ATE238244T1 - Transparentes substrat mit mindestens einer dünner schicht aus siliciumnitrid oder oxynitrid und verfahren zu dessen herstellung - Google Patents
Transparentes substrat mit mindestens einer dünner schicht aus siliciumnitrid oder oxynitrid und verfahren zu dessen herstellungInfo
- Publication number
- ATE238244T1 ATE238244T1 AT98400180T AT98400180T ATE238244T1 AT E238244 T1 ATE238244 T1 AT E238244T1 AT 98400180 T AT98400180 T AT 98400180T AT 98400180 T AT98400180 T AT 98400180T AT E238244 T1 ATE238244 T1 AT E238244T1
- Authority
- AT
- Austria
- Prior art keywords
- oxynitride
- silicon nitride
- producing
- same
- transparent substrate
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3636—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing silicon, hydrogenated silicon or a silicide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/308—Oxynitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/345—Silicon nitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/281—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9701468A FR2759362B1 (fr) | 1997-02-10 | 1997-02-10 | Substrat transparent muni d'au moins une couche mince a base de nitrure ou d'oxynitrure de silicium et son procede d'obtention |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE238244T1 true ATE238244T1 (de) | 2003-05-15 |
Family
ID=9503493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT98400180T ATE238244T1 (de) | 1997-02-10 | 1998-01-29 | Transparentes substrat mit mindestens einer dünner schicht aus siliciumnitrid oder oxynitrid und verfahren zu dessen herstellung |
Country Status (12)
Country | Link |
---|---|
US (2) | US6114043A (de) |
EP (1) | EP0857700B1 (de) |
JP (1) | JP4777490B2 (de) |
KR (1) | KR100498219B1 (de) |
CN (1) | CN1195694C (de) |
AT (1) | ATE238244T1 (de) |
BR (1) | BR9800576A (de) |
DE (1) | DE69813648T2 (de) |
ES (1) | ES2196507T3 (de) |
FR (1) | FR2759362B1 (de) |
PL (1) | PL191071B1 (de) |
PT (1) | PT857700E (de) |
Families Citing this family (131)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2780054B1 (fr) * | 1998-06-19 | 2000-07-21 | Saint Gobain Vitrage | Procede de depot d'une couche a base d'oxyde metallique sur un substrat verrier, substrat verrier ainsi revetu |
US6251802B1 (en) | 1998-10-19 | 2001-06-26 | Micron Technology, Inc. | Methods of forming carbon-containing layers |
JP3595744B2 (ja) * | 1999-02-26 | 2004-12-02 | キヤノン株式会社 | 電子放出素子、電子源及び画像形成装置 |
JP3657869B2 (ja) * | 1999-10-29 | 2005-06-08 | 株式会社巴川製紙所 | 低反射部材 |
US6784485B1 (en) * | 2000-02-11 | 2004-08-31 | International Business Machines Corporation | Diffusion barrier layer and semiconductor device containing same |
US6623846B2 (en) * | 2000-03-06 | 2003-09-23 | Guardian Industries Corp. | Low-emissivity glass coatings having a layer of nitrided nichrome and methods of making same |
EP1238950B2 (de) * | 2000-07-10 | 2014-08-27 | Guardian Industries Corp. | Wärmebehandelbare beschichtete Gegenstände mit niedriger Emissivität und Verfahren zu deren Herstellung |
US6576349B2 (en) | 2000-07-10 | 2003-06-10 | Guardian Industries Corp. | Heat treatable low-E coated articles and methods of making same |
US7879448B2 (en) * | 2000-07-11 | 2011-02-01 | Guardian Industires Corp. | Coated article with low-E coating including IR reflecting layer(s) and corresponding method |
