WO2022083209A1 - 掩膜板的修复方法 - Google Patents

掩膜板的修复方法 Download PDF

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Publication number
WO2022083209A1
WO2022083209A1 PCT/CN2021/109402 CN2021109402W WO2022083209A1 WO 2022083209 A1 WO2022083209 A1 WO 2022083209A1 CN 2021109402 W CN2021109402 W CN 2021109402W WO 2022083209 A1 WO2022083209 A1 WO 2022083209A1
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WO
WIPO (PCT)
Prior art keywords
strip
mask
strips
shielding
blocking
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Application number
PCT/CN2021/109402
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English (en)
French (fr)
Inventor
刘景涛
Original Assignee
云谷(固安)科技有限公司
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Publication date
Application filed by 云谷(固安)科技有限公司 filed Critical 云谷(固安)科技有限公司
Publication of WO2022083209A1 publication Critical patent/WO2022083209A1/zh
Priority to US18/152,285 priority Critical patent/US20230160053A1/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/14Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
    • H05K3/143Masks therefor

Definitions

  • the present application relates to the technical field of mask equipment, in particular to a method for repairing a mask.
  • the evaporation process in the process of preparing an organic light emitting diode (OLED, Organic Light-Emitting Diode) display panel is one of the core processes for preparing an OLED display panel.
  • OLED Organic Light-Emitting Diode
  • the evaporation precision of the evaporation material to be evaporated on the evaporation substrate has an important influence on the evaporation effect.
  • the low evaporation precision will lead to the phenomenon of partial deposition of the evaporated material on the to-be-evaporated area, resulting in the color mixing problem of the OLED display panel, and then Affects the display effect of the display panel.
  • the mask strips on the mask plate are deformed, so that a plurality of pattern evaporation areas on the mask strips are deformed, which affects the evaporation precision.
  • the method of replacing the deformed mask strip is used to improve the evaporation precision, but the mask strip is expensive and takes a long time to replace the mask strip, so that the cost of the display panel is high and the production efficiency is low.
  • Embodiments of the present application provide a method for repairing a mask plate, which aims to reduce the cost and repair time of the mask plate repair process, thereby improving the production efficiency of the display panel and reducing the production cost of the display panel.
  • An embodiment of the present application provides a method for repairing a mask plate.
  • the mask plate includes a frame frame having an opening, a plurality of first blocking strips and a plurality of mask strips.
  • the frame and the right frame, and the opposite upper frame and lower frame in the second direction, the first blocking strip and the mask strip are fixed on the upper frame and the lower frame, and the method includes:
  • the number of the second shielding strips is determined through the database according to the outward expansion deformation amount of the mask strip that is expanded and deformed outward along the second direction in the mask strip deformation region. A more accurate inward retraction and repair of the mask strip that expands and deforms along the second direction is realized, so that the mask strip that expands and deforms along the second direction is repaired to a state without deformation in the second direction.
  • the pulling force along the second direction applied to the second shielding strip is controlled during the processing of the second shielding strip, so that when the second shielding strip is connected to the upper frame and the lower frame, the outwardly expanded and deformed mask strip is along the second direction. Retracted inward to a state without deformation in the second direction, and in the mask strip deformation area, the mask strips distributed in the gap from the second blocking strip to the left border direction are different from the second blocking strip to the right border direction. The mask strips distributed in the gaps are outwardly deformed.
  • the mask strip has an outward expansion pre-deformation in the first direction, which compensates the concave deformation of the mask strip in the first direction caused by the sagging of the mask plate during the actual evaporation process, and improves the evaporation precision.
  • Embodiments of the present application provide a method for repairing a mask plate, including the steps of identifying the deformation area of the mask strip and replacing the mask strip.
  • the pulling force provided by the second shielding strip to the upper frame and the lower frame of the mask plate to move closer to each other causes the mask strip to expand and deform in the second direction and retract inward along the second direction, Therefore, the mask strip with outward expansion deformation along the second direction is at least restored to a state of no deformation along the second direction, especially no outward expansion deformation, so that the pattern evaporation area on the mask strip is restored to a state along the second direction.
  • the direction has no deformation, especially no outward expansion deformation.
  • the mask strips in the mask plate have no outward expansion deformation along the second direction, which improves the evaporation precision of the evaporation process.
  • the mask repairing method provided by the embodiments of the present application avoids the phenomenon that the evaporation material is deposited on the evaporation substrate, thereby avoiding problems such as color mixing on the display panel, and optimizing the display effect of the display panel.
  • the mask plate is repaired only by replacing the second shielding strip instead of directly replacing the mask strip having the outward expansion deformation along the second direction.
  • the mask repairing method provided by the embodiment of the present application can greatly save the material cost of the mask repairing process.
  • the mask plate In the deformation area of the mask plate, the mask plate can be repaired by replacing part of the shielding strips, and it is not necessary to replace all the shielding strips.
  • the time required for the repairing method of the mask plate in the embodiment of the present application is shorter than that of the common repairing method of the mask plate that replaces all the mask strips having the outward expansion deformation along the second direction.
  • the method for repairing the mask plate in the embodiment of the present application does not need to replace all the blocking strips; The alignment process is simpler, so that the time cost for the overall repair of the mask plate is reduced.
  • the repair method of the mask plate in the embodiment of the present application shortens the repair time of the mask plate in the process of multiple use as a whole, improves the repair efficiency of the mask plate, thereby improves the efficiency of preparing and producing multiple display panels, and improves the performance of the display panel. capacity.
  • FIG. 1 is a schematic flowchart of a method for repairing a mask plate according to an embodiment of the present application
  • FIG. 2 is a schematic structural diagram of a mask plate repaired by a method for repairing a mask plate in an embodiment of the present application
  • FIG. 3 is a schematic structural diagram of a mask plate obtained by repairing a mask plate by a method for repairing a mask plate in another embodiment of the present application;
  • FIG. 4 is a schematic structural diagram of an unrepaired mask.
  • the inventor found that during the evaporation process, the temperature change caused the outward expansion and deformation of the mask strip; when the mask plate was made, the deviation of the force applied to the mask strip opening process would also cause the mask strip to expand outward. deformed.
  • the outward expansion deformation of the mask strips on the mask plate along the stretching direction of the meshing process is common.
  • the inventor proposes the present application, and the following describes the repairing method of the mask plate 1 in the embodiment of the present application in detail with reference to FIG. 1 to FIG. 4 .
  • the embodiment of the present application provides a repair method for the mask plate 1, including:
  • the mask strip deformation area A is identified, and the area in the mask plate 1 having the mask strip 13 that is expanded and deformed along the second direction Y is identified as the mask strip deformation area A.
  • the mask plate 1 includes a frame frame 11 having an opening, a plurality of first blocking strips 14 and a plurality of mask strips 12 , and the frame frame 11 includes a left frame 111 and a right frame opposite in the first direction X 112 , and the upper frame 113 and the lower frame 114 opposite to each other in the second direction Y, a plurality of first shielding strips 14 and a plurality of masking strips 12 are fixed to the upper frame 113 and the lower frame 114 .
  • a plurality of first shielding bars 14 are distributed along the first direction X at intervals, and each first shielding bar 14 is connected to the upper frame 113 and the lower frame 114 .
