WO2022107678A1 - Résine époxyde, composition de résine durcissable et objet durci obtenu à partir de celle-ci - Google Patents
Résine époxyde, composition de résine durcissable et objet durci obtenu à partir de celle-ci Download PDFInfo
- Publication number
- WO2022107678A1 WO2022107678A1 PCT/JP2021/041534 JP2021041534W WO2022107678A1 WO 2022107678 A1 WO2022107678 A1 WO 2022107678A1 JP 2021041534 W JP2021041534 W JP 2021041534W WO 2022107678 A1 WO2022107678 A1 WO 2022107678A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- epoxy resin
- resin composition
- epoxy
- formula
- represented
- Prior art date
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 104
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 104
- 239000011342 resin composition Substances 0.000 title claims description 9
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000003795 chemical substances by application Substances 0.000 claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 32
- 239000000203 mixture Substances 0.000 abstract description 26
- 238000010521 absorption reaction Methods 0.000 abstract description 14
- -1 laminated board Substances 0.000 description 39
- 238000006243 chemical reaction Methods 0.000 description 28
- 229920005989 resin Polymers 0.000 description 25
- 239000011347 resin Substances 0.000 description 25
- 239000002904 solvent Substances 0.000 description 22
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 21
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 238000005227 gel permeation chromatography Methods 0.000 description 17
- 239000000047 product Substances 0.000 description 17
- 239000000853 adhesive Substances 0.000 description 15
- 230000001070 adhesive effect Effects 0.000 description 15
- 238000004128 high performance liquid chromatography Methods 0.000 description 15
- 150000002989 phenols Chemical class 0.000 description 14
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 150000004982 aromatic amines Chemical class 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 10
- 238000005160 1H NMR spectroscopy Methods 0.000 description 9
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 9
- 238000004458 analytical method Methods 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 9
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 8
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- JAYXSROKFZAHRQ-UHFFFAOYSA-N n,n-bis(oxiran-2-ylmethyl)aniline Chemical compound C1OC1CN(C=1C=CC=CC=1)CC1CO1 JAYXSROKFZAHRQ-UHFFFAOYSA-N 0.000 description 8
- 125000003277 amino group Chemical group 0.000 description 7
- 239000011256 inorganic filler Substances 0.000 description 7
- 229910003475 inorganic filler Inorganic materials 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 6
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical group O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 229930185605 Bisphenol Natural products 0.000 description 5
- 150000001299 aldehydes Chemical class 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 239000007822 coupling agent Substances 0.000 description 5
- 239000000835 fiber Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000012044 organic layer Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 4
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 238000005538 encapsulation Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 3
- 238000006735 epoxidation reaction Methods 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 3
- 238000010926 purge Methods 0.000 description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000002351 wastewater Substances 0.000 description 3
- KJPRLNWUNMBNBZ-QPJJXVBHSA-N (E)-cinnamaldehyde Chemical compound O=C\C=C\C1=CC=CC=C1 KJPRLNWUNMBNBZ-QPJJXVBHSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- FMGGHNGKHRCJLL-UHFFFAOYSA-N 1,2-bis(chloromethyl)benzene Chemical group ClCC1=CC=CC=C1CCl FMGGHNGKHRCJLL-UHFFFAOYSA-N 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 2
- MODAACUAXYPNJH-UHFFFAOYSA-N 1-(methoxymethyl)-4-[4-(methoxymethyl)phenyl]benzene Chemical group C1=CC(COC)=CC=C1C1=CC=C(COC)C=C1 MODAACUAXYPNJH-UHFFFAOYSA-N 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical group C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- KSMBFKMHJGVFQO-UHFFFAOYSA-N 2-[2-(2-hydroxypropan-2-yl)phenyl]propan-2-ol Chemical compound CC(C)(O)C1=CC=CC=C1C(C)(C)O KSMBFKMHJGVFQO-UHFFFAOYSA-N 0.000 description 2
- KWOIWTRRPFHBSI-UHFFFAOYSA-N 4-[2-[3-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=CC(C(C)(C)C=2C=CC(N)=CC=2)=CC=1C(C)(C)C1=CC=C(N)C=C1 KWOIWTRRPFHBSI-UHFFFAOYSA-N 0.000 description 2
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical class OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical group OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 150000003935 benzaldehydes Chemical class 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000004917 carbon fiber Substances 0.000 description 2
- 229940117916 cinnamic aldehyde Drugs 0.000 description 2
- KJPRLNWUNMBNBZ-UHFFFAOYSA-N cinnamic aldehyde Natural products O=CC=CC1=CC=CC=C1 KJPRLNWUNMBNBZ-UHFFFAOYSA-N 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 150000005205 dihydroxybenzenes Chemical class 0.000 description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000005194 fractionation Methods 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 239000003456 ion exchange resin Substances 0.000 description 2