US6445503B1 (en) | 2000-07-10 | 2002-09-03 | Guardian Industries Corp. | High durable, low-E, heat treatable layer coating system |
CN100431110C (zh) * | 2000-08-18 | 2008-11-05 | 东京毅力科创株式会社 | 低介电氮化硅膜的形成方法和半导体器件及其制造工艺 |
US6410968B1 (en) * | 2000-08-31 | 2002-06-25 | Micron Technology, Inc. | Semiconductor device with barrier layer |
US6627317B2 (en) | 2001-05-17 | 2003-09-30 | Guardian Industries Corp. | Heat treatable coated articles with anti-migration barrier layer between dielectric and solar control layers, and methods of making same |
KR20030000992A (ko) * | 2001-06-28 | 2003-01-06 | 주식회사 엘리아테크 | 애노드/유기 결합층을 가지는 유기 전계발광 표시소자 |
US20030049464A1 (en) | 2001-09-04 | 2003-03-13 | Afg Industries, Inc. | Double silver low-emissivity and solar control coatings |
US6605358B1 (en) | 2001-09-13 | 2003-08-12 | Guardian Industries Corp. | Low-E matchable coated articles, and methods |
US6602608B2 (en) * | 2001-11-09 | 2003-08-05 | Guardian Industries, Corp. | Coated article with improved barrier layer structure and method of making the same |
US6830817B2 (en) * | 2001-12-21 | 2004-12-14 | Guardian Industries Corp. | Low-e coating with high visible transmission |
JP4295624B2 (ja) * | 2001-12-21 | 2009-07-15 | 日本板硝子株式会社 | 光触媒機能を有する部材及びその製造方法 |
US6906305B2 (en) * | 2002-01-08 | 2005-06-14 | Brion Technologies, Inc. | System and method for aerial image sensing |
JP2003221257A (ja) * | 2002-01-31 | 2003-08-05 | Nippon Sheet Glass Co Ltd | 透明薄膜の成形方法およびそれを備える透明基体 |
DE10234588A1 (de) * | 2002-07-30 | 2004-02-19 | Robert Bosch Gmbh | Bauteil eines Verbrennungsmotors mit einem tribologisch beanspruchten Bauelement |
US6707610B1 (en) | 2002-09-20 | 2004-03-16 | Huper Optik International Pte Ltd | Reducing the susceptibility of titanium nitride optical layers to crack |
US6881487B2 (en) | 2002-11-15 | 2005-04-19 | Guardian Industries Corp. | Heat treatable coated articles with zirconium or zirconium nitride layer and methods of making same |
US6689475B1 (en) | 2002-11-20 | 2004-02-10 | Guardian Industries Corp. | Heat treatable coated articles with boride layer of titanium and/or zirconium and methods of making same |
US7005190B2 (en) | 2002-12-20 | 2006-02-28 | Guardian Industries Corp. | Heat treatable coated article with reduced color shift at high viewing angles |
US6994910B2 (en) | 2003-01-09 | 2006-02-07 | Guardian Industries Corp. | Heat treatable coated article with niobium nitride IR reflecting layer |
US7122222B2 (en) * | 2003-01-23 | 2006-10-17 | Air Products And Chemicals, Inc. | Precursors for depositing silicon containing films and processes thereof |
US6759297B1 (en) | 2003-02-28 | 2004-07-06 | Union Semiconductor Technology Corporatin | Low temperature deposition of dielectric materials in magnetoresistive random access memory devices |
US7507442B2 (en) * | 2003-11-04 | 2009-03-24 | Guardian Industries Corp. | Heat treatable coated article with diamond-like carbon (DLC) and/or zirconium in coating |
US7566481B2 (en) * | 2003-12-15 | 2009-07-28 | Guardian Industries Corp. | Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s) |
WO2006017311A1 (en) | 2004-07-12 | 2006-02-16 | Cardinal Cg Company | Low-maintenance coatings |
US7482060B2 (en) * | 2004-07-14 | 2009-01-27 | Agc Flat Glass North America, Inc. | Silicon oxycarbide coatings having durable hydrophilic properties |
JP4470023B2 (ja) * | 2004-08-20 | 2010-06-02 | レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | シリコン窒化物膜の製造方法 |
