WO2021219062A1 - 保护膜、保护膜组件、显示屏组件及终端 - Google Patents

保护膜、保护膜组件、显示屏组件及终端 Download PDF

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Publication number
WO2021219062A1
WO2021219062A1 PCT/CN2021/090871 CN2021090871W WO2021219062A1 WO 2021219062 A1 WO2021219062 A1 WO 2021219062A1 CN 2021090871 W CN2021090871 W CN 2021090871W WO 2021219062 A1 WO2021219062 A1 WO 2021219062A1
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Prior art keywords
layer
protective film
refractive index
base film
antistatic
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PCT/CN2021/090871
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English (en)
French (fr)
Inventor
庞欢
胡成文
谭俊彦
周羽佳
李银
黄义宏
Original Assignee
华为技术有限公司
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Application filed by 华为技术有限公司 filed Critical 华为技术有限公司
Priority to EP21796981.5A priority Critical patent/EP4134409A4/en
Priority to US17/922,258 priority patent/US20230174826A1/en
Publication of WO2021219062A1 publication Critical patent/WO2021219062A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29—Laminated material
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22—Plastics; Metallised plastics
    • C09J7/25—Plastics; Metallised plastics based on macromolecular compounds obtained otherwise than by reactions involving only carbon-to-carbon unsaturated bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22—Plastics; Metallised plastics
    • C09J7/25—Plastics; Metallised plastics based on macromolecular compounds obtained otherwise than by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/255—Polyesters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385—Acrylic polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/50—Adhesives in the form of films or foils characterised by a primer layer between the carrier and the adhesive
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C08K2003/2244—Oxides; Hydroxides of metals of zirconium
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/318—Applications of adhesives in processes or use of adhesives in the form of films or foils for the production of liquid crystal displays
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00—Additional features of adhesives in the form of films or foils
    • C09J2301/10—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
    • C09J2301/16—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the structure of the carrier layer
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00—Additional features of adhesives in the form of films or foils
    • C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/41—Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the carrier layer
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2433/00—Presence of (meth)acrylic polymer
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2433/00—Presence of (meth)acrylic polymer
    • C09J2433/006—Presence of (meth)acrylic polymer in the substrate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2467/00—Presence of polyester
    • C09J2467/006—Presence of polyester in the substrate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2471/00—Presence of polyether
    • C09J2471/006—Presence of polyether in the substrate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2475/00—Presence of polyurethane
    • C09J2475/006—Presence of polyurethane in the substrate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2479/00—Presence of polyamine or polyimide
    • C09J2479/08—Presence of polyamine or polyimide polyimide
    • C09J2479/086—Presence of polyamine or polyimide polyimide in the substrate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2483/00—Presence of polysiloxane
    • C09J2483/006—Presence of polysiloxane in the substrate
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/16—Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04M—TELEPHONIC COMMUNICATION
    • H04M1/00—Substation equipment, e.g. for use by subscribers
    • H04M1/02—Constructional features of telephone sets
    • H04M1/0202—Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
    • H04M1/0206—Portable telephones comprising a plurality of mechanically joined movable body parts, e.g. hinged housings
    • H04M1/0208—Portable telephones comprising a plurality of mechanically joined movable body parts, e.g. hinged housings characterized by the relative motions of the body parts
    • H04M1/0214—Foldable telephones, i.e. with body parts pivoting to an open position around an axis parallel to the plane they define in closed position
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04M—TELEPHONIC COMMUNICATION
    • H04M1/00—Substation equipment, e.g. for use by subscribers
    • H04M1/02—Constructional features of telephone sets
    • H04M1/0202—Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
    • H04M1/026—Details of the structure or mounting of specific components
    • H04M1/0266—Details of the structure or mounting of specific components for a display module assembly
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04M—TELEPHONIC COMMUNICATION
    • H04M1/00—Substation equipment, e.g. for use by subscribers
    • H04M1/02—Constructional features of telephone sets
    • H04M1/18—Telephone sets specially adapted for use in ships, mines, or other places exposed to adverse environment
    • H04M1/185—Improving the rigidity of the casing or resistance to shocks

Definitions

  • This application relates to the technical field of terminals, and in particular to a protective film, a protective film component, a display screen component and a terminal.
  • the present application provides a protective film to be firmly attached to a foldable display screen, to prevent the protective film from being warped due to rebounds due to multiple bendings, and to comprehensively and effectively protect the foldable display screen.
  • the application also provides a protective film assembly, a display screen assembly and a terminal.
  • the protective film shown in the present application includes an adhesive layer and a base film layer that are laminated.
  • the adhesive layer is used to bond to a foldable display screen.
  • the base film layer includes one or more high modulus base films and one or more layers. Multi-layer low modulus base film, the elastic modulus of the high modulus base film is greater than that of the low modulus base film, the high modulus base film and the low modulus base film are alternately laminated, and the base film layer is far away from the adhesive layer
  • the surface layer is a high modulus base film.
  • the base film layer adopts a structure in which a high modulus base film and a low modulus base film are alternately laminated.
  • the high modulus base film can ensure the mechanical properties of the base film layer and strong pencil hardness, so that The protective film is not easily scratched during use, which ensures the mechanical properties of the protective film and improves the reliability of the protective film.
  • the low modulus base film can reduce the rebound stress caused by the deformation of the protective film during the folding process and prevent The protective film bounces and rises during the folding process of the display screen, realizing comprehensive and effective protection of the display screen.
  • the low modulus base film can also improve the impact resistance of the protective film.
  • the elastic modulus of the high-modulus base film is greater than 2Gpa, and the elastic modulus of the low-modulus base film is less than 300Mpa to ensure that the base film layer can prevent the protective film from rebounding and warping due to multiple bending. Comprehensive and effective protection of the foldable display screen.
  • the material of the high modulus base film includes polymer optical polyester material or colorless polyimide to ensure that the high modulus base film has a higher elastic modulus, so that the base film layer has better Its mechanical properties and strong pencil hardness make the protective film not easy to be scratched during use, ensure the mechanical properties of the protective film, and improve the reliability of the protective film.
  • the material of the low modulus base film includes acrylic glue, polyurethane or urethane acrylate to ensure that the low modulus base film has a low elastic modulus and can reduce the rebound stress caused by the deformation of the protective film during the folding process.
  • the transmittance of light with a wavelength of 500 nm in the base film layer is greater than or equal to 90%. Since 550nm is the average wavelength of visible light and the most sensitive wavelength for human eyes, the transmittance of light with a wavelength of 500nm in the base film layer is ⁇ 90%, which is equivalent to that visible light can completely pass through the base film layer, ensuring that the base film layer has The higher transmittance, when the protective film is bonded to the display screen, can reduce the influence of the protective film on the display screen of the display screen and ensure the optical performance of the protective film.
  • the protective film further includes an antireflection and antireflection layer.
  • the antireflection and antireflection layer includes one or more high refractive index layers and one or more low refractive index layers.
  • the high refractive index layer has a refractive index greater than The refractive index of the low refractive index layer, the high refractive index layer and the low refractive index layer are alternately laminated, and the surface layer far from the adhesive layer in the antireflection layer is the low refractive index layer.
  • the antireflection layer can increase the transmittance of light on the surface of the protective film, reduce the reflectivity of light on the surface of the protective film, ensure the antireflection effect of the protective film, and reduce the effect of the protective film component on the display screen.
  • At least one of the low refractive index layer and the high refractive index layer is doped with antistatic components, so that the anti-reflection and anti-reflection layer also has antistatic properties, reduces the surface resistance of the protective film, and prevents static electricity. Produce to ensure the antistatic performance of the protective film, avoid the adsorption of dust and impurities on the surface of the protective film, and improve the display quality of the display when the protective film is adhered to the display screen.
  • the high refractive index layer includes a resin layer and metal oxide particles doped in the resin layer, and the material of the resin layer of the high refractive index layer includes acrylic materials, urethane acrylate materials, and silane-modified materials.
  • the refractive index of the metal oxide particles is greater than 1.6.
  • the high refractive index layer doped with an antistatic component further includes an antistatic component doped in the resin layer of the high refractive index layer, and the antistatic component is an antistatic agent.
  • the high refractive index layer is formed by a coating process.
  • the high refractive index layer doped with antistatic agent makes the anti-reflection and anti-reflective layer have antistatic properties at the same time, thereby ensuring the antistatic properties of the protective film, avoiding the adsorption of dust and impurities on the surface of the protective film, and bonding the protective film to When displaying the display, improve the display quality of the display.
  • the high refractive index layer includes an inorganic film layer
  • the material of the inorganic film layer includes inorganic metal oxide, nitride, or oxynitride
  • the refractive index of the inorganic film layer is greater than 1.6.
  • the high refractive index layer doped with antistatic components also includes antistatic components doped in the inorganic film layer, and the antistatic components are metal oxides.
  • the high refractive index layer is formed by magnetron sputtering. Doped with a high refractive index layer with metal oxides, the AR layer has antistatic properties at the same time, thereby ensuring the antistatic properties of the protective film, and avoiding the adsorption of dust and impurities on the surface of the protective film. Improve the display quality of the display when it is used on the display.
  • the low refractive index layer includes a resin layer and oxide particles or fluoride particles doped in the resin layer, and the material of the resin layer of the low refractive index layer includes acrylic materials, urethane acrylate materials, For silane-modified acrylate or silane-modified urethane acrylate materials, the refractive index of oxide particles or fluoride particles is less than 1.5.
  • the low refractive index layer doped with an antistatic component further includes an antistatic component doped in the resin layer of the low refractive index layer, and the antistatic component is an antistatic agent.
  • the low refractive index layer is formed by a coating process.
  • the low-refractive-index layer doped with antistatic agent makes the anti-reflection and anti-reflection layer also have antistatic performance, thereby ensuring the antistatic performance of the protective film, and avoiding the adsorption of dust and impurities on the surface of the protective film.
  • improve the display quality of the display improve the display quality of the display.
  • the antistatic agent in the low refractive index layer is closer to the outside of the protective film.
  • the anti-static ability of the anti-reflection layer is stronger, which is beneficial to improve the anti-static performance of the protective film.
  • the difference in refractive index between the low refractive index layer and the high refractive index layer is greater than 0.1 to ensure the antireflection and antireflection effect of the antireflection layer and to realize the antireflection and antireflection effect of the protective film on light.
  • the protective film further includes a hardened layer, and the hardened layer is located on the side of the base film layer away from the adhesive layer. Among them, the hardened layer is located between the base film layer and the antireflection and antireflection layer.
  • the hardening layer includes a resin layer, and the material of the resin layer of the hardening layer includes acrylic materials, urethane acrylate materials, silane-modified acrylates or silane-modified urethane acrylate materials to increase the surface energy of the hardening layer, so that
  • the hardened layer can not only adhere to the surface of the base film layer, but also serves as a primer layer formed on the surface of the base film layer as the antireflection layer to improve the adhesion of the antireflection layer on the surface of the base film layer and avoid antireflection layer.
  • the anti-reflection layer and the base film layer easily peel off, which improves the reliability of the protective film.
  • the hardness of the hardened layer is also high, which can provide mechanical support for the antireflection layer and ensure the wear resistance of the protective film.
  • the hardened layer further includes an antistatic agent doped in the resin layer of the hardened layer to increase the antistatic ability of the hardened layer, improve the antistatic performance of the protective film, reduce the surface resistance of the protective film, and prevent static electricity. produce.
  • the protective film further includes an antistatic layer, the antistatic layer is located between the adhesive layer and the base film layer, and the material of the antistatic layer includes an antistatic agent to improve the antistatic performance of the protective film and reduce the protective film.
  • the antistatic layer is located on the side of the base film layer away from the adhesive layer, wherein the antistatic layer is located between the base film layer and the hardened layer, or the antistatic layer is located between the hardened layer and the antireflection layer. between. Compared with the antistatic layer located between the base film layer and the adhesive layer, the antistatic layer is closer to the outside of the protective film, which is beneficial to improve the antistatic performance of the protective film.
  • the material of the adhesive layer includes acrylic glue, the elastic modulus of the adhesive layer is less than 40KPa, and the glass transition temperature is less than -30°C. That is, the adhesive layer has an ultra-low modulus of elasticity and high resilience performance, so that the protective film has a bendable performance.
  • the adhesive layer can absorb the plastic deformation of the protective film, preventing the protective film from rebounding and arching during the bending process of the display screen, so that the protective film can be Always attached to the display surface of the display to protect the display.
  • the protective film further includes an antifouling layer, and the antifouling layer is located on the side of the base film layer away from the adhesive layer. Specifically, the anti-fouling layer is located on the side of the AR layer facing away from the adhesive layer. That is, the antifouling layer is the uppermost layer structure of the antifouling layer, which can provide the protective film with antifouling performance.
  • the material of the anti-fouling layer includes perfluoropolyether silane, fluoroether or fluorocarbon silane, so that the anti-fouling layer also has scratch resistance and high hardness performance to ensure that the protective film is not easily scratched during use.
  • the anti-fouling layer has a small dynamic friction coefficient, and the user receives less friction when sliding on the surface of the protective film, that is, the user slides more smoothly on the surface of the protective film, which helps to improve the user's experience of use.
  • the protective film further includes a primer layer, which is located between the antifouling layer and the base film layer.
  • the primer layer is located between the antifouling layer and the antireflection layer.
  • the material for the bottom layer includes organosilane or inorganic silica.
  • the bottom layer can increase the adhesion between the anti-fouling layer and the anti-reflection layer, prevent the anti-fouling layer and the anti-reflection layer from peeling off during the use of the protective film, and improve the reliability of the protective film. sex.
  • the protective film assembly shown in this application includes any of the above-mentioned protective films, a first release film, and a second release film.
  • the first release film covers the inner surface of the protective film
  • the second release film covers the inner surface of the protective film. The outer surface.
  • the protective film assembly shown in the present application includes any of the above-mentioned protective films.
  • the protective film When the protective film is attached to the foldable display screen, the protective film will not rebound and warp with the folding of the display screen, and can comprehensively and effectively protect the protective film. Folding display.
  • the display screen assembly shown in the present application includes a foldable display screen and any of the above-mentioned protective films, and the adhesive layer of the protective film is adhered to the display screen.
  • the display screen assembly shown in the present application adopts any of the above-mentioned protective films to be attached to the foldable display screen, and the protective film will not bounce and warp with the folding of the display screen, and can comprehensively and effectively protect the foldable display screen , Is conducive to extending the service life of the display assembly.
  • the terminal shown in the present application includes a casing and the above-mentioned display screen assembly, and the display screen assembly is installed in the casing.
  • the terminal shown in this application adopts any of the above-mentioned protective films to be attached to the foldable display screen.
  • the protective film will not bounce and warp with the folding of the display screen, and can comprehensively and effectively protect the foldable display screen. Conducive to extending the service life of the terminal.
  • FIG. 1 is a schematic structural diagram of a terminal provided by an embodiment of the present application.
  • Fig. 2 is a schematic structural diagram of the terminal shown in Fig. 1 in another state;
  • FIG. 3 is a schematic structural diagram of a display screen assembly in the terminal shown in FIG. 1;
  • FIG. 4 is a schematic diagram of an exploded structure of the display screen assembly shown in FIG. 3;
  • FIG. 5 is a schematic cross-sectional structure diagram of the protective film in the display screen assembly shown in FIG. 4 cut along the I-I direction in an embodiment
  • FIG. 6 is a schematic cross-sectional structure diagram of the protective film in the display screen assembly shown in FIG. 4 cut along the I-I direction in the second embodiment;
  • FIG. 7 is a schematic cross-sectional structure diagram of the protective film in the display screen assembly shown in FIG. 4 cut along the direction I-I in the third embodiment;
  • FIG. 8 is a schematic cross-sectional structure diagram of the protective film in the display screen assembly shown in FIG. 4 cut along the I-I direction in the fourth embodiment;
  • FIG. 9 is a schematic cross-sectional structure diagram of the protective film in the display screen assembly shown in FIG. 4 cut along the direction I-I in the fifth embodiment;
  • FIG. 10 is a schematic cross-sectional structure diagram of the protective film in the display screen assembly shown in FIG. 4 cut along the direction I-I in the sixth embodiment;
  • FIG. 11 is a schematic cross-sectional structure diagram of the protective film in the display screen assembly shown in FIG. 4 cut along the I-I direction in the seventh embodiment;
  • FIG. 12 is a schematic cross-sectional structure diagram of the protective film in the display screen assembly shown in FIG. 4 cut along the I-I direction in the eighth embodiment;
  • FIG. 13 is a schematic cross-sectional structure diagram of the protective film in the display screen assembly of the second terminal provided by the embodiment of the present application, cut along the direction I-I in an implementation manner;
  • FIG. 14 is a schematic cross-sectional structure diagram of the protective film in the display screen assembly of the second terminal provided by the embodiment of the present application, cut along the direction I-I in the second embodiment;
  • 15 is a schematic cross-sectional structure diagram of the protective film in the display screen assembly of the second terminal provided by the embodiment of the present application, cut along the direction I-I in the third embodiment;
  • 16 is a schematic cross-sectional structure diagram of the protective film in the display screen assembly of the second terminal provided by the embodiment of the present application, cut along the direction I-I in the fourth embodiment;
  • FIG. 17 is a schematic cross-sectional structure diagram of the protective film in the display screen assembly of the third terminal provided by the embodiment of the present application, cut along the direction I-I;
  • FIG. 18 is a schematic structural diagram of a protective film assembly provided by an embodiment of the present application.
  • FIG. 19 is a schematic cross-sectional structure view of the protective film assembly shown in FIG. 18 taken along the direction of II-II;
  • FIG. 20 is a process flow diagram of a method for preparing a protective film provided by an embodiment of the present application.
  • FIG. 21 is a schematic view of the structure of the hardened layer formed in the method for preparing the protective film shown in FIG. 20;
  • FIG. 22 is a schematic diagram of the structure of the antireflection and antireflection layer formed in the manufacturing method of the protective film shown in FIG. 20;
  • FIG. 23 is a schematic diagram of the structure of the adhesive layer formed in the method for preparing the protective film shown in FIG. 20.
  • FIG. 1 is a schematic structural diagram of a terminal 100 according to an embodiment of the present application.
  • the terminal 100 includes, but is not limited to, electronic devices with display functions such as mobile phones, tablet computers, personal computers, multimedia players, e-book readers, notebook computers, in-vehicle devices, or wearable devices.
  • FIG. 1 takes the terminal 100 as a mobile phone as an example for specific description.
  • the width direction of the terminal 100 is defined as the X-axis direction
  • the length direction of the terminal 100 is the Y-axis direction
  • the thickness direction of the terminal 100 is the Z-axis direction
  • the X-axis, Y-axis and Z-axis directions are paired. Perpendicular to each other.
  • FIG. 2 is a schematic structural diagram of the terminal 100 shown in FIG. 1 in another state.
  • the terminal 100 is a foldable mobile phone.
  • the terminal 100 is a mobile phone that can be switched between a folded state and an expanded state.
  • the terminal 100 shown in FIG. 1 is in an unfolded state, and the terminal 100 shown in FIG. 2 is in a folded state.
  • the terminal 100 can be folded or unfolded along the X-axis direction as an example for description.
  • the terminal 100 shown in this embodiment is an electronic device that can be folded once.
  • the terminal 100 may also be an electronic device that can be folded multiple times (two or more times).
  • the terminal 100 may have multiple parts, and every two parts may be relatively close until the terminal 100 is in a folded state, and every two parts may also be relatively far away until the terminal 100 is in an unfolded state.
  • the terminal 100 includes a housing 10 and a display screen assembly 20, and the display screen assembly 20 is installed on the housing 10.
  • the housing 10 includes a first housing 11, a second housing 12, and a connecting mechanism (not labeled) connected between the first housing 11 and the second housing 12.
  • the connecting mechanism is a rotating shaft mechanism extending along the X-axis direction.
  • the first housing 11 and the second housing 12 are rotatably connected by a connecting mechanism. That is, the first housing 11 and the second housing 12 are connected to each other by a connecting mechanism, and can be relatively rotated along the X-axis direction. Specifically, the first housing 11 and the second housing 12 can be relatively rotated to be relatively close, so that the housing 10 is in a folded state, as shown in FIG. 2.
  • the first housing 11 and the second housing 12 can also be relatively rotated to move away from each other, so that the housing 10 is in an unfolded state, as shown in FIG. 1.
  • the first housing 11 and the second housing 12 can be relatively rotated, so that the housing 10 can be switched between the folded state and the unfolded state.
  • the connecting mechanism may also be a sliding mechanism, a composite mechanism of rotation and sliding, or a detachable fastening mechanism, which is not specifically limited in this application.
  • FIG. 3 is a schematic structural diagram of the display screen assembly 20 in the terminal 100 shown in FIG. 1.
  • the display screen assembly 20 is used to display information such as text, image or video.
  • the display screen assembly 20 includes a first part 201, a second part 202, and a third part 203 connected between the first part 201 and the second part 202.
  • the first part 201, the second part 202 and the third part 203 are located on the same side of the housing 10, and the first part 201, the third part 203 and the second part 202 are arranged in sequence along the Y-axis direction.
  • the first part 201 is mounted on the first housing 11
  • the second part 202 is mounted on the second housing 12
  • the third part 203 is located between the first housing 11 and the second housing 12.
  • the third part 203 can be bent along the X-axis direction.
  • the display screen assembly 20 When the terminal 100 is in the unfolded state, the display screen assembly 20 is in the unfolded state, and the angle between the first part 201, the second part 202, and the third part 203 is 180 degrees (or roughly 180 degrees, that is, a slight deviation is allowed). At this time, the terminal 100 has a continuous large-area display area, which can realize large-screen display and improve the user experience.
  • the display screen assembly 20 When the terminal 100 is in the folded state, the display screen assembly 20 is in the folded state, the first part 201 overlaps the second part 202, and the third part 203 is bent. At this time, the exposed area of the display screen assembly 20 is less, which reduces the probability of the display screen assembly 20 being damaged.
  • the display screen assembly 20 when the terminal 100 shown in this embodiment is in the folded state shown in FIG. 2, the display screen assembly 20 is in a folded state, and the display screen assembly 20 is located in the first housing 11 and the second housing at this time. Between 12. In other embodiments, when the terminal 100 is in a folded state, the display screen assembly 20 may also be in an outwardly folded state. At this time, the first housing 11 and the second housing 12 are located between the first part 201 and the second part 202. between.
  • FIG. 4 is a schematic diagram of an exploded structure of the display screen assembly 20 shown in FIG. 3.
  • the display screen assembly 20 includes a display screen 21 and a protective film 22.
  • the display screen 21 is installed on the housing 10, and the protective film 22 is attached to the display screen 21.
  • the display screen 21 is a foldable display screen.
  • the display screen 21 includes a display surface 211 facing away from the housing 10, and the display surface 211 is used to display information such as text, images, or videos.
  • the display screen 21 may be integrated with a display function, a touch sensing function and a fingerprint image collection function. It should be understood that the display screen 21 shown in this embodiment is not limited to the 2D display screen shown in FIG. 3, and may also be a 2.5D display screen or a 3D display screen.
  • the display screen 21 is provided with an optical under-screen fingerprint.
  • the display screen 21 includes a display panel, a polarizer, and a protective cover that are stacked in sequence. That is, the polarizer is located between the display panel and the protective cover.
  • the display panel is used to display information such as text, images, or videos.
  • the polarizer is installed on the display surface 211 of the display panel, and the protective cover is installed on the surface of the polarizer away from the display panel to protect the polarizer and the display panel.
  • the protective cover can be made of transparent materials such as glass to avoid affecting the display of the display panel.
  • the protective film 22 is attached to the display surface 211 of the display screen 21.
  • the size and shape of the protective film 22 are adapted to the size and shape of the display surface 211.
  • the protective film 22 is completely attached to the display surface 211, and the sides of the protective film 22 are aligned with the sides of the display screen 21.
  • the distance L between the edge of the protective film 22 and the edge of the display screen 21 is 1.0 mm, so as to ensure that the protective film 22 has a good bonding effect on the display surface 211, and the protective film 22 is not prone to curling.
