WO2022196834A1 - カバー部材 - Google Patents
カバー部材 Download PDFInfo
- Publication number
- WO2022196834A1 WO2022196834A1 PCT/JP2022/013314 JP2022013314W WO2022196834A1 WO 2022196834 A1 WO2022196834 A1 WO 2022196834A1 JP 2022013314 W JP2022013314 W JP 2022013314W WO 2022196834 A1 WO2022196834 A1 WO 2022196834A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- functional film
- cover member
- glass plate
- inorganic oxide
- glass
- Prior art date
Links
- 239000011521 glass Substances 0.000 claims abstract description 111
- 229910052809 inorganic oxide Inorganic materials 0.000 claims abstract description 48
- 239000010419 fine particle Substances 0.000 claims abstract description 36
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 15
- 239000007788 liquid Substances 0.000 claims description 18
- 230000000844 anti-bacterial effect Effects 0.000 claims description 17
- 238000000576 coating method Methods 0.000 claims description 17
- 239000011248 coating agent Substances 0.000 claims description 15
- -1 silicon alkoxide Chemical class 0.000 claims description 15
- 229910052710 silicon Inorganic materials 0.000 claims description 14
- 239000010703 silicon Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 9
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 4
- 229910001431 copper ion Inorganic materials 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000002346 layers by function Substances 0.000 claims description 2
- 239000012528 membrane Substances 0.000 claims description 2
- 230000000845 anti-microbial effect Effects 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 22
- 238000003426 chemical strengthening reaction Methods 0.000 description 19
- 229910052814 silicon oxide Inorganic materials 0.000 description 14
- 239000010410 layer Substances 0.000 description 13
- 239000011734 sodium Substances 0.000 description 11
- 238000006124 Pilkington process Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 125000004430 oxygen atom Chemical group O* 0.000 description 7
- 229910052718 tin Inorganic materials 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 239000006060 molten glass Substances 0.000 description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 5
- 229910018068 Li 2 O Inorganic materials 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 239000000156 glass melt Substances 0.000 description 5
- 238000005342 ion exchange Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 235000010333 potassium nitrate Nutrition 0.000 description 5
- 239000004323 potassium nitrate Substances 0.000 description 5
- 229910001415 sodium ion Inorganic materials 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 125000000962 organic group Chemical group 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 4
- 239000005341 toughened glass Substances 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 229910006404 SnO 2 Inorganic materials 0.000 description 3
- 230000002776 aggregation Effects 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000010828 elution Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 229910052779 Neodymium Inorganic materials 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- COHDHYZHOPQOFD-UHFFFAOYSA-N arsenic pentoxide Chemical compound O=[As](=O)O[As](=O)=O COHDHYZHOPQOFD-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000005329 float glass Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 229910001414 potassium ion Inorganic materials 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- 238000010583 slow cooling Methods 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 241000195940 Bryophyta Species 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 241000588724 Escherichia coli Species 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 125000003302 alkenyloxy group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Inorganic materials O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000011449 brick Substances 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000006025 fining agent Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- QZQVBEXLDFYHSR-UHFFFAOYSA-N gallium(III) oxide Inorganic materials O=[Ga]O[Ga]=O QZQVBEXLDFYHSR-UHFFFAOYSA-N 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum oxide Inorganic materials [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000010446 mirabilite Substances 0.000 description 1
- 235000011929 mousse Nutrition 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- KTUFCUMIWABKDW-UHFFFAOYSA-N oxo(oxolanthaniooxy)lanthanum Chemical compound O=[La]O[La]=O KTUFCUMIWABKDW-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000007372 rollout process Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- RSIJVJUOQBWMIM-UHFFFAOYSA-L sodium sulfate decahydrate Chemical compound O.O.O.O.O.O.O.O.O.O.[Na+].[Na+].[O-]S([O-])(=O)=O RSIJVJUOQBWMIM-UHFFFAOYSA-L 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
- C03C17/009—Mixtures of organic and inorganic materials, e.g. ormosils and ormocers
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/714—Inert, i.e. inert to chemical degradation, corrosion
- B32B2307/7145—Rot proof, resistant to bacteria, mildew, mould, fungi
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2571/00—Protective equipment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
- C03C2217/445—Organic continuous phases
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
- C03C2217/478—Silica
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
- C03C2217/479—Metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
Definitions
- the present invention relates to a cover member that covers an article so that the article can be viewed from the outside, and a method for manufacturing the same.
- a display device such as a display is provided with a cover member that protects the display device.
- a cover member is required to have an antireflection function in order to make the display device easier to see.
- a glass plate having such an antireflection function for example, there is one disclosed in Patent Document 1.
- the present invention has been made to solve this problem, and an object of the present invention is to provide a cover member that achieves both antireflection function and antibacterial performance, and a method of manufacturing the same.
- Section 1 A cover member that covers an article and makes the article visible from the outside, a glass plate having a first side and a second side; a single functional film formed on the first surface; with The functional membrane is an inorganic oxide that forms a three-dimensional network bond; inorganic oxide fine particles containing the same element as the inorganic oxide; an antibacterial metal ion; contains A cover member, wherein irregularities are formed on the surface of the functional film by the inorganic oxide fine particles.
- Item 2 The cover member according to Item 1, wherein the functional film has a refractive index of 1.3 to 1.48.
- Item 3. The cover member according to Item 1 or 2, wherein the functional film has a reflectance of 3% or less at 550 nm.
- Section 4. The cover member according to any one of Items 1 to 3, wherein the functional film has a specular gloss of 90 to 140%.
- the reflection color tone from the functional film side has a* value of ⁇ 2 to +2 in the L*a*b* color system, Item 5.
- Item 6. The cover member according to any one of items 1 to 5, wherein the metal ions are copper ions.
- Item 7. The cover member according to any one of Items 1 to 6, wherein the film thickness of the functional layer is 50 to 500 nm.
- Item 8 forming a coating liquid by adding inorganic fine particles and antibacterial metal ions to silicon alkoxide; applying the coating liquid to a glass plate; heating the glass plate coated with the coating liquid;
- a method of manufacturing a cover member comprising:
- FIG. 1 is a cross-sectional view showing an embodiment of a cover member according to the present invention
- FIG. 2 is an enlarged sectional view of FIG. 1
- FIG. 2 shows the surface properties of the functional film of Example 1.
- the cover member according to the present embodiment is used for covering an article, and is configured so that the article can be visually recognized from the outside through the cover member.
- articles include mobile PCs, tablet PCs, in-vehicle devices such as car navigation systems, devices that have a display function at least partially using electronic components, and devices that do not have an electronic display function but are visible to the outside.
- Various devices such as a display device for displaying some kind of display are targeted.