WO2006033233A1 (ja) | 2004-09-21 | 2006-03-30 | Konica Minolta Holdings, Inc. | 透明ガスバリア性フィルム |
US7923114B2 (en) | 2004-12-03 | 2011-04-12 | Cardinal Cg Company | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
US8092660B2 (en) | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
EP1852402A1 (de) * | 2004-12-06 | 2007-11-07 | Nippon Sheet Glass Company Limited | Glaselement mit photokatalytischer funktion und wärmestrahlenreflektierender funktion und doppelschichtglas damit |
JP5684965B2 (ja) * | 2005-06-20 | 2015-03-18 | 大王製紙株式会社 | 塗工紙の製造方法 |
US7495743B2 (en) * | 2005-09-30 | 2009-02-24 | International Business Machines Corporation | Immersion optical lithography system having protective optical coating |
JP4939176B2 (ja) * | 2005-12-22 | 2012-05-23 | キヤノン株式会社 | 有機el素子 |
JP2009534563A (ja) | 2006-04-19 | 2009-09-24 | 日本板硝子株式会社 | 同等の単独の表面反射率を有する対向機能コーティング |
US7825038B2 (en) * | 2006-05-30 | 2010-11-02 | Applied Materials, Inc. | Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen |
US7902080B2 (en) * | 2006-05-30 | 2011-03-08 | Applied Materials, Inc. | Deposition-plasma cure cycle process to enhance film quality of silicon dioxide |
US8232176B2 (en) * | 2006-06-22 | 2012-07-31 | Applied Materials, Inc. | Dielectric deposition and etch back processes for bottom up gapfill |
US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
WO2009036284A1 (en) | 2007-09-14 | 2009-03-19 | Cardinal Cg Company | Low-maintenance coatings, and methods for producing low-maintenance coatings |
US7943531B2 (en) * | 2007-10-22 | 2011-05-17 | Applied Materials, Inc. | Methods for forming a silicon oxide layer over a substrate |
US7867923B2 (en) * | 2007-10-22 | 2011-01-11 | Applied Materials, Inc. | High quality silicon oxide films by remote plasma CVD from disilane precursors |
US7803722B2 (en) * | 2007-10-22 | 2010-09-28 | Applied Materials, Inc | Methods for forming a dielectric layer within trenches |
AR069169A1 (es) * | 2007-11-02 | 2010-01-06 | Agc Flat Glass Europe Sa | Metodo para fabricar un recubrimiento transparente de un oxido conductor para aplicaciones fotovoltaicas en peliculas finas |
US8357435B2 (en) * | 2008-05-09 | 2013-01-22 | Applied Materials, Inc. | Flowable dielectric equipment and processes |
DE102008030825A1 (de) | 2008-06-30 | 2009-12-31 | Schott Ag | Vorrichtung zur Reflektion von Wärmestrahlung, ein Verfahren zu ihrer Herstellung sowie deren Verwendung |
FR2933394B1 (fr) * | 2008-07-03 | 2011-04-01 | Saint Gobain | Procede de depot de couche mince et produit obtenu |
DE102008033941A1 (de) * | 2008-07-18 | 2010-01-28 | Innovent E.V. | Verfahren zum Beschichten |
US20100081293A1 (en) * | 2008-10-01 | 2010-04-01 | Applied Materials, Inc. | Methods for forming silicon nitride based film or silicon carbon based film |
DE102008060923B4 (de) | 2008-12-06 | 2012-09-27 | Innovent E.V. | Verwendung einer Schicht |
JP5182883B2 (ja) * | 2008-12-17 | 2013-04-17 | 独立行政法人産業技術総合研究所 | 光触媒体およびその製造方法 |
US8980382B2 (en) * | 2009-12-02 | 2015-03-17 | Applied Materials, Inc. | Oxygen-doping for non-carbon radical-component CVD films |
US7935643B2 (en) * | 2009-08-06 | 2011-05-03 | Applied Materials, Inc. | Stress management for tensile films |
US8741788B2 (en) * | 2009-08-06 | 2014-06-03 | Applied Materials, Inc. | Formation of silicon oxide using non-carbon flowable CVD processes |