  • the protective film 22 always keeps fully attached to the display 21 without shrinking and warping, ensuring that the protective film 22 has a full protection effect on the display 21 and prevents the display 21 from being broken due to the terminal 100 falling. In the case of cracks, reduce user losses and improve user experience.
  • the protective film 22 can also be provided with through holes that avoid these functional holes, so that these functional holes are exposed on the protective film 22. Ensure the normal use of these functional holes.
  • FIG. 5 is a cross-sectional structure diagram of the protective film 22 of the display screen assembly 20 shown in FIG. 4 taken along the I-I direction in one embodiment.
  • cut along the I-I direction refers to the cut along the plane where the arrows at both ends of the I-I line and the I-I line are located. The description of the drawings is the same in the following understand.
  • the protective film 22 includes a base film layer 1, an adhesive layer 2, a hard coating (HC) layer 3, an anti-reflective (AR) layer 4 and an anti-fingerprint (AF) layer 5.
  • the adhesive layer 2 is located on one side of the base film layer 1 for bonding to the display screen 21.
  • the hardened layer 3, the antireflection layer 4 and the antifouling layer 5 are located on the side of the base film layer 1 away from the adhesive layer 2. That is, the hardened layer 3, the antireflection layer 4 and the antifouling layer 5 are laminated on the side of the base film layer 1 away from the adhesive layer 2 in this order.
  • the adhesive layer 2, the base film layer 1, the hardened layer 3, the antireflection and antireflection layer 4, and the antifouling layer 5 are laminated in this order.
  • the layered arrangement means that the various layer structures are sequentially stacked from the inside to the outside. At this time, each layer structure can be directly stacked in contact with each other, or it can be mixed with other layer structures.
  • the adhesive layer 1 and the base film layer 2 are laminated, which means that the base film layer 2 is located on the outer surface of the adhesive layer 1 or that the base film layer 2 is located outside the adhesive layer 1.
  • the base film layer 1 includes one or more layers of a high modulus base film 11 and one or more layers of a low modulus base film 12, and the elastic modulus of the high modulus base film 12 is greater than that of the low modulus base film.
  • the high modulus base film 11 and the low modulus base film 12 are alternately laminated.
  • the surface layer away from the adhesive layer 2 in the base film layer 1 is a high modulus base film 11. That is, the outermost layer of the base film layer 1 is the high modulus base film 11.
  • the base film layer 1 includes a layer of high modulus base film 11 and a layer of low modulus base film 12, and the low modulus base film 12 and the high modulus base film 11 are laminated in sequence.
  • the elastic modulus of the high modulus base film 11 is greater than 3 GPa to ensure that the high modulus base film 11 has a higher elastic modulus, so that the base film layer 1 has better mechanical properties and strong pencil hardness, so that the protection The film 22 is not easily scratched during use, which ensures the mechanical properties of the protective film 22 and improves the reliability of the protective film 22.
  • the material of the high modulus base film 11 includes polymer optical polyester material or colorless polyimide (CPI).
  • the material of the base film layer 1 includes a polymer optical polyester material.
  • the polymer optical polyester material included in the base film layer 1 is polyethylene terephthalate (PET). That is, the base film layer 1 has a film-like structure made of PET.
  • PET polyethylene terephthalate
  • the thickness of the high modulus base film 11 is between 50 ⁇ m and 80 ⁇ m. It should be noted that in other embodiments, the thickness of the high modulus base film 11 may also be between 38 ⁇ m and 100 ⁇ m, which is not specifically limited in this application.
  • the elastic modulus of the low modulus base film 12 is less than 300 MPa to ensure that the low modulus base film 12 has a lower elastic modulus.
  • the low modulus base film 12 can not only reduce the rebound stress generated by the deformation of the protective film 12 during the folding process, but also prevent the protective film 22 from rebounding and warping during the folding process of the display screen assembly 20.
  • the comprehensive and effective protection of the display screen 21 can also improve the impact resistance of the protective film 22.
  • the material of the low modulus base film 12 includes polyurethane (PU) or polyurethane acrylate (PUA).
  • the thickness of the low modulus base film 12 is between 25 ⁇ m and 50 ⁇ m. In other embodiments, the thickness of the low modulus base film 12 may also be between 10 ⁇ m and 100 ⁇ m, which is not specifically limited in this application.
  • the refractive index of the base film layer 1 is between 1.4 and 1.5.
  • the haze of the base film layer 1 is less than or equal to 1%, and the transmittance of light with a wavelength of 550 nm in the base film layer 1 is greater than or equal to 90%.
  • 550nm is the average wavelength of visible light, and it is the most sensitive wavelength of the human eye.
  • the transmittance of light with a wavelength of 550nm in the base film layer 1 is ⁇ 90%, which is equivalent to that visible light can almost completely pass through the base film layer 1, ensuring
  • the base film layer 1 has higher transmittance and lower haze, which can reduce the influence of the protective film 22 on the display screen of the display screen 21 and ensure the optical performance of the protective film 22.
  • the fast axis direction of the base film layer 1 is parallel or perpendicular to the polarization direction of the polarizer of the display screen 21, or the fast axis and slow axis directions of the base film layer 1 and the polarization direction of the polarizer of the display screen 21 are in between. 45 degrees to ensure the normal use of fingerprints under the optical screen in the display 21.
  • the hardening layer 3 is laminated on the surface of the base film layer 1 facing away from the display screen 21 and is located between the base film layer 1 and the antireflection layer 4.
  • the hardened layer 3 is formed on the surface of the base film layer 1 away from the display screen 21 by a coating process.
  • the thickness of the hardened layer 3 is between 0.1 ⁇ m and 3 ⁇ m.
  • the surface energy of the hardened layer 3 is greater than 32 dynes (g*cm/sec ⁇ 2). That is, the hardened layer 3 has a higher surface energy.
  • the hardened layer 3 includes a resin layer 31.
  • the material of the resin layer 31 includes an acrylic material, a PUA material, a silane-modified acrylic material, or a silane-modified PUA material.
  • the material of the resin layer 31 includes an acrylic material.
  • the acrylic material included in the resin layer 31 is acrylic resin. It should be noted that in other embodiments, the acrylic material included in the resin layer 31 may not be an acrylic resin, but may be other acrylic materials other than the acrylic resin.
  • the hardened layer 3 can not only be better attached to the surface of the base film layer 1, but also can be used as a primer layer formed on the surface of the base film layer 1 as the antireflection and antireflection layer 4 to enhance the increase
  • the adhesion of the anti-reflection layer 4 on the surface of the base film layer 1 prevents easy peeling between the anti-reflection layer 4 and the base film layer 1, and improves the use reliability of the protective film 22.
  • the hardness of the hardened layer 3 made of acrylic resin is also relatively high, and can also provide mechanical support for the antireflection layer 4 and the antifouling layer 5 on the outside of the hardened layer 3 to ensure the wear resistance of the protective film 22.
  • the antireflection and antireflection layer 4 is located on the side of the adhesive layer 2 away from the display screen 21. Specifically, the antireflection and antireflection layer 4 is laminated on the surface of the hardened layer 3 away from the base film layer 1 to increase the transmittance of light on the surface of the protective film 22, reduce the reflectivity of the light on the surface of the protective film 22, and ensure that the protective film
  • the anti-reflection and anti-reflection effect of 22 improves the display clarity of the display assembly 20 and improves the user experience.
  • the antireflection and antireflection layer 4 is formed on the surface of the hardened layer 3 away from the base film layer 1 by a coating process.
  • the thickness of the antireflection and antireflection layer 4 is between 100 nm and 300 nm.
  • the antireflection and antireflection layer 4 includes one or more high refractive index layers 41 and one or more low refractive index layers 42.
  • the high refractive index layers 41 and the low refractive index layers 42 are alternately laminated with high refractive index layers. Both the layer 41 and the low refractive index layer 42 are formed by a coating process.
  • the surface layer of the antireflection layer 4 far from the adhesive layer 2 is the low refractive index layer 42. That is, the outermost layer of the anti-reflection layer 4 is the low refractive index layer 42 to ensure that the anti-reflection layer 4 can increase the transmission and reduce the reflection of light.
  • At least one of the low refractive index layer 42 and the high refractive index layer 41 is doped with anti-static (AS) components, so that the anti-reflection and anti-reflection layer 4 also has anti-static properties, which can reduce the protective film 22.
  • AS anti-static
  • the surface resistance prevents the generation of static electricity, ensures the antistatic performance of the protective film 22, avoids the adsorption of dust and impurities on the surface of the protective film 22, and improves the display quality of the display screen 21.
  • the antireflection and antireflection layer 4 includes a high refractive index layer 41 and a low refractive index layer 42.
  • the high refractive index layer 41 and the low refractive index layer 42 are sequentially laminated on the surface of the hardened layer 3 away from the base film layer 1.
  • the high refractive index layer 41 is doped with antistatic components to increase the antistatic ability of the antireflection and antireflection layer 4, improve the antistatic property of the protective film 22, reduce the surface resistance of the protective film 22, prevent the generation of static electricity, and improve The display clarity of the display screen assembly 20.
  • the antireflection and antireflection layer 4 may include multiple (two or more) high refractive index layers 41 or multiple low refractive index layers 42, such as high refractive index layer 41.
  • the total number of layers of the low refractive index layer 42 and the low refractive index layer 42 can be between 3 and 6 layers, so as to ensure the antireflection and antireflection effect of the antireflection layer 4 while avoiding the thickness of the protective film 22 from being too large and affecting the terminal 100.
  • the thin and light design is the thin and light design.
  • the thickness of the high refractive index layer 41 is between 20 nm and 80 nm, and the refractive index of the high refractive index layer 41 is between 1.5 and 2.1.
  • the high refractive index layer 41 includes a resin layer 411 and metal oxide particles 412 and an antistatic component 413 doped in the resin layer 411.
  • the material of the resin layer 411 includes acrylic material, PUA material, silane-modified acrylic or silane-modified PUA material.
  • the material of the resin layer 411 includes an acrylic material.
  • the acrylic material included in the resin layer 411 is acrylic resin.
  • the material of the high refractive index layer 41 includes the same acrylic resin as the material of the hardened layer 3, which helps to improve the adhesion of the high refractive index layer 41 on the surface of the hardened layer 3.
  • the acrylic material included in the resin layer 411 may not be an acrylic resin, but may be other acrylic materials other than the acrylic resin.
  • the metal oxide particles 412 are doped in the acrylic resin of the resin layer 411, and the refractive index of the metal oxide particles is greater than 1.6 to ensure the high refractive index of the high refractive index layer 41.
  • the metal oxide particles 412 are zirconia particles.
  • the zirconia particles are particles with a particle size of nanometers, and the particle size is between 10 nm and 50 nm.
  • the zirconia particles are polygonal particles to increase the surface area of the zirconia particles, increase the contact area between the zirconia particles and the acrylic resin, and improve the dispersibility of the zirconia particles in the acrylic resin.
  • the zirconia particles may also be spherical or other special-shaped particles.
  • the metal oxide particles 412 may not be zirconia particles but other metal oxide particles, or there may be multiple types of metal oxide particles 412, as long as the refractive index of the metal oxide particles 412 is greater than 1.6. This application does not specifically limit this.
  • the antistatic component 413 and the zirconia particles are co-doped in the acrylic resin of the resin layer 31.
  • the antistatic component 413 is an antistatic agent.
  • the antistatic component 413 includes, but is not limited to, anionic antistatic agents such as alkyl sulfonic acid, alkali metal phosphate, alkyl quaternary ammonium salts, phosphorous or phosphonium salt surfactants, cationic antistatic agents, and ethoxylates.
  • Aliphatic alkylamine non-ionic antistatic agent or conductive polymer antistatic agent such as PEDOT:PSS. It should be noted that PEDOT:PSS is composed of poly 3,4-ethylenedioxythiophene (PEDOT) and polysodium-p-styrenesulfonate (PSS) substance.
  • the doping of the antistatic component 413 in the resin layer 411 in this embodiment will have a certain impact on the refractive index of the high refractive index layer 41.
  • the thickness and composition of the high refractive index layer 41 can be adjusted.
  • the refractive index of the high refractive index layer 41 is maintained between 1.5 and 2.1, so as to ensure that the high refractive index layer 41 can cooperate with the low refractive index layer 42 to achieve the antireflection and antireflection effect of the antireflection layer 4.
  • the low refractive index layer 42 is laminated on the surface of the high refractive index layer 41 away from the hardened layer 3. Among them, the refractive index of the low refractive index layer 42 is smaller than the refractive index of the high refractive index layer 41. That is, the refractive index of the high refractive index layer 41 is greater than the refractive index of the low refractive index layer 42. Specifically, the difference in refractive index between the low refractive index layer 42 and the high refractive index layer 41 is greater than 0.1 to ensure the antireflection and antireflection effect of the antireflection layer 4, and to realize the antireflection and antireflection effect of the protective film 22 on the light. .
  • the low refractive index layer 42 includes a resin layer 421 and oxide particles or fluoride particles 422 doped in the resin layer 421.
  • the thickness of the low refractive index layer 42 is between 10 nm and 100 nm, and the refractive index of the low refractive index layer 42 is between 1.2 and 1.6.
  • the material of the resin layer 421 includes an acrylic material, a PUA material, a silane-modified acrylic or a silane-modified PUA material.
  • the material of the resin layer 421 includes an acrylic material.
  • the acrylic material included in the resin layer 411 is acrylic resin.
  • the material of the low refractive index layer 42 includes the same acrylic resin as the material of the high refractive index layer 41, which helps to improve the adhesion of the low refractive index layer 42 on the surface of the high refractive index layer 41. It should be noted that, in other embodiments, the acrylic material included in the low refractive index layer 42 may not be an acrylic resin, but may be other acrylic materials other than the acrylic resin.
  • Oxide particles or fluoride particles 422 are doped in the acrylic resin of the resin layer 421.
  • the refractive index of the oxide particles or fluoride particles 422 is less than 1.5 to ensure that the refractive index of the low refractive index layer 42 is between 1.2 and 1.6.
  • the low refractive index layer 42 includes oxide particles 422.
  • the oxide particles 422 are silica particles. Among them, the silica particles are hollow and nano-sized particles with a particle size between 10 nm and 50 nm. It should be understood that, in other embodiments, the oxide particles 422 may not be silica particles, but may be other oxide particles other than silica, or there may be multiple types of oxide particles 422, as long as they are oxidized.
  • the refractive index of the object particles 422 may be less than 1.5.
  • the anti-fouling layer 5 is located on the side of the antireflection and antireflection layer 4 facing away from the adhesive layer 2.
  • the antifouling layer 5 has a layer structure of the uppermost layer of the protective film 22. That is, the anti-fouling layer 5 is a layer structure in which the protective film 22 is away from the display screen 21, and can provide the protective film 22 with anti-fouling performance.
  • the material of the anti-fouling layer 5 includes perfluoropolyether silane or fluoroether or fluorocarbon silane. In this embodiment, the material of the anti-fouling layer 5 includes perfluoropolyether silane.
  • the anti-fouling layer 5 is formed on the surface of the antireflection layer 4 through a roll to roll (R2R) process.
  • R2R roll to roll
  • the thickness of the anti-fouling layer 5 is between 10 nm and 50 nm
  • the water drop angle is greater than or equal to 110 degrees
  • the contact angle of diiodomethane is greater than or equal to 95 degrees.
  • the antifouling layer 5 directly vapor-deposits perfluoropolyether silane on the surface of the antireflection layer 4, which gives full play to the low surface energy characteristics of the perfluoropolyether silane, making it resistant to
  • the water drop angle and the oil stain angle of the dirt layer 5 are relatively large, so that its dirt resistance performance is comparable to that of a glass dirt resistant layer.
  • the anti-fouling layer 5 also has scratch resistance and high hardness performance, ensuring that the protective film 22 is not easily scratched during use.
  • the anti-fouling layer 5 has a low dynamic friction coefficient, and the user receives less friction when sliding on the surface of the protective film 22, that is, the user slides more smoothly on the surface of the protective film 22, which helps to improve the user's experience.
  • the light travels at the interface between the anti-fouling layer 5 and the low refractive index layer 42, the interface between the low refractive index layer 42 and the high refractive index layer 41, and the high refractive index layer 41 and the hardened layer.
  • the interface of 3 will reflect, and the refractive index of the anti-fouling layer 5 can be limited to 1.5 or less, and the thickness of the anti-fouling layer 5 can be limited to 10nm ⁇ 30nm, and it can be adjusted by common simulation software such as thin film calculation (TACal) software
  • TACS thin film calculation
  • the refractive index and thickness of the high refractive index layer 41 and the low refractive index layer 42 make the light intensity of the reflected light reflected at the aforementioned interface similar, and the phase difference is 180 degrees, so that the interference of these reflected lights is canceled and the protective film 22 is increased. Transmitting and reducing the negative effect.
  • the hardened layer 3 since the hardened layer 3 has little influence on the anti-reflection and anti-reflection effect of the anti-reflection layer 4, it is only necessary to limit the thickness of the hardened layer 3 to less than 1 ⁇ m, and limit the refractive index to between 1.4 and 1.6. In this way, the anti-reflection effect of the protective film 22 can be increased.
  • the protective film 22 also includes a primer layer 6, which is located between the antifouling layer 5 and the antireflection layer 4.
  • the primer layer 6 is formed in the process of forming the anti-fouling layer 5 by the R2R process. The adhesion between the dirt layer 5 and the anti-reflection layer 4 prevents the anti-fouling layer 5 and the anti-reflection layer 4 from peeling off during the use of the protective film 22, thereby improving the reliability of the protective film 22.
  • the material of the primer layer 6 includes organosilane. Among them, the thickness of the bottom layer 6 is between 10 nm and 30 nm. It should be understood that, in other embodiments, the material of the primer layer 6 may also include inorganic silicon dioxide, and the thickness of the primer layer 6 in this case is between 3 nm and 10 nm.
  • the adhesive layer 2 is laminated on the surface of the base film layer 1 away from the hardened layer 3. That is, the base film layer 1 is located between the adhesive layer 2 and the hardened layer 3. That is, the adhesive layer 2 is laminated on the surface of the base film layer 1 facing the display screen 21.
  • the adhesive layer 2 is formed on the surface of the base film layer 1 through a coating process. Specifically, the surface of the adhesive layer 2 facing away from the base film layer 1 is attached to the display surface 211 of the display screen 21.
  • the material of the adhesive layer 2 includes acrylic glue.
  • the thickness of the adhesive layer 2 is between 10 ⁇ m and 30 ⁇ m
  • the refractive index of the adhesive layer 2 is between 1.3 and 1.4.
  • the adhesive layer 2 made of acrylic glue can not only adhere well to the display surface 211 of the display screen 21, so that the protective film 22 is not prone to small bubbles when it is attached to the display surface 211 of the display screen 21, and will not affect the display screen 21. Fingerprint unlocking and other related functions, and the acrylic glue has high light transmittance, which can reduce the influence of the protective film 22 on the display screen of the display screen 21, and improve the user's experience of use.
  • the adhesive layer 2 can adhere well to the base film layer 1 made of PET, that is, the adhesive layer 2 has greater adhesion on the surface of the base film layer 1.
  • the elastic modulus of the adhesive layer 2 is less than 40KPa (about 25°C at room temperature), glass transition temperature ⁇ -30°C.
  • the adhesive layer 2 is made of ultra-low modulus and high resilience acrylic glue, so that the protective film 22 has a bendable performance.
  • the adhesive layer 2 can absorb the plastic deformation of the protective film 22, preventing the protective film 22 from rebounding and arching during the bending process of the terminal 100, so that the protective film 22 can always be attached to the display surface 211 of the display screen 21 to protect the display screen 21.
  • the material of the adhesive layer 2 may also be other transparent adhesive materials such as acrylate film or silica gel with ultra-low modulus and high resilience performance.
  • FIG. 6 is a schematic cross-sectional structure diagram of the protective film 22 of the display screen assembly 20 shown in FIG. 4 taken along the I-I direction in the second embodiment.
  • the protective film 22 shown in this embodiment is different from the protective film 22 shown in the above embodiment in that the base film layer 1 includes two layers of high modulus base film 11 and one layer of low modulus base film 12.
  • the modulus base film 11, one layer of low modulus base film 12, and another layer of high modulus base film 11 are laminated in this order.
  • the material of the two layers of high modulus base film 11 is the same. It should be noted that, in other embodiments, the materials of the two layers of high modulus base film 11 may also be different.
  • the base film layer 1 may also include three or more layers of high modulus base film 11 or multiple (two or two layers) low modulus base films 12, which are not specifically limited in this application.
  • the low-modulus base film 12 is located between two layers of high-modulus base films 11.
  • the low-modulus base film 12 can also absorb the high-modulus base film 11 (that is, the low-modulus base film located on the inner side). 12
  • the high modulus base film on the side close to the adhesive layer 2 11) Plastic deformation due to deformation prevents the protective film 22 from rebounding and warping during the folding process of the display screen assembly 20, and achieves a comprehensive and effective effect on the display screen 21 protect.
  • FIG. 7 is a schematic cross-sectional structure diagram of the protective film 22 of the display screen assembly 20 shown in FIG. 4 cut along the direction I-I in the third embodiment.
  • the protective film 22 shown in this embodiment is different from the protective film 22 shown in the second embodiment described above in that the high refractive index layer 41 is not doped with antistatic components, and the low refractive index layer 42 is doped There are antistatic ingredients.
  • the high refractive index layer 41 includes a resin layer 411 and metal oxide particles 412 doped in the resin layer 411.
  • the low refractive index layer 42 includes a resin layer 421 and oxide particles or fluoride particles 422 and an antistatic component 423 doped in the resin layer 421.
  • the antistatic component 423 is an antistatic agent.
  • the antistatic ingredients include, but are not limited to, anionic antistatic agents such as alkyl sulfonic acid, alkali metal phosphate, alkyl quaternary ammonium salts, phosphorous or phosphonium salt surfactants, cationic antistatic agents, and ethoxylated fats.
  • Group alkylamine non-ionic antistatic agent or conductive polymer antistatic agent such as PEDOT:PSS.
  • the doping of the antistatic component 423 in the resin layer 421 in this embodiment will have a certain impact on the refractive index of the low refractive index layer 42.
  • the thickness and composition of the low refractive index layer 42 can be adjusted.
  • the refractive index of the low refractive index layer 42 is maintained between 1.2 and 1.6 to ensure that the low refractive index layer 42 can cooperate with the high refractive index layer 41 to achieve the antireflection and antireflection effect of the antireflection layer 4.
  • the antistatic component is added to the low refractive index layer 42. Since the low refractive index layer 42 is closer to the outside of the protective film 22, that is, the antistatic component is closer to the protective film. The outer side of the film 22 makes the anti-static ability of the anti-reflection and anti-reflection layer 4 stronger, which is beneficial to improve the anti-static performance of the protective film 22.
  • both the low refractive index layer and the high refractive index layer 41 of the antireflection layer 4 may be added with antistatic components to enhance the antistatic ability of the antireflection layer 4. Furthermore, the antistatic performance of the protective film 22 is improved.
  • FIG. 8 is a schematic cross-sectional structure diagram of the protective film 22 of the display screen assembly 20 shown in FIG. 4 taken along the I-I direction in the fourth embodiment.
  • the difference between the protective film 22 shown in this embodiment and the protective film 22 shown in the third embodiment is that the antireflection layer 4 is formed on the hardened layer 3 away from the base film layer 1 by a magnetron sputtering coating process. surface. That is, both the high refractive index layer 41 and the low refractive index layer 42 are formed by a magnetron sputtering coating process. Wherein, the thickness of the anti-reflection and anti-reflection layer 4 is between 50 nm and 1000 nm.
  • both the high refractive index layer 41 and the low refractive index layer 42 are formed by the same process, for example, both are formed by a coating process or both are formed by a magnetron sputtering coating process, so as to save production costs. It should be understood that in other embodiments, the high refractive index layer 41 and the low refractive index layer 42 can also be formed by different processes. For example, the high refractive index layer 41 is formed by a coating process, and the low refractive index layer 42 is formed by magnetron.
