ATE95573T1 - Vorrichtung und verfahren zum auftragen von duennschichtueberzuegen im vacuum. - Google Patents

Vorrichtung und verfahren zum auftragen von duennschichtueberzuegen im vacuum.

Info

Publication number
ATE95573T1
ATE95573T1 AT87310453T AT87310453T ATE95573T1 AT E95573 T1 ATE95573 T1 AT E95573T1 AT 87310453 T AT87310453 T AT 87310453T AT 87310453 T AT87310453 T AT 87310453T AT E95573 T1 ATE95573 T1 AT E95573T1
Authority
AT
Austria
Prior art keywords
crucible
plasma
vacuum chamber
substrate
thin film
Prior art date
Application number
AT87310453T
Other languages
German (de)
English (en)
Inventor
Michael David Temple
Kim Loren Johnson
Richard Ian Seddon
Original Assignee
Optical Coating Laboratory Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25466875&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE95573(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Optical Coating Laboratory Inc filed Critical Optical Coating Laboratory Inc
Application granted granted Critical
Publication of ATE95573T1 publication Critical patent/ATE95573T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Inorganic Insulating Materials (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
AT87310453T 1986-11-26 1987-11-26 Vorrichtung und verfahren zum auftragen von duennschichtueberzuegen im vacuum. ATE95573T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/935,292 US4777908A (en) 1986-11-26 1986-11-26 System and method for vacuum deposition of thin films
EP87310453A EP0269446B1 (en) 1986-11-26 1987-11-26 Apparatus and method for vacuum deposition of thin films

Publications (1)

Publication Number Publication Date
ATE95573T1 true ATE95573T1 (de) 1993-10-15

Family

ID=25466875

Family Applications (1)

Application Number Title Priority Date Filing Date
AT87310453T ATE95573T1 (de) 1986-11-26 1987-11-26 Vorrichtung und verfahren zum auftragen von duennschichtueberzuegen im vacuum.

Country Status (6)

