BR9611969A - Processo e aparelho para formação de sílica fundida por combustão de reagentes líquidos - Google Patents
Processo e aparelho para formação de sílica fundida por combustão de reagentes líquidosInfo
- Publication number
- BR9611969A BR9611969A BR9611969A BR9611969A BR9611969A BR 9611969 A BR9611969 A BR 9611969A BR 9611969 A BR9611969 A BR 9611969A BR 9611969 A BR9611969 A BR 9611969A BR 9611969 A BR9611969 A BR 9611969A
- Authority
- BR
- Brazil
- Prior art keywords
- fused silica
- soot
- liquid
- flame
- silicon
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/28—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with integral means for shielding the discharged liquid or other fluent material, e.g. to limit area of spray; with integral means for catching drips or collecting surplus liquid or other fluent material
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C03B19/1423—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
- C03B37/0142—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00157—Controlling the temperature by means of a burner
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00159—Controlling the temperature controlling multiple zones along the direction of flow, e.g. pre-heating and after-cooling
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/04—Multi-nested ports
- C03B2207/06—Concentric circular ports
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/04—Multi-nested ports
- C03B2207/14—Tapered or flared nozzles or ports angled to central burner axis
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/34—Liquid, e.g. mist or aerosol
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/42—Assembly details; Material or dimensions of burner; Manifolds or supports
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Silicon Compounds (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US888995P | 1995-12-19 | 1995-12-19 | |
PCT/US1996/020756 WO1997022553A1 (en) | 1995-12-19 | 1996-12-12 | Method and apparatus for forming fused silica by combustion of liquid reactants |
Publications (1)
Publication Number | Publication Date |
---|---|
BR9611969A true BR9611969A (pt) | 1999-02-17 |
Family
ID=21734283
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR9611969A BR9611969A (pt) | 1995-12-19 | 1996-12-12 | Processo e aparelho para formação de sílica fundida por combustão de reagentes líquidos |
Country Status (13)
Country | Link |
---|---|
US (1) | US6565823B1 (pt) |
EP (1) | EP0868401B1 (pt) |
JP (1) | JP4089922B2 (pt) |
KR (1) | KR100473827B1 (pt) |
CN (1) | CN1128111C (pt) |
AT (1) | ATE272573T1 (pt) |
AU (1) | AU718737B2 (pt) |
BR (1) | BR9611969A (pt) |
CA (1) | CA2233021A1 (pt) |
DE (1) | DE69633066D1 (pt) |
TW (1) | TW343959B (pt) |
UA (1) | UA46068C2 (pt) |
WO (1) | WO1997022553A1 (pt) |
Families Citing this family (36)
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---|---|---|---|---|
US6312656B1 (en) | 1995-12-19 | 2001-11-06 | Corning Incorporated | Method for forming silica by combustion of liquid reactants using oxygen |
WO1998015499A1 (en) * | 1996-10-08 | 1998-04-16 | Corning Incorporated | Method of inhibiting gelling of siloxane feedstocks and a gel inhibited feedstock |