- the cover member of the invention can be used, for example, as part of a show mousse.
- FIG. 1 is a cross-sectional view of the cover member.
- the cover member 10 according to this embodiment includes a glass plate 1 having a first surface and a second surface, and a functional film 2 laminated on the first surface of the glass plate 1. ing.
- the cover member 10 is arranged so as to cover the display device 100 described above.
- the second surface of the glass plate 1 is arranged to face the display device 100, and the functional film 2 is arranged to face the outside.
- the cover member 10 includes a glass plate 1 having a first surface and a second surface, and a functional film 2 laminated on the first surface of the glass plate 1. ing.
- the cover member 10 is arranged so as to cover the display device 100 described above.
- the second surface of the glass plate 1 is arranged to face the display device 100
- the functional film 2 is arranged to face the outside.
- the glass plate 1 can be made of general-purpose soda-lime glass, borosilicate glass, aluminosilicate glass, alkali-free glass, or other glass, for example. Further, the glass plate 1 can be formed by a float method. According to this manufacturing method, a glass plate 1 having a smooth surface can be obtained. However, the glass plate 10 may have unevenness on its main surface, and may be a figured glass, for example. A figured glass can be molded by a manufacturing method called a roll-out method. A figured glass produced by this method usually has periodic irregularities in one direction along the main surface of the glass plate.
- molten glass is continuously supplied onto molten tin or other molten metal, and the supplied molten glass is made to flow on the molten metal to form a strip.
- the glass thus formed is called a glass ribbon.
- the glass ribbon is cooled as it goes downstream, is cooled and solidified, and is pulled up from the molten metal by rollers. Then, it is conveyed to a slow cooling furnace by rollers, and cut after slow cooling. A float glass sheet is thus obtained.
- the thickness of the glass plate 1 is not particularly limited, it should be thinner for weight reduction.
- it is preferably 0.3 to 5 mm, more preferably 0.6 to 2.5 mm. This is because if the glass plate 10 is too thin, the strength will decrease, and if it is too thick, the protected member 100 viewed through the cover member 10 may be distorted.
- the glass plate 1 may generally be a flat plate, but may also be a curved plate.
- the glass plate 1 preferably has a non-planar main surface that conforms thereto.
- the glass plate 1 may be bent so as to have a constant curvature as a whole, or may be bent locally.
- the main surface of the glass plate 1 may be configured by, for example, connecting a plurality of flat surfaces with curved surfaces.
- the radius of curvature of the glass plate 1 can be, for example, 5000 mm or less.
- the lower limit of the radius of curvature can be, for example, 10 mm or more, but it may be even smaller, for example, 1 mm or more, especially in a locally bent portion.
- a glass plate having the following composition can also be used.
- percentages indicating the components of the glass plate 1 all mean mol%.
- the phrase “substantially composed of” means that the total content of the listed components is 99.5% by mass or more, preferably 99.9% by mass or more, more preferably 99.95% by mass. It means that it occupies more than % by mass. “Substantially free” means that the content of the component is 0.1% by mass or less, preferably 0.05% by mass or less.
- SL in a narrow sense a glass composition suitable for the production of glass plates by the float method
- the composition range considered by those skilled in the art to be soda lime silicate glass suitable for the float process hereinafter sometimes referred to as “broadly defined SL”
- mass% range in which the properties such as T 2 and T 4 are approximated to SL in the narrow sense as much as possible while improving the chemical strengthening properties of SL in the narrow sense.
- SiO2 is a main component that constitutes the glass plate 1. If the content is too low, the chemical durability such as water resistance and heat resistance of the glass are lowered. On the other hand, if the SiO 2 content is too high, the viscosity of the glass plate 1 at high temperatures becomes high, making melting and molding difficult. Therefore, the content of SiO 2 is suitably in the range of 66-72 mol %, preferably 67-70 mol %.
- Al2O3 Al 2 O 3 improves the chemical durability such as water resistance of the glass plate 1, and facilitates the movement of alkali metal ions in the glass to increase the surface compressive stress after chemical strengthening. It is a component for deepening the depth.
- the content of Al 2 O 3 is too high, the viscosity of the glass melt will increase, T 2 and T 4 will increase, and the clarity of the glass melt will deteriorate, making it difficult to produce a high-quality glass plate. becomes difficult.
- the content of Al 2 O 3 is appropriately in the range of 1 to 12 mol %.
- the content of Al 2 O 3 is preferably 10 mol % or less, preferably 2 mol % or more.
- the glass plate 1 preferably contains MgO.
- MgO MgO
- the content of MgO is less than 8 mol %, the surface compressive stress after chemical strengthening tends to decrease and the depth of the stress layer tends to become shallow.
- the strengthening performance obtained by chemical strengthening is lowered, and in particular the depth of the surface compressive stress layer is sharply reduced.
- MgO has the least adverse effect, but in this glass plate 1, the content of MgO is 15 mol % or less.
- T 2 and T 4 are increased and the clarity of the glass melt is deteriorated, making it difficult to produce a high-quality glass plate.
- the content of MgO is in the range of 1 to 15 mol%, preferably 8 mol% or more and 12 mol% or less.
- CaO CaO has the effect of lowering the viscosity at high temperatures, but if the content is too high beyond an appropriate range, the glass plate 1 tends to devitrify and the movement of sodium ions in the glass plate 1 is inhibited. end up When CaO is not contained, the surface compressive stress after chemical strengthening tends to decrease. On the other hand, if the CaO content exceeds 8 mol %, the surface compressive stress after chemical strengthening is significantly reduced, the depth of the compressive stress layer is significantly reduced, and the glass plate 1 is likely to devitrify.
- the appropriate CaO content is in the range of 1 to 8 mol%.
- the CaO content is preferably 7 mol % or less, and preferably 3 mol % or more.
- SrO, BaO greatly lower the viscosity of the glass plate 1, and when contained in small amounts, the effect of lowering the liquidus temperature TL is more pronounced than CaO.
- SrO and BaO significantly hinder the movement of sodium ions in the glass plate 1, greatly reduce the surface compressive stress, and make the depth of the compressive stress layer considerably shallow.
- the glass plate 1 does not substantially contain SrO and BaO.
- ( Na2O ) Na 2 O is a component for increasing the surface compressive stress and increasing the depth of the surface compressive stress layer by replacing sodium ions with potassium ions.
- the stress relaxation during the chemical strengthening treatment will exceed the generation of surface compressive stress due to ion exchange during the chemical strengthening treatment, and as a result, the surface compressive stress will tend to decrease. be.
- Na 2 O is a component for improving the solubility and lowering T 4 and T 2 , but if the content of Na 2 O is too high, the water resistance of the glass is remarkably lowered.