  • the mask strips 12 are correspondingly disposed at the gaps formed by two adjacent first blocking strips 14 , and the mask strips 12 are also connected to the upper frame 113 and the lower frame 114 .
  • the mask strip 12 is provided with a plurality of pattern evaporation areas 15 distributed along the second direction Y, and the pattern evaporation area 15 is provided with a plurality of pixel openings, which are not shown in FIG. 2 .
  • FIG. 2 and FIG. 4 only illustrate a situation of a mask strip deformation area as an example.
  • the mask strip deformation area A is located at any position of the mask plate 1, for example, at the center of the mask plate 1, or at the left side of the mask plate 1 in the first direction X. position, or the position on the right side of the mask plate 1 in the first direction X.
  • the mask strip deformation area A includes a mask strip 13 that is outwardly deformed along the second direction Y and a mask strip that does not have outward expansion deformation along the second direction Y.
  • one or more mask strip deformation regions A are included in the mask plate.
  • the second shielding strips 16 are firstly subjected to a netting process, that is, the second shielding strips 16 will generate a force that stretches outward along the second direction Y.
  • the second blocking strip 16 replaces at least part of the first blocking strip 14 in the mask strip deformation area A and is connected to the upper frame 113 and the lower frame 114 , the second blocking strip 16 will return inward along the second direction Y Therefore, the upper frame 113 and the lower frame 114 are driven to retract inward along the second direction Y, and the mask strip 13 that has been expanded and deformed outwardly in the second direction Y is further retracted inward along the second direction Y.
  • the embodiment of the present application provides a method for repairing the mask plate 1, including the step S110 of identifying the deformation area A of the mask strip and the step of S120 of replacing the mask strip.
  • the upper frame 113 and the lower frame 114 of the mask plate 1 are provided with a pulling force to move closer to each other through the second blocking strip 16, so that the mask strip 13 that has been expanded and deformed in the second direction Y is retracted inward in the second direction Y, thereby
  • the mask strip 13 that has been expanded and deformed along the second direction Y is at least restored to a state of no deformation along the second direction Y, especially no expansion deformation, so that the pattern evaporation area 15 on the mask strip is restored to a state along the second direction Y.
  • the second direction Y has no deformation, especially no outward expansion deformation.
  • the mask strips 12 in the mask plate 1 repaired by this repair method do not have outward expansion deformation along the second direction Y, which improves the evaporation precision of the evaporation process, thereby avoiding the occurrence of evaporation of the evaporation material on the evaporation substrate.
  • the phenomenon that the vapor deposition material is biased can avoid problems such as color mixing on the display panel, and optimize the display effect of the display panel.
  • the mask plate 1 is repaired by replacing the first masking strip 14 with the second masking strip 16 instead of directly replacing the masking strip 13 that is outwardly deformed along the second direction Y.
  • the material cost of the repairing process of the mask plate 1 can be greatly saved by using the method for repairing the mask plate 1 provided in the embodiment of the present application.
  • the mask plate 1 in the mask strip deformation area A, the mask plate 1 can be repaired by replacing part of the first blocking strips 14 , without replacing all the first blocking strips 14 .
  • the meshing process alignment time required is shorter.
  • the processing and alignment process of the 16 meshes of the second shielding strip is simpler, and the overall repair time and cost of the mask plate 1 is reduced.
  • the repair process of the mask plate 1 in the embodiment of the present application shortens the repair time of the mask plate 1 in the process of multiple use, improves the repair efficiency of the mask plate 1, thereby improves the efficiency of preparing multiple display panels, and improves the performance of the display panel. capacity.
  • step S110 of identifying the deformation area A of the mask strip in the step S110 of identifying the deformation area A of the mask strip,
  • the mask strip deformation area A includes n first blocking strips 14 distributed with continuous gaps in the first direction X, and n-1 mask strips 13 correspondingly disposed in the gaps that expand and deform outward along the second direction Y, wherein n greater than or equal to 2.
  • the mask strips 13 distributed in the mask plate 1 along the continuous gap along the first direction X and having the outward expansion deformation along the second direction Y and the mask strips 13 with the outward expansion deformation along the second direction Y are arranged in each strip
  • the first blocking strips 14 on the left and right sides of the mask strip 13 are identified as a mask strip deformation area A.
  • the mask strip deformation area A at least part of the first shielding strip 14 is replaced with the second shielding strip 16 , so that the second shielding strip 16 provides the upper frame 113 and the lower frame 114 with a relatively close pulling force. Then, the upper frame 113 and the lower frame 114 are relatively moved inward along the second direction Y, and the mask strips 13 that are distributed in the continuous gap and are expanded and deformed outward along the second direction Y are directly driven to return inward along the second direction Y toward the opening.
  • the deformation state of the mask strip 13 that is expanded and deformed outward along the second direction Y can be adjusted more quickly and accurately.
  • step S120 of replacing the blocking strip in step S120 of replacing the blocking strip:
  • the second shielding strips 16 are symmetrically distributed with respect to the center line of the mask strip deformation area A in the first direction X as the axis of symmetry.
  • the second shielding strips 16 when the second shielding strips 16 are disposed on the mask plate 1, they are symmetrically distributed in the mask strip deformation area A with the center line of the mask strip deformation area A in the first direction X as the axis of symmetry .
  • the second shielding strip 16 provides a pulling force for the upper frame 113 and the lower frame 114 of the mask plate 1 , and the pulling force takes the center line of the deformation area A of the mask strip in the first direction X as the axis of symmetry, and is symmetrically distributed over the deformation of the mask strip District A. Therefore, the pulling force provided by each of the second shielding bars 16 to the upper frame 113 and the lower frame 114 to be relatively close to each other is substantially the same.
  • the part of the upper frame 113 and the lower frame 114 in the deformation area A of the mask strip is under the force of the second blocking strip 16, the upper frame 113 and the lower frame 114 are both displaced towards the opening, thereby driving the deformation area of the mask strip.
  • the mask strips 13 that are expanded and deformed outward along the second direction Y are all retracted and reset along the second direction Y toward the inside of the opening.
  • Improve the outward expansion and deviation of the pattern evaporation area 15 caused by the original outer expansion deformation of the mask strip 13 in the second direction Y, and the alignment of the mask plate 1 and the evaporation substrate is not accurate.
  • the problem of low vapor deposition accuracy The problem of low vapor deposition accuracy.
  • the second blocking strips 16 are symmetrically distributed in the mask strip deformation area A, so that the force provided by the second blocking strips 16 to the upper frame 113 and the lower frame 114 in the mask strip deformation area A is equal to the mask strip deformation area A
  • the center line in the first direction X is symmetrical about the axis of symmetry, which is more conducive to driving the mask strips 13 in the mask strip deformation area A that expand and deform along the second direction Y to return to the opening along the second direction Y. retracted position.
  • step S120 of replacing the blocking strip in step S120 of replacing the blocking strip:
  • the second blocking strip 16 is located at the center of the deformation area A of the mask strip in the first direction X. As shown in FIG.
  • the second shielding strip 16 provides a relatively close pulling force to the upper frame 113 and the lower frame 114 located at the center of the mask strip deformation area A, and then the outward expansion deformation mask strips 13 located on the left and right sides of the mask strip deformation area A Both can be retracted inward along the second direction Y.
