AU2001248466A1 - Palladium complex salt and use thereof for adjusting palladium concentration of an electrolytic solution for deposit of palladium or one of its alloys - Google Patents
Palladium complex salt and use thereof for adjusting palladium concentration of an electrolytic solution for deposit of palladium or one of its alloysInfo
- Publication number
- AU2001248466A1 AU2001248466A1 AU2001248466A AU4846601A AU2001248466A1 AU 2001248466 A1 AU2001248466 A1 AU 2001248466A1 AU 2001248466 A AU2001248466 A AU 2001248466A AU 4846601 A AU4846601 A AU 4846601A AU 2001248466 A1 AU2001248466 A1 AU 2001248466A1
- Authority
- AU
- Australia
- Prior art keywords
- palladium
- complex salt
- alloys
- adjusting
- deposit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 title abstract 18
- 229910052763 palladium Inorganic materials 0.000 title abstract 8
- 150000003839 salts Chemical class 0.000 title abstract 4
- 229910045601 alloy Inorganic materials 0.000 title abstract 2
- 239000000956 alloy Substances 0.000 title abstract 2
- 239000008151 electrolyte solution Substances 0.000 title 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 abstract 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 abstract 1
- 230000002378 acidificating effect Effects 0.000 abstract 1
- 238000004070 electrodeposition Methods 0.000 abstract 1
- 238000005868 electrolysis reaction Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
- C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G55/00—Compounds of ruthenium, rhodium, palladium, osmium, iridium, or platinum
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0004382A FR2807422B1 (fr) | 2000-04-06 | 2000-04-06 | Sel complexe de palladium et son utilisation pour ajuster la concentration en palladium d'un bain electrolytique destine au depot de palladium ou d'un de ses alliages |
| FR0004382 | 2000-04-06 | ||
| PCT/FR2001/001022 WO2001077025A1 (fr) | 2000-04-06 | 2001-04-05 | Sel complexe de palladium et son utilisation pour ajuster la concentration en palladium d'un bain electrolytique destine au depot du palladium ou d'un de ses alliages |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2001248466A1 true AU2001248466A1 (en) | 2001-10-23 |
Family
ID=8848928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2001248466A Abandoned AU2001248466A1 (en) | 2000-04-06 | 2001-04-05 | Palladium complex salt and use thereof for adjusting palladium concentration of an electrolytic solution for deposit of palladium or one of its alloys |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6743950B2 (ja) |
| EP (1) | EP1268347B8 (ja) |
| JP (1) | JP4740508B2 (ja) |
| CN (1) | CN1214990C (ja) |
| AT (1) | ATE298729T1 (ja) |
| AU (1) | AU2001248466A1 (ja) |
| DE (1) | DE60111727T2 (ja) |
| ES (1) | ES2244603T3 (ja) |
| FR (1) | FR2807422B1 (ja) |
| WO (1) | WO2001077025A1 (ja) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2807450B1 (fr) * | 2000-04-06 | 2002-07-05 | Engelhard Clal Sas | Bain electrolytique destine au depot electrochimique du palladium ou de ses alliages |
| JP4765401B2 (ja) * | 2005-05-18 | 2011-09-07 | 旭硝子株式会社 | 固体高分子形燃料電池用膜の製造方法及び固体高分子形燃料電池用膜電極接合体の製造方法 |
| ES2387055T3 (es) * | 2008-05-07 | 2012-09-12 | Umicore Galvanotechnik Gmbh | Baños de electrolitos de Pd y Pd-Ni |
| DE502008000944D1 (de) * | 2008-05-07 | 2010-08-26 | Umicore Galvanotechnik Gmbh | Verfahren zur Herstellung von Komplexen des Palladium(hydrogen) carbonats mit Aminliganden |