- the content of Na 2 O is 10 mol % or more, the effect of reducing T 4 and T 2 is sufficiently obtained, and if it exceeds 16 mol %, the surface compressive stress is significantly reduced due to stress relaxation. Become.
- the content of Na 2 O in the glass plate 1 of this embodiment is appropriately in the range of 10 to 16 mol %.
- the Na 2 O content is preferably 12 mol % or more, and more preferably 15 mol % or less.
- K2O K 2 O like Na 2 O, is a component that improves the solubility of glass.
- the ion exchange rate in chemical strengthening increases, the depth of the surface compressive stress layer increases, and the liquidus temperature TL of the glass plate 1 decreases. Therefore, it is preferable to contain K 2 O at a low content.
- K 2 O is less effective than Na 2 O in reducing T 4 and T 2 , but a large amount of K 2 O inhibits clarification of the glass melt. Also, the higher the K 2 O content, the lower the surface compressive stress after chemical strengthening. Therefore, the appropriate K 2 O content is in the range of 0 to 1 mol %.
- the glass plate 1 of the present embodiment may contain Li 2 O in an amount of 1 mol % or less, but preferably does not substantially contain Li 2 O.
- B2O3 is a component that lowers the viscosity of the glass plate 1 and improves its solubility.
- the content of B 2 O 3 is too high, the glass plate 1 tends to undergo phase separation and the water resistance of the glass plate 1 decreases.
- the compound formed by B 2 O 3 and the alkali metal oxide may volatilize and damage the refractories in the glass melting chamber.
- the inclusion of B 2 O 3 reduces the depth of the compressive stress layer in chemical strengthening. Therefore, the appropriate content of B 2 O 3 is 0.5 mol % or less. In the present invention, it is more preferable that the glass plate 1 does not substantially contain B 2 O 3 .
- Fe2O3 Fe usually exists in the glass in the form of Fe 2+ or Fe 3+ and acts as a colorant.
- Fe 3+ is a component that enhances the ultraviolet absorption performance of the glass
- Fe 2+ is a component that enhances the heat ray absorption performance.
- the iron oxide content in terms of Fe 2 O 3 is preferably 0.15% by mass or less, more preferably 0.1% by mass or less, when the entire glass plate 1 is taken as 100% by mass. It is preferably 0.02% by mass or less, more preferably 0.02% by mass or less.
- TiO2 TiO 2 is a component that lowers the viscosity of the glass plate 1 and increases the surface compressive stress due to chemical strengthening. Therefore, the appropriate content of TiO 2 is 0 to 0.2% by mass. In addition, it is inevitably mixed with commonly used industrial raw materials, and may be contained in the glass plate 1 in an amount of about 0.05% by mass. This level of content does not color the glass, so it may be included in the glass plate 1 of the present embodiment.
- ZrO2 ZrO 2 may be mixed into the glass plate 1 from the refractory bricks constituting the glass melting kiln, especially when the glass plate is manufactured by the float method, and its content is about 0.01% by mass.
- ZrO 2 is a component that improves the water resistance of glass and increases surface compressive stress due to chemical strengthening.
- a high ZrO 2 content may cause an increase in the working temperature T 4 and a rapid increase in the liquidus temperature TL . It tends to remain as a foreign substance in the manufactured glass. Therefore, the appropriate ZrO 2 content is 0 to 0.1% by mass.
- SO3 In the float method, sulfates such as Glauber's salt (Na 2 SO 4 ) are commonly used as clarifiers. Sulfate decomposes in the molten glass to produce gas components, which promotes defoaming of the glass melt, but some of the gas components dissolve and remain in the glass plate 1 as SO 3 .
- SO 3 is preferably 0 to 0.3% by mass.
- CeO2 CeO 2 is used as a fining agent. CeO 2 contributes to degassing since it produces O 2 gas in the molten glass. On the other hand, too much CeO 2 causes the glass to turn yellow. Therefore, the CeO 2 content is preferably 0 to 0.5% by mass, more preferably 0 to 0.3% by mass, and even more preferably 0 to 0.1% by mass.
- SnO2 It is known that in a glass sheet molded by the float method, tin diffuses from the tin bath to the surface that comes into contact with the tin bath during molding, and the tin exists as SnO 2 . Also, SnO 2 mixed with the glass raw material contributes to defoaming. In the glass plate 1 of the present invention, SnO 2 is preferably 0 to 0.3% by mass.
- the glass plate 1 according to the present embodiment is substantially composed of the components listed above.
- the glass plate 1 according to the present embodiment may contain components other than the components listed above, preferably within a range where the content of each component is less than 0.1% by mass.
- components that are allowed to be included include As2O5 , Sb2O5 , Cl , and F, which are added for the purpose of defoaming the molten glass , in addition to SO3 and SnO2 described above.
- As 2 O 5 , Sb 2 O 5 , Cl, and F are preferably not added because they have a large adverse effect on the environment.
- other examples that are allowed to be included are ZnO , P2O5 , GeO2 , Ga2O3 , Y2O3 and La2O3 .
- Components other than the above derived from industrially used raw materials are acceptable as long as they do not exceed 0.1% by mass. Since these components are added as appropriate or mixed inevitably as necessary, the glass plate 1 of the present embodiment may be substantially free of these components. do not have.
- the density of the glass plate 1 is reduced to 2.53 g ⁇ cm ⁇ 3 or less, further 2.51 g ⁇ cm ⁇ 3 or less, and in some cases 2.50 g ⁇ cm ⁇ 3 or less. be able to.
- the density of soda-lime glass currently mass-produced by the float method is about 2.50 g ⁇ cm ⁇ 3 . Therefore, considering mass production by the float method, the density of the glass plate 1 should be close to the above values, specifically 2.45 to 2.55 g ⁇ cm ⁇ 3 , particularly 2.47 to 2.53 g ⁇ cm ⁇ 3 . cm ⁇ 3 is preferred, and 2.47 to 2.50 g ⁇ cm ⁇ 3 is more preferred.
- the glass substrate may warp.
- the elastic modulus of the glass plate 1 is high.
- the elastic modulus (Young's modulus: E) of the glass plate 1 can be increased to 70 GPa or higher, or even 72 GPa or higher.
- Chemical strengthening of the glass plate 1 will be described below. (Chemical strengthening conditions and compressive stress layer)
- a glass plate 1 containing sodium is brought into contact with a molten salt containing monovalent cations having an ionic radius larger than that of sodium ions, preferably potassium ions, so that the sodium ions in the glass plate 1 are replaced with the above monovalent cations.
