ZA867185B - Photoinitiator systems for free radical polymerizable compositions - Google Patents

Photoinitiator systems for free radical polymerizable compositions

Info

Publication number
ZA867185B
ZA867185B ZA867185A ZA867185A ZA867185B ZA 867185 B ZA867185 B ZA 867185B ZA 867185 A ZA867185 A ZA 867185A ZA 867185 A ZA867185 A ZA 867185A ZA 867185 B ZA867185 B ZA 867185B
Authority
ZA
South Africa
Prior art keywords
free radical
radical polymerizable
polymerizable compositions
photoinitiator systems
photoinitiator
Prior art date
Application number
ZA867185A
Other languages
English (en)
Inventor
Leslie R Gatechair
Gary M Blumenstein
Peter J Schirmann
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of ZA867185B publication Critical patent/ZA867185B/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/725Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing inorganic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/04Chromates
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/115Cationic or anionic
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/117Free radical
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/124Carbonyl compound containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/126Halogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
ZA867185A 1985-09-23 1986-09-22 Photoinitiator systems for free radical polymerizable compositions ZA867185B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/779,343 US4707432A (en) 1985-09-23 1985-09-23 Ferrocenium/alpha-cleavage photoinitiator systems for free radical polymerizable compositions

Publications (1)

Publication Number Publication Date
ZA867185B true ZA867185B (en) 1987-05-27

Family

ID=25116120

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA867185A ZA867185B (en) 1985-09-23 1986-09-22 Photoinitiator systems for free radical polymerizable compositions

Country Status (12)

Country Link
US (1) US4707432A (pt)
EP (1) EP0221010B1 (pt)
JP (1) JPH0695212B2 (pt)
KR (1) KR900005848B1 (pt)
AT (1) ATE42644T1 (pt)
AU (1) AU588627B2 (pt)
BR (1) BR8604523A (pt)
CA (1) CA1262200A (pt)
DE (1) DE3663093D1 (pt)
ES (1) ES2000400A6 (pt)
SU (1) SU1560070A3 (pt)
ZA (1) ZA867185B (pt)

