ATE350679T1 - Verfahren und apparat für die herstellung von dünnen schichten - Google Patents

Verfahren und apparat für die herstellung von dünnen schichten

Info

Publication number
ATE350679T1
ATE350679T1 AT02026463T AT02026463T ATE350679T1 AT E350679 T1 ATE350679 T1 AT E350679T1 AT 02026463 T AT02026463 T AT 02026463T AT 02026463 T AT02026463 T AT 02026463T AT E350679 T1 ATE350679 T1 AT E350679T1
Authority
AT
Austria
Prior art keywords
light
amount
vapor deposition
electron gun
film
Prior art date
Application number
AT02026463T
Other languages
English (en)
Inventor
Yukihiro Takahashi
Takeshi Mitsuishi
Kenichi Shinde
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Application granted granted Critical
Publication of ATE350679T1 publication Critical patent/ATE350679T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Inorganic Insulating Materials (AREA)
  • Optical Filters (AREA)
AT02026463T 2001-12-28 2002-11-27 Verfahren und apparat für die herstellung von dünnen schichten ATE350679T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001401267A JP3848571B2 (ja) 2001-12-28 2001-12-28 薄膜形成方法及び装置

Publications (1)

Publication Number Publication Date
ATE350679T1 true ATE350679T1 (de) 2007-01-15

Family

ID=19189749

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02026463T ATE350679T1 (de) 2001-12-28 2002-11-27 Verfahren und apparat für die herstellung von dünnen schichten

Country Status (7)

Country Link
US (1) US7182976B2 (de)
EP (1) EP1326097B1 (de)
JP (1) JP3848571B2 (de)
KR (1) KR100508007B1 (de)
CN (1) CN1253728C (de)
AT (1) ATE350679T1 (de)
DE (1) DE60217282T2 (de)

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US6972136B2 (en) * 2003-05-23 2005-12-06 Optima, Inc. Ultra low residual reflection, low stress lens coating and vacuum deposition method for making the same
KR100716704B1 (ko) * 2004-03-03 2007-05-14 산요덴키가부시키가이샤 퇴적 두께 측정 방법, 재료층의 형성 방법, 퇴적 두께 측정장치 및 재료층의 형성 장치
JP4704711B2 (ja) * 2004-08-31 2011-06-22 Ｈｏｙａ株式会社 レンズ製造方法及びプログラム
TWI291047B (en) * 2005-08-08 2007-12-11 Ind Tech Res Inst Method and apparatus for inspection flexible display medium layer
CN100350278C (zh) * 2005-11-15 2007-11-21 郑睿敏 数字式光学膜厚控制仪
JP4626888B2 (ja) * 2005-11-18 2011-02-09 富士ゼロックス株式会社 原稿判定装置、原稿読み取り装置、画像形成装置及び原稿判定方法
ES2455998T3 (es) * 2005-12-28 2014-04-21 Tokai Optical Co., Ltd. Lente para gafas y gafas
FR2916860B1 (fr) * 2007-06-04 2010-10-01 Commissariat Energie Atomique Procede de fabrication d'element optique en silice.
JP4669522B2 (ja) * 2008-01-08 2011-04-13 セイコーエプソン株式会社 発色構造体製造装置及び発色構造体の製造方法
JP2009164020A (ja) * 2008-01-09 2009-07-23 Sony Corp 有機ｅｌ素子の製造装置
WO2012078197A1 (en) * 2010-01-22 2012-06-14 Oakley, Inc. Eyewear with three-dimensional viewing capability
EP2526456A4 (de) * 2010-01-22 2014-01-29 Oakley Inc Linsen für 3d-brillen
US8752959B2 (en) * 2010-07-13 2014-06-17 Shamir Optical Industry Ltd. Method and system for designing opthalmic lenses
GB2491151B (en) * 2011-05-24 2017-11-15 Qioptiq Ltd Methods and apparatuses for inferring or predicting the thickness distribution of a layer of coating material deposited or to be deposited on a curved surface
JP5949252B2 (ja) 2011-12-02 2016-07-06 株式会社島津製作所 Ｍａｌｄｉ用試料作成装置および試料作成方法
CN102542107B (zh) * 2011-12-28 2013-09-04 浙江大学 一种用于实现氟掺杂氧化锡镀膜玻璃表面色彩控制的方法
JP6290637B2 (ja) 2014-01-30 2018-03-07 浜松ホトニクス株式会社 膜厚計測方法及び膜厚計測装置
WO2015171149A1 (en) * 2014-05-08 2015-11-12 Halliburton Energy Services, Inc. Optical transmission/reflection mode in-situ deposition rate control for ice fabrication
JP6600519B2 (ja) * 2015-09-28 2019-10-30 株式会社Ｓｃｒｅｅｎホールディングス 成膜装置およびデータ作成方法
EP3346023A1 (de) * 2017-01-05 2018-07-11 Essilor International Verfahren zur schichtweisen optimierung einer dünnschicht
EP3366804B1 (de) * 2017-02-22 2022-05-11 Satisloh AG Vakuumbeschichtungsvorrichtung zur vakuumbeschichtung von substraten, insbesondere von brillenlinsen
DE102017204861A1 (de) 2017-03-23 2018-09-27 Carl Zeiss Smt Gmbh Verfahren zum Bestimmen eines Materialabtrags und Vorrichtung zur Strahlbearbeitung eines Werkstücks
CN107764523A (zh) * 2017-11-30 2018-03-06 盛禛真空技术丹阳有限公司 镜片镀膜视觉监控系统及其使用方法
CN110793937B (zh) * 2018-08-03 2022-08-16 张家港康得新光电材料有限公司 一种膜层类型测定方法
CN117268270B (zh) * 2023-11-23 2024-02-06 中国航发北京航空材料研究院 连续化学气相沉积界面层厚度的实时监控装置及其方法

