ATE386830T1 - Niedrigtemperaturverfahren zur herstellung einer antireflexionsbeschichtung - Google Patents
Niedrigtemperaturverfahren zur herstellung einer antireflexionsbeschichtungInfo
- Publication number
- ATE386830T1 ATE386830T1 AT01998671T AT01998671T ATE386830T1 AT E386830 T1 ATE386830 T1 AT E386830T1 AT 01998671 T AT01998671 T AT 01998671T AT 01998671 T AT01998671 T AT 01998671T AT E386830 T1 ATE386830 T1 AT E386830T1
- Authority
- AT
- Austria
- Prior art keywords
- sub
- producing
- low temperature
- temperature process
- antireflection coating
- Prior art date
Links
- 239000000758 substrate Substances 0.000 abstract 3
- 238000000151 deposition Methods 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000007738 vacuum evaporation Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
- G02B1/116—Multilayers including electrically conducting layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0694—Halides
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Eyeglasses (AREA)
- Paints Or Removers (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0015334A FR2817267B1 (fr) | 2000-11-28 | 2000-11-28 | Procede de depot de couche anti-reflets a froid sur substrat organique |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE386830T1 true ATE386830T1 (de) | 2008-03-15 |
Family
ID=8856948
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT01998671T ATE386830T1 (de) | 2000-11-28 | 2001-11-26 | Niedrigtemperaturverfahren zur herstellung einer antireflexionsbeschichtung |
Country Status (14)
| Country | Link |
|---|---|
| US (1) | US7175878B2 (de) |
| EP (1) | EP1339893B1 (de) |
| JP (1) | JP2004514939A (de) |
| KR (1) | KR100845244B1 (de) |
| CN (1) | CN1239733C (de) |
| AT (1) | ATE386830T1 (de) |
| AU (2) | AU2002222043B2 (de) |
| BR (1) | BR0115898B1 (de) |
| CA (1) | CA2429150C (de) |
| DE (1) | DE60132914T2 (de) |
| ES (1) | ES2301578T3 (de) |
| FR (1) | FR2817267B1 (de) |
| PT (1) | PT1339893E (de) |
| WO (1) | WO2002044440A1 (de) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3555844B2 (ja) | 1999-04-09 | 2004-08-18 | 三宅 正二郎 | 摺動部材およびその製造方法 |
| JP2004138128A (ja) | 2002-10-16 | 2004-05-13 | Nissan Motor Co Ltd | 自動車エンジン用摺動部材 |
| US6969198B2 (en) | 2002-11-06 | 2005-11-29 | Nissan Motor Co., Ltd. | Low-friction sliding mechanism |
| JP3891433B2 (ja) | 2003-04-15 | 2007-03-14 | 日産自動車株式会社 | 燃料噴射弁 |
| EP1479946B1 (de) | 2003-05-23 | 2012-12-19 | Nissan Motor Co., Ltd. | Kolben für eine Brennkraftmaschine |
| JP2004360649A (ja) | 2003-06-06 | 2004-12-24 | Nissan Motor Co Ltd | エンジン用ピストンピン |
| JP4863152B2 (ja) | 2003-07-31 | 2012-01-25 | 日産自動車株式会社 | 歯車 |
| JP4973971B2 (ja) | 2003-08-08 | 2012-07-11 | 日産自動車株式会社 | 摺動部材 |
| JP2005054617A (ja) | 2003-08-08 | 2005-03-03 | Nissan Motor Co Ltd | 動弁機構 |
| DE602004008547T2 (de) | 2003-08-13 | 2008-05-21 | Nissan Motor Co., Ltd., Yokohama | Struktur zur Verbindung von einem Kolben mit einer Kurbelwelle |
| JP4117553B2 (ja) | 2003-08-13 | 2008-07-16 | 日産自動車株式会社 | チェーン駆動装置 |
| JP4539205B2 (ja) | 2003-08-21 | 2010-09-08 | 日産自動車株式会社 | 冷媒圧縮機 |
| US7771821B2 (en) | 2003-08-21 | 2010-08-10 | Nissan Motor Co., Ltd. | Low-friction sliding member and low-friction sliding mechanism using same |
| EP1508611B1 (de) | 2003-08-22 | 2019-04-17 | Nissan Motor Co., Ltd. | Getriebe enthaltend eine getriebeölzusammensetzung |
