WO2022021732A1 - 超高压洗净装置 - Google Patents

超高压洗净装置 Download PDF

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Publication number
WO2022021732A1
WO2022021732A1 PCT/CN2020/135180 CN2020135180W WO2022021732A1 WO 2022021732 A1 WO2022021732 A1 WO 2022021732A1 CN 2020135180 W CN2020135180 W CN 2020135180W WO 2022021732 A1 WO2022021732 A1 WO 2022021732A1
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Prior art keywords
plunger pump
ultra
high pressure
gas
cleaning device
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PCT/CN2020/135180
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English (en)
French (fr)
Inventor
蒋新
陈宽政
陈国才
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苏州晶洲装备科技有限公司
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Publication of WO2022021732A1 publication Critical patent/WO2022021732A1/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids

Definitions

  • the present application belongs to the flat panel display industry and a cleaning device, for example, relates to an ultra-high pressure cleaning device used for cleaning the surface of a glass substrate.
  • the present application provides an ultra-high pressure cleaning device, which can remove particles with smaller particle size on the surface of the object to be cleaned.
  • An embodiment provides an ultra-high pressure cleaning device, including: a supply pipe; A vent, the vent end is connected with a carbon dioxide inlet pipe; a plunger pump, the plunger pump is connected to the outlet of the supply pipe, and the plunger pump is driven by a motor; a filter tank, the filter tank is connected to the an outlet of the plunger pump; and a discharge pipe, the discharge pipe is connected to the liquid outlet of the filter tank.
  • a flow regulating valve is arranged between the different parts.
  • the pumping pressure of the plunger pump is adjustable.
  • the adjustable range of the pumping pressure of the plunger pump is 100kg/cm 2 -150kg/cm 2 .
  • an electrical conductivity meter is further provided on the supply pipe, and the electrical conductivity meter is located downstream of the connecting position of the gas-liquid membrane pipe.
  • the filter tank is provided with a filter tank exhaust pipe.
  • a cleaning solution (such as pure water) is supplied to the plunger pump through a supply pipe, and after being pressurized by the plunger pump, it is filtered through a filter tank, and the cleaning solution is atomized by ultra-high pressure and refined. It removes liquid molecules, improves the removal rate of small particle size particles, and improves the cleaning effect of products.
  • Carbon dioxide is dissolved into the cleaning solution through the gas-liquid film tube, and the carbon dioxide is dissolved in the cleaning solution, and the dissociated hydrogen ions and bicarbonate ions suppress the static electricity generated in the cleaning solution, thereby reducing the metal on the substrate surface caused by the electrostatic current.
  • the wire or film partially dissolves.
  • FIG. 1 is a schematic perspective view of an ultra-high pressure cleaning device according to an embodiment of the present application.
  • Fig. 2 is the structural representation of plunger pump suction pipeline
  • FIG. 3 is a schematic structural diagram of the outlet pipeline of the plunger pump.
  • the ultra-high pressure cleaning device includes a supply pipe 1 , a gas-liquid film pipe 2 , a plunger pump, a filter tank 5 and a discharge pipe 6 , wherein the plunger pump is connected to the action end of the motor 4 and is driven by the motor 4 .
  • the cleaning liquid is supplied from the supply pipe 1, and the cleaning liquid in this example is ultrapure water.
  • a solenoid valve 10 is provided in the supply pipe 1, and the solenoid valve 10 is provided to control the opening and closing of the flow path. As shown in FIG. 2 , the cleaning liquid is supplied to the plunger pump 3 , and the cleaning liquid is pressurized by the plunger pump 3 .
  • the pressurized cleaning liquid is filtered by the filter tank 5 and then discharged from the discharge pipe 6 to the nozzle 12 .
  • the pressure of the water is increased to 150kg/cm 2 through the plunger pump 3, this pressure can be adjusted according to the actual demand, the adjustable range is 100kg/cm 2 -150kg/cm 2 , the ultrapure water is filtered out after the plunger pump 3 After the tank 5 is filtered, it is finally sprayed out from the high-pressure nozzle 12 through the high-pressure hose 13 to achieve the purpose of cleaning.
  • the ultra-pure water is atomized with ultra-high pressure to refine the liquid molecules, improve the removal rate of small-sized particles, and improve the cleaning effect of products.
  • ultrapure water has a high resistance value, it is easy to generate static electricity after being ejected by high pressure, causing particles to adhere or current to be generated in pure water, which in turn leads to partial dissolution of metal wires or films on the substrate surface.
  • 3 Add gas-liquid membrane tube 2 to the pipeline.
  • the two ends (liquid contact ends) of the gas-liquid membrane tube 2 are connected to different parts of the supply pipe 1 , and the cleaning liquid is introduced from the supply pipe 1 .
  • the gas-liquid membrane tube 2 also has a venting end, and the venting end is connected with a carbon dioxide access tube 7, and carbon dioxide is introduced into the gas-liquid membrane tube 2 through the carbon dioxide access tube 7, and a gas-liquid membrane is arranged in the gas-liquid membrane tube 2, so that carbon dioxide passes through.
  • High pressure penetrates into the cleaning fluid.
  • the gas CO is dissolved in the ultrapure water, and the dissociated hydrogen ions and bicarbonate ions are dissolved in the ultrapure water by CO to suppress the static electricity generated in the
  • a conductivity meter 9 is also provided on the supply pipe 1 , and the conductivity meter 9 is located downstream of the position where the gas-liquid membrane pipe 2 is connected, so as to monitor the dissolution of carbon dioxide in the cleaning liquid.
  • the gas-liquid membrane tube 2 and the supply tube 1 have two connections, and a flow regulating valve 8 is arranged in the supply tube 1 between these two connections, so as to adjust the flow rate of a section of the pipeline in parallel with the gas-liquid membrane tube 2 .
  • the filter tank 5 is connected to the outlet of the plunger pump 3 and is arranged to receive the liquid flowing out from the plunger pump 3 . Moreover, two filter tanks 5 are provided, and the two filter tanks 5 are arranged in series, thereby forming two-stage filtration and improving the filtering effect.
  • the filter tank 5 is also provided with a filter tank exhaust pipe 11, and the filter tank exhaust pipe 11 is arranged to discharge the gas in the cleaning liquid.
  • the discharge pipe 6 is connected to the liquid outlet of the filter tank 5 , as shown in FIG. 1 , the discharge pipe 6 is connected to the nozzle 12 through a hose 13 .
  • the pressure of the liquid is increased by the plunger pump 3, so that the cleaning liquid is sprayed with ultra-high pressure to realize atomization, refine the liquid molecules, and improve the removal rate of small-sized particles. , to improve the cleaning effect of the product.
  • Carbon dioxide is dissolved into the cleaning solution through the gas-liquid membrane tube 2, and the carbon dioxide dissociates into hydrogen ions and bicarbonate ions in the cleaning solution, suppressing the static electricity in the ultrapure water, and protecting the surface of the substrate to be cleaned.