US7989365B2 (en) * | 2009-08-18 | 2011-08-02 | Applied Materials, Inc. | Remote plasma source seasoning |
US20110086235A1 (en) * | 2009-10-08 | 2011-04-14 | Stewart Engineers, Inc. | Methods of nucleation control in film deposition |
US20110136347A1 (en) * | 2009-10-21 | 2011-06-09 | Applied Materials, Inc. | Point-of-use silylamine generation |
US8449942B2 (en) * | 2009-11-12 | 2013-05-28 | Applied Materials, Inc. | Methods of curing non-carbon flowable CVD films |
CN102687252A (zh) | 2009-12-30 | 2012-09-19 | 应用材料公司 | 以可变的氮/氢比所制造的自由基来生长介电薄膜的方法 |
US8329262B2 (en) * | 2010-01-05 | 2012-12-11 | Applied Materials, Inc. | Dielectric film formation using inert gas excitation |
JP2013517616A (ja) | 2010-01-06 | 2013-05-16 | アプライド マテリアルズ インコーポレイテッド | 酸化物ライナを使用する流動可能な誘電体 |
US8304351B2 (en) | 2010-01-07 | 2012-11-06 | Applied Materials, Inc. | In-situ ozone cure for radical-component CVD |
EP2524099B1 (de) | 2010-01-16 | 2020-09-30 | Cardinal CG Company | Hochwertige emissionskontrollbeschichtungen, emissionskontrollverglasungen |
US10000965B2 (en) | 2010-01-16 | 2018-06-19 | Cardinal Cg Company | Insulating glass unit transparent conductive coating technology |
US10060180B2 (en) | 2010-01-16 | 2018-08-28 | Cardinal Cg Company | Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology |
US9862640B2 (en) | 2010-01-16 | 2018-01-09 | Cardinal Cg Company | Tin oxide overcoat indium tin oxide coatings, coated glazings, and production methods |
US10000411B2 (en) | 2010-01-16 | 2018-06-19 | Cardinal Cg Company | Insulating glass unit transparent conductivity and low emissivity coating technology |
US11155493B2 (en) | 2010-01-16 | 2021-10-26 | Cardinal Cg Company | Alloy oxide overcoat indium tin oxide coatings, coated glazings, and production methods |
FR2956659B1 (fr) * | 2010-02-22 | 2014-10-10 | Saint Gobain | Substrat verrier revetu de couches a tenue mecanique amelioree |
US8524337B2 (en) | 2010-02-26 | 2013-09-03 | Guardian Industries Corp. | Heat treated coated article having glass substrate(s) and indium-tin-oxide (ITO) inclusive coating |
WO2011109148A2 (en) * | 2010-03-05 | 2011-09-09 | Applied Materials, Inc. | Conformal layers by radical-component cvd |
US8236708B2 (en) | 2010-03-09 | 2012-08-07 | Applied Materials, Inc. | Reduced pattern loading using bis(diethylamino)silane (C8H22N2Si) as silicon precursor |
US7994019B1 (en) | 2010-04-01 | 2011-08-09 | Applied Materials, Inc. | Silicon-ozone CVD with reduced pattern loading using incubation period deposition |
US8476142B2 (en) | 2010-04-12 | 2013-07-02 | Applied Materials, Inc. | Preferential dielectric gapfill |
US8524004B2 (en) | 2010-06-16 | 2013-09-03 | Applied Materials, Inc. | Loadlock batch ozone cure |
FR2963343B1 (fr) * | 2010-07-28 | 2012-07-27 | Saint Gobain | Vitrage pourvu d'un revetement contre la condensation |
US8318584B2 (en) | 2010-07-30 | 2012-11-27 | Applied Materials, Inc. | Oxide-rich liner layer for flowable CVD gapfill |
US9285168B2 (en) | 2010-10-05 | 2016-03-15 | Applied Materials, Inc. | Module for ozone cure and post-cure moisture treatment |
US8664127B2 (en) | 2010-10-15 | 2014-03-04 | Applied Materials, Inc. | Two silicon-containing precursors for gapfill enhancing dielectric liner |
JP5224012B2 (ja) * | 2010-12-08 | 2013-07-03 | 日新電機株式会社 | シリコン酸窒化膜の形成方法及び半導体デバイス |
US10283321B2 (en) | 2011-01-18 | 2019-05-07 | Applied Materials, Inc. | Semiconductor processing system and methods using capacitively coupled plasma |
