ATE518122T1 - Systemn zum messen oder analysieren von proben mit vuv-licht - Google Patents

Systemn zum messen oder analysieren von proben mit vuv-licht

Info

Publication number
ATE518122T1
ATE518122T1 AT05751944T AT05751944T ATE518122T1 AT E518122 T1 ATE518122 T1 AT E518122T1 AT 05751944 T AT05751944 T AT 05751944T AT 05751944 T AT05751944 T AT 05751944T AT E518122 T1 ATE518122 T1 AT E518122T1
Authority
AT
Austria
Prior art keywords
subsystem
optical
systems
vacuum ultraviolet
purging
Prior art date
Application number
AT05751944T
Other languages
English (en)
Inventor
John Fielden
Gary Janik
Shing Lee
Qiang Zhao
Torsten Kaack
Sungchul Yoo
Zhengquan Tan
Original Assignee
Kla Tencor Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/845,982 external-priority patent/US7349079B2/en
Priority claimed from US10/845,958 external-priority patent/US7564552B2/en
Priority claimed from US10/846,170 external-priority patent/US7067819B2/en
Priority claimed from US10/846,053 external-priority patent/US7359052B2/en
Application filed by Kla Tencor Tech Corp filed Critical Kla Tencor Tech Corp
Application granted granted Critical
Publication of ATE518122T1 publication Critical patent/ATE518122T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/10—Arrangements of light sources specially adapted for spectrometry or colorimetry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0286—Constructional arrangements for compensating for fluctuations caused by temperature, humidity or pressure, or using cooling or temperature stabilization of parts of the device; Controlling the atmosphere inside a spectrometer, e.g. vacuum
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/30—Measuring the intensity of spectral lines directly on the spectrum itself
    • G01J3/36—Investigating two or more bands of a spectrum by separate detectors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G01N2021/213—Spectrometric ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
    • G01N2021/335—Vacuum UV
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
AT05751944T 2004-05-14 2005-05-13 Systemn zum messen oder analysieren von proben mit vuv-licht ATE518122T1 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10/845,982 US7349079B2 (en) 2004-05-14 2004-05-14 Methods for measurement or analysis of a nitrogen concentration of a specimen
US10/845,958 US7564552B2 (en) 2004-05-14 2004-05-14 Systems and methods for measurement of a specimen with vacuum ultraviolet light
US10/846,170 US7067819B2 (en) 2004-05-14 2004-05-14 Systems and methods for measurement or analysis of a specimen using separated spectral peaks in light
US10/846,053 US7359052B2 (en) 2004-05-14 2004-05-14 Systems and methods for measurement of a specimen with vacuum ultraviolet light
PCT/US2005/016843 WO2005114148A2 (en) 2004-05-14 2005-05-13 Systems and methods for measurement or analysis of a specimen

Publications (1)

Publication Number Publication Date
ATE518122T1 true ATE518122T1 (de) 2011-08-15

Family

ID=35428991

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05751944T ATE518122T1 (de) 2004-05-14 2005-05-13 Systemn zum messen oder analysieren von proben mit vuv-licht

Country Status (4)

