WO2021106805A1 - 感光性組成物、硬化物、及び硬化物の製造方法 - Google Patents
感光性組成物、硬化物、及び硬化物の製造方法 Download PDFInfo
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- WO2021106805A1 WO2021106805A1 PCT/JP2020/043504 JP2020043504W WO2021106805A1 WO 2021106805 A1 WO2021106805 A1 WO 2021106805A1 JP 2020043504 W JP2020043504 W JP 2020043504W WO 2021106805 A1 WO2021106805 A1 WO 2021106805A1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0012—Processes making use of the tackiness of the photolithographic materials, e.g. for mounting; Packaging for photolithographic material; Packages obtained by processing photolithographic materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
Definitions
- the present invention relates to a photosensitive composition, a cured product of the photosensitive composition, and a method for producing a cured product using the above-mentioned photosensitive composition.
- a coating material such as a hard coat
- a translucent material constituting a display panel such as a liquid crystal display display panel and an organic EL display panel
- a material for forming a protective film or an insulating film in a touch panel is used.
- Patent Document 1 For forming a protective film or an insulating film in a touch panel containing, for example, a photopolymerizable monomer, a transparent resin which is a mixture of resins having a specific structure, a photopolymerization initiator, and a solvent as such a photosensitive composition.
- Photosensitive compositions have been proposed (see Patent Document 1).
- Patent Document 1 describes an oxime ester compound as a photopolymerization initiator that gives a photosensitive composition having excellent sensitivity.
- the present invention has been made in view of the above problems, and is a photosensitive composition capable of forming a cured product having high transparency, a cured product of the photosensitive composition, and the above-mentioned photosensitive composition. It is an object of the present invention to provide a method for producing a cured product using the above.
- the present inventors use a phosphine oxide compound (B1) as the photopolymerization initiator (B). ) And the oxime ester compound (B2) in combination at a specific ratio, the above-mentioned problems can be solved, and the present invention has been completed. More specifically, the present invention provides the following.
- a first aspect of the present invention is a photosensitive composition containing a base material component (A) and a photopolymerization initiator (B).
- the base material component (A) contains at least one of the resin (A1) and the photopolymerizable monomer (A2).
- the resin (A1) contains a photopolymerizable resin (A1-1) having an ethylenically unsaturated double bond.
- the photopolymerization initiator (B) contains a phosphine oxide compound (B1) in combination and an oxime ester compound (B2).
- the second aspect of the present invention is a cured product of the photosensitive composition according to the first aspect.
- a third aspect of the present invention is to mold the photosensitive composition according to the first aspect according to the shape of the cured product to be formed. Exposure to the molded photosensitive composition and It is a method for producing a cured product containing.
- a photosensitive composition capable of forming a cured product having high transparency, a cured product of the photosensitive composition, and a method for producing a cured product using the above-mentioned photosensitive composition. can do.
- the photosensitive composition contains a base material component (A) and a photopolymerization initiator (B).
- the base material component (A) contains at least one of the resin (A1) and the photopolymerizable monomer (A2).
- the resin (A1) contains a photopolymerizable resin (A1-1) having an ethylenically unsaturated double bond.
- the photopolymerization initiator (B) contains a phosphine oxide compound (B1) in combination with an oxime ester compound (B2).
- the ratio of the mass W2 of the oxime ester compound (B2) to the total mass W1 of the phosphine oxide compound (B1) and the mass W2 of the oxime ester compound (B2) is 35% by mass or more.
- the photosensitive composition having the above structure cures well by exposure and gives a cured product having high transparency.
- the photosensitive composition contains a base material component (A) that imparts shapeability to the photosensitive composition.
- the base material component (A) contains at least one of the resin (A1) and the photopolymerizable monomer (A2).
- the resin (A1) contains a photopolymerizable resin (A1-1) having an ethylenically unsaturated double bond.
- the resin (A1) is not particularly limited as long as it is a transparent resin material that imparts shape-forming properties such as film-forming property to the photosensitive composition.
- resin materials include polyacetal resin, polyamide resin, polycarbonate resin, polyester resin (polybutylene terephthalate, polyethylene terephthalate, polyarylate, etc.), FR-AS resin, FR-ABS resin, AS resin, ABS resin, and polyphenylene.
- Oxide resin polyphenylene sulfide resin, polysulfone resin, polyether sulfone resin, polyether ether ketone resin, fluororesin, polyimide resin, polyamideimide resin, polyamidebismaleimide resin, polyetherimide resin, polybenzoxazole resin, polybenzothiazole
- examples thereof include resins, polybenzoimidazole resins, silicone resins, BT resins, polymethylpentenes, ultrahigh molecular weight polyethylenes, FR-polypropylenes, (meth) acrylic resins (polymethylmethacrylates and the like), and polystyrenes.
- the structure of these resins (A1) is not particularly limited as long as the object of the present invention is not impaired.
- the silicone resin may be a so-called silicone resin.
- the structure of the silsesquioxane resin is not particularly limited, and may be any conventionally known structure such as a cage type, an incomplete cage type, a ladder type, and a random type. These resin materials may be used in combination of two or more.
- the above resin material is preferably dissolved in the photosensitive composition.
- the above resin material may be a suspension such as latex as long as the object of the present invention is not impaired.
- the resin (A1) preferably contains a photopolymerizable resin (A1-1) having an ethylenically unsaturated double bond from the viewpoint of easily forming a cured product having excellent mechanical properties.
- the resin (A1) preferably contains an alkali-soluble resin (A1-2) because patterning by a photolithography method is easy.
- the resin material as the resin (A1) may correspond to both the photopolymerizable resin (A1-1) and the alkali-soluble resin (A1-2).
- the alkali-soluble resin (A1-2) refers to a resin having a functional group (for example, a phenolic hydroxyl group, a carboxy group, a sulfonic acid group, etc.) having alkali solubility in the molecule.
- a functional group for example, a phenolic hydroxyl group, a carboxy group, a sulfonic acid group, etc.
- Examples of the resin suitable as the alkali-soluble resin (A1-2) include a resin (a-1) having a cardo structure (hereinafter, also referred to as “cardo resin (a-1)”).
- cardo resin (a-1) a resin having a cardo structure
- the cardo structure refers to a structure in which a second cyclic structure and a third cyclic structure are bonded to one ring carbon atom constituting the first cyclic structure.
- the second annular structure and the third annular structure may have the same structure or different structures.
- a typical example of the cardo structure is a structure in which two aromatic rings (for example, a benzene ring) are bonded to a carbon atom at the 9-position of the fluorene ring.
- the cardo resin (a-1) is not particularly limited, and conventionally known resins can be used. Among them, the resin represented by the following formula (a-1) is preferable. Since the cardo resin (a-1) represented by the following formula (a-1) has a (meth) acryloyl group, it also corresponds to the photopolymerizable resin (A1-1).
- (meth) acrylate means both acrylate and methacrylate.
- (meth) acrylic means both acrylic and methacrylic.
- (meth) acryloyl means both acryloyl and methacryloyl.
- X a represents a group represented by the following formula (a-2).
- t1 represents an integer of 0 or more and 20 or less.
- R a1 independently represents a hydrogen atom, a hydrocarbon group having 1 or more and 6 or less carbon atoms, or a halogen atom
- R a2 independently represents a hydrogen atom or a methyl group.
- R a3 each independently represent an alkylene group of straight or branched chain
- t2 is 0 or 1
- W a represents a group represented by the following formula (a3).
- Ra3 an alkylene group having 1 or more and 20 or less carbon atoms is preferable, an alkylene group having 1 or more and 10 or less carbon atoms is more preferable, and an alkylene group having 1 or more and 6 or less carbon atoms is preferable. Is particularly preferable, and ethane-1,2-diyl group, propane-1,2-diyl group, and propane1,3-diyl group are most preferable.
- Ring A in formula (a-3) represents an aliphatic ring that may be condensed with an aromatic ring or may have a substituent.
- the aliphatic ring may be an aliphatic hydrocarbon ring or an aliphatic heterocycle.
- Examples of the aliphatic ring include monocycloalkane, bicycloalkane, tricycloalkane, tetracycloalkane and the like. Specific examples thereof include monocycloalkanes such as cyclopentane, cyclohexane, cycloheptane and cyclooctane, and adamantane, norbornane, isobornane, tricyclodecane and tetracyclododecane.
- the aromatic ring that may be condensed with the aliphatic ring may be an aromatic hydrocarbon ring or an aromatic heterocycle, and an aromatic hydrocarbon ring is preferable. Specifically, a benzene ring and a naphthalene ring are preferable.
- divalent group represented by the formula (a-3) include the following groups.
- the divalent group X a in the formula (a-1) is a cardo by reacting a tetracarboxylic dianhydride giving the residue Z a with a diol compound represented by the following formula (a-2a). It is introduced into the resin (a-1).
- R a1 , R a2 , R a3 , and t2 are as described in the formula (a-2).
- the ring A in the formula (a-2a) is as described in the formula (a-3).
- the diol compound represented by the formula (a-2a) can be produced, for example, by the following method. First, the hydrogen atom in the phenolic hydroxyl group of the diol compound represented by the following formula (a-2b) is replaced with a group represented by -R a3-OH according to a conventional method, if necessary, and then. Glysidylation is performed using epichlorohydrin or the like to obtain an epoxy compound represented by the following formula (a-2c). Then, the epoxy compound represented by the formula (a-2c) is reacted with acrylic acid or methacrylic acid to obtain a diol compound represented by the formula (a-2a).
- Ra1 , Ra3 , and t2 are as described for the formula (a-2).
- the ring A in the formula (a-2b) and the formula (a-2c) is as described in the formula (a-3).
- the method for producing the diol compound represented by the formula (a-2a) is not limited to the above method.
- diol compound represented by the formula (a-2b) include the following diol compounds.
- R a0 is a group represented by hydrogen or a -CO-Y a -COOH.
- Y a represents the residue obtained by removing dicarboxylic acid anhydride from the acid anhydride group (-CO-O-CO-).
- dicarboxylic acid anhydrides are maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylendomethylenetetrahydrophthalic anhydride, chlorendic anhydride, methyltetrahydro. Examples thereof include phthalic anhydride and glutaric anhydride.
- Z a represents a residue obtained by removing two acid anhydride groups from a tetracarboxylic acid dianhydride.
- tetracarboxylic dianhydrides include tetracarboxylic dianhydride represented by the following formula (a-4), pyromellitic dianhydride, benzophenone tetracarboxylic dianhydride, and biphenyltetracarboxylic dianhydride. Examples thereof include biphenyl ether tetracarboxylic dianhydride and the like.
- pyromellitic dianhydride or biphenyltetracarboxylic dianhydride is preferable, and pyromellitic dianhydride is preferable because it has a wide development process margin.
- t1 represents an integer of 0 or more and 20 or less.
- R a4 , R a5 , and R a6 are each independently selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, and a fluorine atom. Shown, t3 indicates an integer of 0 or more and 12 or less.
- the alkyl group that can be selected as Ra4 in the formula (a-4) is an alkyl group having 1 or more and 10 or less carbon atoms. By setting the number of carbon atoms contained in the alkyl group in this range, the heat resistance of the obtained carboxylic acid ester can be further improved.
- R a4 is an alkyl group
- the number of carbon atoms thereof is preferably 1 or more and 6 or less, more preferably 1 or more and 5 or less, and further preferably 1 or more and 4 or less, from the viewpoint that a cardo resin having excellent heat resistance can be easily obtained. 1 or more and 3 or less are particularly preferable.
- R a4 is an alkyl group, the alkyl group may be linear or branched.
- R a4 in the formula (a-4) a hydrogen atom or an alkyl group having 1 or more and 10 or less carbon atoms is more preferable independently from the viewpoint that a cardo resin having excellent heat resistance can be easily obtained.
- R a4 in the formula (a-4) is more preferably a hydrogen atom, a methyl group, an ethyl group, an n-propyl group or an isopropyl group, and particularly preferably a hydrogen atom or a methyl group.
- the plurality of Ra4s in the formula (a-4) are preferably the same group because it is easy to prepare a high-purity tetracarboxylic dianhydride.
- T3 in the formula (a-4) represents an integer of 0 or more and 12 or less. Purification of the tetracarboxylic dianhydride can be facilitated by setting the value of t3 to 12 or less.
- the upper limit of t3 is preferably 5 and more preferably 3 because the tetracarboxylic dianhydride can be easily purified.
- the lower limit of t3 is preferably 1 and more preferably 2. 2 or 3 is particularly preferable for t3 in the formula (a-4).
- the alkyl groups having 1 or more and 10 or less carbon atoms that can be selected as R a5 and R a6 in the formula (a-4) are the same as the alkyl groups having 1 or more and 10 or less carbon atoms that can be selected as R a4. .. R a5 and R a6 have a hydrogen atom or a carbon atom number of 1 or more and 10 or less (preferably 1 or more and 6 or less, more preferably 1 or more and 5 or less, because the tetracarboxylic acid dianhydride can be easily purified. More preferably, it is 1 or more and 4 or less, particularly preferably 1 or more and 3 or less), and it is particularly preferable that it is a hydrogen atom or a methyl group.
- Examples of the tetracarboxylic acid dianhydride represented by the formula (a-4) include norbornane-2-spiro- ⁇ -cyclopentanone- ⁇ '-spiro-2''-norbornane-5,5'', 6,6''-Tetracarboxylic acid dianhydride (also known as "norbornane-2-spiri-2'-cyclopentanone-5'-spiro-2"-norbornane-5,5'', 6,6'' -Tetracarboxylic acid dianhydride "), methylnorbornane-2-spiro- ⁇ -cyclopentanone- ⁇ '-spiro-2''-(methylnorbornane) -5,5'', 6,6''-tetra Norbornane dianhydride, norbornane-2-spiro- ⁇ -cyclohexanone- ⁇ '-spiro-2''-norbornane-5,5'', 6,6''-te
- the weight average molecular weight of the cardo resin (a-1) is preferably 1000 or more and 40,000 or less, more preferably 1500 or more and 30,000 or less, and further preferably 2000 or more and 10000 or less. Within the above range, sufficient heat resistance and mechanical strength of the cured product can be obtained while obtaining good developability.
- the alkali-soluble resin (A1-2) preferably contains a novolak resin (a-2) from the viewpoint of suppressing excessive heat flow of the cured product due to heating.
- a-2 various novolak resins conventionally blended in the photosensitive composition can be used.
- the novolak resin (a-2) a resin obtained by addition-condensing an aromatic compound having a phenolic hydroxyl group (hereinafter, simply referred to as "phenols") and aldehydes under an acid catalyst is preferable.
- phenols used in producing the novolak resin (a-2) examples include phenols; cresols such as o-cresol, m-cresol, p-cresol; 2,3-xylenol, 2,4-xylenol.
- Each alkyl group has 1 or more and 4 or less carbon atoms.); ⁇ -naphthol; ⁇ -naphthol; hydroxydiphenyl; and bisphenol A and the like. These phenols may be used alone or in combination of two or more.
- m-cresol and p-cresol are preferable, and it is more preferable to use m-cresol and p-cresol in combination.
- various properties such as heat resistance of the cured product formed by using the photosensitive composition can be adjusted by adjusting the blending ratio of both.
- the blending ratio of m-cresol and p-cresol is not particularly limited, but the molar ratio of m-cresol / p-cresol is preferably 3/7 or more and 8/2 or less.
- a novolak resin produced by using m-cresol and 2,3,5-trimethylphenol in combination is also preferable.
- a novolak resin When such a novolak resin is used, it is particularly easy to obtain a photosensitive composition capable of forming a cured product which is difficult to flow excessively by heating during post-baking.
- the blending ratio of m-cresol and 2,3,5-trimethylphenol is not particularly limited, but the molar ratio of m-cresol / 2,3,5-trimethylphenol is preferably 70/30 or more and 95/5 or less.