- the chemical strengthening of the glass plate 1 according to the present invention can be carried out by performing an ion-exchange treatment that replaces with . Thereby, a compressive stress layer having a compressive stress applied to the surface is formed.
- Potassium nitrate can typically be mentioned as the molten salt.
- a mixed molten salt of potassium nitrate and sodium nitrate can also be used, but since it is difficult to control the concentration of the mixed molten salt, a molten salt of potassium nitrate alone is preferable.
- the surface compressive stress and compressive stress layer depth in a tempered glass article can be controlled not only by the glass composition of the article, but also by the molten salt temperature and treatment time in the ion exchange treatment.
- a tempered glass article having a very high surface compressive stress and a very deep compressive stress layer By contacting the above glass plate 1 with potassium nitrate molten salt, a tempered glass article having a very high surface compressive stress and a very deep compressive stress layer can be obtained. Specifically, a tempered glass article having a surface compressive stress of 700 MPa or more and a compressive stress layer having a depth of 20 ⁇ m or more can be obtained. Certain tempered glass articles can also be obtained.
- wind tempering can be used as a general strengthening method instead of chemical strengthening.
- FIG. 2 is an enlarged cross-sectional view schematically showing the vicinity of the surface of the functional film.
- the functional film 2 comprises an inorganic oxide forming a three-dimensional network bond, inorganic oxide fine particles held by the inorganic oxide, and antibacterial metal ions held by the inorganic oxide. These will be described below.
- the inorganic oxide serves as a binder that holds the inorganic oxide fine particles and metal ions.
- the inorganic oxide includes, for example, silicon oxide, which is an oxide of Si, and preferably contains silicon oxide as a main component. Using silicon oxide as a main component is suitable for lowering the refractive index of the film and suppressing the reflectance of the film.
- the functional film may contain a component other than silicon oxide, or may contain a component partially containing silicon oxide.
- the component partially containing silicon oxide forms, for example, a three-dimensional network structure of siloxane bonds (Si--O--Si) in which silicon atoms and oxygen atoms are alternately connected and spread three-dimensionally. Also, it is a component in which atoms other than both atoms, functional groups, and the like are bonded to silicon atoms or oxygen atoms in this portion. Examples of atoms other than silicon atoms and oxygen atoms include nitrogen atoms, carbon atoms, hydrogen atoms, and metal elements described in the next paragraph. Examples of functional groups include organic groups described as R in the next paragraph. Such components are not strictly silicon oxides in that they are not composed solely of silicon and oxygen atoms.
- the silicon oxide portion composed of silicon atoms and oxygen atoms is also consistent with the common practice in the field.
- the silicon oxide portion is also treated as silicon oxide.
- the atomic ratio of silicon atoms and oxygen atoms in silicon oxide need not be stoichiometric (1:2).
- the functional film 2 may contain metal oxides other than silicon oxide, specifically metal oxide components or metal oxide portions containing other than silicon.
- the metal oxide that the functional film 2 may contain is not particularly limited, but for example, an oxide of at least one metal element selected from the group consisting of Al, Ti, Zr, Ta, Nb, Nd, La, Ce and Sn. is.
- the functional film 2 may contain inorganic compound components other than oxides, such as nitrides, carbides, and halides, or may contain organic compound components.
- Metal oxides such as silicon oxide, can be formed from hydrolyzable organometallic compounds.
- hydrolyzable silicon compounds include compounds represented by formula (1).
- RnSiY4 -n ( 1)
- R is an organic group containing at least one selected from an alkyl group, a vinyl group, an epoxy group, a styryl group, a methacryloyl group and an acryloyl group.
- Y is at least one hydrolyzable organic group selected from an alkoxy group, an acetoxy group, an alkenyloxy group and an amino group, or a halogen atom.
- a halogen atom is preferably Cl.
- n is an integer from 0 to 3, preferably 0 or 1;
- R is preferably an alkyl group, such as an alkyl group having 1 to 3 carbon atoms, particularly a methyl group.
- Y is preferably an alkoxy group such as an alkoxy group having 1 to 4 carbon atoms, particularly a methoxy group and an ethoxy group.
- Two or more of the compounds represented by the above formulas may be used in combination. Such a combination includes, for example, a combination of a tetraalkoxysilane in which n is 0 and a monoalkyltrialkoxysilane in which n is 1.
- the compound represented by formula (1) forms a network structure in which silicon atoms are bonded to each other via oxygen atoms.
- the organic group represented by R is included directly attached to the silicon atom.
- the functional film 2 further contains inorganic oxide fine particles as at least part of the inorganic oxide.
- Inorganic oxides constituting the inorganic oxide fine particles are composed of the same elements as the inorganic oxides described in ⁇ 2-1>, for example, Si, Al, Ti, Zr, Ta, Nb, Nd, La , Ce and Sn, preferably silica fine particles.
- Silica fine particles can be introduced into the functional film 2 by adding colloidal silica, for example.
- the inorganic oxide fine particles are excellent in transferring the stress applied to the functional film 2 to the glass plate 1 supporting the functional film 2 and have high hardness.
- inorganic oxide fine particles is advantageous from the viewpoint of improving the abrasion resistance of the functional film 2 .
- the inorganic oxide fine particles can be supplied to the functional film 2 by adding preformed inorganic oxide fine particles to the coating liquid for forming the functional film 2 .
- the average particle size of the primary particles of the inorganic oxide fine particles is preferably 1 to 100 nm, more preferably 5 to 50 nm.
- the average particle size of the inorganic oxide fine particles is described in the state of primary particles. The average particle diameter of the inorganic oxide fine particles is determined by measuring the particle diameters of 50 arbitrarily selected fine particles by observation using a scanning electron microscope and adopting the average value. If the content of the inorganic oxide fine particles increases, the functional film 2 may become cloudy.
- the inorganic oxide fine particles are preferably 10 to 200 parts by weight, more preferably 20 to 180 parts by weight, still more preferably 5 to 25 parts by weight, and particularly preferably 50 to 160 parts by weight with respect to 100 parts by weight of the inorganic oxide. It is good to add so that it becomes part.
- Metal ions have antibacterial properties and can be formed from monovalent or divalent copper ions, silver ions, and the like.
- the content of the metal ions in the functional film 2 is preferably 2 to 50%, preferably 5 to 25%, in terms of molar ratio with respect to the main component having the largest weight ratio among the inorganic oxides forming the network bonds. is more preferred.
- the thickness of the functional film 2 is, for example, preferably 50 nm or more and 500 nm or less, more preferably 100 nm or more and 450 nm or less, and particularly preferably 200 nm or more and 400 nm or less. If the thickness is too thick, the haze ratio may increase or excessive coloring may occur. On the other hand, if the thickness is too thin, the inorganic oxide fine particles and metal ions cannot be retained and may be separated from the functional film 2 . Moreover, there is also a possibility that durability may become low.
