WO2021168929A1 - 一种显示装置 - Google Patents

一种显示装置 Download PDF

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Publication number
WO2021168929A1
WO2021168929A1 PCT/CN2020/079708 CN2020079708W WO2021168929A1 WO 2021168929 A1 WO2021168929 A1 WO 2021168929A1 CN 2020079708 W CN2020079708 W CN 2020079708W WO 2021168929 A1 WO2021168929 A1 WO 2021168929A1
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WO
WIPO (PCT)
Prior art keywords
layer
glass
display device
polarizer
display screen
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Application number
PCT/CN2020/079708
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English (en)
French (fr)
Inventor
何春梅
Original Assignee
武汉华星光电半导体显示技术有限公司
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Application filed by 武汉华星光电半导体显示技术有限公司 filed Critical 武汉华星光电半导体显示技术有限公司
Priority to US16/759,647 priority Critical patent/US20230092654A1/en
Publication of WO2021168929A1 publication Critical patent/WO2021168929A1/zh

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/123—Connection of the pixel electrodes to the thin film transistors [TFT]
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3016—Polarising elements involving passive liquid crystal elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/124—Insulating layers formed between TFT elements and OLED elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/126—Shielding, e.g. light-blocking means over the TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • H10K59/871—Self-supporting sealing arrangements

Definitions

  • the present invention relates to the field of display technology, in particular to a display device.
  • the display device can convert computer data into various characters, numbers, symbols or intuitive images for display, and can use keyboard and other input tools to input commands or data into the computer, and add, delete, modify, and change the display at any time with the help of system hardware and software content.
  • Display devices are classified into plasma, liquid crystal, light emitting diode, and cathode ray tube types according to the display device used.
  • Organic light-emitting display device (full English name: Organic Light-Emitting Diode, OLED for short) is also known as organic electro-laser display device and organic light-emitting semiconductor.
  • the working principle of OLED is: when the power is supplied to the appropriate voltage, the positive electrode holes and the negative electrode charges will be combined in the light-emitting layer, and under the action of the Coulomb force, they will recombine with a certain probability to form excitons in the excited state (electron-hole Yes), and this excited state is unstable in a normal environment.
  • the excitons of the excited state recombine and transfer energy to the luminescent material, making it transition from the ground state energy level to the excited state, and the excited state energy is through the radiative relaxation process It produces photons, releases light energy, and produces light. According to its different formulas, it produces three primary colors of red, green and blue RGB, which constitute the basic colors.
  • OLED has the advantages of low voltage demand, high power saving efficiency, fast response, light weight, thin thickness, simple structure, low cost, wide viewing angle, almost infinitely high contrast, low power consumption, and extremely high response speed. It has become today's One of the most important display technologies.
  • Folding mobile phones are the future technology development trend.
  • the demand for materials for folding products is increasing, and the pursuit of thinning is increasingly pursued.
  • the thinning of materials will also lead to The flatness of the surface is low, and the bending center produces creases and other problems. Therefore, it is necessary to find a new type of display device to solve the above-mentioned problems.
  • the object of the present invention is to provide a display device that can solve the problems of low flatness and creases in the bending center of the existing display devices.
  • the present invention provides a display device, which includes: a display screen; a polarizer arranged on the display screen; a cover plate arranged on the polarizer; and a first glass arranged on the Between the polarizer and the cover plate.
  • the display screen includes: a second glass; a buffer layer disposed on the second glass; a thin film transistor layer disposed on the buffer layer; a light emitting layer disposed on the thin film transistor layer; An encapsulation layer is arranged on the light-emitting layer; and a touch control layer is arranged on the encapsulation layer.
  • the polarizer includes: a first liquid crystal layer, which is arranged on the display screen; a quarter-wavelength plate, which is arranged on the first liquid crystal layer; an interlayer, which is arranged on the 1/4-wavelength plate And a second liquid crystal layer, which is disposed on the interlayer.
  • the cover plate includes: an explosion-proof film arranged on the first glass; a hardened coating layer arranged on the explosion-proof film; and a protective film arranged on the hardened coating layer.