CA2288769A1 (en) * | 1997-07-08 | 1999-01-21 | Corning Incorporated | Germanium chloride and siloxane feedstock for forming silica glass and method |
US5979185A (en) * | 1997-07-16 | 1999-11-09 | Corning Incorporated | Method and apparatus for forming silica by combustion of liquid reactants using a heater |
CA2295684A1 (en) * | 1997-07-21 | 1999-01-28 | Corning Incorporated | Methods and apparatus for producing low flow rates of feedstock vapors |
JP4038866B2 (ja) * | 1998-03-11 | 2008-01-30 | 株式会社ニコン | 合成石英ガラス製造方法 |
JPH11116247A (ja) * | 1997-10-09 | 1999-04-27 | Nikon Corp | 合成石英ガラス製造方法 |
US6094940A (en) | 1997-10-09 | 2000-08-01 | Nikon Corporation | Manufacturing method of synthetic silica glass |
WO1999032410A1 (en) * | 1997-12-19 | 1999-07-01 | Corning Incorporated | Burner and method for producing metal oxide soot |
EP0978487A3 (en) | 1998-08-07 | 2001-02-21 | Corning Incorporated | Sealed, nozzle-mix burners for silica deposition |
ZA994173B (en) * | 1998-08-07 | 2000-03-06 | Corning Inc | System and method for plug free delivery of liquid reactants through a burner assembly to form soot for the manufacture of glass. |
US6260385B1 (en) * | 1998-08-07 | 2001-07-17 | Corning Incorporated | Method and burner for forming silica-containing soot |
US6705127B1 (en) | 1998-10-30 | 2004-03-16 | Corning Incorporated | Methods of manufacturing soot for optical fiber preforms and preforms made by the methods |
KR20010089372A (ko) * | 1998-10-30 | 2001-10-06 | 알프레드 엘. 미첼슨 | 광섬유 예형용 수트의 제조방법 및 상기 방법으로 제조된예형 |
US6736633B1 (en) | 1998-12-17 | 2004-05-18 | Corning Incorporated | Burner manifold apparatus for use in a chemical vapor deposition process |
US6336347B1 (en) | 1998-12-28 | 2002-01-08 | Pirelli Cavi E Sistemi S.P.A. | Process for producing silica by decomposition of an organosilane |
GB2346683A (en) * | 1999-02-05 | 2000-08-16 | Univ Glasgow | Flame hydrolysis deposition burner |
EP1087177B1 (en) * | 1999-04-06 | 2011-12-28 | Shin-Etsu Chemical Co., Ltd. | Burner and combustion furnace for combustion and flame hydrolysis and combustion method |
US6418756B1 (en) | 2000-01-28 | 2002-07-16 | Corning Incorporated | Method of making planar waveguides using low flow rates of feedstock vapors from a gas and liquid mixture |
US20030070452A1 (en) * | 2001-10-12 | 2003-04-17 | Alcatel | Process for online spheroidization of quartz and silica particles |
WO2004048261A2 (en) * | 2002-11-26 | 2004-06-10 | Cabot Corporation | Fumed metal oxide particles and process for producing the same |
DE10302914B4 (de) * | 2003-01-24 | 2005-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas |
FI116619B (fi) | 2004-07-02 | 2006-01-13 | Liekki Oy | Menetelmä ja laite optisen materiaalin tuottamiseksi sekä optinen aaltojohde |
KR100975746B1 (ko) * | 2004-08-11 | 2010-08-12 | 현대중공업 주식회사 | 프로펠러 및 금속 주조를 위한 통합 압탕가열장치 |
JP4412485B2 (ja) * | 2004-12-10 | 2010-02-10 | 信越化学工業株式会社 | シリコーンゴムと基材との一体成形複合体及びその製造方法 |
US20070165308A1 (en) * | 2005-12-15 | 2007-07-19 | Jian Wang | Optical retarders and methods of making the same |
US20090079187A1 (en) * | 2007-09-25 | 2009-03-26 | Itt Automotive, Inc. | Fluidic coupling with deformable quick connector |
KR101256299B1 (ko) * | 2008-05-16 | 2013-04-18 | 덴키 가가쿠 고교 가부시기가이샤 | 비정질 실리카질 분말, 그의 제조 방법 및 용도 |