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US4808638A (en) * 1986-10-14 1989-02-28 Loctite Corporation Thiolene compositions on based bicyclic 'ene compounds
WO1988002879A1 (en) * 1986-10-14 1988-04-21 Loctite Corporation VISIBLE LIGHT CURABLE FREE RADICAL COMPOSITIONS CONTAINING pi-ARENE METAL COMPLEXES
DE3879278D1 (pt) * 1987-06-05 1993-04-22 Ciba-Geigy Ag, Basel, Ch
DE3888400D1 (de) * 1987-06-12 1994-04-21 Ciba Geigy Photoresistzusammensetzungen.
US4801392A (en) * 1987-07-02 1989-01-31 The Mead Corporation Magnetic recording compositions containing ionic dye compounds as initiators
JPS6454440A (en) * 1987-08-24 1989-03-01 Toyo Boseki Photopolymerizable composition
US5147900A (en) * 1987-08-28 1992-09-15 Minnesosta Mining And Manufacturing Company Energy-induced dual curable compositions
US5086086A (en) * 1987-08-28 1992-02-04 Minnesota Mining And Manufacturing Company Energy-induced curable compositions
US4950696A (en) * 1987-08-28 1990-08-21 Minnesota Mining And Manufacturing Company Energy-induced dual curable compositions
US4952612A (en) * 1987-08-28 1990-08-28 Minnesota Mining And Manufacturing Company Energy-induced curable compositions
CA1330464C (en) * 1987-12-08 1994-06-28 Mitsui Petrochemical Industries, Ltd. Active energy ray-curable composition and optical recording medium having cured product of the composition
JP2658123B2 (ja) * 1988-02-08 1997-09-30 東レ株式会社 感光性平版印刷版原版
US4985340A (en) * 1988-06-01 1991-01-15 Minnesota Mining And Manufacturing Company Energy curable compositions: two component curing agents
US4987056A (en) * 1988-06-02 1991-01-22 Toyo Boseki Kabushiki Kaisha Photopolymerizable composition
JP2757375B2 (ja) * 1988-06-02 1998-05-25 東洋紡績株式会社 光重合性組成物
JPH021859A (ja) * 1988-06-13 1990-01-08 Toyobo Co Ltd 感光性樹脂組成物
JPH022562A (ja) * 1988-06-13 1990-01-08 Toyobo Co Ltd 光重合性組成物
JP3035740B2 (ja) * 1988-06-22 2000-04-24 東洋紡績株式会社 感光性樹脂組成物
DE3832032A1 (de) * 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
US5102775A (en) * 1988-09-30 1992-04-07 Kansai Paint Co., Ltd. Visible light sensitive electrodeposition coating composition and image-forming method using the same
JPH02114266A (ja) * 1988-10-24 1990-04-26 Toyobo Co Ltd 光重合性組成物
US4954414A (en) * 1988-11-08 1990-09-04 The Mead Corporation Photosensitive composition containing a transition metal coordination complex cation and a borate anion and photosensitive materials employing the same
EP0413087A1 (en) * 1989-07-20 1991-02-20 International Business Machines Corporation Photosensitive composition and use thereof
JP2775880B2 (ja) * 1989-08-21 1998-07-16 ブラザー工業株式会社 転写記録媒体
CA2082258A1 (en) * 1990-04-23 1991-10-24 Michael C. Palazzotto Energy curable cationically and free-radically polymerizable pressure sensitive compositions
US5238744A (en) * 1990-08-16 1993-08-24 Minnesota Mining And Manufacturing Company Tough polymeric mixtures
US5102924A (en) * 1990-08-16 1992-04-07 Minnesota Mining And Manufacturing Company Polymeric mixtures and process therefor
CA2048232A1 (en) * 1990-09-05 1992-03-06 Jerry W. Williams Energy curable pressure-sensitive compositions
US5667934A (en) * 1990-10-09 1997-09-16 International Business Machines Corporation Thermally stable photoimaging composition
US5652280A (en) * 1991-11-12 1997-07-29 University Of Georgia Research Foundation, Inc. Anionic photoinitiation
WO1993010483A1 (en) * 1991-11-12 1993-05-27 University Of Georgia Research Foundation, Inc. Anionic photoinitiation
US5262232A (en) * 1992-01-22 1993-11-16 Minnesota Mining And Manufacturing Company Vibration damping constructions using acrylate-containing damping materials
US5252694A (en) * 1992-01-22 1993-10-12 Minnesota Mining And Manufacturing Company Energy-polymerization adhesive, coating, film and process for making the same
US5667893A (en) * 1992-10-09 1997-09-16 Minnesota Mining And Manufacturing Company Substrate coated or impregnated with flexible epoxy composition
US5453450A (en) * 1993-06-16 1995-09-26 Minnesota Mining And Manufacturing Company Stabilized curable adhesives
US5494943A (en) * 1993-06-16 1996-02-27 Minnesota Mining And Manufacturing Company Stabilized cationically-curable compositions
US5744557A (en) * 1993-06-16 1998-04-28 Minnesota Mining And Manufacturing Company Energy-curable cyanate/ethylenically unsaturated compositions
DE4324322B4 (de) * 1993-07-20 2005-11-24 Delo Industrieklebstoffe Gmbh & Co. Kg Flexibilisierte, lichtinitiiert härtende Epoxidharzmassen, ihre Herstellung und Verwendung
US5496685A (en) * 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
CA2134156A1 (en) * 1993-11-22 1995-05-23 Thomas P. Klun Coatable compositions, abrasive articles made therefrom, and methods of making and using same
DE4340949A1 (de) * 1993-12-01 1995-06-08 Thera Ges Fuer Patente Lichtinitiiert kationisch härtende Epoxidmasse und ihre Verwendung
US5856022A (en) * 1994-06-15 1999-01-05 Minnesota Mining And Manufacturing Company Energy-curable cyanate/ethylenically unsaturated compositions
US5721289A (en) * 1994-11-04 1998-02-24 Minnesota Mining And Manufacturing Company Stable, low cure-temperature semi-structural pressure sensitive adhesive
US5827602A (en) * 1995-06-30 1998-10-27 Covalent Associates Incorporated Hydrophobic ionic liquids
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Also Published As

Publication number Publication date
KR900005848B1 (ko) 1990-08-13
US4707432A (en) 1987-11-17
JPS6290648A (ja) 1987-04-25
ATE42644T1 (de) 1989-05-15
ES2000400A6 (es) 1988-02-16
CA1262200A (en) 1989-10-03
SU1560070A3 (ru) 1990-04-23
DE3663093D1 (en) 1989-06-01
BR8604523A (pt) 1987-05-19
AU6308386A (en) 1987-03-26
AU588627B2 (en) 1989-09-21
JPH0695212B2 (ja) 1994-11-24
EP0221010B1 (de) 1989-04-26
KR870003402A (ko) 1987-04-17
EP0221010A1 (de) 1987-05-06

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