SE9900239D0 - Manufactoring method for integrated sensor arrays - Google Patents

Manufactoring method for integrated sensor arrays

Info

Publication number
SE9900239D0
SE9900239D0 SE9900239A SE9900239A SE9900239D0 SE 9900239 D0 SE9900239 D0 SE 9900239D0 SE 9900239 A SE9900239 A SE 9900239A SE 9900239 A SE9900239 A SE 9900239A SE 9900239 D0 SE9900239 D0 SE 9900239D0
Authority
SE
Sweden
Prior art keywords
shadow mask
coatings
openings
technique
resist
Prior art date
Application number
SE9900239A
Other languages
English (en)
Other versions
SE9900239L (sv
SE523918C2 (sv
Inventor
Per-Erik Faegerman
Original Assignee
Nordic Sensor Technologies Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nordic Sensor Technologies Ab filed Critical Nordic Sensor Technologies Ab
Priority to SE9900239A priority Critical patent/SE523918C2/sv
Publication of SE9900239D0 publication Critical patent/SE9900239D0/sv
Priority to EP00850013A priority patent/EP1022561B1/en
Priority to DE60031899T priority patent/DE60031899T2/de
Priority to JP2000014955A priority patent/JP4105355B2/ja
Priority to AT00850013T priority patent/ATE346290T1/de
Priority to US09/491,020 priority patent/US6410445B1/en
Publication of SE9900239L publication Critical patent/SE9900239L/xx
Publication of SE523918C2 publication Critical patent/SE523918C2/sv

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/403—Cells and electrode assemblies
    • G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Measuring Fluid Pressure (AREA)
  • Pressure Sensors (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
SE9900239A 1999-01-25 1999-01-25 Förfarande för framställning av integrerade sensorgrupper på ett gemensamt substrat samt en mask för användning vid förfarandet SE523918C2 (sv)

Priority Applications (6)

Application Number Priority Date Filing Date Title
SE9900239A SE523918C2 (sv) 1999-01-25 1999-01-25 Förfarande för framställning av integrerade sensorgrupper på ett gemensamt substrat samt en mask för användning vid förfarandet
EP00850013A EP1022561B1 (en) 1999-01-25 2000-01-24 Manufacturing method for integrated sensor arrays
DE60031899T DE60031899T2 (de) 1999-01-25 2000-01-24 Verfahren zur Herstellung einer integrierten Sensormatrixanordung
JP2000014955A JP4105355B2 (ja) 1999-01-25 2000-01-24 集積センサアレイの製造方法
AT00850013T ATE346290T1 (de) 1999-01-25 2000-01-24 Verfahren zur herstellung einer integrierten sensormatrixanordung
US09/491,020 US6410445B1 (en) 1999-01-25 2000-01-25 Manufacturing method for integrated sensor arrays

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9900239A SE523918C2 (sv) 1999-01-25 1999-01-25 Förfarande för framställning av integrerade sensorgrupper på ett gemensamt substrat samt en mask för användning vid förfarandet

Publications (3)

Publication Number Publication Date
SE9900239D0 true SE9900239D0 (sv) 1999-01-25
SE9900239L SE9900239L (sv) 2000-07-26
SE523918C2 SE523918C2 (sv) 2004-06-01

Family

ID=20414232

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9900239A SE523918C2 (sv) 1999-01-25 1999-01-25 Förfarande för framställning av integrerade sensorgrupper på ett gemensamt substrat samt en mask för användning vid förfarandet

Country Status (6)

Country Link
US (1) US6410445B1 (sv)
EP (1) EP1022561B1 (sv)
JP (1) JP4105355B2 (sv)
AT (1) ATE346290T1 (sv)
DE (1) DE60031899T2 (sv)
SE (1) SE523918C2 (sv)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7232694B2 (en) * 2004-09-28 2007-06-19 Advantech Global, Ltd. System and method for active array temperature sensing and cooling
WO2012090771A1 (ja) * 2010-12-27 2012-07-05 シャープ株式会社 蒸着膜の形成方法及び表示装置の製造方法
JP5384751B2 (ja) 2010-12-27 2014-01-08 シャープ株式会社 蒸着膜の形成方法及び表示装置の製造方法
US8673791B2 (en) 2012-05-25 2014-03-18 International Business Machines Corporation Method and apparatus for substrate-mask alignment
WO2024025475A1 (en) * 2022-07-29 2024-02-01 Ams-Osram Asia Pacific Pte. Ltd. Method of manufacturing an optical device, and optical device

