BR8903449A - Transistor bipolar,metodo para sua fabricacao e estrutura de transistor bipolar - Google Patents
Transistor bipolar,metodo para sua fabricacao e estrutura de transistor bipolarInfo
- Publication number
- BR8903449A BR8903449A BR898903449A BR8903449A BR8903449A BR 8903449 A BR8903449 A BR 8903449A BR 898903449 A BR898903449 A BR 898903449A BR 8903449 A BR8903449 A BR 8903449A BR 8903449 A BR8903449 A BR 8903449A
- Authority
- BR
- Brazil
- Prior art keywords
- bipolar transistor
- manufacture
- transistor structure
- bipolar
- transistor
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66234—Bipolar junction transistors [BJT]
- H01L29/66272—Silicon vertical transistors
- H01L29/66287—Silicon vertical transistors with a single crystalline emitter, collector or base including extrinsic, link or graft base formed on the silicon substrate, e.g. by epitaxy, recrystallisation, after insulating device isolation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/732—Vertical transistors
- H01L29/7325—Vertical transistors having an emitter-base junction leaving at a main surface and a base-collector junction leaving at a peripheral surface of the body, e.g. mesa planar transistor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/011—Bipolar transistors
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Bipolar Transistors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/219,020 US5059544A (en) | 1988-07-14 | 1988-07-14 | Method of forming bipolar transistor having self-aligned emitter-base using selective and non-selective epitaxy |
Publications (1)
Publication Number | Publication Date |
---|---|
BR8903449A true BR8903449A (pt) | 1990-03-06 |
Family
ID=22817480
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR898903449A BR8903449A (pt) | 1988-07-14 | 1989-07-13 | Transistor bipolar,metodo para sua fabricacao e estrutura de transistor bipolar |
Country Status (6)
Country | Link |
---|---|
US (1) | US5059544A (pt) |
EP (1) | EP0350610A3 (pt) |
JP (1) | JPH0695524B2 (pt) |
AR (1) | AR247041A1 (pt) |
BR (1) | BR8903449A (pt) |
CA (1) | CA1311859C (pt) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5227317A (en) * | 1989-04-21 | 1993-07-13 | Hitachi, Ltd. | Method of manufacturing semiconductor integrated circuit bipolar transistor device |
JPH02280340A (ja) * | 1989-04-21 | 1990-11-16 | Hitachi Ltd | 半導体集積回路装置の製造方法 |
US5296388A (en) * | 1990-07-13 | 1994-03-22 | Matsushita Electric Industrial Co., Ltd. | Fabrication method for semiconductor devices |
US5213989A (en) * | 1992-06-24 | 1993-05-25 | Motorola, Inc. | Method for forming a grown bipolar electrode contact using a sidewall seed |
JP2740087B2 (ja) * | 1992-08-15 | 1998-04-15 | 株式会社東芝 | 半導体集積回路装置の製造方法 |
US5557131A (en) * | 1992-10-19 | 1996-09-17 | At&T Global Information Solutions Company | Elevated emitter for double poly BICMOS devices |
US5266505A (en) * | 1992-12-22 | 1993-11-30 | International Business Machines Corporation | Image reversal process for self-aligned implants in planar epitaxial-base bipolar transistors |
JP3172031B2 (ja) * | 1994-03-15 | 2001-06-04 | 株式会社東芝 | 半導体装置の製造方法 |
US5554562A (en) * | 1995-04-06 | 1996-09-10 | Advanced Micro Devices, Inc. | Advanced isolation scheme for deep submicron technology |
US6020246A (en) | 1998-03-13 | 2000-02-01 | National Semiconductor Corporation | Forming a self-aligned epitaxial base bipolar transistor |
FR2778022B1 (fr) * | 1998-04-22 | 2001-07-13 | France Telecom | Transistor bibolaire vertical, en particulier a base a heterojonction sige, et procede de fabrication |
US6444536B2 (en) * | 1999-07-08 | 2002-09-03 | Agere Systems Guardian Corp. | Method for fabricating bipolar transistors |
DE10160509A1 (de) * | 2001-11-30 | 2003-06-12 | Ihp Gmbh | Halbleitervorrichtung und Verfahren zu ihrer Herstellung |
KR20040038511A (ko) * | 2002-11-01 | 2004-05-08 | 한국전자통신연구원 | 자기정렬형 이종접합 쌍극자 트랜지스터 및 그의 제조 방법 |
US6998305B2 (en) * | 2003-01-24 | 2006-02-14 | Asm America, Inc. | Enhanced selectivity for epitaxial deposition |
JP2004356254A (ja) * | 2003-05-28 | 2004-12-16 | Sony Corp | 半導体装置、及び同半導体装置の製造方法 |
TW200518341A (en) * | 2003-09-30 | 2005-06-01 | Agere Systems Inc | Bipolar transistor with selectively deposited emitter |
US7372091B2 (en) * | 2004-01-27 | 2008-05-13 | Micron Technology, Inc. | Selective epitaxy vertical integrated circuit components |
US7265018B2 (en) * | 2004-09-21 | 2007-09-04 | International Business Machines Corporation | Method to build self-aligned NPN in advanced BiCMOS technology |
US7504685B2 (en) | 2005-06-28 | 2009-03-17 | Micron Technology, Inc. | Oxide epitaxial isolation |