  • step S120 of replacing the blocking strip in step S120 of replacing the blocking strip:
  • At least two second shielding strips 16 are located in the central part and are distributed in the first direction X with continuous gaps. Since the second shielding strip 16 is located at the center and the gaps are distributed, this arrangement is beneficial to provide a relatively close pulling force to the upper frame 113 and the lower frame 114, and can easily drive the outwardly expanding and deforming mask strips 13 along the second direction Y Retract inward.
  • step S120 of replacing the blocking strip in step S120 of replacing the blocking strip:
  • At least one replacement mask strip 12 is made to replace at least one mask strip located at the center portion, and the replaced mask strip 12 is disposed between adjacent second barrier strips 16 at the center portion.
  • the efficiency of the mask repair process can be improved under the condition of reasonable cost control.
  • the mask strip located at the central portion is the mask strip 13 that is outwardly expanded and deformed along the second direction Y.
  • step S120 of replacing the occluder bar in step S120 of replacing the occluder bar:
  • At least one mask strip 13 expanded and deformed outward in the second direction Y is torn off at the central portion of the mask strip deformation area A in the first direction X. As shown in FIG.
  • 16 second shielding strips are arranged on the upper frame 113 and the lower frame 114 for alignment and connection, and the position of the second shielding strip 16 on the mask plate 1 is the same as that of the first shielding strip that has been torn off. 14 is set in the same position on the mask plate 1.
  • the frame frame 11 does not exert a force along the second direction Y, that is, the replaced mask strip 12 does not cause the frame to have a force in the second direction Y. deformation.
  • the first shielding strip 14 is located below the masking strip 12, it is more difficult to tear off the first shielding strip 14 directly, so in these examples, you can choose to tear off a small amount, such as a strip along the second direction
  • the method of expanding the deformed mask strip 13 outward and then tearing off the first blocking strip 14 improves the efficiency of the step S120 of replacing the blocking strip.
  • the repairing method further includes establishing a database, where the database includes the outward expansion deformation amount of the mask strip 13 in the mask strip deformation area A that is expanded and deformed along the second direction Y, the second blocking strip 16 A three-dimensional curve between the value of the pulling force along the second direction Y and the number of the second blocking strips 16 applied to the second blocking strips 16 during the net-stretching process.
  • the number of the second shielding bars 16 is positively correlated with the pulling force provided by the entire second shielding bars 16 to the upper frame 113 and the lower frame 114 to be relatively close together. Therefore, the number of the second shielding strips 16 is positively correlated with the retraction deformation amount of the masking strips 13 which are outwardly expanded and deformed along the second direction Y and are retracted inwardly along the second direction Y.
  • the outward expansion deformation amount of the mask strip 13 that expands and deforms outward along the second direction Y is positively correlated with the retraction deformation amount that the mask strip 13 needs to retract inward along the second direction Y for the outward expansion deformation along the second direction Y.
  • the value of the pulling force along the second direction Y applied to the second shielding strips 16 during the processing of the second shielding strips 16 and the outwardly deformed mask along the second direction Y The amount of retraction deformation of the strip 13 inwardly retracted along the second direction Y is positively correlated.
  • the outward expansion deformation amount of the mask strip 13 that expands and deforms outward along the second direction Y is positively correlated with the retraction deformation amount that the mask strip 13 needs to retract inward along the second direction Y for the outward expansion deformation along the second direction Y .
  • the step of establishing the database can be carried out before the step S110 of identifying the deformation area A of the mask strip, and the database is obtained by repeated experiments, with accuracy and reference, and the experimental conditions and parameters are the same as when the mask is repaired. same or roughly similar.
  • step S120 of replacing the blocking strip in step S120 of replacing the blocking strip:
  • the number of the first blocking strips 14 to be replaced in the mask strip deformation area A is determined through the database.
  • the data in the database is searched to determine the set in the mask strip 13 that needs to be replaced.
  • the number of the first blocking strips 14 in the mask strip deformation area A is used to control the mask strip 13 that expands and deforms outward along the second direction Y and retracts inward along the second direction Y until the mask strip is in the second direction Y A state without deformation.
  • step S120 of replacing the blocking strip in step S120 of replacing the blocking strip:
  • the edge applied to the second mask strip 16 during the processing of the second mask strip 16 is determined through the database.
  • the tensile force value in the second direction Y is searched in the database to determine the second 16 meshes of the blocking strip.
  • step S120 of replacing the blocking strip in step S120 of replacing the blocking strip,
  • the pulling force along the second direction Y applied to the second shielding strips 16 is controlled, so that when the second shielding strips 16 are connected to the upper frame 113 and the lower frame 114, the pulling force along the second direction Y is The mask strip 13 that has expanded and deformed outwardly is retracted inward along the second direction Y to a state in which the mask strip has no deformation in the second direction Y. As shown in FIG.
  • the mask plate 1 controls the connection and arrangement of the second shielding strips 16 by controlling the pulling force along the second direction Y applied to the second shielding strips 16 through the repairing method of the masking plate provided in the embodiment of the present application.
  • the second blocking strip 16 provides a pulling force for the upper frame 113 and the lower frame 114 to be relatively close to each other, thereby controlling the displacement of the upper frame 113 and the lower frame 114 toward the opening of the frame frame 11 during the relatively close process. Then, the retraction deformation amount of the mask strip 13 that is expanded and deformed outwardly along the second direction Y and retracts inwardly along the second direction Y is controlled.
  • step S120 of replacing the blocking strip in step S120 of replacing the blocking strip,
  • the pulling force along the second direction Y applied to the second shielding strips 16 is controlled, so that when the second shielding strips 16 are connected to the upper frame 113 and the lower frame 114, the pulling force along the second direction Y is The mask strip 13 that has expanded and deformed outwardly is retracted inward along the second direction Y to a state of no deformation in the second direction Y.
  • the mask strips 12 distributed from the second blocking strip 16 to the left frame 111 and the mask strips 12 distributed from the second blocking strip 16 to the right frame 112 are facing outward. Convex deformation.
  • the inventors have further studied and found that during the evaporation process, the cooling plate in the evaporation device will press down the evaporation substrate, and the evaporation substrate and the mask plate 1 are both subjected to the pressure of the cooling plate and during evaporation During the process, since the evaporation substrate and the mask plate 1 are under the action of their own gravity, the mask plate 1 and the evaporation substrate that is aligned and attached to the mask plate 1 all have a phenomenon of sagging.
  • the mask 1 and the vapor deposition substrate are arranged in alignment and contact, and the vapor deposition substrate is located on the upper side of the mask 1 , when both the mask 1 and the vapor deposition substrate hang down, the vapor deposition substrate is opposite to the mask 1 .
  • the mask plate 1 Under the action of the above-mentioned frictional force and pressing force, the mask plate 1 generates corresponding pressing stress and frictional stress in opposite directions in the first direction X. Under the action of the extrusion stress and frictional stress, the mask strips 12 on the mask plate 1 are relatively deformed.
  • the mask strips 12 symmetrically distributed with the centerline of the mask 1 in the first direction X as the symmetry axis are concavely deformed toward the centerline of the mask 1 in the first direction X.