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  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

一种超高压洗净装置，包括：供给管(1)；气液膜管(2)，所述气液膜管(2)的接液两端连接所述供给管(1)的相异部位，所述气液膜管(2)还具有通气端，所述通气端连接有二氧化碳接入管(7)；柱塞泵(3)，所述柱塞泵(3)连接在所述供给管(1)的出口，所述柱塞泵(3)由电机(4)驱动；过滤罐(5)，所述过滤罐(5)连接在所述柱塞泵(3)的出口；及排出管(6)，所述排出管(6)连接所述过滤罐(5)的出液口。减小了由于静电电流导致的基板面上金属导线或薄膜部分溶解。

Description

超高压洗净装置
本申请要求申请日为2020年7月29日、申请号为202010745911.2的中国专利申请的优先权，该申请的全部内容通过引用结合在本申请中。
技术领域
本申请属于平板显示器行业及一种洗净装置，例如涉及一种用于玻璃基板表面清洗的超高压洗净装置。
背景技术
相关技术中，针对小粒径颗粒，洗净方式一般采用的设计有二流体、MS等，但随着平板显示器产品的升级，对平板显示器的制造工艺要求更高，需要清除更小粒径颗粒，而相关技术无法有效提升产品良率。
发明内容
本申请提供了一种超高压洗净装置，可去除被清洗物表面更小粒径的颗粒。
一实施例提供了一种超高压洗净装置，包括：供给管；气液膜管，所述气液膜管的两端连接所述供给管的相异部位，所述气液膜管还具有通气端，所述通气端连接有二氧化碳接入管；柱塞泵，所述柱塞泵连接在所述供给管的出口，所述柱塞泵由电机驱动；过滤罐，所述过滤罐连接在所述柱塞泵的出口；及排出管，所述排出管连接所述过滤罐的出液口。
在一实施例中，所述相异部位之间设置有流量调节阀。
在一实施例中，所述柱塞泵的泵出压力为可调节设置。
在一实施例中，所述柱塞泵的泵出压力可调整范围为100kg/cm 2-150kg/cm 2。
在一实施例中，所述过滤罐设置有两个，且为串联设置。
在一实施例中，所述供给管上还设置有电导度计，所述电导度计位于所述气液膜管所连接位置的下游。
在一实施例中，所述过滤罐上设置有滤罐排气管。
本申请的超高压洗净装置，通过供给管向柱塞泵供给清洗液(比如纯水)，经过柱塞泵的加压后，通过过滤罐过滤，清洗液以超高压被雾化，细化了液体分子，提升小粒径颗粒的去除率，提高产品洗净效果。通过气液膜管向清洗液 中溶入二氧化碳，通过二氧化碳溶解于清洗液中，解离的氢离子及重碳酸离子压制清洗液中静电产生，从而减小了由于静电电流导致的基板面上金属导线或薄膜部分溶解。
附图说明
附图中：
图1是本申请一实施例的超高压洗净装置的示意性透视图；
图2是柱塞泵吸入管路的结构示意图；
图3是柱塞泵吐出口管路的结构示意图。
其中，附图标记说明如下：
1、供给管；
2、气液膜管；
3、柱塞泵；
4、电机；
5、过滤罐；
6、排出管；
7、二氧化碳接入管；
8、流量调节阀；
9、电导度计；
10、电磁阀；
11、滤罐排气管；
12、喷嘴；
13、软管。
具体实施方式
在本申请的描述中，需要说明的是，术语“中心”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”、“第三”仅用于描述目的，而不能理解为指示或暗示相对重要性。
此外，下面所描述的本申请不同实施方式中所涉及的技术特征只要彼此之间未构成冲突就可以相互结合。
如图1所示，超高压洗净装置包括供给管1、气液膜管2、柱塞泵、过滤罐5以及排出管6，其中，柱塞泵连接在电机4作用端，由电机4驱动。