- the refractive index of the functional film 2 is preferably 1.3 to 1.48, more preferably 1.35 to 1.45. As shown in FIG. 2, in the functional film 2 according to the present invention, irregularities are formed on the surface by agglomeration of inorganic oxide fine particles, which scatters light, so that the refractive index can be lowered. . In particular, the refractive index of the inorganic oxide fine particles themselves is often, for example, 1.4 to 1.55. is formed, the apparent refractive index of the functional film 2 itself can be reduced. The refractive index can be measured, for example, according to JIS B-7071-1:2015.
- the reflectance of the functional film 2 is preferably 3% or less at 550 nm, more preferably 2% or less. Reflectance can be measured, for example, based on JIS R-3106:2019.
- the surface roughness Ra of the unevenness of the functional film 2 can be, for example, 0.03 to 0.3 ⁇ m, preferably 0.05 to 0.2 ⁇ m.
- the refractive index as described above can be realized. is also much smaller. That is, the irregularities on the surface of the functional film 2 are not formed by the spherical aggregation of the inorganic oxide fine particles, but as shown in FIG. is formed. Such irregularities can be formed, for example, by adjusting the dispersion and aggregation of the inorganic oxide fine particles by preparing a coating liquid for the functional film.
- FIG. 2 is a schematic diagram of the inorganic oxide fine particles, and does not represent an accurate diagram. Inorganic oxide fine particles are similarly laminated below line A shown in FIG.
- the method for forming the functional film 2 is not particularly limited, it can be formed, for example, as follows. First, a material forming the three-dimensional network structure described above, for example, a silicon alkoxide such as tetraethoxysilane is made into a solution under acidic conditions to generate a precursor liquid. In addition, a liquid containing the antibacterial metal ions described above, such as an aqueous solution of copper chloride and a dispersion liquid containing inorganic oxide fine particles such as colloidal silica, is mixed with the precursor to form a coating liquid for the functional film. .
- a material forming the three-dimensional network structure described above for example, a silicon alkoxide such as tetraethoxysilane is made into a solution under acidic conditions to generate a precursor liquid.
- a liquid containing the antibacterial metal ions described above such as an aqueous solution of copper chloride and a dispersion liquid containing inorganic oxide fine particles such as colloidal silica,
- a coating liquid is applied to the first surface of the cleaned glass plate 1 .
- the coating method is not particularly limited, for example, a flow coating method, a spray coating method, a spin coating method, or the like can be employed.
- the applied coating liquid is dried in an oven or the like at a predetermined temperature (eg, 80 to 200 ° C.) to volatilize the alcohol content in the solution, for example, for hydrolysis and decomposition of the organic chain.
- a predetermined temperature for example, 200 to 500° C.
- the visible light transmittance is preferably 85% or more, more preferably 90% or more.
- the haze ratio of the cover member 10 is, for example, 20% or less, further 15% or less, particularly 10% or less, and in some cases 0.1 to 8.0%, further 0.1 to 6.0%.
- the gloss can be evaluated by the degree of specular gloss.
- the 60° specular glossiness of the cover member 10 is, for example, 90 to 140%, further 95 to 140%, particularly 100 to 140%. These specular glossiness values are values measured for the surface on which the functional film 2 is formed.
- materials exhibiting a gloss of 120 to 140% are generally used.
- the gloss can be measured according to JIS Z8741-1997 "Method for measuring specular gloss”, “Method 3 (60 degree specular gloss)", and the haze can be measured according to JIS K7136:2000.
- both a* and b* of the color tone reflected from the transflective film 2 side are preferably within ⁇ 2, and within ⁇ 1.5. It is more preferable that there is, and it is particularly preferable that it is ⁇ 1 or less.
- These a* and b* can be adjusted by changing the material and thickness of the functional film 2 and the material and thickness of the glass plate 1 . If a* and b* are ⁇ 2 or less, the color tone of the transmitted image can be viewed correctly.
- a* and b* in the range of -2.5 to +2.5 are "a range that can be treated as the same color at the impression level”. Furthermore, it is generally said that if a* and b* are ⁇ 2 or less, the color tone level is hardly noticeable in color separation comparison.
- the cover member 10 since the functional film 2 is formed with unevenness due to the inorganic oxide fine particles, an antireflection function can be obtained. In addition, since antibacterial metal ions are contained, an antibacterial function can also be obtained. Further, since the antireflection function and the antibacterial function can be realized by the single functional film 2, manufacturing can be easily performed.
- the refractive index of the functional film 2 as described above is equivalent to that of fat or oil, it is possible to obtain the effect that even if fat or oil adheres to the functional film 2, it is difficult to visually recognize it. Furthermore, since the surface of the functional film 2 is uneven, even if dirt such as fat or oil adheres, it can be easily wiped off.
- Examples of the present invention will be described below. However, the present invention is not limited to the following examples.
- (1) Preparation of Examples A float glass plate having a size of 50 mm x 50 mm and a thickness of 1.1 mm was prepared, and its surface was subjected to alkaline ultrasonic cleaning. Next, a coating liquid for a functional film having the composition shown below was prepared.
- FIG. 3 is an image of the surface of the functional film of Example 1 taken by SEM. As shown in this photograph, it can be seen that irregularities are formed on the surface of the functional film by inorganic oxide fine particles, and voids are formed inside the irregularities. It has been confirmed that similar irregularities are formed in Examples 2 to 7 as well.