- 229920003303 ion-exchange polymer Polymers 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 239000006082 mold release agent Substances 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical class C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 2
- 150000004780 naphthols Chemical group 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- IGALFTFNPPBUDN-UHFFFAOYSA-N phenyl-[2,3,4,5-tetrakis(oxiran-2-ylmethyl)phenyl]methanediamine Chemical compound C=1C(CC2OC2)=C(CC2OC2)C(CC2OC2)=C(CC2OC2)C=1C(N)(N)C1=CC=CC=C1 IGALFTFNPPBUDN-UHFFFAOYSA-N 0.000 description 2
- ZWLUXSQADUDCSB-UHFFFAOYSA-N phthalaldehyde Chemical compound O=CC1=CC=CC=C1C=O ZWLUXSQADUDCSB-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000004382 potting Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 229960004889 salicylic acid Drugs 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- PVXVWWANJIWJOO-UHFFFAOYSA-N 1-(1,3-benzodioxol-5-yl)-N-ethylpropan-2-amine Chemical compound CCNC(C)CC1=CC=C2OCOC2=C1 PVXVWWANJIWJOO-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- IYSVFZBXZVPIFA-UHFFFAOYSA-N 1-ethenyl-4-(4-ethenylphenyl)benzene Chemical group C1=CC(C=C)=CC=C1C1=CC=C(C=C)C=C1 IYSVFZBXZVPIFA-UHFFFAOYSA-N 0.000 description 1
- SDRZFSPCVYEJTP-UHFFFAOYSA-N 1-ethenylcyclohexene Chemical compound C=CC1=CCCCC1 SDRZFSPCVYEJTP-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- LNETULKMXZVUST-UHFFFAOYSA-N 1-naphthoic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1 LNETULKMXZVUST-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- SMBYEXNJVNACSW-UHFFFAOYSA-N 2,3,3a,7a-tetrahydro-1h-indene Chemical compound C1=CC=CC2CCCC21 SMBYEXNJVNACSW-UHFFFAOYSA-N 0.000 description 1
- PISLZQACAJMAIO-UHFFFAOYSA-N 2,4-diethyl-6-methylbenzene-1,3-diamine Chemical compound CCC1=CC(C)=C(N)C(CC)=C1N PISLZQACAJMAIO-UHFFFAOYSA-N 0.000 description 1
- MYEWQUYMRFSJHT-UHFFFAOYSA-N 2-(2-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC=C1S(=O)(=O)C1=CC=CC=C1N MYEWQUYMRFSJHT-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- LYXAQAXLWMRPOZ-UHFFFAOYSA-N 2-[1-(2-aminophenyl)-9h-fluoren-2-yl]aniline Chemical compound NC1=CC=CC=C1C1=CC=C(C=2C(=CC=CC=2)C2)C2=C1C1=CC=CC=C1N LYXAQAXLWMRPOZ-UHFFFAOYSA-N 0.000 description 1
- CUZMSUQFXDTNQE-UHFFFAOYSA-N 2-[2-[3-[2-(2-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=CC=C(N)C=1C(C)(C)C(C=1)=CC=CC=1C(C)(C)C1=CC=CC=C1N CUZMSUQFXDTNQE-UHFFFAOYSA-N 0.000 description 1
- SDKYDUUJVBRYEK-UHFFFAOYSA-N 2-[2-[3-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound NC1=C(C(C)(C)C2=CC(=CC=C2)C(C)(C)C2=CC=C(C=C2)N)C=CC=C1 SDKYDUUJVBRYEK-UHFFFAOYSA-N 0.000 description 1
- UGPWRRVOLLMHSC-UHFFFAOYSA-N 2-[3-(2-hydroxypropan-2-yl)phenyl]propan-2-ol Chemical compound CC(C)(O)C1=CC=CC(C(C)(C)O)=C1 UGPWRRVOLLMHSC-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- ZMPZWXKBGSQATE-UHFFFAOYSA-N 3-(4-aminophenyl)sulfonylaniline Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=CC(N)=C1 ZMPZWXKBGSQATE-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- WECDUOXQLAIPQW-UHFFFAOYSA-N 4,4'-Methylene bis(2-methylaniline) Chemical compound C1=C(N)C(C)=CC(CC=2C=C(C)C(N)=CC=2)=C1 WECDUOXQLAIPQW-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- KHYXYOGWAIYVBD-UHFFFAOYSA-N 4-(4-propylphenoxy)aniline Chemical compound C1=CC(CCC)=CC=C1OC1=CC=C(N)C=C1 KHYXYOGWAIYVBD-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical class O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 1
- NWIVYGKSHSJHEF-UHFFFAOYSA-N 4-[(4-amino-3,5-diethylphenyl)methyl]-2,6-diethylaniline Chemical compound CCC1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=C(CC)C=2)=C1 NWIVYGKSHSJHEF-UHFFFAOYSA-N 0.000 description 1
- QJENIOQDYXRGLF-UHFFFAOYSA-N 4-[(4-amino-3-ethyl-5-methylphenyl)methyl]-2-ethyl-6-methylaniline Chemical compound CC1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=C(C)C=2)=C1 QJENIOQDYXRGLF-UHFFFAOYSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- QKEUMLXGHGAUQG-UHFFFAOYSA-N 4-[4-[1-(4-aminophenoxy)cyclohexa-2,4-dien-1-yl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C2(C=CC=CC2)OC=2C=CC(N)=CC=2)C=C1 QKEUMLXGHGAUQG-UHFFFAOYSA-N 0.000 description 1
- INYHZQLKOKTDAI-UHFFFAOYSA-N 5-ethenylbicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(C=C)CC1C=C2 INYHZQLKOKTDAI-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241000252505 Characidae Species 0.000 description 1
- 241001448862 Croton Species 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- BKJLNJYDEMKREK-UHFFFAOYSA-N FNB(F)F Chemical compound FNB(F)F BKJLNJYDEMKREK-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- QMMZSJPSPRTHGB-UHFFFAOYSA-N MDEA Natural products CC(C)CCCCC=CCC=CC(O)=O QMMZSJPSPRTHGB-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- PFJGMUWBVMNSSU-UHFFFAOYSA-N [2-(hydroxymethyl)-3-phenylphenyl]methanol Chemical compound OCC1=CC=CC(C=2C=CC=CC=2)=C1CO PFJGMUWBVMNSSU-UHFFFAOYSA-N 0.000 description 1
- XMUZQOKACOLCSS-UHFFFAOYSA-N [2-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=CC=C1CO XMUZQOKACOLCSS-UHFFFAOYSA-N 0.000 description 1
- QLBRROYTTDFLDX-UHFFFAOYSA-N [3-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCCC(CN)C1 QLBRROYTTDFLDX-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 1
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001448 anilines Chemical class 0.000 description 1