Country Link
US (1) US4777908A (enExample)
EP (1) EP0269446B1 (enExample)
JP (1) JPS63213662A (enExample)
AT (1) ATE95573T1 (enExample)
CA (1) CA1316865C (enExample)
DE (1) DE3787705T2 (enExample)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63274762A (ja) * 1987-05-01 1988-11-11 Ulvac Corp 反応蒸着膜の形成装置
JPH0196372A (ja) * 1987-10-07 1989-04-14 Raimuzu:Kk イオンプレーティング装置
US5798027A (en) * 1988-02-08 1998-08-25 Optical Coating Laboratory, Inc. Process for depositing optical thin films on both planar and non-planar substrates
US5618388A (en) * 1988-02-08 1997-04-08 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
US5225057A (en) * 1988-02-08 1993-07-06 Optical Coating Laboratory, Inc. Process for depositing optical films on both planar and non-planar substrates
EP0362418A1 (en) * 1988-10-03 1990-04-11 International Business Machines Corporation Improved method and system for the angled exposition of a surface portion to an emission impinging obliquely thereon, and semiconductor wafers having facets exposed according to said method
US4951604A (en) * 1989-02-17 1990-08-28 Optical Coating Laboratory, Inc. System and method for vacuum deposition of thin films
DE69033441T2 (de) * 1989-11-13 2000-05-18 Optical Coating Laboratory Inc., Santa Rosa Geometrie und Gestaltungen eines Geräts zum Magnetronzerstäuben
DE4005692C2 (de) * 1990-02-23 1995-04-20 Omt Oberflaechen Materialtech Verfahren zur Herstellung von physiologisch verträglichen Oxidschichten auf Skelettimplantaten
US5112644A (en) * 1990-03-08 1992-05-12 Optical Coating Laboratory, Inc. Horizontal precession tooling and method for tube rotation
US5071670A (en) * 1990-06-11 1991-12-10 Kelly Michael A Method for chemical vapor deposition under a single reactor vessel divided into separate reaction chambers each with its own depositing and exhausting means
DE4026367A1 (de) * 1990-06-25 1992-03-12 Leybold Ag Vorrichtung zum beschichten von substraten
JPH0521670A (ja) * 1991-07-12 1993-01-29 Sumitomo Electric Ind Ltd ヒートシンク、ヒートシンクの製造方法および製造装置
FR2683395A1 (fr) * 1991-11-06 1993-05-07 Commissariat Energie Atomique Dispositif d'amende de tension sur une piece conductrice.
DE4221361C1 (en) * 1992-06-29 1993-07-01 Vtd-Vakuumtechnik Dresden Gmbh, O-8017 Dresden, De Plasma-supported deposition of thin insulating layers on substrates - buy vaporising insulating material and ionising in plasma of low energetic arc discharge
DE4239511A1 (de) * 1992-11-25 1994-05-26 Leybold Ag Verfahren und Vorrichtung zum Beschichten von Substraten
DE4421045C2 (de) * 1994-06-17 1997-01-23 Dresden Vakuumtech Gmbh Einrichtung zur plamagestützten Beschichtung von Substraten, insbesondere mit elektrisch isolierendem Material
US20070137653A1 (en) * 2000-03-13 2007-06-21 Wood Thomas J Ventilation interface for sleep apnea therapy
US6669824B2 (en) 2000-07-10 2003-12-30 Unaxis Usa, Inc. Dual-scan thin film processing system
US6495010B2 (en) 2000-07-10 2002-12-17 Unaxis Usa, Inc. Differentially-pumped material processing system
WO2003028428A2 (en) * 2001-09-10 2003-04-10 University Of Virginia Patent Foundation Method and apparatus application of metallic alloy coatings
GB0307745D0 (en) * 2003-04-03 2003-05-07 Microemissive Displays Ltd Method and apparatus for depositing material on a substrate
CA2486289C (en) * 2003-11-25 2008-01-08 Weyerhaeuser Company Combination end seal and restraint
US7518880B1 (en) 2006-02-08 2009-04-14 Bi-Link Shielding arrangement for electronic device
US7997227B2 (en) * 2007-03-13 2011-08-16 General Electric Company Vacuum coater device and mechanism for supporting and manipulating workpieces in same
EP2113584A1 (en) * 2008-04-28 2009-11-04 LightLab Sweden AB Evaporation system
US20100257732A1 (en) * 2009-04-14 2010-10-14 Ziberna Frank J Shielding Arrangement for Electronic Device
US10056237B2 (en) 2012-09-14 2018-08-21 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
US9793098B2 (en) 2012-09-14 2017-10-17 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
US9412569B2 (en) * 2012-09-14 2016-08-09 Vapor Technologies, Inc. Remote arc discharge plasma assisted processes
JP6054249B2 (ja) * 2013-05-27 2016-12-27 住友重機械工業株式会社 成膜装置
US11898248B2 (en) * 2019-12-18 2024-02-13 Jiangsu Favored Nanotechnology Co., Ltd. Coating apparatus and coating method
US12170189B2 (en) 2019-12-18 2024-12-17 Jiangsu Favored Nanotechnology Co., Ltd. Coating apparatus and coating method
CN111534797B (zh) * 2020-05-25 2023-11-07 中国科学院上海技术物理研究所 一种超高真空束源炉坩埚除气装置
CN113957391B (zh) * 2020-07-21 2023-09-12 宝山钢铁股份有限公司 一种采用芯棒加热结构均匀分配金属蒸汽的真空镀膜装置
CN115110048B (zh) * 2022-06-20 2023-05-02 肇庆市科润真空设备有限公司 基于磁控溅射的pecvd镀膜装置及方法
CN115164587A (zh) * 2022-07-22 2022-10-11 西北工业大学 一种碳刷一体式坩埚旋转装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3984581A (en) * 1973-02-28 1976-10-05 Carl Zeiss-Stiftung Method for the production of anti-reflection coatings on optical elements made of transparent organic polymers
GB1601427A (en) * 1977-06-20 1981-10-28 Siemens Ag Deposition of a layer of electrically-conductive material on a graphite body
DD140057A1 (de) * 1978-11-30 1980-02-06 Adelheid Seifert Verfahren und einrichtung zur reaktiven bedampfung
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
CH645137A5 (de) * 1981-03-13 1984-09-14 Balzers Hochvakuum Verfahren und vorrichtung zum verdampfen von material unter vakuum.
US4526132A (en) * 1982-11-24 1985-07-02 Konishiroku Photo Industry Co., Ltd. Evaporator
JPS60141869A (ja) * 1983-12-29 1985-07-26 Nissin Electric Co Ltd 膜形成方法および膜形成装置
CH664163A5 (de) * 1985-03-01 1988-02-15 Balzers Hochvakuum Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden.

Also Published As

Publication number Publication date
EP0269446A2 (en) 1988-06-01
DE3787705T2 (de) 1994-02-24
US4777908A (en) 1988-10-18
EP0269446A3 (en) 1990-03-07
CA1316865C (en) 1993-04-27
JPS63213662A (ja) 1988-09-06
EP0269446B1 (en) 1993-10-06
DE3787705D1 (de) 1993-11-11
JPH0477072B2 (enExample) 1992-12-07

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