JPS5565219A - Photopolymerizing composition - Google Patents

Photopolymerizing composition

Info

Publication number
JPS5565219A
JPS5565219A JP13828779A JP13828779A JPS5565219A JP S5565219 A JPS5565219 A JP S5565219A JP 13828779 A JP13828779 A JP 13828779A JP 13828779 A JP13828779 A JP 13828779A JP S5565219 A JPS5565219 A JP S5565219A
Authority
JP
Japan
Prior art keywords
polymerisation
acid
under
yield
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13828779A
Other languages
English (en)
Inventor
Retsudouizu Antonii
Kureinton Matsukuguine Robaato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Imperial Chemical Industries Ltd
Original Assignee
Imperial Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imperial Chemical Industries Ltd filed Critical Imperial Chemical Industries Ltd
Publication of JPS5565219A publication Critical patent/JPS5565219A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C08G75/06—Polythioethers from cyclic thioethers
    • C08G75/08—Polythioethers from cyclic thioethers from thiiranes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Polyethers (AREA)
JP13828779A 1978-10-27 1979-10-27 Photopolymerizing composition Pending JPS5565219A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB7842234 1978-10-27

Publications (1)

Publication Number Publication Date
JPS5565219A true JPS5565219A (en) 1980-05-16

Family

ID=10500641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13828779A Pending JPS5565219A (en) 1978-10-27 1979-10-27 Photopolymerizing composition

Country Status (13)

Country Link
EP (1) EP0011918B1 (ja)
JP (1) JPS5565219A (ja)
AT (1) ATE6550T1 (ja)
AU (1) AU5188179A (ja)
CA (1) CA1126435A (ja)
DE (1) DE2966764D1 (ja)
DK (1) DK453679A (ja)
ES (1) ES485416A1 (ja)
IE (1) IE49093B1 (ja)
MX (1) MX150944A (ja)
NZ (1) NZ191926A (ja)
ZA (1) ZA795795B (ja)
ZW (1) ZW21379A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003522238A (ja) * 2000-02-04 2003-07-22 エシロール アテルナジオナール カンパニー ジェネラーレ デ オプティック ジエピスルフィドのカチオン光重合および光学レンズ製造への利用

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4442197A (en) * 1982-01-11 1984-04-10 General Electric Company Photocurable compositions
US4564578A (en) * 1982-11-25 1986-01-14 Ciba-Geigy Corporation Novel thioxanthones substituted by alpha-aminoalkyl groups
DE3468112D1 (en) * 1983-09-30 1988-01-28 Toshiba Kk Photopolymerizable epoxy resin composition
JPS6072918A (ja) * 1983-09-30 1985-04-25 Toshiba Corp 光重合性エポキシ樹脂組成物
US4707432A (en) * 1985-09-23 1987-11-17 Ciba-Geigy Corporation Ferrocenium/alpha-cleavage photoinitiator systems for free radical polymerizable compositions
DE3641053A1 (de) * 1986-12-19 1988-06-16 Wolfen Filmfab Veb Fotopolymerisierbares material
US5434196A (en) * 1988-02-19 1995-07-18 Asahi Denka Kogyo K.K. Resin composition for optical molding
WO1989007620A1 (en) * 1988-02-19 1989-08-24 Asahi Denka Kogyo K.K. Resin composition for optical modeling
US4954416A (en) * 1988-12-21 1990-09-04 Minnesota Mining And Manufacturing Company Tethered sulfonium salt photoinitiators for free radical polymerization
JPH06107913A (ja) * 1992-08-10 1994-04-19 Siemens Ag 反応樹脂混合物
DE19500968A1 (de) * 1995-01-14 1996-07-18 Schmidt Gebr Druckfarben Druckverfahren, Druckfarbe und Verfahren zu deren Herstellung sowie deren Verwendung

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3926639A (en) * 1971-11-18 1975-12-16 Sun Chemical Corp Photopolymerizable compositions comprising polycarboxysubstituted benzophenone reaction products
IE42085B1 (en) * 1974-09-18 1980-06-04 Ici Ltd Photopolymerisable compositions
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003522238A (ja) * 2000-02-04 2003-07-22 エシロール アテルナジオナール カンパニー ジェネラーレ デ オプティック ジエピスルフィドのカチオン光重合および光学レンズ製造への利用
JP4875819B2 (ja) * 2000-02-04 2012-02-15 エシロール アテルナジオナール カンパニー ジェネラーレ デ オプティック ジエピスルフィドのカチオン光重合および光学レンズ製造への利用

Also Published As

Publication number Publication date
DE2966764D1 (en) 1984-04-12
DK453679A (da) 1980-04-28
IE49093B1 (en) 1985-07-24
EP0011918A3 (en) 1981-01-21
ES485416A1 (es) 1980-09-01
CA1126435A (en) 1982-06-22
ATE6550T1 (de) 1984-03-15
IE792032L (en) 1980-04-27
ZA795795B (en) 1980-10-29
EP0011918B1 (en) 1984-03-07
ZW21379A1 (en) 1981-05-27
EP0011918A2 (en) 1980-06-11
MX150944A (es) 1984-08-23
NZ191926A (en) 1981-12-15
AU5188179A (en) 1980-05-01

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