ATE195591T1 - Vermeidung der verkürzung eines musters unter verwendung einer schiefen beleuchtung mit rotierenden dipol- und polarisationsblenden - Google Patents

Vermeidung der verkürzung eines musters unter verwendung einer schiefen beleuchtung mit rotierenden dipol- und polarisationsblenden

Info

Publication number
ATE195591T1
ATE195591T1 AT96929479T AT96929479T ATE195591T1 AT E195591 T1 ATE195591 T1 AT E195591T1 AT 96929479 T AT96929479 T AT 96929479T AT 96929479 T AT96929479 T AT 96929479T AT E195591 T1 ATE195591 T1 AT E195591T1
Authority
AT
Austria
Prior art keywords
exposure
pattern
axis illumination
dipol
rotating
Prior art date
Application number
AT96929479T
Other languages
English (en)
Inventor
Bernhard L Poschenrieder
Takashi Sato
Tsukasa Azuma
Original Assignee
Siemens Ag
Toshiba Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag, Toshiba Kk filed Critical Siemens Ag
Application granted granted Critical
Publication of ATE195591T1 publication Critical patent/ATE195591T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701—Off-axis setting using an aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polarising Elements (AREA)
  • Illuminated Signs And Luminous Advertising (AREA)
  • Eye Examination Apparatus (AREA)
AT96929479T 1995-09-21 1996-09-03 Vermeidung der verkürzung eines musters unter verwendung einer schiefen beleuchtung mit rotierenden dipol- und polarisationsblenden ATE195591T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/531,767 US5815247A (en) 1995-09-21 1995-09-21 Avoidance of pattern shortening by using off axis illumination with dipole and polarizing apertures
PCT/IB1996/000971 WO1997011411A1 (en) 1995-09-21 1996-09-03 Avoidance of pattern shortening by using an off axis illumination with twisting dipole and polarizing apertures

Publications (1)

Publication Number Publication Date
ATE195591T1 true ATE195591T1 (de) 2000-09-15

Family

ID=24118965

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96929479T ATE195591T1 (de) 1995-09-21 1996-09-03 Vermeidung der verkürzung eines musters unter verwendung einer schiefen beleuchtung mit rotierenden dipol- und polarisationsblenden

Country Status (8)

Country Link
US (1) US5815247A (de)
EP (1) EP0852029B1 (de)
JP (1) JPH11512569A (de)
KR (1) KR100464843B1 (de)
AT (1) ATE195591T1 (de)
DE (1) DE69609848T2 (de)
TW (1) TW376529B (de)
WO (1) WO1997011411A1 (de)

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Also Published As

Publication number Publication date
DE69609848T2 (de) 2001-03-29
KR19990063613A (ko) 1999-07-26
US5815247A (en) 1998-09-29
DE69609848D1 (de) 2000-09-21
KR100464843B1 (ko) 2005-01-15
JPH11512569A (ja) 1999-10-26
EP0852029B1 (de) 2000-08-16
WO1997011411A1 (en) 1997-03-27
EP0852029A1 (de) 1998-07-08
TW376529B (en) 1999-12-11

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