BR112015014013A2 - método para produzir um semicondutor composto e célula solar de película fina - Google Patents
método para produzir um semicondutor composto e célula solar de película finaInfo
- Publication number
- BR112015014013A2 BR112015014013A2 BR112015014013A BR112015014013A BR112015014013A2 BR 112015014013 A2 BR112015014013 A2 BR 112015014013A2 BR 112015014013 A BR112015014013 A BR 112015014013A BR 112015014013 A BR112015014013 A BR 112015014013A BR 112015014013 A2 BR112015014013 A2 BR 112015014013A2
- Authority
- BR
- Brazil
- Prior art keywords
- precursor layer
- precursor
- metals
- produce
- composite semiconductor
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 239000002131 composite material Substances 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 239000010409 thin film Substances 0.000 title 1
- 239000002243 precursor Substances 0.000 abstract 13
- 229910052751 metal Inorganic materials 0.000 abstract 4
- 239000002184 metal Substances 0.000 abstract 4
- 238000000151 deposition Methods 0.000 abstract 3
- 150000002739 metals Chemical class 0.000 abstract 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 2
- 229910052802 copper Inorganic materials 0.000 abstract 2
- 239000010949 copper Substances 0.000 abstract 2
- 229910052733 gallium Inorganic materials 0.000 abstract 2
- 229910052738 indium Inorganic materials 0.000 abstract 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 abstract 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 abstract 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 abstract 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 abstract 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 1
- 229910052791 calcium Inorganic materials 0.000 abstract 1
- 239000011575 calcium Substances 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- -1 gallium metals Chemical class 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 229910052711 selenium Inorganic materials 0.000 abstract 1
- 239000011669 selenium Substances 0.000 abstract 1
- 229910052717 sulfur Inorganic materials 0.000 abstract 1
- 239000011593 sulfur Substances 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1864—Annealing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02614—Transformation of metal, e.g. oxidation, nitridation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/065—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the graded gap type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
- H01L31/0749—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type including a AIBIIICVI compound, e.g. CdS/CulnSe2 [CIS] heterojunction solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
1/1 resumo “método para produzir um semicondutor composto e célula solar de película fina” a presente invenção refere-se a um método para produzir um semicondutor composto (2), que compreende as seguintes etapas: -produzir pelo menos uma pilha de camadas precursoras (11), consistindo de uma primeira camada precursora (5.1), uma segunda camada precursora (6) e uma terceira camada precursora (5.2), em que, em um primeiro estágio, a primeira camada precursora (5.1) é produzida depositando-se os metais cobre, índio e gálio sobre um corpo (12) e, em um segundo estágio, a segunda camada precursora (6) é produzida depositando-se pelo menos um calcogênio, selecionado de enxofre e selênio, sobre a primeira camada precursora (5.1) e, em um terceiro estágio, a terceira camada precursora (5.2) é produzida depositando-se os metais cobre, índio e gálio sobre a segunda camada precursora (6); -tratar termicamente a pelo menos uma pilha de camadas precursoras (11) em uma câmara de processo (13), de modo que os metais da primeira camada precursora (5.1), o pelo menos um calcogênio da segunda camada precursora (6) e os metais da terceira camada precursora (5.2) sejam reativamente convertidos para formar o semicondutor composto (2).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP12198612 | 2012-12-20 | ||
PCT/EP2013/076158 WO2014095503A1 (de) | 2012-12-20 | 2013-12-11 | Verfahren zur herstellung eines verbindungshalbleiters sowie dünnschichtsolarzelle |
Publications (1)
Publication Number | Publication Date |
---|---|
BR112015014013A2 true BR112015014013A2 (pt) | 2017-07-11 |
Family
ID=47603079
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112015014013A BR112015014013A2 (pt) | 2012-12-20 | 2013-12-11 | método para produzir um semicondutor composto e célula solar de película fina |
Country Status (8)
Country | Link |
---|---|
US (1) | US9899561B2 (pt) |
EP (1) | EP2936548B1 (pt) |
JP (1) | JP6239645B2 (pt) |
KR (1) | KR101768788B1 (pt) |
CN (1) | CN104885191B (pt) |
BR (1) | BR112015014013A2 (pt) |
ES (1) | ES2686620T3 (pt) |
WO (1) | WO2014095503A1 (pt) |
Family Cites Families (36)
