DE60204389D1 - Vorrichtung zur Entfernung von Debris zur Verwendung in einer Röntgenquelle - Google Patents

Vorrichtung zur Entfernung von Debris zur Verwendung in einer Röntgenquelle

Info

Publication number
DE60204389D1
DE60204389D1 DE60204389T DE60204389T DE60204389D1 DE 60204389 D1 DE60204389 D1 DE 60204389D1 DE 60204389 T DE60204389 T DE 60204389T DE 60204389 T DE60204389 T DE 60204389T DE 60204389 D1 DE60204389 D1 DE 60204389D1
Authority
DE
Germany
Prior art keywords
ray source
removing debris
debris
ray
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60204389T
Other languages
English (en)
Other versions
DE60204389T2 (de
Inventor
Nobuaki Ogushi
Yutaka Watanabe
Akira Miyake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=19041654&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60204389(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE60204389D1 publication Critical patent/DE60204389D1/de
Publication of DE60204389T2 publication Critical patent/DE60204389T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/04—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/04—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers
    • G21K1/043—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers changing time structure of beams by mechanical means, e.g. choppers, spinning filter wheels

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Epidemiology (AREA)
  • Nanotechnology (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE60204389T 2001-07-05 2002-07-03 Vorrichtung zur Entfernung von Debris zur Verwendung in einer Röntgenquelle Expired - Lifetime DE60204389T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001205319A JP2003022950A (ja) 2001-07-05 2001-07-05 Ｘ線光源用デブリ除去装置及び、デブリ除去装置を用いた露光装置
JP2001205319 2001-07-05

Publications (2)

Publication Number Publication Date
DE60204389D1 true DE60204389D1 (de) 2005-07-07
DE60204389T2 DE60204389T2 (de) 2006-03-16

Family

ID=19041654

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60204389T Expired - Lifetime DE60204389T2 (de) 2001-07-05 2002-07-03 Vorrichtung zur Entfernung von Debris zur Verwendung in einer Röntgenquelle

Country Status (4)

Country Link
US (1) US6867843B2 (de)
EP (1) EP1274287B1 (de)
JP (1) JP2003022950A (de)
DE (1) DE60204389T2 (de)