US8450191B2 (en) | 2011-01-24 | 2013-05-28 | Applied Materials, Inc. | Polysilicon films by HDP-CVD |
US8716154B2 (en) | 2011-03-04 | 2014-05-06 | Applied Materials, Inc. | Reduced pattern loading using silicon oxide multi-layers |
US8445078B2 (en) | 2011-04-20 | 2013-05-21 | Applied Materials, Inc. | Low temperature silicon oxide conversion |
FR2975989B1 (fr) * | 2011-05-30 | 2014-04-25 | Saint Gobain | Couche barriere aux alcalins |
US8466073B2 (en) | 2011-06-03 | 2013-06-18 | Applied Materials, Inc. | Capping layer for reduced outgassing |
JP6045043B2 (ja) * | 2011-06-30 | 2016-12-14 | エージーシー グラス ユーロップAgc Glass Europe | 焼入れ可能及び焼入れ不可能な透明ナノコンポジット層 |
US9404178B2 (en) | 2011-07-15 | 2016-08-02 | Applied Materials, Inc. | Surface treatment and deposition for reduced outgassing |
US8617989B2 (en) | 2011-09-26 | 2013-12-31 | Applied Materials, Inc. | Liner property improvement |
US8551891B2 (en) | 2011-10-04 | 2013-10-08 | Applied Materials, Inc. | Remote plasma burn-in |
FR2982608B1 (fr) * | 2011-11-16 | 2013-11-22 | Saint Gobain | Couche barriere aux metaux alcalins a base de sioc |
JP5903848B2 (ja) * | 2011-11-25 | 2016-04-13 | 三菱マテリアル株式会社 | 反射防止膜付きガラス基材 |
CN102527363A (zh) * | 2011-12-27 | 2012-07-04 | 长沙学院 | 一种N-F共掺杂TiO2/竹炭复合光催化材料的生产方法 |
US20130334089A1 (en) * | 2012-06-15 | 2013-12-19 | Michael P. Remington, Jr. | Glass Container Insulative Coating |
US8889566B2 (en) | 2012-09-11 | 2014-11-18 | Applied Materials, Inc. | Low cost flowable dielectric films |
JP2014088287A (ja) * | 2012-10-30 | 2014-05-15 | Mitsubishi Materials Corp | 反射防止膜および拡散抑制膜からなる複合膜、およびこの複合膜を備えるガラス基材の製造方法 |
DE102012223195A1 (de) | 2012-12-14 | 2014-06-18 | Evonik Industries Ag | Hochreine pulverförmige Halbmetallcarbid- und Halbmetallnitridverbindungen, Verfahren zu deren Herstellung und dafür geeigneter Reaktor |
US9018108B2 (en) | 2013-01-25 | 2015-04-28 | Applied Materials, Inc. | Low shrinkage dielectric films |
TWI637926B (zh) | 2013-02-08 | 2018-10-11 | 康寧公司 | 具抗反射與高硬度塗層之物品及其相關方法 |
DE102013109308A1 (de) * | 2013-03-19 | 2014-09-25 | Karlsruher Institut für Technologie | Strukturierte Beschichtung aus Siliciumoxicarbid, Verfahren zu ihrer Herstellung und ihre Verwendung |
US9684097B2 (en) | 2013-05-07 | 2017-06-20 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
US9703011B2 (en) | 2013-05-07 | 2017-07-11 | Corning Incorporated | Scratch-resistant articles with a gradient layer |
US9366784B2 (en) | 2013-05-07 | 2016-06-14 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
US9359261B2 (en) | 2013-05-07 | 2016-06-07 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
US9110230B2 (en) | 2013-05-07 | 2015-08-18 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
US10160688B2 (en) | 2013-09-13 | 2018-12-25 | Corning Incorporated | Fracture-resistant layered-substrates and articles including the same |
US9382269B2 (en) | 2013-09-27 | 2016-07-05 | Voltaix, Llc | Halogen free syntheses of aminosilanes by catalytic dehydrogenative coupling |
US11267973B2 (en) | 2014-05-12 | 2022-03-08 | Corning Incorporated | Durable anti-reflective articles |
US9335444B2 (en) | 2014-05-12 | 2016-05-10 | Corning Incorporated | Durable and scratch-resistant anti-reflective articles |
US9412581B2 (en) | 2014-07-16 | 2016-08-09 | Applied Materials, Inc. | Low-K dielectric gapfill by flowable deposition |