- 238000007080 aromatic substitution reaction Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000004883 computer application Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 239000013310 covalent-organic framework Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- MLUCVPSAIODCQM-NSCUHMNNSA-N crotonaldehyde Chemical compound C\C=C\C=O MLUCVPSAIODCQM-NSCUHMNNSA-N 0.000 description 1
- MLUCVPSAIODCQM-UHFFFAOYSA-N crotonaldehyde Natural products CC=CC=O MLUCVPSAIODCQM-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 239000004643 cyanate ester Substances 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000004508 fractional distillation Methods 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 125000000654 isopropylidene group Chemical group C(C)(C)=* 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 229960004488 linolenic acid Drugs 0.000 description 1
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 1
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000012170 montan wax Substances 0.000 description 1
- JGGQWILNAAODRS-UHFFFAOYSA-N n-methyl-4-[4-(methylamino)phenyl]aniline Chemical compound C1=CC(NC)=CC=C1C1=CC=C(NC)C=C1 JGGQWILNAAODRS-UHFFFAOYSA-N 0.000 description 1
- ZMVMYBGDGJLCHV-UHFFFAOYSA-N n-methyl-4-[[4-(methylamino)phenyl]methyl]aniline Chemical compound C1=CC(NC)=CC=C1CC1=CC=C(NC)C=C1 ZMVMYBGDGJLCHV-UHFFFAOYSA-N 0.000 description 1
- 150000004002 naphthaldehydes Chemical class 0.000 description 1
- NTNWKDHZTDQSST-UHFFFAOYSA-N naphthalene-1,2-diamine Chemical compound C1=CC=CC2=C(N)C(N)=CC=C21 NTNWKDHZTDQSST-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- XPPWLXNXHSNMKC-UHFFFAOYSA-N phenylboron Chemical class [B]C1=CC=CC=C1 XPPWLXNXHSNMKC-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011208 reinforced composite material Substances 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 238000001256 steam distillation Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/10—Polycondensates containing more than one epoxy group per molecule of polyamines with epihalohydrins or precursors thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
- C08G59/3227—Compounds containing acyclic nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
Definitions
- the present invention relates to an epoxy resin having a specific structure, a curable resin composition, and a cured product thereof.
- epoxy resin By curing with various curing agents, epoxy resin becomes a cured product with excellent mechanical properties, water resistance, chemical resistance, heat resistance, electrical properties, etc., and becomes an adhesive, paint, laminated board, molding material, note. It is used in a wide range of fields such as mold materials.
- Carbon fiber reinforced composite material (CFRP) which is made by impregnating reinforced fibers with an epoxy resin and a curing agent as a matrix resin and curing them, can impart properties such as weight reduction and high strength.
- CFRP Carbon fiber reinforced composite material
- Materials such as bisphenol A type epoxy resin, bisphenol F type epoxy resin, and tetraglycidyldiaminodiphenylmethane are generally used as resins used for matrix resins such as CFRP, and glycidylamine type epoxy resins are used for aircraft applications. Materials such as tetraglycidyldiaminodiphenylmethane are used.
- Patent Document 1 the required characteristics for CFRP have become stricter, and when applied to aerospace applications and structural materials such as vehicles, heat resistance of 180 ° C or higher is required.
- the glycidylamine-based material has high heat resistance, it has a high water absorption rate and has a problem of deterioration of characteristics after water absorption.
- a general glycidyl ether type epoxy resin has a problem that its elastic modulus is low although its water absorption rate is relatively low. Therefore, there is a demand for a material that satisfies high heat resistance, high elastic modulus, and low water absorption.
- an object of the present invention is to provide an epoxy resin or an epoxy resin composition whose cured product has high heat resistance, high elastic modulus and low water absorption.
- the present invention relates to the following [1] to [8].
- n is the number of repetitions, and the average value thereof is 1 ⁇ n ⁇ 5.
- n is the number of repetitions, and the average value thereof is 1 ⁇ n ⁇ 5.
- the present invention relates to an epoxy resin having a specific structure, a curable resin composition and a cured product thereof, and the cured product has high heat resistance, high elastic modulus and low water absorption. Therefore, the present invention is used for insulating materials for electrical and electronic parts (highly reliable semiconductor encapsulation materials, etc.), laminated boards (printed wiring boards, build-up boards, etc.), various composite materials such as CFRP, adhesives, paints, etc. It is useful.
- the GPC chart of synthesis example 1 is shown.
- the 1H-NMR chart of synthesis example 1 is shown.
- the HPLC chart of synthesis example 1 is shown.
- the GPC chart of Example 1 is shown.
- the 1H-NMR chart of Example 1 is shown.
- the HPLC chart of Example 1 is shown.
- the GPC chart of Reference Example 1 is shown.
- the 1H-NMR chart of Reference Example 1 is shown.
- the HPLC chart of Reference Example 1 is shown.
- an aromatic amine resin represented by the following formula (6) can be used as a precursor.
- n is the number of repetitions, and the average value thereof is 1 ⁇ n ⁇ 5.