  • the high refractive index layer 41 is formed by a sputtering coating process, or the high refractive index layer 41 is formed by a magnetron sputtering coating process, and the low refractive index layer 42 is formed by a coating process, which is not specifically limited in this application.
  • the antireflection and antireflection layer 4 includes a low refractive index layer 42 and a high refractive index layer 41.
  • the high refractive index layer 41 and the low refractive index layer are sequentially laminated on the surface of the hardened layer 3 away from the base film layer 1.
  • the high refractive index layer 41 is doped with antistatic components, so that the anti-reflection and anti-reflection layer 4 also has antistatic properties, which can reduce the surface resistance of the protective film 22, prevent the generation of static electricity, and ensure the antistatic properties of the protective film 22 Performance, avoid the adsorption of dust and impurities on the surface of the protective film 22, and improve the display quality of the display screen 21.
  • the antireflection layer 4 may include multiple (two or more) low refractive index layers 42 or multiple high refractive index layers 41, for example, an antireflection layer
  • the total number of layers 4 can be between 3 and 8 layers, so as to ensure the antireflection and antireflection effect of the antireflection layer 4 while avoiding the thickness of the protective film 22 from being too large and affecting the thinner and lighter design of the terminal 100.
  • the high refractive index layer 41 includes an inorganic film layer 414 and an antistatic component 413 doped in the inorganic film layer 414.
  • the refractive index of the inorganic film layer 414 is greater than 1.6.
  • the material of the inorganic film layer 414 includes inorganic metal oxide.
  • the inorganic metal oxide included in the inorganic film layer 414 is Nb 2 O 5 or TiO 2 . It should be understood that, in other embodiments, the material of the inorganic film layer 414 may not include inorganic metal oxides, but include nitrides or oxynitrides, such as Si 3 N 4 .
  • the antistatic component 413 is doped in inorganic metal oxide.
  • the antistatic component 413 is a metal oxide.
  • the antistatic component 413 includes, but is not limited to, ZnO, In 2 O 3 and other metal oxides capable of generating oxygen holes.
  • the refractive index of the low refractive index layer 42 is less than 1.5.
  • the material of the low refractive index layer 42 includes inorganic materials such as SiO 2.
  • FIG. 9 is a schematic cross-sectional structure diagram of the protective film 22 of the display screen assembly 20 shown in FIG. 4 cut along the direction I-I in the fifth embodiment.
  • the hardened layer 3 further includes an antistatic component 32 doped in the resin layer 31.
  • the antistatic component 32 is doped into the acrylic resin of the resin layer 31 to increase the antistatic ability of the hardened layer 3, improve the antistatic performance of the protective film 22, reduce the surface resistance of the protective film 22, prevent the generation of static electricity, and improve The display clarity of the display screen assembly 20.
  • the antistatic component 32 is an antistatic agent.
  • Antistatic components 32 include, but are not limited to, anionic antistatic agents such as alkyl sulfonic acid, alkali metal phosphate, alkyl quaternary ammonium salts, phosphorous or phosphonium salt surfactants, cationic antistatic agents, and ethoxylated aliphatic Alkylamine non-ionic antistatic agent or conductive polymer antistatic agent such as PEDOT:PSS.
  • anionic antistatic agents such as alkyl sulfonic acid, alkali metal phosphate, alkyl quaternary ammonium salts, phosphorous or phosphonium salt surfactants, cationic antistatic agents, and ethoxylated aliphatic Alkylamine non-ionic antistatic agent or conductive polymer antistatic agent such as PEDOT:PSS.
  • the other layer structure of the protective film 22 shown in FIG. 9 is described by taking the other layer structure of the protective film 22 in the second embodiment described above as an example. It should be understood that the other layer structures of the protective film 22 shown in FIG. 9 may also be other layer structures of the protective film 22 in other embodiments, and will not be described here too much.
  • FIG. 10 is a schematic cross-sectional structure diagram of the protective film 22 of the display screen assembly 20 shown in FIG. 4 cut along the direction I-I in the sixth embodiment.
  • the protective film 22 further includes an antistatic layer 7.
  • the antistatic layer 7 is located between the adhesive layer 2 and the base film layer 1.
  • the antistatic layer 7 is formed on the surface of the base film layer 1 away from the hardened layer 3 by a coating process.
  • the adhesive layer 2 is laminated on the surface of the antistatic layer 7 away from the base film layer 1.
  • the material of the antistatic layer 7 includes an antistatic agent.
  • the material of the antistatic layer 7 includes, but is not limited to, anionic antistatic agents such as alkyl sulfonic acid, alkali metal phosphate, alkyl quaternary ammonium salts, phosphorus or phosphonium salt surfactants, cationic antistatic agents, ethyl Oxylated aliphatic alkylamine non-ionic antistatic agent or conductive polymer antistatic agent such as PEDOT:PSS.
  • the presence of the antistatic layer 7 can not only improve the antistatic performance of the protective film 22, but also the antistatic layer 7 can better bond with the base film layer 1 and the adhesive layer 2, namely The antistatic layer 7 can also effectively improve the adhesion of the adhesive layer 2 on the surface of the base film layer 1.
  • the protective film 22 is removed from the display surface 211 of the display screen 21, no residue will remain on the display surface 211 of the display screen 21 Adhesive layer 2 colloid.
  • the other layer structure of the protective film 22 shown in FIG. 10 is described by taking the other layer structure of the protective film 22 in the second embodiment described above as an example. It should be understood that the other layer structures of the protective film 22 shown in FIG. 10 may also be other layer structures of the protective film 22 in other embodiments, which are not described here too much.
  • FIG. 11 is a schematic cross-sectional structure diagram of the protective film 22 of the display screen assembly 20 shown in FIG. 4 cut along the direction I-I in the seventh embodiment.
  • the difference between the protective film 22 shown in this embodiment and the protective film 22 shown in the fifth embodiment is that the antistatic layer 7 is located on the side of the base film layer 1 away from the adhesive layer 2. Specifically, the antistatic layer 7 is located between the hardened layer 3 and the base film layer 1. That is, the antistatic layer 7 is located between the hardened layer 3 and the high modulus base film 11. Wherein, the antistatic layer 7 is formed on the surface of the base film layer 1 away from the adhesive layer 2 through a coating process. At this time, the hardened layer 3 is laminated on the surface of the antistatic layer 7 away from the base film layer 1.
  • the antistatic layer 7 of the protective film 22 shown in this embodiment is located between the hardened layer 3 and the base film layer 1. At this time, the antistatic layer 7 is closer to the protective film The outer side of the protective film 22 is beneficial to improve the antistatic performance of the protective film 22.
  • FIG. 12 is a schematic cross-sectional structure diagram of the protective film 22 of the display screen assembly 20 shown in FIG. 4 cut along the I-I direction in the eighth embodiment.
  • the difference between the protective film 22 shown in this embodiment and the protective film 22 shown in the seventh embodiment is that the antistatic layer 7 is located between the hardened layer 3 and the antireflection layer 4. Specifically, the antistatic layer 7 is located between the hardened layer 3 and the high refractive index layer 41. Wherein, the antistatic layer 7 is formed on the surface of the hardened layer 3 away from the base film layer 1 through a coating process. At this time, the high refractive index layer 41 is laminated on the surface of the antistatic layer 7 away from the hardened layer 3.
  • the antistatic layer 7 of the protective film 22 shown in this embodiment is located between the hardened layer 3 and the antireflection layer 4, at this time, the antistatic layer The layer 7 is closer to the outside of the protective film 22, which helps to improve the antistatic performance of the protective film 22.
  • the protective film 22 may also include multiple (two or more) antistatic layers 7 to improve the antistatic ability of the protective film 22.
  • the protective film 22 may include two antistatic layers 7, one antistatic layer 7 is located between the adhesive layer 2 and the base film layer 1, and the other antistatic layer 7 is located between the hardened layer 3 and the base film layer 1 or Between the antireflection and antireflection layers 4, or, an antistatic layer 7 is located between the hardened layer 3 and the base film layer 1, and the other antistatic layer 7 is located between the hardened layer 3 and the antireflection and antireflection layer 4.
  • the protective film 22 may also include three antistatic layers 7, an antistatic layer 7 is located between the adhesive layer 2 and the base film layer 1, and an antistatic layer 7 is located between the hardened layer 3 and the base film layer 1. In between, an antistatic layer 7 is located between the hardened layer 3 and the anti-reflection and anti-reflection layer 4.
  • FIG. 13 is a schematic cross-sectional structure diagram of the protective film 22 in the display screen assembly 20 of the second terminal 100 provided in an embodiment of the present application, taken along the I-I direction in an embodiment.
  • the difference between the terminal 100 shown in the embodiment of this application and the terminal 100 shown in the foregoing embodiment is that the low refractive index layer 42 or the high refractive index layer 41 of the antireflection layer 4 of the protective film 22 is not doped with anti Electrostatic component.
  • the antireflection and antireflection layer 4 is located on the side of the hardened layer 3 away from the base film layer 1.
  • the antireflection and antireflection layer 4 is formed on the surface of the hardened layer 3 away from the base film layer 1 through a coating process.
  • the high refractive index layer 41 includes a resin layer 411 and metal oxide particles 412 doped in the resin layer 411.
  • the low refractive index layer 42 includes a resin layer 421 and oxide particles or fluoride particles 422 doped in the resin layer 421.
  • the AR layer 4 can also be formed on the surface of the hardened layer 3 away from the base film layer 1 by a magnetron sputtering coating process.
  • the material of the high refractive index layer 41 includes metal oxides such as Nb 2 O 5 and TiO 2 and nitrides or oxynitrides such as Si 3 N 4.
  • the material of the low refractive index layer 42 includes inorganic materials such as SiO 2. It should be understood that in other embodiments, the high refractive index layer 41 and the low refractive index layer 42 may also be formed by different processes.
  • the protective film 22 further includes an antistatic layer 7 to improve the antistatic performance of the protective film 22.
  • the material of the antistatic layer 7 includes an antistatic agent.
  • the material of the antistatic layer 7 includes, but is not limited to, anionic antistatic agents such as alkyl sulfonic acid, alkali metal phosphate, alkyl quaternary ammonium salts, phosphorus or phosphonium salt surfactants, cationic antistatic agents, and ethoxylates.
  • anionic antistatic agents such as alkyl sulfonic acid, alkali metal phosphate, alkyl quaternary ammonium salts, phosphorus or phosphonium salt surfactants, cationic antistatic agents, and ethoxylates.
  • Alkylated aliphatic alkylamine non-ionic antistatic agent or conductive polymer antistatic agent such as PEDOT:PSS.
  • the antistatic layer 7 is located between the adhesive layer 2 and the base film layer 1. Wherein, the antistatic layer 7 is formed on the surface of the base film layer 1 away from the hardened layer 3 by a coating process. At this time, the adhesive layer 2 is laminated on the surface of the antistatic layer 7 away from the base film layer 1.
  • the presence of the antistatic layer 7 can not only improve the antistatic performance of the protective film 22, but also the antistatic layer 7 can better bond with the base film layer 1 and the adhesive layer 2, namely The antistatic layer 7 can also effectively improve the adhesion of the adhesive layer 2 on the surface of the base film layer 1.
  • the protective film 22 is removed from the display surface 211 of the display screen 21, no residue will remain on the display surface 211 of the display screen 21 Adhesive layer 2 colloid.
  • the hardened layer 3 is located on the side of the base film layer 1 facing away from the antistatic layer 4.
  • the hardened layer 3 includes a resin layer 31.
  • the material of the resin layer 31 includes an acrylic material, a PUA material, a silane-modified acrylic material, or a silane-modified PUA material.
  • the material of the resin layer 31 includes an acrylic material.
  • the acrylic material included in the resin layer 31 is acrylic resin. It should be noted that in other embodiments, the acrylic material included in the resin layer 31 may not be an acrylic resin, but may be other acrylic materials other than the acrylic resin.
  • FIG. 14 is a schematic cross-sectional structure diagram of the protective film 22 in the display screen assembly 20 of the second terminal 100 provided by the embodiment of the present application, which is cut along the direction I-I in the second embodiment.
  • the antistatic layer 7 is located on the side of the hardened layer 3 away from the adhesive layer 2. Specifically, the antistatic layer 7 is located between the hardened layer 2 and the base film layer 1. which is. The antistatic layer 7 is located between the hardened layer 2 and the high modulus base film 11. Wherein, the antistatic layer 7 is formed on the surface of the base film layer 1 away from the adhesive layer 2 through a coating process. At this time, the hardened layer 3 is laminated on the surface of the antistatic layer 7 away from the base film layer 1.
  • the antistatic layer 7 of the protective film 22 shown in this embodiment is located between the hardened layer 3 and the base film layer 1. At this time, the antistatic layer 7 is closer to the protective film The outer side of the protective film 22 is beneficial to improve the antistatic performance of the protective film 22.
  • FIG. 15 is a schematic cross-sectional structure diagram of the protective film 22 in the display screen assembly 20 of the second terminal 100 provided in an embodiment of the present application, cut along the I-I direction in the third embodiment.
  • the antistatic layer 7 is located between the hardened layer 2 and the antireflection and antireflection layer 4. That is, the antistatic layer 7 is located between the hardened layer 3 and the high refractive index layer 41. Wherein, the antistatic layer 7 is formed on the surface of the hardened layer 3 away from the base film layer 1 through a coating process. At this time, the anti-reflection and anti-reflection layer 4 is located on the side of the antistatic layer 7 away from the hardened layer 3.
  • the antistatic layer 7 of the protective film 22 shown in this embodiment is located between the hardened layer 3 and the antireflection and antireflection layer 4, and the antistatic layer 7 is closer to the protective film 22 at this time.
  • the outer side of the protective film 22 is beneficial to improve the antistatic performance of the protective film 22.
  • FIG. 16 is a schematic cross-sectional structure diagram of the protective film 22 in the display screen assembly 20 of the second terminal 100 provided by the embodiment of the present application, taken along the I-I direction in the fourth embodiment.
  • the hardened layer 3 also includes an antistatic component 32 doped in the resin layer 31 to increase the antistatic ability of the hardened layer 3 and improve the protection.
  • the antistatic performance of the film 22 reduces the surface resistance of the protective film 22, prevents the generation of static electricity, and improves the display clarity of the display screen assembly 20.
  • the antistatic component 32 is an antistatic agent.
  • Antistatic components 32 include, but are not limited to, anionic antistatic agents such as alkyl sulfonic acid, alkali metal phosphate, alkyl quaternary ammonium salts, phosphorous or phosphonium salt surfactants, cationic antistatic agents, and ethoxylated aliphatic Alkylamine non-ionic antistatic agent or conductive polymer antistatic agent such as PEDOT:PSS.
  • the other layer structure of the protective film 22 shown in FIG. 16 is described by taking the other layer structure of the protective film 22 in the first embodiment in this embodiment as an example. It should be understood that the other layer structures of the protective film 22 shown in FIG. 16 may also be other layer structures of the protective film 22 in other embodiments, which are not described here.
  • FIG. 17 is a schematic cross-sectional structure diagram of the protective film 22 of the display screen assembly 20 of the third terminal 100 provided in an embodiment of the present application, taken along the I-I direction.
  • the difference between the terminal 100 shown in the embodiment of this application and the terminal 100 shown in the above two embodiments is that the low refractive index layer 42 or the high refractive index layer 41 of the antireflection layer 4 of the protective film 22 is not doped There are antistatic components, and the antistatic layer 7 is not included.
  • the hardened layer 3 further includes an antistatic component 32 doped in the resin layer 31 to increase the antistatic ability of the hardened layer 3, improve the antistatic performance of the protective film 22, and reduce the surface resistance of the protective film 22, Prevent the generation of static electricity and improve the display clarity of the display screen assembly 20.
  • the antistatic component 32 is an antistatic agent.
  • Antistatic components 32 include, but are not limited to, anionic antistatic agents such as alkyl sulfonic acid, alkali metal phosphate, alkyl quaternary ammonium salts, phosphorous or phosphonium salt surfactants, cationic antistatic agents, and ethoxylated aliphatic Alkylamine non-ionic antistatic agent or conductive polymer antistatic agent such as PEDOT:PSS.
  • anionic antistatic agents such as alkyl sulfonic acid, alkali metal phosphate, alkyl quaternary ammonium salts, phosphorous or phosphonium salt surfactants, cationic antistatic agents, and ethoxylated aliphatic Alkylamine non-ionic antistatic agent or conductive polymer antistatic agent such as PEDOT:PSS.
  • the other layer structure of the protective film 22 shown in FIG. 17 is described by taking the other layer structure of the protective film 22 in the second embodiment in the first embodiment as an example. It should be understood that the other layer structures of the protective film 22 shown in FIG. 17 may also be other layer structures of the protective film 22 in other embodiments, which will not be described here.
  • FIG. 18 is a schematic structural diagram of a protective film assembly 200 provided by an embodiment of the present application.
  • 19 is a schematic cross-sectional structure diagram of the protective film assembly 200 shown in FIG. 18 taken along the II-II direction.
  • the protective film 22 in the protective film assembly 200 shown in FIGS. 18 and 19 is in a state where the protective film 22 in the terminal 100 shown in FIG. 1 is not attached to the display screen 21.
  • the protective film assembly 200 is described by taking the protective film 22 as the protective film 22 shown in the first embodiment described above as an example.
  • the protective film assembly 200 includes any of the protective films 22 described above, a first release film 30, a second release film 40, a first tearing part 50, and a second tearing part 60.
  • the protective film 22 is connected between the second release film 40 and the first release film 30.
  • the second release film 40 covers the surface of the anti-fouling layer 5 away from the AR layer 4
  • the first release film 30 covers the surface of the adhesive layer 2 away from the base film layer 1. That is, the second release film 40 covers the outer surface of the protective film 22, and the first release film 30 covers the inner surface of the protective film 22 layer.
  • the second release film 40 and the first release film 30 respectively cover the two opposite surfaces of the protective film 22, which can not only protect the protective film 22, prevent the protective film 22 from being damaged during transportation, but also prevent The adhesive layer 2 of the protective film 22 loses its viscosity when exposed to the air.
  • the first tearing portion 50 is connected to the first release film 30 and extends out of the edge of the protective film 22, and the second tearing portion 60 is connected to the second release film 40 and extends out of the edge of the protective film 22.
  • the protective film 22 is rectangular
  • the second release film 40 and the first release film 30 are rectangular in conformity with the shape and size of the protective film 22.
  • the first tearing part 50 is connected to the corner of the first release film 30, and the second tearing part 60 is connected to the corner of the second release film 40 to facilitate the connection between the second release film 40 and the first release film 40.
  • the release film 30 is quickly torn off from the protective film 22.
  • the first release film 30 can be easily removed from the adhesive layer of the protective film 22 by holding the first tearing part 50 2 is quickly peeled off, and then the surface of the adhesive layer 2 away from the second release film 40 is aligned with the display surface 211 of the display 21 of the terminal 100 and attached to the display 21, and finally by holding the second release film
  • the tearing part 60 tears the second release film 40 from the anti-fouling layer 5 of the protective film 22 to complete the film sticking to the display screen 21.
  • the protective film 22 when the protective film 22 is attached, it can be attached to the display surface 211 of the display screen 21 through the protective film 22 by a filming jig or device, and then subjected to high-pressure defoaming treatment to make the protective film 22 completely attached. On the display surface 211 of the display screen 21, the protection of the display screen 21 is realized.
  • FIG. 20 is a process flow diagram of a method for preparing a protective film according to an embodiment of the present application.
  • the method for preparing the protective film shown in the embodiment of the present application is used to prepare the protective film 22 in the display screen assembly 20 of the terminal 100 described above.
  • FIG. 21 is a schematic diagram of the structure of the hardened layer 3 formed in the method for preparing the protective film shown in FIG. 20.
  • step S1 a hardened layer 3 is formed on the surface of the base film layer 1.
  • the material of the hardening layer 3 includes acrylic resin.
  • the hardened layer 3 is formed on the surface of the base film layer 1 through a coating process.
  • step S1 can be implemented through step S101 to step S103.
  • Step S101 the base film layer 1 is provided.
  • the base film layer 1 is formed by a coating process.
  • step S101 can be implemented through step S1011 to step S1013.
  • Step S1011 providing a high modulus base film.
  • the elastic modulus of the high modulus base film is 4 Gpa.
  • the material of the high modulus base film includes PET, and the thickness of the high modulus base film is about 50 ⁇ m. PET is used as the material of the base film layer 1 in the protective film 22 to support other film layer structures of the protective film 22 to ensure the mechanical and optical properties of the protective film 22.
  • Step S1012 preparing a low modulus base film coating solution. Specifically, take 10 parts of polyether polyol, 20 parts of polyether polyol, 5 parts of hexamethylene diisocyanate, 0.5 parts of toluene diisocyanate, 0.2 parts of ethylene glycol, and obtain a low modulus base film through high-speed mechanical stirring for 3 minutes ⁇ Coating solution. It should be noted that the unit of "parts" mentioned in the embodiments of the present application can refer to grams or kilograms.
  • Step S1013 coating a low modulus base film coating liquid on the surface of the high modulus base film, and curing the low modulus base film coating liquid on the surface of the high modulus base film to form a low modulus base film. That is, the base film layer 1 whose film structure is a high modulus base film/low modulus base film is obtained.
  • the elastic modulus of the low modulus base film is 200 MPa, and the thickness is 50 ⁇ m.
  • step S101 can be implemented through step S1011 / to step S1014 / .
  • Step S1011 / provide a high modulus base film.
  • the elastic modulus of the high modulus base film is 4 Gpa, and the thickness is about 50 ⁇ m.
  • Step S1012 / preparing a low modulus base film coating solution.
  • Step S1013 / coating the low modulus base film coating liquid on the surface of the high modulus base film, and curing the low modulus base film coating liquid on the surface of the high modulus base film to form a low modulus base film, A film structure of high modulus base film/low modulus base film is obtained.
  • the elastic modulus of the low modulus base film is 250 MPa, and the thickness is 30 ⁇ m.
  • Step S1014 / covering the surface of the low modulus base film away from the high modulus base film with a high modulus base film to obtain a base film with a film structure of high modulus base film/low modulus base film/high modulus base film ⁇ 1 ⁇ Film layer 1.
  • Step S102 preparing a hardened layer coating liquid. Specifically, 15 g of methyl methacrylate, 6 g of butyl acrylate, 8 g of styrene, 3 g of acrylic acid, 40 g of ethyl acetate, and 1 g of 1-hydroxycyclohexyl phenyl ketone were used for high-speed mechanical stirring for 10 minutes to obtain a hardened layer coating solution.
  • step S103 the hardened layer coating liquid is applied on the surface of the base film layer 1, and the hardened layer coating liquid on the surface of the base film layer 1 is cured to obtain the hardened layer 3.
  • the hardened layer coating liquid is applied to the surface of the base film layer 1, and the base film layer 1 coated with the hardened layer coating liquid on the surface is placed in an oven at a temperature of 110°C and dried for 80 seconds to make the coating The solvent of the liquid evaporates.
  • the curing layer coating solution on the surface of the base film layer 1 is irradiated and cured by mercury lamp source ultraviolet (UV) light, and the irradiation measurement is 2400mj/cm 2 , and a hardened layer 3 with a thickness of about 2 ⁇ m is formed on the surface of the base film layer 1.
  • UV mercury lamp source ultraviolet
  • FIG. 22 is a schematic diagram of the structure of the antireflection and antireflection layer 4 formed in the method for preparing the protective film shown in FIG. 20.
  • Step S2 forming an antireflection and antireflection layer 4 on the surface of the hardened layer 3 away from the base film layer 1.
  • the antireflection and antireflection layer 4 includes a high refractive index layer 41 and a low refractive index layer 42 alternately stacked.
  • the layer structure of the antireflection and antireflection layer 4 far from the hardened layer 3 is the low refractive index layer 42.
  • the antireflection and antireflection layer 4 includes a high refractive index layer 41 and a low refractive index layer 42.