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NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
JP4006251B2 (ja) * 2002-03-20 2007-11-14 キヤノン株式会社 ミラー装置、ミラーの調整方法、露光装置、露光方法及び半導体デバイスの製造方法
JP4111487B2 (ja) * 2002-04-05 2008-07-02 ギガフォトン株式会社 極端紫外光源装置
JP2004061177A (ja) * 2002-07-25 2004-02-26 Canon Inc 光学装置及び測定方法、半導体デバイスの製造方法
KR100748447B1 (ko) 2002-08-23 2007-08-10 에이에스엠엘 네델란즈 비.브이. 리소그래피 투영장치 및 상기 장치에 사용하기 위한파티클 배리어
TWI230847B (en) 2002-12-23 2005-04-11 Asml Netherlands Bv Contamination barrier with expandable lamellas
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DE10308174B4 (de) * 2003-02-24 2010-01-14 Xtreme Technologies Gmbh Anordnung zur Debrisreduktion bei einer Strahlungsquelle auf Basis eines Plasmas
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ATE515720T1 (de) * 2003-08-13 2011-07-15 Koninkl Philips Electronics Nv Verfahren zum zurückhalten einer in einer strahlungsquelle erzeugten substanz mit hilfe eines filters
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US7302043B2 (en) * 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
US7161653B2 (en) 2004-09-20 2007-01-09 Asml Netherlands B.V. Lithographic apparatus having a contaminant trapping system, a contamination trapping system, a device manufacturing method, and a method for improving trapping of contaminants in a lithographic apparatus
US7145132B2 (en) 2004-12-27 2006-12-05 Asml Netherlands B.V. Lithographic apparatus, illumination system and debris trapping system
JP4455491B2 (ja) * 2004-12-28 2010-04-21 エーエスエムエル ネザーランズ ビー．ブイ． 放射ビームから粒子をフィルタ除去するように動作可能なフィルタ・システムを提供する方法、フィルタ・システム、装置、及びフィルタ・システムを含むリソグラフィ装置
SG123767A1 (en) 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, illumination system and filter system
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US7692169B2 (en) * 2004-12-28 2010-04-06 Asml Netherlands B.V. Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus
JP4366358B2 (ja) 2004-12-29 2009-11-18 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、照明システム、フィルタ・システム、およびそのようなフィルタ・システムのサポートを冷却するための方法
US7106832B2 (en) * 2005-01-10 2006-09-12 Asml Netherlands B.V. Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles out of radiation emitting and propagating from a radiation source
DE102005020521B4 (de) * 2005-04-29 2013-05-02 Xtreme Technologies Gmbh Verfahren und Anordnung zur Unterdrückung von Debris bei der Erzeugung kurzwelliger Strahlung auf Basis eines Plasmas
KR101298214B1 (ko) 2005-06-14 2013-08-22 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 향상된 가스 분포를 갖는 잔해 저감 시스템
US8018574B2 (en) 2005-06-30 2011-09-13 Asml Netherlands B.V. Lithographic apparatus, radiation system and device manufacturing method
US7397056B2 (en) 2005-07-06 2008-07-08 Asml Netherlands B.V. Lithographic apparatus, contaminant trap, and device manufacturing method
DE102005044141B4 (de) * 2005-09-15 2008-08-14 Qimonda Ag Belichtungsgerät und Verfahren zum Betrieb eines Belichtungsgeräts
US7262423B2 (en) 2005-12-02 2007-08-28 Asml Netherlands B.V. Radiation system and lithographic apparatus
US7332731B2 (en) * 2005-12-06 2008-02-19 Asml Netherlands, B.V. Radiation system and lithographic apparatus
US7468521B2 (en) 2005-12-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2007234822A (ja) 2006-02-28 2007-09-13 Canon Inc 露光装置及びその制御方法並びにデバイス製造方法
US7453071B2 (en) 2006-03-29 2008-11-18 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US7368733B2 (en) 2006-03-30 2008-05-06 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US7442948B2 (en) * 2006-05-15 2008-10-28 Asml Netherlands B.V. Contamination barrier and lithographic apparatus
US7889312B2 (en) * 2006-09-22 2011-02-15 Asml Netherlands B.V. Apparatus comprising a rotating contaminant trap
US8071963B2 (en) * 2006-12-27 2011-12-06 Asml Netherlands B.V. Debris mitigation system and lithographic apparatus
DE102008014832A1 (de) 2007-04-19 2008-10-23 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie
DE102007023444B4 (de) 2007-05-16 2009-04-09 Xtreme Technologies Gmbh Einrichtung zur Erzeugung eines Gasvorhangs für plasmabasierte EUV-Strahlungsquellen
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US7687788B2 (en) * 2007-07-16 2010-03-30 Asml Netherlands B.V. Debris prevention system, radiation system, and lithographic apparatus
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US20110001952A1 (en) * 2008-09-25 2011-01-06 Eran & Jan, Inc Resist exposure and contamination testing apparatus for EUV lithography
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US8232537B2 (en) * 2008-12-18 2012-07-31 Asml Netherlands, B.V. Radiation source, lithographic apparatus and device manufacturing method
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KR20210127823A (ko) * 2013-11-04 2021-10-22 어플라이드 머티어리얼스, 인코포레이티드 증가된 개수의 측들을 갖는 이송 챔버들, 반도체 디바이스 제조 프로세싱 툴들, 및 프로세싱 방법들
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Also Published As

Publication number Publication date
EP1274287B1 (de) 2005-06-01
DE60204389T2 (de) 2006-03-16
US20030020890A1 (en) 2003-01-30
US6867843B2 (en) 2005-03-15
EP1274287A1 (de) 2003-01-08
JP2003022950A (ja) 2003-01-24

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