- the aromatic amine resin represented by the formula (6) is more preferably represented by the following formula (7). This is because the crystallinity of the benzene ring to which the amino group is not bonded in the formula (6) is lower than that in the ortho-position or the para-position. The decrease in crystallinity increases the solvent stability and facilitates the preparation of the resin solution. In addition, the crystallinity of the compound derived from this can be reduced. Therefore, it is possible to suppress the precipitation of crystals during storage after the composition.
- n is the number of repetitions, and the average value thereof is 1 ⁇ n ⁇ 5.
- the method for producing the aromatic amine resin represented by the formula (6) or the formula (7) is not particularly limited.
- the above formula is obtained by reacting aniline with m-dissopropenylbenzene or m-di ( ⁇ -hydroxyisopropyl) benzene at 180 to 250 ° C. in the presence of an acidic catalyst.
- the acidic catalyst used for synthesizing the aromatic amine resin represented by the formula (6) is hydrochloric acid, phosphoric acid, sulfuric acid, formic acid, zinc chloride, ferric chloride, aluminum chloride, p-toluenesulfonic acid, and methanesulfonic acid. Acids, active white clay, ion exchange resin and the like can be mentioned. These may be used alone or in combination of two or more.
- the amount of the catalyst used is 0.1 to 50% by weight, preferably 1 to 30% by weight, based on the aniline used. If the amount is too large, the viscosity of the reaction solution becomes too high and stirring becomes difficult, and the amount is too small. And the progress of the reaction slows down.
- the reaction may be carried out using an organic solvent such as toluene or xylene, or may be carried out without a solvent.
- an organic solvent such as toluene or xylene
- the reaction may be carried out without a solvent.
- an organic solvent such as toluene or xylene
- the reaction may be carried out without a solvent.
- an organic solvent such as toluene or xylene
- the reaction may be carried out using an organic solvent such as toluene or xylene, or may be carried out without a solvent.
- an organic solvent such as toluene or xylene
- the reaction may be carried out without a solvent.
- the diphenylamine derivative is added to 1% by weight or less, preferably 0.5% by weight or less under high temperature and high vacuum, or by means such as steam distillation. , More preferably to 0.2% by weight or less.
- the epoxy resin of the present invention is represented by the following formula (1), and the total content of the epoxy resins represented by the following formulas (2) to (4) is represented by the following formula (1). It is 80 area% or less in the resin.
- n is the number of repetitions, and the average value thereof is 1 ⁇ n ⁇ 5.
- n is preferably 1 ⁇ n ⁇ 5, and more preferably 1 ⁇ n ⁇ 3.
- the total content of the epoxy resins represented by the formulas (2) to (4) in the epoxy resin represented by the formula (1) is two, gel permeation chromatography analysis and high performance liquid chromatography analysis. It can be obtained by an analysis method using. In the present invention, the analysis was performed under the following conditions.
- the content ( ⁇ 2 to ⁇ 4) of the epoxy resin represented by the formulas (2) to (4) contained in the above can be determined. Therefore, for example, the product of ⁇ and ⁇ 2 is the content of the epoxy resin represented by the formula (2) contained in the epoxy resin represented by the formula (1).
- the epoxy resin of the present invention preferably has a total content of the epoxy resins represented by the formulas (2) to (4) in the epoxy resin represented by the formula (1) of 80 area% or less. It is more preferably 70 area% or less, and most preferably 60 area% or less. This is because if the area is 80 area% or less, the orientation and the molecular weight distribution are controlled, and at the same time, an epoxy resin having high heat resistance, low water absorption, and high elastic modulus, which are difficult to develop, can be obtained. ..
- the lower limit may be 0 area%, but is preferably 20 area% or more, and more preferably 40 area% or more.
- the lower limit may be 0 area%, but is preferably 20 area% or more, and more preferably 40 area% or more.
- the epoxy resin represented by the above formula (1) is more preferably represented by the following formula (5). This is because each isopropylidene structure and cross-linking points are closer to each other, so that the rigidity of the molecule is improved due to the steric hindrance, and high elastic modulus and low water absorption are easily exhibited.
- n and the preferable range are the same as those in the formula (1).
- the method for producing the epoxy resin of the present invention is not particularly limited, but it can be obtained, for example, by adding or ring-closing the aromatic amine resin represented by the above formula (6) and epihalohydrin in the presence of a solvent and a catalyst.
- the amount of epihalohydrin used is usually 3.0 to 20.0 mol, preferably 3.5 to 10.0 mol, relative to 1 mol of the amino group of the amine compound.
- Examples of the alkali metal hydroxide that can be used in the epoxidation reaction include sodium hydroxide and potassium hydroxide.
- the alkali metal hydroxide may be a solid substance or an aqueous solution thereof may be used.
- an aqueous solution is used, the aqueous solution of the alkali metal hydroxide is continuously added into the reaction system, and water and epihalohydrin are continuously distilled under reduced pressure or under normal pressure, and further separated to remove water.
- a method of continuously returning epihalohydrin into the reaction system may be used.
- the amount of the alkali metal hydroxide used is usually 0.9 to 2.5 mol, preferably 0.95 to 1.5 mol, based on 1 mol of the amino group of the amine compound.
- a quaternary ammonium salt such as tetramethylammonium chloride, tetramethylammonium bromide, or trimethylbenzylammonium chloride may be added as a catalyst.
- the amount of the quaternary ammonium salt used is usually 0.1 to 15 g, preferably 0.2 to 10 g, based on 1 mol of the amino group of the amine compound. If the amount used is too small, a sufficient reaction promoting effect cannot be obtained, and if the amount used is too large, the amount of quaternary ammonium salt remaining in the epoxy resin increases, which may cause deterioration of electrical reliability.