| FR2861182B1 (fr) * | 2003-10-16 | 2006-02-03 | Essilor Int | Substrat organique transparent comprenant un empilement antireflet multicouches resistant a la temperature |
| JP5135753B2 (ja) * | 2006-02-01 | 2013-02-06 | セイコーエプソン株式会社 | 光学物品 |
| FR2903197B1 (fr) * | 2006-06-28 | 2009-01-16 | Essilor Int | Article d'optique revetu d'une sous-couche et d'un revetement anti-reflets multicouches resistant a la temperature, et procede de fabrication |
| US8318245B2 (en) | 2007-02-23 | 2012-11-27 | Essilor International (Compagnie Generale D'optique) | Method for producing an optical article coated with an antireflection or a reflective coating having improved adhesion and abrasion resistance properties |
| FR2913116B1 (fr) * | 2007-02-23 | 2009-08-28 | Essilor Int | Procede de fabrication d'un article optique revetu d'un revetement anti-reflets ou reflechissant ayant des proprietes d'adhesion et de resistance a l'abrasion ameliorees |
| JP5308640B2 (ja) * | 2007-08-06 | 2013-10-09 | Hoya株式会社 | 反射防止膜及びそれを用いた光学部材 |
| JP4693836B2 (ja) * | 2007-12-17 | 2011-06-01 | 日本電波工業株式会社 | 赤外線カットフィルタ及びその製造方法 |
| US8691331B2 (en) * | 2009-02-09 | 2014-04-08 | Prashant D. Santan | Surface modification of hydrophobic and/or oleophobic coatings |
| CN102782565A (zh) * | 2010-01-22 | 2012-11-14 | 奥克利有限公司 | 用于3d眼镜的镜片 |
| US20110199680A1 (en) * | 2010-01-22 | 2011-08-18 | Oakley, Inc. | Eyewear with three-dimensional viewing capability |
| US8883935B2 (en) | 2010-04-29 | 2014-11-11 | Battelle Memorial Institute | High refractive index composition |
| JP5589581B2 (ja) * | 2010-06-11 | 2014-09-17 | コニカミノルタ株式会社 | 光学素子とその製造方法 |
| FR2975507B1 (fr) * | 2011-05-16 | 2014-01-10 | Essilor Int | Lentille ophtalmique anti-reflets et son procede de fabrication |
| JP5699364B2 (ja) * | 2012-12-21 | 2015-04-08 | 株式会社麗光 | 高硬度ハードコートフイルム |
| CN103059617B (zh) * | 2013-01-05 | 2015-07-22 | 江西安源光伏玻璃有限责任公司 | 一种纳米增透自洁镀膜液的制备方法 |
| EP3346023A1 (de) * | 2017-01-05 | 2018-07-11 | Essilor International | Verfahren zur schichtweisen optimierung einer dünnschicht |
| CN112198565B (zh) * | 2020-11-05 | 2024-12-24 | 中山联合光电研究院有限公司 | 一种超低反射率的光学增透膜 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3330681A (en) * | 1963-07-15 | 1967-07-11 | Eastman Kodak Co | Low reflection coatings for plastics |
| JPS58167124A (ja) * | 1982-03-29 | 1983-10-03 | Nippon Oil & Fats Co Ltd | プラスチツクレンズの製造法 |
| JPS6022101A (ja) * | 1983-07-18 | 1985-02-04 | Matsushita Electric Ind Co Ltd | プラスチツク製光学部品の反射防止膜 |
| JPS60129702A (ja) * | 1983-12-16 | 1985-07-11 | Matsushita Electric Ind Co Ltd | プラスチツクレンズの反射防止膜 |
| JPS61250601A (ja) | 1985-04-30 | 1986-11-07 | Toray Ind Inc | 反射防止性を有する光学材料およびその製造方法 |
| US5783299A (en) * | 1986-01-21 | 1998-07-21 | Seiko Epson Corporation | Polarizer plate with anti-stain layer |
| JPS62186203A (ja) * | 1986-02-12 | 1987-08-14 | Seiko Epson Corp | プラスチツク製光学部品の反射防止膜 |
| JPS63228101A (ja) * | 1987-03-17 | 1988-09-22 | Nippon Sheet Glass Co Ltd | 防汚性を有する帯電防止無反射板 |
| US5764416A (en) * | 1988-04-19 | 1998-06-09 | Litton Systems, Inc. | Fault tolerant antireflective coatings |
| US5316791A (en) * | 1993-01-21 | 1994-05-31 | Sdc Coatings Inc. | Process for improving impact resistance of coated plastic substrates |
| FR2702486B1 (fr) | 1993-03-08 | 1995-04-21 | Essilor Int | Compositions de revêtement antiabrasion à base d'hydrolysats de silanes et de composés de l'aluminium, et articles revêtus correspondants résistants à l'abrasion et aux chocs. |