  • the phenomenon of plating deviation occurs, that is, the deposition precision of the evaporation material after evaporation is low, which makes the OLED display panel display poor display effects such as color mixing during the display process.
  • the pulling force along the second direction Y applied to the second shielding bar 16 is controlled in the step of replacing the shielding bar, so that the second shielding bar 16 is connected to the upper frame 113 and the lower frame
  • the mask strip 13 that expands and deforms outward that is, the mask strip 13 that expands and deforms outward along the second direction Y
  • the mask strips 12 distributed from the second blocking strip 16 to the left frame 111 and the mask strips 12 distributed from the second blocking strip 16 to the right frame 112 are facing outward. Convex deformation.
  • the mask strip 12 on the mask plate 1 has a compensation pre-deformation along the first direction X, and the compensation pre-deformation offsets the deformation along the first direction X caused by the sagging of the mask plate 1 during the evaporation process, so as to avoid During the evaporation process of the mask plate 1, due to the deformation along the first direction X, evaporation deviation occurs, the evaporation precision of the evaporation process is low, and the display panel display has problems such as color mixing.
  • FIG. 4 shows a schematic structural diagram of an unrepaired mask plate in an example.
  • the repair method of the mask plate 1 includes:
  • the mask plate 1 includes a frame frame 11 with an opening, a plurality of first blocking strips 14 , and a plurality of mask strips 12
  • the frame frame 11 includes a frame frame 11 opposite to each other in the first direction X
  • the left frame 111 and the right frame 112, and the opposite upper frame 113 and lower frame 114 in the second direction Y, a plurality of first blocking strips 14 and a plurality of mask strips 12 are fixed on the upper frame 113 and the lower frame 114
  • the region of the mask plate 1 where the three mask strips 13 are expanded and deformed outward along the second direction Y is identified as the mask strip deformation region A. As shown in FIG.
  • the two first blocking strips 14 located at the central portion of the mask strip deformation area A in the first direction X are selected to be replaced.
  • this embodiment is described by using the second blocking strips 16 to replace the two first blocking strips 14 in the mask strip deformation area A as an example.
  • the control applied to the above-mentioned two second shielding strips 16 along the first causes the second shielding strip 16 to be connected to the upper frame 113 and the lower frame 114, and the masking strip 13 that expands and deforms outward along the second direction Y retracts inward along the second direction Y to the second direction
  • the state with no deformation in the Y direction that is, from the mask strip 13 that is outwardly deformed along the second direction Y to the mask strip 12 that has no deformation in the second direction Y.
  • step S120 of replacing the shielding strips in the process of processing the 16 second shielding strips 16 meshes, the control applied to the above-mentioned two second shielding strips 16 along the first