- alcohols such as methanol, ethanol and isopropyl alcohol
- an aprotonic polar solvent such as dimethyl sulfone, dimethyl sulfoxide, tetrahydrofuran and dioxane
- the amount used is usually 2 to 50% by weight, preferably 4 to 20% by weight, based on the amount of epihalohydrin used.
- an aprotic polar solvent it is usually 5 to 100% by weight, preferably 10 to 80% by weight, based on the amount of epihalohydrin used.
- the reaction temperature is usually 30 to 90 ° C, preferably 35 to 80 ° C.
- the reaction time is usually 0.5 to 100 hours, preferably 1 to 30 hours.
- the reaction product is washed with water, or without washing with water, the epihalohydrin, solvent, etc. are removed under heating and reduced pressure.
- the recovered epoxy resin is dissolved in a solvent such as toluene and methyl isobutyl ketone, and an aqueous solution of an alkali metal hydroxide such as sodium hydroxide and potassium hydroxide is added. It is also possible to carry out a reaction to ensure ring closure.
- the amount of the alkali metal hydroxide used is usually 0.01 to 0.3 mol, preferably 0.05 to 0.2 mol, based on 1 mol of the amino group of the amine compound used for glycidylation.
- the reaction temperature is usually 50 to 120 ° C., and the reaction time is usually 0.5 to 24 hours.
- the produced salt is removed by filtration, washing with water, or the like, and the solvent is further distilled off under heating and reduced pressure to obtain the epoxy resin of the present invention.
- the epoxy resin of the present invention is usually in the form of a liquid to solid resin at room temperature, and its softening point is preferably 100 ° C. or lower, more preferably 80 ° C. or lower. When the softening point is higher than 100 ° C., the viscosity is high and the fiber impregnation is reduced during the preparation of the prepreg.
- the epoxy equivalent is preferably 142 to 1000 g / eq, more preferably 150 to 500 g / eq, particularly preferably 170 to 450 g / eq, and most preferably 180 to 400 g / eq.
- the epoxy resin represented by the formula (1) can be used alone or in combination with other epoxy resins.
- the proportion of the epoxy resin represented by the formula (1) in the total epoxy resin is preferably 10 to 98% by weight, more preferably 20 to 95% by weight, still more preferably 30 to 95% by weight. %.
- Examples of the curing agent that can be used in the epoxy resin composition of the present invention include amine compounds, acid anhydride compounds, amide compounds, and phenol compounds. Specific examples of the curing agent that can be used include, for example, o-phenylenediamine, m-phenylenediamine, p-phenylenediamine, 4,4'-diaminodiphenylsulfone, 3,4'-diaminodiphenylsulfone, 3,3'-diamino.
- Aromatic amine compounds such as the aromatic amine compound described in 1 and Synthesis Example 2, 1,3-bis (aminomethyl) cyclohexane, isophorondiamine, 4,4'-methylenebis (cyclohexylamine), norbornandiamine, ethylenediamine, propane.
- Examples thereof include aliphatic diamines such as diamine, tetramethylenediamine, pentamethylenediamine, hexamethylenediamine, dimerdiamine and triethylenetetramine, but the present invention is not limited to this and may be suitably used depending on the characteristics desired to be imparted to the composition. can.
- an aromatic amine it is preferable to use an aromatic amine to secure the pot life, and it is preferable to use an aliphatic amine when it is desired to impart immediate curability.
- an amine compound containing a bifunctional component as a main component as a curing agent, a highly linear network can be constructed during the curing reaction, and particularly excellent toughness can be exhibited.
- amide compounds such as polyamide resin synthesized from dimer of dicyandiamide and linolenic acid and ethylenediamine; phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydro.
- Acid anhydride compounds such as phthalic anhydride, methylnadic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride; bisphenols (bisphenol A, bisphenol F, bisphenol S, biphenol, bisphenol AD, etc.) or phenols ( Phenol, alkyl-substituted phenol, aromatic-substituted phenol, naphthol, alkyl-substituted naphthol, dihydroxybenzene, alkyl-substituted dihydroxybenzene, dihydroxynaphthalene, etc.
- bisphenols bisphenol A, bisphenol F, bisphenol S, biphenol, bisphenol AD, etc.
- aldehydes formaldehyde, acetaldehyde, alkylaldehyde, benzaldehyde, alkyl-substituted benzaldehyde, hydroxybenzaldehyde, naphtho
- aldehyde glutaaldehyde, phthalaldehyde, crotonaldehyde, cinnamaldehyde, etc., or the phenols and various diene compounds (dicyclopentadiene, terpenes, vinylcyclohexene, norbornadien, vinylnorbornene, tetrahydroinden, divinylbenzene).
- the amount of the curing agent used is preferably 0.5 to 1.5 equivalents, particularly preferably 0.6 to 1.2 equivalents, relative to 1 equivalent of the epoxy group of the epoxy resin. Good cured physical properties can be obtained by setting the amount to 0.5 to 1.5 equivalents.
- a curing accelerator When performing a curing reaction using the above curing agent, a curing accelerator may be used in combination.
- the curing accelerator that can be used include imidazoles such as 2-methylimidazole, 2-ethyl imidazole, 2-phenyl imidazole, and 2-ethyl-4-methyl imidazole, 2- (dimethylaminomethyl) phenol, and triethylenediamine.
- Triethanolamine such as 1,8-diazabicyclo (5,4,0) undecene-7
- organic phosphines such as triphenylphosphine, diphenylphosphine, tributylphosphine, metal compounds such as tin octylate, Tetra-substituted phosphonium-tetra-substituted borates such as tetraphenylphosphonium / tetraphenylborate, tetraphenylphosphonium / ethyltriphenylborate, 2-ethyl-4-methylimidazole / tetraphenylborate, tetras such as N-methylmorpholin / tetraphenylborate, etc.
