WO2024108914A1 - 一种具有双通路的光伏硅片烘干设备 - Google Patents

一种具有双通路的光伏硅片烘干设备 Download PDF

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Publication number
WO2024108914A1
WO2024108914A1 PCT/CN2023/093356 CN2023093356W WO2024108914A1 WO 2024108914 A1 WO2024108914 A1 WO 2024108914A1 CN 2023093356 W CN2023093356 W CN 2023093356W WO 2024108914 A1 WO2024108914 A1 WO 2024108914A1
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WIPO (PCT)
Prior art keywords
tank body
silicon wafer
air
wafer drying
photovoltaic silicon
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PCT/CN2023/093356
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English (en)
French (fr)
Inventor
钱诚
田晓东
肖箭雨
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江苏亚电科技有限公司
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Publication of WO2024108914A1 publication Critical patent/WO2024108914A1/zh

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F26B21/02—Circulating air or gases in closed cycles, e.g. wholly within the drying enclosure
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B23/00—Heating arrangements
    • F26B23/10—Heating arrangements using tubes or passages containing heated fluids, e.g. acting as radiative elements; Closed-loop systems
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B25/00—Details of general application not covered by group F26B21/00 or F26B23/00
    • F26B25/06—Chambers, containers, or receptacles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B9/00—Machines or apparatus for drying solid materials or objects at rest or with only local agitation; Domestic airing cupboards
    • F26B9/10—Machines or apparatus for drying solid materials or objects at rest or with only local agitation; Domestic airing cupboards in the open air; in pans or tables in rooms; Drying stacks of loose material on floors which may be covered, e.g. by a roof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present application belongs to the technical field of photovoltaic silicon wafer production equipment, and in particular, relates to a photovoltaic silicon wafer drying equipment with dual channels.
  • Photovoltaic silicon wafers are the key to converting light energy into electrical energy.
  • the silicon wafers need to be cleaned.
  • the main work of the cleaning process is to debond the silicon wafers produced by the wire cutting process and clean the mortar on the surface of the silicon wafers. It includes three work contents: pre-cleaning, inserting, and ultrasonic cleaning. After each cleaning, the photovoltaic silicon wafers need to be dried using a drying tank.
  • Chinese patent document CN108240740A discloses a drying device, including a tank body, a heating and temperature control component, a fan component and a silicon wafer basket support.
  • the tank body is arranged in the cleaning equipment, the heating and temperature control component is arranged on the inner side wall of the tank body, the fan component and the silicon wafer basket support are both arranged in the tank body, and the silicon wafer basket is placed on the silicon wafer basket support.
  • the air outlet of the fan component is located below the silicon wafer basket support to blow the airflow to the silicon wafer basket.
  • An air duct is also provided in the tank body, and the air inlet of the fan component is connected to the air duct to suck the airflow into the fan component.
  • the present invention integrates the tank into the cleaning device.
  • the silicon wafer basket is taken out by a mechanical arm and placed on the silicon wafer basket support of the drying device, thereby realizing the automatic drying in and out.
  • the drying device cannot effectively utilize the heat of the air.
  • the technical problem to be solved by the present invention is: to solve the deficiencies in the prior art, thereby providing a photovoltaic silicon wafer drying device with dual channels that can effectively utilize gas heat.
  • a photovoltaic silicon wafer drying device with dual passages comprises: a tank body and a ventilation component;
  • the tank body has a connecting portion on one side, and the two side walls and the bottom of the tank body have interlayers.
  • the inner wall of the tank body is provided with air holes to allow air to flow from the inside of the tank body into the interlayer.
  • the inner wall of the tank body is provided with a vent pipe connected to the connecting portion.
  • the ventilation assembly includes an exhaust fan, a heater and a centrifugal fan arranged at the bottom of the trough body, an air inlet pipe connected to the connecting part, and an air outlet pipe connected to the bottom of the trough body.
  • the exhaust fan draws gas from the air inlet pipe and then enters the trough body through the heater and exhausts the gas from the air outlet pipe.
  • the exhaust fan draws gas from the air inlet pipe and exhausts gas from the air outlet pipe to form an air inlet pipe to the connecting part to the ventilation pipe to the inside of the trough body and passes through the interlayer at the bottom of the trough body. Part of the gas returns to the inside of the trough body through the interlayer of the side wall of the trough body, and part of the gas flows through the through holes at the bottom of the trough body to the air outlet pipe and is discharged outward.
