ATE277204T1 - Lichtbogenverdampfer mit kraftvoller magnetführung für targets mit grosser oberfläche - Google Patents

Lichtbogenverdampfer mit kraftvoller magnetführung für targets mit grosser oberfläche

Info

Publication number
ATE277204T1
ATE277204T1 AT01915437T AT01915437T ATE277204T1 AT E277204 T1 ATE277204 T1 AT E277204T1 AT 01915437 T AT01915437 T AT 01915437T AT 01915437 T AT01915437 T AT 01915437T AT E277204 T1 ATE277204 T1 AT E277204T1
Authority
AT
Austria
Prior art keywords
target
magnetic
evaporator
cathode
large surface
Prior art date
Application number
AT01915437T
Other languages
English (en)
Inventor
Larrinaga Josu Goikoetxea
Original Assignee
Fundacion Tekniker
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fundacion Tekniker filed Critical Fundacion Tekniker
Application granted granted Critical
Publication of ATE277204T1 publication Critical patent/ATE277204T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32614—Consumable cathodes for arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
AT01915437T 2001-03-27 2001-03-27 Lichtbogenverdampfer mit kraftvoller magnetführung für targets mit grosser oberfläche ATE277204T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/ES2001/000119 WO2002077318A1 (es) 2001-03-27 2001-03-27 Evaporador de arco con guía magnética intensa para blancos de superficie amplia

Publications (1)

Publication Number Publication Date
ATE277204T1 true ATE277204T1 (de) 2004-10-15

Family

ID=8244313

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01915437T ATE277204T1 (de) 2001-03-27 2001-03-27 Lichtbogenverdampfer mit kraftvoller magnetführung für targets mit grosser oberfläche

Country Status (9)

Country Link
US (2) US20040112736A1 (de)
EP (1) EP1382711B1 (de)
JP (1) JP2004523658A (de)
CN (1) CN100355933C (de)
AT (1) ATE277204T1 (de)
BR (1) BR0116951B1 (de)
DE (1) DE60105856T2 (de)
ES (1) ES2228830T3 (de)
WO (1) WO2002077318A1 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE372586T1 (de) * 2002-12-19 2007-09-15 Oc Oerlikon Balzers Ag Vacuumarcquelle mit magnetfelderzeugungseinrichtung
WO2007017528A1 (es) * 2005-08-02 2007-02-15 Fundacion Tekniker Dispositivo evaporador de arco catodico, y metodo para el encendido del arco
DE602005019800D1 (de) * 2005-12-16 2010-04-15 Fundacion Tekniker Kathodenverdampfungsmaschine
EP2140476B1 (de) * 2007-04-17 2016-05-18 Oerlikon Surface Solutions AG, Pfäffikon Vakuum lichtbogenverdampfungsquelle, sowie eine lichtbogenverdampfungskammer mit einer vakuum lichtbogenverdampfungsquelle
WO2009057715A1 (ja) * 2007-10-31 2009-05-07 Canon Anelva Corporation マグネトロンユニット、マグネトロンスパッタリング装置及び電子デバイスの製造方法
ES2774167T3 (es) * 2008-09-02 2020-07-17 Oerlikon Surface Solutions Ag Pfaeffikon Dispositivo de revestimiento para el revestimiento de un sustrato, así como un procedimiento para el revestimiento de un sustrato
JP5496223B2 (ja) * 2008-12-26 2014-05-21 フンダシオン テクニケル アーク・エバポレーターおよびアーク・エバポレーターの操作方法
JP5839422B2 (ja) * 2009-04-28 2016-01-06 株式会社神戸製鋼所 成膜速度が速いアーク式蒸発源及びこのアーク式蒸発源を用いた皮膜の製造方法
JP5649308B2 (ja) * 2009-04-28 2015-01-07 株式会社神戸製鋼所 成膜速度が速いアーク式蒸発源及びこのアーク式蒸発源を用いた皮膜の製造方法
JP5318052B2 (ja) 2010-06-23 2013-10-16 株式会社神戸製鋼所 成膜速度が速いアーク式蒸発源、このアーク式蒸発源を用いた皮膜の製造方法及び成膜装置
JP5081320B2 (ja) * 2011-02-23 2012-11-28 株式会社神戸製鋼所 アーク式蒸発源
BR112013021546B1 (pt) 2011-02-23 2020-10-27 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) fonte de evaporação do arco
JP5081315B2 (ja) * 2011-02-23 2012-11-28 株式会社神戸製鋼所 アーク式蒸発源
UA101678C2 (uk) * 2011-04-08 2013-04-25 Национальный Научный Центр "Харьковский Физико-Технический Институт" Вакуумно-дуговий випарник для генерування катодної плазми
JP5081327B1 (ja) * 2011-04-25 2012-11-28 株式会社神戸製鋼所 アーク式蒸発源
US9153422B2 (en) 2011-08-02 2015-10-06 Envaerospace, Inc. Arc PVD plasma source and method of deposition of nanoimplanted coatings
CN102534513B (zh) * 2011-12-19 2014-04-16 东莞市汇成真空科技有限公司 一种组合磁场的矩形平面阴极电弧蒸发源
JP5946337B2 (ja) 2012-06-20 2016-07-06 株式会社神戸製鋼所 アーク式蒸発源
CN103526166B (zh) * 2013-10-25 2015-12-02 中国航空工业集团公司北京航空制造工程研究所 矩形平面阴极弧源和阴极靶材烧蚀装置
JP6403269B2 (ja) * 2014-07-30 2018-10-10 株式会社神戸製鋼所 アーク蒸発源
US11342168B2 (en) 2017-02-14 2022-05-24 Oerlikon Surface Solutions Ag, Pfaffikon Cathodic arc evaporation with predetermined cathode material removal
JP7344483B2 (ja) * 2017-10-03 2023-09-14 エリコン サーフェス ソリューションズ アーゲー、 プフェフィコン 高効率低温コーティングを行うコーティング装置
MX2022000138A (es) * 2019-07-03 2022-02-17 Oerlikon Surface Solutions Ag Pfaeffikon Fuente de arco catodico.
CN111139438B (zh) * 2019-12-25 2022-01-21 兰州空间技术物理研究所 一种磁路可控式真空阴极电弧离子源