- Examples thereof include carboxylic acid compounds such as phenylboron salt, benzoic acid, phthalic acid, isophthalic acid, terephthalic acid, naphthoic acid and salicylic acid.
- a carboxylic acid compound such as salicylic acid is preferable from the viewpoint of accelerating the curing reaction between the amine compound and the epoxy resin.
- the curing accelerator 0.01 to 15 parts by weight is used as necessary with respect to 100 parts by weight of the epoxy resin.
- an inorganic filler can be added to the epoxy resin composition of the present invention as needed.
- the inorganic filler include powders such as crystalline silica, molten silica, alumina, zircon, calcium silicate, calcium carbonate, silicon carbide, silicon nitride, boron nitride, zirconia, fosterite, steatite, spinel, titania, and talc, or these.
- powders such as crystalline silica, molten silica, alumina, zircon, calcium silicate, calcium carbonate, silicon carbide, silicon nitride, boron nitride, zirconia, fosterite, steatite, spinel, titania, and talc, or these.
- examples thereof include, but are not limited to, spherical beads and the like. These may be used alone or may use two or more kinds.
- the amount of these inorganic fillers used varies depending on the application, but when used for semiconductor encapsulants, for example, the cured product of the epoxy resin composition has heat resistance, moisture resistance, mechanical properties, flame retardancy, etc. From the surface, it is preferably used in a proportion of 20% by weight or more in the epoxy resin composition, more preferably 30% by weight or more, and particularly 70 to 95% by weight in order to improve the linear expansion coefficient with the lead frame. It is more preferable to use it in a proportion.
- the epoxy resin composition of the present invention can be blended with a mold release agent in order to improve the mold release from the mold at the time of molding.
- a mold release agent can be used, but for example, ester waxes such as carnauba wax and montan wax, fatty acids such as stearic acid and partiminic acid, metal salts thereof, and polyolefins such as polyethylene oxide and non-polyethylene oxide. Examples include waxes. These may be used alone or in combination of two or more.
- the blending amount of these release agents is preferably 0.5 to 3% by weight based on the total organic components. If it is less than this, the mold release from the mold will be poor, and if it is too large, the adhesion to the lead frame or the like will be poor.
- a coupling agent can be added to the epoxy resin composition of the present invention in order to enhance the adhesiveness between the inorganic filler and the resin component.
- the coupling agent any conventionally known one can be used, and for example, vinylalkoxysilane, epochionicsilane, styrylalkoxysilane, methacryoxyalkoxysilane, acryloxyalkoxysilane, aminoalkoxysilane, mercaptoalkoxysilane, and isocyanatoalkoxy can be used.
- Examples thereof include various alkoxysilane compounds such as silane, alkoxytitanium compounds, and aluminum chelate. These may be used alone or in combination of two or more.
- the surface of the inorganic filler may be treated with the coupling agent in advance and then kneaded with the resin, or the coupling agent may be mixed with the resin and then the inorganic filler may be kneaded. ..
- a known additive can be added to the epoxy resin composition of the present invention, if necessary.
- the additives include polybutadiene and modified products thereof, modified products of acrylonitrile copolymer, polyphenylene ether, polystyrene, polyethylene, polyimide, fluororesin, maleimide-based compound, cyanate ester-based compound, silicone gel, and silicone oil.
- colorants such as carbon black, phthalocyanine blue, and phthalocyanine green.
- the epoxy resin composition of the present invention is obtained by uniformly mixing each of the above components.
- the epoxy resin composition of the present invention can be easily obtained as a cured product by the same method as a conventionally known method.
- the epoxy resin and the curing agent, and if necessary, the curing accelerator, the inorganic filler, the mold release agent, the silane coupling agent, and the additive are uniformly used using an extruder, a kneader, a roll, or the like as necessary.
- the epoxy resin composition of the present invention is obtained by sufficiently mixing, and this is molded by a melt casting method, a transfer molding method, an injection molding method, a compression molding method, etc., and further at 80 to 200 ° C. for 2 to 10 hours.
- a cured product can be obtained by heating to.
- the epoxy resin composition of the present invention may contain a solvent, if necessary.
- the epoxy resin composition (epoxy resin varnish) containing a solvent is impregnated with a fibrous substance (base material) such as glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber, and paper, and heated and dried to obtain prepreg. By press molding, a cured product of the epoxy resin composition of the present invention can be obtained.
- the solvent content of this epoxy resin composition is usually about 10 to 70% by weight, preferably about 15 to 70% by weight by internal division.
- solvent examples include ⁇ -butyrolactones, N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, N, N-dimethylimidazolidinone and other amide solvents; Ethereal solvents such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether monoacetate, propylene glycol monobutyl ether, preferably lower (1 to 3 carbon atoms) alkylene glycol mono or di-lower (1 carbon number) ⁇ 3) Alkyl ether; Ketone-based solvent such as methyl ethyl ketone and methyl isobutyl ketone, preferably di-lower (1 to 3 carbon atoms) alkyl ketone in which two alkyl groups may be the same or different; aromatic-based such as toluene and xylene. Examples include solvents. These may be alone or may be
- a sheet-shaped adhesive (sheet of the present invention) can be obtained by applying the epoxy resin varnish on the release film, removing the solvent under heating, and performing B-stage formation.
- This sheet-like adhesive can be used as an interlayer insulating layer in a multilayer substrate or the like.