  • a solenoid valve is provided on the air outlet pipe to realize the opening and closing of the pipe.
  • a rectifier plate is provided at the bottom of the tank body and above the centrifugal fan, and the rectifier plate has a plurality of rectifier holes.
  • the rectifying holes are arranged in a circle.
  • the through hole at the bottom of the tank body is located between the two centrifugal fans.
  • the vent pipe is L-shaped so as to extend to the inner wall of the trough body opposite to the connecting portion.
  • the number of the air holes gradually decreases as the height decreases.
  • the gas is air or nitrogen.
  • inclined plates are provided at the corners of the interlayer.
  • the beneficial effects of the present invention are as follows: in the photovoltaic silicon wafer drying equipment with dual passages of the present embodiment, the gas is heated by the heater and then passed into the tank body, and an internal circulation passage is formed by the centrifugal fan and the interlayer of the tank body to realize the recycling of gas and heat. At the same time, in order to prevent the increase of moisture in the gas in the tank body and affect the drying effect, the gas in the tank body will be partially discharged.
  • the dual-passage structural design improves the utilization rate of gas and heat.
  • FIG1 is a schematic structural diagram of a photovoltaic silicon wafer drying device with dual channels according to an embodiment of the present application
  • FIG2 is a cross-sectional view of a photovoltaic silicon wafer drying device with dual passages according to an embodiment of the present application
  • FIG3 is a top view of a photovoltaic silicon wafer drying device with dual channels according to an embodiment of the present application
  • FIG4 is a schematic diagram of the structure of the photovoltaic silicon wafer drying equipment with dual channels after the side panels are hidden according to an embodiment of the present application.
  • the terms “installed”, “connected”, and “connected” should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components.
  • installed should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components.
  • This embodiment provides a photovoltaic silicon wafer drying device with dual channels, as shown in FIG1 , comprising: a tank body 1 (for accommodating a hanging basket 9 ) and a ventilation assembly 2 ;
  • the tank body 1 has a connection portion 15 on one side, and the two side walls and the bottom of the tank body 1 have interlayers.
  • the inner wall of the tank body 1 is provided with air holes 14 to allow air to flow from the inside of the tank body 1 into the interlayer.
  • the inner wall of the tank body 1 is provided with a vent pipe 16 connected to the connection portion 15.
  • the ventilation assembly 2 includes an exhaust fan 21, a heater 24 and a centrifugal fan 22 arranged at the bottom of the tank body 1, an air inlet pipe 231 connected to the connecting portion 15, and an air outlet pipe 232 connected to the bottom of the tank body 1.
  • the exhaust fan 21 draws gas from the air inlet pipe 231 and discharges gas from the air outlet pipe 232 to form the air inlet pipe 231 to the connecting portion 15 to the ventilation pipe 16 to the inside of the tank body 1 and after passing through the bottom interlayer of the tank body 1, part of the gas returns to the inside of the tank body 1 through the side wall interlayer of the tank body 1, and part of the gas flows through the through hole 20 at the bottom of the tank body 1 to the air outlet pipe 232 and is discharged outward.
  • the gas is heated by the heater 24 and then passed into the tank body 1.
  • An internal circulation channel is formed through the centrifugal fan 22 and the interlayer of the tank body 1 to realize the recycling of gas and heat.
  • the gas in the tank body 1 will be partially discharged.
  • the dual-channel structural design improves the utilization rate of gas and heat.
  • a solenoid valve is provided on the air outlet pipe 232 to realize the opening and closing of the pipe.
  • a rectifying plate 17 is provided at the bottom of the tank body 1 and above the centrifugal fan 22 , and the rectifying plate 17 has a plurality of rectifying holes, which are arranged in a circular or rectangular shape.
  • the through hole 20 at the bottom of the tank body 1 is located between the two centrifugal fans 22 .
  • the through hole 20 is disposed between the two centrifugal fans 22 so that the air volume entering the through hole 20 can be stably controlled.
  • the ventilation pipe 16 is L-shaped so as to extend to the inner wall of the tank body 1 opposite to the connecting portion 15 .
  • the air holes 14 are evenly distributed on the side wall, or the number of the air holes 14 gradually decreases along the decreasing height, as shown in FIG. 2 , and preferably the number of the air holes 14 gradually decreases along the decreasing height.
  • inclined plates 18 are provided at the corners of the interlayer to reduce the dead zone of the airflow.
  • top of the tank body 1 has a cover, and since it is irrelevant to the invention, its related structure will not be described in detail here.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

本申请涉及一种具有双通路的光伏硅片烘干设备，气体经过加热器的加热后，通入槽体内，通过离心风机及槽体的夹层形成内循环的通路，以实现气体和热量的循环利用，同时为了防止槽体内气体中水分的增加而影响烘干效果，槽体内的气体又会部分被排出，通过双通路的结构设计，提高了气体和热量的利用率。

