ATE423330T1 - Verfahren zum herstellen eines optischen bauteils mit einer wasserabstossenden dünnschicht - Google Patents

Verfahren zum herstellen eines optischen bauteils mit einer wasserabstossenden dünnschicht

Info

Publication number
ATE423330T1
ATE423330T1 AT02009645T AT02009645T ATE423330T1 AT E423330 T1 ATE423330 T1 AT E423330T1 AT 02009645 T AT02009645 T AT 02009645T AT 02009645 T AT02009645 T AT 02009645T AT E423330 T1 ATE423330 T1 AT E423330T1
Authority
AT
Austria
Prior art keywords
temperature
water
thin film
stage
vapor deposition
Prior art date
Application number
AT02009645T
Other languages
English (en)
Inventor
Shigetoshi Kono
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Application granted granted Critical
Publication of ATE423330T1 publication Critical patent/ATE423330T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
AT02009645T 2001-04-27 2002-04-27 Verfahren zum herstellen eines optischen bauteils mit einer wasserabstossenden dünnschicht ATE423330T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001133577 2001-04-27

Publications (1)

Publication Number Publication Date
ATE423330T1 true ATE423330T1 (de) 2009-03-15

Family

ID=18981410

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02009645T ATE423330T1 (de) 2001-04-27 2002-04-27 Verfahren zum herstellen eines optischen bauteils mit einer wasserabstossenden dünnschicht

Country Status (4)

Country Link
US (1) US6929822B2 (de)
EP (1) EP1255129B1 (de)
AT (1) ATE423330T1 (de)
DE (1) DE60231165D1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2005200563B2 (en) * 2002-03-18 2007-07-26 Hoya Corporation Optical member, process of producing optical member, and process of producing thin film
KR100543222B1 (ko) * 2002-08-02 2006-01-20 호야 가부시키가이샤 광학부재 및 그의 제조방법
US6991826B2 (en) * 2004-04-20 2006-01-31 3M Innovative Properties Company Antisoiling coatings for antireflective substrates
DE102004044441B3 (de) * 2004-09-14 2006-06-01 Rodenstock Gmbh Verbesserung des Einschleif- und Anstempelverhaltens von Brillengläsern mit hydrophober Beschichtung
US7178919B2 (en) * 2005-01-18 2007-02-20 Tokai Kogaku Co., Ltd. Plastic lens for spectacles
US20080002146A1 (en) * 2006-06-28 2008-01-03 Stachowski Mark J Biocompatible, surface modified materials
US8919966B2 (en) * 2009-01-29 2014-12-30 Speranza, Inc. Rotatable mounting system for a projection system
US10077207B2 (en) 2011-11-30 2018-09-18 Corning Incorporated Optical coating method, apparatus and product
WO2013082477A2 (en) * 2011-11-30 2013-06-06 Corning Incorporated Process for making of glass articles with optical and easy-to-clean coatings
US9957609B2 (en) 2011-11-30 2018-05-01 Corning Incorporated Process for making of glass articles with optical and easy-to-clean coatings
TWI661065B (zh) * 2011-11-30 2019-06-01 美商康寧公司 磁性基板載體與磁性載體
CN111565977A (zh) * 2018-01-08 2020-08-21 3M创新有限公司 保护膜及其使用方法
US20210003745A1 (en) * 2018-04-20 2021-01-07 Konica Minolta, Inc. Transparent member and transparent-member manufacturing method