  • the pulling force in the two directions Y causes the second shielding strip 16 to be connected to the upper frame 113 and the lower frame 114, and the masking strip 13 that expands and deforms outward along the second direction Y retracts inward along the second direction Y to the second direction
  • There is no deformation state on Y and in the mask strip deformation area A, the mask strips 12 distributed from the second blocking strip 16 to the left frame 111 and the mask strips 12 distributed from the second blocking strip 16 to the right frame 112
  • the gap is distributed
  • the mask strips 12 are outwardly deformed in the first direction X relative to each other.

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  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
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  • Metallurgy (AREA)
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  • Electroluminescent Light Sources (AREA)

Abstract

一种掩膜板(1)的修复方法,掩膜板(1)包括具有开口的框式框架(11)、多个第一遮挡条(14)和多个掩膜条(12),框式框架(11)包括在第一方向(X)上相对的左边框(111)和右边框(112),以及在第二方向(Y)上相对的上边框(113)和下边框(114),第一遮挡条(14)及掩膜条(12)固定于上边框(113)和下边框(114)。修复方法包括:识别掩膜条变形区(A),包括将掩膜板(1)中具有沿第二方向(Y)上的外扩变形的掩膜条(13)的区域识别为掩膜条变形区(A);替换遮挡条,包括对第二遮挡条(16)进行张网处理,用第二遮挡条(16)替换掩膜条变形区(A)中的至少部分第一遮挡条(14)并连接至上边框(113)和下边框(114),使外扩变形掩膜条(13)沿第二方向(Y)向开口内回缩。

Description

掩膜板的修复方法
相关申请的交叉引用
本申请要求享有于2020年10月21日提交的名称为“掩膜板的修复方法”的中国专利申请第202011133646.9号的优先权,该申请的全部内容通过引用并入本文中。
技术领域
本申请涉及掩膜板设备技术领域,具体涉及一种掩膜板的修复方法。
背景技术
通常制备有机发光二极管(OLED,Organic Light-Emitting Diode)显示面板过程中蒸镀工艺为制备OLED显示面板的核心工艺之一。掩膜板的蒸镀过程中,蒸镀材料蒸镀到蒸镀基板上的待蒸镀区的蒸镀精度对蒸镀效果有重要影响。蒸镀过程中蒸镀材料蒸镀到蒸镀基板的待蒸镀区时,蒸镀精度低会导致在待蒸镀区上出现蒸镀材料镀偏的现象,造成OLED显示面板的混色问题,进而影响显示面板的显示效果。
在蒸镀过程中,掩膜板上的掩膜条发生变形从而使得掩膜条上的多个图案蒸镀区发生变形,影响蒸镀精度。一般采用替换变形的掩膜条的方法提高蒸镀精度,但是掩膜条价格较高,替换掩膜条所需时间长,使显示面板成本高且生产效率低。
因此急需一种新型的掩膜板的修复方法。
发明内容
本申请实施例提供一种掩膜板的修复方法,旨在降低掩膜板修复过程的成本以及缩短修复时间,从而提高显示面板生产的效率,降低显示面板生产成本。
本申请实施例提供一种掩膜板的修复方法,掩膜板包括具有开口的框式框架、多个第一遮挡条和多个掩膜条,框式框架包括在第一方向上相对的左边框和右边框,以及在第二方向上相对的上边框和下边框,第一遮挡条及掩膜条固定于上边框和下边框,所述方法包括:
识别掩膜条变形区,掩膜板中具有沿第二方向上外扩变形的掩膜条的区域识别为掩膜条变形区;
替换遮挡条,对第二遮挡条进行张网处理,用第二遮挡条替换掩膜条变形区中的至少部分第一遮挡条,并连接至上边框和下边框,使外扩变形掩膜条沿第二方向向内回缩。
根据本申请实施例的前述任一实施方式,替换遮挡条的步骤中:
根据掩膜条变形区中沿第二方向外扩变形的掩膜条的外扩变形量通过数据库确定第二遮挡条的数量。实现对沿第二方向外扩变形的掩膜条更准确的向内回缩修复,使沿第二方向外扩变形的掩膜条在第二方向修复到不具有形变的状态。
根据本申请实施例的前述任一实施方式,替换遮挡条的步骤中,
在第二遮挡条张网处理过程中控制对第二遮挡条施加的沿第二方向的拉力,使第二遮挡条连接于上边框和下边框时,外扩变形的掩膜条沿第二方向向内回缩至在第二方向上不具有形变的状态,且在掩膜条变形区中,从第二遮挡条向左边框方向间隙分布的掩膜条与从第二遮挡条向右边框方向间隙分布的掩膜条相向外凸变形。从而掩膜条在第一方向具有外扩预变形,对在实际的蒸镀过程中因为掩膜版下垂造成的掩膜条在第一方向具有的内凹变形进行补偿,提高蒸镀精度。
本申请实施例提供掩膜板的修复方法,包括识别掩膜条变形区以及替换遮挡条的步骤。在替换遮挡条的步骤中,通过第二遮挡条对掩膜板的上边框和下边框提供的相互靠拢的拉力,使得沿第二方向外扩形变掩膜条沿第二方向向内回缩,从而使得沿第二方向具有外扩形变的掩膜条至少恢复到沿第二方向不具有形变尤其是不具有外扩形变的状态,由此掩膜条上的图案蒸镀区恢复到沿第二方向不具有形变尤其是不具有外扩形变的状态。经过本申请实施例提供的掩膜板修复方法修复的掩膜板,掩膜板中的掩膜 条沿第二方向不具有外扩形变,提高了蒸镀过程的蒸镀精度。本申请实施例提供的掩膜板修复方法避免蒸镀材料蒸镀到蒸镀基板上时出现蒸镀材料镀偏的现象,从而避免显示面板出现混色等问题,优化显示面板的显示效果。在本申请中,只是通过替换第二遮挡条而非直接替换具有沿第二方向外扩形变的掩膜条对掩膜板实现修复。由于遮挡条的价格远低于掩膜条的价格,因此采用本申请实施例提供的掩膜板的修复方法可以大大节约掩膜板修复过程的材料成本。在掩膜板变形区中可以通过替换部分的遮挡条就可以实现对掩膜板的修复,无需替换所有的遮挡条。本申请实施例中掩膜板的修复方法相比普通的替换所有具有沿第二方向外扩形变的掩膜条的掩膜板修复方法所需的时间更短。本申请实施例中掩膜板的修复方法一方面,无需替换所有的遮挡条;另一方面,替换遮挡条相比替换掩膜条所需的张网处理对位时间更短,遮挡条张网处理对位过程更简单,使得掩膜板整体修复的时间成本降低。本申请实施例中掩膜板的修复方法在整体上缩短掩膜板在多次使用过程中的修复时间,提高掩膜板的修复效率进而提高制备生产多个显示面板的效率,提升显示面板的产能。