- aldehydes examples include formaldehyde, paraformaldehyde, furfural, benzaldehyde, nitrobenzaldehyde, acetaldehyde and the like. These aldehydes may be used alone or in combination of two or more.
- Acid catalysts used in the preparation of novolak resin (a-2) include, for example, inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, and phosphoric acid; formic acid, oxalic acid, acetic acid, diethylsulfate, and Examples include organic acids such as paratoluene oxalic acid; and metal salts such as zinc acetate. These acid catalysts may be used alone or in combination of two or more.
- the polystyrene-equivalent weight average molecular weight (Mw; hereinafter, also simply referred to as “weight average molecular weight”) of the novolak resin (a-2) is resistant to the flow of the cured product formed by using the photosensitive composition.
- Mw polystyrene-equivalent weight average molecular weight
- 10000 is particularly preferable
- 15000 is more preferable
- 20000 is the most preferable
- 50000 is preferable as the upper limit value
- 45000 is more preferable
- 40,000 is more preferable
- 35000 is the most preferable. preferable.
- the novolak resin (a-2) at least two kinds of resins having different polystyrene-equivalent weight average molecular weights can be used in combination. By using a combination of resins having different weight average molecular weights, it is possible to balance the developability of the photosensitive composition with the heat resistance of the cured product formed by using the photosensitive composition.
- Modified epoxy resin (a-3) As the alkali-soluble resin (A1-2), the epoxy compound (a-3a) and the unsaturated group-containing carboxylic acid (a-3b) are difficult to be deformed by heating and easily form a cured product having high water resistance.
- the reaction product with and may contain an adduct to which a polybasic acid anhydride (a-3c) is added. Such an adduct is also referred to as "modified epoxy resin (a-3)".
- a compound that falls under the above definition and does not fall under the above-mentioned resin (a-1) having a cardo structure is a modified epoxy resin (a-3). ). Since the modified epoxy resin (a-3) has an unsaturated deposition derived from the unsaturated group-containing carboxylic acid (a-3b), it also corresponds to the photopolymerizable resin (A1-1).
- epoxy compound (a-3a), the unsaturated group-containing carboxylic acid (a-3b), and the polybasic acid anhydride (a-3c) will be described.
- the epoxy compound (a-3a) is not particularly limited as long as it is a compound having an epoxy group, and may be an aromatic epoxy compound having an aromatic group or an aliphatic epoxy compound containing no aromatic group. Often, aromatic epoxy compounds having an aromatic group are preferred.
- the epoxy compound (a-3a) may be a monofunctional epoxy compound or a bifunctional or higher functional epoxy compound, and a polyfunctional epoxy compound is preferable.
- epoxy compound (a-3a) examples include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, bisphenol AD type epoxy resin, naphthalene type epoxy resin, and biphenyl type epoxy resin.
- Functional epoxy resin glycidyl ester type epoxy resin such as dimer acid glycidyl ester and triglycidyl ester; tetraglycidyl aminodiphenylmethane, triglycidyl-p-aminophenol, tetraglycidyl metaxylylene diamine, tetraglycidyl bisaminomethylcyclohexane and the like.
- Glycidylamine type epoxy resin such as triglycidyl isocyanurate; fluoroglycinol triglycidyl ether, trihydroxybiphenyl triglycidyl ether, trihydroxyphenylmethane triglycidyl ether, glycerin triglycidyl ether, 2- [4- (2,3-Epoxy propoxy) phenyl] -2- [4- [1,1-bis [4- (2,3-epoxy propoxy) phenyl] ethyl] phenyl] propane, and 1,3-bis [4- [1- [4- (2,3-epoxypropoxy) phenyl] -1- [4- [1- [4- (2,3-epoxypropoxy) phenyl] -1-methylethyl] phenyl] ethyl] phenoxy] Trifunctional epoxy resins such as -2-propanol; te
- an epoxy compound having a biphenyl skeleton is preferable.
- the epoxy compound having a biphenyl skeleton preferably has at least one biphenyl skeleton represented by the following formula (a-3a-1) in the main chain.
- the epoxy compound having a biphenyl skeleton is preferably a polyfunctional epoxy compound having two or more epoxy groups.
- R a7 is a phenyl group which may independently have a hydrogen atom, an alkyl group having 1 or more and 12 or less carbon atoms, a halogen atom, or a substituent.
- j is an integer of 1 or more and 4 or less.
- R a7 is an alkyl group having 1 or more carbon atoms and 12 or less carbon atoms
- specific examples of the alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group and sec-butyl.
- n-butyl group n-pentyl group, isopentyl group, sec-pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert- Examples thereof include an octyl group, an n-nonyl group, an isononyl group, an n-decyl group, an isodecyl group, an n-undecyl group, and an n-dodecyl group.
- R a7 is a halogen atom
- specific examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
- R a7 is a phenyl group which may have a substituent
- the number of substituents on the phenyl group is not particularly limited.
- the number of substituents on the phenyl group is 0-5, preferably 0 or 1.
- substituents are an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an aliphatic acyl group having 2 to 4 carbon atoms, a halogen atom, a cyano group, and a nitro group. The group is mentioned.
- the epoxy compound (a-3a) having a biphenyl skeleton represented by the above formula (a-3a-1) is not particularly limited, and examples thereof include an epoxy compound represented by the following formula (a-3a-2). be able to.
- R a7 and j are the same as those in the formula (a-3a-1), and k is the average number of repetitions of the structural units in parentheses and is 0 or more and 10 or less. .
- the epoxy compound (a-3a) is reacted with an unsaturated group-containing carboxylic acid (a-3b).
- an unsaturated group-containing carboxylic acid (a-3b) a monocarboxylic acid containing a reactive unsaturated double bond such as an acrylic group or a methacrylic group in the molecule is preferable.
- unsaturated group-containing carboxylic acids include acrylic acid, methacrylic acid, ⁇ -styrylacrylic acid, ⁇ -flufurylacrylic acid, ⁇ -cyanocinnamic acid, and cinnamic acid.
- the unsaturated group-containing carboxylic acid (a-3b) may be used alone or in combination of two or more.
- the epoxy compound (a-3a) and the unsaturated group-containing carboxylic acid (a-3b) can be reacted by a known method.
- a reaction method for example, the epoxy compound (a-3a) and the unsaturated group-containing carboxylic acid (a-3b) are mixed with a tertiary amine such as triethylamine or benzylethylamine, dodecyltrimethylammonium chloride, tetramethylammonium chloride, or the like.
- a tertiary amine such as triethylamine or benzylethylamine, dodecyltrimethylammonium chloride, tetramethylammonium chloride, or the like.
- examples thereof include a method of reacting in an organic solvent at a reaction temperature of 50 ° C. or higher and 150 ° C.
- quaternary ammonium salt such as tetraethylammonium chloride or benzyltriethylammonium chloride, pyridine, or triphenylphosphine as a catalyst. Be done.
- the ratio of the amounts used in the reaction of the epoxy compound (a-3a) and the unsaturated group-containing carboxylic acid (a-3b) is the epoxy equivalent of the epoxy compound (a-3a) and the unsaturated group-containing carboxylic acid (a-3b).
- the ratio of a-3b) to the carboxylic acid equivalent is usually preferably 1: 0.5 to 1: 2, more preferably 1: 0.8 to 1: 1.25, and 1: 0.9 to 1: 1. .1 is particularly preferable.
- the ratio of the amount of the epoxy compound (a-3a) used and the amount of the unsaturated group-containing carboxylic acid (a-3b) used is 1: 0.5 to 1: 2 in the above equivalent ratio, the crosslinking efficiency Is preferable because it tends to improve.
- Polybasic acid anhydride (a-3c) Polybasic acid anhydride (a-3c) is an anhydride of a carboxylic acid having two or more carboxy groups.
- the polybasic acid anhydride (a-3c) is not particularly limited, and for example, phthalic anhydride, succinic anhydride, phthalic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, and methylhexahydrophthalic anhydride are used.
- R a8 represents an alkylene group which may have a substituent having 1 or more and 10 or less carbon atoms.
- the polybasic acid anhydride (a-3c) is preferably a compound having two or more benzene rings because it is easy to obtain a photosensitive composition having an excellent balance between sensitivity and developability. Further, the polybasic acid anhydride (a-3c) contains at least one of the compound represented by the above formula (a-3c-1) and the compound represented by the above formula (a-3c-2). Is more preferable.
- the method of reacting the epoxy compound (a-3a) with the unsaturated group-containing carboxylic acid (a-3b) and then the polybasic acid anhydride (a-3c) can be appropriately selected from known methods.
- the amount ratio used is the number of moles of OH groups in the component after the reaction between the epoxy compound (a-3a) and the unsaturated group-containing carboxylic acid (a-3b), and the polybasic acid anhydride (a-3c).
- the equivalent ratio of the acid anhydride groups is usually 1: 1 to 1: 0.1, preferably 1: 0.8 to 1: 0.2. Within the above range, it is easy to obtain a photosensitive composition having good developability.
- the acid value of the modified epoxy resin (a-3) is preferably 10 mgKOH / g or more and 150 mgKOH / g or less, and more preferably 70 mgKOH / g or more and 110 mgKOH / g or less in terms of resin solid content. Sufficient solubility in a developing solution can be obtained by setting the acid value of the resin to 10 mgKOH / g or more, and sufficient curability can be obtained by setting the acid value to 150 mgKOH / g or less. The surface property can be improved.
- the weight average molecular weight of the modified epoxy resin (a-3) is preferably 1000 or more and 40,000 or less, and more preferably 2000 or more and 30,000 or less.
- the weight average molecular weight is 1000 or more, it is easy to form a cured product having excellent heat resistance and strength. Further, when the weight average molecular weight is 40,000 or less, it is easy to obtain a photosensitive composition exhibiting sufficient solubility in a developing solution.
- Acrylic resin (a-4) is also preferable as a component constituting the alkali-soluble resin (A1-2).
- the acrylic resin (a-4) a resin containing a structural unit derived from (meth) acrylic acid and / or a structural unit derived from another monomer such as (meth) acrylic acid ester can be used.
- the (meth) acrylic acid is acrylic acid or methacrylic acid.
- the (meth) acrylic acid ester is a compound represented by the following formula (a-4-1), and is not particularly limited as long as the object of the present invention is not impaired.
- R a9 is a hydrogen atom or a methyl group
- R a10 is a monovalent organic group.
- This organic group may contain a bond or a substituent other than the hydrocarbon group such as a hetero atom in the organic group. Further, the organic group may be linear, branched or cyclic.
- the substituent other than a hydrocarbon group in the organic group R a10 the effect is not particularly limited as long as they do not impair the present invention, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a cyano group, an isocyano group, a cyanato group , Isocyanato group, thiocyanato group, isothiocyanato group, silyl group, silanol group, alkoxy group, alkoxycarbonyl group, carbamoyl group, thiocarbamoyl group, nitro group, nitroso group, carboxy group, carboxylate group, acyl group, acyloxy group, sulfino Group, sulfo group, sulfonate group, phosphino group, phosphinyl group, phosphono group, phosphonato group, hydroxyimino group, alkyl ether group, al
- the organic group as R a10 is acryloyloxy group, methacryloyloxy group, an epoxy group, may have a reactive functional group such as oxetanyl group.
- Acyl groups having unsaturated double bonds such as acryloyloxy groups and metaacryloyloxy groups, can be added to at least a part of epoxy groups in an acrylic resin (a-4) containing a structural unit having an epoxy group, for example. It can be produced by reacting an unsaturated carboxylic acid such as acrylic acid or methacrylic acid. An unsaturated carboxylic acid may be reacted with at least a part of the epoxy group, and then the polybasic acid anhydride may be reacted with the group produced by the reaction.
- polybasic acid anhydrides include phthalic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, and methyltetrahydrophthalic anhydride.
- the acrylic resin (a-4) is represented by the formula (a-4-1) and contains a structural unit derived from a compound having an organic group having an unsaturated double bond as Ra10, the acrylic resin is said. Also corresponds to a photopolymerizable resin (A1-1).
- R a10 is preferably an alkyl group, an aryl group, an aralkyl group, or a heterocyclic group, and these groups may be substituted with a halogen atom, a hydroxyl group, an alkyl group, or a heterocyclic group.
- the alkylene moiety may be interrupted by an ether bond, a thioether bond, or an ester bond.
- the number of carbon atoms of the alkyl group is preferably 1 or more and 20 or less, more preferably 1 or more and 15 or less, and particularly preferably 1 or more and 10 or less.
- suitable alkyl groups include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group, isopentyl group, sec.
- -Pentyl group tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl group, isononyl group, n-decyl group, Examples thereof include an isodecyl group.
- suitable alicyclic groups contained in the alkyl group include a cyclopentyl group, a monocyclic alicyclic group such as a cyclohexyl group, and the like. , Adamantyl group, norbornyl group, isobornyl group, tricyclononyl group, tricyclodecyl group, tetracyclododecyl group and other polycyclic alicyclic groups.
- the compound represented by the formula (a-4-1) is, in a case having a chain groups having an epoxy group as R a10, specific examples of the compound represented by the formula (a-4-1) is, Examples thereof include (meth) acrylic acid epoxyalkyl esters such as glycidyl (meth) acrylate, 2-methylglycidyl (meth) acrylate, 3,4-epoxybutyl (meth) acrylate, and 6,7-epoxyheptyl (meth) acrylate. ..
- the compound represented by the formula (a-4-1) may be an alicyclic epoxy group-containing (meth) acrylic acid ester.
- the alicyclic group constituting the alicyclic epoxy group may be monocyclic or polycyclic.
- Examples of the monocyclic alicyclic group include a cyclopentyl group and a cyclohexyl group.
- Examples of the polycyclic alicyclic group include a norbornyl group, an isobornyl group, a tricyclononyl group, a tricyclodecyl group, a tetracyclododecyl group and the like.
- the compound represented by the formula (a-4-1) is an alicyclic epoxy group-containing (meth) acrylic acid ester
- examples thereof include the compound represented by -1o).
- the compounds represented by the following formulas (a-4-1a) to (a-4-1e) are preferable, and the following formula (a-4-1a) is preferable.
- )-(A-4-1c) are more preferable.
- R a20 represents a hydrogen atom or a methyl group
- R a21 represents a divalent aliphatic saturated hydrocarbon group having 1 to 6 carbon atoms
- R a22 is 2 having 1 to 10 carbon atoms It indicates a valent hydrocarbon group
- t indicates an integer of 0 or more and 10 or less.
- Ra21 a linear or branched alkylene group, for example, a methylene group, an ethylene group, a propylene group, a tetramethylene group, an ethylethylene group, a pentamethylene group, or a hexamethylene group is preferable.
- Ra22 examples include methylene group, ethylene group, propylene group, tetramethylene group, ethylethylene group, pentamethylene group, hexamethylene group, phenylene group, cyclohexylene group, -CH 2 -Ph-CH 2- (Ph is (Indicating a phenylene group) is preferable.
- the acrylic resin (a-4) may be a copolymer obtained by further polymerizing a monomer other than the (meth) acrylic acid ester.
- the monomer other than the (meth) acrylic acid ester include (meth) acrylamides, unsaturated carboxylic acids, allyl compounds, vinyl ethers, vinyl esters, styrenes and the like. These monomers can be used alone or in combination of two or more.
- Examples of (meth) acrylamides include (meth) acrylamide, N-alkyl (meth) acrylamide, N-aryl (meth) acrylamide, N, N-dialkyl (meth) acrylamide, N, N-aryl (meth) acrylamide, and N.
- -Methyl-N-phenyl (meth) acrylamide, N-hydroxyethyl-N-methyl (meth) acrylamide and the like can be mentioned.
- unsaturated carboxylic acids include monocarboxylic acids such as crotonic acid; dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid, mesaconic acid, and itaconic acid; and anhydrides of these dicarboxylic acids.
- allyl compound examples include allyl esters such as allyl acetate, allyl caproate, allyl caprylate, allyl laurate, allyl palmitate, allyl stearate, allyl benzoate, allyl acetoacetate, allyl lactate; allyloxyethanol; and the like. Can be mentioned.