  • the display device further includes: an optical glue, which is arranged between the display screen and the polarizer.
  • the display device further includes: an optical glue, which is arranged between the polarizer and the cover plate.
  • the display device further includes: a protective layer disposed between the display screen and the polarizer.
  • the material of the first glass includes at least one of inorganic minerals, Na 2 SiO 3 , CaSiO 3 , SiO 2 , and Na 2 O ⁇ CaO ⁇ 6SiO 2.
  • a material wherein the second glass comprises inorganic minerals, Na2SiO3, CaSiO 3, at least one of SiO 2, Na 2 O ⁇ CaO ⁇ 6SiO 2 in.
  • the thickness of the first glass and the second glass are both less than 100 ⁇ m.
  • the present invention relates to a display device.
  • a first glass is arranged between the cover plate and the polarizer, and the high yield strength characteristics of the first glass are used to effectively improve the bending caused by multiple bending.
  • the problem of creases in the fold area; the rigidity of the first glass is used to improve the flatness of the display device.
  • the second glass is used to replace the PI substrate in the prior art to further improve the flatness of the display device.
  • FIG. 1 is a schematic diagram of the structure of the display device of the first embodiment.
  • Figure 2 is a schematic diagram of the structure of the display screen.
  • FIG. 3 is a schematic diagram of the structure of the display device of the second embodiment.
  • FIG. 4 is a schematic diagram of the structure of the first glass and the protective film.
  • Fig. 5 is a schematic diagram of the structure of the protective film, the first glass and the explosion-proof film.
  • Fig. 6 is a schematic diagram of the structure of the protective film, the first glass, the explosion-proof film, and the hardened coating.
  • FIG. 7 is a schematic diagram of the structure of the first glass and the cover plate.
  • FIG. 8 is a schematic diagram of the structure of the cover plate, the first glass and the second liquid crystal layer.
  • FIG. 9 is a schematic diagram of the structure of the cover plate, the first glass, the second liquid crystal layer and the interlayer.
  • FIG. 10 is a schematic diagram of the structure of the cover plate, the first glass, the second liquid crystal layer, the interlayer, and the 1/4 wavelength plate.
  • FIG. 11 is a schematic diagram of the structure of the cover plate, the first glass and the polarizer.
  • Source and drain layer 136 Source and drain layer 136.
  • the second insulating layer 1321, the first insulating layer 1322.
  • the second insulating layer 1321, the first insulating layer 1322.
  • the first liquid crystal layer 22 1/4 wavelength plate
  • the component can be directly placed on the other component; there may also be an intermediate component on which the component is placed , And the intermediate component is placed on another component.
  • a component is described as “installed to” or “connected to” another component, both can be understood as directly “installed” or “connected”, or a component is “installed to” or “connected to” through an intermediate component Another component.
  • this embodiment provides a display device 100, which includes: a display screen 1, a polarizer 2, a cover plate 3 and a first glass 4.
  • the display screen 1 includes: a second glass 11, a buffer layer 12, a thin film transistor layer 13, a light-emitting layer 14, an encapsulation layer 15 and a touch control layer 16.
  • the material of the second glass 11 includes at least one of inorganic minerals, Na 2 SiO 3 , CaSiO 3 , SiO 2 , and Na 2 O ⁇ CaO ⁇ 6SiO 2.
  • the thickness of the second glass 11 is less than 100 ⁇ m.
  • the high yield strength and rigidity of the second glass are used to improve the flatness of the display device 100 and improve the water and oxygen blocking performance of the display device 100.
  • the buffer layer 12 is disposed on the second glass 11; the buffer layer 12 includes a first buffer layer 121 and a second buffer layer 122 sequentially disposed on the second glass 11.
  • the buffer layer 12 mainly serves as a buffer and protection.
  • the thin film transistor layer 13 is disposed on the buffer layer 12.
  • the thin film transistor layer 13 includes an active layer 131, an insulating layer 132, a gate layer 133, an interlayer insulating layer 134, a source and drain layer 135, and a flat layer 136.
  • the active layer 131 is disposed on the buffer layer 2.
  • the active layer 131 includes a main body portion 1311 and two side portions 1312.