附图说明
下面将参考附图来描述本申请示例性实施例的特征、优点和技术效果,其中的附图并未按照实际的比例绘制。
图1是本申请一实施例中掩膜板的修复方法的流程示意图;
图2是采用本申请的一实施例中掩膜版的修复方法修复得到的掩膜板的结构示意图;
图3是采用本申请的另一实施例中掩膜板的修复方法修复得到的掩膜板的结构示意图;
图4是一种未进行修复的掩膜板的结构示意图。
具体实施方式
下面将详细描述本申请的各个方面的特征和示例性实施例。在下面的详细描述中,提出了许多具体细节,以便提供对本申请的全面理解。但是,对于本领域技术人员来说很明显的是,本申请可以在不需要这些具体细节中的一些细节的情况下实施。下面对实施例的描述仅仅是为了通过示出本申请的示例来提供对本申请的更好的理解。在附图和下面的描述中,至少部分的公知结构和技术没有被示出,以避免对本申请造成不必要的模糊;并且,为了清晰,可能夸大了部分结构的尺寸。此外,下文中所描述的特征、结构或特性可以以任何合适的方式结合在一个或更多实施例中。
为了更好地理解本申请,下面结合附图对本申请实施方式提供的掩膜板的修复方法进行详细描述。
发明人在长期研究过程中发现:在蒸镀过程中,温度变化引起掩膜条外扩变形;掩膜板制作时,对掩膜条张网处理施力存在偏差也会引起掩膜条外扩变形。在蒸镀过程中,掩膜板上的掩膜条沿张网处理拉伸方向的外扩变形较常见。当掩膜条在使用过程中发生上述沿拉伸方向的外扩变形时,掩膜板上的图案蒸镀区外扩偏位,导致掩膜板与蒸镀基板对位不准,使蒸镀精度低,容易出现蒸镀材料镀偏的问题。为防止蒸镀效果不佳,一般需要对上述外扩变形的掩膜条进行拆卸,用新的掩膜条替换上述外扩变形的掩膜条以实现对掩膜板的修复。即一般需要对沿第二方向Y(具体可参见图2)外扩变形的掩膜条进行拆卸,替换新的掩膜条以实现对掩膜板的修复。但是掩膜条价格高,且重新将替换掩膜条张网处理对位设置在掩膜板的框架上所需时间长。替换多条变形的掩膜板会极大增大蒸镀过程的时间成本以及材料费用,从而增大显示面板的生产成本,降低显示面板的生产效率。
鉴于此,发明人提出本申请,下面结合图1至图4,对本申请实施例中掩膜板1的修复方法进行详细展开说明。
本申请实施例提供掩膜板1的修复方法,包括:
S110,识别掩膜条变形区A,掩膜板1中具有沿第二方向Y外扩变形的掩膜条13的区域识别为掩膜条变形区A。
具体的,掩膜板1包括具有开口的框式框架11、多个第一遮挡条 14、多个掩膜条12,框式框架11包括在第一方向X上相对的左边框111和右边框112,以及在第二方向Y上相对的上边框113和下边框114,多个第一遮挡条14及多个掩膜条12固定于上边框113和下边框114。
S120,替换遮挡条,对第二遮挡条16张网处理,用第二遮挡条16替换掩膜条变形区A中的至少部分第一遮挡条14,第二遮挡条16连接于上边框113和下边框114,使沿第二方向Y外扩变形的掩膜条13沿第二方向Y向内回缩。
具体的,在本申请实施例的掩膜板1中,多个第一遮挡条14沿第一方向X间隔分布,且每个第一遮挡条14连接设置于上边框113和下边框114。掩膜条12对应设置在相邻两个第一遮挡条14形成的间隙处,且掩膜条12也连接设置于上边框113和下边框114。掩膜条12上设置有多个沿第二方向Y分布的图案蒸镀区15,图案蒸镀区15上设置有多个像素开口,图2中未示出多个像素开口。
需要说明的是,图2以及图4仅作为示例示出一种掩膜条变形区的情况。可以理解的是,在一些实施例中掩膜条变形区A位于掩膜板1的任意位置,例如位于掩膜板1的中心部位,或位于掩膜板1在第一方向X上的左侧部位,或位于掩膜板1在第一方向X上的右侧部位。在另一些实施例中,掩膜条变形区A中包括沿第二方向Y外扩变形的掩膜条13以及沿第二方向Y不具有外扩变形的掩膜条。在还一些实施例中,掩膜板中包括一个或者多个掩膜条变形区A。
本申请替换遮挡条的S110步骤中,首先对第二遮挡条16进行张网处理,即第二遮挡条16会产生沿第二方向Y向外拉伸的力。当第二遮挡条16替换掩膜条变形区A中的至少部分第一遮挡条14且连接于上边框113和下边框114上时,第二遮挡条16会产生沿第二方向Y向内回缩的力,从而带动上边框113和下边框114产生沿第二方向Y向内回缩的力,进一步使沿第二方向Y外扩变形的掩膜条13沿第二方向Y向内回缩。
本申请实施例提供掩膜板1的修复方法,包括识别掩膜条变形区A的S110步骤以及替换遮挡条的S120步骤。通过第二遮挡条16对掩膜板1的上边框113和下边框114提供相互靠拢的拉力,使得沿第二方向Y外扩变 形的掩膜条13沿第二方向Y向内回缩,从而使得沿第二方向Y外扩变形的掩膜条13至少恢复到沿第二方向Y不具有形变尤其是不具有外扩形变的状态,由此掩膜条上的图案蒸镀区15恢复到沿第二方向Y不具有形变尤其是不具有外扩形变的状态。经过该修复方法修复的掩膜板1中的掩膜条12沿第二方向Y不具有外扩形变,提高蒸镀过程的蒸镀精度,从而避免蒸镀材料蒸镀到蒸镀基板上时出现蒸镀材料镀偏的现象从而避免显示面板出现混色等问题,优化显示面板的显示效果。通过用第二遮挡条16替换第一遮挡条14,而非直接替换沿第二方向Y外扩变形的掩膜条13对掩膜板1实现修复。由于第二遮挡条16的价格远低于掩膜条12的价格,因此采用本申请实施例提供的掩膜板1的修复方法可以大大节约掩膜板1修复过程的材料成本。且在掩膜条变形区A中可以通过替换部分的第一遮挡条14就可以实现对掩膜板1的修复,无需替换所有的第一遮挡条14。在本申请实施例中掩膜板1的修复过程相比普通的替换所有沿第二方向Y外扩变形的掩膜条13的掩膜板1修复过程所需的张网处理对位时间更短,第二遮挡条16张网处理对位过程更简单,掩膜板1整体修复时间成本降低。本申请实施例中掩膜板1的修复过程缩短掩膜板1在多次使用过程中的修复时间,提高掩膜板1的修复效率,进而提高制备多个显示面板的效率,提升显示面板的产能。
在一些可选的实施例中,识别掩膜条变形区A的S110步骤中,
掩膜条变形区A包括在第一方向X上连续间隙分布的n条第一遮挡条14以及对应设置于间隙的n-1条沿第二方向Y外扩变形的掩膜条13,其中n大于或等于2。在这些实施例中,将掩膜板1中沿第一方向X上连续间隙分布的具有沿第二方向Y外扩变形的掩膜条13以及设置在每条沿第二方向Y外扩变形的掩膜条13左右两侧的第一遮挡条14识别为一个掩膜条变形区A。在该掩膜条变形区A中用第二遮挡条16对至少部分的第一遮挡条14进行替换,使得第二遮挡条16向上边框113和下边框114提供相对靠拢的拉力。继而上边框113和下边框114沿第二方向Y进行向内的相对靠拢过程中,直接带动连续间隙分布的沿第二方向Y外扩变形的掩膜条13沿第二方向Y朝向开口内回缩,可以更快速准确地调节沿第二方向 Y外扩变形的掩膜条13的变形状态。
在一些可选的实施例中,替换遮挡条的S120步骤中:
第二遮挡条16以掩膜条变形区A在第一方向X上的中心线为对称轴对称分布。
在这些实施例中,第二遮挡条16设置在掩膜板1上时,以掩膜条变形区A在第一方向X上的中心线为对称轴,对称分布于掩膜条变形区A中。第二遮挡条16为掩膜板1的上边框113以及下边框114提供拉力,该拉力以掩膜条变形区A在第一方向X上的中心线为对称轴,对称分布于掩膜条变形区A。从而,各第二遮挡条16向上边框113和下边框114提供相对靠拢的拉力基本相同。上边框113和下边框114在掩膜条变形区A中的部分在第二遮挡条16施力作用下,上边框113和下边框114均发生朝向开口内的位移,从而带动掩膜条变形区A中沿第二方向Y外扩变形的掩膜条13均沿第二方向Y朝向开口内进行回缩复位。改善沿第二方向Y外扩变形的掩膜条13原有的外扩形变带来的图案蒸镀区15外扩偏位,掩膜板1与蒸镀基板对位不准,蒸镀过程中蒸镀精度低的问题。第二遮挡条16是对称分布于掩膜条变形区A中,使得在掩膜条变形区A内第二遮挡条16对上边框113和下边框114提供的作用力以掩膜条变形区A在第一方向X上的中心线为对称轴左右对称,更有利于带动掩膜条变形区A中沿第二方向Y外扩变形的掩膜条13均沿第二方向Y朝向开口内进行回缩复位。