- vinyl ethers include hexyl vinyl ether, octyl vinyl ether, decyl vinyl ether, ethyl hexyl vinyl ether, methoxyethyl vinyl ether, ethoxyethyl vinyl ether, chloroethyl vinyl ether, 1-methyl-2,2-dimethylpropyl vinyl ether, 2-ethylbutyl vinyl ether and hydroxyethyl vinyl ether.
- Diethylene glycol vinyl ether dimethylaminoethyl vinyl ether, diethylaminoethyl vinyl ether, butylaminoethyl vinyl ether, benzyl vinyl ether, tetrahydrofurfuryl vinyl ether and other alkyl vinyl ethers; vinyl phenyl ether, vinyl trill ether, vinyl chlorophenyl ether, vinyl-2,4-dichlorophenyl ether.
- Vinyl aryl ethers such as vinyl naphthyl ethers and vinyl anthranyl ethers; and the like.
- vinyl esters include vinyl butyrate, vinylisobutyrate, vinyltrimethylacetate, vinyldiethylacetate, vinylvalerate, vinylcaproate, vinylchloroacetate, vinyldichloroacetate, vinylmethoxyacetate, vinylbutoxyacetate, and vinylphenyl.
- vinyl esters include vinyl butyrate, vinylisobutyrate, vinyltrimethylacetate, vinyldiethylacetate, vinylvalerate, vinylcaproate, vinylchloroacetate, vinyldichloroacetate, vinylmethoxyacetate, vinylbutoxyacetate, and vinylphenyl.
- vinyl esters include vinyl butyrate, vinylisobutyrate, vinyltrimethylacetate, vinyldiethylacetate, vinylvalerate, vinylcaproate, vinylchloroacetate, vinyldichloroacetate, vinylmethoxyacetate, vinylbutoxyacetate, and vinylphenyl.
- vinyl acetoacetate vinyl lactate, vinyl- ⁇ -phenylbutyrate, vinyl benzoate, vinyl salicy
- Styrenes include styrene; methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, diethylstyrene, isopropylstyrene, butylstyrene, hexylstyrene, cyclohexylstyrene, decylstyrene, benzylstyrene, chloromethylstyrene, trifluoromethylstyrene, ethoxy.
- Alkylstyrene such as methylstyrene and acetoxymethylstyrene; alkoxystyrene such as methoxystyrene, 4-methoxy-3-methylstyrene and dimethoxystyrene; chlorostyrene, dichlorostyrene, trichlorostyrene, tetrachlorostyrene, pentachlorostyrene, bromostyrene, Examples thereof include halostyrene such as dibromostyrene, iodostyrene, fluorostyrene, trifluorostyrene, 2-bromo-4-trifluoromethylstyrene, and 4-fluoro-3-trifluoromethylstyrene.
- the amount of the structural unit derived from (meth) acrylic acid and the amount of the structural unit derived from other monomers in the acrylic resin (a-4) are not particularly limited as long as the object of the present invention is not impaired.
- the amount of the structural unit derived from (meth) acrylic acid in the acrylic resin (a-4) is preferably 5% by mass or more and 50% by mass or less with respect to the mass of the acrylic resin (a-4). More preferably, it is by mass% or more and 30% by mass or less.
- the amount of the structural unit having an unsaturated double bond in the acrylic resin (a-4) is 1% by mass or more. 50% by mass or less is preferable, 1% by mass or more and 30% by mass or less is more preferable, and 1% by mass or more and 20% by mass or less is particularly preferable. Since the acrylic resin (a-4) contains a structural unit having an unsaturated double bond in an amount within the above range, the acrylic resin can be incorporated into the cross-linking reaction in the resist film and homogenized, so that the cured film can be made uniform. It is effective in improving heat resistance and mechanical properties.
- the weight average molecular weight of the acrylic resin (a-4) is preferably 2000 or more and 50,000 or less, and more preferably 3000 or more and 30,000 or less. Within the above range, the film-forming ability of the photosensitive composition and the developability after exposure tend to be easily balanced.
- the resin corresponding to both the photopolymerizable resin (A1-1) and the alkali-soluble resin (A1-2) is obtained by condensing polyhydric alcohols with monobasic acid or polybasic acid.
- Polyester (meth) acrylate obtained by reacting the polyester prepolymer to be obtained with (meth) acrylic acid; obtained by reacting a polyol with a compound having two isocyanate groups and then reacting with (meth) acrylic acid.
- Polyurethane (meth) acrylate bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol or cresol novolac type epoxy resin, resol type epoxy resin, triphenol methane type epoxy resin, polycarboxylic acid polyglycidyl ester , Polypolyglycidyl ester, aliphatic or alicyclic epoxy resin, amine epoxy resin, dihydroxybenzene type epoxy resin and other epoxy resins, and epoxy (meth) acrylate resin obtained by reacting (meth) acrylic acid, etc. Can be mentioned.
- the resins corresponding to both the alkali-soluble resin (A1-2) and the photopolymerizable resin (A1-1) and the alkali-soluble resin (A1-2) have been described above.
- Examples of resins that do not correspond to the photopolymerizable resin (A1-1) include polyacetal resin, polyamide resin, polycarbonate resin, polyester resin (polybutylene terephthalate, polyethylene terephthalate, polyarylate, etc.), FR-AS resin, FR-.
- ABS resin AS resin, ABS resin, polyphenylene oxide resin, polyphenylene sulfide resin, polysulfone resin, polyethersulfone resin, polyether ether ketone resin, fluororesin, polyimide resin, polyamideimide resin, polyamidebismaleimide resin, polyetherimide Resin, polybenzoxazole resin, polybenzothiazole resin, polybenzoimidazole resin, silicone resin, BT resin, polymethylpentene, ultrahigh molecular weight polyethylene, FR-polypropylene, (meth) acrylic resin (polymethylmethacrylate, etc.), and polystyrene.
- unsaturated group-modified resins in which a group having an unsaturated double bond such as a (meth) acryloyl group, a vinyl group, and an allyl group is introduced into the resin.
- the method of unsaturated group modification is not particularly limited.
- the resin may be modified by copolymerizing a monomer having an unsaturated group, and when the resin has a hydroxyl group, an amino group, or the like, such functional groups include a (meth) acryloyl group and a vinyl group. , A group having an unsaturated double bond such as an allyl group may be introduced.
- the photosensitive composition may contain a photopolymerizable monomer (A2) alone or in combination with the above-mentioned resin (A1).
- a compound conventionally blended in the photosensitive composition can be used without particular limitation.
- Examples of the monofunctional photopolymerizable monomer include (meth) acrylamide, methylol (meth) acrylamide, methoxymethyl (meth) acrylamide, ethoxymethyl (meth) acrylamide, propoxymethyl (meth) acrylamide, and butoxymethoxymethyl (meth) acrylamide.
- polyfunctional photopolymerizable monomer examples include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, and butylene.
- a compound represented by the following formula (a-01) is also preferable as the photopolymerizable monomer (A2) in that a cured product having a high refractive index can be easily formed.
- W 01 and W 02 are independently described in the following formula (a-02): It is a group represented by In formula (a-02), ring Z 01 represents an aromatic hydrocarbon ring, X 01 represents a single bond or a group represented by —S—, R 01 is a single bond, and the number of carbon atoms is 1 or more and 4 or less.
- R 02 is a monovalent hydrocarbon group, a hydroxyl group, a group represented by -OR 4A , a group represented by -SR 4B , an acyl group, an alkoxycarbonyl group, a halogen atom, a nitro group, a cyano group, and a mercapto group.
- R 03 is a hydrogen atom, a vinyl group, or a (meth) acryloyl group, and at least one of the two R 03 is a vinyl group or a (meth) acryloyl group.
- Both W 01 and W 02 do not have a hydrogen atom as R 03, Ring Y 01 and ring Y 02 show the same or different aromatic hydrocarbon rings, and R 00 is a single bond, may have a methylene group having a substituent, may have a substituent, and may have two carbons.
- An ethylene group which may contain a hetero atom between atoms, a group represented by -O-, a group represented by -NH-, or a group represented by -S-, and R 3A and R 3B are independently cyano groups. It represents a halogen atom or a monovalent hydrocarbon group, and N1 and N2 independently represent an integer of 0 to 4. ) It is also preferable to include a compound represented by.
- the ring Z 01 is, for example, a benzene ring, a condensed polycyclic aromatic hydrocarbon ring [for example, a fused bicyclic hydrocarbon ring (for example, a naphthalene ring or the like, C 8-20). Fused 2-4 ring type such as fused bicyclic hydrocarbon ring, preferably C 10-16 fused dicyclic hydrocarbon ring), fused tricyclic aromatic hydrocarbon ring (eg, anthracene ring, phenanthrene ring, etc.) Aromatic hydrocarbon ring] and the like.
- a condensed polycyclic aromatic hydrocarbon ring for example, a fused bicyclic hydrocarbon ring (for example, a naphthalene ring or the like, C 8-20).
- Fused 2-4 ring type such as fused bicyclic hydrocarbon ring, preferably C 10-16 fused dicyclic hydrocarbon ring), fused tricyclic aromatic hydrocarbon ring (eg, anthracene
- Ring Z 01 is preferably a benzene ring or a naphthalene ring, and more preferably a naphthalene ring. Since W 01 and W 02 in the formula (a-01) are independently represented by the above formula (a-02), W 01 and W 02 each include a ring Z 01. .. The ring Z 01 contained in the ring Z 01 and W 02 included in the W 01, may be the same or different, for example, one ring is a benzene ring, although other ring may be a naphthalene ring, , It is particularly preferable that each ring is a naphthalene ring.
- substitution position of the ring Z 01 bonded to the carbon atom to which both W 01 and W 02 are directly connected via X 01 is not particularly limited.
- the group corresponding to ring Z 01 bonded to the carbon atom may be a 1-naphthyl group, a 2-naphthyl group, or the like.
- X 01 independently represents a single bond or a group represented by ⁇ S—, and is typically a single bond.
- a preferable example of R 01 is a single bond; the number of carbon atoms of a methylene group, an ethylene group, a trimethylene group, a propylene group, a butane-1,2-diyl group, etc. is 1 or more and 4 or less.
- R 01 is an alkyleneoxy group
- the oxygen atom in the alkyleneoxy group is bonded to the ring Z 01.
- W 01 and W 02 in the formula (a-01) are independently represented by the following formula (a-02)
- W 01 and W 02 are divalent groups, respectively. Includes some R 01.
- the R 01 that is included in the R 01 and W 02 to be included in the W 01 may be the same or may be different.
- R 02 is, for example, a C 1-12 alkyl group such as an alkyl group (for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, etc., preferably C 1-8.
- Alkyl group more preferably C 1-6 alkyl group, etc.
- cycloalkyl group C 5-10 cycloalkyl group such as cyclohexyl group, preferably C 5-8 cycloalkyl group, more preferably C 5-6 cycloalkyl group.
- aryl groups eg, C 6-14 aryl groups such as phenyl group, trill group, xsilyl group, naphthyl group, preferably C 6-10 aryl group, more preferably C 6-8 aryl group, etc.
- Monovalent hydrocarbon groups such as aralkyl groups (C 6-10aryl- C 1-4 alkyl groups such as benzyl group and phenethyl group); hydroxyl groups; alkoxy groups (methoxy group, ethoxy group, propoxy group, butoxy group, etc.) C 1-12 alkoxy group, preferably C 1-8 alkoxy group, more preferably C 1-6 alkoxy group, etc.), cycloalkoxy group (C 5-10 cycloalkoxy group such as cyclohexyloxy group), aryloxy group A group represented by -OR 4A such as (C 6-10 aryloxy group such as phenoxy group), aralkyloxy group (for example, C 6-10 aryloxy group
- R 4A represents a monovalent hydrocarbon group (such as the above-exemplified monovalent hydrocarbon group).
- Alkylthio group C 1-12 alkyl thio group such as methyl thio group, ethyl thio group, propyl thio group, butyl thio group, preferably C 1-8 alkyl thio group, more preferably C 1-6 alkyl thio group, etc.
- cycloalkyl thio group C 5-10 cycloalkylthio group such as cyclohexylthio group
- arylthio group C 6-10 arylthio group such as phenylthio group
- aralkylthio group for example, C 6-10aryl- C 1-4 such as benzylthio group
- a group represented by -SR 4B such as (alkylthio group) [in the formula, R 4B represents a monovalent hydrocarbon group (such as the above-exemplified monovalent hydrocarbon group
- Acyl group (C 1-6 acyl group such as acetyl group); alkoxycarbonyl group (C 1-4 alkoxy-carbonyl group such as methoxycarbonyl group); halogen atom (fluorine atom, chlorine atom, bromine atom, etc.) Iodine atom, etc.); Nitro group; Cyan group; Mercapto group; Carboxy group; Amino group; Carbamoyl group; Alkylamino group (methylamino group, ethylamino group, propylamino group, butylamino group, etc.
- R 4C represents a monovalent hydrocarbon group (such as the above-exemplified monovalent hydrocarbon group).
- Dialkylamino groups dimethylamino group, diethylamino group, dipropylamino group, dibutylamino group and other di (C 1-12 alkyl) amino groups, preferably di (C 1-8 alkyl) amino groups, more preferably.
- R 4D independently represents a monovalent hydrocarbon group (such as the above-exemplified monovalent hydrocarbon group).
- at least a part of the hydrogen atom bonded to the carbon atom contained in the group represented by -N (R 4D ) 2 is the above monovalent hydrocarbon group, hydroxyl group, group represented by -OR 4A , -SR 4B .
- alkoxyaryl group eg, C 1-4 alkoxy C 6-10 aryl group such as methoxyphenyl group
- alkoxycarbonylaryl Groups for example, C 1-4 alkoxy-carbonyl C 6-10 aryl groups such as methoxycarbonylphenyl group and ethoxycarbonylphenyl group
- R 02 is a monovalent hydrocarbon group, a group represented by -OR 4A , a group represented by -SR 4B , an acyl group, an alkoxycarbonyl group, a halogen atom, a nitro group, and a cyano group.
- the group represented by -NHR 4C , the group represented by -N (R 4D ) 2 , and the like may be used.
- R 02s include monovalent hydrocarbon groups [eg, alkyl groups (eg, C 1-6 alkyl groups), cycloalkyl groups (eg, C 5-8 cycloalkyl groups), aryl groups (eg, C 6-). 10 aryl group), aralkyl group (for example, C 6-8 aryl-C 1-2 alkyl group), etc.], alkoxy group (C 1-4 alkoxy group, etc.) and the like.
- R 02 is a monovalent hydrocarbon group (particularly, C 1-4 alkyl group (particularly methyl group), etc.], aryl group [for example, C 6-10 aryl group (particularly phenyl group), etc.] and the like. , Alkyl group).
- the plurality of R 02s may be different from each other or may be the same.
- the R 02 contained in R 02 and W 2 included in W 01 it may be the same or may be different.
- the number M of R 02 can be selected according to the type of ring Z 01 , and is, for example, 0 or more and 4 or less, preferably 0 or more and 3 or less, and more preferably 0 or more and 2 or less. You may.
- the M in W 01 and the M in W 02 may be the same or different.
- R 03 is a hydrogen atom, a vinyl group, or a (meth) acryloyl group. At least one of the two R 03s is a vinyl group or a (meth) acryloyl group. That is, neither W 01 nor W 02 has a hydrogen atom as R 03.
- R 03 contained in R 03 and W 02 included in the W 01 may be the same or may be different. It is also preferable that both R 03 contained in W 01 and R 03 contained in W 02 are (meth) acryloyl groups.
- R 03 a vinyl group or a (meth) acryloyl group is preferable because the compound represented by the formula (a-01) can be easily synthesized and obtained.
- the ring Y 01 and the ring Y 02 include, for example, a benzene ring, a condensed polycyclic aromatic hydrocarbon ring [for example, a condensed bicyclic hydrocarbon ring (for example, a naphthalene ring, etc.).
