ATE95573T1 - Vorrichtung und verfahren zum auftragen von duennschichtueberzuegen im vacuum. - Google Patents
Vorrichtung und verfahren zum auftragen von duennschichtueberzuegen im vacuum.Info
- Publication number
- ATE95573T1 ATE95573T1 AT87310453T AT87310453T ATE95573T1 AT E95573 T1 ATE95573 T1 AT E95573T1 AT 87310453 T AT87310453 T AT 87310453T AT 87310453 T AT87310453 T AT 87310453T AT E95573 T1 ATE95573 T1 AT E95573T1
- Authority
- AT
- Austria
- Prior art keywords
- crucible
- plasma
- vacuum chamber
- substrate
- thin film
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Inorganic Insulating Materials (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/935,292 US4777908A (en) | 1986-11-26 | 1986-11-26 | System and method for vacuum deposition of thin films |
EP87310453A EP0269446B1 (de) | 1986-11-26 | 1987-11-26 | Vorrichtung und Verfahren zum Auftragen von Dünnschichtüberzügen im Vacuum |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE95573T1 true ATE95573T1 (de) | 1993-10-15 |
Family
ID=25466875
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT87310453T ATE95573T1 (de) | 1986-11-26 | 1987-11-26 | Vorrichtung und verfahren zum auftragen von duennschichtueberzuegen im vacuum. |
Country Status (6)
Country | Link |
---|---|
US (1) | US4777908A (de) |
EP (1) | EP0269446B1 (de) |
JP (1) | JPS63213662A (de) |
AT (1) | ATE95573T1 (de) |
CA (1) | CA1316865C (de) |
DE (1) | DE3787705T2 (de) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63274762A (ja) * | 1987-05-01 | 1988-11-11 | Ulvac Corp | 反応蒸着膜の形成装置 |
JPH0196372A (ja) * | 1987-10-07 | 1989-04-14 | Raimuzu:Kk | イオンプレーティング装置 |
US5618388A (en) * | 1988-02-08 | 1997-04-08 | Optical Coating Laboratory, Inc. | Geometries and configurations for magnetron sputtering apparatus |
US5798027A (en) * | 1988-02-08 | 1998-08-25 | Optical Coating Laboratory, Inc. | Process for depositing optical thin films on both planar and non-planar substrates |
US5225057A (en) * | 1988-02-08 | 1993-07-06 | Optical Coating Laboratory, Inc. | Process for depositing optical films on both planar and non-planar substrates |
EP0362418A1 (de) * | 1988-10-03 | 1990-04-11 | International Business Machines Corporation | Methode und System für die winklige Belichtung eines Oberflächeteils mit einer schrägeinfallenden Strahlung und nach dieser Methode belichtete halbleitende Scheibe |
US4951604A (en) * | 1989-02-17 | 1990-08-28 | Optical Coating Laboratory, Inc. | System and method for vacuum deposition of thin films |
DE69027004T2 (de) * | 1989-11-13 | 1996-11-14 | Optical Coating Laboratory Inc | Geometrie und Gestaltungen eines Geräts zum Magnetronzerstäuben |
DE4005692C2 (de) * | 1990-02-23 | 1995-04-20 | Omt Oberflaechen Materialtech | Verfahren zur Herstellung von physiologisch verträglichen Oxidschichten auf Skelettimplantaten |
US5112644A (en) * | 1990-03-08 | 1992-05-12 | Optical Coating Laboratory, Inc. | Horizontal precession tooling and method for tube rotation |
US5071670A (en) * | 1990-06-11 | 1991-12-10 | Kelly Michael A | Method for chemical vapor deposition under a single reactor vessel divided into separate reaction chambers each with its own depositing and exhausting means |
DE4026367A1 (de) * | 1990-06-25 | 1992-03-12 | Leybold Ag | Vorrichtung zum beschichten von substraten |
JPH0521670A (ja) * | 1991-07-12 | 1993-01-29 | Sumitomo Electric Ind Ltd | ヒートシンク、ヒートシンクの製造方法および製造装置 |
FR2683395A1 (fr) * | 1991-11-06 | 1993-05-07 | Commissariat Energie Atomique | Dispositif d'amende de tension sur une piece conductrice. |
DE4221361C1 (en) * | 1992-06-29 | 1993-07-01 | Vtd-Vakuumtechnik Dresden Gmbh, O-8017 Dresden, De | Plasma-supported deposition of thin insulating layers on substrates - buy vaporising insulating material and ionising in plasma of low energetic arc discharge |
DE4239511A1 (de) * | 1992-11-25 | 1994-05-26 | Leybold Ag | Verfahren und Vorrichtung zum Beschichten von Substraten |
DE4421045C2 (de) * | 1994-06-17 | 1997-01-23 | Dresden Vakuumtech Gmbh | Einrichtung zur plamagestützten Beschichtung von Substraten, insbesondere mit elektrisch isolierendem Material |