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Publication number Priority date Publication date Assignee Title
US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
JPS62207863A (ja) * 1986-03-06 1987-09-12 Matsushita Electric Ind Co Ltd 高速スパツタリング装置
AU612319B2 (en) * 1986-04-04 1991-07-11 Regents Of The University Of Minnesota Arc coating of refractory metal compounds
JP2537210B2 (ja) * 1986-09-18 1996-09-25 株式会社東芝 高密度プラズマの発生装置
DE3700633C2 (de) * 1987-01-12 1997-02-20 Reinar Dr Gruen Verfahren und Vorrichtung zum schonenden Beschichten elektrisch leitender Gegenstände mittels Plasma
DE4017111C2 (de) * 1990-05-28 1998-01-29 Hauzer Holding Lichtbogen-Magnetron-Vorrichtung
US5298136A (en) * 1987-08-18 1994-03-29 Regents Of The University Of Minnesota Steered arc coating with thick targets
JPH02166278A (ja) * 1988-12-21 1990-06-26 Amorufuasu Denshi Device Kenkyusho:Kk マグネトロンスパッタ装置
DE4301516C2 (de) * 1993-01-21 2003-02-13 Applied Films Gmbh & Co Kg Targetkühlung mit Wanne
JPH0888176A (ja) * 1994-09-16 1996-04-02 Toshiba Corp スパッタリング装置
GB9722649D0 (en) * 1997-10-24 1997-12-24 Univ Nanyang Cathode ARC source for metallic and dielectric coatings
US6440282B1 (en) * 1999-07-06 2002-08-27 Applied Materials, Inc. Sputtering reactor and method of using an unbalanced magnetron

Also Published As

Publication number Publication date
BR0116951B1 (pt) 2011-06-14
US20040112736A1 (en) 2004-06-17
DE60105856D1 (de) 2004-10-28
US20060237309A1 (en) 2006-10-26
ES2228830T3 (es) 2005-04-16
EP1382711A1 (de) 2004-01-21
US7828946B2 (en) 2010-11-09
CN1494603A (zh) 2004-05-05
JP2004523658A (ja) 2004-08-05
CN100355933C (zh) 2007-12-19
WO2002077318A1 (es) 2002-10-03
EP1382711B1 (de) 2004-09-22
DE60105856T2 (de) 2005-10-20
BR0116951A (pt) 2004-03-09

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