US8038971B2 (en) * | 2008-09-05 | 2011-10-18 | Cabot Corporation | Fumed silica of controlled aggregate size and processes for manufacturing the same |
US8729158B2 (en) * | 2008-09-05 | 2014-05-20 | Cabot Corporation | Fumed silica of controlled aggregate size and processes for manufacturing the same |
GB2478307A (en) | 2010-03-02 | 2011-09-07 | Heraeus Quartz Uk Ltd | Manufacture of silica glass |
US8840858B2 (en) * | 2011-07-06 | 2014-09-23 | Corning Incorporated | Apparatus for mixing vaporized precursor and gas and method therefor |
JP6236866B2 (ja) * | 2013-05-15 | 2017-11-29 | 住友電気工業株式会社 | ガラス微粒子堆積体の製造方法およびガラス微粒子堆積体製造用バーナー |
JP6086168B2 (ja) * | 2016-04-01 | 2017-03-01 | 住友電気工業株式会社 | ガラス微粒子堆積体の製造方法およびガラス母材の製造方法 |
CN106277750A (zh) * | 2016-08-19 | 2017-01-04 | 中国建筑材料科学研究总院 | 石英玻璃的制备方法 |
KR101880728B1 (ko) | 2017-01-06 | 2018-07-23 | 배명인 | 각도 및 길이조절이 가능한 조명장치 |
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US5703191A (en) | 1995-09-01 | 1997-12-30 | Corning Incorporated | Method for purifying polyalkylsiloxanes and the resulting products |
DE19725955C1 (de) | 1997-06-19 | 1999-01-21 | Heraeus Quarzglas | Verfahren zur Herstellung eines Quarzglasrohlings und dafür geeignete Vorrichtung |
US5979185A (en) * | 1997-07-16 | 1999-11-09 | Corning Incorporated | Method and apparatus for forming silica by combustion of liquid reactants using a heater |
-
1996
- 1996-12-12 DE DE69633066T patent/DE69633066D1/de not_active Expired - Lifetime
- 1996-12-12 EP EP96945303A patent/EP0868401B1/en not_active Expired - Lifetime
- 1996-12-12 KR KR10-1998-0704637A patent/KR100473827B1/ko not_active IP Right Cessation
- 1996-12-12 CA CA002233021A patent/CA2233021A1/en not_active Abandoned
- 1996-12-12 UA UA98052779A patent/UA46068C2/uk unknown
- 1996-12-12 CN CN96199035A patent/CN1128111C/zh not_active Expired - Fee Related
- 1996-12-12 AT AT96945303T patent/ATE272573T1/de not_active IP Right Cessation
- 1996-12-12 JP JP52308997A patent/JP4089922B2/ja not_active Expired - Fee Related
- 1996-12-12 AU AU15206/97A patent/AU718737B2/en not_active Ceased
- 1996-12-12 WO PCT/US1996/020756 patent/WO1997022553A1/en active IP Right Grant
- 1996-12-12 BR BR9611969A patent/BR9611969A/pt not_active Application Discontinuation
- 1996-12-17 US US08/767,653 patent/US6565823B1/en not_active Expired - Lifetime
-
1997
- 1997-04-07 TW TW086100125A patent/TW343959B/zh active
Also Published As
Publication number | Publication date |
---|---|
EP0868401A4 (en) | 1999-03-17 |
KR100473827B1 (ko) | 2005-07-18 |
AU718737B2 (en) | 2000-04-20 |
CA2233021A1 (en) | 1997-06-26 |
JP4089922B2 (ja) | 2008-05-28 |
US6565823B1 (en) | 2003-05-20 |
TW343959B (en) | 1998-11-01 |
WO1997022553A1 (en) | 1997-06-26 |
AU1520697A (en) | 1997-07-14 |
EP0868401B1 (en) | 2004-08-04 |
CN1204299A (zh) | 1999-01-06 |
ATE272573T1 (de) | 2004-08-15 |
KR20000064466A (ko) | 2000-11-06 |
JP2000502040A (ja) | 2000-02-22 |
EP0868401A1 (en) | 1998-10-07 |
DE69633066D1 (de) | 2004-09-09 |
CN1128111C (zh) | 2003-11-19 |
UA46068C2 (uk) | 2002-05-15 |
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EG | Technical examination (opinion): publication of technical examination (opinion) | ||
FC | Decision: refusal |