| EP0619504A1 (de) | 1993-04-08 | 1994-10-12 | Optische Werke G. Rodenstock | Antireflex-Belag |
| JPH0727902A (ja) * | 1993-07-13 | 1995-01-31 | Dainippon Printing Co Ltd | 反射防止フィルム及びその製造方法 |
| JPH0776048A (ja) | 1993-09-08 | 1995-03-20 | Toray Ind Inc | 成形体の製造方法 |
| JP3433845B2 (ja) * | 1994-08-02 | 2003-08-04 | 尾池工業株式会社 | 耐擦傷性と耐久性に優れた反射防止フィルム |
| JP3359178B2 (ja) | 1995-02-22 | 2002-12-24 | 沖電気工業株式会社 | 半導体集積回路の配置配線方式 |
| US5939189A (en) * | 1995-05-09 | 1999-08-17 | Flex Products, Inc. | Flexible plastic substrate with anti-reflection coating having low reflective color and method |
| US5920431A (en) * | 1996-06-27 | 1999-07-06 | Konica Corporation | Optical member having antireflection film thereon |
| JPH10123303A (ja) * | 1996-10-18 | 1998-05-15 | Victor Co Of Japan Ltd | 反射防止光学部品 |
| EP0947601A1 (de) | 1998-03-26 | 1999-10-06 | ESSILOR INTERNATIONAL Compagnie Générale d'Optique | Organisches Substrat mit optischen Schichten hergestellt mittels Magnetron-Zerstäubung und Verfahren |
| JP3601580B2 (ja) * | 1999-05-20 | 2004-12-15 | 信越化学工業株式会社 | パーフルオロポリエーテル変性アミノシラン及び表面処理剤並びに該アミノシランの被膜が形成された物品 |
| US6505935B2 (en) * | 2000-07-21 | 2003-01-14 | Abby Ayoub | Optical lens coating and method |
-
2000
- 2000-11-28 FR FR0015334A patent/FR2817267B1/fr not_active Expired - Fee Related
-
2001
- 2001-11-26 US US10/432,662 patent/US7175878B2/en not_active Expired - Lifetime
- 2001-11-26 PT PT01998671T patent/PT1339893E/pt unknown
- 2001-11-26 AT AT01998671T patent/ATE386830T1/de active
- 2001-11-26 BR BRPI0115898-8A patent/BR0115898B1/pt not_active IP Right Cessation
- 2001-11-26 JP JP2002546785A patent/JP2004514939A/ja active Pending
- 2001-11-26 ES ES01998671T patent/ES2301578T3/es not_active Expired - Lifetime
- 2001-11-26 EP EP01998671A patent/EP1339893B1/de not_active Expired - Lifetime
- 2001-11-26 CN CNB018196101A patent/CN1239733C/zh not_active Expired - Fee Related
- 2001-11-26 DE DE60132914T patent/DE60132914T2/de not_active Expired - Lifetime
- 2001-11-26 WO PCT/FR2001/003723 patent/WO2002044440A1/fr not_active Ceased
- 2001-11-26 AU AU2002222043A patent/AU2002222043B2/en not_active Ceased
- 2001-11-26 CA CA2429150A patent/CA2429150C/en not_active Expired - Fee Related
- 2001-11-26 KR KR1020037007077A patent/KR100845244B1/ko not_active Expired - Fee Related
- 2001-11-26 AU AU2204302A patent/AU2204302A/xx active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2817267A1 (fr) | 2002-05-31 |
| JP2004514939A (ja) | 2004-05-20 |
| DE60132914D1 (de) | 2008-04-03 |
| US20040067351A1 (en) | 2004-04-08 |
| KR20030057558A (ko) | 2003-07-04 |
| EP1339893B1 (de) | 2008-02-20 |
| ES2301578T3 (es) | 2008-07-01 |
| US7175878B2 (en) | 2007-02-13 |
| CN1478154A (zh) | 2004-02-25 |
| FR2817267B1 (fr) | 2003-08-29 |
| WO2002044440A1 (fr) | 2002-06-06 |
| CN1239733C (zh) | 2006-02-01 |
| EP1339893A1 (de) | 2003-09-03 |
| PT1339893E (pt) | 2008-05-13 |
| DE60132914T2 (de) | 2009-03-12 |
| CA2429150C (en) | 2010-03-30 |
| CA2429150A1 (en) | 2002-06-06 |
| BR0115898A (pt) | 2003-11-04 |
| BR0115898B1 (pt) | 2011-09-20 |
| AU2002222043B2 (en) | 2006-10-12 |
| AU2204302A (en) | 2002-06-11 |
| KR100845244B1 (ko) | 2008-07-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| UEP | Publication of translation of european patent specification |
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