在一些可选的实施例中,替换遮挡条的S120步骤中:
第二遮挡条16位于掩膜条变形区A在第一方向X上的中心部位。第二遮挡条16对位于掩膜条变形区A中心部位的上边框113和下边框114提供相对靠拢的拉力,则位于掩膜条变形区A左、右两侧的外扩变形掩膜条13均可沿第二方向Y向内回缩。
在一些可选的实施例中,替换遮挡条的S120步骤中:
至少两条第二遮挡条16位于中心部位且在第一方向X上连续间隙分布。由于第二遮挡条16位于中心部位且间隙分布,此种设置方式有利于对上边框113和下边框114提供相对靠拢的拉力,能轻松带动外扩变形掩膜条13均可沿第二方向Y向内回缩。
在一些可选的实施例中,替换遮挡条的S120步骤中:
使至少一条替换的掩膜条12替换至少一条位于中心部位的掩膜条,且替换的掩膜条12设置于中心部位处的相邻第二遮挡条16之间。可以在合理控制成本的情况下,提高掩膜板修复过程的效率。在一些示例中,位于中心部位的掩膜条为沿第二方向Y外扩变形的掩膜条13。
在这些实施例的一些示例中,替换遮挡条的S120步骤中:
首先,在掩膜条变形区A在第一方向X上的中心部位处撕离至少一条沿第二方向Y外扩变形的掩膜条13。
继而,撕离位于上述沿第二方向Y外扩变形的掩膜条13左右两侧相邻设置的第一遮挡条14。
再者,将第二遮挡条16张网处理对位连接设置于上边框113和下边框114,且第二遮挡条16在掩膜板1上设置的位置与上述已经撕离的第一遮挡条14在掩膜板1上设置的位置相同。
最后,先将替换的掩膜条12张网处理对位连接设置于上边框113和下边框114,且替换的掩膜条12在掩膜板1上设置的位置与上述已经撕离的掩膜条在掩膜板1上设置的位置相同。在替换掩膜条的过程中对掩膜板1的框式框架11施加对抗作用力,使得替换的掩膜条12连接设置于上边框113和下边框114时掩膜条12因张网处理过程产生的拉应力被对抗作用力抵消。最终替换的掩膜条12固定设置于上边框113和下边框114时,不对框式框架11施加沿第二方向Y的作用力,即替换的掩膜条12不使框架在第二方向Y具有形变。
因为在这些示例中,第一遮挡条14位于掩膜条12的下方,直接撕离第一遮挡条14的难度较大,因此可以在该些示例中选择先撕离少量例如一条沿第二方向Y外扩变形的掩膜条13,再撕离第一遮挡条14的方式提高替换遮挡条的S120步骤的效率。
在一些可选的实施例中,该修复方法还包括建立数据库,数据库包括掩膜条变形区A中沿第二方向Y外扩变形的掩膜条13的外扩变形量、第二遮挡条16张网处理过程中对第二遮挡条16施加的沿第二方向Y的拉力值和第二遮挡条16的数量这三者之间的三维曲线。
替换每一第一遮挡条14对第二遮挡条16进行张网处理对位过程中,对第二遮挡条16施加的沿第二方向Y的拉伸作用力基本一致时,则在掩膜条变形区A中替换遮挡条后,第二遮挡条16的数量与全体第二遮挡条16向上边框113和下边框114提供相对靠拢的拉力呈正相关。从而第二遮挡条16的数量与沿第二方向Y外扩变形的掩膜条13沿第二方向Y向内回缩的回缩形变量呈正相关。沿第二方向Y外扩变形的掩膜条13的外扩变形量与沿第二方向Y外扩变形的掩膜条13沿第二方向Y需要向内回缩的回缩形变量呈正相关。
当第二遮挡条16的数量不变时,第二遮挡条16张网处理过程中对第二遮挡条16施加的沿第二方向Y的拉力值与沿第二方向Y外扩变形的掩膜条13沿第二方向Y向内回缩的回缩形变量呈正相关。而沿第二方向Y外扩变形的掩膜条13的外扩变形量与沿第二方向Y外扩变形的掩膜条13沿第二方向Y需要向内回缩的回缩形变量呈正相关。
建立数据库的步骤可以在识别掩膜条变形区A的S110步骤之前进行,并且该数据库是反复实验所得,具有准确性和参考性,实验条件和参数与对掩膜板进行修复时的条件和参数相同或大致相似。
在一些可选的实施例中,替换遮挡条的S120步骤中:
根据掩膜条变形区A中沿第二方向Y外扩变形的掩膜条13的外扩变形量,通过数据库确定替换设置于掩膜条变形区A中的第一遮挡条14的数量。在本实施例中,确定掩膜条变形区A中、沿第二方向Y外扩变形的掩膜条13的外扩变形量后,通过在数据库中查找数据,从而确定需要被替换的设置于掩膜条变形区A中的第一遮挡条14的数量,以控制沿第二方向Y外扩变形的掩膜条13沿第二方向Y向内回缩至掩膜条在第二方向Y上不具有形变的状态。
在一些可选的实施例中,替换遮挡条的S120步骤中:
根据掩膜条变形区A中沿第二方向Y外扩变形的掩膜条13的外扩变形量,通过数据库确定第二遮挡条16张网处理过程中、对第二遮挡条16施加的沿第二方向Y的拉力值。在本实施例中,确定掩膜条变形区A中沿第二方向Y外扩变形的掩膜条13的外扩变形量后,通过在数据库中查找 数据,从而确定第二遮挡条16张网处理过程中对第二遮挡条16施加的沿第二方向Y的拉力值,以控制沿第二方向Y外扩变形的掩膜条13沿第二方向Y向内回缩至掩膜条在第二方向Y上不具有形变的状态。
在一些可选的实施例中,请参见图2,替换遮挡条的S120步骤中,
在第二遮挡条16张网处理过程中控制对第二遮挡条16施加的沿第二方向Y的拉力,使第二遮挡条16连接于上边框113和下边框114时,沿第二方向Y外扩变形的掩膜条13沿第二方向Y向内回缩至掩膜条在第二方向Y上不具有形变的状态。
在这些实施例中,掩膜板1经本申请实施例提供的掩膜板的修复方法,通过控制对第二遮挡条16施加的沿第二方向Y的拉力,控制第二遮挡条16连接设置于上边框113和下边框114时,第二遮挡条16向上边框113和下边框114提供相对靠拢的拉力,从而控制上边框113和下边框114相对靠拢过程中朝向框式框架11开口内的位移量,继而控制沿第二方向Y外扩变形的掩膜条13沿第二方向Y向内回缩的回缩变形量。
在一些可选的实施例中,请参见图3,替换遮挡条的S120步骤中,
在第二遮挡条16张网处理过程中控制对第二遮挡条16施加的沿第二方向Y的拉力,使第二遮挡条16连接于上边框113和下边框114时,沿第二方向Y外扩变形的掩膜条13沿第二方向Y向内回缩至在第二方向Y上不具有形变的状态。
且,在掩膜条变形区A中,从第二遮挡条16向左边框111方向间隙分布的掩膜条12与从第二遮挡条16向右边框112方向间隙分布的掩膜条12相向外凸变形。
在这些实施例中,发明人进一步研究发现,在蒸镀过程中,蒸镀装置中的冷却板会下压蒸镀基板,蒸镀基板以及掩膜板1都受到冷却板的压力且在蒸镀过程中由于蒸镀基板和掩膜板1受自身重力作用,使得掩膜板1以及与之对位贴合的蒸镀基板都具有下垂的现象。由于掩膜板1和蒸镀基板对位贴合接触设置,蒸镀基板位于掩膜板1的上侧,因此当掩膜板1和蒸镀基板均下垂时,蒸镀基板对掩膜板1施加在第一方向X上、方向相反的挤压作用力以及施加在第一方向X上、方向相反的摩擦力。在上述摩擦 力以及挤压作用力的作用下,掩膜板1自身在第一方向X上产生对应的方向相反的挤压应力和摩擦应力。又在该挤压应力以及摩擦应力的作用下掩膜板1上的掩膜条12发生相对形变。即,以掩膜板1于第一方向X上的中心线为对称轴对称分布的掩膜条12,发生朝向掩膜板1于第一方向X上的中心线的内凹形变。蒸镀材料蒸镀到蒸镀基板上的待蒸镀区时出现镀偏现象,即蒸镀后蒸镀材料镀膜精度低,使OLED显示面板显示过程中呈现混色等不良显示效果。