  • excimer laser crystallization technology is mainly used to achieve polysiliconization of the active layer 131, and then the active layer 131 is patterned through a PR mask to form a main body 1311 and two side portions 1312
  • the two side portions 1312 of the multi-active layer 131 of a PR photomask are subjected to ion doping treatment to form a P-type semiconductor.
  • the insulating layer 132 is disposed on the active layer 131; the gate layer 133 is disposed on the insulating layer 132.
  • the insulating layer 132 includes a first insulating layer 1321 and a second insulating layer 1322; the gate layer 133 includes a first gate layer 1331 and a second gate layer 1332; the first insulating layer 1321 is provided On the active layer 131; the first gate layer 1331 is disposed on the first insulating layer 1321; the second insulating layer 1322 is disposed on the first gate layer 1331; the first gate layer 1331 The second gate layer 1332 is disposed on the second insulating layer 1322.
  • the insulating layer 132 mainly functions as an insulating layer, and the first insulating layer 1321 mainly prevents the first gate layer 1331 and the active layer 131 from contacting and causing a short circuit.
  • the material of the insulating layer 132 includes one or more of SiO 2 and SiN x.
  • the material of the gate layer 33 is metal, such as copper Cu or molybdenum Mo.
  • the interlayer insulating layer 134 is disposed on the second gate layer 1322.
  • the main purpose is to prevent the source and drain layer 135 provided thereon from being in contact with the second gate layer 1322 to cause a short circuit.
  • the material of the interlayer insulating layer 134 includes one or more of SiO 2 and SiN x.
  • the source and drain layers 135 are disposed on the interlayer insulating layer 134 and connected to the active layer 131 through via holes. In this way, the source/drain layer 135 and the active layer 131 can be electrically connected.
  • the flat layer 136 is disposed on the source and drain layer 135. It is mainly used for leveling and provides a smooth surface for subsequent film preparation.
  • the light-emitting layer 14 is disposed on the thin film transistor layer 13.
  • the light-emitting layer 14 includes an anode layer 141, an organic light-emitting layer 142, and a cathode layer 143.
  • the anode layer 141 is disposed on the flat layer 136 and connected to the source and drain layer 135 through via holes.
  • the organic light emitting layer 142 is disposed on the anode layer 142, and the cathode layer is disposed on the organic light emitting layer 143.
  • the encapsulation layer 15 is disposed on the light-emitting layer 14.
  • the encapsulation layer 15 is mainly used to prevent water and oxygen from invading and causing damage to the display screen 1 device.
  • the touch layer 16 is disposed on the encapsulation layer 15.
  • the display device 100 further includes an optical glue 5 which is arranged between the display screen 1 and the polarizer 2.
  • the optical glue includes a first optical glue 51 and a second optical glue 52.
  • the polarizer 2 is arranged on the display screen 1.
  • the polarizer 2 includes: a first liquid crystal layer 21, a quarter-wave plate 22, an interlayer 23, and a second liquid crystal layer 24.
  • the first liquid crystal layer 21 is disposed on the display screen 1 and mainly plays a role of turning natural light into a positive light.
  • the quarter-wave plate 22 is disposed on the first liquid crystal layer 21, and mainly changes linearly polarized positive light into circularly polarized positive light.
  • the interlayer 23 is arranged on the quarter-wavelength plate 22, mainly to prevent the mutual dissolution reaction between the upper and lower film layers.
  • the second liquid crystal layer 24 is disposed on the interlayer 23 and mainly plays a role in improving the large parallax.
  • the cover plate 3 is arranged on the polarizer 2.
  • the cover plate 3 includes: an explosion-proof film 31, a hardened coating layer 32 and a protective film 33.
  • An explosion-proof film 31 is provided on the first glass 4; a hardened coating layer 32 is provided on the explosion-proof film 31; and a protective film 33 is provided on the hardened coating layer 32.
  • the first glass 4 is arranged between the polarizer 2 and the cover 3.
  • the material of the first glass 4 includes at least one of inorganic minerals, Na 2 SiO 3 , CaSiO 3 , SiO 2 , and Na 2 O ⁇ CaO ⁇ 6SiO 2.