| JP5854727B2 (ja) * | 2010-09-21 | 2016-02-09 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | シアン化物を含まない銀電気めっき液 |
| JP2013189715A (ja) * | 2013-06-06 | 2013-09-26 | Umicore Galvanotechnik Gmbh | Ｐｄ電解質浴およびＰｄ−Ｎｉ電解質浴 |
| CN104195604A (zh) * | 2014-09-17 | 2014-12-10 | 朱忠良 | 一种抑制裂缝产生的铱电镀液及其电镀方法和镀膜物 |
| CN105401182B (zh) * | 2015-10-14 | 2017-06-23 | 佛山科学技术学院 | 一种在不锈钢上电镀厚钯的镀液配方及其电镀方法 |
| CN108864200B (zh) * | 2018-08-06 | 2020-12-11 | 金川集团股份有限公司 | 电镀用硫酸乙二胺钯的一步制备方法 |
| CN112169811B (zh) * | 2020-10-27 | 2023-03-24 | 金川集团股份有限公司 | 一种硫酸钯溶液的制备方法 |
| CN114408858B (zh) * | 2022-01-05 | 2023-03-17 | 北京科技大学 | 一种室温可吸氢锆基复合材料的制备方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1051383A (ja) * | 1965-02-17 | |||
| CH572989A5 (ja) * | 1973-04-27 | 1976-02-27 | Oxy Metal Industries Corp | |
| US4278514A (en) * | 1980-02-12 | 1981-07-14 | Technic, Inc. | Bright palladium electrodeposition solution |
| JPS5967388A (ja) * | 1982-09-09 | 1984-04-17 | エンゲルハ−ド・コ−ポレ−シヨン | パラジウムメツキ浴 |
| US4552628A (en) * | 1982-09-09 | 1985-11-12 | Engelhard Corporation | Palladium electroplating and bath thereof |
| GB2171721B (en) * | 1985-01-25 | 1989-06-07 | Omi Int Corp | Palladium and palladium alloy plating |
| US4673472A (en) * | 1986-02-28 | 1987-06-16 | Technic Inc. | Method and electroplating solution for deposition of palladium or alloys thereof |
| GB8612361D0 (en) * | 1986-05-21 | 1986-06-25 | Engelhard Corp | Gold electroplating bath |
| US5882736A (en) * | 1993-05-13 | 1999-03-16 | Atotech Deutschland Gmbh | palladium layers deposition process |
| US5976344A (en) * | 1996-05-10 | 1999-11-02 | Lucent Technologies Inc. | Composition for electroplating palladium alloys and electroplating process using that composition |
| US6346222B1 (en) * | 1999-06-01 | 2002-02-12 | Agere Systems Guardian Corp. | Process for synthesizing a palladium replenisher for electroplating baths |
| FR2807450B1 (fr) * | 2000-04-06 | 2002-07-05 | Engelhard Clal Sas | Bain electrolytique destine au depot electrochimique du palladium ou de ses alliages |
-
2000
- 2000-04-06 FR FR0004382A patent/FR2807422B1/fr not_active Expired - Lifetime
-
2001
- 2001-04-05 AT AT01921483T patent/ATE298729T1/de not_active IP Right Cessation
- 2001-04-05 ES ES01921483T patent/ES2244603T3/es not_active Expired - Lifetime
- 2001-04-05 EP EP01921483A patent/EP1268347B8/fr not_active Expired - Lifetime
- 2001-04-05 AU AU2001248466A patent/AU2001248466A1/en not_active Abandoned
- 2001-04-05 JP JP2001575506A patent/JP4740508B2/ja not_active Expired - Fee Related
- 2001-04-05 US US10/239,862 patent/US6743950B2/en not_active Expired - Fee Related
- 2001-04-05 DE DE60111727T patent/DE60111727T2/de not_active Expired - Lifetime
- 2001-04-05 WO PCT/FR2001/001022 patent/WO2001077025A1/fr active IP Right Grant
- 2001-04-05 CN CN01809756.1A patent/CN1214990C/zh not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP1268347B1 (fr) | 2005-06-29 |
| EP1268347A1 (fr) | 2003-01-02 |
| DE60111727D1 (de) | 2005-08-04 |
| DE60111727T2 (de) | 2006-04-27 |
| FR2807422A1 (fr) | 2001-10-12 |
| ATE298729T1 (de) | 2005-07-15 |
| CN1430579A (zh) | 2003-07-16 |
| US6743950B2 (en) | 2004-06-01 |
| JP4740508B2 (ja) | 2011-08-03 |
| FR2807422B1 (fr) | 2002-07-05 |
| JP2003530371A (ja) | 2003-10-14 |
| EP1268347B8 (fr) | 2005-09-21 |
| WO2001077025A1 (fr) | 2001-10-18 |
| CN1214990C (zh) | 2005-08-17 |
| US20030047460A1 (en) | 2003-03-13 |
| ES2244603T3 (es) | 2005-12-16 |
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