JPS6428367A - Electron beam vapor deposition device - Google Patents

Electron beam vapor deposition device

Info

Publication number
JPS6428367A
JPS6428367A JP18427287A JP18427287A JPS6428367A JP S6428367 A JPS6428367 A JP S6428367A JP 18427287 A JP18427287 A JP 18427287A JP 18427287 A JP18427287 A JP 18427287A JP S6428367 A JPS6428367 A JP S6428367A
Authority
JP
Japan
Prior art keywords
electrons
substrate
electron beam
raw material
clouds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18427287A
Other languages
Japanese (ja)
Other versions
JPH0576540B2 (en
Inventor
Hisashi Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP18427287A priority Critical patent/JPS6428367A/en
Publication of JPS6428367A publication Critical patent/JPS6428367A/en
Publication of JPH0576540B2 publication Critical patent/JPH0576540B2/ja
Granted legal-status Critical Current

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  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To provide an electron beam vapor deposition device which prevents the arrival of harmful stray electrons at a substrate and accelerates the ionization of a material to be evaporated by providing a magnetic field which ionizes the evaporated material of a raw material by the clouds of the electrons formed from the electrons, etc., reflected from the raw material in the space between the raw material and the substrate. CONSTITUTION:An electron beam 2 is deflected by the magnetic field generated by a magnet 6 and is projected to the raw material 5 to evaporate the material 5. The electrons reflected in the electrons 2 projected to the material 5 and the electrons released again from the material 5 as the secondary electrons, i.e., the electrons 3, 4 exist as well at this time. Of these electrons 3, 4, the electrons 4 released in the substrate direction are captured by the magnetic field generated by a pole piece 11 for ionization to generate the clouds of the electrons there. As a result, the stray electrons arriving at the substrate can be drastically decreased as compared to an electron beam deposition device of the conventional type; further, the clouds of said electrons ionize the raw material evaporated and jumped out by the electron beam projection in the course of flying, thereby applying the stronger energy to said material and sending the material to the substrate. The thin film is thus deposited on the substrate.
JP18427287A 1987-07-23 1987-07-23 Electron beam vapor deposition device Granted JPS6428367A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18427287A JPS6428367A (en) 1987-07-23 1987-07-23 Electron beam vapor deposition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18427287A JPS6428367A (en) 1987-07-23 1987-07-23 Electron beam vapor deposition device

Publications (2)

Publication Number Publication Date
JPS6428367A true JPS6428367A (en) 1989-01-30
JPH0576540B2 JPH0576540B2 (en) 1993-10-22

Family

ID=16150417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18427287A Granted JPS6428367A (en) 1987-07-23 1987-07-23 Electron beam vapor deposition device

Country Status (1)

Country Link
JP (1) JPS6428367A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60165374A (en) * 1984-02-09 1985-08-28 Matsushita Electronics Corp Electron beam vapor deposition apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60165374A (en) * 1984-02-09 1985-08-28 Matsushita Electronics Corp Electron beam vapor deposition apparatus

Also Published As

Publication number Publication date
JPH0576540B2 (en) 1993-10-22

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