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US2472605A (en) * 1946-04-15 1949-06-07 Eastman Kodak Co Method of depositing optical interference coatings
US2771055A (en) * 1952-04-25 1956-11-20 Technicolor Corp Apparatus for coating optical interference layers
US3892490A (en) * 1974-03-06 1975-07-01 Minolta Camera Kk Monitoring system for coating a substrate
US4140078A (en) * 1974-03-16 1979-02-20 Leybold Heraeus Gmbh & Co. Kg Method and apparatus for regulating evaporating rate and layer build up in the production of thin layers
US4024291A (en) * 1975-06-17 1977-05-17 Leybold-Heraeus Gmbh & Co. Kg Control of vapor deposition
US4837044A (en) * 1987-01-23 1989-06-06 Itt Research Institute Rugate optical filter systems
JP2637820B2 (ja) * 1989-03-27 1997-08-06 オリンパス光学工業株式会社 光学式膜厚測定装置
US5101111A (en) * 1989-07-13 1992-03-31 Dainippon Screen Mfg. Co., Ltd. Method of measuring thickness of film with a reference sample having a known reflectance
US5009485A (en) * 1989-08-17 1991-04-23 Hughes Aircraft Company Multiple-notch rugate filters and a controlled method of manufacture thereof
US5000575A (en) * 1989-09-06 1991-03-19 Rockwell International Corporation Method of fabricating gradient index optical films
US5354575A (en) * 1993-04-16 1994-10-11 University Of Maryland Ellipsometric approach to anti-reflection coatings of semiconductor laser amplifiers
WO1995033081A1 (fr) * 1994-05-31 1995-12-07 Toray Industries, Inc. Substrat filme et procede et dispositif de production de ce substrat
US5425964A (en) * 1994-07-22 1995-06-20 Rockwell International Corporation Deposition of multiple layer thin films using a broadband spectral monitor
JP2001123269A (ja) 1999-10-21 2001-05-08 Hoya Corp 薄膜形成方法及び装置
ATE291240T1 (de) * 1999-10-14 2005-04-15 Hoya Corp Gerät und verfahren zur bildung dünner schichten
JP3926073B2 (ja) 1999-10-14 2007-06-06 Ｈｏｙａ株式会社 薄膜形成方法及び装置
JP3625736B2 (ja) * 2000-04-27 2005-03-02 古河電気工業株式会社 光学フィルタの製造方法
IL145699A (en) * 2001-09-30 2006-12-10 Nova Measuring Instr Ltd Method of thin film characterization

Also Published As

Publication number Publication date
EP1326097B1 (de) 2007-01-03
JP3848571B2 (ja) 2006-11-22
KR100508007B1 (ko) 2005-08-17
JP2003202404A (ja) 2003-07-18
DE60217282T2 (de) 2007-08-30
KR20030057338A (ko) 2003-07-04
CN1253728C (zh) 2006-04-26
CN1430073A (zh) 2003-07-16
US7182976B2 (en) 2007-02-27
EP1326097A2 (de) 2003-07-09
US20030133124A1 (en) 2003-07-17
EP1326097A3 (de) 2004-06-16
DE60217282D1 (de) 2007-02-15

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