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Abstract
Description
第1面及び第2面を有するガラス板と、
前記第1面に形成された単一の機能膜と、
を備え、
前記機能膜は、
三次元ネットワーク結合を構成する無機酸化物と、
前記無機酸化物と同じ元素を含有する無機酸化物微粒子と、
抗菌性の金属イオンと、
を含有し、
前記無機酸化物微粒子により、前記機能膜の表面に凹凸が形成されている、カバー部材。
前記機能膜側からの反射色調が、L*a*b*表色系において、b*の値は、-2~+2である、項1から4のいずれかに記載のカバー部材。
前記コーティング液をガラス板に塗布するステップと、
前記コーティング液が塗布されたガラス板を加熱するステップと、
を備えている、カバー部材の製造方法。
ガラス板1は、例えば、汎用のソーダライムガラス、ホウケイ酸ガラス、アルミノシリケートガラス、無アルカリガラス等その他のガラスにより形成することができる。また、ガラス板1は、フロート法により成形することができる。この製法によると平滑な表面を有するガラス板1を得ることができる。但し、ガラス板10は、主面に凹凸を有していてもよく、例えば型板ガラスであってもよい。型板ガラスは、ロールアウト法と呼ばれる製法により成形することができる。この製法による型板ガラスは、通常、ガラス板の主面に沿った一方向について周期的な凹凸を有する。
SiO2 65~80%
Al2O3 0~16%
MgO 0~20%
CaO 0~20%
Na2O 10~20%
K2O 0~5%
(SiO2)
SiO2は、ガラス板1を構成する主要成分であり、その含有率が低すぎるとガラスの耐水性などの化学的耐久性および耐熱性が低下する。他方、SiO2の含有率が高すぎると、高温でのガラス板1の粘性が高くなり、溶解および成形が困難になる。したがって、SiO2の含有率は、66~72mol%の範囲が適切であり、67~70mol%が好ましい。
Al2O3はガラス板1の耐水性などの化学的耐久性を向上させ、さらにガラス中のアルカリ金属イオンの移動を容易にすることにより化学強化後の表面圧縮応力を高め、かつ、応力層深さを深くするための成分である。他方、Al2O3の含有率が高すぎると、ガラス融液の粘度を増加させ、T2、T4を増加させると共にガラス融液の清澄性が悪化し高品質なガラス板を製造することが難しくなる。
MgOはガラスの溶解性を向上させる必須の成分である。この効果を十分に得る観点から、このガラス板1ではMgOが添加されていることが好ましい。また、MgOの含有率が8mol%を下回ると、化学強化後の表面圧縮応力が低下し、応力層深さが浅くなる傾向にある。一方、適量を越えて含有率を増やすと、化学強化により得られる強化性能が低下し、特に表面圧縮応力層の深さが急激に浅くなる。この悪影響は、アルカリ土類金属酸化物の中でMgOが最も少ないが、このガラス板1においては、MgOの含有率は15mol%以下である。また、MgOの含有率が高いと、T2、T4を増加させると共にガラス融液の清澄性が悪化し高品質なガラス板を製造することが難しくなる。
CaOは、高温での粘性を低下させる効果を有するが、適度な範囲を超えて含有率が高すぎると、ガラス板1が失透しやすくなるとともに、ガラス板1におけるナトリウムイオンの移動が阻害されてしまう。CaOを含有しない場合に化学強化後の表面圧縮応力が低下する傾向にある。一方、8mol%を超えてCaOを含有すると、化学強化後の表面圧縮応力が顕著に低下し、圧縮応力層深さが顕著に浅くなるとともに、ガラス板1が失透しやすくなる。
SrO、BaOは、ガラス板1の粘性を大きく低下させ、少量の含有では液相温度TLを低下させる効果がCaOより顕著である。しかし、SrO、BaOは、ごく少量の添加であっても、ガラス板1におけるナトリウムイオンの移動を顕著に妨げ、表面圧縮応力を大きく低下させ、かつ、圧縮応力層の深さがかなり浅くなる。
Na2Oは、ナトリウムイオンがカリウムイオンと置換されることにより、表面圧縮応力を大きくし、表面圧縮応力層の深さを深くするための成分である。しかし、適量を超えて含有率を増やすと、化学強化処理でのイオン交換による表面圧縮応力の発生を、化学強化処理中の応力緩和が上回るようになり、結果として表面圧縮応力が低下する傾向にある。
K2Oは、Na2Oと同様、ガラスの溶解性を向上させる成分である。また、K2Oの含有率が低い範囲では、化学強化におけるイオン交換速度が増加し、表面圧縮応力層の深さが深くなる一方で、ガラス板1の液相温度TLを低下させる。したがってK2Oは低い含有率で含有させることが好ましい。
Li2Oは、少量含有されるだけであっても圧縮応力層の深さを著しく低下させる。また、Li2Oを含むガラス物品を硝酸カリウム単独の溶融塩で化学強化処理する場合、Li2Oを含まないガラス物品の場合と比較して、その溶融塩が劣化する速度が著しく速い。具体的には、同じ溶融塩で繰り返し化学強化処理を行なう場合に、より少ない回数でガラス表面に形成される表面圧縮応力が低下する。したがって、本実施形態のガラス板1においては、1mol%以下のLi2Oを含有してもよいが、実質的にLi2Oを含有しない方が好ましい。
B2O3は、ガラス板1の粘性を下げ、溶解性を改善する成分である。しかし、B2O3の含有率が高すぎると、ガラス板1が分相しやすくなり、ガラス板1の耐水性が低下する。また、B2O3とアルカリ金属酸化物とが形成する化合物が揮発してガラス溶解室の耐火物を損傷するおそれが生じる。さらに、B2O3の含有は化学強化における圧縮応力層の深さを浅くしてしまう。したがって、B2O3の含有率は0.5mol%以下が適切である。本発明では、B2O3を実質的に含有しないガラス板1であることがより好ましい。
通常Feは、Fe2+又はFe3+の状態でガラス中に存在し、着色剤として作用する。Fe3+はガラスの紫外線吸収性能を高める成分であり、Fe2+は熱線吸収性能を高める成分である。ガラス板1をディスプレイのカバーガラスとして用いる場合、着色が目立たないことが求められるため、Feの含有率は少ない方が好ましい。しかし、Feは工業原料により不可避的に混入することが多い。したがって、Fe2O3に換算した酸化鉄の含有率は、ガラス板1全体を100質量%として示して0.15質量%以下とすることがよく、0.1質量%以下であることがより好ましく、更に好ましくは0.02質量%以下である。
TiO2は、ガラス板1の粘性を下げると同時に、化学強化による表面圧縮応力を高める成分であるが、ガラス板1に黄色の着色を与えることがある。したがって、TiO2の含有率は0~0.2質量%が適切である。また、通常用いられる工業原料により不可避的に混入し、ガラス板1において0.05質量%程度含有されることがある。この程度の含有率であれば、ガラスに着色を与えることはないので、本実施形態のガラス板1に含まれてもよい。
ZrO2は、とくにフロート法でガラス板を製造する際に、ガラスの溶融窯を構成する耐火レンガからガラス板1に混入することがあり、その含有率は0.01質量%程度であることが知られている。一方、ZrO2はガラスの耐水性を向上させ、また、化学強化による表面圧縮応力を高める成分である。しかし、ZrO2の高い含有率は、作業温度T4の上昇や液相温度TLの急激な上昇を引き起こすことがあり、またフロート法によるガラス板の製造においては、析出したZrを含む結晶が製造されたガラス中に異物として残留しやすい。したがって、ZrO2の含有率は0~0.1質量%が適切である。