Country Link
EP (1) EP1747434B1 (de)
JP (6) JP2007537455A (de)
AT (1) ATE518122T1 (de)
WO (1) WO2005114148A2 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008081374A2 (en) * 2006-12-28 2008-07-10 Koninklijke Philips Electronics N.V. Reflection or single scattering spectroscopy and imaging
FR2948192B1 (fr) * 2009-07-20 2011-07-22 Commissariat Energie Atomique Procede de caracterisation optique
JP2012098272A (ja) * 2010-08-23 2012-05-24 Nsk Ltd 標的物質濃度測定装置および標的物質濃度測定方法
US8830486B2 (en) * 2011-07-04 2014-09-09 Kla-Tencor Corporation Atmospheric molecular contamination control with local purging
JP6066582B2 (ja) * 2012-04-27 2017-01-25 積水化学工業株式会社 検出装置
JP2014163712A (ja) * 2013-02-22 2014-09-08 Hitachi High-Technologies Corp 検査装置
US9558858B2 (en) * 2013-08-14 2017-01-31 Kla-Tencor Corporation System and method for imaging a sample with a laser sustained plasma illumination output
US9658150B2 (en) * 2015-01-12 2017-05-23 Kla-Tencor Corporation System and method for semiconductor wafer inspection and metrology
JP6278917B2 (ja) * 2015-03-10 2018-02-14 日本電信電話株式会社 成分濃度測定装置及び成分濃度測定方法
US10139358B2 (en) 2016-01-11 2018-11-27 International Business Machines Corporation Method for characterization of a layered structure
WO2017191084A1 (en) * 2016-05-04 2017-11-09 Asml Netherlands B.V. Method and apparatus for generating illuminating radiation
US10371626B2 (en) * 2016-08-17 2019-08-06 Kla-Tencor Corporation System and method for generating multi-channel tunable illumination from a broadband source
RU2638092C1 (ru) * 2016-08-23 2017-12-11 Общество с ограниченной ответственностью "Поларлайт" Эллипсометр
WO2018071716A1 (en) * 2016-10-13 2018-04-19 Kla-Tencor Corporation Metrology systems and methods for process control
JP2018065209A (ja) * 2016-10-18 2018-04-26 株式会社荏原製作所 研磨パッドの表面性状測定装置
IL263106B2 (en) * 2018-11-19 2023-02-01 Nova Ltd Integrated measurement system
US10804167B2 (en) * 2019-01-24 2020-10-13 Kla-Tencor Corporation Methods and systems for co-located metrology
US10444140B1 (en) * 2019-03-18 2019-10-15 J.A. Woollam Co., Inc. Theta-theta sample positioning stage with application to sample mapping using reflectometer, spectrophotometer or ellipsometer system
CN112806780B (zh) * 2021-02-04 2022-09-06 陇东学院 一种文物展示保护系统
CN112755535B (zh) * 2021-02-05 2022-07-26 腾讯科技（深圳）有限公司 光照渲染方法、装置、存储介质及计算机设备
DE102021204170B4 (de) * 2021-04-27 2024-09-26 Carl Zeiss Smt Gmbh Messvorrichtung sowie Verfahren zur Messung einer Wirkung einer wellenlängenabhängigen Messlicht-Reflektivität sowie einer Wirkung einer Polarisation von Messlicht auf eine Messlicht-Beaufschlagung einer Lithografiemaske
CN115064437B (zh) * 2022-08-19 2022-11-29 广州粤芯半导体技术有限公司 半导体器件的制造方法及半导体器件
CN116299497B (zh) * 2023-05-12 2023-08-11 深圳深浦电气有限公司 光学检测的方法、装置和计算机可读存储介质
DE102023204665A1 (de) 2023-05-17 2024-08-14 Carl Zeiss Smt Gmbh EUV-Reflektometer und Verfahren zum Ermitteln der Reflexionseigenschaften einer Probenoberfläche

