DE69602131D1 - System zur Elektronstrahlabscheidung aus der Gasphase - Google Patents

System zur Elektronstrahlabscheidung aus der Gasphase

Info

Publication number
DE69602131D1
DE69602131D1 DE69602131T DE69602131T DE69602131D1 DE 69602131 D1 DE69602131 D1 DE 69602131D1 DE 69602131 T DE69602131 T DE 69602131T DE 69602131 T DE69602131 T DE 69602131T DE 69602131 D1 DE69602131 D1 DE 69602131D1
Authority
DE
Germany
Prior art keywords
ions
electron
evaporant
electron beam
gas phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69602131T
Other languages
English (en)
Other versions
DE69602131T2 (de
Inventor
Bret Halpern
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jet Process Corp
Original Assignee
Jet Process Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jet Process Corp filed Critical Jet Process Corp
Publication of DE69602131D1 publication Critical patent/DE69602131D1/de
Application granted granted Critical
Publication of DE69602131T2 publication Critical patent/DE69602131T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3132—Evaporating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Lasers (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Jet Pumps And Other Pumps (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DE69602131T 1995-02-10 1996-02-09 System zur Elektronstrahlabscheidung aus der Gasphase Expired - Lifetime DE69602131T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/386,705 US5571332A (en) 1995-02-10 1995-02-10 Electron jet vapor deposition system
PCT/US1996/001820 WO1996024703A1 (en) 1995-02-10 1996-02-09 An electron jet vapor deposition system

Publications (2)

Publication Number Publication Date
DE69602131D1 true DE69602131D1 (de) 1999-05-27
DE69602131T2 DE69602131T2 (de) 1999-12-23

Family

ID=23526702

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69602131T Expired - Lifetime DE69602131T2 (de) 1995-02-10 1996-02-09 System zur Elektronstrahlabscheidung aus der Gasphase

Country Status (7)

Country Link
US (1) US5571332A (de)
EP (1) EP0753081B1 (de)
AT (1) ATE179221T1 (de)
AU (1) AU5022496A (de)
CA (1) CA2190086C (de)
DE (1) DE69602131T2 (de)
WO (1) WO1996024703A1 (de)

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US6426125B1 (en) 1999-03-17 2002-07-30 General Electric Company Multilayer article and method of making by ARC plasma deposition
US6365016B1 (en) 1999-03-17 2002-04-02 General Electric Company Method and apparatus for arc plasma deposition with evaporation of reagents
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UA116262C2 (uk) * 2013-08-01 2018-02-26 Арселорміттал Сталевий лист з цинковим покриттям
US10167556B2 (en) * 2014-03-14 2019-01-01 The Board Of Trustees Of The University Of Illinois Apparatus and method for depositing a coating on a substrate at atmospheric pressure
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Also Published As

Publication number Publication date
EP0753081A1 (de) 1997-01-15
CA2190086A1 (en) 1996-08-15
AU5022496A (en) 1996-08-27
US5571332A (en) 1996-11-05
WO1996024703A1 (en) 1996-08-15
EP0753081B1 (de) 1999-04-21
CA2190086C (en) 2000-09-12
ATE179221T1 (de) 1999-05-15
DE69602131T2 (de) 1999-12-23

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Representative=s name: ACKMANN MENGES PATENT- UND RECHTSANWAELTE, 80469 M