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53306B2 (de) * 1973-10-16 1978-01-07
JPS60221470A (ja) 1984-04-17 1985-11-06 Shin Etsu Chem Co Ltd 硬化皮膜形成剤
US4678688A (en) 1983-12-28 1987-07-07 Shin-Etsu Chemical Co., Ltd. Method for forming a surface film of cured organosilicon polymer on a substrate surface
CA1293655C (en) 1985-04-30 1991-12-31 Takashi Taniguchi Anti-reflection optical article and process for preparation thereof
JP2561395B2 (ja) 1991-02-27 1996-12-04 ホーヤ株式会社 撥水性薄膜を有する光学部材及びその製造方法
JPH04355404A (ja) 1991-05-31 1992-12-09 Hoya Corp 撥水性薄膜を有する光学部材及びその製造方法
JP3758247B2 (ja) 1995-08-11 2006-03-22 ダイキン工業株式会社 防汚性基材
JP2860979B2 (ja) 1996-01-24 1999-02-24 ダイキン工業株式会社 表面処理方法
EP0844265B1 (de) * 1995-08-11 2002-11-20 Daikin Industries, Limited Silizium enthaltende organische fluorpolymere und ihre verwendung
DE19539789A1 (de) * 1995-10-26 1997-04-30 Merck Patent Gmbh Mittel und Verfahren zur Herstellung von wasserabweisenden Beschichtungen auf optischen Substraten
JP3449070B2 (ja) 1995-10-19 2003-09-22 住友化学工業株式会社 汚れ防止処理方法
US5709753A (en) * 1995-10-27 1998-01-20 Specialty Coating Sysetms, Inc. Parylene deposition apparatus including a heated and cooled dimer crucible
JP4282099B2 (ja) 1996-01-24 2009-06-17 ダイキン工業株式会社 表面処理組成物
US6119626A (en) 1996-11-14 2000-09-19 Canon Kabushiki Kaisha Vacuum apparatus for forming a thin-film and method for forming thin-film
JP3264444B2 (ja) * 1997-05-16 2002-03-11 ホーヤ株式会社 両面同時撥水処理機構
JPH10319208A (ja) * 1997-05-16 1998-12-04 Hoya Corp 複合式連続薄膜形成装置
US6136725A (en) * 1998-04-14 2000-10-24 Cvd Systems, Inc. Method for chemical vapor deposition of a material on a substrate
US6264751B1 (en) * 1998-05-18 2001-07-24 Hoya Corporation Mechanism for performing water repellency processing on both sides simultaneously
DE19825100A1 (de) * 1998-06-05 1999-12-16 Merck Patent Gmbh Mittel zur Herstellung von wasserabweisenden Beschichtungen auf optischen Substraten
JP2000080465A (ja) 1998-09-03 2000-03-21 Toppan Printing Co Ltd 防汚蒸着材料及びこれを用いた反射防止部材
US6542302B2 (en) * 1999-12-01 2003-04-01 Bushnell Corporation Lens coating to reduce external fogging of scope lenses
US6833159B1 (en) * 2000-05-02 2004-12-21 Vision-Ease Lens, Inc. Method for applying hydrophobic anti-reflection coatings to lenses and lens blanks

Also Published As

Publication number Publication date
DE60231165D1 (de) 2009-04-02
EP1255129A3 (de) 2004-04-14
US6929822B2 (en) 2005-08-16
US20030003227A1 (en) 2003-01-02
EP1255129A2 (de) 2002-11-06
EP1255129B1 (de) 2009-02-18

Similar Documents

Publication Publication Date Title
ATE423330T1 (de) Verfahren zum herstellen eines optischen bauteils mit einer wasserabstossenden dünnschicht
ATE524574T1 (de) Verfahren zur herstellung vom dünnen metalloxidfilm
EP1736477A4 (de) Fluorhaltige verbindung, wasserabstossende zusammensetzung und dünner film
DE60121768D1 (de) Verfahren zur herstellung eines halbleiterbauelements mit nitridzusammensetzung der gruppe iii
WO2004095086A3 (en) Conformal coatings for micro-optical elements
DE69941675D1 (de) Verfahren zur Herstellung einer photovoltaischen Dünnschichtvorrichtung
EP1641028A4 (de) Belichtungsverfahren, substratstufe, belichtungsvorrichtung und verfahren zur bauelementeherstellung
JP2008524374A (ja) シロキサン樹脂コーティング
TW200732383A (en) Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method
MY131900A (en) Method of manufacturing a semiconductor device
US20120164338A1 (en) Isocyanurate compound for forming organic anti-reflective layer and composition including same
ATE386830T1 (de) Niedrigtemperaturverfahren zur herstellung einer antireflexionsbeschichtung
TW373249B (en) Composition for anti-reflection coating
ATE201460T1 (de) Verfahren zur herstellung von aluminiumoxidfilmen unter verwendung von dialkylaluminiumalkoxid
ATE556337T1 (de) Verfahren zur herstellung einer funktionellen vorrichtung mit temperaturbehandelten abgeschiedenen schichten
DE50212709D1 (de) Verfahren und vorrichtung zur herstellung eines optisch wirksamen schichtsystems
ATE438118T1 (de) Photochromische kunststofflinsen für gläser und prozess für ihre herstellung
EP1316849A3 (de) Methode zum Entfernen von Farbzentren aus film-beschichteten optischen Elementen aus Fluorid
GB0027432D0 (en) Treatment of a surface of a polymer
ATE215737T1 (de) Verfahren zur herstellung von photovoltaischen modulen aus kristallinem silizium
US20100264114A1 (en) Microprocessing of synthetic quartz glass substrate
DE50006834D1 (de) Verfahren und mittel zur herstellung hydrophober schichten auf fluoridschichten und optische substrate
DK0492583T3 (da) Fremgangsmåde til overtrækning af overfladen af polymere genstande med uorganiske film
ATE340411T1 (de) Verfahren zur herstellung einer halbleitervorrichtung
SE9900239D0 (sv) Manufactoring method for integrated sensor arrays

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties