ATE291240T1 - Gerät und verfahren zur bildung dünner schichten - Google Patents

Gerät und verfahren zur bildung dünner schichten

Info

Publication number
ATE291240T1
ATE291240T1 AT00122153T AT00122153T ATE291240T1 AT E291240 T1 ATE291240 T1 AT E291240T1 AT 00122153 T AT00122153 T AT 00122153T AT 00122153 T AT00122153 T AT 00122153T AT E291240 T1 ATE291240 T1 AT E291240T1
Authority
AT
Austria
Prior art keywords
light quantity
quantity value
electron gun
standard light
thin layers
Prior art date
Application number
AT00122153T
Other languages
English (en)
Inventor
Yukihiro Takahashi
Kenichi Shinde
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP29249699A external-priority patent/JP3926073B2/ja
Priority claimed from JP29982999A external-priority patent/JP2001123269A/ja
Application filed by Hoya Corp filed Critical Hoya Corp
Application granted granted Critical
Publication of ATE291240T1 publication Critical patent/ATE291240T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
AT00122153T 1999-10-14 2000-10-12 Gerät und verfahren zur bildung dünner schichten ATE291240T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP29249699A JP3926073B2 (ja) 1999-10-14 1999-10-14 薄膜形成方法及び装置
JP29982999A JP2001123269A (ja) 1999-10-21 1999-10-21 薄膜形成方法及び装置

Publications (1)

Publication Number Publication Date
ATE291240T1 true ATE291240T1 (de) 2005-04-15

Family

ID=26559024

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00122153T ATE291240T1 (de) 1999-10-14 2000-10-12 Gerät und verfahren zur bildung dünner schichten

Country Status (4)

Country Link
US (2) US6481369B1 (de)
EP (1) EP1094344B1 (de)
AT (1) ATE291240T1 (de)
DE (1) DE60018673T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3632757B2 (ja) * 2001-01-31 2005-03-23 古河電気工業株式会社 光学フィルタの製造方法
JP4072889B2 (ja) * 2001-03-19 2008-04-09 新明和工業株式会社 真空成膜装置
US6611378B1 (en) * 2001-12-20 2003-08-26 Semrock, Inc. Thin-film interference filter with quarter-wavelength unit sub-layers arranged in a generalized pattern
JP3848571B2 (ja) 2001-12-28 2006-11-22 Ｈｏｙａ株式会社 薄膜形成方法及び装置
US6825050B2 (en) * 2002-06-07 2004-11-30 Lam Research Corporation Integrated stepwise statistical process control in a plasma processing system
US6972136B2 (en) * 2003-05-23 2005-12-06 Optima, Inc. Ultra low residual reflection, low stress lens coating and vacuum deposition method for making the same
US20070078466A1 (en) * 2005-09-30 2007-04-05 Restoration Robotics, Inc. Methods for harvesting follicular units using an automated system
US7679063B2 (en) * 2005-11-07 2010-03-16 Cardinal Cg Company Method and apparatus for identifying photocatalytic coatings
US20080007275A1 (en) * 2006-05-11 2008-01-10 The Regents Of The University Of California Volumetric induction phase shift detection system for determining tissue water content properties
DE102006056289A1 (de) * 2006-11-29 2008-06-05 Bankmann, Joachim, Dr. Beschichtungsanlage mit einer Funkvorrichtung sowie Verfahren zur Steuerung eines Aktors bzw. einer Heizung
EP3366804B1 (de) * 2017-02-22 2022-05-11 Satisloh AG Vakuumbeschichtungsvorrichtung zur vakuumbeschichtung von substraten, insbesondere von brillenlinsen
WO2021021351A1 (en) * 2019-07-26 2021-02-04 Applied Materials, Inc. Substrate processing monitoring
US20210062324A1 (en) * 2019-08-30 2021-03-04 Applied Materials, Inc. Electron beam pvd endpoint detection and closed-loop process control systems

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4472453A (en) * 1983-07-01 1984-09-18 Rca Corporation Process for radiation free electron beam deposition
JPS61147874A (ja) 1984-12-20 1986-07-05 Fuji Electric Co Ltd 真空蒸着装置
US4915476A (en) * 1988-05-31 1990-04-10 Hughes Aircraft Company Single-notch rugate filters and a controlled method of manufacture thereof
JPH0224502A (ja) * 1988-07-12 1990-01-26 Dainippon Screen Mfg Co Ltd 膜厚測定方法
US5101111A (en) * 1989-07-13 1992-03-31 Dainippon Screen Mfg. Co., Ltd. Method of measuring thickness of film with a reference sample having a known reflectance
JP2928543B2 (ja) 1989-07-19 1999-08-03 株式会社日立製作所 プラスチック部材のハードコート膜形成方法
EP0451329B1 (de) * 1990-04-13 1998-01-28 Hitachi, Ltd. Verfahren zum Kontrollieren der Dicke einer Dünnschicht während ihrer Herstellung
JPH0718055A (ja) 1993-04-08 1995-01-20 Mitsubishi Kasei Dow Kk 軟質ポリウレタンフォーム
US5450205A (en) * 1993-05-28 1995-09-12 Massachusetts Institute Of Technology Apparatus and method for real-time measurement of thin film layer thickness and changes thereof
JPH0790583A (ja) * 1993-09-22 1995-04-04 Shincron:Kk 薄膜形成方法
JPH07180055A (ja) * 1993-12-22 1995-07-18 Toshiba Glass Co Ltd 真空成膜装置
US5425964A (en) * 1994-07-22 1995-06-20 Rockwell International Corporation Deposition of multiple layer thin films using a broadband spectral monitor
KR0165470B1 (ko) * 1995-11-08 1999-02-01 김광호 반도체 소자의 박막형성 프로그램의 자동보정 시스템
US6278809B1 (en) * 1997-05-30 2001-08-21 Ion Optics, Inc. Fiber optic reflectance apparatus for in situ characterization of thin films
US6236459B1 (en) * 1998-11-05 2001-05-22 University Of Miami Thin film measuring device and method

Also Published As

Publication number Publication date
US20030029382A1 (en) 2003-02-13
US6481369B1 (en) 2002-11-19
EP1094344A2 (de) 2001-04-25
US6656518B2 (en) 2003-12-02
DE60018673T2 (de) 2005-08-04
EP1094344B1 (de) 2005-03-16
DE60018673D1 (de) 2005-04-21
EP1094344A3 (de) 2002-04-17

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Legal Events

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