US9790593B2 (en) | 2014-08-01 | 2017-10-17 | Corning Incorporated | Scratch-resistant materials and articles including the same |
EP3194477A4 (de) | 2014-09-15 | 2018-05-30 | Saint-Gobain Performance Plastics Corporation | Optischer film mit einer infrarotabsorptionsschichtstruktur |
KR102079501B1 (ko) * | 2014-10-24 | 2020-02-20 | 버슘머트리얼즈 유에스, 엘엘씨 | 규소-함유 필름의 증착을 위한 조성물 및 이를 사용하는 방법 |
US10571610B2 (en) | 2014-11-21 | 2020-02-25 | Saint-Gobain Performance Plastics Corporation | Infra-red control optical films having metal nitride between encapsulating layers containing oxide |
US9777025B2 (en) | 2015-03-30 | 2017-10-03 | L'Air Liquide, Société pour l'Etude et l'Exploitation des Procédés Georges Claude | Si-containing film forming precursors and methods of using the same |
PL3319915T3 (pl) * | 2015-07-07 | 2020-06-15 | Agc Glass Europe | Szklane podłoże o podwyższonej odporności na warunki atmosferyczne i środki chemiczne |
GB201515985D0 (en) * | 2015-09-09 | 2015-10-21 | Pilkington Group Ltd | Deposition process |
TWI744249B (zh) | 2015-09-14 | 2021-11-01 | 美商康寧公司 | 高光穿透與抗刮抗反射物件 |
US10604442B2 (en) | 2016-11-17 | 2020-03-31 | Cardinal Cg Company | Static-dissipative coating technology |
FR3068031B1 (fr) * | 2017-06-26 | 2019-08-02 | Saint-Gobain Glass France | Vitrage a proprietes antisolaires comprenant une couche d'oxynitrure de titane |
WO2019113539A1 (en) * | 2017-12-08 | 2019-06-13 | Apogee Enterprises, Inc. | Adhesion promoters, glass surfaces including the same, and methods for making the same |
CN114085038A (zh) | 2018-08-17 | 2022-02-25 | 康宁股份有限公司 | 具有薄的耐久性减反射结构的无机氧化物制品 |
US11028012B2 (en) | 2018-10-31 | 2021-06-08 | Cardinal Cg Company | Low solar heat gain coatings, laminated glass assemblies, and methods of producing same |
US11286199B2 (en) * | 2019-07-01 | 2022-03-29 | Agc Automotive Americas Co., A Division Of Agc Flat Glass North America Inc. | Substantially transparent substrates including high and low emissivity coating layers |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1518564A (en) * | 1975-11-25 | 1978-07-19 | Motorola Inc | Method for the low pressure pyrolytic deposition of silicon nitride |
DE2557079C2 (de) | 1975-12-18 | 1984-05-24 | Ibm Deutschland Gmbh, 7000 Stuttgart | Verfahren zum Herstellen einer Maskierungsschicht |
JPH01213600A (ja) * | 1988-02-22 | 1989-08-28 | Konica Corp | 保護層を有する蛍光体パネル |
WO1989010903A1 (en) * | 1988-05-05 | 1989-11-16 | Commonwealth Scientific And Industrial Research Or | Glass article |
FR2631346B1 (fr) * | 1988-05-11 | 1994-05-20 | Air Liquide | Revetement protecteur multicouche pour substrat, procede de protection de substrat par depot par plasma d'un tel revetement, revetements obtenus et leurs applications |
US5639671A (en) * | 1989-09-18 | 1997-06-17 | Biostar, Inc. | Methods for optimizing of an optical assay device |
US5176893A (en) * | 1989-10-02 | 1993-01-05 | Phillips Petroleum Company | Silicon nitride products and method for their production |
EP0423884A1 (de) * | 1989-10-16 | 1991-04-24 | Koninklijke Philips Electronics N.V. | Verfahren zur Abscheidung von Siliziumnitridschichten auf Glassubstraten |
DE69016171T2 (de) * | 1989-10-26 | 1995-05-24 | Shinetsu Chemical Co | Magnetooptisches Aufzeichnungsmedium. |
US4992299A (en) * | 1990-02-01 | 1991-02-12 | Air Products And Chemicals, Inc. | Deposition of silicon nitride films from azidosilane sources |