  • the thickness of the first glass 4 is less than 100 ⁇ m.
  • the high yield strength characteristics and rigidity of the first glass 4 are used to improve the flatness of the display device 100 and improve the water and oxygen blocking performance of the display device 100.
  • this embodiment includes most of the technical features of Embodiment 1.
  • the difference between this embodiment and Embodiment 1 is that the optical glue 5 in this embodiment is disposed between the polarizer 2 and the cover 3 , Instead of being arranged between the display screen 1 and the polarizer 3 in the first embodiment.
  • the display device 100 of this embodiment further includes a protective layer 6 disposed between the display screen 1 and the polarizer 2. This can protect the touch layer 16 from being invaded by water and oxygen, and at the same time prevent the touch layer 16 from being damaged by stress.
  • the high yield strength characteristics and rigidity of the first glass 4 are used to improve the flatness of the display device 100 and improve the water and oxygen blocking performance of the display device 100.
  • the high yield strength characteristics and rigidity of the second glass 11 are used to improve the flatness of the display device 100 and improve the water and oxygen blocking performance of the display device 100.
  • This embodiment provides a method for manufacturing the display device described in Embodiment 1.
  • the manufacturing method of the display device includes: providing a protective film 33, and preparing the first glass 4 on the protective film 33.
  • an explosion-proof film 31 is coated on one surface of the first glass 4.
  • the surface of the explosion-proof film 31 away from the first glass 4 is coated to prepare a hardened coating 32.
  • the film layer on the side of the first glass 4 away from the protective film 33 is turned over as a whole to form a cover plate 3 arranged on the first glass 4.
  • a second liquid crystal layer 24 is prepared on the side surface of the first glass 4 away from the cover plate.
  • an interlayer 23 is prepared on the surface of the second liquid crystal layer 24 away from the first glass.
  • a quarter-wave plate 22 is prepared on the surface of the interlayer away from the first glass.
  • a first liquid crystal layer 21 is prepared on the side surface of the quarter-wave plate 22 away from the first glass to form a polarizer 2.
  • the display screen 1 is prepared on a glass substrate, the first optical glue 51 is coated on the surface of the prepared display screen 1 away from the second glass 11, and the first optical glue 51 is coated on the surface of the first liquid crystal layer 21 away from the first glass 4.
  • Two optical glues 52, and then the first optical glue 51 and the second optical glue 52 are bonded together, and then the display screen 1 is peeled from the glass substrate by laser glass technology, thereby forming the display device 100.
  • This embodiment provides a method for manufacturing the display device described in Embodiment 2.
  • the manufacturing method of the display device includes: providing a protective film 33, and preparing the first glass 4 on the protective film 33.
  • an explosion-proof film 31 is coated on one surface of the first glass 4.
  • the surface of the explosion-proof film 31 away from the first glass 4 is coated to prepare a hardened coating 32.
  • the film layer on the side of the first glass 4 away from the protective film 33 is turned over as a whole to form a cover plate 3 arranged on the first glass 4.
  • the display screen 1 is prepared on a glass substrate, and the protective layer 6, the first liquid crystal layer 21, the quarter-wave plate 22, the interlayer 23, and the second liquid crystal layer are sequentially prepared on the surface of the prepared display screen 1 away from the second glass 11 twenty four.

