BR0211921B1 - óxidos e sulfetos de mono- e bis-acilfosfina batocrÈmicos e seus usos, seus processos de preparação, sua composição forocurável, processo para fotopolimerização de compostos monoméricos, oligoméricos ou poliméricos não voláteis e substrato revestido. - Google Patents
óxidos e sulfetos de mono- e bis-acilfosfina batocrÈmicos e seus usos, seus processos de preparação, sua composição forocurável, processo para fotopolimerização de compostos monoméricos, oligoméricos ou poliméricos não voláteis e substrato revestido.Info
- Publication number
- BR0211921B1 BR0211921B1 BRPI0211921-8A BR0211921A BR0211921B1 BR 0211921 B1 BR0211921 B1 BR 0211921B1 BR 0211921 A BR0211921 A BR 0211921A BR 0211921 B1 BR0211921 B1 BR 0211921B1
- Authority
- BR
- Brazil
- Prior art keywords
- sub
- forcurable
- batocratic
- oligomeric
- sulfides
- Prior art date
Links
- 238000000034 method Methods 0.000 title 1
- 229920000642 polymer Polymers 0.000 title 1
- 238000002360 preparation method Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
- 150000003568 thioethers Chemical class 0.000 title 1
- 125000000217 alkyl group Chemical group 0.000 abstract 4
- 229910052736 halogen Inorganic materials 0.000 abstract 3
- 150000002367 halogens Chemical class 0.000 abstract 3
- 229910052739 hydrogen Inorganic materials 0.000 abstract 3
- 239000001257 hydrogen Substances 0.000 abstract 3
- 150000002431 hydrogen Chemical class 0.000 abstract 2
- 229910052760 oxygen Inorganic materials 0.000 abstract 2
- 229910052717 sulfur Inorganic materials 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000004430 oxygen atom Chemical group O* 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/30—Phosphinic acids [R2P(=O)(OH)]; Thiophosphinic acids ; [R2P(=X1)(X2H) (X1, X2 are each independently O, S or Se)]
- C07F9/32—Esters thereof
- C07F9/3205—Esters thereof the acid moiety containing a substituent or a structure which is considered as characteristic
- C07F9/3247—Esters of acids containing the structure -C(=X)-P(=X)(R)(XH) or NC-P(=X)(R)(XH), (X = O, S, Se)
- C07F9/3252—Esters of acids containing the structure -C(=X)-P(=X)(R)(XH) or NC-P(=X)(R)(XH), (X = O, S, Se) containing the structure -C(=X)-P(=X)(R)(XR), (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
- C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/553—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having one nitrogen atom as the only ring hetero atom
- C07F9/572—Five-membered rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6527—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having nitrogen and oxygen atoms as the only ring hetero atoms
- C07F9/6533—Six-membered rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Polymerisation Methods In General (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Dental Preparations (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH15422001 | 2001-08-21 | ||
| PCT/EP2002/009045 WO2003019295A1 (en) | 2001-08-21 | 2002-08-13 | Bathochromic mono- and bis-acylphosphine oxides and sulfides and their use as photoinitiators |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BR0211921A BR0211921A (pt) | 2004-10-26 |
| BR0211921B1 true BR0211921B1 (pt) | 2012-05-02 |
Family
ID=4565544
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0211921-8A BR0211921B1 (pt) | 2001-08-21 | 2002-08-13 | óxidos e sulfetos de mono- e bis-acilfosfina batocrÈmicos e seus usos, seus processos de preparação, sua composição forocurável, processo para fotopolimerização de compostos monoméricos, oligoméricos ou poliméricos não voláteis e substrato revestido. |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US7148382B2 (https=) |