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0677301A (ja) * 1992-08-27 1994-03-18 Kawasaki Steel Corp 表面処理装置
JP3266691B2 (ja) * 1993-03-17 2002-03-18 東ソー・クォーツ株式会社 エキシマレーザー用光学材料の検査方法
JP3471485B2 (ja) * 1994-05-30 2003-12-02 株式会社半導体エネルギー研究所 光処理装置および光処理方法
JP3360097B2 (ja) * 1994-07-06 2002-12-24 株式会社ニコン 真空紫外域の光学装置
US5608526A (en) * 1995-01-19 1997-03-04 Tencor Instruments Focused beam spectroscopic ellipsometry method and system
JPH1038856A (ja) * 1996-07-22 1998-02-13 Nikon Corp 光吸収率測定装置及び測定方法
US5771094A (en) * 1997-01-29 1998-06-23 Kla-Tencor Corporation Film measurement system with improved calibration
JPH10335288A (ja) * 1997-06-05 1998-12-18 Sony Corp 基板研磨装置及び研磨終点検出方法
WO1999002970A1 (en) * 1997-07-11 1999-01-21 Therma-Wave, Inc. An apparatus for analyzing multi-layer thin film stacks on semiconductors
US6483580B1 (en) * 1998-03-06 2002-11-19 Kla-Tencor Technologies Corporation Spectroscopic scatterometer system
US6714300B1 (en) * 1998-09-28 2004-03-30 Therma-Wave, Inc. Optical inspection equipment for semiconductor wafers with precleaning
JP2000205966A (ja) * 1999-01-20 2000-07-28 Komatsu Ltd 真空紫外レ―ザの波長測定装置
US6184984B1 (en) * 1999-02-09 2001-02-06 Kla-Tencor Corporation System for measuring polarimetric spectrum and other properties of a sample
JP2001068400A (ja) * 1999-08-27 2001-03-16 Nikon Corp 吸光物質検出方法、並びに露光方法及び装置
JP2001118783A (ja) * 1999-10-21 2001-04-27 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
KR20020080482A (ko) * 2000-03-31 2002-10-23 가부시키가이샤 니콘 계측방법 및 계측장치, 노광방법 및 노광장치
FR2810108B1 (fr) * 2000-06-09 2004-04-02 France Telecom Ellipsometre spectroscopique a faible bruit
JP2002083766A (ja) * 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
JP2002093871A (ja) * 2000-09-20 2002-03-29 Hitachi Ltd 半導体製造装置および半導体装置の製造方法
US6806951B2 (en) * 2000-09-20 2004-10-19 Kla-Tencor Technologies Corp. Methods and systems for determining at least one characteristic of defects on at least two sides of a specimen
WO2002080185A1 (fr) * 2001-03-28 2002-10-10 Nikon Corporation Dispositif a etages, dispositif d'exposition et procede de fabrication du dispositif
US6813026B2 (en) * 2001-04-11 2004-11-02 Therma-Wave, Inc. Purge system for optical metrology tool
US6583876B2 (en) * 2001-05-24 2003-06-24 Therma-Wave, Inc. Apparatus for optical measurements of nitrogen concentration in thin films
JP3742319B2 (ja) * 2001-07-24 2006-02-01 松下電器産業株式会社 膜厚測定装置および膜厚測定方法
JP3941432B2 (ja) * 2001-08-01 2007-07-04 凸版印刷株式会社 膜厚測定方法
US7061614B2 (en) * 2001-10-16 2006-06-13 Therma-Wave, Inc. Measurement system with separate optimized beam paths
JP2003130808A (ja) * 2001-10-29 2003-05-08 Hitachi Ltd 欠陥検査方法及びその装置
JP3912085B2 (ja) * 2001-11-29 2007-05-09 日本電気株式会社 半導体装置の製造方法
US6710354B1 (en) * 2001-12-11 2004-03-23 Kla-Tencor Corporation Scanning electron microscope architecture and related material handling system
US6986280B2 (en) * 2002-01-22 2006-01-17 Fei Company Integrated measuring instrument
US7253901B2 (en) * 2002-01-23 2007-08-07 Kla-Tencor Technologies Corporation Laser-based cleaning device for film analysis tool
US7369233B2 (en) * 2002-11-26 2008-05-06 Kla-Tencor Technologies Corporation Optical system for measuring samples using short wavelength radiation

Also Published As

Publication number Publication date
JP2018160676A (ja) 2018-10-11
WO2005114148A2 (en) 2005-12-01
JP5785571B2 (ja) 2015-09-30
JP2017175147A (ja) 2017-09-28
JP6717777B2 (ja) 2020-07-08
EP1747434A2 (de) 2007-01-31
JP2015127708A (ja) 2015-07-09
JP2011133492A (ja) 2011-07-07
JP2013102223A (ja) 2013-05-23
EP1747434B1 (de) 2011-07-27
EP1747434A4 (de) 2008-05-14
WO2005114148A3 (en) 2006-03-09
JP2007537455A (ja) 2007-12-20
WO2005114148B1 (en) 2006-06-22
JP5745899B2 (ja) 2015-07-08

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