フロート法においては、ボウ硝(Na2SO4)など硫酸塩が清澄剤として汎用される。硫酸塩は溶融ガラス中で分解してガス成分を生じ、これによりガラス融液の脱泡が促進されるが、ガス成分の一部はSO3としてガラス板1中に溶解し残留する。本発明のガラス板1においては、SO3は0~0.3質量%であることが好ましい。
CeO2は清澄剤として使用される。CeO2により溶融ガラス中でO2ガスが生じるので、CeO2は脱泡に寄与する。一方、CeO2が多すぎると、ガラスが黄色に着色してしまう。そのため、CeO2の含有量は、0~0.5質量%が好ましく、0~0.3質量%がより好ましく、0~0.1質量%がさらに好ましい。
フロート法により成形されたガラス板において、成型時にスズ浴に触れた面はスズ浴からスズが拡散し、そのスズがSnO2として存在することが知られている。また、ガラス原料に混合させたSnO2は、脱泡に寄与する。本発明のガラス板1においては、SnO2は0~0.3質量%であることが好ましい。
本実施形態によるガラス板1は、上記に列挙した各成分から実質的に構成されていることが好ましい。ただし、本実施形態によるガラス板1は、上記に列記した成分以外の成分を、好ましくは各成分の含有率が0.1質量%未満となる範囲で含有していてもよい。
上記組成より、本実施形態では、ガラス板1の密度を2.53g・cm-3以下、さらには2.51g・cm-3以下、場合によっては2.50g・cm-3以下にまで減少させることができる。
イオン交換を伴う化学強化を行うと、ガラス基板に反りが生じることがある。この反りを抑制するためには、ガラス板1の弾性率は高いことが好ましい。本発明によれば、ガラス板1の弾性率(ヤング率:E)を70GPa以上、さらには72GPa以上にまで増加させることができる。
(化学強化の条件と圧縮応力層)
ナトリウムを含むガラス板1を、ナトリウムイオンよりもイオン半径の大きい一価の陽イオン、好ましくはカリウムイオン、を含む溶融塩に接触させ、ガラス板1中のナトリウムイオンを上記の一価の陽イオンによって置換するイオン交換処理を行うことにより、本発明によるガラス板1の化学強化を実施することができる。これによって、表面に圧縮応力が付与された圧縮応力層が形成される。
次に、機能膜2について、図2を参照しつつ説明する。図2は機能膜の表面付近の概略を示す拡大断面図である。機能膜2は、三次元ネットワーク結合を構成する無機酸化物と、この無機酸化物に保持される無機酸化物微粒子と、無機酸化物に保持される抗菌性の金属イオンと、を備えている。以下、これらについて説明する。
無機酸化物は、無機酸化物微粒子及び金属イオンを保持するバインダとしての役割を果たす。無機酸化物としては、例えば、Siの酸化物である酸化シリコンを含み、酸化シリコンを主成分とすることが好ましい。酸化シリコンを主成分とすることで、膜の屈折率を低下させ、膜の反射率を抑制することに適している。機能膜には、酸化シリコン以外の成分を含んでいてもよく、酸化シリコンを部分的に含む成分を含んでいてもよい。
RnSiY4-n (1)
Rは、アルキル基、ビニル基、エポキシ基、スチリル基、メタクリロイル基及びアクリロイル基から選ばれる少なくとも1種を含む有機基である。Yは、アルコキシ基、アセトキシ基、アルケニルオキシ基及びアミノ基から選ばれる少なくとも1種である加水分解可能な有機基、又はハロゲン原子である。ハロゲン原子は、好ましくはClである。nは、0から3までの整数であり、好ましくは0又は1である。
機能膜2は、無機酸化物の少なくとも一部として、無機酸化物微粒子をさらに含んでいる。無機酸化物微粒子を構成する無機酸化物は、<2-1>項で説明した無機酸化物と同じ元素で構成されており、例えば、Si、Al、Ti、Zr、Ta、Nb、Nd、La、Ce及びSnから選ばれる少なくとも1種の元素の酸化物であり、好ましくはシリカ微粒子である。シリカ微粒子は、例えば、コロイダルシリカを添加することにより機能膜2に導入できる。無機酸化物微粒子は、機能膜2に加えられた応力を、機能膜2を支持するガラス板1に伝達する作用に優れ、硬度も高い。したがって、無機酸化物微粒子の添加は、機能膜2の耐摩耗性を向上させる観点から有利である。無機酸化物微粒子は、機能膜2を形成するための塗工液に、予め形成した無機酸化物微粒子を添加することにより、機能膜2に供給することができる。
金属イオンは、抗菌性を有するものであり、1価または2価の銅イオン、銀イオンなどで形成することができる。機能膜2の金属イオンの含有量は、ネットワーク結合を構成する無機酸化物のうち最も重量比の大きい主成分に対し、モル比で2~50%であることが好ましく、5~25%であることがさらに好ましい。
機能膜2の厚みは、例えば、50nm以上500nm以下であることが好ましく、100nm以上450nm以下であることがさらに好ましく、200nm以上400nm以下であることが特に好ましい。厚みが厚すぎると、ヘイズ率が高くなったり、過度の着色が生じるおそれがある。一方、厚みが薄すぎると、無機酸化物微粒子や金属イオンを保持できず、機能膜2から離脱するおそれがある。また、耐久性が低くなるおそれもある。
機能膜2の形成方法は、特には限定されないが、例えば、以下のように形成することができる。まず、上述した三次元ネットワーク構造を構成する材料、例えば、テトラエトキシシラン等のシリコンアルコキシドを酸性条件下で溶液とし、前駆体液を生成する。また、上述した抗菌性の金属イオンを含む液、例えば、塩化銅水溶液と、コロイダルシリカ等の無機酸化物微粒子を含有する分散液を、前駆体に混合し、機能膜用の塗布液を生成する。
カバー部材10の光学特性としては、例えば、可視光透過率が85%以上であることが好ましく、90%以上であることがさらに好ましい。また、カバー部材10のヘイズ率は、例えば20%以下、さらに15%以下、特に10%以下であり、場合によっては0.1~8.0%、さらに0.1~6.0%であってもよい。
本実施形態に係るカバー部材10では、機能膜2に、無機酸化物微粒子による凹凸が形成されるため、反射防止機能を得ることができる。また、抗菌性の金属イオンが含有されているため、抗菌機能を得ることもできる。そして、これら反射防止機能と抗菌機能を単一の機能膜2で実現できるため、製造を容易に行うことができる。
(1)実施例の準備
50mmx50mm、厚みが1.1mmのフロートガラス板を準備し、その表面に対し、アルカリ超音波洗浄を行った。次に、以下に示す組成の機能膜用のコーティング液を調製した。
実施例1~7のカバー部材に対し、以下の試験を行った。結果は、表2に示すとおりである。
ヘイズ、グロス、透過率を測定した。ヘイズは、日本電色工業株式会社製ヘイズメータNDH2000により行った。この際、機能膜2を入射面とし、試料の3点でヘイズ率を測定し、その平均値をヘイズ率とした。グロスはJIS Z8741-1997の「鏡面光沢度測定方法」の「方法3(60度鏡面光沢)」に従って測定を行った。透過率は、日立製作所製分光光度計U-4100により測定した。
各機能膜に対し、JIS-K5600-5-1(1999)で規定する表面鉛筆硬度試験を行った。
実施例1~7に係るカバー部材を25ml、25℃の精製水に浸漬し、24時間後の銅の溶出率の関係を算出した。この溶出率の算出は、次のように行った。まず、パックテスト銅(共立理化学研究所製)で発色させた検水をデジタルパックテスト銅(同上)で測定し、液中に含まれる銅イオン濃度を求めた後、これを元の膜中に含有していた銅に対する重量比に換算した。
2 機能膜
10 カバー部材
100 被保護部材
Claims (8)
- 物品を覆い、外部から当該物品を視認可能とするカバー部材であって、