US20070137653A1 (en) * | 2000-03-13 | 2007-06-21 | Wood Thomas J | Ventilation interface for sleep apnea therapy |
US6669824B2 (en) | 2000-07-10 | 2003-12-30 | Unaxis Usa, Inc. | Dual-scan thin film processing system |
US6495010B2 (en) | 2000-07-10 | 2002-12-17 | Unaxis Usa, Inc. | Differentially-pumped material processing system |
ATE450631T1 (de) * | 2001-09-10 | 2009-12-15 | Univ Virginia | Verfahren zum aufbringen von metalllegierungsüberzügen und überzogene komponente |
GB0307745D0 (en) * | 2003-04-03 | 2003-05-07 | Microemissive Displays Ltd | Method and apparatus for depositing material on a substrate |
CA2486289C (en) * | 2003-11-25 | 2008-01-08 | Weyerhaeuser Company | Combination end seal and restraint |
US7518880B1 (en) | 2006-02-08 | 2009-04-14 | Bi-Link | Shielding arrangement for electronic device |
US7997227B2 (en) * | 2007-03-13 | 2011-08-16 | General Electric Company | Vacuum coater device and mechanism for supporting and manipulating workpieces in same |
EP2113584A1 (de) * | 2008-04-28 | 2009-11-04 | LightLab Sweden AB | Verdampfungssystem |
US20100257732A1 (en) * | 2009-04-14 | 2010-10-14 | Ziberna Frank J | Shielding Arrangement for Electronic Device |
US9412569B2 (en) * | 2012-09-14 | 2016-08-09 | Vapor Technologies, Inc. | Remote arc discharge plasma assisted processes |
US10056237B2 (en) | 2012-09-14 | 2018-08-21 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
US9793098B2 (en) | 2012-09-14 | 2017-10-17 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
JP6054249B2 (ja) * | 2013-05-27 | 2016-12-27 | 住友重機械工業株式会社 | 成膜装置 |
US11898248B2 (en) | 2019-12-18 | 2024-02-13 | Jiangsu Favored Nanotechnology Co., Ltd. | Coating apparatus and coating method |
CN111534797B (zh) * | 2020-05-25 | 2023-11-07 | 中国科学院上海技术物理研究所 | 一种超高真空束源炉坩埚除气装置 |
CN113957391B (zh) * | 2020-07-21 | 2023-09-12 | 宝山钢铁股份有限公司 | 一种采用芯棒加热结构均匀分配金属蒸汽的真空镀膜装置 |
CN115110048B (zh) * | 2022-06-20 | 2023-05-02 | 肇庆市科润真空设备有限公司 | 基于磁控溅射的pecvd镀膜装置及方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3984581A (en) * | 1973-02-28 | 1976-10-05 | Carl Zeiss-Stiftung | Method for the production of anti-reflection coatings on optical elements made of transparent organic polymers |
GB1601427A (en) * | 1977-06-20 | 1981-10-28 | Siemens Ag | Deposition of a layer of electrically-conductive material on a graphite body |
DD140057A1 (de) * | 1978-11-30 | 1980-02-06 | Adelheid Seifert | Verfahren und einrichtung zur reaktiven bedampfung |
GB2085482B (en) * | 1980-10-06 | 1985-03-06 | Optical Coating Laboratory Inc | Forming thin film oxide layers using reactive evaporation techniques |
CH645137A5 (de) * | 1981-03-13 | 1984-09-14 | Balzers Hochvakuum | Verfahren und vorrichtung zum verdampfen von material unter vakuum. |
US4526132A (en) * | 1982-11-24 | 1985-07-02 | Konishiroku Photo Industry Co., Ltd. | Evaporator |
JPS60141869A (ja) * | 1983-12-29 | 1985-07-26 | Nissin Electric Co Ltd | 膜形成方法および膜形成装置 |
CH664163A5 (de) * | 1985-03-01 | 1988-02-15 | Balzers Hochvakuum | Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden. |
-
1986
- 1986-11-26 US US06/935,292 patent/US4777908A/en not_active Expired - Lifetime
-
1987
- 1987-11-25 CA CA000552700A patent/CA1316865C/en not_active Expired - Fee Related
- 1987-11-26 JP JP62298864A patent/JPS63213662A/ja active Granted
- 1987-11-26 EP EP87310453A patent/EP0269446B1/de not_active Expired - Lifetime
- 1987-11-26 DE DE87310453T patent/DE3787705T2/de not_active Expired - Fee Related
- 1987-11-26 AT AT87310453T patent/ATE95573T1/de active
Also Published As
Publication number | Publication date |
---|---|
DE3787705T2 (de) | 1994-02-24 |
JPS63213662A (ja) | 1988-09-06 |
JPH0477072B2 (de) | 1992-12-07 |
CA1316865C (en) | 1993-04-27 |
US4777908A (en) | 1988-10-18 |
EP0269446A3 (en) | 1990-03-07 |
DE3787705D1 (de) | 1993-11-11 |
EP0269446B1 (de) | 1993-10-06 |
EP0269446A2 (de) | 1988-06-01 |
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