- 4-ring aromatic hydrocarbon ring to 4-ring aromatic hydrocarbon ring
- Rings Y 01 and Y 02 are preferably benzene rings or naphthalene rings, and more preferably benzene rings.
- the ring Y 01 and the ring Y 02 may be the same or different.
- one ring may be a benzene ring, the other ring may be a naphthalene ring, or the like.
- R 00 is a single bond, a methylene group which may have a substituent, or an ethylene group which may contain a hetero atom between two carbon atoms. , -O-, -NH-, or -S-, typically a single bond.
- a cyano group for example, a cyano group, a halogen atom (fluorine atom, chlorine atom, bromine atom, etc.), a monovalent hydrocarbon group [for example, an alkyl group (methyl group, ethyl group, propyl group, isopropyl group, etc., A butyl group, a C 1-6 alkyl group such as a tert-butyl group), an aryl group (C 6-10 aryl group such as a phenyl group), etc.] and the like can be mentioned.
- the hetero atom include an oxygen atom and a nitrogen atom. , Sulfur atom, silicon atom and the like.
- R 3A and R 3B are usually non-reactive substituents such as a cyano group, a halogen atom (fluorine atom, chlorine atom, bromine atom, etc.) and a monovalent hydrocarbon group
- a cyano group a halogen atom (fluorine atom, chlorine atom, bromine atom, etc.) and a monovalent hydrocarbon group
- a cyano group or an alkyl group is preferable, and an alkyl group is particularly preferable.
- alkyl group examples include C 1-6 alkyl groups such as methyl group, ethyl group, propyl group, isopropyl group, butyl group and tert-butyl group (for example, C 1-4 alkyl group, particularly methyl group). ..
- N1 is an integer of 2 or more
- R 3A may be different from each other or may be the same.
- N2 is an integer of 2 or more
- R 3B may be different from each other or may be the same.
- R 3A and R 3B may be the same or different.
- the bonding position (replacement position) of R 3A and R 3B with respect to the ring Y 01 and the ring Y 02 is not particularly limited.
- the preferred substitution numbers N1 and N2 are 0 or 1, especially 0. N1 and N2 may be the same or different from each other.
- the compound represented by the above formula (a-01) has high reactivity while maintaining excellent optical and thermal properties.
- the compound represented by the above formula (a-01) has a fluorene skeleton, and has optical properties and thermal properties. Even better in characteristics.
- the compound represented by the above formula (a-01) gives a cured product having high hardness.
- the photosensitive composition When forming a cured product having a high refractive index, the photosensitive composition contains a sulfide compound (A2-1) having the following structure and a (meth) acrylate compound (A2-2) having the following structure as the photopolymerizable monomer (A2). ) In combination with. In this case, even if the photosensitive composition contains or does not contain the solvent (S), a low-viscosity photosensitive composition that can be applied to an inkjet method or the like can be prepared.
- the sulfide compound (A2-1) is a compound represented by the following formula (a2-1).
- R a01 and R a02 are independently hydrogen atoms or methyl groups, respectively.
- R a03 and R a04 are each independently an alkyl group having 1 or more carbon atoms and 5 or less carbon atoms.
- p and q are independently 0 or 1, respectively.
- R a01 and R a02 are independently hydrogen atoms or methyl groups, respectively. R a01 and R a02 may be different from each other or may be the same. Sulfide compound of (A2-1), since the synthesis and of easy availability, R a01, and preferably R a02 are the same.
- R a03 and R a04 are each independently an alkyl group having 1 or more carbon atoms and 5 or less carbon atoms. R a03 and R a04 may be different from each other or may be the same. Sulfide compound of (A2-1), since the synthesis and of easy availability, R a03, and preferably R a04 are the same.
- the alkyl groups having 1 or more and 5 or less carbon atoms as R a03 and R a04 may be linear or branched.
- alkyl groups having 1 or more and 5 or less carbon atoms as R a03 and R a04 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, and the like. Examples thereof include a tert-butyl group, an n-pentyl group, an isopentyl group and a tert-pentyl group.
- sulfide compound (A2-1) include the following compounds.
- the (meth) acrylate compound (A2-2) is a compound represented by the following formula (a2-2).
- R a010 is a hydrogen atom or a methyl group.
- R a011 is an alkylene group having 1 or more carbon atoms and 3 or less carbon atoms.
- R a012 is a single bond, an oxygen atom, or a sulfur atom.
- R a013 is an alkyl group having 1 or more and 4 or less carbon atoms, or an alkoxy group having 1 or more and 4 or less carbon atoms.
- m1 is an integer of 0 or more and 5 or less.
- m2 is 1 or 2.
- the plurality of Ra 011s may be the same or different, and are preferably the same.
- the plurality of Ra 012s may be the same or different, and are preferably the same.
- Ra011 is an alkylene group having 1 or more carbon atoms and 3 or less carbon atoms.
- the alkylene group include a methylene group, an ethane-1,2-diyl group (ethylene group), an ethane-1,1-diyl group, a propane-1,3-diyl group, and a propane-1,2-diyl group.
- propane-2,2-diyl groups Among these, a methylene group, an ethane-1,2-diyl group (ethylene group), a propane-1,3-diyl group, and a propane-1,2-diyl group are preferable, and an ethane-1,2-diyl group is preferable. (Ethylene group) is more preferable.
- R a012 is a single bond, an oxygen atom, or a sulfur atom, and a single bond is preferable.
- m2 is preferably 1.
- R a013 is an alkyl group having 1 or more and 4 or less carbon atoms, or an alkoxy group having 1 or more and 4 or less carbon atoms.
- the alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a tert-butyl group.
- a methyl group and an ethyl group are preferable, and a methyl group is more preferable.
- alkoxy group examples include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, a sec-butyloxy group, and a tert-butyloxy group.
- a methoxy group and an ethoxy group are preferable, and a methoxy group is more preferable.
- m1 is an integer of 0 or more and 5 or less, preferably 0 or 1, and more preferably 0.
- (meth) acrylate compound (A2-2) include the following compounds.
- the photosensitive composition contains the sulfide compound (A2-1) and the (meth) acrylate compound (A2-2) in combination as the photopolymerizable monomer (A2), the sulfide with respect to the mass of the base material component (A).
- the total ratio of the mass of the compound (A2-1) to the mass of the (meth) acrylate compound (A2-2) is preferably 80% by mass or more, more preferably 90% by mass or more, and further preferably 95% by mass or more. It is preferable, and 100% by mass is most preferable.
- the mass of the solvent (S) of the photosensitive composition is preferably 5% by mass or more and 30% by mass or less, more preferably 7% by mass or more and 25% by mass or less, and further preferably 9% by mass or more and 20% by mass or less. preferable.
- the mass of the solvent (S) of the photosensitive composition is preferably 10% by mass or more and 50% by mass or less, more preferably 20% by mass or more and 45% by mass or less, and 30% by mass or more and 40% by mass or less. The following is more preferable.
- the photosensitive composition contains the sulfide compound (A2-1) and the (meth) acrylate compound (A2-2) in combination as the photopolymerizable monomer (A2), the photosensitive composition is within the above range.
- the photosensitive composition has excellent photocurability and low viscosity, and the photosensitive composition is used.
- a cured product having a high refractive index can be formed.
- the photosensitive composition contains a sulfide compound (A2-1) and a (meth) acrylate compound (A2-2) in combination as the photopolymerizable monomer (A2)
- the photosensitive composition is used for high refraction. It is preferable that the mass of the (meth) acrylate compound (A2-2) is larger than the mass of the sulfide compound (A2-1) from the viewpoint of easily forming a cured product having a ratio.
- the content of the base material component (A) in the photosensitive composition is not particularly limited as long as it does not impair the object of the present invention.
- the content of the base material component (A) in the photosensitive composition is preferably 10% by mass or more and 99.5% by mass or less, preferably 30% by mass or less, based on the mass excluding the mass of the solvent (S) of the photosensitive composition. More preferably, it is by mass% or more and 99% by mass or less.
- the content of the resin (A1) in the photosensitive composition is preferably 99.5% by mass or less, preferably 20% by mass or more and 85% by mass or less, based on the mass excluding the mass of the solvent (S) of the photosensitive composition. Is more preferable, and 25% by mass or more and 75% by mass or less is further preferable.
- the content of the photopolymerizable monomer (A2) in the photosensitive composition is preferably 99.5% by mass or less, preferably 1% by mass or more and 50% by mass, based on the mass of the photosensitive composition excluding the mass of the solvent (S). It is preferably 5% by mass or less, and more preferably 5% by mass or more and 40% by mass or less. Within the above range, it tends to be easy to balance sensitivity, developability, and resolution.
- the photosensitive composition contains a phosphine oxide compound (B1) and an oxime ester compound (B2) in combination as a photopolymerization initiator (B).
- the ratio of the mass W2 of the oxime ester compound (B2) to the total mass W1 of the phosphine oxide compound (B1) and the mass W2 of the oxime ester compound (B2) is 35% by mass or more.
- the photosensitive composition may contain a phosphine oxide compound (B1) and another photopolymerization initiator (B3) other than the oxime ester compound (B2) as long as the object of the present invention is not impaired.
- the total ratio of the mass of the phosphine oxide compound (B1) to the mass of the oxime ester compound (B2) to the mass of the photopolymerization initiator (B) is 80% by mass or more from the viewpoint that the desired effect can be easily obtained. Is more preferable, 90% by mass or more is more preferable, 95% by mass or more is further preferable, and 100% by mass is particularly preferable.
- Examples of the phosphine oxide compound include a compound having a partial structure represented by the following formula (b-I).
- R b01 and R b02 are independently an alkyl group, a cycloalkyl group, an aryl group, an aliphatic acyl group having 2 or more and 20 or less carbon atoms, or 7 or more and 20 or less carbon atoms. It is an aromatic acyl group of. However, neither R b01 nor R b02 is an aliphatic acyl group or an aromatic acyl group.
- the number of carbon atoms of the alkyl group as R b01 and R b02 is preferably 1 or more and 12 or less, more preferably 1 or more and 8 or less, and further preferably 1 or more and 4 or less.
- the alkyl groups as R b01 and R b02 may be linear or branched. Specific examples of the alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group, isopentyl group and tert-.
- Pentyl group n-hexyl group, n-heptyl group, n-octyl group, 2,4,4-trimethylpentyl group, 2-ethylhexyl group, n-nonyl group, n-decyl group, n-undecyl group, and Examples include the n-dodecyl group.
- the number of carbon atoms of the cycloalkyl group as R b01 and R b02 is preferably 5 or more and 12 or less.
- Specific examples of the cycloalkyl group include a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cyclononyl group, a cyclodecyl group, a cycloundecyl group, and a cyclododecyl group.
- the number of carbon atoms of the aryl group as R b01 and R b02 is preferably 6 or more and 12 or less.
- the aryl group may have a substituent.
- the substituent include a halogen atom, an alkyl group having 1 or more and 4 or less carbon atoms, an alkoxy group having 1 or more and 4 or less carbon atoms, and the like.
- Specific examples of the aryl group include a phenyl group and a naphthyl group.
- the number of carbon atoms of the aliphatic acyl group as R b01 and R b02 is 2 or more and 20 or less, preferably 2 or more and 12 or less, more preferably 2 or more and 8 or less, and further preferably 2 or more and 6 or less.
- the aliphatic acyl group may be linear or branched.
- aliphatic acyl group examples include an acetyl group, a propionyl group, a butanoyl group, a pentanoyl group, a hexanoyl group, a heptanoil group, an octanoyl group, a nonanoyl group, a decanoyle group, an undecanoyl group, a dodecanoyl group, a tridecanoyl group and a tetradecanoyl group.
- Pentadecanoyl group Pentadecanoyl group, hexadecanoyl group, heptadecanoyl group, octadecanoyl group, nonadecanoyyl group, and icosanoyl group.
- the number of carbon atoms of the aromatic acyl group as R b01 and R b02 is 7 or more and 20 or less.
- the aromatic acyl group may have a substituent.
- the substituent include a halogen atom, an alkyl group having 1 or more and 4 or less carbon atoms, an alkoxy group having 1 or more and 4 or less carbon atoms, and the like.
- Specific examples of the aromatic acyl group include a benzoyl group, an o-tolyl group, an m-tolyl group, a p-tolyl group, a 2,6-dimethylbenzoyl group, a 2,6-dimethoxybenzoyl group, and 2,4,6-. Examples include a trimethylbenzoyl group, an ⁇ -naphthoyl group, and a ⁇ -naphthoyl group.
- Preferred specific examples of the phosphine oxide compound (B1) containing the structural portion represented by the formula (b-I) include 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide and bis (2,4,6).
- 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide and bis (2,4,6).
- -Trimethylbenzoyl) -phenylphosphine oxide ethyl (2,4,6-trimethylbenzoyl) phenylphosphinate
- the photopolymerization initiator (B) When only the oxime ester compound (B2) is used as the photopolymerization initiator (B), it may be difficult to form a cured product having sufficiently high transparency. On the other hand, when the oxime ester compound (B2) is used in combination with the phosphine oxide compound (B1) as the photopolymerization initiator (B), it is easy to form a cured product having excellent transparency.
- the oxime ester compound (B2) does not contain a compound having a peak in the wavelength range of 320 nm or more and less than 400 nm in the absorption spectrum and exhibiting a gram extinction coefficient of 10 or more in any wavelength of the wavelength range of 400 nm or more. It is preferably a compound. In this case, it is easy to form a cured product having particularly excellent transparency.
- the oxime ester compound (B2) for example, the oxime ester compound represented by the following formula (b1) is preferable.
- R b11 may have an alkyl group having 1 to 10 carbon atoms which may have a substituent, a phenyl group which may have a substituent, or a substituent. Shows a carbazolyl group.
- a is 0 or 1.
- R b12 represents an alkyl group having 1 to 10 carbon atoms which may have a substituent, a phenyl group which may have a substituent, or a carbazolyl group which may have a substituent.
- R b13 represents a hydrogen atom, an alkyl group having 1 or more and 6 or less carbon atoms, or a phenyl group which may have a substituent.
- R b11 is an alkyl group having 1 or more and 10 or less carbon atoms which may have a substituent
- the type of the substituent contained in the alkyl group is not particularly limited as long as the object of the present invention is not impaired.
- an alkyl group having 1 to 10 carbon atoms may have include an alkoxy group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, and a carbon atom.
- Cycloalkoxy groups with 3 to 10 carbon atoms saturated aliphatic acyl groups with 2 to 20 carbon atoms, alkoxycarbonyl groups with 2 to 20 carbon atoms, saturated aliphatic acyloxy groups with 2 to 20 carbon atoms, It has a phenyl group which may have a substituent, a phenoxy group which may have a substituent, a phenylthio group which may have a substituent, a benzoyl group which may have a substituent, and a substituent.
- a phenoxycarbonyl group May have a phenoxycarbonyl group, a benzoyloxy group which may have a substituent, a phenylalkyl group which may have a substituent and has 7 to 20 carbon atoms, a naphthyl group which may have a substituent, and a substituent.
- a naphthoxy group which may have a group, a naphthoyl group which may have a substituent, a naphthoxycarbonyl group which may have a substituent, a naphthoyloxy group which may have a substituent, and a substituent.
- Substituted amino groups, morpholin-1-yl groups, piperazin-1-yl groups, halogens, nitro groups, cyano groups and the like can be mentioned.
- the alkyl group having 1 or more and 10 or less carbon atoms may be a straight chain or a branched chain.
- the number of carbon atoms of the alkyl group is preferably 1 or more and 8 or less, and more preferably 1 or more and 5 or less.
- R b11 is a phenyl group which may have a substituent
- the type of the substituent is not particularly limited as long as it does not impair the object of the present invention.
- the substituent that the phenyl group may have are an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic acyl group, an alkoxycarbonyl group, a saturated aliphatic acyloxy group, and a substituent.