  • the high refractive index layer 41 and the low refractive index layer 42 are sequentially laminated on the hardened layer 3 away from the base film layer 1. s surface.
  • the high refractive index layer 41 or the low refractive index layer 42 is doped with antistatic components.
  • the antireflection and antireflection layer 4 is formed on the surface of the hardened layer 3 through a coating process.
  • the high refractive index layer 41 is doped with antistatic components, which include but are not limited to anionic antistatic agents such as alkyl sulfonic acid and alkali metal phosphate, alkyl quaternary ammonium salts, phosphorus or phosphonium salts.
  • anionic antistatic agents such as alkyl sulfonic acid and alkali metal phosphate, alkyl quaternary ammonium salts, phosphorus or phosphonium salts.
  • step S2 can be implemented through step S201 to step S204.
  • Step S201 preparing a coating solution for a high refractive index layer. Specifically, take a certain amount of antistatic ingredients, 25g 1-naphthalene methacrylate, 5g ethyl acrylate, 5g methyl methacrylate, 2g zirconium oxide particles, 30g ethyl acetate, 2g 2,4,6-three Ethyl methyl benzoyl phosphonate, high-speed mechanical stirring for 20 minutes to obtain a coating solution for the high refractive index layer.
  • antistatic ingredients 25g 1-naphthalene methacrylate, 5g ethyl acrylate, 5g methyl methacrylate, 2g zirconium oxide particles, 30g ethyl acetate, 2g 2,4,6-three Ethyl methyl benzoyl phosphonate, high-speed mechanical stirring for 20 minutes to obtain a coating solution for the high refractive index layer.
  • a coating solution for a low refractive index layer is prepared. Specifically, take 25g methyl acrylate, 5g ethyl acrylate, 5g methyl methacrylate, 40g ethyl acetate, 2g ethyl 2,4,6-trimethylbenzoylphosphonate, 3g hollow silica particles .
  • the low-refractive index layer coating solution is obtained by high-speed mechanical stirring for 10 minutes.
  • step S201 and step S202 are not particularly limited in this application.
  • Step S202 can also be performed before step S201, that is, the preparation of the low refractive index layer coating solution can be performed first, and then the high refractive index layer coating solution can be prepared.
  • the preparation of the layer coating liquid is not specifically limited in this application.
  • Step S203 coating the high refractive index layer coating liquid on the surface of the hardened layer 3 away from the base film layer 1, and curing the high refractive index layer coating liquid on the surface of the hardened layer 3 to obtain the high refractive index layer 41.
  • the high refractive index layer coating liquid is coated on the surface of the hardened layer 3 away from the base film layer 1, and the film structure coated with the high refractive index layer coating liquid is placed in an oven at a temperature of 115° C. Dry for 60 s to volatilize the solvent of the coating solution for the high refractive index layer, and then cure by UV light radiation from a mercury lamp source.
  • the irradiation measurement is 2000 mj/cm 2 , and a high refractive index layer with a thickness of about 0.05 ⁇ m is formed on the surface of the hardened layer 3 41 to obtain a film structure of high refractive index layer/hardened layer/base film layer.
  • Step S204 coating the low refractive index layer coating liquid on the surface of the high refractive index layer 41 away from the hardened layer 3, and curing the low refractive index layer coating liquid on the surface of the high refractive index layer 41 to obtain the low refractive index layer 42 .
  • the low refractive index layer coating liquid is coated on the surface of the high refractive index layer 41 away from the hardened layer 3, and the film structure coated with the low refractive index layer coating liquid is placed in an oven at a temperature of 115°C Dry for 70s to volatilize the solvent of the coating solution for the low refractive index layer, and then cure by UV light radiation from a mercury lamp source.
  • the irradiation measurement is 2200mj/cm 2 , and a low refractive index with a thickness of about 0.06 ⁇ m is formed on the surface of the hardened layer 3
  • the layer 42 obtains a film structure of low refractive index layer/high refractive index layer/hardened layer/base film layer, that is, a film structure of antireflection layer/hardened layer/base film layer is obtained.
  • the difference from the foregoing embodiment is that the high refractive index layer 41 is not doped with an antistatic component, and the low refractive index layer 42 is doped with an antistatic component. It can be understood that, in other embodiments, both the high refractive index layer 41 and the low refractive index layer 42 may also be doped with antistatic components.
  • step S2 shown in this embodiment The difference between step S2 shown in this embodiment and step S2 shown in the foregoing embodiment is: step S201 and step S202.
  • Step S201 preparing a coating solution for a high refractive index layer. Specifically, take 25g 1-naphthalene methacrylate, 5g ethyl acrylate, 5g methyl methacrylate, 2g zirconia particles, 30g ethyl acetate, 2g 2,4,6-trimethylbenzoyl phosphonic acid Ethyl ester, a high-refractive-index layer coating solution was obtained by high-speed mechanical stirring for 20 minutes.
  • a coating solution for a low refractive index layer is prepared. Specifically, take a certain amount of antistatic ingredients, 25g methyl acrylate, 5g ethyl acrylate, 5g methyl methacrylate, 40g ethyl acetate, 2g 2,4,6-trimethylbenzoyl phosphonate ethyl ester , 3g of hollow silica particles, high-speed mechanical stirring for 10 minutes to obtain a low refractive index layer coating solution.
  • the difference from the above two embodiments is that the AR layer 4 is formed on the surface of the hardened layer 3 by a magnetron sputtering coating process.
  • the high refractive index layer 41 is doped with antistatic components, and the antistatic components include, but are not limited to, ZnO, In 2 O 3 and other antistatic components.
  • step S2 can be implemented through steps S201 / and S202 / .
  • Step S201 / using a target material such as a Nb target or a Ti target or Si target doped with antistatic metals such as Zn or In to coat the surface of the hardened layer 3 away from the base film layer 1 by magnetron sputtering to form ZnO, In 2
  • the high refractive index layer 41 of inorganic materials such as Nb 2 O 5 , TiO 2 or Si 3 N 4 , which is an antistatic component such as O 3 , is used to obtain a film structure of high refractive index layer/hardened layer/base film layer.
  • Step S202 / using a target material such as a Si target to coat the surface of the high refractive index layer 41 away from the hardened layer 3 by magnetron sputtering to form a low refractive index layer 42 containing SiO 2 to obtain a low refractive index layer/high refractive index layer
  • a target material such as a Si target to coat the surface of the high refractive index layer 41 away from the hardened layer 3 by magnetron sputtering to form a low refractive index layer 42 containing SiO 2 to obtain a low refractive index layer/high refractive index layer
  • the film structure of the /hardened layer/base film layer that is, the film structure of the antireflection layer/hardened layer/base film layer is obtained.
  • the formation process of the high refractive index layer 41 and the low refractive index layer 42 is the same, for example, both are formed by a coating process or a magnetron sputtering coating process to save production costs.
  • the high refractive index layer 41 and the low refractive index layer 42 can also be formed by different processes.
  • the refractive index layer 42, or the high refractive index layer 41 is formed by a magnetron sputtering process first, and then the low refractive index layer 42 is formed by a coating process, which is not specifically limited in this application.
  • FIG. 23 is a schematic diagram of the structure of forming the adhesive layer 2 in the method for preparing the protective film shown in FIG. 20.
  • Step S3 forming an adhesive layer 2 on the surface of the base film layer 1 away from the hardened layer 3.
  • the material of the adhesive layer 2 includes acrylic glue.
  • the adhesive layer 2 is formed on the surface of the base film layer 1 through a coating process. Specifically, step S3 can be implemented through step S301 and step S302.
  • Step S301 preparing an adhesive layer coating liquid. Specifically, 10 g of isooctyl acrylate, 10 g of butyl acrylate, 2 g of methyl methacrylate, 40 g of ethyl acetate, and 1 g of aminoethyl acrylate were taken, and the adhesive layer coating solution was obtained by high-speed mechanical stirring for 10 minutes.
  • Step S302 coating the adhesive layer coating liquid on the surface of the base film layer 1 away from the hardened layer 3, and curing the adhesive layer coating liquid on the surface of the base film layer 1 to obtain the adhesive layer 2.
  • the adhesive layer coating solution is applied to the surface of the base film layer 1 away from the hardened layer 3, and the film layer structure coated with the adhesive layer coating solution on the surface of the base film layer 1 is placed in a baking temperature of 110°C. Drying in an oven for 75 seconds to volatilize the solvent of the coating solution to obtain an adhesive layer 2 with a thickness of about 20 ⁇ m to obtain a film structure of antireflection layer/hardened layer/base film layer/adhesive layer 2.
  • step S4 the antifouling layer 5 is formed on the surface of the antireflection layer 4 away from the hardened layer 3 to obtain a protective film 22, as shown in FIG. 5.
  • the material of the anti-fouling layer 5 includes perfluoropolyether silane.
  • the anti-fouling layer 5 is formed on the surface of the anti-reflection and anti-reflection layer 4 through the R2R process.
  • a primer layer 6 is first formed on the surface of the AR layer 4 away from the hardened layer 3, and then an anti-fouling layer 5 is formed on the surface of the primer layer 6 away from the AR layer 4.
  • a base layer 6 including organosilane is formed on the surface of the AR layer 4 by vapor deposition, and then a base layer 6 including perfluoropolyether siloxane is formed on the surface of the base layer 6 by vapor deposition.
  • the anti-fouling layer 5 is about 15 nm to obtain a film structure of anti-fouling layer/antireflection layer/hardened layer/base film layer/adhesive layer. It should be noted that, in other embodiments, a sputtering process may also be used to form a primer layer 6 including inorganic silicon dioxide on the surface of the AR layer 4 that faces away from the hardened layer 3, which is not specifically limited in this application.
  • the method for preparing the protective film further includes:
  • Step S31 covering the first release film 30 on the surface of the adhesive layer 2 away from the base film layer 1 to obtain a film layer of antireflection layer/hardened layer/base film layer/adhesive layer/first release film structure.
  • the material of the first release film 30 includes PET, and the thickness of the first release film 30 is about 50 ⁇ m.
  • step S4 the method for preparing the protective film further includes steps S5 and S6.
  • Step S5 cover the second release film 40 on the surface of the anti-fouling layer 5 away from the anti-reflection layer 4 to obtain a second release film/anti-fouling layer/anti-reflection layer/hardened layer/base film layer/
  • the film structure of the adhesive layer/first release film is to obtain a protective film roll.
  • the material of the second release film 40 includes PET, and the thickness of the second release film 40 is about 50 ⁇ m.
  • step S6 the protective film roll is cut to obtain the protective film assembly 200, as shown in FIG. 9.
  • the protective film assembly 200 adapted to the display 21 of the terminal 100 is cut out using a knife die, and the protective film 22 in the protective film assembly 200 is retracted by 1.0 mm relative to the edge of the display 21 to ensure that the protective film 22
  • the bonding effect of bonding to the display surface 211 is good, and the protective film 22 is not prone to curling.
  • the protective film 22 prepared by the method for preparing the protective film shown in this embodiment can be observed and observed by ion polishing with transmission electron microscope (TEM) or scanning electron microscope (SEM). Measurement.
  • TEM transmission electron microscope
  • SEM scanning electron microscope
  • the material composition and performance of each layer structure in the protective film assembly 200 can be measured by Fourier transform infrared spectrometer (FTIR Spectrometer), X-ray photoelectron spectroscopy (XPS), and nuclear magnetic resonance. (nuclear magnetic resonance, NMR), energy dispersive spectrometer (EDX), rheometer (thermal mechanical analysis, TMA), etc. for testing.
  • FTIR Spectrometer Fourier transform infrared spectrometer
  • XPS X-ray photoelectron spectroscopy
  • NMR nuclear magnetic resonance
  • EDX energy dispersive spectrometer
  • rheometer thermo mechanical analysis, TMA
  • the protective film 22 prepared by the preparation method of the protective film shown in this embodiment is attached to the display screen 21 of the foldable terminal 100, and the dynamic bending and static bending properties of the protective film 22 are tested. After 30,000 times of dynamic bending, since the adhesive layer 2 is made of acrylic glue with ultra-low modulus and high resilience, the protective film 22 has bendable performance, and the protective film 22 does not rebound and arches, which is still better.
  • the display screen 21 attached to the terminal 100 on the ground protects the display screen 21.
  • the reflectance and transmittance of the protective film 22 prepared by the preparation method of the protective film shown in this embodiment can be tested.
  • the transmittance of the protective film 22 is between 94% and 95%, that is, the transmittance of the protective film 22 The overrate is better.
  • the display screen of the display screen 21 will not be affected.
  • the reflectivity of light with a wavelength of 550 nm on the protective film 22 is between 2.8% and 2.9%.
  • the protective film 22 has a better anti-reflection and anti-reflection effect, prevents glare phenomena such as "dazzling" when the light is directed to the terminal 100, avoids the user from feeling glare, and not only improves the display clarity of the display 21, It also improves the user experience.
  • the embodiment of the present application also provides another method for preparing a protective film, including:
  • step S1 a hardened layer 3 is formed on the surface of the base film layer 1.
  • the material of the hardening layer 3 includes acrylic resin.
  • step S1 in the method for preparing the protective film shown in this embodiment lies in step S101 and step S103.
  • Step S101 the base film layer 1 is provided.
  • the material of the base film layer 1 includes PET, and the thickness of the base film layer 1 is about 38 ⁇ m.
  • step S103 the hardened layer coating liquid is applied on the surface of the base film layer 1, and the hardened layer coating liquid on the surface of the base film layer 1 is cured to obtain the hardened layer 3.
  • the hardened layer coating liquid is applied to the surface of the base film layer 1, and the base film layer 1 coated with the hardened layer coating liquid on the surface is placed in an oven at a temperature of 108°C and dried for 90 seconds to make the coating The solvent of the liquid evaporates.
  • the curing layer coating solution on the surface of the base film layer 1 is irradiated and cured by mercury lamp source UV light, and the irradiation measurement is 2200mj/cm 2 , and a hardened layer 3 with a thickness of about 3 ⁇ m is formed on the surface of the base film layer 1 to obtain The film structure of the hardened layer/base film layer.
  • Step S2 forming an antireflection and antireflection layer 4 on the surface of the hardened layer 3 away from the base film layer 1.
  • the antireflection and antireflection layer 4 includes a high refractive index layer 41 and a low refractive index layer 42 alternately stacked.
  • the layer structure of the antireflection and antireflection layer 4 far from the hardened layer 3 is the low refractive index layer 42.
  • step S1 in the method for preparing the protective film shown in this embodiment lies in step S203 and step S204.
  • Step S203 coating the high refractive index layer coating liquid on the surface of the hardened layer 3 away from the base film layer 1, and curing the high refractive index layer coating liquid on the surface of the hardened layer 3 to obtain the high refractive index layer 41.
  • the high refractive index layer coating liquid is coated on the surface of the hardened layer 3 away from the base film layer 1, and the layer structure coated with the high refractive index layer coating liquid is placed in an oven at a temperature of 112°C for drying 75s, volatilize the solvent of the coating solution for the high refractive index layer, and then cure by UV light radiation of a mercury lamp source, the irradiation measurement is 2150mj/cm 2 , a high refractive index layer 41 is formed on the surface of the hardened layer 3 to obtain a high refractive index Layer/hardened layer/base film layer structure.
  • Step S204 coating the low refractive index layer coating liquid on the surface of the high refractive index layer 41 away from the hardened layer 3, and curing the low refractive index layer coating liquid on the surface of the high refractive index layer 41 to form a thickness of about 0.02 ⁇ m
  • the low refractive index layer 42 to obtain a layer structure of low refractive index layer/high refractive index layer/hardened layer/base film layer.
  • step S2 further includes step S205 and step S206.
  • Step S205 coating the high refractive index layer coating liquid on the surface of the low refractive index layer 42 away from the high refractive index layer 41, and curing the high refractive index layer coating liquid on the surface of the low refractive index layer 42 to obtain a high refractive index Layer 41.
  • the high refractive index layer coating liquid is coated on the surface of the hardened layer 3 away from the base film layer 1, and the film structure coated with the high refractive index layer coating liquid is placed in an oven at a temperature of 113°C for baking. Dry for 65s to volatilize the solvent of the coating solution for the high refractive index layer, and then cure by UV light radiation from a mercury lamp source.
  • the irradiation measurement is 2100mj/cm 2 , and a high refractive index with a thickness of about 0.06 ⁇ m is formed on the surface of the low refractive index layer 42 Rate layer 41 to obtain a film structure of high refractive index layer/low refractive index layer/high refractive index layer/hardened layer/base film layer.
  • Step S206 coating the low refractive index layer coating liquid on the surface of the high refractive index layer 41 away from the low refractive index layer 42, and curing the low refractive index layer coating liquid on the surface of the high refractive index layer 41 to obtain a low refractive index Layer 42.
  • the low refractive index layer coating liquid is coated on the surface of the high refractive index layer 41 away from the low refractive index layer 42, and the layer structure coated with the low refractive index layer coating liquid is placed in a baking temperature of 115°C. Dry in the oven for 50s to volatilize the solvent of the coating solution for the low refractive index layer, and then cure by UV light radiation from a mercury lamp source.
  • the irradiation measurement is 2300mj/cm 2 , and the thickness on the surface of the high refractive index layer 41 is about 0.04 ⁇ m.
  • the low refractive index layer 42 to obtain the film structure of the low refractive index layer/high refractive index layer/low refractive index layer/high refractive index layer/hardened layer/base film layer, namely to obtain the antireflection layer/hardened layer /The film structure of the base film layer.
  • Step S3 forming an adhesive layer 2 on the surface of the base film layer 1 away from the hardened layer 3.
  • the material of the adhesive layer 2 includes acrylic glue.
  • step S3 in the method for preparing the protective film shown in this embodiment lies in step S302.
  • Step S302 coating the adhesive layer coating liquid on the surface of the base film layer 1 away from the hardened layer 3, and curing the adhesive layer coating liquid on the surface of the base film layer 1 to obtain the adhesive layer 2.
  • the adhesive layer coating liquid is applied to the surface of the base film layer 1 away from the hardened layer 3, and the film layer structure coated with the adhesive layer coating liquid on the surface of the base film layer 1 is placed in a baking temperature of 108°C. Dry in an oven for 85 seconds to volatilize the solvent of the coating solution to obtain an adhesive layer 2 with a thickness of about 25 ⁇ m to obtain a film structure of AR layer/hardened layer/base film layer/adhesive layer 2.
  • Step S31 covering the first release film 30 on the surface of the adhesive layer 2 away from the base film layer 1 to obtain a film of antireflection layer/hardened layer/base film layer/adhesive layer/first release film 30 Layer structure.
  • the material of the first release film 30 includes PET, and the thickness of the first release film 30 is about 50 ⁇ m.
  • Step S4 forming an anti-fouling layer 5 on the surface of the anti-reflection layer 4 away from the hardened layer 3 to obtain anti-fouling layer/anti-reflection layer/hardened layer/base film layer/adhesive layer/first release film 30 film structure.
  • the material of the antifouling layer 5 includes perfluoropolyether silane, and the thickness of the antifouling layer 5 is about 20 ⁇ m.
  • Step S5 cover the second release film 40 on the surface of the anti-fouling layer 5 away from the anti-reflection layer 4 to obtain a second release film/anti-fouling layer/anti-reflection layer/hardened layer/base film layer/
  • the film structure of the adhesive layer/first release film 30 is a protective film roll.
  • the material of the second release film 40 includes PET, and the thickness of the second release film 40 is about 50 ⁇ m.
  • step S6 the protective film roll is cut to obtain the protective film assembly 200.
  • the protective film 22 prepared by the preparation method of the protective film shown in this embodiment is attached to the display screen 21 of the foldable terminal 100, and the dynamic bending and static bending performance of the protective film 22 are tested. After the bending and static bending tests, the protective film 22 did not rebound and arch, and was still well attached to the display screen 21 of the terminal 100 to protect the display screen 21.
  • the reflectance and transmittance of the protective film 22 prepared by the preparation method of the protective film shown in this embodiment can be tested.
  • the transmittance of the protective film 22 is between 94% and 95%, that is, the transmittance of the protective film 22 The overrate is better.
  • the display screen of the display screen 21 will not be affected.
  • the reflectivity of light with a wavelength of 550 nm on the protective film 22 is between 2.7% and 2.8%.
  • the protective film 22 has a better anti-reflection and anti-reflection effect, prevents glare phenomena such as "dazzling" when the light is directed to the terminal 100, avoids the user from feeling glare, and not only improves the display clarity of the display 21, It also improves the user experience.
  • the embodiment of the present application also provides a third method for preparing the protective film.
  • the difference between the method for preparing the protective film shown in this embodiment and the method for preparing the protective film shown in the above two embodiments lies in step S1.
  • a hardened layer 3 is formed on the surface of the base film layer 1.
  • the material of the hardened layer 3 includes acrylic resin and antistatic components doped in the acrylic resin.
  • the antistatic components include, but are not limited to, anionic antistatic agents such as alkyl sulfonic acid and alkali metal phosphate, and alkyl quaternary ammonium salts. , Phosphorus or phosphonium salt surfactants, cationic antistatic agents, ethoxylated aliphatic alkylamine nonionic antistatic agents, or conductive polymer antistatic agents such as PEDOT:PSS.
  • step S1 in the method for preparing the protective film shown in this embodiment lies in step S102.
  • Step S102 preparing a hardened layer coating liquid. Specifically, take a certain amount of antistatic ingredients, 15g methyl methacrylate, 6g butyl acrylate, 8g styrene, 3g acrylic acid, 40g ethyl acetate, and 1g 1-hydroxycyclohexyl phenyl ketone and stir it through high-speed mechanical stirring for 10 minutes A hardened layer coating liquid is obtained.
  • the embodiment of the present application also provides a fourth method for preparing a protective film.
  • the difference between the method for preparing the protective film in this embodiment and the method for preparing the protective film in the above three embodiments is that after step S2, and Before step S3, the method for preparing the protective film further includes step S21.
  • an antistatic layer 7 is formed on the surface of the base film layer 1 away from the hardened layer 3.
  • the material of the antistatic layer 7 includes antistatic components.
  • the antistatic layer 7 is formed on the surface of the base film layer 1 away from the hardened layer 3 through a coating process.
  • the antistatic ingredients include, but are not limited to, anionic antistatic agents such as alkyl sulfonic acid, alkali metal phosphate, alkyl quaternary ammonium salts, phosphorous or phosphonium salt surfactants, cationic antistatic agents, and ethoxylated fats.
  • Group alkylamine non-ionic antistatic agent or conductive polymer antistatic agent such as PEDOT:PSS.
  • Step S3 forming an adhesive layer 2 on the surface of the antistatic layer 7 away from the base film layer 1.
  • the embodiment of the present application also provides a fifth method for preparing a protective film.
  • the difference between the method for preparing the protective film in this embodiment and the method for preparing the protective film shown in the first to third embodiments is that Before step S1, the method for preparing the protective film further includes step S0.
  • an antistatic layer 7 is formed on the surface of the base film layer 1.
  • the material of the antistatic layer 7 includes antistatic components.
  • the antistatic layer 7 is formed on the surface of the base film layer 1 away from the hardened layer 3 through a coating process.
  • the antistatic ingredients include, but are not limited to, anionic antistatic agents such as alkyl sulfonic acid, alkali metal phosphate, alkyl quaternary ammonium salts, phosphorous or phosphonium salt surfactants, cationic antistatic agents, and ethoxylated fats.
  • Group alkylamine non-ionic antistatic agent or conductive polymer antistatic agent such as PEDOT:PSS.
  • step S1 a hardened layer 3 is formed on the surface of the antistatic layer 7 away from the base film layer 1.
  • the embodiment of the present application also provides a sixth method for preparing a protective film.
  • the difference between the method for preparing the protective film in this embodiment and the method for preparing the protective film shown in the first to third embodiments is After step S1 and before step S2, the method for preparing the protective film further includes step S11.
  • an antistatic layer 7 is formed on the surface of the hardened layer 3 away from the base film layer 1.
  • the material of the antistatic layer 7 includes antistatic components.