JP3189277B2 (ja) * | 1990-06-04 | 2001-07-16 | 日本板硝子株式会社 | 熱線遮へいガラス |
JP3028576B2 (ja) * | 1990-09-21 | 2000-04-04 | 日本板硝子株式会社 | 熱線遮蔽ガラス |
JP3139031B2 (ja) * | 1991-02-21 | 2001-02-26 | 日本板硝子株式会社 | 熱線遮蔽ガラス |
FR2677639B1 (fr) * | 1991-06-14 | 1994-02-25 | Saint Gobain Vitrage Internal | Technique de formation par pyrolyse en voie gazeuse d'un revetement essentiellement a base d'oxygene et de silicium. |
JPH0818849B2 (ja) * | 1991-08-29 | 1996-02-28 | 日本板硝子株式会社 | 熱線遮蔽ガラス |
DE4135701C2 (de) * | 1991-10-30 | 1995-09-28 | Leybold Ag | Scheibe mit hohem Transmissionsverhalten im sichtbaren Spektralbereich und mit hohem Reflexionsverhalten für Wärmestrahlung |
DE69220901T3 (de) * | 1991-10-30 | 2005-01-20 | Asahi Glass Co., Ltd. | Verfahren zur Herstellung eines wärmebehandelten beschichteten Glases |
JP3200637B2 (ja) * | 1992-02-05 | 2001-08-20 | 日本板硝子株式会社 | 熱線遮蔽ガラス |
US5234769A (en) * | 1992-04-16 | 1993-08-10 | Deposition Sciences, Inc. | Wear resistant transparent dielectric coatings |
TW250618B (de) * | 1993-01-27 | 1995-07-01 | Mitsui Toatsu Chemicals | |
FR2708924B1 (fr) * | 1993-08-12 | 1995-10-20 | Saint Gobain Vitrage Int | Procédé de dépôt d'une couche de nitrure métallique sur un substrat transparent. |
FR2711983B1 (fr) * | 1993-11-02 | 1996-01-19 | Saint Gobain Vitrage | Substrat transparent muni d'une couche de nitrure métallique. |
US5665424A (en) * | 1994-03-11 | 1997-09-09 | Sherman; Dan | Method for making glass articles having a permanent protective coating |
FR2727107B1 (fr) * | 1994-11-21 | 1996-12-27 | Saint Gobain Vitrage | Vitrage muni d'au moins une couche mince et son procede d'obtention |
FR2728559B1 (fr) * | 1994-12-23 | 1997-01-31 | Saint Gobain Vitrage | Substrats en verre revetus d'un empilement de couches minces a proprietes de reflexion dans l'infrarouge et/ou dans le domaine du rayonnement solaire |
GB9500330D0 (en) * | 1995-01-09 | 1995-03-01 | Pilkington Plc | Coatings on glass |
FR2730990B1 (fr) * | 1995-02-23 | 1997-04-04 | Saint Gobain Vitrage | Substrat transparent a revetement anti-reflets |
FR2736632B1 (fr) * | 1995-07-12 | 1997-10-24 | Saint Gobain Vitrage | Vitrage muni d'une couche conductrice et/ou bas-emissive |
FR2752235B3 (fr) * | 1996-08-07 | 1998-08-28 | Saint Gobain Vitrage | Substrat verrier muni d'une couche reflechissante |
FR2780054B1 (fr) * | 1998-06-19 | 2000-07-21 | Saint Gobain Vitrage | Procede de depot d'une couche a base d'oxyde metallique sur un substrat verrier, substrat verrier ainsi revetu |
-
1997
- 1997-02-10 FR FR9701468A patent/FR2759362B1/fr not_active Expired - Lifetime
-
1998
- 1998-01-29 PT PT98400180T patent/PT857700E/pt unknown
- 1998-01-29 ES ES98400180T patent/ES2196507T3/es not_active Expired - Lifetime
- 1998-01-29 EP EP98400180A patent/EP0857700B1/de not_active Expired - Lifetime
- 1998-01-29 AT AT98400180T patent/ATE238244T1/de active
- 1998-01-29 DE DE69813648T patent/DE69813648T2/de not_active Expired - Lifetime
- 1998-02-03 PL PL324615A patent/PL191071B1/pl unknown
- 1998-02-09 BR BR9800576A patent/BR9800576A/pt not_active IP Right Cessation
- 1998-02-10 JP JP02865298A patent/JP4777490B2/ja not_active Expired - Fee Related
- 1998-02-10 CN CNB981070590A patent/CN1195694C/zh not_active Expired - Fee Related
- 1998-02-10 US US09/021,307 patent/US6114043A/en not_active Expired - Lifetime
- 1998-02-10 KR KR10-1998-0003880A patent/KR100498219B1/ko not_active IP Right Cessation