US7375413B2 (en) * | 2006-05-26 | 2008-05-20 | International Business Machines Corporation | Trench widening without merging |
US8278176B2 (en) | 2006-06-07 | 2012-10-02 | Asm America, Inc. | Selective epitaxial formation of semiconductor films |
US7687887B1 (en) | 2006-12-01 | 2010-03-30 | National Semiconductor Corporation | Method of forming a self-aligned bipolar transistor structure using a selectively grown emitter |
US7759199B2 (en) | 2007-09-19 | 2010-07-20 | Asm America, Inc. | Stressor for engineered strain on channel |
US8367528B2 (en) | 2009-11-17 | 2013-02-05 | Asm America, Inc. | Cyclical epitaxial deposition and etch |
US8809170B2 (en) | 2011-05-19 | 2014-08-19 | Asm America Inc. | High throughput cyclical epitaxial deposition and etch process |
US9356097B2 (en) | 2013-06-25 | 2016-05-31 | Globalfoundries Inc. | Method of forming a bipolar transistor with maskless self-aligned emitter |
CN109887996B (zh) * | 2019-01-31 | 2022-03-08 | 上海华虹宏力半导体制造有限公司 | 自对准锗硅hbt器件的制造方法 |
US11588043B2 (en) | 2021-04-14 | 2023-02-21 | Globalfoundries U.S. Inc. | Bipolar transistor with elevated extrinsic base and methods to form same |
US20230197787A1 (en) * | 2021-12-22 | 2023-06-22 | Globalfoundries Singapore Pte. Ltd. | Bipolar transistors |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1061506A (en) * | 1965-03-31 | 1967-03-15 | Ibm | Method of forming a semiconductor device and device so made |
JPS5244173A (en) * | 1975-10-06 | 1977-04-06 | Hitachi Ltd | Method of flat etching of silicon substrate |
US4004954A (en) * | 1976-02-25 | 1977-01-25 | Rca Corporation | Method of selective growth of microcrystalline silicon |
JPS5539677A (en) * | 1978-09-14 | 1980-03-19 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Semiconductor device and its manufacturing |
US4236294A (en) * | 1979-03-16 | 1980-12-02 | International Business Machines Corporation | High performance bipolar device and method for making same |
JPS55128869A (en) * | 1979-03-26 | 1980-10-06 | Mitsubishi Electric Corp | Semiconductor device and method of fabricating the same |
US4324814A (en) * | 1981-03-19 | 1982-04-13 | Rca Corporation | Method for forming a narrow thin film line |
US4483726A (en) * | 1981-06-30 | 1984-11-20 | International Business Machines Corporation | Double self-aligned fabrication process for making a bipolar transistor structure having a small polysilicon-to-extrinsic base contact area |
JPS5856320A (ja) * | 1981-09-29 | 1983-04-04 | Nec Corp | 気相成長方法 |
JPS5889863A (ja) * | 1981-11-24 | 1983-05-28 | Hitachi Ltd | 半導体装置の製造方法 |
US4462847A (en) * | 1982-06-21 | 1984-07-31 | Texas Instruments Incorporated | Fabrication of dielectrically isolated microelectronic semiconductor circuits utilizing selective growth by low pressure vapor deposition |
US4545114A (en) * | 1982-09-30 | 1985-10-08 | Fujitsu Limited | Method of producing semiconductor device |
JPS5984469A (ja) * | 1982-11-04 | 1984-05-16 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
US4507158A (en) * | 1983-08-12 | 1985-03-26 | Hewlett-Packard Co. | Trench isolated transistors in semiconductor films |
US4522662A (en) * | 1983-08-12 | 1985-06-11 | Hewlett-Packard Company | CVD lateral epitaxial growth of silicon over insulators |
US4578142A (en) * | 1984-05-10 | 1986-03-25 | Rca Corporation | Method for growing monocrystalline silicon through mask layer |
US4640721A (en) * | 1984-06-06 | 1987-02-03 | Hitachi, Ltd. | Method of forming bipolar transistors with graft base regions |
JPS6146063A (ja) * | 1984-08-10 | 1986-03-06 | Hitachi Ltd | 半導体装置の製造方法 |
JPS6298770A (ja) * | 1985-10-25 | 1987-05-08 | Sony Corp | 半導体装置の製造方法 |
JPS6318673A (ja) * | 1986-07-11 | 1988-01-26 | Yamaha Corp | 半導体装置の製法 |
US4818713A (en) * | 1987-10-20 | 1989-04-04 | American Telephone And Telegraph Company, At&T Bell Laboratories | Techniques useful in fabricating semiconductor devices having submicron features |
-
1988
- 1988-07-14 US US07/219,020 patent/US5059544A/en not_active Expired - Fee Related
-
1989
- 1989-05-29 JP JP1132923A patent/JPH0695524B2/ja not_active Expired - Lifetime
- 1989-06-01 EP EP89109885A patent/EP0350610A3/en not_active Ceased
- 1989-06-02 CA CA000601601A patent/CA1311859C/en not_active Expired - Fee Related
- 1989-07-07 AR AR89314341A patent/AR247041A1/es active
- 1989-07-13 BR BR898903449A patent/BR8903449A/pt not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
CA1311859C (en) | 1992-12-22 |
US5059544A (en) | 1991-10-22 |
JPH0695524B2 (ja) | 1994-11-24 |
EP0350610A2 (en) | 1990-01-17 |
AR247041A1 (es) | 1994-10-31 |
JPH0240923A (ja) | 1990-02-09 |
EP0350610A3 (en) | 1990-08-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FD3 | Appl. lapsed due to non-payment of renewal fee |