Description

一种具有双通路的光伏硅片烘干设备 技术领域
本申请属于光伏硅片生产设备技术领域，尤其是涉及一种具有双通路的光伏硅片烘干设备。
 背景技术
光伏硅片是将光能转换成电能的关键，在光伏硅片的生产过程中，需要对硅片进行清洗，清洗工序的主要工作就是将线切工序生产的硅片进行脱胶、清洗掉硅片表面的砂浆。包括三项工作内容：预清洗、插片、超声波清洗。每次清洗后，都需要使用烘干槽光伏硅片进行烘干。中国专利文献CN108240740A公开了一种烘干设备，包括槽体、加热控温组件、风机组件和硅片篮支撑件，槽体设置于清洗设备内，加热温控组件设置于槽体的内侧壁上，风机组件与硅片篮支撑件均设置于槽体内，硅片篮支撑件上放置硅片篮，风机组件的出风口位于硅片篮支撑件的下方，以将气流吹向硅片篮，槽体内还设有风道，风机组件的进风口与风道连通，以将气流吸入风机组件。本发明是将槽体集成到清洗设备中，硅片在清洗设备中完成清洗后，由机械臂将硅片篮取出放于烘干设备的硅片篮支撑件上，实现干进干出自动化。然而，该烘干设备无法有效利用空气的热量。
 技术问题
本发明要解决的技术问题是：为解决现有技术中的不足，从而提供一种能够有效利用气体热量的具有双通路的光伏硅片烘干设备。
 技术解决方案
本发明解决其技术问题所采用的技术方案是：
一种具有双通路的具有双通路的光伏硅片烘干设备，包括：槽体以及通风组件；
所述槽体一侧具有连接部，槽体两侧壁和底部具有夹层，槽体的内壁上开设有气孔以使气流从槽体内部流入夹层内，所述槽体内壁上设置有连通连接部的通气管；
所述通风组件包括抽风机，加热器以及设置在槽体底部的离心风机，与连接部连通的进风管，与槽体底部连通的出风管，抽风机从进风管抽入气体通过加热器后进入槽体内并从出风管排出气体，抽风机从进风管抽入气体并从出风管排出气体形成进风管到连接部到通气管到槽体内部经过槽体底部夹层后，部分气体经过槽体侧壁夹层返回槽体内部，部分气体经过槽体底部的通孔流到出风管向外排出。
优选地，本发明的具有双通路的光伏硅片烘干设备，出风管上设置有电磁阀以实现管道的通断。
优选地，本发明的具有双通路的光伏硅片烘干设备，所述槽体底部、离心风机的上方设置有整流板，所述整流板上具有若干整流孔。
优选地，本发明的具有双通路的光伏硅片烘干设备，整流孔成圆形排布。
优选地，本发明的具有双通路的光伏硅片烘干设备，槽体底部的通孔位于两个离心风机之间。
优选地，本发明的具有双通路的光伏硅片烘干设备，所述通气管为L形以延伸到与连接部相对的槽体的内壁上。
优选地，本发明的具有双通路的光伏硅片烘干设备，所述气孔沿高度的降低数量逐渐减少。
优选地，本发明的具有双通路的光伏硅片烘干设备，所述气体为空气或者氮气。
优选地，本发明的具有双通路的光伏硅片烘干设备，所述夹层的转角处设置有斜板。
 有益效果
本发明的有益效果是：本实施例发明的具有双通路的光伏硅片烘干设备，气体经过加热器的加热后，通入槽体内，通过离心风机及槽体的夹层形成内循环的通路，以实现气体和热量的循环利用，同时为了防止槽体内气体中水分的增加而影响烘干效果，槽体内的气体又会部分被排出，通过双通路的结构设计，提高了气体和热量的利用率。
 附图说明
下面结合附图和实施例对本申请的技术方案进一步说明。
图1是本申请实施例的具有双通路的光伏硅片烘干设备的结构示意图；
图2是本申请实施例的具有双通路的光伏硅片烘干设备的剖视图；
图3是本申请实施例的具有双通路的光伏硅片烘干设备的俯视图；
图4是本申请实施例的具有双通路的光伏硅片烘干设备隐藏了侧板后的结构示意图。
图中的附图标记为：
1　槽体；
2　通风组件；
14　气孔；
15　连接部；
16　通气管；
17　整流板；
18  斜板；
20　通孔；
21　抽风机；
22　离心风机；
24　加热器；
231　进风管；
232　出风管。
 本发明的最佳实施方式
需要说明的是，在不冲突的情况下，本申请中的实施例及实施例中的特征可以相互组合。
在本申请的描述中，需要理解的是，术语“中心”、“纵向”、“横向”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请保护范围的限制。此外，术语“第一”、“第二”等仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”等的特征可以明示或者隐含地包括一个或者更多个该特征。在本发明创造的描述中，除非另有说明，“多个”的含义是两个或两个以上。
在本申请的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以通过具体情况理解上述术语在本申请中的具体含义。
下面将参考附图并结合实施例来详细说明本申请的技术方案。
实施例
本实施例提供一种具有双通路的光伏硅片烘干设备，如图1所示，包括：槽体1（用于容纳吊篮9）以及通风组件2；
所述槽体1一侧具有连接部15，槽体1两侧壁和底部具有夹层，槽体1的内壁上开设有气孔14以使气流从槽体1内部流入夹层内，所述槽体1内壁上设置有连通连接部15的通气管16；
所述通风组件2包括抽风机21，加热器24以及设置在槽体1底部的离心风机22，与连接部15连通的进风管231，与槽体1底部连通的出风管232，抽风机21从进风管231抽入气体并从出风管232排出气体形成进风管231到连接部15到通气管16到槽体1内部经过槽体1底部夹层后，部分气体经过槽体1侧壁夹层返回槽体1内部，部分气体经过槽体1底部的通孔20流到出风管232向外排出。
本实施例的具有双通路的光伏硅片烘干设备，气体经过加热器24的加热后，通入槽体1内，通过离心风机22及槽体1的夹层形成内循环的通路，以实现气体和热量的循环利用，同时为了防止槽体1内气体中水分的增加而影响烘干效果，槽体1内的气体又会部分被排出，通过双通路的结构设计，提高了气体和热量的利用率。
进一步地，出风管232上设置有电磁阀以实现管道的通断。
进一步地，所述槽体1底部、离心风机22的上方设置有整流板17，所述整流板17上具有若干整流孔，整流孔成圆形排布或者矩形排布。
进一步地，如图4所示，槽体1底部的通孔20位于两个离心风机22之间，通孔20设置于两个离心风机22之间可以稳定得控制进入通孔20的风量。
进一步地，所述通气管16为L形以延伸到与连接部15相对的槽体1的内壁上。
进一步地，气孔14均匀分布在侧壁上，或者沿高度的降低数量逐渐减少，如图2，优选为沿高度的降低数量逐渐减少。
进一步地，所述夹层的转角处设置有斜板18，以降低气流的死区。
需要说明的是，槽体1顶部是具有盖体的，由于与发明点无关，因此这里不赘述其相关结构。
以上述依据本申请的理想实施例为启示，通过上述的说明内容，相关工作人员完全可以在不偏离本项申请技术思想的范围内，进行多样的变更以及修改。本项申请的技术性范围并不局限于说明书上的内容，必须要根据权利要求范围来确定其技术性范围。