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Abstract

本发明涉及一种显示装置，一方面，在所述盖板和所述偏光片之间设置第一玻璃，利用第一玻璃的高屈服强度特性，以此有效改善多次弯折带来的弯折区折痕问题；利用第一玻璃的刚性，以此提高显示装置的平整性。另一方面，利用第二玻璃代替现有技术中的PI基板，以此进一步提高显示装置的平整性。

Description

一种显示装置
本申请要求于2020年02月25日提交中国专利局、申请号为202010116769.5、发明名称为“一种显示装置”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本发明涉及显示技术领域，具体涉及一种显示装置。
 背景技术
显示装置可以把计算机的数据变换成各种文字、数字、符号或直观的图像显示出来，并且可以利用键盘等输入工具把命令或数据输入计算机，借助系统的硬件和软件随时增添、删改、变换显示内容。显示装置根据所用之显示器件分为等离子、液晶、发光二极管和阴极射线管等类型。
有机发光显示装置(英文全称：Organic Light-Emitting Diode, 简称OLED)又称为有机电激光显示装置、有机发光半导体。OLED的工作原理是：当电力供应至适当电压时，正极空穴与阴极电荷就会在发光层中结合，在库伦力的作用下以一定几率复合形成处于激发态的激子（电子-空穴对），而此激发态在通常的环境中是不稳定的，激发态的激子复合并将能量传递给发光材料，使其从基态能级跃迁为激发态，激发态能量通过辐射驰豫过程产生光子，释放出光能，产生光亮，依其配方不同产生红、绿和蓝RGB三基色，构成基本色彩。
OLED具有电压需求低、省电效率高、反应快、重量轻、厚度薄，构造简单，成本低、广视角、几乎无穷高的对比度、较低耗电、极高反应速度等优点，已经成为当今最重要的显示技术之一。
 技术问题
折叠手机是未来技术发展趋势，为了满足折叠的可靠性以及折叠的半径极小化，折叠产品对材料的需求越来越高，越来越追求薄性化，然而材料减薄的同时也会导致表面的平整性低、弯折中心产生折痕等问题。因此，需要寻求一种新型的显示装置以解决上述问题。
 技术解决方案
本发明的目的是提供一种显示装置，其能够解决现有的显示装置中存在的平整性低、弯折中心产生折痕等问题。
为了解决上述问题，本发明提供了一种显示装置，其包括：显示屏；偏光片，设置于所述显示屏上；盖板，设置于所述偏光片上；以及第一玻璃，设置于所述偏光片与所述盖板之间。
进一步的，其中所述显示屏包括：第二玻璃；缓冲层，设置于所述第二玻璃上；薄膜晶体管层，设置于所述缓冲层上；发光层，设置于所述薄膜晶体管层上；封装层，设置于所述发光层上；以及触控层，设置于所述封装层上。
进一步的，其中所述偏光片包括：第一液晶层，设置于所述显示屏上；1/4波长片，设置于所述第一液晶层上；夹层，设置于所述1/4波长片上；以及第二液晶层，设置于所述夹层上。
进一步的，其中所述盖板包括：防爆膜，设置于所述第一玻璃上；硬化涂层，设置于所述防爆膜上；以及保护膜，设置于所述硬化涂层上。
进一步的，其中所述显示装置还包括：光学胶，设置于所述显示屏与所述偏光片之间。
进一步的，其中所述显示装置还包括：光学胶，设置于所述偏光片与盖板之间。
进一步的，其中所述显示装置还包括：保护层，设置于所述显示屏与所述偏光片之间。
进一步的，其中所述第一玻璃的材质包括无机矿物质、Na 2SiO 3、CaSiO 3、SiO 2、Na 2O·CaO·6SiO 2中的至少一种。
进一步的，其中所述第二玻璃的材质包括无机矿物质、Na2SiO3、CaSiO 3、SiO 2、Na 2O·CaO·6SiO 2中的至少一种。
进一步的，其中所述第一玻璃、第二玻璃的厚度均小于100μm。
 有益效果
本发明涉及一种显示装置，一方面，在所述盖板和所述偏光片之间设置第一玻璃，利用第一玻璃的高屈服强度特性，以此有效改善多次弯折带来的弯折区折痕问题；利用第一玻璃的刚性，以此提高显示装置的平整性。另一方面，利用第二玻璃代替现有技术中的PI基板，以此进一步提高显示装置的平整性。
 附图说明
为了更清楚地说明本发明实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为实施例1的显示装置的结构示意图。