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2857251A (en) 1953-01-28 1958-10-21 Atlantic Refining Co Process and dual-detector apparatus for analyzing gases
US3595621A (en) 1968-09-30 1971-07-27 Anthony John Andreatch Catalytic analyzer
US4169126A (en) 1976-09-03 1979-09-25 Johnson, Matthey & Co., Limited Temperature-responsive device
US4321322A (en) 1979-06-18 1982-03-23 Ahnell Joseph E Pulsed voltammetric detection of microorganisms
DE3151891A1 (de) 1981-12-30 1983-07-14 Zimmer, Günter, Dr.rer. nat., 4600 Dortmund Halbleiter-sensor fuer die messung der konzentration von teilchen in fluiden
CS231026B1 (en) 1982-09-27 1984-09-17 Lubomir Serak Method of voltmetric determination of oxygen and sensor to perform this method
CH665908A5 (de) 1983-08-30 1988-06-15 Cerberus Ag Vorrichtung zum selektiven detektieren der gasfoermigen bestandteile von gasgemischen in luft mittels eines gassensors.
US4897162A (en) 1986-11-14 1990-01-30 The Cleveland Clinic Foundation Pulse voltammetry
DE3729286A1 (de) 1987-09-02 1989-03-16 Draegerwerk Ag Messgeraet zur analyse eines gasgemisches
JPH0695082B2 (ja) 1987-10-08 1994-11-24 新コスモス電機株式会社 吸引式オゾンガス検知器
US4875083A (en) 1987-10-26 1989-10-17 North Carolina State University Metal-insulator-semiconductor capacitor formed on silicon carbide
US5120421A (en) * 1990-08-31 1992-06-09 The United States Of America As Represented By The United States Department Of Energy Electrochemical sensor/detector system and method
JPH0572163A (ja) 1990-11-30 1993-03-23 Mitsui Mining Co Ltd 半導体式ガスセンサー
NL9002750A (nl) 1990-12-13 1992-07-01 Imec Inter Uni Micro Electr Sensor van het diode type.
GB9114018D0 (en) * 1991-06-28 1991-08-14 Philips Electronic Associated Thin-film transistor manufacture
JPH05240838A (ja) 1992-02-27 1993-09-21 Kagome Co Ltd 加工飲食品に含まれるジアセチルの測定方法
US5332681A (en) 1992-06-12 1994-07-26 The United States Of America As Represented By The Secretary Of The Navy Method of making a semiconductor device by forming a nanochannel mask
US5285084A (en) 1992-09-02 1994-02-08 Kobe Steel Usa Diamond schottky diodes and gas sensors fabricated therefrom
US5323022A (en) 1992-09-10 1994-06-21 North Carolina State University Platinum ohmic contact to p-type silicon carbide
JP3266699B2 (ja) 1993-06-22 2002-03-18 株式会社日立製作所 触媒の評価方法及び触媒効率制御方法ならびにＮＯｘ浄化触媒評価装置
JP3496307B2 (ja) 1994-02-18 2004-02-09 株式会社デンソー 触媒劣化検知法及び空燃比センサ
SE503265C2 (sv) 1994-09-23 1996-04-29 Forskarpatent Ab Förfarande och anordning för gasdetektion
ES2223067T3 (es) * 1995-12-01 2005-02-16 Innogenetics N.V. Sistema de deteccion impedimetrico y metodo de produccion del mismo.
US5691215A (en) 1996-08-26 1997-11-25 Industrial Technology Research Institute Method for fabricating a sub-half micron MOSFET device with insulator filled shallow trenches planarized via use of negative photoresist and de-focus exposure
SE524102C2 (sv) 1999-06-04 2004-06-29 Appliedsensor Sweden Ab Mikro-hotplate-anordning med integrerad gaskänslig fälteffektsensor

Also Published As

Publication number Publication date
DE60031899T2 (de) 2007-06-21
EP1022561B1 (en) 2006-11-22
US6410445B1 (en) 2002-06-25
JP4105355B2 (ja) 2008-06-25
ATE346290T1 (de) 2006-12-15
EP1022561A2 (en) 2000-07-26
SE9900239L (sv) 2000-07-26
EP1022561A3 (en) 2004-10-20
DE60031899D1 (de) 2007-01-04
JP2000221161A (ja) 2000-08-11
SE523918C2 (sv) 2004-06-01

Similar Documents

Publication Publication Date Title
ATE410529T1 (de) Verfahren zum herstellen eines beschichteten substrats
DE69906808D1 (de) Schmutzabweisende beschichtung für glasoberflächen
DE69628704D1 (de) Verfahren zum Herstellen eines Oxidfilms auf der Oberfläche eines Halbleitersubstrats
EP0400621A3 (en) Method for producing liquid transfer articles
DE69426094D1 (de) Herstellungsmethode einer mikroelektronikanordnung unter verwendung eines alternierenden substrates.
DE69518548D1 (de) Verfahren zur Herstellung eines keramischen Substrates
CA2335213A1 (en) Electron-emitting source, electron-emitting module, and method of manufacturing electron-emitting source
ATE223514T1 (de) Organisches substrat mit optischen schichten hergestellt mittels magnetron-zerstäubung und verfahren zu seiner herstellung
ATE171283T1 (de) Verfahren zur herstellung von hochauflösenden silizium-schattenmasken
CA2479702A1 (en) System and method for making thin-film structures using a stepped profile mask
TW200520609A (en) Mask, method for manufacturing thereof, method for manufacturing organic electroluminescent device, and organic electroluminescent device
DE69526286D1 (de) Verfahren zur Herstellung eines keramischen Substrates
SE9900239D0 (sv) Manufactoring method for integrated sensor arrays
DE69817019D1 (de) Verfahren zur herstellung einer metallschicht mittels eines nicht-isothermen plasmas
DE60035648D1 (de) Verfahren zur Säuberung einer Vorrichtung zum Herstellen von Dünnfilm-Silizium
TW328167B (en) Method for manufacturing lead frame
ATE229925T1 (de) Verfahren zur herstellung optischer schichten von gleichmässiger schichtdicke
ATE423330T1 (de) Verfahren zum herstellen eines optischen bauteils mit einer wasserabstossenden dünnschicht
DE69128160D1 (de) Verfahren zur Herstellung eines organischen monomolekularen Überzuges
DE69302444D1 (de) Verfahren zur Herstellung eines keramischen Überzuges mit metallischen Substraten
JPS6456315A (en) Method for improving film quality of silicon-compound coated film
EP2248778A1 (en) Microprocessing of synthetic quartz glass substrate
US6391500B1 (en) Photomask for obtaining a graded pattern profile on a photoresist
DE69505837D1 (de) Beschichtungen mit niedriger oberflächenenergie
JPS56146137A (en) Formation of mask

Legal Events

Date Code Title Description
NUG Patent has lapsed