- thermosetting resins such as epoxy resins are used are mentioned, for example, adhesives, paints, coating agents, molding materials (including sheets, films, FRP, etc.), insulating materials (printed circuit boards, etc.). (Including wire coating, etc.), sealants, additives to other resins, etc. can be mentioned.
- adhesives for civil engineering, construction, automobiles, general office work, medical use examples include adhesives for electronic materials.
- adhesives for electronic materials include interlayer adhesives for multilayer substrates such as build-up substrates, die bonding agents, adhesives for semiconductors such as underfills, underfills for BGA reinforcement, and anisotropic conductive films (these are adhesives).
- ACF an adhesive for mounting such as an anisotropic conductive paste (ACP) and the like can be mentioned.
- Sealants include potting for capacitors, transistors, diodes, light emitting diodes, ICs, LSIs, dipping, transfer mold encapsulation, potting encapsulation for ICs, COBs, COFs, TABs, etc., and flip chips. Examples include underfilling for IC packages such as QFP, BGA, and CSP, and sealing (including reinforcing underfilling) when mounting IC packages.
- the present invention will be described in more detail by way of examples, but in the following, the parts are parts by weight unless otherwise specified.
- the present invention is not limited to these examples.
- the epoxy equivalent was measured by a method according to JIS K-7236, and the softening point was measured by a method according to JIS K-7234.
- the extracted toluene and water were returned to the system, and 88 parts of a 30% sodium hydroxide aqueous solution was added for neutralization. Then, the organic layer was washed with water and concentrated until the waste liquid became neutral to obtain 458 parts of the aromatic amine resin (A1).
- the amine equivalent of the aromatic amine resin (A1) was 185 g / eq, and the softening point was 58.7 ° C.
- Example 1 186 parts of aromatic amine resin (A1), 555 parts of epichlorohydrin, 55 parts of methanol, 5 parts of water obtained in Synthesis Example 1 while performing nitrogen purging on a flask equipped with a thermometer, a cooling tube, a fractionation tube and a stirrer. .5 parts were added and reacted at 77 ° C. for 8 hours. The internal temperature was cooled to 65 ° C., and 81 parts of sodium hydroxide was added in portions over 90 minutes. The reaction was continued at 65 ° C. for 3 hours, 500 parts of water was added, sodium chloride in the organic layer was removed, and the mixture was concentrated under reduced pressure at 120 ° C.
- HPLC analysis measure wavelength: 274 nm
- 2,2'-(1,3-phenylenedisopropridene) bis (1,3-phenylenedisopropyridene) in n 1 body.
- Diglycidylaniline) is 31.2 area%
- 2,4'-(1,3-phenylenedisopropyridene) bis diglycidylaniline
- 4,4'-(1,3-phenylene) Disopropyridene) bis (diglycidyl aniline) was 33.0 area%.
- each isopropridene bond among the epoxy resins represented by the 2,2'-(1,3-phenylenedisopropyridene) bis (diglycidylaniline) (formula (2)) contained in EP1 is in the meta position.
- (Replaced) is 19.0 area%
- each isopropylidene bond is (Replaced with meta position) is 19.7 area%
- 4,4'-(1,3-phenylenedisopropyridene) bis (diglycidylaniline) each isopropi among the epoxy resins represented by the formula (4)).
- (Reden bond replaced with meta position) was 20.1 area%.
- Example 2 Comparative Examples 1 and 2] Epoxy resins (EP1, EP2) and epoxy resins (EP3; RE-304S, manufactured by Nippon Kayaku Co., Ltd.) obtained in Example 1 and Reference Example 1, and 4,4'-methylenebis (2,) as a curing agent.
- 6-Diethylaniline manufactured by Tokyo Kasei Co., Ltd., abbreviation: MDEA
- MDEA Methylaniline
- Table 1 shows the results of measuring the evaluation test pieces under the following conditions.
- Example 2 had high heat resistance, high bending strength, high elastic modulus, and low water absorption.
- the epoxy resin of the present invention is an insulating material for electrical and electronic parts (highly reliable semiconductor encapsulation material, etc.), a laminated board (printed wiring board, BGA board, build-up board, etc.), and an adhesive (conductive adhesive, etc.). It is useful for various composite materials such as CFRP and paints, and is particularly useful for various composite material applications such as CFRP that strongly require high elasticity.