如图3所示,在这些实施例中,在替换遮挡条的步骤中控制对第二遮挡条16施加的沿第二方向Y的拉力,使第二遮挡条16连接于上边框113和下边框114时,外扩变形的掩膜条即沿第二方向Y外扩变形的掩膜条13沿第二方向Y向内回缩至在第二方向Y上不具有形变的状态。且,在掩膜条变形区A中,从第二遮挡条16向左边框111方向间隙分布的掩膜条12与从第二遮挡条16向右边框112方向间隙分布的掩膜条12相向外凸变形。则使得掩膜板1上的掩膜条12具有沿第一方向X的补偿预变形,该补偿预变形与蒸镀过程中因掩膜板1下垂造成沿第一方向X的变形相抵,从而避免掩膜板1在蒸镀过程中因为具有沿第一方向X的变形而出现蒸镀偏位,蒸镀过程蒸镀精度低,显示面板显示出现混色等问题。
请参见图4,图4示出了一个示例中一种未进行修复的掩膜板的结构示意图,在该示例中掩膜板1的修复方法包括:
S110:识别掩膜条变形区A,掩膜板1包括具有开口的框式框架11、多个第一遮挡条14、多个掩膜条12,框式框架11包括在第一方向X上相对的左边框111和右边框112,以及在第二方向Y上相对的上边框113和下边框114,多个第一遮挡条14及多个掩膜条12固定于上边框113和下边框114,掩膜板1中3条沿第二方向Y外扩变形的掩膜条13的区域识别为掩膜条变形区A。
示例性的,以掩膜条变形区A中有3条沿第二方向Y外扩变形的掩膜条13为例。
S120:替换遮挡条,对第二遮挡条16进行张网处理,使2条第二遮挡条16替换掩膜条变形区A中的2条第一遮挡条14,第二遮挡条16连接 于上边框113和下边框114设置,且向上边框113和下边框114提供相对靠拢的拉力,使3条沿第二方向Y外扩变形的掩膜条13沿第二方向Y向内回缩。
在该示例中,选择替换掉位于掩膜条变形区A在第一方向X上的中心部位的两条第一遮挡条14。
示例性的,本实施例以用第二遮挡条16替换掩膜条变形区A中的2条第一遮挡条14为例进行阐述。
在一个具体例子中,请一并参见图2及图4,在替换遮挡条的S120步骤中,在第二遮挡条16张网处理过程中控制对上述2条第二遮挡条16施加的沿第二方向Y的拉力,使第二遮挡条16连接于上边框113和下边框114时,沿第二方向Y外扩变形的掩膜条13沿第二方向Y向内回缩至在第二方向Y上不具有形变的状态,即从沿第二方向Y外扩变形的掩膜条13变为在第二方向Y上不具有形变的掩膜条12。
在另一个具体例子中,请一并参见图3及图4,替换遮挡条的S120步骤中,在第二遮挡条16张网处理过程中控制对上述2条第二遮挡条16施加的沿第二方向Y的拉力,使第二遮挡条16连接于上边框113和下边框114时,沿第二方向Y外扩变形的掩膜条13沿第二方向Y向内回缩至在第二方向Y上不具有形变的状态,且在掩膜条变形区A中,从第二遮挡条16向左边框111方向间隙分布的掩膜条12与从第二遮挡条16向右边框112方向间隙分布的掩膜条12在第一方向X上相向外凸变形。
本领域技术人员应能理解,上述实施例均是示例性而非限制性的。在不同实施例中出现的不同技术特征可以进行组合,以取得有益效果。本领域技术人员在研究附图、说明书及权利要求书的基础上,应能理解并实现所揭示的实施例的其他变化的实施例。权利要求中出现的多个部分的功能可以由一个单独的硬件或软件模块来实现。某些技术特征出现在不同的从属权利要求中并不意味着不能将这些技术特征进行组合以取得有益效果。

Claims (12)

  1. 一种掩膜板的修复方法,所述掩膜板包括具有开口的框式框架、多个第一遮挡条和多个掩膜条,所述框式框架包括在第一方向上相对的左边框和右边框,以及在第二方向上相对的上边框和下边框,所述第一遮挡条及所述掩膜条固定于所述上边框和下边框,所述方法包括:
    识别掩膜条变形区,包括将所述掩膜板中具有沿所述第二方向上外扩变形的掩膜条的区域识别为所述掩膜条变形区;
    替换遮挡条,包括对第二遮挡条进行张网处理,用所述第二遮挡条替换所述掩膜条变形区中的至少部分所述第一遮挡条,并连接至所述上边框和所述下边框,使所述外扩变形掩膜条沿所述第二方向向所述开口内回缩。
  2. 根据权利要求1所述的修复方法,其中,所述替换遮挡条的步骤中:
    所述第二遮挡条以所述掩膜条变形区在所述第一方向上的中心线为对称轴对称分布。
  3. 根据权利要求1或2所述的修复方法,其中,所述替换遮挡条的步骤中:
    所述第二遮挡条位于所述掩膜条变形区在所述第一方向上的中心部位。
  4. 根据权利要求3所述的修复方法,其中,所述替换遮挡条的步骤中:
    至少两条所述第二遮挡条位于所述中心部位且在所述第一方向上连续间隙分布。
  5. 根据权利要求4所述的修复方法,其中,所述替换遮挡条的步骤中:
    使至少一条替换的掩膜条替换至少一条位于所述中心部位的所述外扩变形掩膜条,且所述替换的掩膜条设置于所述中心部位处的相邻所述第二遮挡条之间。
  6. 根据权利要求5所述的修复方法,其中,所述使至少一条替换的掩膜条替换至少位于所述中心部位的所述外扩变形掩膜条的步骤包括:
    在所述掩膜条变形区于所述第一方向上的所述中心部位处撕离至少一条沿所述第二方向变形的所述外扩变形掩膜条;
    撕离所述外扩变形掩膜条左右两侧相邻设置的所述第一遮挡条;
    将所述第二遮挡条张网处理对位连接设置于所述上边框和所述下边框,所述第二遮挡条在所述掩膜板上设置的位置与已撕离的所述第一遮挡条在所述掩膜板上设置的位置相同;
    将所述替换的掩膜条张网处理对位连接设置于所述上边框和所述下边框,所述替换的掩膜条在所述掩膜板上设置的位置与已经撕离的所述外扩变形掩膜条在所述掩膜板上设置的位置相同。
  7. 根据权利要求1所述的修复方法,包括:
    建立数据库,所述数据库包括所述掩膜条变形区中沿所述第二方向外扩变形的掩膜条的外扩变形量、所述第二遮挡条张网处理过程中对所述第二遮挡条施加的沿所述第二方向的拉力值和所述第二遮挡条的数量这三者之间的三维曲线。
  8. 根据权利要求7所述的修复方法,其中,所述替换遮挡条的步骤中:
    根据所述掩膜条变形区中沿所述第二方向外扩变形的掩膜条的外扩变形量通过所述数据库确定所述第二遮挡条的数量。
  9. 根据权利要求7所述的修复方法,其中,所述替换遮挡条的步骤中:
    根据所述掩膜条变形区中沿所述第二方向外扩变形的掩膜条的外扩变形量通过所述数据库确定所述第二遮挡条张网处理过程中对所述第二遮挡条施加的沿所述第二方向的拉力值。
  10. 根据权利要求1所述的修复方法,其中,所述替换遮挡条的步骤中,
    在所述第二遮挡条张网处理过程中控制对所述第二遮挡条施加的沿所述第二方向的拉力,
    使所述第二遮挡条连接于所述上边框和所述下边框时,所述外扩变形的掩膜条沿所述第二方向向内回缩至在所述第二方向上不具有形变的状态。
  11. 根据权利要求1所述的修复方法,其中,所述替换遮挡条的步骤中,
    在所述第二遮挡条张网处理过程中控制对所述第二遮挡条施加的沿所述第二方向的拉力,使所述第二遮挡条连接于所述上边框和所述下边框时,
    所述外扩变形的掩膜条沿所述第二方向向内回缩至在所述第二方向上不具有形变的状态,且在所述掩膜条变形区中,从所述第二遮挡条向所述左边框方向间隙分布的所述掩膜条与从所述第二遮挡条向所述右边框方向间隙分布的所述掩膜条相向外凸变形。
  12. 根据权利要求1所述的修复方法,其中,所述识别掩膜条变形区的步骤中,
    所述掩膜条变形区包括在所述第一方向上连续间隙分布的n条所述第一遮挡条以及对应设置于间隙的n-1条沿所述第二方向外扩变形的所述外扩变形掩膜条,其中n大于或等于2。
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