其中，从供给管1供给清洗液，本例清洗液为超纯水。供给管1中设置有电磁阀10，该电磁阀10设置为控制流路的通断。如图2，清洗液供给到柱塞泵3，通过柱塞泵3对清洗液进行增压。
如图1，增压后的清洗液经过过滤罐5过滤后从排出管6排出到喷嘴12上。
通过柱塞泵3将水的压力提高至150kg/cm 2，此压力可根据实际需求调整，可调整范围100kg/cm 2-150kg/cm 2，超纯水从柱塞泵3出来后再经过滤罐5过滤后，经由高压软管13，最后由高压喷嘴12喷出，达到洗净目的。以超高压将超纯水雾化，细化液体分子，提升小粒径颗粒的去除率，提高产品洗净效果。
因超纯水具有高电阻值，经过高压喷出后，易产生静电，造成颗粒附着或纯水中产生电流，进而导致基板面上金属导线或薄膜部分溶解，故在超纯水至柱塞泵3管路上增加气液膜管2。气液膜管2的两端(接液端)连接供给管1的相异部位，从供给管1引入清洗液。气液膜管2还具有通气端，通气端连接有二氧化碳接入管7，通过二氧化碳接入管7将二氧化碳引入气液膜管2，气液膜管2中设置有气液膜，使二氧化碳通过高压渗入清洗液中。气体CO溶解于超纯水中，通过CO溶解超纯水中，解离的氢离子及重碳酸离子，压制超纯水中静电产生。
如图2，供给管1上还设置有电导度计9，电导度计9位于气液膜管2所连接位置的下游，从而监测清洗液中二氧化碳溶解情况。
气液膜管2与供给管1有两个连接处，这两个连接处之间的供给管1中设置有流量调节阀8，从而调节与气液膜管2并联的一段管路流量。
如图3，过滤罐5连接在柱塞泵3的出口，并设置为接收从柱塞泵3流出的液体。且过滤罐5设置有两个，这两个过滤罐5为串联设置，从而形成两级过滤，提高了过滤效果。
过滤罐5上还设置有滤罐排气管11，滤罐排气管11设置为排出清洗液中的气体。
排出管6连接在过滤罐5的出液口，如图1，排出管6通过软管13连接到喷嘴12上。
综上所述，本实施例的超高压洗净装置，通过柱塞泵3提高液体的压力，使 清洗液以超高压喷出实现雾化，细化液体分子，提升小粒径颗粒的去除率，提高产品洗净效果。通过气液膜管2向清洗液中溶入二氧化碳，二氧化碳在清洗液中解离成氢离子及重碳酸离子，压制超纯水中的静电产生，达到保护被清洗基板表面的效果。

Claims (7)

  1. 一种超高压洗净装置，包括：
    供给管(1)；
    气液膜管(2)，所述气液膜管(2)的接液两端连接所述供给管(1)的相异部位，所述气液膜管(2)还具有通气端，所述通气端连接有二氧化碳接入管(7)；
    柱塞泵(3)，所述柱塞泵(3)连接在所述供给管(1)的出口，所述柱塞泵(3)由电机(4)驱动；
    过滤罐(5)，所述过滤罐(5)连接在所述柱塞泵(3)的出口；及
    排出管(6)，所述排出管(6)连接所述过滤罐(5)的出液口。
  2. 根据权利要求1所述的超高压洗净装置，其中：所述相异部位之间设置有流量调节阀(8)。
  3. 根据权利要求1所述的超高压洗净装置，其中：所述柱塞泵(3)的泵出压力为可调节设置。
  4. 根据权利要求3所述的超高压洗净装置，其中：所述柱塞泵(3)的泵出压力可调整范围为100kg/cm 2-150kg/cm 2。
  5. 根据权利要求1所述的超高压洗净装置，其中：所述过滤罐(5)设置有两个，且为串联设置。
  6. 根据权利要求1所述的超高压洗净装置，其中：所述供给管(1)上还设置有电导度计(9)，所述电导度计(9)位于所述气液膜管(2)所连接位置的下游。
  7. 根据权利要求1所述的超高压洗净装置，其中：所述过滤罐(5)上设置有滤罐排气管(11)。
PCT/CN2020/135180 2020-07-29 2020-12-10 超高压洗净装置 WO2022021732A1 (zh)

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