- a phenyl group which may have a substituent a phenoxy group which may have a substituent, a benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, and a substituent.
- R b11 is a phenyl group which may have a substituent and the phenyl group has a plurality of substituents, the plurality of substituents may be the same or different.
- the number of carbon atoms thereof is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, further preferably 1 or more and 6 or less, and particularly preferably 1 or more and 3 or less. 1 is the most preferable.
- the alkyl group may be a straight chain or a branched chain. Specific examples of the case where the substituent of the phenyl group is an alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group and a tert-butyl group.
- n-pentyl group isopentyl group, sec-pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl group , Isononyl group, n-decyl group, isodecyl group and the like.
- the alkyl group may contain an ether bond (—O—) in the carbon chain.
- substituent having the phenyl group include an alkoxyalkyl group and an alkoxyalkoxyalkyl group.
- R b14 is an alkylene group which may be a straight chain or a branched chain having 1 or more and 10 or less carbon atoms.
- R b15 is an alkyl group which may be a straight chain or a branched chain having 1 or more and 10 or less carbon atoms.
- the number of carbon atoms of R b14 is preferably 1 or more and 8 or less, more preferably 1 or more and 5 or less, and particularly preferably 1 or more and 3 or less.
- the number of carbon atoms of R b15 is preferably 1 or more and 8 or less, more preferably 1 or more and 5 or less, particularly preferably 1 or more and 3 or less, and most preferably 1.
- the alkyl group having an ether bond in the carbon chain include a methoxyethyl group, an ethoxyethyl group, a methoxyethoxyethyl group, an ethoxyethoxyethyl group, a propyloxyethoxyethyl group, a methoxypropyl group and the like.
- the number of carbon atoms thereof is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less.
- the alkoxy group may be a straight chain or a branched chain. Specific examples of the case where the substituent of the phenyl group is an alkoxy group include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, a sec-butyloxy group and a tert-.
- the alkoxy group may contain an ether bond (—O—) in the carbon chain.
- alkoxy groups having an ether bond in the carbon chain include methoxyethoxy group, ethoxyethoxy group, 2-methoxy-1-methylethoxy group, methoxyethoxyethoxy group, ethoxyethoxyethoxy group, propyloxyethoxyethoxy group, and Examples thereof include a methoxypropyloxy group.
- the number of carbon atoms thereof is preferably 3 or more and 10 or less, and more preferably 3 or more and 6 or less.
- Specific examples of the case where the substituent of the phenyl group is a cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group and the like.
- substituent of the phenyl group is a cycloalkoxy group
- substituent of the phenyl group is a cycloalkoxy group
- a cyclopropyloxy group a cyclobutyloxy group
- a cyclopentyloxy group a cyclohexyloxy group
- a cycloheptyloxy group a cyclooctyloxy group and the like.
- the number of carbon atoms thereof is preferably 2 or more and 20 or less, and more preferably 2 or more and 7 or less.
- Specific examples of the case where the substituent of the phenyl group is a saturated aliphatic acyl group include an acetyl group, a propanoyl group, an n-butanoyl group, a 2-methylpropanol group, an n-pentanoyl group and a 2,2-dimethylpropa.
- substituent of the phenyl group is a saturated aliphatic acyloxy group
- substituent of the phenyl group include an acetyloxy group, a propanoyloxy group, an n-butanoyloxy group, a 2-methylpropanoyloxy group and an n-pentanoyloxy group.
- the number of carbon atoms thereof is preferably 2 or more and 20 or less, and more preferably 2 or more and 7 or less.
- Specific examples of the case where the substituent of the phenyl group is an alkoxycarbonyl group include a methoxycarbonyl group, an ethoxycarbonyl group, an n-propyloxycarbonyl group, an isopropyloxycarbonyl group, an n-butyloxycarbonyl group and an isobutyloxycarbonyl group.
- the number of carbon atoms thereof is preferably 7 or more and 20 or less, and more preferably 7 or more and 10 or less.
- the number of carbon atoms thereof is preferably 11 or more and 20 or less, and more preferably 11 or more and 14 or less.
- Specific examples of the case where the substituent of the phenyl group is a phenylalkyl group include a benzyl group, a 2-phenylethyl group, a 3-phenylpropyl group, and a 4-phenylbutyl group.
- the substituent of the phenyl group is a naphthylalkyl group
- substituents contained in the phenyl group is a phenylalkyl group or a naphthylalkyl group
- the substituent may further have a substituent on the phenyl group or the naphthyl group.
- the heterocyclyl group is a 5- or 6-membered monocycle containing one or more N, S, O, such monocyclic rings, or such monocyclic rings and benzene. It is a heterocyclyl group fused with a ring.
- the heterocyclyl group is a condensed ring, the number of monocycles constituting the condensed ring is up to 3.
- heterocycle constituting such a heterocyclyl group examples include furan, thiophene, pyrrole, oxazole, isooxazole, thiazole, thiadiazol, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, indol, Examples thereof include isoindole, indridin, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, and quinoxalin.
- the substituent of the phenyl group is a heterocyclyl group
- the heterocyclyl group may further have a substituent.
- the substituent of the phenyl group is an amino group substituted with 1 or 2 organic groups
- suitable examples of the organic group are an alkyl group having 1 to 20 carbon atoms and 3 to 10 carbon atoms.
- Specific examples of these suitable organic groups include the same groups as those described above for the substituents of the phenyl group.
- amino group substituted with the organic group 1 or 2 include methylamino group, ethylamino group, diethylamino group, n-propylamino group, di-n-propylamino group, isopropylamino group, n-.
- the substituent includes an alkyl group having 1 or more and 6 or less carbon atoms and 1 or more and 6 or less carbon atoms.
- Monoalkylamino group having the following alkyl group, dialkylamino group having an alkyl group having 1 or more and 6 or less carbon atoms, morpholin-1-yl group, piperazine-1-yl group, halogen, nitro group, cyano group, etc.
- the phenyl group, the naphthyl group, and the heterocyclyl group contained in the substituents of the phenyl group further have a substituent
- the number of the substituents is not limited as long as it does not impair the object of the present invention, but is 1 or more and 4 The following is preferable.
- the phenyl group, the naphthyl group, and the heterocyclyl group contained in the substituents of the phenyl group have a plurality of substituents, the plurality of substituents may be the same or different.
- R b11 is a phenyl group which may have a substituent have been described above, but among these substituents, an alkyl group or an alkoxyalkyl group is preferable.
- R b11 is a phenyl group which may have a substituent
- the number of substituents and the bonding position of the substituent are not particularly limited as long as the object of the present invention is not impaired.
- the phenyl group which may have a substituent may have a substituent from the viewpoint of excellent base generation efficiency. It is preferably a tolyl group.
- R b11 is a carbazolyl group which may have a substituent
- the type of the substituent is not particularly limited as long as it does not impair the object of the present invention.
- suitable substituents that the carbazolyl group may have on the carbon atom include an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, and 3 to 10 carbon atoms.
- Heterocyclyl group which may have a substituent
- a heterocyclylcarbonyl group which may have a substituent
- an amino group an amino group substituted with one or two organic groups
- a morpholin-1-yl group and piperazin-1-yl.
- Examples include groups, halogens, nitro groups, cyano groups and the like.
- R b11 is a carbazolyl group which may have a substituent
- examples of a suitable substituent where the carbazolyl group may have on a nitrogen atom include an alkyl group having 1 to 20 carbon atoms and carbon. Cycloalkyl group with 3 or more and 10 or less atoms, saturated aliphatic acyl group with 2 or more and 20 or less carbon atoms, alkoxycarbonyl group with 2 or more and 20 or less carbon atoms, phenyl group which may have a substituent, substituent A benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, a phenylalkyl group which may have a substituent and has 7 to 20 carbon atoms, and a naphthyl which may have a substituent.
- a naphthoyl group which may have a substituent
- a naphthoxycarbonyl group which may have a substituent
- a naphthylalkyl group which may have a substituent and has 11 or more and 20 or less carbon atoms
- substituents include a heterocyclyl group which may have a substituent and a heterocyclylcarbonyl group which may have a substituent.
- an alkyl group having 1 to 20 carbon atoms is preferable, an alkyl group having 1 to 6 carbon atoms is more preferable, and an ethyl group is particularly preferable.
- R b11 is substituted for a phenylalkyl group optionally, a naphthylalkyl group optionally having a substituent, a heterocyclyl group optionally having a substituent, and an amino group substituted with one or two organic groups. This is the same as the example of the substituent having a phenyl group when it is a phenyl group which may have a group.
- R b11 as an example of the substituent when the phenyl group, the naphthyl group, and the heterocyclyl group contained in the substituent of the carbazolyl group further have a substituent, an alkyl group having 1 to 6 carbon atoms; a carbon atom An alkoxy group having a number of 1 to 6; a saturated aliphatic acyl group having 2 to 7 carbon atoms; an alkoxycarbonyl group having 2 to 7 carbon atoms; a saturated aliphatic acyloxy group having 2 to 7 carbon atoms; Group; naphthyl group; benzoyl group; naphthoyl group; substituted with a group selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazine-1-yl group, and a phenyl group.
- Benzoyl group monoalkylamino group having an alkyl group with 1 to 6 carbon atoms; dialkylamino group having an alkyl group with 1 to 6 carbon atoms; morpholin-1-yl group; piperazin-1-yl group Halogen; nitro group; cyano group.
- the phenyl group, naphthyl group, and heterocyclyl group contained in the substituents of the carbazolyl group further have substituents
- the number of the substituents is not limited as long as the object of the present invention is not impaired, but is 1 or more and 4 or less. Is preferable.
- the phenyl group, the naphthyl group, and the heterocyclyl group have a plurality of substituents, the plurality of substituents may be the same or different.
- R b12 is an alkyl group having 1 to 10 carbon atoms which may have a substituent, a phenyl group which may have a substituent, or a carbazolyl group which may have a substituent.
- R b12 is an alkyl group having 1 or more and 10 or less carbon atoms which may have a substituent
- the alkyl group may be a straight chain or a branched chain.
- the number of carbon atoms of the alkyl group is preferably 1 or more and 8 or less, and more preferably 1 or more and 5 or less.
- the substituent contained in the alkyl group or the phenyl group is not particularly limited as long as the object of the present invention is not impaired.
- suitable substituents that the alkyl group may have on the carbon atom include an alkoxy group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, and 3 to 10 carbon atoms. It has the following cycloalkoxy groups, saturated aliphatic acyl groups with 2 to 20 carbon atoms, alkoxycarbonyl groups with 2 to 20 carbon atoms, saturated aliphatic acyloxy groups with 2 to 20 carbon atoms, and substituents.
- It may have a naphthoxy group, a naphthoyl group which may have a substituent, a naphthoxycarbonyl group which may have a substituent, a naphthoyloxy group which may have a substituent, or a substituent.
- Examples thereof include a group, a morpholin-1-yl group, a piperazine-1-yl group, a halogen, a nitro group, a cyano group and the like.
- suitable substituents that the phenyl group may have on the carbon atom include the number of carbon atoms in addition to the groups exemplified above as suitable substituents that the alkyl group may have on the carbon atom. Examples thereof include alkyl groups of 1 or more and 20 or less.
- substituents which the alkyl group or the phenyl group may have are an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic acyl group, an alkoxycarbonyl group, a saturated aliphatic acyloxy group and a substituent.
- substituents which may have naphthylalkyl groups which may have substituents, heterocyclyl groups which may have substituents, and amino groups substituted with 1 or 2 organic groups
- R This is the same as the example of the substituent having a phenyl group when b11 is a phenyl group which may have a substituent.
- R b12 as an example of the substituent when the phenyl group, the naphthyl group, and the heterocyclyl group contained in the substituent of the alkyl group or the phenyl group further have a substituent, an alkyl group having 1 or more and 6 or less carbon atoms is used.
- the number of the substituent is not limited as long as the object of the present invention is not impaired. More than 4 or less is preferable.
- the phenyl group, the naphthyl group, and the heterocyclyl group have a plurality of substituents, the plurality of substituents may be the same or different.
- R b12 is a carbazolyl group which may have a substituent
- the type of the substituent contained in the carbazolyl group is not particularly limited as long as it does not impair the object of the present invention.
- the substituent which the carbazolyl group may have are the same as the example of the substituent when R b11 is a carbazolyl group which may have a substituent.
- R b12 is represented by the following formula (b2):
- R b16 and R b17 are monovalent organic groups, respectively, and b is 0 or 1.
- R b18 is a group selected from the group consisting of a monovalent organic group, an amino group, a halogen, a nitro group, and a cyano group, A is S or O, and c is 0 or more. It is an integer of 4 or less.
- R b16 in the formula (b2) can be selected from various organic groups as long as the object of the present invention is not impaired.
- R b16 are a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a saturated aliphatic acyl group having 2 to 20 carbon atoms, and carbon. It has an alkoxycarbonyl group having 2 to 20 atoms, a phenyl group which may have a substituent, a benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, and a substituent.
- a phenylalkyl group having 7 to 20 carbon atoms a naphthyl group which may have a substituent, a naphthoyl group which may have a substituent, a naphthoxycarbonyl group which may have a substituent, and the like.
- Examples thereof include a naphthylalkyl group having 11 or more and 20 or less carbon atoms which may have a substituent, a heterocyclyl group which may have a substituent, and a heterocyclylcarbonyl group which may have a substituent.
- an alkyl group having 1 to 20 carbon atoms is preferable, an alkyl group having 1 to 6 carbon atoms is more preferable, and an ethyl group is particularly preferable.
- R b17 in the formula (b2) is not particularly limited as long as it does not impair the object of the present invention, and can be selected from various organic groups.
- a suitable group as R b17 include a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a substituent.
- Examples include heterocyclyl groups which may have a group.
- R b17 a phenyl group which may have a substituent and a naphthyl group which may have a substituent are more preferable, and a 2-methylphenyl group and a naphthyl group are particularly preferable.
- the substituent includes an alkyl group having 1 to 6 carbon atoms and 1 to 6 carbon atoms.
- a monoalkylamino group having an alkyl group, a dialkylamino group having an alkyl group having 1 or more and 6 or less carbon atoms, a morpholin-1-yl group, a piperazin-1-yl group, a halogen, a nitro group, a cyano group, etc. Can be mentioned.
- the number of the substituent is not limited as long as it does not impair the object of the present invention, but is 1 or more and 4 or less. Is preferable.
- the phenyl group, the naphthyl group, and the heterocyclyl group contained in R b16 or R b17 have a plurality of substituents, the plurality of substituents may be the same or different.
- R b18 in the formula (b3) is an organic group
- R b18 can be selected from various organic groups as long as the object of the present invention is not impaired.
- a preferred example of the case where R b18 is an organic group in the formula (b3) is an alkyl group having 1 or more and 6 or less carbon atoms; an alkoxy group having 1 or more and 6 or less carbon atoms; and 2 or more and 7 or less carbon atoms.
- Saturated aliphatic acyl group alkoxycarbonyl group having 2 to 7 carbon atoms; saturated aliphatic acyloxy group having 2 to 7 carbon atoms; phenyl group; naphthyl group; benzoyl group; naphthoyl group; 1 to 6 carbon atoms
- Alkoxyamino group Dialkylamino group having an alkyl group having 1 or more and 6 or less carbon atoms; Morphorin-1-yl group; Piperazine-1-yl group; Halogen; Nitro group; Cyano group; 2-Methylphenylcarbonyl group; 4 -(Piperazine-1-yl) phenylcarbonyl group; 4- (phenyl) phenylcarbonyl group.
- R b18 substituted with a group selected from the group consisting of a benzoyl group; a naphthoyl group; an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazine-1-yl group, and a phenyl group.
- Benzoyl groups; nitro groups are preferred, and benzoyl groups; naphthoyl groups; 2-methylphenylcarbonyl groups; 4- (piperazin-1-yl) phenylcarbonyl groups; 4- (phenyl) phenylcarbonyl groups are more preferred.