第1面及び第2面を有するガラス板と、
前記第1面に形成された単一の機能膜と、
を備え、
前記機能膜は、
三次元ネットワーク結合を構成する無機酸化物と、
前記無機酸化物と同じ元素を含有する無機酸化物微粒子と、
抗菌性の金属イオンと、
を含有し、
前記無機酸化物微粒子により、前記機能膜の表面に凹凸が形成されている、カバー部材。 - 前記機能膜の屈折率は、1.3~1.48である、請求項1に記載のカバー部材。
- 前記機能膜の550nmにおける反射率は、3%以下である、請求項1または2に記載のカバー部材。
- 前記機能膜の鏡面光沢度は、90~140%である、請求項1から3のいずれかに記載のカバー部材。
- 前記機能膜側からの反射色調が、L*a*b*表色系において、a*の値は、-2~+2であり、
前記機能膜側からの反射色調が、L*a*b*表色系において、b*の値は、-2~+2である、請求項1から4のいずれかに記載のカバー部材。 - 前記金属イオンは、銅イオンである、請求項1から5のいずれかに記載のカバー部材。
- 前記機能層の膜厚は、50~500nmである、請求項1から6のいずれかに記載のカバー部材。
- シリコンアルコキシドに、無機微粒子及び抗菌性の金属イオンを添加したコーティング液を形成するステップと、
前記コーティング液をガラス板に塗布するステップと、
前記コーティング液が塗布されたガラス板を加熱するステップと、
を備えている、カバー部材の製造方法。
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JP2023507216A JPWO2022196834A1 (ja) | 2021-03-19 | 2022-03-22 | |
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CN (1) | CN116997535A (ja) |
AR (1) | AR125541A1 (ja) |
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JPH1186757A (ja) * | 1997-09-04 | 1999-03-30 | Nippon Electric Glass Co Ltd | ブラウン管用パネル |
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JP2005092099A (ja) * | 2003-09-19 | 2005-04-07 | Fuji Photo Film Co Ltd | 硬化性樹脂組成物、及び光学物品、並びにそれを用いた画像表示装置 |
WO2008081837A1 (ja) | 2006-12-27 | 2008-07-10 | Asahi Glass Company, Limited | 反射防止体およびディスプレイ装置 |
JP2010282036A (ja) * | 2009-06-05 | 2010-12-16 | Kagawa Univ | 表示装置用透光性部材とその製造方法並びにそれらを用いた表示装置及び物品 |
JP2013198826A (ja) * | 2010-07-23 | 2013-10-03 | Toto Ltd | 光触媒層を備えてなる複合材の使用 |
JP2015161791A (ja) * | 2014-02-27 | 2015-09-07 | 旭硝子株式会社 | 反射防止膜付き基材および物品 |
JP2017106944A (ja) * | 2014-04-23 | 2017-06-15 | 旭硝子株式会社 | アンチグレア層付き基材および物品 |
-
2022
- 2022-03-15 AR ARP220100592A patent/AR125541A1/es unknown
- 2022-03-18 TW TW111110167A patent/TW202243881A/zh unknown
- 2022-03-22 WO PCT/JP2022/013314 patent/WO2022196834A1/ja active Application Filing
- 2022-03-22 CN CN202280021864.4A patent/CN116997535A/zh active Pending
- 2022-03-22 KR KR1020237035240A patent/KR20230159698A/ko unknown
- 2022-03-22 JP JP2023507216A patent/JPWO2022196834A1/ja active Pending
- 2022-03-22 EP EP22771573.7A patent/EP4309890A1/en active Pending
- 2022-03-22 US US18/282,700 patent/US20240150231A1/en active Pending
Patent Citations (8)
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JP2000095969A (ja) * | 1996-07-19 | 2000-04-04 | Toto Ltd | 光触媒性親水性コ―ティング組成物による自動車車体表面の親水化方法 |
JPH1186757A (ja) * | 1997-09-04 | 1999-03-30 | Nippon Electric Glass Co Ltd | ブラウン管用パネル |
JP2005092099A (ja) * | 2003-09-19 | 2005-04-07 | Fuji Photo Film Co Ltd | 硬化性樹脂組成物、及び光学物品、並びにそれを用いた画像表示装置 |
WO2008081837A1 (ja) | 2006-12-27 | 2008-07-10 | Asahi Glass Company, Limited | 反射防止体およびディスプレイ装置 |
JP2010282036A (ja) * | 2009-06-05 | 2010-12-16 | Kagawa Univ | 表示装置用透光性部材とその製造方法並びにそれらを用いた表示装置及び物品 |
JP2013198826A (ja) * | 2010-07-23 | 2013-10-03 | Toto Ltd | 光触媒層を備えてなる複合材の使用 |
JP2015161791A (ja) * | 2014-02-27 | 2015-09-07 | 旭硝子株式会社 | 反射防止膜付き基材および物品 |
JP2017106944A (ja) * | 2014-04-23 | 2017-06-15 | 旭硝子株式会社 | アンチグレア層付き基材および物品 |
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JPWO2022196834A1 (ja) | 2022-09-22 |
CN116997535A (zh) | 2023-11-03 |
KR20230159698A (ko) | 2023-11-21 |
EP4309890A1 (en) | 2024-01-24 |
TW202243881A (zh) | 2022-11-16 |
US20240150231A1 (en) | 2024-05-09 |
AR125541A1 (es) | 2023-07-26 |
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