BR0214907B1 - método para fluoração de um artigo poroso, e, aparelho para fluoração de um substrato. - Google Patents
método para fluoração de um artigo poroso, e, aparelho para fluoração de um substrato.Info
- Publication number
- BR0214907B1 BR0214907B1 BR0214907A BR0214907A BR0214907B1 BR 0214907 B1 BR0214907 B1 BR 0214907B1 BR 0214907 A BR0214907 A BR 0214907A BR 0214907 A BR0214907 A BR 0214907A BR 0214907 B1 BR0214907 B1 BR 0214907B1
- Authority
- BR
- Brazil
- Prior art keywords
- fluorination
- substrate
- porous article
- porous layer
- article
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/18—Introducing halogen atoms or halogen-containing groups
- C08F8/20—Halogenation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/36—After-treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249955—Void-containing component partially impregnated with adjacent component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
- Y10T442/20—Coated or impregnated woven, knit, or nonwoven fabric which is not [a] associated with another preformed layer or fiber layer or, [b] with respect to woven and knit, characterized, respectively, by a particular or differential weave or knit, wherein the coating or impregnation is neither a foamed material nor a free metal or alloy layer
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US34156401P | 2001-12-14 | 2001-12-14 | |
| US10/293,830 US7887889B2 (en) | 2001-12-14 | 2002-11-13 | Plasma fluorination treatment of porous materials |
| PCT/US2002/037372 WO2003051969A2 (en) | 2001-12-14 | 2002-11-21 | Plasma fluorination treatment of porous materials |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BR0214907A BR0214907A (pt) | 2004-11-30 |
| BR0214907B1 true BR0214907B1 (pt) | 2012-09-18 |
Family
ID=26968178
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR0214907A BR0214907B1 (pt) | 2001-12-14 | 2002-11-21 | método para fluoração de um artigo poroso, e, aparelho para fluoração de um substrato. |
Country Status (12)
| Country | Link |
|---|---|
| US (4) | US7887889B2 (pt) |
| EP (1) | EP1453897B1 (pt) |
| JP (1) | JP4308014B2 (pt) |
| KR (3) | KR100903233B1 (pt) |
| AT (1) | ATE357475T1 (pt) |
| AU (1) | AU2002366335B2 (pt) |
| BR (1) | BR0214907B1 (pt) |
| CA (1) | CA2469115A1 (pt) |
| DE (1) | DE60219070T2 (pt) |
| ES (1) | ES2282500T3 (pt) |
| MX (1) | MXPA04005626A (pt) |
| WO (1) | WO2003051969A2 (pt) |
Families Citing this family (86)
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|---|---|---|---|---|
| US7887889B2 (en) * | 2001-12-14 | 2011-02-15 | 3M Innovative Properties Company | Plasma fluorination treatment of porous materials |
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| JP2008031511A (ja) * | 2006-07-27 | 2008-02-14 | Asahi Glass Co Ltd | 親水撥油性物品の製造方法 |
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-
2002
- 2002-11-13 US US10/293,830 patent/US7887889B2/en not_active Expired - Fee Related
- 2002-11-21 BR BR0214907A patent/BR0214907B1/pt not_active IP Right Cessation
- 2002-11-21 EP EP02791286A patent/EP1453897B1/en not_active Expired - Lifetime
- 2002-11-21 KR KR1020047009154A patent/KR100903233B1/ko active IP Right Grant
- 2002-11-21 KR KR1020097025492A patent/KR20090130157A/ko not_active Application Discontinuation
- 2002-11-21 WO PCT/US2002/037372 patent/WO2003051969A2/en active Application Filing
- 2002-11-21 CA CA 2469115 patent/CA2469115A1/en not_active Abandoned
- 2002-11-21 MX MXPA04005626A patent/MXPA04005626A/es active IP Right Grant
- 2002-11-21 KR KR1020087028717A patent/KR100946817B1/ko active IP Right Grant
- 2002-11-21 AU AU2002366335A patent/AU2002366335B2/en not_active Ceased
- 2002-11-21 ES ES02791286T patent/ES2282500T3/es not_active Expired - Lifetime
- 2002-11-21 DE DE2002619070 patent/DE60219070T2/de not_active Expired - Lifetime
- 2002-11-21 JP JP2003552842A patent/JP4308014B2/ja not_active Expired - Fee Related
- 2002-11-21 AT AT02791286T patent/ATE357475T1/de not_active IP Right Cessation
-
2011
- 2011-01-11 US US13/004,288 patent/US20110100298A1/en not_active Abandoned
- 2011-01-11 US US13/004,257 patent/US9127363B2/en not_active Expired - Fee Related
-
2013
- 2013-01-21 US US13/746,077 patent/US20130125816A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| US20110100220A1 (en) | 2011-05-05 |
| US20030134515A1 (en) | 2003-07-17 |
| ES2282500T3 (es) | 2007-10-16 |
| BR0214907A (pt) | 2004-11-30 |
| KR100903233B1 (ko) | 2009-06-17 |
| ATE357475T1 (de) | 2007-04-15 |
| EP1453897B1 (en) | 2007-03-21 |
| MXPA04005626A (es) | 2004-12-06 |
| KR100946817B1 (ko) | 2010-03-09 |
| WO2003051969A3 (en) | 2004-01-22 |
| DE60219070T2 (de) | 2007-12-13 |
| JP4308014B2 (ja) | 2009-08-05 |
| AU2002366335A1 (en) | 2003-06-30 |
| DE60219070D1 (de) | 2007-05-03 |
| KR20090130157A (ko) | 2009-12-17 |
| KR20090003361A (ko) | 2009-01-09 |
| EP1453897A2 (en) | 2004-09-08 |
| US20130125816A1 (en) | 2013-05-23 |
| US20110100298A1 (en) | 2011-05-05 |
| WO2003051969A2 (en) | 2003-06-26 |
| CA2469115A1 (en) | 2003-06-26 |
| US9127363B2 (en) | 2015-09-08 |
| AU2002366335B2 (en) | 2008-10-02 |
| KR20040080438A (ko) | 2004-09-18 |
| JP2005511877A (ja) | 2005-04-28 |
| US7887889B2 (en) | 2011-02-15 |
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