  • the antistatic layer 7 is formed on the surface of the base film layer 1 away from the hardened layer 3 through a coating process.
  • the antistatic ingredients include, but are not limited to, anionic antistatic agents such as alkyl sulfonic acid, alkali metal phosphate, alkyl quaternary ammonium salts, phosphorous or phosphonium salt surfactants, cationic antistatic agents, and ethoxylated fats.
  • Group alkylamine non-ionic antistatic agent or conductive polymer antistatic agent such as PEDOT:PSS.
  • Step S2 forming an antireflection and antireflection layer 4 on the surface of the antistatic layer 7 away from the hardened layer 3.
  • the embodiment of the present application also provides a seventh method for preparing the protective film.
  • the difference between the method for preparing the protective film in this embodiment and the method for preparing the protective film shown in the third to sixth embodiments is step S2. .
  • the high refractive index layer 41 or the low refractive index layer 42 of the anti-reflection layer 4 is not doped with antistatic components.
  • the antireflection and antireflection layer 4 is formed on the surface of the hardened layer 3 through a coating process.
  • step S2 can be implemented through step S201 to step S204.
  • Step S201 preparing a coating solution for a high refractive index layer. Specifically, take 25g 1-naphthalene methacrylate, 5g ethyl acrylate, 5g methyl methacrylate, 2g zirconia particles, 30g ethyl acetate, 2g 2,4,6-trimethylbenzoyl phosphonic acid Ethyl ester, a high-refractive-index layer coating solution was obtained by high-speed mechanical stirring for 20 minutes.
  • a coating solution for a low refractive index layer is prepared. Specifically, take 25g methyl acrylate, 5g ethyl acrylate, 5g methyl methacrylate, 40g ethyl acetate, 2g ethyl 2,4,6-trimethylbenzoylphosphonate, 3g hollow silica particles .
  • the low-refractive index layer coating solution is obtained by high-speed mechanical stirring for 10 minutes.
  • Step S203 coating the high refractive index layer coating liquid on the surface of the hardened layer 3 away from the base film layer 1, and curing the high refractive index layer coating liquid on the surface of the hardened layer 3 to form the high refractive index layer 41 to obtain Layer structure of high refractive index layer/hardened layer/base film layer.
  • Step S204 coating the low refractive index layer coating liquid on the surface of the high refractive index layer 41 away from the hardened layer 3, and curing the low refractive index layer coating liquid on the surface of the high refractive index layer 41 to form the low refractive index layer 42
  • a film structure of low refractive index layer/high refractive index layer/hardened layer/base film layer that is, a film structure of antireflection layer/hardened layer/base film layer is obtained.
  • the antireflection and antireflection layer 4 is formed on the surface of the hardened layer 3 by a magnetron sputtering coating process. In this embodiment, it can be implemented through steps S201 / and S202 / .
  • Step S201 / using a target material such as a Nb target or a Ti target or a Si target to coat the hardened layer 3 away from the base film layer 1 by magnetron sputtering to form Nb 2 O containing ZnO, In 2 O 3 and other antistatic components 5.
  • a high refractive index layer 41 made of inorganic materials such as TiO 2 or Si 3 N 4 to obtain a film structure of high refractive index layer/hardened layer/base film layer.
  • Step S202 / using a target material such as a Si target to coat the surface of the high refractive index layer 41 away from the hardened layer 3 by magnetron sputtering to form a low refractive index layer 42 containing SiO 2 to obtain a low refractive index layer/high refractive index layer
  • a target material such as a Si target to coat the surface of the high refractive index layer 41 away from the hardened layer 3 by magnetron sputtering to form a low refractive index layer 42 containing SiO 2 to obtain a low refractive index layer/high refractive index layer
  • the film structure of the /hardened layer/base film layer that is, the film structure of the antireflection layer/hardened layer/base film layer is obtained.
  • the embodiment of the present application also provides an eighth method for preparing the protective film.
  • the difference between the method for preparing the protective film in this embodiment and the method for preparing the protective film in the seventh embodiment is step S1.
  • step S1 a hardened layer 3 is formed on the surface of the base film layer 1.
  • the material of the hardening layer 3 includes acrylic resin.
  • step S1 in the method for preparing the protective film shown in this embodiment lies in step S101 and step S103.
  • Step S101 the base film layer 1 is provided.
  • the material of the base film layer 1 includes PET, and the thickness of the base film layer 1 is about 38 ⁇ m.
  • step S103 the hardened layer coating liquid is applied on the surface of the base film layer 1, and the hardened layer coating liquid on the surface of the base film layer 1 is cured to obtain the hardened layer 3.
  • the hardened layer coating liquid is applied to the surface of the base film layer 1, and the base film layer 1 coated with the hardened layer coating liquid on the surface is placed in an oven at a temperature of 108°C and dried for 90 seconds to make the coating The solvent of the liquid evaporates.
  • the curing layer coating solution on the surface of the base film layer 1 is irradiated and cured by mercury lamp source UV light, and the irradiation measurement is 2200mj/cm 2 , and a hardened layer 3 with a thickness of about 3 ⁇ m is formed on the surface of the base film layer 1 to obtain The film structure of the hardened layer/base film layer.

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Abstract

本申请提供一种保护膜，包括层叠设置的粘接层和基膜层，粘接层用以粘接于可折叠的显示屏，基膜层包括一层或多层高模量基膜和一层或多层低模量基膜，高模量基膜的弹性模量大于低模量基膜的弹性模量，高模量基膜和低模量基膜交替层叠，基膜层中远离粘接层的表层为高模量基膜。本申请所示保护膜可以牢固地贴附于可折叠的显示屏上，不会随显示屏多次弯折发生反弹而起翘，全面且有效地保护可折叠的显示屏。本申请还提供一种包括保护膜的保护膜组件、显示屏组件和终端。

Description

保护膜、保护膜组件、显示屏组件及终端
本申请要求于2020年04月30日提交中国专利局、申请号为202010365596.0、申请名称为“保护膜、保护膜组件、显示屏组件及终端”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及终端技术领域，特别涉及一种保护膜、保护膜组件、显示屏组件及终端。
背景技术
随着手机等终端的广泛应用，其保护性要求越来越高，终端的显示屏上往往贴附有保护层来防止显示屏受到损伤和污染。然而，可折叠的终端在使用过程中，传统的保护膜会因为多次弯折发生反弹而起翘，无法实现对显示屏进行全面而有效的保护。
发明内容
本申请提供一种保护膜，用以牢固地贴附于折叠式显示屏上，避免保护膜因多次弯折发生反弹而起翘，全面且有效地保护可折叠的显示屏。
本申请还提供一种保护膜组件、显示屏组件和终端。
本申请所示保护膜包括层叠设置的粘接层和基膜层，粘接层用以粘接于可折叠的显示屏，基膜层包括一层或多层高模量基膜和一层或多层低模量基膜，高模量基膜的弹性模量大于低模量基膜的弹性模量，高模量基膜和低模量基膜交替层叠，基膜层中远离粘接层的表层为高模量基膜。
本申请所示保护膜中，基膜层采用高模量基膜和低模量基膜交替层叠的结构，高模量基膜可以保证基膜层的机械力学性能和较强的铅笔硬度，使得保护膜在使用过程中不易被划伤，确保了保护膜的机械力学性能，提高了保护膜的使用可靠性，低模量基膜可以降低保护膜在折叠过程中因变形产生的反弹应力，防止保护膜在显示屏折叠过程中发生反弹而起翘，实现对显示屏全面且有效的保护。此外，低模量基膜还可以提高保护膜的耐冲击性能。
一种实施方式中，高模量基膜的弹性模量大于2Gpa，低模量基膜的弹性模量小于300Mpa，以确保基膜层可以避免保护膜因多次弯折发生反弹而起翘，全面且有效地保护可折叠的显示屏。
一种实施方式中，高模量基膜的材料包括高分子光学聚酯材料或无色聚酰亚胺，以保证高模量基膜具有较高的弹性模量，使基膜层具有较好的机械力学性能和较强的铅笔硬度，使得保护膜在使用过程中不易被划伤，确保保护膜的机械力学性能，提高保护膜的使用可靠性。低模量基膜的材料包括丙烯酸胶、聚氨酯或聚氨酯丙烯酸酯，以确保低模量基膜具有较低的弹性模量，能降低保护膜在折叠过程中因变形产生的反弹应力。
一种实施方式中，波长在500nm的光线在基膜层的透过率≥90％。由于550nm为可见光的平均波长，而且为人眼最敏感的波长，波长在500nm的光线在基膜层的透过率≥90％，相当于可见光可完全透过基膜层，保证了基膜层具有较高的透过率，在保护膜粘接于显示屏时，可以减小保护膜对显示屏的显示画面的影响，确保了保护膜的光学性能。
一种实施方式中，保护膜还包括增透减反层，增透减反层包括一层或多层高折射率层和一层或多层低折射率层，高折射率层的折射率大于低折射率层的折射率，高折射率层和低折射率层交替层叠，增透减反层中远离粘接层的表层为低折射率层。
本实施方式中，增透减反层可以提高光线在保护膜表面的透过率，降低光线在保护膜表面的反射率，确保保护膜的增透减反效果，减小保护膜组件对显示屏的显示清晰度的影响，提高用户的使用感受。
一种实施方式中，低折射率层和高折射率层中至少一层中掺杂有抗静电成分，以使增透减反层同时具备抗静电性能，降低保护膜的表面电阻，防止静电的产生，确保保护膜的抗静电性能，避免保护膜的表面产生灰尘和杂质的吸附，在保护膜粘接于显示屏时，提高显示屏的显示质量。
一种实施方式中，高折射率层包括树脂层以及掺杂于树脂层中的金属氧化物粒子，高折射率层的树脂层的材料包括丙烯酸酯类材料、聚氨酯丙烯酸酯类材料、硅烷改性丙烯酸酯类或硅烷改性聚氨酯丙烯酸酯类材料，金属氧化物粒子的折射率大于1.6。
其中，掺杂有抗静电成分的高折射率层还包括掺杂于高折射率层的树脂层中的抗静电成分，抗静电成分为抗静电剂。
本实施方式中，高折射率层通过涂布的工艺形成。掺杂有抗静电剂的高折射率层使增透减反层同时具备抗静电性能，进而确保保护膜的抗静电性能，避免保护膜的表面产生灰尘和杂质的吸附，在保护膜粘接于显示屏时，提高显示屏的显示质量。
一种实施方式中，高折射率层包括无机膜层，无机膜层的材料包括无机金属氧化物、氮化物或氮氧化物，无机膜层的折射率大于1.6。
其中，掺杂有抗静电成分的高折射率层还包括掺杂于无机膜层中的抗静电成分，抗静电成分为金属氧化物。
本实施方式中，高折射率层通过磁控溅射的方式形式。掺杂有具有金属氧化物的高折射率层使增透减反层同时具备抗静电性能，进而确保保护膜的抗静电性能，避免保护膜的表面产生灰尘和杂质的吸附，在保护膜粘接于显示屏时，提高显示屏的显示质量。
一种实施方式中，低折射率层包括树脂层以及掺杂于树脂层中的氧化物粒子或氟化物粒子，低折射率层的树脂层的材料包括丙烯酸酯类材料、聚氨酯丙烯酸酯类材料、硅烷改性丙烯酸酯类或硅烷改性聚氨酯丙烯酸酯类材料，氧化物粒子或氟化物粒子的折射率小于1.5。
其中，掺杂有抗静电成分的低折射率层还包括掺杂于低折射率层的树脂层中的抗静电成分，抗静电成分为抗静电剂。
本实施方式中，低折射率层通过涂布的工艺形成。掺杂有抗静电剂的低折射率层使增透减反层同时具备抗静电性能，进而确保保护膜的抗静电性能，避免保护膜的表面产生灰尘和杂质的吸附，在保护膜粘接于显示屏时，提高显示屏的显示质量。
此外，相比于高折射率层中掺杂有抗静电剂，由于低折射率层更靠近保护膜的外侧，相当于低折射率层中的抗静电剂更靠近保护膜的外侧，使得增透减反层的抗静电能力更强，有利于提高保护膜的抗静电性能。
一种实施方式中，低折射率层与高折射率层之间的折射率之差大于0.1，以保证增透减反层的增透减反效果，实现保护膜对光线的增透减反。
一种实施方式中，保护膜还包括硬化层，硬化层位于基膜层背离粘接层的一侧。其中，硬化层位于基膜层和增透减反层之间。硬化层包括树脂层，硬化层的树脂层的材料包括丙烯酸酯类材料、聚氨酯丙烯酸酯类材料、硅烷改性丙烯酸酯类或硅烷改性聚氨酯丙烯酸酯类材料，以提高硬化层的表面能，使得硬化层不仅能较高地附着于基膜层的表面，还能作为增透减反层形成于基膜层表面的打底层，提升增透减反层在基膜层表面的附着力，避免增透减反层与基膜层之间轻易发生剥离，提升保护膜的使用可靠性。此外，硬化层的硬度也较高，能够为增透减反层提供力学支撑，保证保护膜的耐磨性能。
一种实施方式中，硬化层还包括掺杂于硬化层的树脂层中的抗静电剂，以增加硬化层的抗静电能力，提升保护膜的抗静电性能，降低保护膜的表面电阻，防止静电产生。
一种实施方式中，保护膜还包括抗静电层，抗静电层位于粘接层与基膜层之间，抗静电层的材料包括抗静电剂，以提升保护膜的抗静电性能，降低保护膜的表面电阻，防止静电产生。
一种实施方式中，抗静电层位于基膜层背离粘接层一侧，其中，抗静电层位于基膜层与硬化层之间，或者，抗静电层位于硬化层与增透减反层之间。相比于抗静电层位于基膜层与粘接层之间，抗静电层更靠近保护膜的外侧，有利于提高保护膜的抗静电性能。
一种实施方式中，粘接层的材料包括丙烯酸胶，粘接层的弹性模量小于40KPa，且玻璃化转变温度小于-30℃。即，粘接层具有超低的弹性模量和较高的回弹性能，使保护膜具有可弯折性能。当保护膜随可折叠的显示屏弯折拉伸发生塑性变形时，粘接层可以吸收保护膜发生的塑性变形，防止保护膜在随显示屏发生弯折过程中反弹拱起，使得保护膜能始终贴附于显示屏的显示面，对显示屏进行保护。
一种实施方式中，保护膜还包括耐污层，耐污层位于基膜层背离粘接层的一侧。具体的，耐污层位于增透减反层背离粘接层的一侧。即，耐污层为耐污层最上层的层结构，可为保护膜提供耐脏污性能。其中，耐污层的材料包括全氟聚醚硅烷、氟醚或氟碳硅烷，以使耐污层还具有耐划伤和高硬度的性能，保证保护膜在使用过程中不易被划伤。此外，耐污层的动摩擦系数较小，用户在保护膜的表面滑动时受到的摩擦力较小，即用户在保护膜的表面滑动较为顺畅，有助于提升用户的使用感受。
一种实施方式中，保护膜还包括打底层，打底层位于耐污层和基膜层之间。具体的，打底层位于耐污层和增透减反层之间。其中，打底层的材料包括有机硅烷或无机二氧化硅。
本实施方式中，打底层可以增加耐污层与增透减反层之间的附着力，避免耐污层和增透减反层在保护膜的使用过程中发生剥离，提高保护膜的使用可靠性。
本申请所示保护膜组件包括上述任一种保护膜、第一离型膜和第二离型膜，第一离型膜覆盖于保护膜的内表面，第二离型膜覆盖于保护膜的外表面。
本申请所示保护膜组件包括上述任一种保护膜，当保护膜贴合于可折叠的显示屏时，保护膜不会随显示屏的折叠发生反弹而起翘，可全面且有效地保护可折叠的显示屏。
本申请所示显示屏组件包括可折叠的显示屏和上述任一种保护膜，保护膜的粘接层粘接于显示屏。
本申请所示显示屏组件采用上述任一种保护膜与可折叠的显示屏进行贴合，保护膜不会随显示屏的折叠发生反弹而起翘，可全面且有效地保护可折叠的显示屏，有利于延长显示屏组件的使用寿命。
本申请所示终端包括壳体和上述显示屏组件，显示屏组件安装于壳体。
本申请所示终端采用上述任一种保护膜与可折叠的显示屏进行贴合，保护膜不会随显示屏的折叠发生反弹而起翘，可全面且有效地保护可折叠的显示屏，有利于延长终端的使用寿命。
附图说明
为了更清楚地说明本申请实施例或背景技术中的技术方案，下面将对本申请实施例或背景技术中所需要使用的附图进行说明。
图1是本申请实施例提供的一种终端的结构示意图；
图2是图1所示终端在另一个状态下的结构示意图；
图3是图1所示终端中显示屏组件的结构示意图；
图4是图3所示显示屏组件的分解结构示意图；
图5是图4所示显示屏组件中保护膜在一种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图；
图6是图4所示显示屏组件中保护膜在第二种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图；
图7是图4所示显示屏组件中保护膜在第三种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图；