Claims (9)

  1. 一种具有双通路的具有双通路的光伏硅片烘干设备，其特征在于，包括：槽体（1）以及通风组件（2）；
    所述槽体（1）一侧具有连接部（15），槽体（1）两侧壁和底部具有夹层，槽体（1）的内壁上开设有气孔（14）以使气流从槽体（1）内部流入夹层内，所述槽体（1）内壁上设置有连通连接部（15）的通气管（16）；
    所述通风组件（2）包括抽风机（21），加热器（24）以及设置在槽体（1）底部的离心风机（22），与连接部（15）连通的进风管（231），与槽体（1）底部连通的出风管（232），抽风机（21）从进风管（231）抽入气体通过加热器（24）后进入（1）槽体（1）内并从出风管（232）排出气体，抽风机（21）从进风管（231）抽入气体并从出风管（232）排出气体形成进风管（231）到连接部（15）到通气管（16）到槽体（1）内部经过槽体（1）底部夹层后，部分气体经过槽体（1）侧壁夹层返回槽体（1）内部，部分气体经过槽体（1）底部的通孔（20）流到出风管（232）向外排出。
  2. 根据权利要求1所述的具有双通路的光伏硅片烘干设备，其特征在于，出风管（232）上设置有电磁阀以实现管道的通断。
  3. 根据权利要求1所述的具有双通路的光伏硅片烘干设备，其特征在于，所述槽体（1）底部、离心风机（22）的上方设置有整流板（17），所述整流板（17）上具有若干整流孔。
  4. 根据权利要求3所述的具有双通路的光伏硅片烘干设备，其特征在于，整流孔成圆形排布。
  5. 根据权利要求1所述的具有双通路的光伏硅片烘干设备，其特征在于，槽体（1）底部的通孔（20）位于两个离心风机（22）之间。
  6. 根据权利要求1所述的具有双通路的光伏硅片烘干设备，其特征在于，所述通气管（16）为L形以延伸到与连接部（15）相对的槽体（1）的内壁上。
  7. 根据权利要求1所述的具有双通路的光伏硅片烘干设备，其特征在于，所述气孔（14）沿高度的降低数量逐渐减少。
  8. 根据权利要求1所述的具有双通路的光伏硅片烘干设备，其特征在于，所述气体为空气或者氮气。
  9. 根据权利要求1所述的具有双通路的光伏硅片烘干设备，其特征在于，所述夹层的转角处设置有斜板（18）。
PCT/CN2023/093356 2022-11-23 2023-05-11 一种具有双通路的光伏硅片烘干设备 WO2024108914A1 (zh)

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