图2为显示屏的结构示意图。
图3为实施例2的显示装置的结构示意图。
图4为第一玻璃以及保护膜的结构示意图。
图5为保护膜、第一玻璃以及防爆膜的结构示意图。
图6为保护膜、第一玻璃、防爆膜以及硬化涂层的结构示意图。
图7为第一玻璃以及盖板的结构示意图。
图8为盖板、第一玻璃以及第二液晶层的结构示意图。
图9为盖板、第一玻璃、第二液晶层以及夹层的结构示意图。
图10为盖板、第一玻璃、第二液晶层、夹层以及1/4波长片的结构示意图。
图11为盖板、第一玻璃以及偏光片的结构示意图。
图中部件标识如下：
100、显示装置
1、显示屏                       2、偏光片
3、盖板                         4、第一玻璃
5、光学胶                       6、保护层
11、第二玻璃                    12、缓冲层
13、薄膜晶体管层                14、发光层
15、封装层                      16、触控层
121、第一缓冲层                 122、第二缓冲层
131、有源层                     132、绝缘层
133、栅极层                     134、层间绝缘层
135、源漏极层                   136、平坦层
1311、主体部                    1312、侧部
1321、第一绝缘层                1322、第二绝缘层
1331、第一栅极层                1332、第二栅极层
141、阳极层                     142、有机发光层
143、阴极层
21、第一液晶层                   22、1/4波长片
23、夹层                         24、第二液晶层
31、防爆膜                       32、硬化涂层
33、保护膜
51、第一光学胶                   52、第二光学胶。
 本发明的实施方式
以下结合说明书附图详细说明本发明的优选实施例，以向本领域中的技术人员完整介绍本发明的技术内容，以举例证明本发明可以实施，使得本发明公开的技术内容更加清楚，使得本领域的技术人员更容易理解如何实施本发明。然而本发明可以通过许多不同形式的实施例来得以体现，本发明的保护范围并非仅限于文中提到的实施例，下文实施例的说明并非用来限制本发明的范围。
本发明所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是附图中的方向，本文所使用的方向用语是用来解释和说明本发明，而不是用来限定本发明的保护范围。
在附图中，结构相同的部件以相同数字标号表示，各处结构或功能相似的组件以相似数字标号表示。此外，为了便于理解和描述，附图所示的每一组件的尺寸和厚度是任意示出的 ，本发明并没有限定每个组件的尺寸和厚度。
当某些组件，被描述为“在”另一组件“上”时，所述组件可以直接置于所述另一组件上；也可以存在一中间组件，所述组件置于所述中间组件上，且所述中间组件置于另一组件上。当一个组件被描述为“安装至”或“连接至”另一组件时，二者可以理解为直接“安装”或“连接”，或者一个组件通过一中间组件“安装至”或“连接至”另一个组件。
实施例1
如图1所示，本实施例提供了一种显示装置100，其包括：显示屏1、偏光片2、盖板3以及第一玻璃4。
如图1、图2所示，其中显示屏1包括：第二玻璃11、缓冲层12、薄膜晶体管层13、发光层14、封装层15以及触控层16。
其中第二玻璃11的材质包括无机矿物质、Na 2SiO 3、CaSiO 3、SiO 2、Na 2O·CaO·6SiO 2中的至少一种。第二玻璃11的厚度小于100μm。利用第二玻璃的高屈服强度特性及其刚性，以此提高显示装置100的平整性，提高显示装置100的阻水氧性能。
缓冲层12设置于所述第二玻璃11上；缓冲层12包括依次设置于所述第二玻璃11上的第一缓冲层121和第二缓冲层122。缓冲层12主要是充当缓冲及保护作用。
薄膜晶体管层13设置于所述缓冲层12上。其中所述薄膜晶体管层13包括：有源层131、绝缘层132、栅极层133、层间绝缘层134、源漏极层135以及平坦层136。