图8是图4所示显示屏组件中保护膜在第四种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图；
图9是图4所示显示屏组件中保护膜在第五种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图；
图10是图4所示显示屏组件中保护膜在第六种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图；
图11是图4所示显示屏组件中保护膜在第七种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图；
图12是图4所示显示屏组件中保护膜在第八种实施方式下沿I-I方向剖开的剖面结构示意图；
图13是本申请实施例提供的第二种终端的显示屏组件中保护膜在一种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图；
图14是本申请实施例提供的第二种终端的显示屏组件中保护膜在第二种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图；
图15是本申请实施例提供的第二种终端的显示屏组件中保护膜在第三种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图；
图16是本申请实施例提供的第二种终端的显示屏组件中保护膜在第四种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图；
图17是本申请实施例提供的第三种终端的显示屏组件中保护膜沿Ⅰ-Ⅰ方向剖开的剖面结构示意图；
图18是本申请实施例提供的一种保护膜组件的结构示意图；
图19是图18所示保护膜组件沿Ⅱ-Ⅱ方向剖开的剖面结构示意图；
图20是本申请实施例提供的一种保护膜的制备方法的工艺流程图；
图21是图20所示保护膜的制备方法中形成硬化层的结构示意图；
图22是图20所示保护膜的制备方法中形成增透减反层的结构示意图；
图23是图20所示保护膜的制备方法中形成粘接层的结构示意图。
具体实施方式
下面结合本申请实施例中的附图对本申请实施例进行描述。
请参阅图1，图1是本申请实施例提供的一种终端100的结构示意图。
终端100包括且不限于手机、平板电脑、个人计算机、多媒体播放器、电子书阅读器、笔记本电脑、车载设备或可穿戴设备等具有显示功能的电子设备。图1以终端100是手机为例进行具体说明。其中，为了便于描述，定义终端100的宽度方向为X轴方向，终端100的长度方向为Y轴方向，终端100的厚度方向为Z轴方向，X轴方向、Y轴方向和Z轴方向两两相互垂直。
请一并参阅图2，图2是图1所示终端100在另一状态下的结构示意图。
本实施例中，终端100为可折叠手机。换言之，终端100为可以在折叠状态和展开状态之间切换的手机。其中，图1所示终端100处于展开状态，图2所示终端100处于折叠状态。在本申请中，以终端100可沿X轴方向发生折叠或展开为例进行说明。
需要说明的是，本实施例所示终端100为可发生一次折叠的电子设备。在其他实施例中，终端100也可以为可发生多次(两次及两次以上)折叠的电子设备。此时，终端100可以多个部分，每两个部分可相对靠近至终端100处于折叠状态，每两个部分也可以相对远离至终端100处于展开状态。
终端100包括壳体10和显示屏组件20，显示屏组件20安装于壳体10。其中，壳体10包括第一壳体11、第二壳体12及连接于第一壳体11和第二壳体12之间的连接机构(图未标)。本实施例中，连接机构为沿X轴方向延伸的转轴机构。第一壳体11与第二壳体12通过连接机构转动连接。即，第一壳体11与第二壳体12通过连接机构彼此连接，且可沿X轴方向相对转动。具体的，第一壳体11与第二壳体12可相对转动至相对靠近，以使壳体10处于折叠状态，如图2所示。第一壳体11与第二壳体12也可以相对转动至彼此远离，以使壳体10处于展开状态，如图1所示。换言之，第一壳体11与第二壳体12可相对转动，以使壳体10可以在折叠状态和展开状态之间相互切换。
应当理解的是，在其他实施例中，连接机构也可以为滑动机构、转动与滑动的复合机构或可拆卸式的扣合机构等，本申请对此不做具体限定。
请一并参阅图3，图3是图1所示终端100中显示屏组件20的结构示意图。
显示屏组件20用以显示文字、图像或视频等信息。本实施例中，显示屏组件20包括第一部分201、第二部分202及连接于第一部分201和第二部分202之间的第三部分203。第一部分201、第二部分202和第三部分203位于壳体10的同一侧，且第一部分201、第 三部分203和第二部分202沿Y轴方向依次排布。具体的，第一部分201安装于第一壳体11，第二部分202安装于第二壳体12，第三部分203位于第一壳体11和第二壳体12之间。其中，第三部分203能沿X轴方向发生弯折。
当终端100处于展开状态时，显示屏组件20处于展开状态，第一部分201、第二部分202和第三部分203之间呈180度(也可以大致呈180度，即允许存在少许偏差)。此时，终端100具有连续的大面积的显示区域，能够实现大屏显示，提升用户的使用体验。当终端100处于折叠状态时，显示屏组件20处于折叠状态，第一部分201与第二部分202重叠，第三部分203发生弯折。此时，显示屏组件20的外露面积较少，降低了显示屏组件20被损坏的概率。
需要说明的是，本实施例所示终端100处于图2所示的折叠状态时，显示屏组件20处于向内折叠的状态，此时显示屏组件20位于第一壳体11和第二壳体12之间。在其他实施例中，当终端100处于折叠状态时，显示屏组件20也可以处于向外折叠的状态，此时第一壳体11和第二壳体12位于第一部分201和第二部分202之间。
请一并参阅图4，图4是图3所示显示屏组件20的分解结构示意图。
显示屏组件20包括显示屏21和保护膜22，显示屏21安装于壳体10，保护膜22贴附于显示屏21。本实施例中，显示屏21为可折叠的显示屏。显示屏21包括背离壳体10的显示面211，显示面211用以显示文字、图像或视频等信息。其中，显示屏21可集成有显示功能，触摸感应功能及指纹图像采集功能。应当理解的是，本实施例所示显示屏21并不仅限于图3所示的2D显示屏，也可以为2.5D显示屏或3D显示屏。
一种实施方式中，显示屏21设置有光学屏下指纹。其中，显示屏21包括依次层叠的显示面板、偏光片和保护盖板。即，偏光片位于显示面板和保护盖板之间。具体的，显示面板用以显示文字、图像或视频等信息。偏光片安装于显示面板的显示面211，保护盖板安装于偏光片背离显示面板的表面，用以保护偏光片和显示面板。其中，保护盖板可以采用玻璃等透明材料制成，避免影响显示面板的显示。
保护膜22贴附于显示屏21的显示面211。本实施例中，保护膜22的大小和形状与显示面211的大小和形状相适应。保护膜22完全贴合于显示面211上，且保护膜22的边与显示屏21的边对齐。具体的，保护膜22的边缘与显示屏21的边缘的距离L为1.0mm，从而保证保护膜22贴合于显示面211上的贴合效果好，保护膜22不容易发生卷边。保护膜22始终保持完全贴合于显示屏21上而不会发生收缩而翘曲的情况，保障保护膜22对显示屏21起到全方位保护作用，防止终端100坠落而导致的显示屏21碎裂的情况，减少用户损失，提高用户体验。
需要说明的是，当显示屏21上开设有摄像孔或显示灯孔等功能孔时，保护膜22上还可以开设有避让这些功能孔的通孔，以使这些功能孔露出于保护膜22，保证这些功能孔的正常使用。
请参阅图5，图5是图4所示显示屏组件20中保护膜22在一种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图。需要说明的是，本申请附图中，沿“Ⅰ-Ⅰ方向剖开”是指沿Ⅰ-Ⅰ线及Ⅰ-Ⅰ线两端箭头所在的平面剖开，后文中对附图的说明做相同理解。
保护膜22包括基膜层1、粘接层2、硬化(hard coating，HC)层3、增透减反(anti-reflective， AR)层4和耐污(anti-fingerprint，AF)层5。具体的，粘接层2位于基膜层1的一侧，用以粘接于显示屏21。硬化层3、增透减反层4和耐污层5位于基膜层1背离粘接层2的一侧。即，硬化层3、增透减反层4和耐污层5依次层叠于基膜层1背离粘接层2的一侧。换言之，粘接层2、基膜层1、硬化层3、增透减反层4和耐污层5依次层叠设置。
其中，层叠设置是指各个层结构从内往外依次堆叠。此时，各个层结构之间可以直接接触堆叠，也可以夹杂有其他的层结构。比如，粘接层1与基膜层2层叠设置，即可以指基膜层2位于粘接层1的外表面，也可以指基膜层2位于粘接层1的外侧。
应当理解的是，本申请实施例描述的保护膜22时所采用“外”“内”等方位用词主要是依据保护膜22于附图4中的展示方位进行阐述，并不形成对保护膜22于实际应用场景中的方位的限定。
本实施例中，基膜层1包括一层或多层高模量基膜11和一层或多层低模量基膜12，高模量基膜12的弹性模量大于低模量基膜12的弹性模量。高模量基膜11和低模量基膜12交替层叠。其中，基膜层1中远离粘接层2的表层为高模量基膜11。即，基膜层1的最外侧一层为高模量基膜11。
一种实施方式中，基膜层1包括一层高模量基膜11和一层低模量基膜12，低模量基膜12和高模量基膜11依次层叠。高模量基膜11的弹性模量大于3GPa，以保证高模量基膜11具有较高的弹性模量，使基膜层1具有较好的机械力学性能和较强的铅笔硬度，使得保护膜22在使用过程中不易被划伤，确保了保护膜22的机械力学性能，提高了保护膜22的可靠性。
本实施例中，高模量基膜11的材料包括高分子光学聚酯材料或无色聚酰亚胺(colorless polyimide，CPI)。具体的，基膜层1的材料包括高分子光学聚酯材料。其中，基膜层1所包括的高分子光学聚酯材料为聚对苯二甲酸乙二醇酯(polyethylene terephthalate，PET)。即，基膜层1为采用PET制成的薄膜状结构。其中，高模量基膜11的厚度在50μm～80μm之间。需要说明的是，在其他实施例中，高模量基膜11的厚度也可以在38μm～100μm之间，本申请对此不作具体限定。
低模量基膜12的弹性模量小于300MPa，以保证低模量基膜12具有较低的弹性模量。显示屏组件20发生折叠时，低模量基膜12不仅可以降低保护膜12在折叠过程中因变形产生的反弹应力，防止保护膜22在显示屏组件20折叠过程中发生反弹而起翘，实现对显示屏21全面且有效的保护，还可以提高保护膜22的耐冲击性能。具体的，低模量基膜12的材料包括聚氨基甲酸酯(polyurethane，PU)或聚氨酯丙烯酸酯(polyurethane acrylate，PUA)。其中，低模量基膜12的厚度在25μm～50μm之间。在其他实施例中，低模量基膜12的厚度也可以在10μm～100μm之间，本申请对此不作具体限定。
本实施例中，基膜层1的折射率在1.4～1.5之间。基膜层1的雾度≤1％，且波长在550nm的光线在基膜层1的透过率≥90％。其中，550nm为可见光的平均波长，而且为人眼最敏感的波长，波长在550nm的光线在基膜层1的透过率≥90％，相当于可见光几乎可完全透过基膜层1，保证了基膜层1具有较高的透过率和较小的雾度，可以减小保护膜22对显示屏21的显示画面的影响，确保了保护膜22的光学性能。
此外，基膜层1的快轴方向与显示屏21的偏振片的偏振方向平行或垂直，或者，基膜 层1的快轴与慢轴方向与显示屏21的偏振片的偏振方向之间呈45度，以保证显示屏21中光学屏下指纹的正常使用。
硬化层3层叠于基膜层1背离显示屏21的表面，且位于基膜层1与增透减反层4之间。本实施方式中，硬化层3通过涂布工艺形成于基膜层1背离显示屏21的表面。其中，硬化层3的厚度在0.1μm～3μm之间。而且，硬化层3的表面能大于32达因(克*厘米/秒^2)。即，硬化层3具有较高的表面能。
具体的，硬化层3包括树脂层31。树脂层31的材料包括丙烯酸酯类材料、PUA类材料、硅烷改性丙烯酸酯类材料或硅烷改性PUA类材料。本实施方式中，树脂层31的材料包括丙烯酸酯类材料。其中，树脂层31所包括的丙烯酸酯类材料为丙烯酸树脂。需要说明的是，在其他实施方式中，树脂层31所包括的丙烯酸酯类材料可以不为丙烯酸树脂，而为除丙烯酸树脂外的其他丙烯酸酯类材料。
由于硬化层3的表面能较高，使得硬化层3不仅能较好地附着于基膜层1的表面，还能作为增透减反层4形成于基膜层1表面的打底层，提升增透减反层4在基膜层1表面的附着力，避免增透减反层4与基膜层1之间轻易发生剥离，提升保护膜22的使用可靠性。此外，采用丙烯酸树脂制成的硬化层3的硬度也较高，还能够为位于硬化层3外侧的增透减反层4和耐污层5提供力学支撑，保证保护膜22的耐磨性能。
增透减反层4位于粘接层2背离显示屏21的一侧。具体的，增透减反层4层叠于硬化层3背离基膜层1的表面，用以提高光线在保护膜22表面的透过率，降低光线在保护膜22表面的反射率，确保保护膜22的增透减反效果，提高显示屏组件20的显示清晰度，提高用户的使用感受。
一种实施方式中，增透减反层4通过涂布工艺形成于硬化层3背离基膜层1的表面。其中，增透减反层4的厚度在100nm～300nm之间。具体的，增透减反层4包括一层或多层高折射率层41和一层或多层低折射率层42，高折射率层41和低折射率层42交替层叠，且高折射率层41和低折射率层42均通过涂布工艺形成。增透减反层4中远离粘接层2的表层为低折射率层42。即，增透减反层4的最外侧一层为低折射率层42，以确保增透减反层4能实现对光线的增透减反。
其中，低折射率层42和高折射率层41中至少一层中掺杂有抗静电(anti-static，AS)成分，使得增透减反层4还具备抗静电性能，能降低保护膜22的表面电阻，防止静电的产生，确保保护膜22的抗静电性能，避免保护膜22的表面产生灰尘和杂质的吸附，提高显示屏21的显示质量。
具体的，增透减反层4包括一层高折射率层41和一层低折射率层42，高折射率层41和低折射率层42依次层叠于硬化层3背离基膜层1的表面。其中，高折射率层41中掺杂有抗静电成分以增加增透减反层4的抗静电能力，提升保护膜22的抗静电性，降低保护膜22的表面电阻，防止静电的产生，提高显示屏组件20的显示清晰度。
需要说明的是，在其他实施方式中，增透减反层4可以包括多层(两层或两层以上)高折射率层41或多层低折射率层42，比如，高折射率层41和低折射率层42的总层数可以在3层～6层之间，以在保证增透减反层4的增透减反效果的同时，避免保护膜22的厚度过大而影响终端100的轻薄化设计。
高折射率层41的厚度在20nm～80nm之间，高折射率层41的折射率在1.5～2.1之间。具体的，高折射率层41包括树脂层411以及掺杂于树脂层411中的金属氧化物粒子412和抗静电成分413。树脂层411的材料包括丙烯酸酯类材料、PUA类材料、硅烷改性丙烯酸酯类或硅烷改性PUA类材料。本实施方式中，树脂层411的材料包括丙烯酸酯类材料。其中，树脂层411所包括的丙烯酸酯类材料为丙烯酸树脂。此时，高折射率层41的材料包括与硬化层3的材料相同的丙烯酸树脂，有助于提升高折射率层41在硬化层3表面的附着力。需要说明的是，在其他实施方式中，树脂层411所包括的丙烯酸酯类材料也可以不为丙烯酸树脂，而为除丙烯酸树脂外的其他丙烯酸酯类材料。
金属氧化物粒子412掺杂于树脂层411的丙烯酸树脂中，且金属氧化物粒子的折射率大于1.6，以保证高折射率层41的高折射率。本实施方式中，金属氧化物粒子412为氧化锆粒子。具体的，氧化锆粒子为粒径尺寸在纳米级的粒子，其粒径在10nm～50nm之间。其中，氧化锆粒子为多边形粒子，以增加氧化锆粒子的表面积，增加氧化锆粒子与丙烯酸树脂的接触面积，提高氧化锆粒子在丙烯酸树脂中的分散性。
应当理解的是，在其他实施方式中，氧化锆粒子也可以为球形或其他异形粒子。或者，金属氧化物粒子412也可以不为氧化锆粒子，而为其他的金属氧化物粒子，或者，金属氧化物粒子412可以有多种，只要金属氧化物粒子412的折射率大于1.6即可，本申请对此不做具体限定。
抗静电成分413与氧化锆粒子共同掺杂于树脂层31的丙烯酸树脂中。本实施方式中，抗静电成分413为抗静电剂。具体的，抗静电成分413包括且不限于烷基磺酸、磷酸碱金属盐等阴离子型抗静电剂、烷基季铵盐、磷或鏻盐表面活性剂类阳离子型抗静电剂、乙氧基化脂肪族烷基胺类非离子型抗静电剂或PEDOT:PSS等导电高分子型抗静电剂。需要说明的是，PEDOT:PSS是由聚3,4-乙烯二氧噻吩单体(poly 3,4-ethylenedioxythiophene，PEDOT)和聚苯乙烯磺酸盐(poly sodium-p-styrenesulfonate，PSS)构成的物质。
需要说明的是，本实施例中抗静电成分413掺杂于树脂层411中会对高折射率层41的折射率产生一定影响，此时可通过调整高折射率层41的厚度和成分等参数的方式来使高折射率层41的折射率保持在1.5～2.1之间，以保证高折射率层41可与低折射率层42相配合实现增透减反层4的增透减反效果。
低折射率层42层叠于高折射率层41背离硬化层3的表面。其中，低折射率层42的折射率小于高折射率层41的折射率。即，高折射率层41的折射率大于低折射率层42的折射率。具体的，低折射率层42与高折射率层41之间的折射率之差＞0.1，以保证增透减反层4的增透减反效果，实现保护膜22对光线的增透减反。
低折射率层42包括树脂层421以及掺杂于树脂层421中的氧化物粒子或氟化物粒子422。其中，低折射率层42的厚度在10nm～100nm之间，低折射率层42的折射率在1.2～1.6之间。
本实施方式中，树脂层421的材料包括丙烯酸酯类材料、PUA类材料、硅烷改性丙烯酸酯类或硅烷改性PUA类材料。本实施方式中，树脂层421的材料包括丙烯酸酯类材料。其中，树脂层411所包括的丙烯酸酯类材料为丙烯酸树脂。此时，低折射率层42的材料包括与高折射率层41的材料相同的丙烯酸树脂，有助于提升低折射率层42在高折射率层41 表面的附着力。需要说明的是，在其他实施方式中，低折射率层42所包括的丙烯酸酯材料也可以不为丙烯酸树脂，而为除丙烯酸树脂外的其他丙烯酸酯类材料。
氧化物粒子或氟化物粒子422掺杂于树脂层421的丙烯酸树脂中。氧化物粒子或氟化物粒子422的折射率小于1.5，以保证低折射率层42的折射率在1.2～1.6之间。本实施方式中，低折射率层42包括氧化物粒子422。具体的，氧化物粒子422为二氧化硅粒子。其中，二氧化硅粒子为中空且粒径尺寸在纳米级的粒子，其粒径在10nm～50nm之间。应当理解的是，在其他实施方式中，氧化物粒子422也可以不为二氧化硅粒子，而为除二氧化硅以外的其他氧化物粒子，或者，氧化物粒子422可以有多种，只要氧化物粒子422的折射率小于1.5即可。
耐污层5位于增透减反层4背离粘接层2的一侧。本实施方式中，耐污层5为保护膜22最上层的层结构。即，耐污层5为保护膜22远离显示屏21的层结构，可为保护膜22提供耐脏污性能。耐污层5的材料包括全氟聚醚硅烷或氟醚或氟碳硅烷。本实施方式中，耐污层5的材料包括全氟聚醚硅烷。具体的，耐污层5通过卷对卷(roll to roll，R2R)工艺形成于增透减反层4的表面。其中，耐污层5的厚度在10nm～50nm之间，水滴角≥110度，二碘甲烷的接触角≥95度。
本实施方式所示保护膜22中，耐污层5是直接将全氟聚醚硅烷蒸镀于增透减反层4的表面，充分发挥了全氟聚醚硅烷低表面能的特性，使得耐污层5的水滴角和油污角都较大，使其耐脏污性能可与玻璃材质的耐污层相媲美。而且，耐污层5还具有耐划伤和高硬度的性能，保证保护膜22在使用过程中不易被划伤。此外，耐污层5的动摩擦系数较小，用户在保护膜22的表面滑动时受到的摩擦力较小，即用户在保护膜22的表面滑动较为顺畅，有助于提升用户的使用感受。
当光线穿过保护膜22进入显示屏21时，光线在耐污层5与低折射率层42的界面、低折射率层42与高折射率层41的界面以及高折射率层41与硬化层3的界面均会发生反射，可将耐污层5的折射率限定在1.5以下，厚度限定在10nm～30nm之间，并通过膜系设计(thin film calculation，TACal)软件等常用模拟软件来调整高折射率层41与低折射率层42的折射率和厚度，使得在上述界面反射的反射光的光强相近，且相位相差180度，使得这些反射光干涉相消，实现保护膜22的增透减反效果。应当理解的是，由于硬化层3对增透减反层4的增透减反效果影响较小，只需要将硬化层3的厚度限定在1μm以下，并将折射率限定在1.4～1.6之间即可实现保护膜22的增透减反效果。
此外，保护膜22还包括打底层6，打底层6位于耐污层5和增透减反层4之间。其中，打底层6在采用R2R工艺形成耐污层5的过程中形成，先在增透减反层4的表面形成打底层6，再在打底层6的表面形成耐污层5，以增加耐污层5与增透减反层4之间的附着力，避免耐污层5和增透减反层4在保护膜22的使用过程中发生剥离，提高保护膜22的使用可靠性。
本实施方式中，打底层6的材料包括有机硅烷。其中，打底层6的厚度在10nm～30nm之间。应当理解的是，在其他实施方式中，打底层6的材料也可以包括无机二氧化硅，此时打底层6的厚度在3nm～10nm之间。
粘接层2层叠于基膜层1背离硬化层3的表面。即，基膜层1位于粘接层2与硬化层 3之间。也即，粘接层2层叠于基膜层1朝向显示屏21的表面。其中，粘接层2通过涂布工艺形成于基膜层1的表面。具体的，粘接层2背离基膜层1的表面贴合于显示屏21的显示面211。本实施方式中，粘接层2的材料包括丙烯酸胶。其中，粘接层2的厚度在10μm-30μm之间，且粘接层2的折射率在1.3～1.4之间。
丙烯酸胶制成的粘接层2不仅可以与显示屏21的显示面211良好贴合，使得保护膜22贴附于显示屏21的显示面211时不容易出现小气泡，不会影响显示屏21的指纹解锁等相关的功能，而且丙烯酸胶具有高透光性，可以减小保护膜22对显示屏21的显示画面的影响，提升用户的使用的感受。
粘接层2能与采用PET制成的基膜层1较好的粘接，即粘接层2在基膜层1表面的附着力较大，具体的，粘接层2的弹性模量小于40KPa(在室温约25℃下)，玻璃化转变温度＜-30℃。换言之，粘接层2采用超低模量且高回弹的丙烯酸胶制成，使保护膜22具有可弯折性能。当保护膜22随终端100弯折拉伸发生塑性变形时，粘接层2可以吸收保护膜22发生的塑性变形，防止保护膜22在随终端100发生弯折过程中反弹拱起，使得保护膜22能始终贴附于显示屏21的显示面211，对显示屏21进行保护。应当理解的是，在其他实施例中，粘接层2的材料还可以是具有超低模量且高回弹性能的丙烯酸酯胶膜或硅胶等其他透明粘接材料。
请参阅图6，图6是图4所示显示屏组件20中保护膜22在第二种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图。
本实施方式所示保护膜22，与上述实施方式所示保护膜22的不同之处在于，基膜层1包括两层高模量基膜11和一层低模量基膜12，一层高模量基膜11、一层低模量基膜12和另一层高模量基膜11依次层叠。其中，两层高模量基膜11的材料相同。需要说明的是，在其他实施方式中，两层高模量基膜11的材料也可以不同。当然，基膜层1也可以包括三层以上高模量基膜11或多层(两层或两层)低模量基膜12，本申请对此不作具体限定。
本实施方式中，低模量基膜12位于两层高模量基膜11之间，低模量基膜12还可以吸收位于其内侧的高模量基膜11(即位于低模量基膜12靠近粘接层2一侧的高模量基膜11)因变形产生的塑性变形，防止保护膜22在显示屏组件20折叠过程中发生反弹而起翘，实现对显示屏21全面且有效的保护。
请参阅图7，图7是图4所示显示屏组件20中保护膜22在第三种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图。
本实施方式所示保护膜22，与上述第二种实施方式所示保护膜22的不同之处在于，高折射率层41中不掺杂有抗静电成分，且低折射率层42中掺杂有抗静电成分。
具体的，高折射率层41包括树脂层411和掺杂于树脂层411中的金属氧化物粒子412。低折射率层42包括树脂层421以及掺杂于树脂层421中的氧化物粒子或氟化物粒子422和抗静电成分423。本实施方式中，抗静电成分423为抗静电剂。其中，抗静电成分包括且不限于烷基磺酸、磷酸碱金属盐等阴离子型抗静电剂、烷基季铵盐、磷或鏻盐表面活性剂类阳离子型抗静电剂、乙氧基化脂肪族烷基胺类非离子型抗静电剂或PEDOT:PSS等导电高分子型抗静电剂。