| EP (1) | EP1423757B1 (https=) |
| JP (1) | JP4225898B2 (https=) |
| KR (1) | KR100903939B1 (https=) |
| CN (1) | CN100437354C (https=) |
| AT (1) | ATE430329T1 (https=) |
| BR (1) | BR0211921B1 (https=) |
| CA (1) | CA2454914A1 (https=) |
| DE (1) | DE60232160D1 (https=) |
| DK (1) | DK1423757T3 (https=) |
| ES (1) | ES2324983T3 (https=) |
| MX (1) | MXPA04001483A (https=) |
| WO (1) | WO2003019295A1 (https=) |
Families Citing this family (103)
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|---|---|---|---|---|
| DE10206096A1 (de) * | 2002-02-13 | 2003-08-14 | Basf Ag | Mono- und Bisacylphosphinderivate |
| CN1856742B (zh) * | 2003-09-24 | 2010-11-24 | 日立化成工业株式会社 | 感光性元件、光阻图型的形成方法及印刷电路板制造方法 |
| DE602005002656T2 (de) * | 2004-04-19 | 2008-07-17 | Ciba Specialty Chemicals Holding Inc. Patent Departement | Neue photoinitiatoren |
| EP1814891B1 (en) * | 2004-11-23 | 2011-01-26 | Basf Se | Bisacylphosphanes and their use as photoinitiators; process for preparing acylphosphanes |
| WO2006074983A1 (en) * | 2005-01-17 | 2006-07-20 | Ciba Specialty Chemicals Holding Inc. | Process for preparing acylphosphanes and their oxides and sulphides |
| EP1749513B1 (de) | 2005-08-01 | 2009-03-04 | Ivoclar Vivadent AG | Photopolymerisierbare Dentalmaterialien mit Bisacylphosphinoxiden als Initiator |
| DE102006050153A1 (de) | 2006-10-25 | 2008-05-08 | Ivoclar Vivadent Ag | Mikroverkapselte Photoinitiatoren und deren Verwendung für Dentalmaterialien |
| DE102009016025B4 (de) | 2009-04-02 | 2014-12-11 | Voco Gmbh | Kunststoffmodifizierter Glasionomerzement, seine Verwendung sowie Verfahren zu seiner Herstellung |
| WO2010121387A1 (en) * | 2009-04-20 | 2010-10-28 | ETH Zürich | Polymer nanoparticles |
| US8883872B2 (en) | 2009-07-06 | 2014-11-11 | Basf Se | Polymer-bound bisacylphosphine oxides |
| JP5701576B2 (ja) | 2009-11-20 | 2015-04-15 | 富士フイルム株式会社 | 分散組成物及び感光性樹脂組成物、並びに固体撮像素子 |
| DE102010003884A1 (de) | 2010-04-12 | 2011-10-13 | Voco Gmbh | Dualhärtende, mehrkomponentige dentale Zusammensetzung |
| DE102010003881A1 (de) | 2010-04-12 | 2011-10-13 | Voco Gmbh | Dentale Abdeckmasse |
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| JP5544239B2 (ja) | 2010-07-29 | 2014-07-09 | 富士フイルム株式会社 | 重合性組成物 |
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| EP2436363B1 (de) | 2010-09-30 | 2017-01-18 | VOCO GmbH | Zusammensetzung umfassend ein Monomer mit einem polyalicyclischen Strukturelement zum Füllen und/oder Versiegeln eines Wurzelkanals |
| EP2436364B1 (de) | 2010-09-30 | 2017-05-31 | VOCO GmbH | Lackzusammensetzung umfassend ein Monomer mit einem polyalicyclischen Strukturelement |
| EP2436366B1 (de) | 2010-09-30 | 2015-07-29 | VOCO GmbH | Kompositmaterial umfassend ein Monomer mit einem polyalicyclischen Strukturelement als Versiegelungsmaterial |
| US9023916B2 (en) | 2010-09-30 | 2015-05-05 | Voco Gmbh | Composite material comprising a monomer with a polyalicyclic structure element |
| US9079828B2 (en) | 2010-09-30 | 2015-07-14 | Voco Gmbh | Polymerizable compounds comprising a polyalicylic structure element |
| EP2450025B1 (de) | 2010-11-08 | 2012-11-28 | VOCO GmbH | Polymerisierbare Phosphorsäurederivate umfassend ein polyalicyclisches Strukturelement |