其中有源层131设置于所述缓冲层2上。所述有源层131包括主体部1311和两个侧部1312。具体的，本实施例中主要是利用准分子激光晶化技术实现有源层131的多晶硅化，然后通过PR光罩对有源层131进行图案化处理，形成主体部1311和两个侧部1312，最后通过一道PR光罩多有源层131的两个侧部1312进行离子掺杂处理形成P型半导体。
其中所述绝缘层132设置于所述有源层131上；所述栅极层133设置于所述绝缘层132上。具体的，所述绝缘层132包括第一绝缘层1321和第二绝缘层1322；所述栅极层133包括第一栅极层1331和第二栅极层1332；所述第一绝缘层1321设置于所述有源层131上；所述第一栅极层1331设置于所述第一绝缘层1321上；所述第二绝缘层1322设置于所述第一栅极层1331上；所述第二栅极层1332设置于所述第二绝缘层1322上。
绝缘层132主要是起绝缘作用，其中第一绝缘层1321主要是防止第一栅极层1331和有源层131接触产生短路现象。其中，绝缘层132的材质包括SiO 2、SiN x中的一种或多种。
栅极层33的材质为金属，如铜Cu或钼Mo。
其中所述层间绝缘层134设置于所述第二栅极层1322上。主要是为了防止其上设置的源漏极层135与第二栅极层1322接触产生短路现象。其中，层间绝缘层134的材质包括SiO 2、SiN x中的一种或多种。
源漏极层135设置于所述层间绝缘层134上，并通过过孔连接至所述有源层131上。由此可以使源漏极层135与有源层131形成电连接。
平坦层136设置于所述源漏极层135上。主要是起平整作用，为后续膜层的制备提供一个平整的表面。
其中所述发光层14设置于所述薄膜晶体管层13上。其中发光层14包括阳极层141、有机发光层142、阴极层143。
其中阳极层141设置于所述平坦层136上，并通过过孔连接至所述源漏极层135上。所述有机发光层142设置于所述阳极层上142，所述阴极层设置于所述有机发光层143上。
封装层15设置于所述发光层14上。封装层15主要是为了防止水氧入侵，造成显示屏1器件损坏。
触控层16设置于所述封装层15上。
其中所述显示装置100还包括光学胶5，设置于所述显示屏1与所述偏光片2之间。其中所述光学胶包括第一光学胶51和第二光学胶52。
偏光片2设置于所述显示屏1上。其中所述偏光片2包括：第一液晶层21、1/4波长片22、夹层23以及第二液晶层24。
其中第一液晶层21设置于所述显示屏1上，主要是起将自然光变偏正光的作用。
1/4波长片22设置于所述第一液晶层21上，主要是把线偏正光变成圆偏正光。
夹层23设置于所述1/4波长片22上，主要是防止其上下膜层之间产生互溶反应。
第二液晶层24设置于所述夹层23上，主要是起改善大视角色差的作用。
盖板3设置于所述偏光片2上。其中所述盖板3包括：防爆膜31、硬化涂层32以及保护膜33。
防爆膜31设置于所述第一玻璃4上；硬化涂层32，设置于所述防爆膜31上；以及保护膜33，设置于所述硬化涂层32上。
第一玻璃4设置于所述偏光片2与所述盖板3之间。其中所述第一玻璃4的材质包括无机矿物质、Na 2SiO 3、CaSiO 3、SiO 2、Na 2O·CaO·6SiO 2中的至少一种。第一玻璃4的厚度小于100μm。利用第一玻璃4的高屈服强度特性及其刚性，以此提高显示装置100的平整性，提高显示装置100的阻水氧性能。
实施例2
如图3所示，本实施例包括实施例 1 的大部分技术特征，本实施例与实施例 1 的区别在于：本实施例中光学胶5设置于所述偏光片2与盖板3之间，而不是实施例1中的设置于显示屏1与偏光片3之间。
本实施例的显示装置100还包括保护层6设置于所述显示屏1与所述偏光片2之间。由此可以保护触控层16避免被水氧入侵，同时防止触控层16被应力损伤。
本实施例利用第一玻璃4的高屈服强度特性及其刚性，以此提高显示装置100的平整性，提高显示装置100的阻水氧性能。利用第二玻璃11的高屈服强度特性及其刚性，以此提高显示装置100的平整性，提高显示装置100的阻水氧性能。
实施例3
本实施例提供了实施例1所述的显示装置的制备方法。
如图4所示，显示装置的制备方法包括：提供一保护膜33，在所述保护膜33上制备第一玻璃4。