需要说明的是，本实施例中抗静电成分423掺杂于树脂层421中会对低折射率层42的 折射率产生一定影响，此时可通过调整低折射率层42的厚度和成分等参数的方式来使低折射率层42的折射率保持在1.2～1.6之间，以保证低折射率层42可与高折射率层41相配合实现增透减反层4的增透减反效果。
本实施方式所示保护膜22的增透减反层4中，抗静电成分添加于低折射率层42中，由于低折射率层42更靠近保护膜22的外侧，即抗静电成分更靠近保护膜22的外侧，使得增透减反层4的抗静电能力更强，有利于提高保护膜22的抗静电性能。
需要说明的是，在其他实施方式中，增透减反层4的低射折率层和高折射率层41可以均添加有抗静电成分，以增强增透减反层4的抗静电能力，进而提高保护膜22的抗静电性能。
请参阅图8，图8是图4所示显示屏组件20中保护膜22在第四种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图。
本实施方式所示保护膜22与上述第三种实施方式所示保护膜22的不同之处在于，增透减反层4通过磁控溅射镀膜工艺形成于硬化层3背离基膜层1的表面。即，高折射率层41和低折射率层42均采用磁控溅射镀膜工艺形成。其中，增透减反层4的厚度在50nm～1000nm之间。
需要说明的是，一般来说，高折射率层41和低折射率层42均采用同一工艺形成，比如均采用涂布工艺形成或均采用磁控溅射镀膜工艺形成，以节省生产成本。应当理解的是，在其他实施方式中，高折射率层41和低折射率层42也可以采用不同的工艺形成，比如高折射率层41采用涂布工艺形成，低折射率层42采用磁控溅射镀膜工艺形成，或者，高折射率层41采用磁控溅射镀膜工艺，低折射率层42采用涂布工艺形成，本申请对此不做具体限定。
本实施方式中，增透减反层4包括一层低折射率层42和一层高折射率层41，高折射率层41和低折射率依次层叠于硬化层3背离基膜层1的表面。其中，高折射率层41中掺杂有抗静电成分，以使增透减反层4还具备抗静电性能，能降低保护膜22的表面电阻，防止静电的产生，确保保护膜22的抗静电性能，避免保护膜22的表面产生灰尘和杂质的吸附，提高显示屏21的显示质量。应当理解的是，在其他实施方式中，增透减反层4可以包括多层(两层或两层以上)低折射率层42或多层高折射率层41，比如，增透减反层4的总层数可以在3层～8层之间，以在保证增透减反层4的增透减反效果的同时，避免保护膜22的厚度过大而影响终端100的轻薄化设计。
高折射率层41包括无机膜层414以及掺杂于无机膜层414中的抗静电成分413。本实施方式中，无机膜层414的折射率大于1.6。具体的，无机膜层414的材料包括无机金属氧化物。其中，无机膜层414所包括的无机金属氧化物为Nb 2O 5或TiO 2等。应当理解的是，在其他实施方式中，无机膜层414的材料也可以不包括无机金属氧化物，而包括氮化物或氮氧化物，比如Si 3N 4。
抗静电组分413掺杂于无机金属氧化物中。本实施方式中，抗静电组分413为金属氧化物。具体的，抗静电组分413包括且不限于ZnO、In 2O 3等能产生氧空穴的金属氧化物。
此外，低折射率层42的折射率小于1.5。本实施方式中，低折射率层42的材料包括SiO 2等无机材料。
请参阅图9，图9是图4所示显示屏组件20中保护膜22在第五种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图。
本实施方式所示保护膜22与上述四种实施方式所示保护膜22的不同之处在于，硬化层3还包括掺杂于树脂层31中的抗静电成分32。具体的，抗静电成分32掺杂于树脂层31的丙烯酸树脂中，以增加硬化层3的抗静电能力，提升保护膜22的抗静电性能，降低保护膜22的表面电阻，防止静电产生，提升显示屏组件20的显示清晰度。其中，抗静电成分32为抗静电剂。抗静电成分32包括且不限于烷基磺酸、磷酸碱金属盐等阴离子型抗静电剂、烷基季铵盐、磷或鏻盐表面活性剂类阳离子型抗静电剂、乙氧基化脂肪族烷基胺类非离子型抗静电剂或PEDOT:PSS等导电高分子型抗静电剂。
需要说明的是，图9所示保护膜22的其他层结构以上述第二种实施方式下保护膜22的其他层结构为例进行说明。应当理解的是，图9所示保护膜22的其他层结构也可以为其他实施方式下保护膜22的其他层结构，在此不作过多描述。
请参阅图10，图10是图4所示显示屏组件20中保护膜22在第六种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图。
本实施方式所示保护膜22与上述五种实施方式所示保护膜22的不同之处在于，保护膜22还包括抗静电层7。具体的，抗静电层7位于粘接层2与基膜层1之间。其中，抗静电层7通过涂布工艺形成于基膜层1背离硬化层3的表面。此时，粘接层2层叠于抗静电层7背离基膜层1的表面。
本实施方式中，抗静电层7的材料包括抗静电剂。具体的，抗静电层7的材料包括且不限于烷基磺酸、磷酸碱金属盐等阴离子型抗静电剂、烷基季铵盐、磷或鏻盐表面活性剂类阳离子型抗静电剂、乙氧基化脂肪族烷基胺类非离子型抗静电剂或PEDOT:PSS等导电高分子型抗静电剂。
本实施方式所示保护膜22中，抗静电层7的存在不仅可以提升保护膜22的抗静电性能，而且抗静电层7能与基膜层1和粘接层2较好地粘接，即抗静电层7还能有效提升粘接层2在基膜层1表面的附着力，当保护膜22从显示屏21的显示面211上撕除时，显示屏21的显示面211上不会残留粘接层2的胶体。
需要说明的是，图10所示保护膜22的其他层结构以上述第二种实施方式下保护膜22的其他层结构为例进行说明。应当理解的是，图10所示保护膜22的其他层结构也可以为其他实施方式下保护膜22的其他层结构，在此不作过多描述。
请参阅图11，图11是图4所示显示屏组件20中保护膜22在第七种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图。
本实施方式所示保护膜22与上述第五种实施方式所示保护膜22的不同之处在于，抗静电层7位于基膜层1背离粘接层2的一侧。具体的，抗静电层7位于硬化层3与基膜层1之间。即，抗静电层7位于硬化层3与高模量基膜11之间。其中，抗静电层7通过涂布工艺形成基膜层1背离粘接层2的表面。此时，硬化层3层叠于抗静电层7背离基膜层1的表面。
相比于上述第六种实施方式所示保护膜22，本实施方式所示保护膜22中抗静电层7位于硬化层3与基膜层1之间，此时抗静电层7更靠近保护膜22的外侧，有利于提高保护 膜22的抗静电性能。
请参阅图12，图12是图4所示显示屏组件20中保护膜22在第八种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图。
本实施方式所示保护膜22与上述第七种实施方式所示保护膜22的不同之处在于，抗静电层7位于硬化层3与增透减反层4之间。具体的，抗静电层7位于硬化层3与高折射率层41之间。其中，抗静电层7通过涂布工艺形成于硬化层3背离基膜层1的表面。此时，高折射率层41层叠于抗静电层7背离硬化层3的表面。
相比于上述第六种和第七种实施方式所示保护膜22，本实施方式所示保护膜22中抗静电层7位于硬化层3与增透减反层4之间，此时抗静电层7更靠近保护膜22的外侧，有利于提高保护膜22的抗静电性能。
需要说明的是，在其他实施方式中，保护膜22也可以包括多层(两层或两层以上)抗静电层7，以提升保护膜22的抗静电能力。比如，保护膜22可以包括两层抗静电层7，一层抗静电层7位于粘接层2与基膜层1之间，另一层抗静电层7位于硬化层3与基膜层1或增透减反层4之间，或者，一层抗静电层7位于硬化层3与基膜层1之间，另一层抗静电层7位于硬化层3与增透减反层4之间。再者，保护膜22也可以包括三层抗静电层7，一层抗静电层7位于粘接层2与基膜层1之间，一层抗静电层7位于硬化层3与基膜层1之间，一层抗静电层7位于硬化层3与增透减反层4之间。
请参阅图13，图13是本申请实施例提供的第二种终端100的显示屏组件20中保护膜22在一种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图。
本申请实施例所示终端100与上述实施例所示终端100的不同之处在于，保护膜22的增透减反层4中低折射率层42或高折射率层41中不掺杂有抗静电成分。
增透减反层4位于硬化层3背离基膜层1的一侧。本实施例中，增透减反层4通过涂布工艺形成于硬化层3背离基膜层1的表面。具体的，高折射率层41包括树脂层411以及掺杂于树脂层411中的金属氧化物粒子412。低折射率层42包括树脂层421以及掺杂于树脂层421中的氧化物粒子或氟化物粒子422。
需要说明的是，在其他实施例中，增透减反层4也可以通过磁控溅射镀膜工艺形成于硬化层3背离基膜层1的表面。此时，高折射率层41的材料包括Nb 2O 5、TiO 2等金属氧化物、Si 3N 4等氮化物或氮氧化物。低折射率层42的材料包括SiO 2等无机材料。应当理解的是，在其他实施例中，高折射率层41和低折射率层42也可以采用不同的工艺形成。
本实施例中，保护膜22还包括抗静电层7，以提升保护膜22的抗静电性能。具体的，抗静电层7的材料包括抗静电剂。其中，抗静电层7的材料包括且不限于烷基磺酸、磷酸碱金属盐等阴离子型抗静电剂、烷基季铵盐、磷或鏻盐表面活性剂类阳离子型抗静电剂、乙氧基化脂肪族烷基胺类非离子型抗静电剂或PEDOT:PSS等导电高分子型抗静电剂。
一种实施方式中，抗静电层7位于粘接层2与基膜层1之间。其中，抗静电层7通过涂布工艺形成于基膜层1背离硬化层3的表面。此时粘接层2层叠于抗静电层7背离基膜层1的表面。
本实施方式所示保护膜22中，抗静电层7的存在不仅可以提升保护膜22的抗静电性能，而且抗静电层7能与基膜层1和粘接层2较好地粘接，即抗静电层7还能有效提升粘 接层2在基膜层1表面的附着力，当保护膜22从显示屏21的显示面211上撕除时，显示屏21的显示面211上不会残留粘接层2的胶体。
此外，硬化层3位于基膜层1背离抗静电层4的一侧。具体的，硬化层3包括树脂层31。树脂层31的材料包括丙烯酸酯类材料、PUA类材料、硅烷改性丙烯酸酯类材料或硅烷改性PUA类材料。本实施方式中，树脂层31的材料包括丙烯酸酯类材料。其中，树脂层31所包括的丙烯酸酯类材料为丙烯酸树脂。需要说明的是，在其他实施方式中，树脂层31所包括的丙烯酸酯类材料可以不为丙烯酸树脂，而为除丙烯酸树脂外的其他丙烯酸酯类材料。
请参阅图14，图14是本申请实施例提供的第二种终端100的显示屏组件20中保护膜22在第二种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图。
本实施方式所示保护膜22与上述实施方式所示保护膜22的不同之处在于，抗静电层7位于硬化层3背离粘接层2的一侧。具体的，抗静电层7位于硬化层2与基膜层1之间。即。抗静电层7位于硬化层2与高模量基膜11之间。其中，抗静电层7通过涂布工艺形成于基膜层1背离粘接层2的表面。此时，硬化层3层叠于抗静电层7背离基膜层1的表面。
相比于上述第一种实施方式所示保护膜22，本实施方式所示保护膜22中抗静电层7位于硬化层3与基膜层1之间，此时抗静电层7更靠近保护膜22的外侧，有利于提高保护膜22的抗静电性能。
请参阅图15，图15是本申请实施例提供的第二种终端100的显示屏组件20中保护膜22在第三种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图。
本实施方式所示保护膜22与上述第二种实施方式的不同之处在于，抗静电层7位于硬化层2与增透减反层4之间。即，抗静电层7位于硬化层3与高折射率层41之间。其中，抗静电层7通过涂布工艺形成于硬化层3背离基膜层1的表面。此时，增透减反层4位于抗静电层7背离硬化层3的一侧。
相比于上述实施方式所示保护膜22，本实施方式所示保护膜22中抗静电层7位于硬化层3与增透减反层4之间，此时抗静电层7更靠近保护膜22的外侧，有利于提高保护膜22的抗静电性能。
请参阅图16，图16是本申请实施例提供的第二种终端100的显示屏组件20中保护膜22在第四种实施方式下沿Ⅰ-Ⅰ方向剖开的剖面结构示意图。
本实施方式所示保护膜22与上述三种实施方式的不同之处在于，硬化层3还包括掺杂于树脂层31中的抗静电成分32，以增加硬化层3的抗静电能力，提升保护膜22的抗静电性能，降低保护膜22的表面电阻，防止静电产生，提升显示屏组件20的显示清晰度。
本实施方式中，抗静电成分32为抗静电剂。抗静电成分32包括且不限于烷基磺酸、磷酸碱金属盐等阴离子型抗静电剂、烷基季铵盐、磷或鏻盐表面活性剂类阳离子型抗静电剂、乙氧基化脂肪族烷基胺类非离子型抗静电剂或PEDOT:PSS等导电高分子型抗静电剂。
需要说明的是，图16所示保护膜22的其他层结构以本实施例中第一种实施方式下保护膜22的其他层结构为例进行说明。应当理解的是，图16所示保护膜22的其他层结构也可以为其他实施方式下保护膜22的其他层结构，在此不作过多描述。
请参阅图17，图17是本申请实施例提供的第三种终端100的显示屏组件20中保护膜 22沿Ⅰ-Ⅰ方向剖开的剖面结构示意图。
本申请实施例所示终端100与上述两种实施例所示终端100的不同之处在于，保护膜22的增透减反层4中低折射率层42或高折射率层41中不掺杂有抗静电成分，也不包括抗静电层7。
本实施例中，硬化层3还包括掺杂于树脂层31中的抗静电成分32，以增加硬化层3的抗静电能力，提升保护膜22的抗静电性能，降低保护膜22的表面电阻，防止静电产生，提升显示屏组件20的显示清晰度。其中，抗静电成分32为抗静电剂。抗静电成分32包括且不限于烷基磺酸、磷酸碱金属盐等阴离子型抗静电剂、烷基季铵盐、磷或鏻盐表面活性剂类阳离子型抗静电剂、乙氧基化脂肪族烷基胺类非离子型抗静电剂或PEDOT:PSS等导电高分子型抗静电剂。
需要说明的是，图17所示保护膜22的其他层结构以第一种实施例中第二种实施方式下保护膜22的其他层结构为例进行说明。应当理解的是，图17所示保护膜22的其他层结构也可以为其他实施方式下保护膜22的其他层结构，在此不作过多描述。
请参阅图18和图19。图18是本申请实施例提供的一种保护膜组件200的结构示意图。图19是图18所示保护膜组件200沿Ⅱ-Ⅱ方向剖开的剖面结构示意图。
需要说明的是，图18和图19所示保护膜组件200中的保护膜22为图1所示终端100中保护膜22未贴合于显示屏21上的状态。其中，以保护膜22为上述第一种实施例所示保护膜22为例对保护膜组件200进行说明。
保护膜组件200包括上述任一种保护膜22、第一离型膜30、第二离型膜40、第一撕手部50和第二撕手部60。具体的，保护膜22连接于第二离型膜40与第一离型膜30之间。其中，第二离型膜40覆盖于耐污层5背离增透减反层4的表面，第一离型膜30覆盖于粘接层2背离基膜层1的表面。即，第二离型膜40覆盖于保护膜22的外表面，第一离型膜30覆盖于保护膜22层的内表面。也即，第二离型膜40与第一离型膜30分别覆盖保护膜22的相对设置的两个表面，不仅可以保护保护膜22，防止保护膜22在运输过程中受损伤，还可以防止保护膜22的粘接层2暴露于空气中失去粘性。
第一撕手部50与第一离型膜30连接，且伸出保护膜22的边缘，第二撕手部60与第二离型膜40连接，且伸出保护膜22的边缘。本实施例中，保护膜22为矩形，第二离型膜40与第一离型膜30为与保护膜22的形状和大小相适应的矩形。其中，第一撕手部50连接于第一离型膜30的角部，第二撕手部60连接于第二离型膜40的角部，以便于将第二离型膜40和第一离型膜30从保护膜22上快速撕离。
当需要将保护膜组件200中的保护膜22贴合于终端100的显示屏21上时，可通过握住第一撕手部50轻易将第一离型膜30从保护膜22的粘接层2上快速撕离下来，然后将粘接层2背离第二离型膜40的表面与终端100的显示屏21的显示面211对准并贴合于显示屏21上，最后通过握住第二撕手部60将第二离型膜40从保护膜22的耐污层5上撕离，即可完成对显示屏21的贴膜。需要说明的是，在贴合保护膜22时，可以通过贴膜治具或设备经保护膜22贴合在显示屏21的显示面211，再通过高压脱泡处理，以使保护膜22完全贴附于显示屏21的显示面211，实现对显示屏21的保护。
请参阅图20，图20是本申请实施例提供的一种保护膜的制备方法的工艺流程图。
本申请实施例所示保护膜的制备方法，用以制备上述终端100的显示屏组件20中保护膜22。
本实施例所示保护膜的制备方法包括：
请参阅图21，图21是图20所示保护膜的制备方法中形成硬化层3的结构示意图。
步骤S1，在基膜层1的表面形成硬化层3。其中，硬化层3的材料包括丙烯酸树脂。
本实施例中，硬化层3通过涂布工艺形成于基膜层1的表面。具体的，步骤S1可通过步骤S101至步骤S103实现。
步骤S101，提供基膜层1。本实施例中，基膜层1通过涂布工艺形成。
一种实施方式中，步骤S101可通过步骤S1011至步骤S1013实现。
步骤S1011，提供一高模量基膜。其中，高模量基膜的弹性模量为4Gpa。高模量基膜的材料包括PET，且高模量基膜的厚度在50μm左右。采用PET作为保护膜22中基膜层1的材料，以支撑保护膜22的其他膜层结构，确保保护膜22的力学性能和光学性能。
步骤S1012，制备低模量基膜涂布液。具体的，取10份聚醚多元醇、20份聚醚多元醇、5份六亚甲基二异氰酸酯、0.5份甲苯二异氰酸酯、0.2份乙二醇，通过高速机械搅拌3min获得低模量基膜涂布液。需要说明的是，本申请实施例所提及的“份”这一单位，可以指克，也可以指千克。
步骤S1013，在高模量基膜的表面涂布低模量基膜涂布液，对高模量基膜表面的低模量基膜涂布液进行固化处理以形成低模量基膜。即，获得膜层结构为高模量基膜/低模量基膜的基膜层1。其中，低模量基膜的弹性模量为200Mpa，且厚度为50μm。
另一种实施方式中，步骤S101可通过步骤S1011 /至步骤S1014 /实现。
步骤S1011 /，提供一高模量基膜。其中，高模量基膜的弹性模量为4Gpa，且厚度在50μm左右。
步骤S1012 /，制备低模量基膜涂布液。具体的，取12份苯二亚甲基二异氰酸酯、25份己二异氰酸酯、20份聚己内酯多元醇、10份聚酯多元醇、10份三羟基甲基丙烷三丙烯酸酯、5份丙烯酸异冰片酯、10份丙烯酸羟乙酯、2份γ―甲基丙烯酰氧基丙基三甲氧基硅烷、1份2,4,6(三甲基苯甲酰基)二苯基氧化膦光引发剂、0.5份1-羟基-环已基-苯基甲酮，通过高速机械搅拌3min获得低模量基膜涂布液。
步骤S1013 /，在高模量基膜的表面涂布低模量基膜涂布液，对高模量基膜表面的低模量基膜涂布液进行固化处理以形成低模量基膜，获得高模量基膜/低模量基膜的膜层结构。其中，低模量基膜的弹性模量为250Mpa，且厚度为30μm。
步骤S1014 /，在低模量基膜背离高模量基膜的表面覆盖高模量基膜，以获得膜层结构为高模量基膜/低模量基膜/高模量基膜的基膜层1。
步骤S102，制备硬化层涂布液。具体的，取15g甲基丙烯酸甲酯、6g丙烯酸丁酯、8g苯乙烯、3g丙烯酸、40g乙酸乙酯和1g 1-羟基环己基苯基甲酮通过高速机械搅拌10min获得硬化层涂布液。
步骤S103，在基膜层1的表面涂布硬化层涂布液，对基膜层1表面的硬化层涂布液进行固化处理以获得硬化层3。具体的，在基膜层1的表面涂布硬化层涂布液，将表面涂布有硬化层涂布液的基膜层1放入温度为110℃的烤炉中烘干80s，使涂布液的溶剂挥发。再 通过汞灯源紫外线(ultraviolet，UV)光对基膜层1表面的硬化层涂布液辐射固化，辐照计量2400mj/cm 2，在基膜层1表面形成厚度在2μm左右的硬化层3，以获得硬化层/基膜层的膜层结构，如图21所示。
请参阅图22，图22是图20所示保护膜的制备方法中形成增透减反层4的结构示意图。
步骤S2，在硬化层3背离基膜层1的表面形成增透减反层4。其中，增透减反层4包括交替层叠的高折射率层41和低折射率层42，增透减反层4中远离硬化层3的层结构为低折射率层42。
本实施例中，增透减反层4包括一层高折射率层41和一层低折射率层42，高折射率层41和低折射率层42依次层叠于硬化层3背离基膜层1的表面。其中，高折射率层41或低折射率层42中掺杂有抗静电成分。
一种实施方式中，增透减反层4通过涂布工艺形成于硬化层3的表面。其中，高折射率层41中掺杂有抗静电成分，抗静电成分包括且不限于烷基磺酸、磷酸碱金属盐等阴离子型抗静电剂、烷基季铵盐、磷或鏻盐表面活性剂类阳离子型抗静电剂、乙氧基化脂肪族烷基胺类非离子型抗静电剂或PEDOT:PSS等导电高分子型抗静电剂。具体的，步骤S2可通过步骤S201至步骤S204实现。
步骤S201，制备高折射率层涂布液。具体的，取一定量的抗静电成分、25g 1-萘甲基丙烯酸酯、5g丙烯酸乙酯、5g甲基丙烯酸甲酯、2g氧化锆粒子、30g乙酸乙酯、2g 2,4,6-三甲基苯甲酰基膦酸乙酯，通过高速机械搅拌20min获得高折射率层涂布液。
步骤S202，制备低折射率层涂布液。具体的，取25g丙烯酸甲酯、5g丙烯酸乙酯、5g甲基丙烯酸甲酯、40g乙酸乙酯、2g 2,4,6-三甲基苯甲酰基膦酸乙酯、3g中空二氧化硅粒子，通过高速机械搅拌10min获得低折射率层涂布液。
需要说明的是，本申请对步骤S201和步骤S202的制备顺序不做特别限定，步骤S202也可以在步骤S201之前进行，即可以先进行低折射率层涂布液的制备，再进行高折射率层涂布液的制备，本申请对此不做具体限定。
步骤S203，在硬化层3背离基膜层1的表面涂布高折射率层涂布液，对硬化层3表面的高折射率层涂布液进行固化处理以获得高折射率层41。具体的，在硬化层3背离基膜层1的表面涂布高折射率层涂布液，将涂布有高折射率层涂布液的膜层结构放入温度为115℃的烤炉中烘干60s，使高折射率层涂布液的溶剂挥发，再通过汞灯源UV光辐射固化，辐照计量为2000mj/cm 2，在硬化层3表面形成厚度在0.05μm左右的高折射率层41，以获得高折射率层/硬化层/基膜层的膜层结构。
步骤S204，在高折射率层41背离硬化层3的表面涂布低折射率层涂布液，对高折射率层41表面的低折射率层涂布液进行固化处理以获得低折射率层42。具体的，在高折射率层41背离硬化层3的表面涂布低折射率层涂布液，将涂布有低折射率层涂布液的膜层结构放入温度为115℃的烤炉中烘干70s，使低折射率层涂布液的溶剂挥发，再通过汞灯源UV光辐射固化，辐照计量为2200mj/cm 2，在硬化层3表面形成厚度在0.06μm左右的低折射率层42，以获得低折射率层/高折射率层/硬化层/基膜层的膜层结构，即获得增透减反层/硬化层/基膜层的膜层结构。
另一种实施方式中，与上述实施方式的不同之处在于，高折射率层41中未掺杂抗静电 成分，低折射率层42中掺杂有抗静电成分。可以理解的是，在其他实施例中，高折射率层41和低折射率层42也可以均掺杂有抗静电成分。
本实施方式所示步骤S2与上述实施方式所示步骤S2的不同之处在于：步骤S201和步骤S202。
步骤S201，制备高折射率层涂布液。具体的，取25g 1-萘甲基丙烯酸酯、5g丙烯酸乙酯、5g甲基丙烯酸甲酯、2g氧化锆粒子、30g乙酸乙酯、2g 2,4,6-三甲基苯甲酰基膦酸乙酯，通过高速机械搅拌20min获得高折射率层涂布液。
步骤S202，制备低折射率层涂布液。具体的，取一定量的抗静电成分、25g丙烯酸甲酯、5g丙烯酸乙酯、5g甲基丙烯酸甲酯、40g乙酸乙酯、2g 2,4,6-三甲基苯甲酰基膦酸乙酯、3g中空二氧化硅粒子，通过高速机械搅拌10min获得低折射率层涂布液。
第三种实施方式中，与上述两种实施方式的不同之处在于，增透减反层4通过磁控溅射镀膜工艺形成于硬化层3的表面。其中，高折射率层41中掺杂有抗静电成分，抗静电成分包括且不限于ZnO、In 2O 3等抗静电组分。具体的，步骤S2可通过步骤S201 /和S202 /实现。
步骤S201 /，采用掺杂有Zn或In等抗静电金属的Nb靶或Ti靶或Si靶等靶材在硬化层3背离基膜层1的表面磁控溅射镀膜，形成含ZnO、In 2O 3等抗静电组分的Nb 2O 5、TiO 2或Si 3N 4等无机材料的高折射率层41，以获得高折射率层/硬化层/基膜层的膜层结构。
步骤S202 /，采用Si靶等靶材在高折射率层41背离硬化层3的表面磁控溅射镀膜，形成含SiO 2的低折射率层42，以获得低折射率层/高折射率层/硬化层/基膜层的膜层结构，即获得增透减反层/硬化层/基膜层的膜层结构。