-
2000
- 2000-05-04 US US09/564,751 patent/US6503557B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6114043A (en) | 2000-09-05 |
DE69813648D1 (de) | 2003-05-28 |
KR100498219B1 (ko) | 2005-09-30 |
FR2759362B1 (fr) | 1999-03-12 |
CN1201023A (zh) | 1998-12-09 |
ES2196507T3 (es) | 2003-12-16 |
PL191071B1 (pl) | 2006-03-31 |
KR19980071238A (ko) | 1998-10-26 |
DE69813648T2 (de) | 2004-02-12 |
JPH10309777A (ja) | 1998-11-24 |
FR2759362A1 (fr) | 1998-08-14 |
CN1195694C (zh) | 2005-04-06 |
PT857700E (pt) | 2003-09-30 |
JP4777490B2 (ja) | 2011-09-21 |
PL324615A1 (en) | 1998-08-17 |
EP0857700A1 (de) | 1998-08-12 |
US6503557B1 (en) | 2003-01-07 |
EP0857700B1 (de) | 2003-04-23 |
BR9800576A (pt) | 1999-05-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE238244T1 (de) | Transparentes substrat mit mindestens einer dünner schicht aus siliciumnitrid oder oxynitrid und verfahren zu dessen herstellung | |
WO2003031679A3 (en) | Method for depositing metal layers employing sequential deposition techniques | |
WO2004017365A3 (en) | Deposition of amorphous silicon-containing films | |
ZA929237B (en) | Method for producing flat CVD diamond film | |
MY149325A (en) | Nitride semiconductor component and method for the production thereof | |
EP0647353A1 (de) | Chemische abscheidung aus der gasphase mittels eines einzigen metallorganischen ausgangstoffs. | |
MY119325A (en) | Method of manufacturing bi-layered ferroelectric thin film | |
ES2192891T3 (es) | Mejoras introducidas en el revestimiento de vidrio. | |
ATE196513T1 (de) | Haftschicht für die abscheidung von wolfram | |
DE69225881D1 (de) | Verfahren zur Herstellung eines Substrates vom SOI-Typ mit einer uniformen dünnen Silizium-Schicht | |
DE69304819D1 (de) | Verfahren zur Herstellung einer Silizium-enthaltenden Schicht auf ein metallisches Substrat sowie Anti-Korrosionsbehandlung | |
FR2733255B1 (fr) | Procede de fabrication d'une piece metallique recouverte de diamant et piece metallique obtenue au moyen d'un tel procede | |
ATE182926T1 (de) | Verfahren zur abscheidung einer siliziumoxidschicht | |
EP0845804A3 (de) | Substratvorbehandlung vor der Abscheidung eines isolierenden Filmes | |
AU4347285A (en) | Steel article having a disordered silicon oxide coating thereon and method of preparing the coating | |
KR970052543A (ko) | 바이어스 전압이 인가된 Cu 박막 형성방법 | |
EP1394287A3 (de) | Reinigungsverfahren vom Reaktor für Glassbeschichtung mit Reaktivem gas | |
KR950012607A (ko) | 반도체 기판상에 규화 텅스텐 피복을 증착시키기 전에 증착챔버의 알루미늄 함유면들을 예비처리하기 위한 방법 | |
CA2096274A1 (en) | Device for holding substrates | |
DE69025252T2 (de) | Verfahren zum Herstellen einer abgeschiedenen Schicht und Verfahren zum Herstellen einer Halbleitervorrichtung | |
ATE156866T1 (de) | Verfahren zur abscheidung einer dünnen schicht auf einem substrat durch zeitverzögertes kaltes stickstoffplasma | |
ATE215133T1 (de) | Verfahren zur herstellung einer farbgebenden beschichtung | |
Iio et al. | Method for Producing Silicon Nitride Based Members Coated With Synthetic Diamond | |
EP0762518A3 (de) | Verbesserungen an Halbleiteranordnungen | |
FR2719037B1 (fr) | Procédé de dépôt d'un revêtement conducteur sur un substrat de verre. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
UEP | Publication of translation of european patent specification |
Ref document number: 0857700 Country of ref document: EP |