如图5所示，在第一玻璃4的一侧表面涂布防爆膜31。
如图6所示，在防爆膜31远离第一玻璃4的表面涂布制备硬化涂层32。
如图7所示，将第一玻璃4远离保护膜33一侧膜层整体翻转，形成设置在第一玻璃4上的盖板3。
如图8所示，在所述第一玻璃4远离所述盖板的一侧表面制备第二液晶层24。
如图9所示，在所述第二液晶层24远离所述第一玻璃的一侧表面制备夹层23。
如图10所示，在所述夹层远离所述第一玻璃的一侧表面制备1/4波长片22。
如图11所示，在所述1/4波长片22远离所述第一玻璃的一侧表面制备第一液晶层21，形成偏光片2。
在一玻璃基板上制备显示屏1，在制备完成的显示屏1远离第二玻璃11的表面涂布第一光学胶51，在所述第一液晶层21远离第一玻璃4的表面涂布第二光学胶52， 然后将第一光学胶51和第二光学胶52贴合，然后通过激光玻璃技术将显示屏1从玻璃基板上剥离，从而形成显示装置100。
实施例4
本实施例提供了实施例2所述的显示装置的制备方法。
如图4所示，显示装置的制备方法包括：提供一保护膜33，在所述保护膜33上制备第一玻璃4。
如图5所示，在第一玻璃4的一侧表面涂布防爆膜31。
如图6所示，在防爆膜31远离第一玻璃4的表面涂布制备硬化涂层32。
如图7所示，将第一玻璃4远离保护膜33一侧膜层整体翻转，形成设置在第一玻璃4上的盖板3。
在一玻璃基板上制备显示屏1，在制备完成的显示屏1远离第二玻璃11的表面依次制备保护层6、第一液晶层21、1/4波长片22、夹层23以及第二液晶层24。
在第二液晶层24远离显示屏1的一侧表面涂布第一光学胶51，在所述第一玻璃4远离盖板3的一侧表面涂布第二光学胶52， 然后将第一光学胶51和第二光学胶52贴合，然后通过激光玻璃技术将显示屏1从玻璃基板上剥离，从而形成显示装置100。
以上对本申请所提供的显示装置进行了详细介绍，本文中应用了具体个例对本申请的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本申请的技术方案及其核心思想；本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本申请各实施例的技术方案的范围。

Claims (10)

  1. 一种显示装置，其中包括：
    显示屏；
    偏光片，设置于所述显示屏上；
    盖板，设置于所述偏光片上；以及
    第一玻璃，设置于所述偏光片与所述盖板之间。
  2. 根据权利要求1所述的显示装置，其中所述显示屏包括：
    第二玻璃；
    缓冲层，设置于所述第二玻璃上；
    薄膜晶体管层，设置于所述缓冲层上；
    发光层，设置于所述薄膜晶体管层上；
    封装层，设置于所述发光层上；以及
    触控层，设置于所述封装层上。
  3. 根据权利要求1所述的显示装置，其中所述偏光片包括：
    第一液晶层，设置于所述显示屏上；
    1/4波长片，设置于所述第一液晶层上；
    夹层，设置于所述1/4波长片上；以及
    第二液晶层，设置于所述夹层上。
  4. 根据权利要求1所述的显示装置，其中所述盖板包括：
    防爆膜，设置于所述第一玻璃上；
    硬化涂层，设置于所述防爆膜上；以及
    保护膜，设置于所述硬化涂层上。
  5. 根据权利要求1所述的显示装置，其中还包括：
    光学胶，设置于所述显示屏与所述偏光片之间。
  6. 根据权利要求1所述的显示装置，其中还包括：
    光学胶，设置于所述偏光片与盖板之间。
  7. 根据权利要求6所述的显示装置，其中还包括：
    保护层，设置于所述显示屏与所述偏光片之间。
  8. 根据权利要求1所述的显示装置，其中所述第一玻璃的材质包括无机矿物质、Na 2SiO 3、CaSiO 3、SiO 2、Na 2O·CaO·6SiO 2中的至少一种。
  9. 根据权利要求2所述的显示装置，其中所述第二玻璃的材质包括无机矿物质、Na 2SiO 3、CaSiO 3、SiO 2、Na 2O·CaO·6SiO 2中的至少一种。
  10. 根据权利要求2所述的显示装置，其中所述第一玻璃、第二玻璃的厚度均小于100μm。
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