- c is preferably an integer of 0 or more and 3 or less, more preferably an integer of 0 or more and 2 or less, and particularly preferably 0 or 1.
- c is 1, the binding position of R b18, relative bond which the phenyl group R b18 are bonded is bonded to the sulfur atom is preferably in the para position.
- R b13 is a hydrogen atom, an alkyl group having 1 or more and 6 or less carbon atoms, or a phenyl group which may have a substituent. When it is a phenyl group which may have a substituent, the substituent which the phenyl group may have is the same as when R b11 is a phenyl group which may have a substituent. As R b13 , a methyl group, an ethyl group, or a phenyl group is preferable, and a methyl group or a phenyl group is more preferable.
- a suitable compound includes a compound represented by the following formula (b4).
- R b19 is a group selected from the group consisting of a monovalent organic group, an amino group, a halogen, a nitro group, and a cyano group, and d is an integer of 0 or more and 4 or less.
- R b19 is not particularly limited as long as it does not impair the object of the present invention, and when it is an organic group, it is appropriately selected from various organic groups.
- R b19 include an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic acyl group, an alkoxycarbonyl group, a saturated aliphatic acyloxy group, and a phenyl group which may have a substituent.
- a phenoxy group which may have a substituent a benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, a benzoyloxy group which may have a substituent, and a substituent.
- Examples thereof include a substituted amino group, a morpholin-1-yl group, a piperazine-1-yl group, a halogen, a nitro group, a cyano group and the like.
- R b19 may be the same or different. Further, the number of carbon atoms of the substituent does not include the number of carbon atoms of the substituent further possessed by the substituent.
- R b19 is an alkyl group
- the number of carbon atoms is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less.
- R b19 is an alkyl group, it may be a straight chain or a branched chain.
- Specific examples of the case where R b19 is an alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group and an n-pentyl group.
- R b19 is an alkyl group
- the alkyl group may contain an ether bond (—O—) in the carbon chain.
- alkyl group having an ether bond in the carbon chain examples include a methoxyethyl group, an ethoxyethyl group, a methoxyethoxyethyl group, an ethoxyethoxyethyl group, a propyloxyethoxyethyl group, a methoxypropyl group and the like.
- R b19 is an alkoxy group
- the number of carbon atoms is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less.
- R b19 is an alkoxy group, it may be a straight chain or a branched chain.
- Specific examples of the case where R b19 is an alkoxy group include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, a sec-butyloxy group, a tert-butyloxy group, and n.
- -Pentyloxy group isopentyloxy group, sec-pentyloxy group, tert-pentyloxy group, n-hexyloxy group, n-heptyloxy group, n-octyloxy group, isooctyloxy group, sec-octyloxy group , Tert-octyloxy group, n-nonyloxy group, isononyloxy group, n-decyloxy group, isodecyloxy group and the like.
- R b19 is an alkoxy group
- the alkoxy group may contain an ether bond (—O—) in the carbon chain.
- alkoxy group having an ether bond in the carbon chain examples include methoxyethoxy group, ethoxyethoxy group, methoxyethoxyethoxy group, ethoxyethoxyethoxy group, propyloxyethoxyethoxy group, methoxypropyloxy group and the like.
- R b19 is a cycloalkyl group or a cycloalkoxy group
- the number of carbon atoms is preferably 3 or more and 10 or less, and more preferably 3 or more and 6 or less.
- Specific examples of the case where R b19 is a cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group and the like.
- R b19 is a cycloalkoxy group
- R b19 is a cycloalkoxy group
- R b19 is a cycloalkoxy group
- R b19 is a saturated aliphatic acyl group or a saturated aliphatic acyloxy group
- the number of carbon atoms is preferably 2 or more and 20 or less, and more preferably 2 or more and 7 or less.
- Specific examples of the case where R b19 is a saturated aliphatic acyl group include an acetyl group, a propanoyl group, an n-butanoyl group, a 2-methylpropanoyl group, an n-pentanoyl group, a 2,2-dimethylpropanoyl group and n.
- n-Hexanoyl group n-heptanoyl group, n-octanoyl group, n-nonanoyl group, n-decanoyl group, n-undecanoyl group, n-dodecanoyl group, n-tridecanoyl group, n-tetradecanoyl group, n-pentadeca
- Examples thereof include a noyl group and an n-hexadecanoyl group.
- R b19 is a saturated aliphatic acyloxy group
- R b19 is a saturated aliphatic acyloxy group
- R b19 is a saturated aliphatic acyloxy group
- R b19 is a saturated aliphatic acyloxy group
- R b19 is a saturated aliphatic acyloxy group
- R b19 is an alkoxycarbonyl group
- the number of carbon atoms is preferably 2 or more and 20 or less, and more preferably 2 or more and 7 or less.
- Specific examples of the case where R b19 is an alkoxycarbonyl group include a methoxycarbonyl group, an ethoxycarbonyl group, an n-propyloxycarbonyl group, an isopropyloxycarbonyl group, an n-butyloxycarbonyl group, an isobutyloxycarbonyl group, and sec-butyl.
- R b19 is a phenylalkyl group
- the number of carbon atoms is preferably 7 or more and 20 or less, and more preferably 7 or more and 10 or less.
- R b19 is a naphthylalkyl group
- the number of carbon atoms is preferably 11 or more and 20 or less, and more preferably 11 or more and 14 or less.
- Specific examples of the case where R b19 is a phenylalkyl group include a benzyl group, a 2-phenylethyl group, a 3-phenylpropyl group, and a 4-phenylbutyl group.
- R b19 is a naphthylalkyl group
- R b19 is a naphthylalkyl group
- R b19 may further have a substituent on the phenyl group or the naphthyl group.
- R b19 is a heterocyclyl group
- the heterocyclyl group is a 5- or 6-membered monocycle containing one or more N, S, O, or the monocycles are fused together, or the monocycle and the benzene ring are condensed.
- Heterocyclyl group When the heterocyclyl group is a condensed ring, the number of monocycles constituting the condensed ring is up to 3.
- heterocycle constituting such a heterocyclyl group examples include furan, thiophene, pyrrole, oxazole, isooxazole, thiazole, thiadiazol, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, indol, Examples thereof include isoindole, indridin, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, and quinoxalin.
- R b19 is a heterocyclyl group
- the heterocyclyl group may further have a substituent.
- R b19 is an amino group substituted with 1 or 2 organic groups
- suitable examples of the organic group are an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, and the like.
- phenylalkyl groups which may have substituents
- naphthoyl groups which may have substituents
- naphthylalkyl groups which may have substituents and have 11 to 20 carbon atoms
- heterocyclyl The group etc. can be mentioned.
- Specific examples of these suitable organic groups are the same as for R b19 .
- Specific examples of the amino group substituted with 1 or 2 organic groups include methylamino group, ethylamino group, diethylamino group, n-propylamino group, di-n-propylamino group, isopropylamino group and n-butyl.
- the substituents include an alkyl group having 1 to 6 carbon atoms and an alkoxy group having 1 to 6 carbon atoms.
- Examples thereof include a monoalkylamino group having, a dialkylamino group having an alkyl group having 1 or more and 6 or less carbon atoms, a morpholin-1-yl group, a piperazine-1-yl group, a halogen, a nitro group, a cyano group and the like.
- the number of the substituent is not limited as long as the object of the present invention is not impaired, but is preferably 1 or more and 4 or less.
- the phenyl group, the naphthyl group, and the heterocyclyl group contained in R b19 have a plurality of substituents, the plurality of substituents may be the same or different.
- an alkyl group having 1 or more and 6 or less carbon atoms and 1 carbon atom number have been used because they are chemically stable, have few steric obstacles, and facilitate the synthesis of an oxime ester compound.
- a group selected from the group consisting of an alkoxy group having 6 or more carbon atoms and a saturated aliphatic acyl group having 2 to 7 carbon atoms is preferable, an alkyl having 1 to 6 carbon atoms is more preferable, and a methyl group is particularly preferable. ..
- Position R b19 is attached to the phenyl group, the phenyl group R b19 are attached the position of the bond to the main chain of the phenyl group and the oxime ester compound as a 1-position, if the 2-position of the position of the methyl group
- the 4th or 5th position is preferable, and the 5th position is more preferable.
- d is preferably an integer of 0 or more and 3 or less, more preferably an integer of 0 or more and 2 or less, and particularly preferably 0 or 1.
- R b13 in the above formula (b4) is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group which may have a substituent.
- a specific example of R b13 is as described above for the equation (b1).
- R b13 in the formula (b4) a methyl group, an ethyl group, and a phenyl group are preferable, and a methyl group and a phenyl group are more preferable.
- the following compounds are preferable examples of the compounds contained in the formula (b1) but not contained in the formula (b4).
- oxime ester compounds represented by the formula (b4) which are particularly suitable as the oxime ester compound, the compound of the following formula can be mentioned.
- the oxime ester compound represented by the following formula (1) is particularly preferable as the oxime ester compound (B2).
- R b1 is a hydrogen atom, a nitro group or a monovalent organic group
- R b2 and R b3 each have a chain alkyl group and a substituent which may have a substituent. It may be a cyclic organic group or a hydrogen atom, and R b2 and R b3 may be bonded to each other to form a ring
- R b4 is a monovalent organic group
- R b5 is hydrogen.
- n1 is an integer of 0 or more and 4 or less
- n2 is 0 or 1)
- R b1 is a hydrogen atom, a nitro group or a monovalent organic group.
- R b1 is attached to a 6-membered aromatic ring on the fluorene ring in the formula (1), which is different from the 6-membered aromatic ring attached to the group represented by ⁇ (CO) n2-.
- the bonding position of R b1 with respect to the fluorene ring is not particularly limited.
- the compound represented by the formula (1) has 1 or more R b1
- one of the 1 or more R b1 is a fluorene ring because the compound represented by the formula (1) can be easily synthesized. It is preferable to bind to the 2-position of the inside. If R b1 is more, the plurality of R b1 may be the same or different.
- R b1 is not particularly limited as long as it does not interfere with the object of the present invention, and is appropriately selected from various organic groups.
- R b1 is an organic group include an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic acyl group, a saturated aliphatic acyloxy group, an alkoxycarbonyl group and a substituent.
- It has a naphthoxycarbonyl group which may have a substituent, a naphthyloxy group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclyl group which may have a substituent, and a substituent.
- a naphthoxycarbonyl group which may have a substituent
- a naphthyloxy group which may have a substituent
- a naphthylalkyl group which may have a substituent
- a heterocyclyl group which may have a substituent
- a substituent include a heterocyclylcarbonyl group, an amino group substituted with one or two organic groups, a morpholin-1-yl group, a piperazine-1-yl group and the like.
- R b1 is an alkyl group
- the number of carbon atoms of the alkyl group is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less.
- R b1 is an alkyl group, it may be a straight chain or a branched chain.
- Specific examples of the case where R b1 is an alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group and an n-pentyl group.
- R b1 is an alkyl group
- the alkyl group may contain an ether bond (—O—) in the carbon chain.
- alkyl group having an ether bond in the carbon chain examples include a methoxyethyl group, an ethoxyethyl group, a methoxyethoxyethyl group, an ethoxyethoxyethyl group, a propyloxyethoxyethyl group, a methoxypropyl group and the like.
- R b1 is an alkoxy group
- the number of carbon atoms of the alkoxy group is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less.
- R b1 is an alkoxy group, it may be a straight chain or a branched chain.
- Specific examples of the case where R b1 is an alkoxy group include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, a sec-butyloxy group, a tert-butyloxy group, and n.
- -Pentyloxy group isopentyloxy group, sec-pentyloxy group, tert-pentyloxy group, n-hexyloxy group, n-heptyloxy group, n-octyloxy group, isooctyloxy group, sec-octyloxy group , Tert-octyloxy group, n-nonyloxy group, isononyloxy group, n-decyloxy group, isodecyloxy group and the like.
- R b1 is an alkoxy group
- the alkoxy group may contain an ether bond (—O—) in the carbon chain.
- alkoxy group having an ether bond in the carbon chain examples include methoxyethoxy group, ethoxyethoxy group, methoxyethoxyethoxy group, ethoxyethoxyethoxy group, propyloxyethoxyethoxy group, methoxypropyloxy group and the like.
- R b1 is a cycloalkyl group or a cycloalkoxy group
- the number of carbon atoms of the cycloalkyl group or cycloalkoxy group is preferably 3 or more and 10 or less, and more preferably 3 or more and 6 or less.
- Specific examples of the case where R b1 is a cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group and the like.
- R b1 is a cycloalkoxy group
- R b1 is a cycloalkoxy group
- R b1 is a cycloalkoxy group
- R b1 is a saturated aliphatic acyl group or a saturated aliphatic acyloxy group
- the number of carbon atoms of the saturated aliphatic acyl group or the saturated aliphatic acyloxy group is preferably 2 or more and 21 or less, and more preferably 2 or more and 7 or less.
- Specific examples of the case where R b1 is a saturated aliphatic acyl group include an acetyl group, a propanoyl group, an n-butanoyl group, a 2-methylpropanoyl group, an n-pentanoyl group, a 2,2-dimethylpropanoyl group and n.
- n-Hexanoyl group n-heptanoyl group, n-octanoyl group, n-nonanoyl group, n-decanoyl group, n-undecanoyl group, n-dodecanoyl group, n-tridecanoyl group, n-tetradecanoyl group, n-pentadeca
- Examples thereof include a noyl group and an n-hexadecanoyl group.
- R b1 is a saturated aliphatic acyloxy group
- R b1 is a saturated aliphatic acyloxy group
- R b1 is a saturated aliphatic acyloxy group
- R b1 is a saturated aliphatic acyloxy group
- R b1 is a saturated aliphatic acyloxy group
- R b1 is an alkoxycarbonyl group
- the number of carbon atoms of the alkoxycarbonyl group is preferably 2 or more and 20 or less, and more preferably 2 or more and 7 or less.
- Specific examples of the case where R b1 is an alkoxycarbonyl group include a methoxycarbonyl group, an ethoxycarbonyl group, an n-propyloxycarbonyl group, an isopropyloxycarbonyl group, an n-butyloxycarbonyl group, an isobutyloxycarbonyl group, and sec-butyl.
- R b1 is a phenylalkyl group
- the number of carbon atoms of the phenylalkyl group is preferably 7 or more and 20 or less, and more preferably 7 or more and 10 or less.
- R b1 is a naphthylalkyl group
- the number of carbon atoms of the naphthylalkyl group is preferably 11 or more and 20 or less, and more preferably 11 or more and 14 or less.
- Specific examples of the case where R b1 is a phenylalkyl group include a benzyl group, a 2-phenylethyl group, a 3-phenylpropyl group, and a 4-phenylbutyl group.
- R b1 is a naphthylalkyl group
- R b1 is a naphthylalkyl group
- R b1 may further have a substituent on the phenyl group or the naphthyl group.
- R b1 is a heterocyclyl group
- the heterocyclyl group is a 5- or 6-membered monocycle containing one or more N, S, O, or the monocycles are fused together, or the monocycle and the benzene ring are condensed.
- Heterocyclyl group When the heterocyclyl group is a condensed ring, the number of rings of the monocycle constituting the condensed ring is 3 or less.
- the heterocyclyl group may be an aromatic group (heteroaryl group) or a non-aromatic group.
- heterocycle constituting the heterocyclyl group examples include furan, thiophene, pyrrol, oxazole, isooxazole, thiazole, thiadiazol, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, and indol.
- R b1 is a heterocyclyl group
- the heterocyclyl group may further have a substituent.
- R b1 is a heterocyclylcarbonyl group
- the heterocyclyl group contained in the heterocyclylcarbonyl group is the same as when R b1 is a heterocyclyl group.
- R b1 is an amino group substituted with 1 or 2 organic groups
- suitable examples of the organic group are an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, and the like.
- phenylalkyl groups which may have substituents
- naphthoyl groups which may have substituents
- naphthylalkyl groups which may have substituents and have 11 to 20 carbon atoms, and heterocyclyl.