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JP2975693B2 (ja) | 1990-09-03 | 1999-11-10 | 株式会社富士電機総合研究所 | カルコパイライト型化合物薄膜の製造方法 |
JP3484259B2 (ja) | 1995-05-15 | 2004-01-06 | 松下電器産業株式会社 | 半導体薄膜形成用前駆体及び半導体薄膜の製造方法 |
EP0743686A3 (en) * | 1995-05-15 | 1998-12-02 | Matsushita Electric Industrial Co., Ltd | Precursor for semiconductor thin films and method for producing semiconductor thin films |
JP3468328B2 (ja) | 1996-01-29 | 2003-11-17 | 松下電器産業株式会社 | 半導体薄膜の製造方法 |
DE19956735B4 (de) | 1999-11-25 | 2008-08-21 | Shell Erneuerbare Energien Gmbh | Dünnfilmsolarzelle mit einer Chalkopyritverbindung und einer Titan und Sauerstoff enthaltenden Verbindung |
DE10024882A1 (de) | 2000-05-19 | 2001-11-29 | Zsw | Verfahren zur Herstellung einer photoelektrisch aktiven Verbindungshalbleiterschicht mit Alkalimetall-Dotieranteil |
JP3897622B2 (ja) | 2002-03-18 | 2007-03-28 | 松下電器産業株式会社 | 化合物半導体薄膜の製造方法 |
JP4110515B2 (ja) | 2002-04-18 | 2008-07-02 | 本田技研工業株式会社 | 薄膜太陽電池およびその製造方法 |
CN100413097C (zh) * | 2005-06-03 | 2008-08-20 | 清华大学 | 铜铟镓硒或铜铟镓硫或铜铟镓硒硫薄膜太阳能电池吸收层的制备方法 |
DE102005040087A1 (de) | 2005-08-24 | 2007-03-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Abscheiden von Absorber-Schichten für Dünnschicht-Solarzellen |
AU2008297944A1 (en) | 2007-09-11 | 2009-03-19 | Centrotherm Photovoltaics Ag | Method and apparatus for thermally converting metallic precursor layers into semiconducting layers, and also solar module |
JP4974986B2 (ja) * | 2007-09-28 | 2012-07-11 | 富士フイルム株式会社 | 太陽電池用基板および太陽電池 |
US20120003786A1 (en) | 2007-12-07 | 2012-01-05 | Serdar Aksu | Electroplating methods and chemistries for cigs precursor stacks with conductive selenide bottom layer |
US8252621B2 (en) | 2008-02-08 | 2012-08-28 | Solopower, Inc. | Method for forming copper indium gallium chalcogenide layer with optimized gallium content at its surface |
US8415559B2 (en) * | 2008-02-08 | 2013-04-09 | Solopower, Inc. | Method for forming copper indium gallium chalcogenide layer with shaped gallium profile |
JP5738601B2 (ja) * | 2008-03-05 | 2015-06-24 | ハナジー・ハイ−テク・パワー・(エイチケー)・リミテッド | 薄膜太陽電池セルのための緩衝層蒸着 |
JP2009277945A (ja) | 2008-05-15 | 2009-11-26 | Hitachi Maxell Ltd | 光発電素子および光発電素子の製造方法 |
KR20100073717A (ko) | 2008-12-23 | 2010-07-01 | 삼성전자주식회사 | 태양전지 및 그 제조 방법 |
JP2012518281A (ja) * | 2009-02-15 | 2012-08-09 | ウッドラフ、ジェイコブ | 平衡前駆体から作られる、太陽電池の吸収層 |
US20110005586A1 (en) | 2009-07-10 | 2011-01-13 | Solopower, Inc. | Electrochemical Deposition Methods for Fabricating Group IBIIIAVIA Compound Absorber Based Solar Cells |
WO2011028957A2 (en) | 2009-09-02 | 2011-03-10 | Brent Bollman | Methods and devices for processing a precursor layer in a group via environment |
DE102009053532B4 (de) * | 2009-11-18 | 2017-01-05 | Centrotherm Photovoltaics Ag | Verfahren und Vorrichtung zur Herstellung einer Verbindungshalbleiterschicht |
EP2360720A1 (de) | 2010-02-23 | 2011-08-24 | Saint-Gobain Glass France | Vorrichtung zum Positionieren von mindestens zwei Gegenständen, Anordnungen, insbesondere Mehrschichtkörperanordnungen, Anlage zum Prozessieren, insbesondere zum Selenisieren, von Gegenständen, Verfahren zum Positionieren von mindestens zwei Gegenständen |
EP2360721A1 (de) | 2010-02-23 | 2011-08-24 | Saint-Gobain Glass France | Vorrichtung zum Positionieren von mindestens zwei Gegenständen, Anordnungen, insbesondere Mehrschichtkörperanordnungen, Anlage zum Prozessieren, insbesondere zum Selenisieren, von Gegenständen, Verfahren zum Positionieren von mindestens zwei Gegenständen |
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US9064700B2 (en) * | 2012-02-21 | 2015-06-23 | Zetta Research And Development Llc - Aqt Series | Crystallization annealing processes for production of CIGS and CZTS thin-films |
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-
2013
- 2013-12-11 BR BR112015014013A patent/BR112015014013A2/pt not_active IP Right Cessation
- 2013-12-11 KR KR1020157018982A patent/KR101768788B1/ko active IP Right Grant
- 2013-12-11 US US14/651,374 patent/US9899561B2/en active Active
- 2013-12-11 ES ES13802971.5T patent/ES2686620T3/es active Active
- 2013-12-11 JP JP2015548366A patent/JP6239645B2/ja active Active
- 2013-12-11 CN CN201380066999.3A patent/CN104885191B/zh active Active
- 2013-12-11 EP EP13802971.5A patent/EP2936548B1/de active Active
- 2013-12-11 WO PCT/EP2013/076158 patent/WO2014095503A1/de active Application Filing
Also Published As
Publication number | Publication date |
---|---|
KR20150095878A (ko) | 2015-08-21 |
WO2014095503A1 (de) | 2014-06-26 |
ES2686620T3 (es) | 2018-10-18 |
US20150318433A1 (en) | 2015-11-05 |
JP6239645B2 (ja) | 2017-11-29 |
CN104885191B (zh) | 2017-11-28 |
CN104885191A (zh) | 2015-09-02 |
JP2016500484A (ja) | 2016-01-12 |
EP2936548B1 (de) | 2018-06-06 |
EP2936548A1 (de) | 2015-10-28 |
US9899561B2 (en) | 2018-02-20 |
KR101768788B1 (ko) | 2017-08-16 |
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