| KR101830206B1 (ko) | 2010-12-28 | 2018-02-20 | 후지필름 가부시키가이샤 | 차광막 형성용 티타늄 블랙 분산 조성물과 그 제조방법, 흑색 감방사선성 조성물, 흑색 경화막, 고체촬상소자, 및 흑색 경화막의 제조방법 |
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| DE2909992A1 (de) | 1979-03-14 | 1980-10-02 | Basf Ag | Photopolymerisierbare aufzeichnungsmassen, insbesondere zur herstellung von druckplatten und reliefformen |
| DE2909994A1 (de) * | 1979-03-14 | 1980-10-02 | Basf Ag | Acylphosphinoxidverbindungen, ihre herstellung und verwendung |
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| DE3443221A1 (de) * | 1984-11-27 | 1986-06-05 | ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld | Bisacylphosphinoxide, ihre herstellung und verwendung |
| US5218009A (en) * | 1989-08-04 | 1993-06-08 | Ciba-Geigy Corporation | Mono- and di-acylphosphine oxides |
| EP0495752B1 (de) | 1991-01-14 | 1995-03-01 | Ciba-Geigy Ag | Bisacylphosphinsulfide |
| EP0600373A1 (de) * | 1992-12-03 | 1994-06-08 | Hoechst Aktiengesellschaft | Arylphosphonsäurealkyl-arylester, Verfahren zu ihrer Herstellung und ihre Verwendung |
| CH691970A5 (de) | 1996-03-04 | 2001-12-14 | Ciba Sc Holding Ag | Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen. |
| JPH10279787A (ja) * | 1997-04-09 | 1998-10-20 | Mitsubishi Eng Plast Kk | ポリカーボネート樹脂組成物 |
| JP4265871B2 (ja) * | 1998-11-30 | 2009-05-20 | チバ ホールディング インコーポレーテッド | アシルホスフィン類、アシルオキシド類およびアシルスルフィド類の製造方法 |
| GB2360283B (en) | 2000-02-08 | 2002-08-21 | Ciba Sc Holding Ag | Monoacylarylphosphines and acylphosphine oxides and sulphides |
| GB2365430B (en) | 2000-06-08 | 2002-08-28 | Ciba Sc Holding Ag | Acylphosphine photoinitiators and intermediates |
| US20030164580A1 (en) | 2000-09-14 | 2003-09-04 | Karsten Rinker | Acylphosphine oxide photoinitiators in methacrylate casting resins |
-
2002
- 2002-08-13 ES ES02796226T patent/ES2324983T3/es not_active Expired - Lifetime
- 2002-08-13 AT AT02796226T patent/ATE430329T1/de not_active IP Right Cessation
- 2002-08-13 DE DE60232160T patent/DE60232160D1/de not_active Expired - Lifetime
- 2002-08-13 CN CNB028162811A patent/CN100437354C/zh not_active Expired - Lifetime
- 2002-08-13 US US10/485,836 patent/US7148382B2/en not_active Expired - Lifetime
- 2002-08-13 EP EP02796226A patent/EP1423757B1/en not_active Expired - Lifetime
- 2002-08-13 WO PCT/EP2002/009045 patent/WO2003019295A1/en not_active Ceased
- 2002-08-13 MX MXPA04001483A patent/MXPA04001483A/es active IP Right Grant
- 2002-08-13 CA CA002454914A patent/CA2454914A1/en not_active Abandoned
- 2002-08-13 KR KR1020047002548A patent/KR100903939B1/ko not_active Expired - Lifetime
- 2002-08-13 DK DK02796226T patent/DK1423757T3/da active
- 2002-08-13 JP JP2003523295A patent/JP4225898B2/ja not_active Expired - Lifetime
- 2002-08-13 BR BRPI0211921-8A patent/BR0211921B1/pt not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| US7148382B2 (en) | 2006-12-12 |
| CA2454914A1 (en) | 2003-03-06 |
| BR0211921A (pt) | 2004-10-26 |
| ATE430329T1 (de) | 2009-05-15 |
| CN100437354C (zh) | 2008-11-26 |
| CN1545643A (zh) | 2004-11-10 |
| EP1423757A1 (en) | 2004-06-02 |
| DK1423757T3 (da) | 2009-08-17 |
| DE60232160D1 (de) | 2009-06-10 |
| JP2005501124A (ja) | 2005-01-13 |
| EP1423757B1 (en) | 2009-04-29 |
| KR100903939B1 (ko) | 2009-06-25 |
| ES2324983T3 (es) | 2009-08-21 |
| JP4225898B2 (ja) | 2009-02-18 |
| KR20040028996A (ko) | 2004-04-03 |
| MXPA04001483A (es) | 2004-07-30 |
| US20040204613A1 (en) | 2004-10-14 |
| WO2003019295A1 (en) | 2003-03-06 |
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