- the group etc. can be mentioned.
- Specific examples of these suitable organic groups are the same as for R b1 .
- Specific examples of the amino group substituted with the organic group 1 or 2 include methylamino group, ethylamino group, diethylamino group, n-propylamino group, di-n-propylamino group, isopropylamino group, n-.
- the substituents include an alkyl group having 1 to 6 carbon atoms and an alkoxy group having 1 to 6 carbon atoms.
- Examples thereof include a monoalkylamino group having, a dialkylamino group having an alkyl group having 1 or more and 6 or less carbon atoms, a morpholin-1-yl group, a piperazine-1-yl group, a halogen, a nitro group, a cyano group and the like.
- the number of the substituent is not limited as long as the object of the present invention is not impaired, but is preferably 1 or more and 4 or less.
- the phenyl group, the naphthyl group, and the heterocyclyl group contained in R b1 have a plurality of substituents, the plurality of substituents may be the same or different.
- R b1 a nitro group or a group represented by R b10- CO- tends to improve the sensitivity and is preferable.
- R b10 is not particularly limited as long as it does not interfere with the object of the present invention, and can be selected from various organic groups. Examples of a suitable group as R b10 include an alkyl group having 1 to 20 carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a substituent. Heterocyclyl groups may be mentioned.
- R b10 2-methylphenyl group, thiophen-2-yl group, and ⁇ -naphthyl group are particularly preferable as R b10.
- R b1 is a hydrogen atom
- the transparency tends to be good, which is preferable.
- R b4 is a group represented by the formula (1a) or (1b) described later, the transparency tends to be better.
- R b2 and R b3 are a chain alkyl group which may have a substituent, a cyclic organic group which may have a substituent, or a hydrogen atom, respectively.
- R b2 and R b3 may be coupled to each other to form a ring.
- a chain alkyl group which may have a substituent is preferable.
- the chain alkyl group may be a linear alkyl group or a branched chain alkyl group.
- R b2 and R b3 are chain alkyl groups having no substituent
- the number of carbon atoms of the chain alkyl group is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and particularly preferably 1 or more and 6 or less.
- Specific examples of cases where R b2 and R b3 are chain alkyl groups include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a tert-butyl group.
- N-Pentyl group Isopentyl group, sec-Pentyl group, tert-Pentyl group, n-Hexyl group, n-Heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl Examples thereof include a group, an isononyl group, an n-decyl group, and an isodecyl group.
- R b2 and R b3 are alkyl groups, the alkyl group may contain an ether bond (—O—) in the carbon chain.
- alkyl group having an ether bond in the carbon chain examples include a methoxyethyl group, an ethoxyethyl group, a methoxyethoxyethyl group, an ethoxyethoxyethyl group, a propyloxyethoxyethyl group, a methoxypropyl group and the like.
- R b2 and R b3 are chain alkyl groups having a substituent
- the number of carbon atoms of the chain alkyl group is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and particularly preferably 1 or more and 6 or less. ..
- the number of carbon atoms of the substituent is not included in the number of carbon atoms of the chain alkyl group.
- the chain alkyl group having a substituent is preferably linear.
- the substituent which the alkyl group may have is not particularly limited as long as it does not impair the object of the present invention.
- the substituent include a cyano group, a halogen atom, a cyclic organic group, and an alkoxycarbonyl group.
- the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom. Among these, a fluorine atom, a chlorine atom and a bromine atom are preferable.
- the cyclic organic group include a cycloalkyl group, an aromatic hydrocarbon group, and a heterocyclyl group. Specific examples of the cycloalkyl group are the same as in the preferred example when R b1 is a cycloalkyl group.
- the aromatic hydrocarbon group include a phenyl group, a naphthyl group, a biphenylyl group, an anthryl group, a phenanthryl group and the like.
- Specific examples of the heterocyclyl group are the same as in the preferred example when R b1 is a heterocyclyl group.
- R b1 is an alkoxycarbonyl group
- the alkoxy group contained in the alkoxycarbonyl group may be linear or branched, preferably linear.
- the number of carbon atoms of the alkoxy group contained in the alkoxycarbonyl group is preferably 1 or more and 10 or less, and more preferably 1 or more and 6 or less.
- the number of the substituents is not particularly limited.
- the number of preferred substituents depends on the number of carbon atoms in the chain alkyl group.
- the number of substituents is typically 1 or more and 20 or less, preferably 1 or more and 10 or less, and more preferably 1 or more and 6 or less.
- the cyclic organic group may be an alicyclic group or an aromatic group.
- the cyclic organic group include an aliphatic cyclic hydrocarbon group, an aromatic hydrocarbon group, and a heterocyclyl group.
- R b2 and R b3 are cyclic organic groups, the substituents that the cyclic organic group may have are the same as when R b2 and R b3 are chain alkyl groups.
- R b2 and R b3 are aromatic hydrocarbon groups, whether the aromatic hydrocarbon group is a phenyl group or a group formed by bonding a plurality of benzene rings via a carbon-carbon bond. , It is preferable that the group is formed by condensing a plurality of benzene rings.
- the aromatic hydrocarbon group is a phenyl group or a group formed by bonding or condensing a plurality of benzene rings
- the number of rings of the benzene ring contained in the aromatic hydrocarbon group is not particularly limited. 3 or less is preferable, 2 or less is more preferable, and 1 is particularly preferable.
- Preferred specific examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, a biphenylyl group, an anthryl group, a phenanthryl group and the like.
- R b2 and R b3 are aliphatic cyclic hydrocarbon groups
- the aliphatic cyclic hydrocarbon group may be monocyclic or polycyclic.
- the number of carbon atoms of the aliphatic cyclic hydrocarbon group is not particularly limited, but is preferably 3 or more and 20 or less, and more preferably 3 or more and 10 or less.
- Examples of monocyclic cyclic hydrocarbon groups include cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group, norbornyl group, isobornyl group, tricyclononyl group, tricyclodecyl group, Examples thereof include a tetracyclododecyl group and an adamantyl group.
- the heterocyclyl group is a 5- or 6-membered monocycle containing one or more N, S, O, such monocyclic rings, or such monocyclic and benzene rings. Is a heterocyclyl group condensed with.
- the heterocyclyl group is a condensed ring, the number of rings of the monocycle constituting the condensed ring is 3 or less.
- the heterocyclyl group may be an aromatic group (heteroaryl group) or a non-aromatic group.
- heterocycle constituting the heterocyclyl group examples include furan, thiophene, pyrrol, oxazole, isooxazole, thiazole, thiadiazol, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, and indol.
- R b2 and R b3 may be coupled to each other to form a ring.
- the group composed of the ring formed by R b2 and R b3 is preferably a cycloalkylidene group.
- the ring constituting the cycloalkylidene group is preferably a 5-membered ring or a 6-membered ring, and more preferably a 5-membered ring.
- the cycloalkylidene group may be condensed with one or more other rings.
- rings that may be fused with a cycloalkylene group include a benzene ring, a naphthalene ring, a cyclobutane ring, a cyclopentane ring, a cyclohexane ring, a cycloheptane ring, a cyclooctane ring, a furan ring, a thiophene ring, a pyrrole ring, and a pyridine. Rings, pyrazine rings, pyrimidine rings and the like can be mentioned.
- R b2 and R b3 examples include groups represented by the formula -A 1 -A 2.
- a 1 is a linear alkylene group
- a 2 is an alkoxy group, a cyano group, a halogen atom, an alkyl halide group, a cyclic organic group, or an alkoxycarbonyl group.
- the number of carbon atoms of the linear alkylene group of A 1 is preferably 1 or more and 10 or less, and more preferably 1 or more and 6 or less.
- a 2 is an alkoxy group
- the alkoxy group may be linear or branched, preferably linear.
- the number of carbon atoms of the alkoxy group is preferably 1 or more and 10 or less, and more preferably 1 or more and 6 or less.
- a 2 is a halogen atom, a fluorine atom, a chlorine atom, a bromine atom and an iodine atom are preferable, and a fluorine atom, a chlorine atom and a bromine atom are more preferable.
- the halogen atom contained in the alkyl halide group is preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and more preferably a fluorine atom, a chlorine atom or a bromine atom.
- the alkyl halide group may be linear or branched, preferably linear.
- a 2 is a cyclic organic group
- examples of the cyclic organic group are the same as those of the cyclic organic group that R b2 and R b3 have as substituents.
- a 2 is an alkoxycarbonyl group
- examples of the alkoxycarbonyl group are similar to those of the alkoxycarbonyl group that R b2 and R b3 have as substituents.
- R b2 and R b3 include alkyl groups such as ethyl group, n-propyl group, n-butyl group, n-hexyl group, n-heptyl group, and n-octyl group; 2-methoxyethyl.
- Alkyl group 2-cyclohexylethyl group, 3-cyclohexyl-n-propyl group, 4-cyclohexyl-n-butyl group, 5-cyclohexyl-n-pentyl group, 6-cyclohexyl-n-hexyl group, 7-cyclohexyl-n -Heptyl group, 8-cyclohexyl-n-octyl group, 2-cyclopentylethyl group, 3-cyclopentyl-n-propyl group, 4-cyclopentyl-n-butyl group, 5-cyclopentyl-n-pentyl group, 6-cyclopentyl- Cycloalkylalkyl groups such as n-hexyl group, 7-cyclopentyl-n-heptyl group, and 8-cyclopentyl-n-octyl group; 2-methoxycarbonylethyl group, 3-methoxycarbonyl-n-propyl
- the preferred groups among the above are ethyl group, n-propyl group, n-butyl group, n-pentyl group, 2-methoxyethyl group, 2-cyanoethyl group, 2-phenylethyl group, 2-Cyclohexylethyl group, 2-methoxycarbonylethyl group, 2-chloroethyl group, 2-bromoethyl group, 3,3,3-trifluoropropyl group, and 3,3,4,5,5,5-hepta It is a fluoro-n-pentyl group.
- R b4 examples include alkyl groups, alkoxy groups, cycloalkyl groups, cycloalkoxy groups, saturated aliphatic acyl groups, alkoxycarbonyl groups, saturated aliphatic acyloxy groups and substituents , as in R b1.
- Examples thereof include a heterocyclylcarbonyl group which may have a group, an amino group substituted with one or two organic groups, a morpholin-1-yl group, a piperazine-1-yl group and the like. Specific examples of these groups are similar to those of these groups described for R b1. Further, as R b4 , a cycloalkylalkyl group, a phenoxyalkyl group which may have a substituent on the aromatic ring, and a phenylthioalkyl group which may have a substituent on the aromatic ring are also preferable. The substituents that the phenoxyalkyl group and the phenylthioalkyl group may have are the same as the substituents that the phenyl group contained in R b1 may have.
- R b4 includes an alkyl group, a cycloalkyl group, a phenyl group which may have a substituent, or a cycloalkylalkyl group, and a phenylthio which may have a substituent on the aromatic ring.
- Alkyl groups are preferred.
- the alkyl group an alkyl group having 1 to 20 carbon atoms is preferable, an alkyl group having 1 to 8 carbon atoms is more preferable, an alkyl group having 1 to 4 carbon atoms is particularly preferable, and a methyl group is the most preferable. preferable.
- a methylphenyl group is preferable, and a 2-methylphenyl group is more preferable.
- the number of carbon atoms of the cycloalkyl group contained in the cycloalkylalkyl group is preferably 5 or more and 10 or less, more preferably 5 or more and 8 or less, and particularly preferably 5 or 6.
- the number of carbon atoms of the alkylene group contained in the cycloalkylalkyl group is preferably 1 or more and 8 or less, more preferably 1 or more and 4 or less, and particularly preferably 2.
- a cyclopentylethyl group is preferable.
- the number of carbon atoms of the alkylene group contained in the phenylthioalkyl group which may have a substituent on the aromatic ring is preferably 1 or more and 8 or less, more preferably 1 or more and 4 or less, and particularly preferably 2.
- a 2- (4-chlorophenylthio) ethyl group is preferable.
- R b4 a group represented by -A 3- CO-O-A 4 is also preferable.
- a 3 is a divalent organic group, preferably a divalent hydrocarbon group, and preferably an alkylene group.
- a 4 is a monovalent organic group, preferably a monovalent hydrocarbon group.
- the alkylene group may be linear or branched, preferably linear.
- the number of carbon atoms of the alkylene group is preferably 1 or more and 10 or less, more preferably 1 or more and 6 or less, and particularly preferably 1 or more and 4 or less.
- a 4 the number 1 to 10 alkyl group carbon atoms, having 7 or more carbon atoms and 20 or less aralkyl group, and an aromatic hydrocarbon group having 6 to 20 carbon atoms.
- Specific preferable examples of A 4 is methyl group, ethyl group, n- propyl group, an isopropyl group, n- butyl group, isobutyl group, sec- butyl group, tert- butyl group, n- pentyl group, n- hexyl Examples thereof include a group, a phenyl group, a naphthyl group, a benzyl group, a phenethyl group, an ⁇ -naphthylmethyl group, a ⁇ -naphthylmethyl group and the like.
- Preferable specific examples of the group represented by -A 3- CO-O-A 4 are 2-methoxycarbonylethyl group, 2-ethoxycarbonylethyl group, 2-n-propyloxycarbonylethyl group, 2-n. -Butyloxycarbonylethyl group, 2-n-pentyloxycarbonylethyl group, 2-n-hexyloxycarbonylethyl group, 2-benzyloxycarbonylethyl group, 2-phenoxycarbonylethyl group, 3-methoxycarbonyl-n-propyl Group, 3-ethoxycarbonyl-n-propyl group, 3-n-propyloxycarbonyl-n-propyl group, 3-n-butyloxycarbonyl-n-propyl group, 3-n-pentyloxycarbonyl-n-propyl group , 3-n-hexyloxycarbonyl-n-propyl group, 3-benzyloxycarbonyl-n-propyl group,
- R b4 preferably a group represented by the following formula (1a) or the following formula (1b).
- R b7 and R b8 are organic groups, respectively, n3 is an integer of 0 or more and 4 or less, and R b7 and R b8 are present at adjacent positions on the benzene ring.
- R b7 and R b8 may be combined with each other to form a ring, n4 is an integer of 1 or more and 8 or less, n5 is an integer of 1 or more and 5 or less, and n6 is 0 or more (n5 + 3).
- R b9 is an organic group.
- Examples of organic groups for R b7 and R b8 in formula (1a) are the same as for R b1 .
- R b7 an alkyl group or a phenyl group is preferable.
- R b7 is an alkyl group, the number of carbon atoms thereof is preferably 1 or more and 10 or less, more preferably 1 or more and 5 or less, particularly preferably 1 or more and 3 or less, and most preferably 1. That is, R b7 is most preferably a methyl group.
- the ring may be an aromatic ring or an aliphatic ring.
- n3 is an integer of 0 or more and 4 or less, preferably 0 or 1, and more preferably 0.
- R b9 is an organic group.
- the organic group include groups similar to the organic group described for R b1.
- an alkyl group is preferable.
- the alkyl group may be linear or branched.
- the number of carbon atoms of the alkyl group is preferably 1 or more and 10 or less, more preferably 1 or more and 5 or less, and particularly preferably 1 or more and 3 or less.
- R b9 a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group and the like are preferably exemplified, and among these, a methyl group is more preferable.
- n5 is an integer of 1 or more and 5 or less, preferably an integer of 1 or more and 3 or less, and more preferably 1 or 2.
- n6 is 0 or more (n5 + 3) or less, an integer of 0 or more and 3 or less is preferable, an integer of 0 or more and 2 or less is more preferable, and 0 is particularly preferable.
- n4 is an integer of 1 or more and 8 or less, an integer of 1 or more and 5 or less is preferable, an integer of 1 or more and 3 or less is more preferable, and 1 or 2 is particularly preferable.
- R b5 is a hydrogen atom, an alkyl group having 1 to 11 carbon atoms which may have a substituent, or an aryl group which may have a substituent.