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Epoxy Resins (AREA)
Abstract
La présente invention concerne une résine époxyde et une composition de résine époxyde qui donnent des objets durcis ayant une résistance élevée à la chaleur, un module élevé et une faible absorption d'eau. La résine époxyde est représentée par la formule (1), et a une teneur totale en résines époxydes représentées respectivement par les formules (2) à (4) de 80 % en surface ou moins. (Dans la formule (1), n est le nombre de répétitions et la moyenne de celles-ci est 1<n<5.)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020237009096A KR20230107539A (ko) | 2020-11-19 | 2021-11-11 | 에폭시 수지, 경화성 수지 조성물, 및 그 경화물 |
CN202180063925.9A CN116234851A (zh) | 2020-11-19 | 2021-11-11 | 环氧树脂、硬化性树脂组合物、及其硬化物 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020192138A JP7256160B2 (ja) | 2020-11-19 | 2020-11-19 | エポキシ樹脂、エポキシ樹脂組成物、およびその硬化物 |
JP2020-192138 | 2020-11-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2022107678A1 true WO2022107678A1 (fr) | 2022-05-27 |
Family
ID=81708066
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2021/041534 WO2022107678A1 (fr) | 2020-11-19 | 2021-11-11 | Résine époxyde, composition de résine durcissable et objet durci obtenu à partir de celle-ci |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP7256160B2 (fr) |
KR (1) | KR20230107539A (fr) |
CN (1) | CN116234851A (fr) |
TW (1) | TW202221054A (fr) |
WO (1) | WO2022107678A1 (fr) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62155242A (ja) * | 1985-12-27 | 1987-07-10 | Mitsui Petrochem Ind Ltd | ビス(p−アミノクミル)ベンゼン類の製造方法 |
JPS62155241A (ja) * | 1985-12-27 | 1987-07-10 | Mitsui Petrochem Ind Ltd | ビス(p−アミノクミル)ベンゼン類の製造方法 |
JPS62260819A (ja) * | 1986-01-22 | 1987-11-13 | シエル・インタ−ナシヨネイル・リサ−チ・マ−チヤツピイ・ベ−・ウイ | 熱硬化性組成物 |
JPH01215822A (ja) * | 1987-12-31 | 1989-08-29 | Shell Internatl Res Maatschappij Bv | 芳香族ジアミン硬化剤からなるエポキシ樹脂 |
WO2020054601A1 (fr) * | 2018-09-12 | 2020-03-19 | 日本化薬株式会社 | Résine de maléimide, composition de résine durcissable, et produit durci de celle-ci |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5215909B2 (ja) | 2009-02-27 | 2013-06-19 | 富士フイルム株式会社 | ラビング用布材及びそれを用いたラビング処理方法 |
-
2020
- 2020-11-19 JP JP2020192138A patent/JP7256160B2/ja active Active
-
2021
- 2021-11-11 WO PCT/JP2021/041534 patent/WO2022107678A1/fr active Application Filing
- 2021-11-11 KR KR1020237009096A patent/KR20230107539A/ko active Search and Examination
- 2021-11-11 CN CN202180063925.9A patent/CN116234851A/zh active Pending
- 2021-11-11 TW TW110142034A patent/TW202221054A/zh unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62155242A (ja) * | 1985-12-27 | 1987-07-10 | Mitsui Petrochem Ind Ltd | ビス(p−アミノクミル)ベンゼン類の製造方法 |
JPS62155241A (ja) * | 1985-12-27 | 1987-07-10 | Mitsui Petrochem Ind Ltd | ビス(p−アミノクミル)ベンゼン類の製造方法 |
JPS62260819A (ja) * | 1986-01-22 | 1987-11-13 | シエル・インタ−ナシヨネイル・リサ−チ・マ−チヤツピイ・ベ−・ウイ | 熱硬化性組成物 |
JPH01215822A (ja) * | 1987-12-31 | 1989-08-29 | Shell Internatl Res Maatschappij Bv | 芳香族ジアミン硬化剤からなるエポキシ樹脂 |
WO2020054601A1 (fr) * | 2018-09-12 | 2020-03-19 | 日本化薬株式会社 | Résine de maléimide, composition de résine durcissable, et produit durci de celle-ci |
Also Published As
Publication number | Publication date |
---|---|
CN116234851A (zh) | 2023-06-06 |
TW202221054A (zh) | 2022-06-01 |
JP7256160B2 (ja) | 2023-04-11 |
KR20230107539A (ko) | 2023-07-17 |
JP2022080916A (ja) | 2022-05-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2010001427A (ja) | エポキシ樹脂、エポキシ樹脂組成物、およびその硬化物 | |
JP5273762B2 (ja) | エポキシ樹脂、エポキシ樹脂組成物およびその硬化物 | |
TWI425019B (zh) | Liquid epoxy resin, epoxy resin composition and hardened product | |
TWI438216B (zh) | 變性液性環氧樹脂、以及使用該樹脂的環氧樹脂組成物及其硬化物 | |
JP7185383B2 (ja) | 硬化性樹脂組成物およびその硬化物 | |
JP5366263B2 (ja) | フェノールアラルキル樹脂、エポキシ樹脂組成物及びその硬化物 | |
JP4544496B2 (ja) | エポキシ樹脂、エポキシ樹脂組成物及びその硬化物 | |
JP7268256B1 (ja) | エポキシ樹脂、硬化性樹脂組成物、およびその硬化物 | |
WO2022209642A1 (fr) | Résine époxy et son procédé de production, composition de résine durcissable, et produit durci de celle-ci | |
WO2018123806A1 (fr) | Résine contenant un groupe alcényle, composition de résine durcissable et produit durci à base de celles-ci | |
JP2017082213A (ja) | エポキシ樹脂組成物、硬化物、半導体素子、樹脂シート、プリプレグ及び炭素繊維強化複合材料 | |
JP7240989B2 (ja) | 硬化性樹脂組成物およびその硬化物 | |
JP7185384B2 (ja) | エポキシ樹脂、硬化性樹脂組成物、およびその硬化物 | |
WO2022107678A1 (fr) | Résine époxyde, composition de résine durcissable et objet durci obtenu à partir de celle-ci | |
JP4628621B2 (ja) | フェノールアラルキル樹脂の製造方法 | |
JP5220488B2 (ja) | エポキシ樹脂、エポキシ樹脂組成物、およびその硬化物 | |
JP7230285B1 (ja) | エポキシ樹脂、硬化性樹脂組成物、およびその硬化物 | |
JP2022147099A (ja) | エポキシ樹脂、硬化性樹脂組成物、およびその硬化物 | |
JP2010053293A (ja) | エポキシ樹脂組成物 | |
JP4776446B2 (ja) | エポキシ樹脂、エポキシ樹脂組成物、およびその硬化物 | |
JP2007045978A (ja) | エポキシ樹脂、エポキシ樹脂組成物、およびその硬化物 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 21894552 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 21894552 Country of ref document: EP Kind code of ref document: A1 |