需要说明的是，一般来说，高折射率层41和低折射率层42的形成工艺相同，比如均采用涂布工艺或磁控溅射镀膜工艺形成，以节省生产成本。当然，在其他实施方式中，高折射率层41和低折射率层42也可以采用不同的工艺形成，比如先采用涂布工艺形成高折射率层41，再采用磁控溅射镀膜工艺形成低折射率层42，或者，先采用磁控溅射工艺形成高折射率层41，再采用涂布工艺形成低折射率层42，本申请对此不做具体限定。
请参阅图23，图23是图20所示保护膜的制备方法中形成粘接层2的结构示意图。
步骤S3，在基膜层1背离硬化层3的表面形成粘接层2。其中，粘接层2的材料包括丙烯酸胶。本实施例中，粘接层2通过涂布工艺形成于基膜层1的表面。具体的，步骤S3可通过步骤S301和步骤S302实现。
步骤S301，制备粘接层涂布液。具体的，取10g丙烯酸异辛酯、10g丙烯酸丁酯、2g甲基丙烯酸甲酯、40g乙酸乙酯、1g氨基乙基丙烯酸酯，通过高速机械搅拌10min获得粘接层涂布液。
步骤S302，在基膜层1背离硬化层3的表面涂布粘接层涂布液，对基膜层1表面的粘接层涂布液进行固化处理以获得粘接层2。具体的，在基膜层1背离硬化层3的表面涂布粘接层涂布液，将基膜层1表面涂布有粘接层涂布液的膜层结构放入温度为110℃的烤炉中烘干75s，使涂布液的溶剂挥发，获得厚度在20μm左右的粘接层2，以获得增透减反层/硬化层/基膜层/粘接层2的膜层结构。
步骤S4，在增透减反层4背离硬化层3的表面形成耐污层5，获得保护膜22，如图5 所示。其中，耐污层5的材料包括全氟聚醚硅烷。
本实施例中，耐污层5通过R2R工艺形成于增透减反层4的表面。其中，先在增透减反层4背离硬化层3的表面形成打底层6，再在打底层6背离增透减反层4的表面形成耐污层5。具体的，先采用蒸镀的方式在增透减反层4的表面形成包括有机硅烷的打底层6，再采用蒸镀的方式在打底层6的表面形成包括全氟聚醚硅氧烷且厚度在15nm左右的耐污层5，以获得耐污层/增透减反层/硬化层/基膜层/粘接层的膜层结构。需要说明的是，在其他实施例中，也可以采用溅射工艺在增透减反层4背离硬化层3的表面形成包括无机二氧化硅的打底层6，本申请对此不做具体限定。
本实施例中，在步骤S4之前，且在步骤S3之后，保护膜的制备方法还包括：
步骤S31，在粘接层2背离基膜层1的表面覆盖第一离型膜30，以获得增透减反层/硬化层/基膜层/粘接层/第一离型膜的膜层结构。其中，第一离型膜30的材料包括PET，且第一离型膜30的厚度在50μm左右。
此外，在步骤S4之后，保护膜的制备方法还包括步骤S5和S6。
步骤S5，在耐污层5背离增透减反层4的表面覆盖第二离型膜40，以获得第二离型膜/耐污层/增透减反层/硬化层/基膜层/粘接层/第一离型膜的膜层结构，即获得保护膜卷料。其中，第二离型膜40的材料包括PET，第二离型膜40的厚度在50μm左右。
步骤S6，对保护膜卷料进行切割，获得保护膜组件200，如图9所示。具体的，采用刀模模切出与终端100的显示屏21相适配的保护膜组件200，保护膜组件200中保护膜22相对于显示屏21的边缘内缩1.0mm，从而保证保护膜22贴合于显示面211上的贴合效果好，保护膜22不容易发生卷边。
需要说明的是，本实施例所示保护膜的制备方法制备得到的保护膜22可以通过离子抛光搭配透射电子显微镜(transmission electron microscope，TEM)或扫描电子显微镜(scanning electron microscope，SEM)进行观察和测量。其中，保护膜组件200中各层结构的材料组分与性能可以通过傅立叶变换红外光谱仪(fourier transform infrared spectrometer，FTIR Spectrometer)、X射线光电子能谱分析(X-ray photoelectron spectroscopy，XPS)、核磁共振(nuclear magnetic resonance，NMR)、能谱仪(energy dispersive spectrometer，EDX)、流变仪(rheometer)或热机械分析(thermal mechanical analysis，TMA)等进行测试。
经本实施例所示保护膜的制备方法制备得到的保护膜22贴合在可折叠的终端100的显示屏21，对保护膜22的动态弯折和静态弯折性能进行测试。经3万次动态弯折后，由于粘接层2采用具有超低模量且高回弹的丙烯酸胶制成，保护膜22具有可弯折性能，保护膜22未反弹拱起，仍较好地贴附于终端100的显示屏21对显示屏21进行保护。
对本实施例所示保护膜的制备方法制备得到的保护膜22的反射率和透过率进行测试可得，保护膜22的透过率在94％～95％之间，即保护膜22的透过率较佳，保护膜22贴合在终端100的显示屏21上时，不会影响显示屏21的显示画面。而且，保护膜22贴合在可折叠的终端100的显示屏21后，波长在550nm的光线在保护膜22上的反射率在2.8％～2.9％之间。即，保护膜22具有较好的增透减反效果，防止光线射向终端100时发生“晃眼”等炫光现象，避免了使用者感受到刺眼，不仅提升了显示屏21的显示清晰度，还提高了用户的使用感受。
此外，还采用1kgf载荷的钢丝绒对保护膜22进行摩擦，对保护膜22的耐磨与耐脏污性能进行测试。在Bonstar#0000牌号钢丝绒，摩擦面积20×20mm 2，行程40mm的条件下，对保护膜22摩擦1000次后，保护膜22并未产生掉膜和划伤现象，即保护膜22具有较好的耐磨性能。此时，保护膜22的表面水滴角在113度～115度之间，具有较好的耐油污性能。而且，保护膜22表面的动摩擦系数在0～0.05之间，使用者在保护膜22的表面滑动时，摩擦阻力较小，能顺滑地在保护膜22的表面滑动，有助于提高使用者的使用感受。
本申请实施例还提供另一种保护膜的制备方法，包括：
步骤S1，在基膜层1的表面形成硬化层3。其中，硬化层3的材料包括丙烯酸树脂。
本实施例所示保护膜的制备方法中步骤S1与上述实施例所示保护膜的制备方法中步骤S1的不同之处在于步骤S101和步骤S103。
步骤S101，提供基膜层1。其中，基膜层1的材料包括PET，且基膜层1的厚度在38μm左右。
步骤S103，在基膜层1的表面涂布硬化层涂布液，对基膜层1表面的硬化层涂布液进行固化处理以获得硬化层3。具体的，在基膜层1的表面涂布硬化层涂布液，将表面涂布有硬化层涂布液的基膜层1放入温度为108℃的烤炉中烘干90s，使涂布液的溶剂挥发。再通过汞灯源UV光对基膜层1表面的硬化层涂布液辐照固化，辐照计量2200mj/cm 2，在基膜层1的表面形成厚度在3μm左右的硬化层3，以获得硬化层/基膜层的膜层结构。
步骤S2，在硬化层3背离基膜层1的表面形成增透减反层4。其中，增透减反层4包括交替层叠的高折射率层41和低折射率层42，增透减反层4中远离硬化层3的层结构为低折射率层42。
本实施例所示保护膜的制备方法中步骤S1与上述实施例所示保护膜的制备方法中步骤S1的不同之处在于步骤S203和步骤S204。
步骤S203，在硬化层3背离基膜层1的表面涂布高折射率层涂布液，对硬化层3表面的高折射率层涂布液进行固化处理以获得高折射率层41。具体的，在硬化层3背离基膜层1的表面涂布高折射率层涂布液，将涂布有高折射率层涂布液的层结构放入温度为112℃的烤炉中烘干75s，使高折射率层涂布液的溶剂挥发，再通过汞灯源UV光辐射固化，辐照计量为2150mj/cm 2，在硬化层3表面形成高折射率层41，以获得高折射率层/硬化层/基膜层的膜层结构。
步骤S204，在高折射率层41背离硬化层3的表面涂布低折射率层涂布液，对高折射率层41表面的低折射率层涂布液进行固化处理，形成厚度在0.02μm左右的低折射率层42，以获得低折射率层/高折射率层/硬化层/基膜层的膜层结构。
本实施例中，步骤S2还包括步骤S205和步骤S206。
步骤S205，在低折射率层42背离高折射率层41的表面涂布高折射率层涂布液，对低折射率层42表面的高折射率层涂布液进行固化处理以获得高折射率层41。具体的，在硬化层3背离基膜层1的表面涂布高折射率层涂布液，将涂布有高折射率层涂布液的膜层结构放入温度为113℃的烤炉中烘干65s，使高折射率层涂布液的溶剂挥发，再通过汞灯源UV光辐射固化，辐照计量为2100mj/cm 2，在低折射率层42表面形成厚度在0.06μm左右的高折射率层41，以获得高折射率层/低折射率层/高折射率层/硬化层/基膜层的膜层结构。
步骤S206，在高折射率层41背离低折射率层42的表面涂布低折射率层涂布液，对高折射率层41表面的低折射率层涂布液进行固化处理以获得低折射率层42。具体的，在高折射率层41背离低折射率层42的表面涂布低折射率层涂布液，将涂布有低折射率层涂布液的膜层结构放入温度为115℃的烤炉中烘干50s，使低折射率层涂布液的溶剂挥发，再通过汞灯源UV光辐射固化，辐照计量为2300mj/cm 2，在高折射率层41表面形成厚度在0.04μm左右的低折射率层42，以获得低折射率层/高折射率层/低折射率层/高折射率层/硬化层/基膜层的膜层结构，即获得增透减反层/硬化层/基膜层的膜层结构。
步骤S3，在基膜层1背离硬化层3的表面形成粘接层2。其中，粘接层2的材料包括丙烯酸胶。
本实施例所示保护膜的制备方法中步骤S3与上述实施例所示保护膜的制备方法中步骤S1的不同之处在于步骤S302。
步骤S302，在基膜层1背离硬化层3的表面涂布粘接层涂布液，对基膜层1表面的粘接层涂布液进行固化处理以获得粘接层2。具体的，在基膜层1背离硬化层3的表面涂布粘接层涂布液，将基膜层1表面涂布有粘接层涂布液的膜层结构放入温度为108℃的烤炉中烘干85s，使涂布液的溶剂挥发，获得厚度在25μm左右的粘接层2，以获得增透减反层/硬化层/基膜层/粘接层2的膜层结构。
步骤S31，在粘接层2背离基膜层1的表面覆盖第一离型膜30，以获得增透减反层/硬化层/基膜层/粘接层/第一离型膜30的膜层结构。其中，第一离型膜30的材料包括PET，且第一离型膜30的厚度在50μm左右。
步骤S4，在增透减反层4背离硬化层3的表面形成耐污层5，以获得耐污层/增透减反层/硬化层/基膜层/粘接层/第一离型膜30的膜层结构。其中，耐污层5的材料包括全氟聚醚硅烷，耐污层5的厚度在20μm左右。
步骤S5，在耐污层5背离增透减反层4的表面覆盖第二离型膜40，以获得第二离型膜/耐污层/增透减反层/硬化层/基膜层/粘接层/第一离型膜30的膜层结构，即获得保护膜卷料。其中，第二离型膜40的材料包括PET，第二离型膜40的厚度在50μm左右。
步骤S6，对保护膜卷料进行切割，获得保护膜组件200。
经本实施例所示保护膜的制备方法制备得到的保护膜22贴合在可折叠的终端100的显示屏21，对保护膜22的动态弯折和静态弯折性能进行测试，经多次动态弯折和静态弯折测试后，保护膜22未反弹拱起，仍较好地贴附于终端100的显示屏21对显示屏21进行保护。
对本实施例所示保护膜的制备方法制备得到的保护膜22的反射率和透过率进行测试可得，保护膜22的透过率在94％～95％之间，即保护膜22的透过率较佳，保护膜22贴合在终端100的显示屏21上时，不会影响显示屏21的显示画面。而且，保护膜22贴合在可折叠的终端100的显示屏21后，波长在550nm的光线在保护膜22上的反射率在2.7％～2.8％之间。即，保护膜22具有较好的增透减反效果，防止光线射向终端100时发生“晃眼”等炫光现象，避免了使用者感受到刺眼，不仅提升了显示屏21的显示清晰度，还提高了用户的使用感受。
此外，还采用1kgf载荷的钢丝绒对保护膜22进行摩擦，对保护膜22的耐磨与耐脏污 性能进行测试。在Bonstar#0000牌号钢丝绒，摩擦面积20×20mm 2，行程40mm的条件下，对保护膜22摩擦1000次后，保护膜22并未产生掉膜和划伤现象，即保护膜22具有较好的耐磨性能。此时，保护膜22的表面水滴角在111度～114度之间，具有较好的耐油污性能。而且，保护膜22表面的动摩擦系数在0～0.04之间，使用者在保护膜22的表面滑动时，摩擦阻力较小，能顺滑地在保护膜22的表面滑动，有助于提高使用者的使用感受。
本申请实施例还提供第三种保护膜的制备方法，本实施例所示保护膜的制备方法与上述两种实施例所示保护膜的制备方法的不同之处在于步骤S1。
步骤S1，在基膜层1的表面形成硬化层3。其中，硬化层3的材料包括丙烯酸树脂和掺杂于丙烯酸树脂中的抗静电成分，抗静电成分包括且不限于烷基磺酸、磷酸碱金属盐等阴离子型抗静电剂、烷基季铵盐、磷或鏻盐表面活性剂类阳离子型抗静电剂、乙氧基化脂肪族烷基胺类非离子型抗静电剂或PEDOT:PSS等导电高分子型抗静电剂。
具体的，本实施例中所示保护膜的制备方法中步骤S1与上述两种实施例所示保护膜的制备方法中步骤S1的不同之处在于步骤S102。
步骤S102，制备硬化层涂布液。具体的，取一定量的抗静电成分、15g甲基丙烯酸甲酯、6g丙烯酸丁酯、8g苯乙烯、3g丙烯酸、40g乙酸乙酯和1g 1-羟基环己基苯基甲酮通过高速机械搅拌10min获得硬化层涂布液。
需要说明的是，本实施中所示保护膜的制备方法中其他步骤的具体工艺流程与上述两种实施例所述保护膜的制备方法中其他步骤基本相同，在此不作过多赘述。
本申请实施例还提供第四种保护膜的制备方法，本实施例所示保护膜的制备方法与上述三种实施例所示保护膜的制备方法的不同之处在于，在步骤S2之后，且步骤S3之前，保护膜的制备方法还包括步骤S21。
步骤S21，在基膜层1背离硬化层3的表面形成抗静电层7。其中，抗静电层7的材料包括抗静电成分。本实施例中，抗静电层7通过涂布工艺形成于基膜层1背离硬化层3的表面。其中，抗静电成分包括且不限于烷基磺酸、磷酸碱金属盐等阴离子型抗静电剂、烷基季铵盐、磷或鏻盐表面活性剂类阳离子型抗静电剂、乙氧基化脂肪族烷基胺类非离子型抗静电剂或PEDOT:PSS等导电高分子型抗静电剂。
步骤S3，在抗静电层7背离基膜层1的表面形成粘接层2。
需要说明的是，本实施中所示保护膜的制备方法中其他步骤的具体方法流程与上述三种实施例所述保护膜的制备方法中其他步骤基本相同，在此不作过多赘述。
本申请实施例还提供第五种保护膜的制备方法，本实施例所示保护膜的制备方法与上述第一种实施例至第三种实施例所示保护膜的制备方法的不同之处在于，在步骤S1之前，保护膜的制备方法还包括步骤S0。
步骤S0，在基膜层1的表面形成抗静电层7。其中，抗静电层7的材料包括抗静电成分。本实施例中，抗静电层7通过涂布工艺形成于基膜层1背离硬化层3的表面。其中，抗静电成分包括且不限于烷基磺酸、磷酸碱金属盐等阴离子型抗静电剂、烷基季铵盐、磷或鏻盐表面活性剂类阳离子型抗静电剂、乙氧基化脂肪族烷基胺类非离子型抗静电剂或PEDOT:PSS等导电高分子型抗静电剂。
步骤S1，在抗静电层7背离基膜层1的表面形成硬化层3。
需要说明的是，本实施中所示保护膜的制备方法中其他步骤的具体工艺流程与上述第一种实施例至第三种实施例所述保护膜的制备方法中其他步骤基本相同，在此不作过多赘述。
本申请实施例还提供第六种保护膜的制备方法，本实施例所示保护膜的制备方法与上述第一种实施例至第三种实施例所示保护膜的制备方法的不同之处在于，在步骤S1之后，且在步骤S2之前，保护膜的制备方法还包括步骤S11。
步骤S11，在硬化层3背离基膜层1的表面形成抗静电层7。其中，抗静电层7的材料包括抗静电成分。本实施例中，抗静电层7通过涂布工艺形成于基膜层1背离硬化层3的表面。其中，抗静电成分包括且不限于烷基磺酸、磷酸碱金属盐等阴离子型抗静电剂、烷基季铵盐、磷或鏻盐表面活性剂类阳离子型抗静电剂、乙氧基化脂肪族烷基胺类非离子型抗静电剂或PEDOT:PSS等导电高分子型抗静电剂。
步骤S2，在抗静电层7背离硬化层3的表面形成增透减反层4层。
需要说明的是，本实施中所示保护膜的制备方法中其他步骤的具体工艺流程与上述第一种实施例至第三种实施例所示保护膜的制备方法中其他步骤基本相同，在此不作过多赘述。
本申请实施例还提供第七种保护膜的制备方法，本实施例所示保护膜的制备方法与上述第三种至第六种实施例所示保护膜的制备方法的不同之处在于步骤S2。
本实施例中，增透减反层4的高折射率层41或低折射率层42中不掺杂有抗静电成分。
一种实施方式中，增透减反层4通过涂布工艺形成于硬化层3的表面。本实施方式中，步骤S2可通过步骤S201至步骤S204实现。
步骤S201，制备高折射率层涂布液。具体的，取25g 1-萘甲基丙烯酸酯、5g丙烯酸乙酯、5g甲基丙烯酸甲酯、2g氧化锆粒子、30g乙酸乙酯、2g 2,4,6-三甲基苯甲酰基膦酸乙酯，通过高速机械搅拌20min获得高折射率层涂布液。
步骤S202，制备低折射率层涂布液。具体的，取25g丙烯酸甲酯、5g丙烯酸乙酯、5g甲基丙烯酸甲酯、40g乙酸乙酯、2g 2,4,6-三甲基苯甲酰基膦酸乙酯、3g中空二氧化硅粒子，通过高速机械搅拌10min获得低折射率层涂布液。
步骤S203，在硬化层3背离基膜层1的表面涂布高折射率层涂布液，对硬化层3表面的高折射率层涂布液进行固化处理，形成高折射率层41，以获得高折射率层/硬化层/基膜层的膜层结构。
步骤S204，在高折射率层41背离硬化层3的表面涂布低折射率层涂布液，对高折射率层41表面的低折射率层涂布液进行固化处理，形成低折射率层42，以获得低折射率层/高折射率层/硬化层/基膜层的膜层结构，即获得增透减反层/硬化层/基膜层的膜层结构。
另一种实施方式中，增透减反层4通过磁控溅射镀膜工艺形成于硬化层3的表面。本实施方式中，可通过步骤S201 /和S202 /实现。
步骤S201 /，采用Nb靶或Ti靶或Si靶等靶材在硬化层3背离基膜层1的表面磁控溅射镀膜，形成含ZnO、In 2O 3等抗静电组分的Nb 2O 5、TiO 2或Si 3N 4等无机材料的高折射率层41，以获得高折射率层/硬化层/基膜层的膜层结构。
步骤S202 /，采用Si靶等靶材在高折射率层41背离硬化层3的表面磁控溅射镀膜，形 成含SiO 2的低折射率层42，以获得低折射率层/高折射率层/硬化层/基膜层的膜层结构，即获得增透减反层/硬化层/基膜层的膜层结构。
需要说明的是，本实施中所示保护膜的制备方法中其他步骤的具体工艺流程与上述第三种至第六种实施例所述保护膜的制备方法中其他步骤基本相同，在此不作过多赘述。
本申请实施例还提供第八种保护膜的制备方法，本实施例所示保护膜的制备方法与上述第七种实施例所示保护膜的制备方法的不同之处在于步骤S1。
步骤S1，在基膜层1的表面形成硬化层3。其中，硬化层3的材料包括丙烯酸树脂。
本实施例所示保护膜的制备方法中步骤S1与上述实施例所示保护膜的制备方法中步骤S1的不同之处在于步骤S101和步骤S103。
步骤S101，提供基膜层1。其中，基膜层1的材料包括PET，且基膜层1的厚度在38μm左右。
步骤S103，在基膜层1的表面涂布硬化层涂布液，对基膜层1表面的硬化层涂布液进行固化处理以获得硬化层3。具体的，在基膜层1的表面涂布硬化层涂布液，将表面涂布有硬化层涂布液的基膜层1放入温度为108℃的烤炉中烘干90s，使涂布液的溶剂挥发。再通过汞灯源UV光对基膜层1表面的硬化层涂布液辐照固化，辐照计量2200mj/cm 2，在基膜层1的表面形成厚度在3μm左右的硬化层3，以获得硬化层/基膜层的膜层结构。
需要说明的是，本实施中所示保护膜的制备方法中其他步骤的具体工艺流程与上述第七种实施例所示保护膜的制备方法中其他步骤基本相同，在此不作过多赘述。
以上，仅为本申请的部分实施例和实施方式，本申请的保护范围不局限于此，任何熟知本领域的技术人员在本申请揭露的技术范围内，可轻易想到变化或替换，都应涵盖在本申请的保护范围之内。因此，本申请的保护范围应以权利要求的保护范围为准。

Claims (18)

  1. 一种保护膜，其特征在于，包括层叠设置的粘接层和基膜层，所述粘接层用以粘接于可折叠的显示屏，所述基膜层包括一层或多层高模量基膜和一层或多层低模量基膜，所述高模量基膜的弹性模量大于所述低模量基膜的弹性模量，所述高模量基膜和所述低模量基膜交替层叠，所述基膜层中远离所述粘接层的表层为所述高模量基膜。
  2. 根据权利要求1所述保护膜，其特征在于，所述高模量基膜的弹性模量大于2GPa，所述低模量基膜的弹性模量小于300MPa。
  3. 根据权利要求1或2所述的保护膜，其特征在于，所述高模量基膜的材料包括高分子光学聚酯材料或无色聚酰亚胺，所述低模量基膜的材料包括聚氨酯或聚氨酯丙烯酸酯。
  4. 根据权利要求1-3中任一项所述的保护膜，其特征在于，所述保护膜还包括增透减反层，所述增透减反层位于所述基膜层背离所述粘接层的一侧，所述增透减反层包括一层或多层高折射率层和一层或多层低折射率层，所述高折射率层的折射率大于所述低折射率层的折射率，所述高折射率层和所述低折射率层交替层叠，所述增透减反层中远离所述粘接层的表层为所述低折射率层。
  5. 根据权利要求4所述的保护膜，其特征在于，所述低折射率层和所述高折射率层中至少一层中掺杂有抗静电成分。
  6. 根据权利要求5所述的保护膜，其特征在于，所述高折射率层包括树脂层以及掺杂于所述树脂层中的金属氧化物粒子，所述高折射率层的树脂层的材料包括丙烯酸酯类材料、聚氨酯丙烯酸酯类材料、硅烷改性丙烯酸酯类或硅烷改性聚氨酯丙烯酸酯类材料，所述金属氧化物粒子的折射率大于1.6，
    掺杂有所述抗静电成分的所述高折射率层还包括掺杂于所述高折射率层的树脂层中的所述抗静电成分，所述抗静电成分为抗静电剂。
  7. 根据权利要求5或6所述的保护膜，其特征在于，所述高折射率层包括无机膜层，所述无机膜层的材料包括无机金属氧化物、氮化物或氮氧化物，所述无机膜层的折射率大于1.6，
    掺杂有所述抗静电成分的所述高折射率层还包括掺杂于所述无机膜层中的所述抗静电成分，所述抗静电成分为金属氧化物。
  8. 根据权利要求5-7中任一项所述的保护膜，其特征在于，所述低折射率层包括树脂层以及掺杂于所述树脂层中的氧化物粒子或氟化物粒子，所述低折射率层的树脂层的材料包括丙烯酸酯类材料、聚氨酯丙烯酸酯类材料、硅烷改性丙烯酸酯类或硅烷改性聚氨酯丙烯酸酯类材料，所述氧化物粒子或氟化物粒子的折射率小于1.5，
    掺杂有所述抗静电成分的所述低折射率层还包括掺杂于所述低折射率层的树脂层中的所述抗静电成分，所述抗静电成分为抗静电剂。
  9. 根据权利要求4-8中任一项所述的保护膜，其特征在于，所述低折射率层与所述高折射率层之间的折射率之差大于0.1。
  10. 根据权利要求1-9中任一项所述的保护膜，其特征在于，所述保护膜还包括硬化层，所述硬化层位于所述基膜层背离所述粘接层的一侧，所述硬化层包括树脂层，所述硬化层 的树脂层的材料包括丙烯酸酯类材料、聚氨酯丙烯酸酯类材料、硅烷改性丙烯酸酯类或硅烷改性聚氨酯丙烯酸酯类材料。
  11. 根据权利要求10所述的保护膜，其特征在于，所述硬化层还包括掺杂于所述硬化层的树脂层中的抗静电剂。
  12. 根据权利要求1-11中任一项所述的保护膜，其特征在于，所述保护膜还包括抗静电层，所述抗静电层位于所述粘接层与所述基膜层之间，或者，所述抗静电层位于所述基膜层背离所述粘接层的一侧，所述抗静电层的材料包括抗静电剂。
  13. 根据权利要求1-12中任一项所述的保护膜，其特征在于，所述粘接层的材料包括丙烯酸胶，所述粘接层的弹性模量小于40KPa，且玻璃化转变温度小于-30℃。
  14. 根据权利要求1-13中任一项所述的保护膜，其特征在于，所述保护膜还包括耐污层，所述耐污层位于所述基膜层背离所述粘接层的一侧，所述耐污层的材料包括全氟聚醚硅烷、氟醚或氟碳硅烷。
  15. 根据权利要求14所述的保护膜，其特征在于，所述保护膜还包括打底层，所述打底层位于所述耐污层和所述基膜层之间，所述打底层的材料包括有机硅烷或无机二氧化硅。
  16. 一种保护膜组件，其特征在于，包括如权利要求1-15中任一项所述的保护膜、第一离型膜和第二离型膜，所述第一离型膜覆盖于所述保护膜的内表面，所述第二离型膜覆盖于所述保护膜的外表面。
  17. 一种显示屏组件，包括可折叠的显示屏和权利要求1-15中任意一项所述的保护膜，所述保护膜的所述粘接层粘接于所述可折叠的显示屏。
  18. 一种终端，其特征在于，包括壳体和权利要求17所述的显示屏组件，所述显示屏组件安装于所述壳体。
PCT/CN2021/090871 2020-04-30 2021-04-29 保护膜、保护膜组件、显示屏组件及终端 WO2021219062A1 (zh)

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