ATE467149T1 - Alternierende phasenmaske - Google Patents

Alternierende phasenmaske

Info

Publication number
ATE467149T1
ATE467149T1 AT05447222T AT05447222T ATE467149T1 AT E467149 T1 ATE467149 T1 AT E467149T1 AT 05447222 T AT05447222 T AT 05447222T AT 05447222 T AT05447222 T AT 05447222T AT E467149 T1 ATE467149 T1 AT E467149T1
Authority
AT
Austria
Prior art keywords
mask
processing
phase mask
alternate phase
account
Prior art date
Application number
AT05447222T
Other languages
English (en)
Inventor
Look Lieve Van
Staf Verhaegen
Eric Hendrickx
Original Assignee
Imec
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imec filed Critical Imec
Application granted granted Critical
Publication of ATE467149T1 publication Critical patent/ATE467149T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/30—Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Control Of Motors That Do Not Use Commutators (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
AT05447222T 2005-10-03 2005-10-03 Alternierende phasenmaske ATE467149T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05447222A EP1770439B1 (de) 2005-10-03 2005-10-03 Alternierende Phasenmaske

Publications (1)

Publication Number Publication Date
ATE467149T1 true ATE467149T1 (de) 2010-05-15

Family

ID=35482116

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05447222T ATE467149T1 (de) 2005-10-03 2005-10-03 Alternierende phasenmaske

Country Status (5)

Country Link
US (1) US7761837B2 (de)
EP (1) EP1770439B1 (de)
JP (1) JP5084217B2 (de)
AT (1) ATE467149T1 (de)
DE (1) DE602005021106D1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1804119A1 (de) * 2005-12-27 2007-07-04 Interuniversitair Microelektronica Centrum Verfahren zur Herstellung gedämpfter Phasenverschiebungsmasken und daraus erhaltene Vorrichtungen
DE102007031691A1 (de) 2007-07-06 2009-01-08 Carl Zeiss Smt Ag Verfahren zum Betreiben einer Mikrolithographischen Projektionsbelichtunganlagen
US10534257B2 (en) * 2017-05-01 2020-01-14 Lam Research Corporation Layout pattern proximity correction through edge placement error prediction
US10572697B2 (en) 2018-04-06 2020-02-25 Lam Research Corporation Method of etch model calibration using optical scatterometry
KR102812035B1 (ko) 2018-04-10 2025-05-22 램 리써치 코포레이션 레지스트 및 에칭 모델링
WO2019200015A1 (en) 2018-04-10 2019-10-17 Lam Research Corporation Optical metrology in machine learning to characterize features
US10846574B1 (en) * 2019-07-12 2020-11-24 Electronics For Imaging, Inc. Variable smoothing in printing

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3339174B2 (ja) * 1993-11-08 2002-10-28 ソニー株式会社 フォトマスクの製造方法、露光方法及び半導体装置の製造方法
JP3388986B2 (ja) * 1996-03-08 2003-03-24 株式会社東芝 露光用マスク及びその製造方法
JP2002072442A (ja) * 2000-08-30 2002-03-12 Sony Corp 位相シフトマスクの製造方法、レジストパターンの形成方法および半導体装置の製造方法
JP2002118049A (ja) * 2000-10-06 2002-04-19 Hitachi Ltd 半導体集積回路装置の製造方法
TWI252516B (en) * 2002-03-12 2006-04-01 Toshiba Corp Determination method of process parameter and method for determining at least one of process parameter and design rule
JP4204858B2 (ja) * 2002-12-11 2009-01-07 大日本印刷株式会社 位相シフトマスクの設計方法および設計装置
JP2005084170A (ja) * 2003-09-05 2005-03-31 Dainippon Printing Co Ltd 位相シフトマスクの設計方法／製造方法／設計装置
JP4539061B2 (ja) * 2003-09-08 2010-09-08 凸版印刷株式会社 位相シフトマスクの製造方法及び位相シフトマスク並びに半導体素子の製造方法
SG111289A1 (en) * 2003-11-05 2005-05-30 Asml Masktools Bv A method for performing transmission tuning of a mask pattern to improve process latitude
JP4758358B2 (ja) * 2004-01-29 2011-08-24 ケーエルエー−テンカー コーポレイション レチクル設計データにおける欠陥を検出するためのコンピュータに実装される方法
JP4351928B2 (ja) * 2004-02-23 2009-10-28 株式会社東芝 マスクデータの補正方法、フォトマスクの製造方法及びマスクデータの補正プログラム
US7642019B2 (en) * 2005-04-15 2010-01-05 Samsung Electronics Co., Ltd. Methods for monitoring and adjusting focus variation in a photolithographic process using test features printed from photomask test pattern images; and machine readable program storage device having instructions therefore
US7536670B2 (en) * 2005-05-31 2009-05-19 Cadence Design Systems, Inc. Method for verifying and choosing lithography model

Also Published As

Publication number Publication date
DE602005021106D1 (de) 2010-06-17
EP1770439A1 (de) 2007-04-04
JP5084217B2 (ja) 2012-11-28
JP2007102230A (ja) 2007-04-19
US20070087273A1 (en) 2007-04-19
EP1770439B1 (de) 2010-05-05
US7761837B2 (en) 2010-07-20

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Legal Events

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