ATE6550T1 - Polymerisierbare zusammensetzungen, daraus hergestellte beschichtungen und andere polymerisierte produkte. - Google Patents

Polymerisierbare zusammensetzungen, daraus hergestellte beschichtungen und andere polymerisierte produkte.

Info

Publication number
ATE6550T1
ATE6550T1 AT79302226T AT79302226T ATE6550T1 AT E6550 T1 ATE6550 T1 AT E6550T1 AT 79302226 T AT79302226 T AT 79302226T AT 79302226 T AT79302226 T AT 79302226T AT E6550 T1 ATE6550 T1 AT E6550T1
Authority
AT
Austria
Prior art keywords
polymerizable compositions
coatings made
polymerisation
acid
polymerized products
Prior art date
Application number
AT79302226T
Other languages
English (en)
Inventor
Anthony Ledwith
Robert Clayton Mcguiness
Original Assignee
Imperial Chemical Industries Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imperial Chemical Industries Plc filed Critical Imperial Chemical Industries Plc
Application granted granted Critical
Publication of ATE6550T1 publication Critical patent/ATE6550T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C08G75/06—Polythioethers from cyclic thioethers
    • C08G75/08—Polythioethers from cyclic thioethers from thiiranes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Polyethers (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
AT79302226T 1978-10-27 1979-10-16 Polymerisierbare zusammensetzungen, daraus hergestellte beschichtungen und andere polymerisierte produkte. ATE6550T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB7842234 1978-10-27
EP79302226A EP0011918B1 (de) 1978-10-27 1979-10-16 Polymerisierbare Zusammensetzungen, daraus hergestellte Beschichtungen und andere polymerisierte Produkte

Publications (1)

Publication Number Publication Date
ATE6550T1 true ATE6550T1 (de) 1984-03-15

Family

ID=10500641

Family Applications (1)

Application Number Title Priority Date Filing Date
AT79302226T ATE6550T1 (de) 1978-10-27 1979-10-16 Polymerisierbare zusammensetzungen, daraus hergestellte beschichtungen und andere polymerisierte produkte.

Country Status (13)

Country Link
EP (1) EP0011918B1 (de)
JP (1) JPS5565219A (de)
AT (1) ATE6550T1 (de)
AU (1) AU5188179A (de)
CA (1) CA1126435A (de)
DE (1) DE2966764D1 (de)
DK (1) DK453679A (de)
ES (1) ES485416A1 (de)
IE (1) IE49093B1 (de)
MX (1) MX150944A (de)
NZ (1) NZ191926A (de)
ZA (1) ZA795795B (de)
ZW (1) ZW21379A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4442197A (en) * 1982-01-11 1984-04-10 General Electric Company Photocurable compositions
US4564578A (en) * 1982-11-25 1986-01-14 Ciba-Geigy Corporation Novel thioxanthones substituted by alpha-aminoalkyl groups
DE3468112D1 (en) * 1983-09-30 1988-01-28 Toshiba Kk Photopolymerizable epoxy resin composition
JPS6072918A (ja) * 1983-09-30 1985-04-25 Toshiba Corp 光重合性エポキシ樹脂組成物
US4707432A (en) * 1985-09-23 1987-11-17 Ciba-Geigy Corporation Ferrocenium/alpha-cleavage photoinitiator systems for free radical polymerizable compositions
DE3641053A1 (de) * 1986-12-19 1988-06-16 Wolfen Filmfab Veb Fotopolymerisierbares material
US5434196A (en) * 1988-02-19 1995-07-18 Asahi Denka Kogyo K.K. Resin composition for optical molding
WO1989007620A1 (en) * 1988-02-19 1989-08-24 Asahi Denka Kogyo K.K. Resin composition for optical modeling
US4954416A (en) * 1988-12-21 1990-09-04 Minnesota Mining And Manufacturing Company Tethered sulfonium salt photoinitiators for free radical polymerization
JPH06107913A (ja) * 1992-08-10 1994-04-19 Siemens Ag 反応樹脂混合物
DE19500968A1 (de) * 1995-01-14 1996-07-18 Schmidt Gebr Druckfarben Druckverfahren, Druckfarbe und Verfahren zu deren Herstellung sowie deren Verwendung
US6635195B1 (en) * 2000-02-04 2003-10-21 Essilor International Compagnie Generale D'optique Cationic photopolymerization of diepisulfides and application to the manufacture of optical lenses

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3926639A (en) * 1971-11-18 1975-12-16 Sun Chemical Corp Photopolymerizable compositions comprising polycarboxysubstituted benzophenone reaction products
IE42085B1 (en) * 1974-09-18 1980-06-04 Ici Ltd Photopolymerisable compositions
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials

Also Published As

Publication number Publication date
DE2966764D1 (en) 1984-04-12
DK453679A (da) 1980-04-28
IE49093B1 (en) 1985-07-24
EP0011918A3 (en) 1981-01-21
ES485416A1 (es) 1980-09-01
CA1126435A (en) 1982-06-22
IE792032L (en) 1980-04-27
ZA795795B (en) 1980-10-29
EP0011918B1 (de) 1984-03-07
ZW21379A1 (en) 1981-05-27
EP0011918A2 (de) 1980-06-11
JPS5565219A (en) 1980-05-16
MX150944A (es) 1984-08-23
NZ191926A (en) 1981-12-15
AU5188179A (en) 1980-05-01

Similar Documents

Publication Publication Date Title
ATE6550T1 (de) Polymerisierbare zusammensetzungen, daraus hergestellte beschichtungen und andere polymerisierte produkte.
EP0090493A3 (en) Photopolymerisable compositions
ATE6002T1 (de) Polymerisierbare zusammensetzungen, daraus hergestellte beschichtungen und andere polymerisierte produkte.
TW262537B (de)
JPS55118030A (en) Photopolymerizable composition
AU600746B2 (en) Two-layer system
ES2119851T3 (es) Ligantes a base de polisiloxano, su fabricacion, composiciones de revestimiento que contienen estos y su aplicacion.
DE3473357D1 (de) Photopolymerizable laminate
ES2170410T3 (es) Procedimiento para la fabricacion de un cuerpo moldeado adecuado para fines opticos.
FI841969A0 (fi) Genom straolning haerdbara bindemedelssystem, foerfaranden foer anvaendning av dem och pao sao saett fram staellda belaeggningar.
TW343939B (en) Photosensitive resin composition for photo-cast-molding
MX9100114A (es) Compuestos antioxidantes polimerizables,proceso para su preparacion y polimeros olefinicos que los contienen
KR890017674A (ko) 레이저 사진 정보기록에 적당한 광중합가능한 조성물
EP0403100A3 (de) Photopolymerisierbare Zusammensetzungen mit hoher Empfindlichkeit, die wasserstoffabgebende Merkaptane enthalten
ES474174A1 (es) Un procedimiento para la preparacion de polimeros reticula- bles por accion de la luz, con grupos de azidoftalimidilo enposicion lateral
JPS5566931A (en) Flame-retarding of diene polymer film
ES2068470T3 (es) Granulados de aglutinante para barnices.
JPS53112932A (en) Coating of electron radiation curing thick coating paint
JPS5284269A (en) Preparation of super-high-molecular-weight polymers
GB1507666A (en) Photopolymerisable compositions containing polyester photoinitiators
JPS538687A (en) Resin compositions

Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee