions. The aqueous solutions may comprise organic solvents, e.g. alcohols, esters, ethers, hydrocarbons, or combinations thereof.
The development liquids may be organic solvents or mixtures thereof. For example, use may be made of developers comprising naphthenic or aromatic petroleum fractions in a mixture with alcohols, such as benzyl alcohol, cyclohexanol, or aliphatic alcohols having 5 to 10 carbon atoms, for example, and also, optionally, further components, such as, for example, alicyclic hydrocarbons, terpenoid hydrocarbons, substituted benzenes such as diisopropylbenzene, esters having 5 to 12 carbon atoms, or glycol ethers or water. Suitable washing agents are disclosed in EP-A 332 070 or
EP-A 433 374, for example. In addition the solvents and solvent mixtures may comprise other ingredients e.g. salts, acids, bases, emulsifiers, dispersion aids, viscosity regulators, antistatics, water, surfactants, or combinations thereof. Preferably development liquids with organic solvents should have a high flash point, preferably above 60°C. For reasons of safety and to reduce the cost and complexity of the apparatus involved, the temperature when using organic solvents ought to be 5°C to 15°C beneath the flash point of the washing agent mixture used.
When controlling the solid content of a development liquid in a washer, as the first step the control unit 1000 determines a value representative for an amount of material to be removed from a relief precursor during the development in the washer. As the second step the control unit 1000 controls, based on the determined value, an amount of the fresh development liquid to be added to the development liquid L in the washer and/or an amount of the used development liquid to be removed from the washer.
Whilst the principles of the invention have been set out above in connection with specific embodiments, it is to be understood that this description 1s merely made by way of example and not as a limitation of the scope of protection which is determined by the appended claims.
Claims (38)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2030535A NL2030535B1 (en) | 2022-01-13 | 2022-01-13 | Method to control the solid content of a development liquid for developing a relief precursor, associated washer apparatus, and associated system |
| PCT/EP2023/050741 WO2023135255A1 (en) | 2022-01-13 | 2023-01-13 | Method to control the solid content of a development liquid for developing a relief precursor, associated washer apparatus, and associated system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2030535A NL2030535B1 (en) | 2022-01-13 | 2022-01-13 | Method to control the solid content of a development liquid for developing a relief precursor, associated washer apparatus, and associated system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2030535B1 true NL2030535B1 (en) | 2023-07-25 |
Family
ID=81851377
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2030535A NL2030535B1 (en) | 2022-01-13 | 2022-01-13 | Method to control the solid content of a development liquid for developing a relief precursor, associated washer apparatus, and associated system |
Country Status (2)
| Country | Link |
|---|---|
| NL (1) | NL2030535B1 (en) |
| WO (1) | WO2023135255A1 (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0332070A2 (en) | 1988-03-10 | 1989-09-13 | BASF Aktiengesellschaft | Process for the development of imagewise exposed flexoprinting plates |
| EP0433374A1 (en) | 1988-08-23 | 1991-06-26 | Du Pont | Process for the production of flexographic printing reliefs. |
| EP1091253A2 (en) * | 1999-09-28 | 2001-04-11 | Fuji Photo Film Co., Ltd. | Plate making process for planographic plate, automatic developing apparatus and recording medium |
| EP1788443A1 (en) * | 2005-11-18 | 2007-05-23 | Agfa Graphics N.V. | Method of making a lithographic printing plate |
| EP3495890A1 (en) * | 2017-12-08 | 2019-06-12 | Flint Group Germany GmbH | Apparatus and method for developing printing precursors |
| WO2021224342A1 (en) | 2020-05-06 | 2021-11-11 | Xeikon Prepress N.V. | Apparatus and method for treating a relief precursor with reduced cleaning |
-
2022
- 2022-01-13 NL NL2030535A patent/NL2030535B1/en active
-
2023
- 2023-01-13 WO PCT/EP2023/050741 patent/WO2023135255A1/en unknown
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0332070A2 (en) | 1988-03-10 | 1989-09-13 | BASF Aktiengesellschaft | Process for the development of imagewise exposed flexoprinting plates |
| EP0433374A1 (en) | 1988-08-23 | 1991-06-26 | Du Pont | Process for the production of flexographic printing reliefs. |
| EP1091253A2 (en) * | 1999-09-28 | 2001-04-11 | Fuji Photo Film Co., Ltd. | Plate making process for planographic plate, automatic developing apparatus and recording medium |
| EP1788443A1 (en) * | 2005-11-18 | 2007-05-23 | Agfa Graphics N.V. | Method of making a lithographic printing plate |
| EP3495890A1 (en) * | 2017-12-08 | 2019-06-12 | Flint Group Germany GmbH | Apparatus and method for developing printing precursors |
| WO2021224342A1 (en) | 2020-05-06 | 2021-11-11 | Xeikon Prepress N.V. | Apparatus and method for treating a relief precursor with reduced cleaning |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2023135255A1 (en) | 2023-07-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101176292B1 (en) | Resist liquid supply apparatus, resist liquid supply method, and computer-readable storage medium | |
| JP2007515307A (en) | Apparatus and method for processing imaging materials | |
| NL2030535B1 (en) | Method to control the solid content of a development liquid for developing a relief precursor, associated washer apparatus, and associated system | |
| CN111433681B (en) | Apparatus and method for developing printing precursor | |
| NL2025512B1 (en) | Apparatus and method for treating a relief precursor with reduced cleaning | |
| US20230145873A1 (en) | Apparatus and method for treating a relief plate precursor with improved liquid evacuation | |
| CN115885220A (en) | Apparatus and method for exposing a relief precursor | |
| JP2021113881A (en) | Development device and development method | |
| US20220161548A1 (en) | Apparatus and method for treating a relief printing plate precursor with liquid | |
| WO2022173054A1 (en) | Separation and recovery device, separation and recovery method, development system, and developer recycling method | |
| JP4584130B2 (en) | Post-exposure method and apparatus for improving printing durability of planographic printing plates | |
| NL2028815B1 (en) | Apparatus and method for treating a relief precursor with liquid | |
| JP4295649B2 (en) | Photosensitive material processing apparatus and method | |
| JP2007155790A (en) | Exposure apparatus and exposure tool for planographic printing plate | |
| JP4500625B2 (en) | Planographic printing plate processing method and processing apparatus | |
| WO2023165919A1 (en) | Method and apparatus for processing a lithographic printing plate precursor | |
| JP3442585B2 (en) | Processing solution tank for photosensitive material processing equipment | |
| JPH05249696A (en) | Production of plate for waterless planographic printing plate and plate making device | |
| JPH08117735A (en) | Apparatus for treating waste liquid produced from treatment of photosensitive lithographic printing plate | |
| KR20090113719A (en) | Apparatus for immersion lithography and the method for removing defect source using the same | |
| JP2010139867A (en) | Automatic developing apparatus | |
| JPH0973175A (en) | Developing device for photosensitive planographic printing plate | |
| JPH1062942A (en) | Photosensitive material processing device | |
| JPH04344658A (en) | Electrophotographic engraving device | |
| JP2007232942A (en) | Developing method and apparatus for planographic printing plate |