- R b5 is an alkyl group
- a phenyl group, a naphthyl group and the like are preferably exemplified.
- R b1 is an aryl group
- an alkyl group having 1 or more and 5 or less carbon atoms an alkoxy group, a halogen atom and the like are preferably exemplified.
- a hydrogen atom, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a phenyl group, a benzyl group, a methylphenyl group, a naphthyl group and the like are preferably exemplified. Of these, a methyl group or a phenyl group is more preferable.
- Preferable specific examples of the compound represented by the formula (1) include the following PI-43 to PI-83.
- the other photopolymerization initiator (B3) can be used alone or in combination of two or more.
- the content of the photopolymerization initiator (B) is preferably 0.5% by mass or more and 30% by mass or less with respect to the mass (total solid content) of the photosensitive composition excluding the mass of the solvent (S) described later. More preferably, it is 1% by mass or more and 20% by mass or less.
- the ratio of the mass of the mass W2 of the oxime ester compound (B2) to the total mass W1 of the phosphine oxide compound (B1) and the mass W2 of the oxime ester compound (B2) is preferably 35% by mass or more, preferably 40% by mass. It is more preferably 95% by mass or more, and further preferably 50% by mass or more and 90% by mass or less.
- the photopolymerization initiator (B) may be combined with a photoinitiator aid.
- Photoinitiator aids include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-dimethylaminobenzoate 2-.
- Examples thereof include thiol compounds such as acid, methyl 3-mercaptopropionate, pentaeristol tetramercaptoacetate and 3-mercaptopropionate.
- the photosensitive composition may contain a solvent (S) for the purpose of adjusting the coatability or the like.
- the type of the solvent (S) is not particularly limited, but is typically an organic solvent.
- organic solvent examples include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, and diethylene glycol monoethyl ether.
- the content of the solvent (S) in the photosensitive composition is not particularly limited as long as it does not impair the object of the present invention.
- the content of the solvent (S) in the photosensitive composition may be 95% by mass or less, 80% by mass or less, 50% by mass or less, or 30% by mass with respect to the mass of the photosensitive composition. It may be less than or equal to 20% by mass or less.
- the content of the solvent (S) in the photosensitive composition may be 1% by mass or more, 5% by mass or more, or 10% by mass or more. It may be 20% by mass or more, or 30% by mass or more.
- the cured product of the photosensitive composition is a cured film
- such a cured film is often used for forming a high refractive index film in a display panel such as an organic EL panel.
- volatilization of the solvent (S) at the time of forming the high refractive index film and outgas derived from the solvent (S) remaining in the high refractive index film It is hoped that the occurrence will be small.
- the problems of volatilization of the solvent (S) and outgas can be solved by reducing the content of the solvent (S) in the photosensitive composition.
- the coatability of the composition is significantly impaired, and it is particularly difficult to apply it to a coating method such as an inkjet method.
- the photosensitive composition containing the above-mentioned sulfide compound (A2-1) in combination with the (meth) acrylate compound (A2-2) does not contain the solvent (S) or contains only a small amount of the solvent (S). It is possible to achieve a low viscosity applicable to the inkjet method.
- the viscosity of the photosensitive composition measured at 25 ° C. using an E-type viscometer is preferably 40 cP or less, more preferably 30 cP or less, further preferably 28 cP or less, and particularly preferably 25 cP or less.
- the viscosity of the photosensitive composition can be adjusted, for example, by adjusting the contents of the base material component (A), the solvent (S), and the like.
- the content of the solvent (S) in the photosensitive composition is preferably 5% by mass or less. Furthermore, the content of the solvent (S) in the photosensitive composition is preferably 3% by mass or less, more preferably 2% by mass or less, further preferably 1% by mass or less, still more preferably 0.5% by mass or less. , 0.3% by mass or less is particularly preferable. Considering the problems of solvent (S) volatilization and outgassing, it is most preferable that the photosensitive composition is substantially free of solvent (S).
- the photosensitive composition does not substantially contain the solvent (S) means that a very small amount of the solvent (S) is inevitably brought into the photosensitive composition in association with the raw material or the like, and is intended for the photosensitive composition. It means that the solvent (S) is not added.
- the content of the solvent (S) in the photosensitive composition is, for example, 0.2% by mass or less, preferably 0.15% by mass or less. , 0.1% by mass or less is more preferable, and 0.05% by mass or less is further preferable.
- the photosensitive composition may contain various additives conventionally blended in the photosensitive composition in addition to the components described above, as long as the object of the present invention is not impaired.
- Preferred additives to be blended in the photosensitive composition include adhesion promoters such as dispersants and silane coupling agents, antioxidants, anti-aggregation agents, defoaming agents, surfactants and the like.
- the surfactant is not particularly limited, and known components such as a fluorine-based surfactant and a silicon-based surfactant can be used.
- the photosensitive composition is at least one metal compound selected from the group consisting of titanium oxide particles, barium titanate particles, cerium oxide particles, and zinc sulfide particles. It may contain particles.
- the photosensitive composition contains the above-mentioned metal compound particles, it is particularly easy to form a cured product exhibiting a high refractive index.
- the average particle size of the metal compound particles is preferably 500 nm or less, preferably 2 nm or more and 100 nm or less, from the viewpoint of transparency of the cured product.
- the content of the metal compound particles in the photosensitive composition is not particularly limited as long as the object of the present invention is not impaired.
- the content of the metal compound particles in the photosensitive composition is preferably 5% by mass or more and 70% by mass or less, and 35% by mass or more and 70% by mass, based on the mass excluding the mass of the solvent (S) of the photosensitive composition. % Or less is more preferable, and 45% by mass or more and 60% by mass or less is further preferable.
- the content of the metal compound particles in the photosensitive composition is within the above range, it is easy to obtain a photosensitive composition having a low viscosity, and it is easy to form a cured product having a high refractive index.
- a photosensitive composition is obtained by mixing a predetermined amount of each of the components described above and then uniformly stirring the mixture.
- the photosensitive compositions described above typically have Molding the photosensitive composition according to the shape of the cured product to be formed, Exposure to the molded photosensitive composition and It is made into a cured product by a method including.
- the method for molding the photosensitive composition is not particularly limited, and is appropriately selected depending on the shape of the cured product.
- the shape of the cured product is not limited to these, and examples thereof include a film shape, a lens shape, a line shape, and a prism shape. Among these shapes, the film shape is preferable.
- the photosensitive composition may be filled in a mold according to the shape of the cured product using a squeegee or the like.
- the photosensitive composition may be applied onto the substrate according to the shape of the cured product. Examples of the coating method include a printing method such as an inkjet method.
- the photosensitive composition contains an alkali-soluble resin (A1-2) as the base material component (A), a line shape, a dot shape, etc. can be obtained by a photolithography method using an alkali developer or an organic solvent as the developer.
- a cured product patterned in any shape can be formed.
- a method of applying the cured product to the film shape a method using a contact transfer type coating device such as a roll coater, a reverse coater, or a bar coater, or a non-contact type coating device such as a spinner (rotary coating device) or a curtain flow coater is used.
- the photosensitive composition can be applied to the film shape by a printing method such as an inkjet method.
- the solvent (S) may be removed from the photosensitive composition formed by a method such as heating after molding the photosensitive composition into a desired shape.
- a photosensitive composition formed into a desired shape such as a film shape is exposed to such an extent that the photosensitive composition is not completely cured, and then is semi-cured by a method such as an imprint method. May be shaped to the photosensitive composition of. In this case, the shaped semi-cured photosensitive composition is further exposed to sufficiently cure the photosensitive composition to a desired degree. Further, by applying the above-mentioned photosensitive composition to a 3D printing method and laminating a thin-film cured product by repeating inkjet printing and curing by exposure, a cured product having a desired shape is formed. May be good.
- Exposure to the molded photosensitive composition is performed by irradiating, for example, active energy rays such as ultraviolet rays and excimer laser light.
- the exposure to the molded photosensitive composition may be regioselective by a method such as exposure through a mask.
- the exposed photosensitive composition is developed with an organic solvent to remove the unexposed portion, whereby a patterned cured product can be formed.
- the developing solution include organic developing solutions such as monoethanolamine, diethanolamine and triethanolamine, and aqueous solutions such as sodium hydroxide, potassium hydroxide, sodium carbonate, ammonia and quaternary ammonium salts.
- a cured product having a desired shape and having high transparency is formed.
- the cured product obtained by using the above-mentioned photosensitive composition has excellent bending resistance and is not easily cracked even when bent, and is therefore preferably used in a flexible device.
- a film having a thickness of 50 nm made of the above-mentioned cured product is wound around a cylindrical stainless steel rod having a radius of 6 mm, preferably a radius of 2 mm, cracks do not occur.
- Example 1 to 5 and Comparative Examples 1 to 3 In Examples 1 to 5 and Comparative Examples 1 to 3, a compound having the following structure was used as the sulfide compound (A2-1) as the base material component (A).
- Examples 1 to 5 and Comparative Examples 1 to 3 zirconium oxide particles (average particle size 10 nm) and titanium oxide particles (average particle size 100 nm) were used as the metal compound particles.
- B1-1 Bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide.
- B1-2 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide
- B1-3 ethyl (2,4,6-trimethylbenzoyl) phenylphosphinate
- Examples 1 to 5 and Comparative Examples 1 to 3 compounds OE1, compound OE2, and compound OE3 having the following structures were used as the oxime ester compound (B2).
- Compound OE1, Compound OE2, and Compound OE3 all have a peak in the wavelength range of 320 nm or more and less than 400 nm in the absorption spectrum, and have a gram absorption coefficient of 10 or more at any wavelength in the wavelength range of 400 nm or more. Is shown.
- Table 1 shows the viscosities of the obtained photosensitive composition measured at 25 ° C. using an E-type viscometer. Moreover, the refractive index and the light transmittance of the cured film formed by using the obtained photosensitive composition were measured according to the following formulation. The measurement results of the refractive index are shown in Table 1.
- ⁇ Refractive index measurement method> The photosensitive compositions of Examples 1 to 5 and Comparative Examples 1 to 3 were applied onto a glass substrate using an inkjet device. Then, the coating film was exposed and cured with an exposure amount of 2 J / cm2 using a 395 nm UV-LED exposure machine to obtain a cured film having a thickness of 3 ⁇ m. The refractive index of the film at a light wavelength of 550 nm was evaluated using a prism coupler manufactured by Metrocon.
- ⁇ Light transmittance measurement method The light transmittance of the film formed by the refractive index measurement was measured using an MCPD transmittance meter manufactured by Otsuka Electronics. Based on the measured light transmittance, the light transmittance of the cured product formed by using the photosensitive compositions of Examples 1 to 5 and Comparative Examples 1 to 3 was evaluated according to the following criteria. ⁇ : The light transmittance is 96% or more. ⁇ : The light transmittance is 95% or more and less than 96%. ⁇ : The light transmittance is 93% or more and less than 95%. X: The light transmittance is less than 93%.
- the base material component (A) contains a sulfide compound (A2-1) having a predetermined structure and a (meth) acrylate compound (A2-2) in combination, and photopolymerization is initiated. It can be seen that the photosensitive composition containing the phosphine oxide compound (B1) and the oxime ester compound (B2) in combination as the agent (B) gives a cured product having low viscosity and excellent transparency.
- Example 6 Comparative Example 4, and Comparative Example 5 In Example 6, Comparative Example 4, and Comparative Example 5, a compound having the following structure was used as the photopolymerizable monomer (A) as the base material component (A).
- Example 6 Comparative Example 4, and Comparative Example 5, titanium oxide particles (average particle diameter 100 nm) were used as the metal compound particles.
- Example 6 bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide was used as the phosphine oxide compound (B1).
- Example 6 the compound OE1 and the compound OE2 having the following structures described above were used as the oxime ester compound (B2).
- Example 6 Comparative Example 4, and Comparative Example 5, propylene glycol monomethyl ether was used as the solvent (S).
- Example 6 Comparative Example 4
- Comparative Example 5 Comparative Example 5.
- Table 2 shows the viscosities of the obtained photosensitive composition measured at 25 ° C. using an E-type viscometer.
- the refractive index and the light transmittance of the cured film formed by using the obtained photosensitive composition were measured according to the above-mentioned formulation. The measurement results of the refractive index are shown in Table 2.
- Example 6 a base material component (A) and a photopolymerization initiator (B) are contained, and as the photopolymerization initiator (B), a phosphine oxide compound (B1) and an oxime ester compound (B2) are used. It can be seen that the photosensitive composition containing the combination of and gives a cured product having excellent transparency.
- Example 7 to 12 to 10 and Comparative Examples 6 to 10 the resin R1 which is the cardo resin obtained in the following Preparation Example 1 and the structural units I to IV are composed, and the amount of each structural unit is in parentheses for each unit.
- Resin R2 which is an acrylic resin having a lower right value (% by mass), and a methacrylic-modified silicone resin having a methacrylic group (as a monomer composition, 2- (3- (triethoxysilylpropyl) carbamoyl) cyclohexanecarboxylic acid (40 mol).
- ⁇ Sensitivity measurement method> The photosensitive compositions of Examples and Comparative Examples were spin-coated on a glass substrate and dried at 100 ° C. for 2 minutes. Then, it was exposed using a 395 nm UV-LED exposure machine to obtain a coating film. The obtained film was immersed in an aqueous solution having a concentration of TMAH (tetramethylammonium hydroxide) of 2.38% by mass, and after 2 minutes, the glass substrate was taken out. Then, it is purely rinsed, dried, and then the film thickness is measured.
- TMAH tetramethylammonium hydroxide
- the film thickness after TMAH immersion at that time is 90% or more of the film thickness before TMAH immersion and the exposure amount is 200 mJ / cm 2 or less, it is judged as ⁇ , and it is more than 200 mJ / cm 2 and 1 J / cm 2 or less. A certain case was judged as ⁇ . Further, the case where the film was not cured even with an exposure amount of 1 J / cm 2 was determined as x.
- ⁇ Light transmittance measurement method The photosensitive compositions of Examples 7 to 12 and Comparative Examples 6 to 10 were spin-coated on a glass substrate and dried at 100 ° C. for 2 minutes. Then, the coating film was exposed and cured at an exposure amount of 2 J / cm 2 using a 395 nm UV-LED exposure machine to obtain a cured film having a thickness of 3 ⁇ m. The light transmittance of the obtained cured film was measured using an MCPD transmittance meter manufactured by Otsuka Electronics Co., Ltd. Based on the measured light transmittance, the light transmittance of the cured product formed by using the photosensitive compositions of Examples 5 to 10 and Comparative Examples 6 to 10 was evaluated according to the following criteria. ⁇ : The light transmittance is 95% or more. ⁇ : The light transmittance is 93% or more and less than 95%. X: The light transmittance is less than 93%.
- a base material component (A) and a photopolymerization initiator (B) are contained, and as the photopolymerization initiator (B), a phosphine oxide compound (B1) and an oxime ester compound ( It can be seen that the photosensitive composition contained in combination with B2) gives a cured product having excellent transparency.
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Abstract
Description
基材成分(A)が、樹脂(A1)及び光重合性モノマー(A2)の少なくとも一方を含み、
基材成分(A)が、光重合性モノマー(A2)を含まない場合、樹脂(A1)がエチレン性不飽和二重結合を有する光重合性樹脂(A1-1)を含み、
光重合開始剤(B)が、フォスフィンオキサイド化合物(B1)と、オキシムエステル化合物(B2)とを組み合わせて含み、
フォスフィンオキサイド化合物(B1)の質量W1とオキシムエステル化合物(B2)の質量W2との合計に対する、オキシムエステル化合物(B2)の質量W2の質量の比率が35質量%以上である、感光性組成物である。
成形された感光性組成物に対して露光することと、
を含む硬化物の製造方法である。
感光性組成物は、基材成分(A)と、光重合開始剤(B)とを含む。基材成分(A)は、樹脂(A1)及び光重合性モノマー(A2)の少なくとも一方を含む。
基材成分(A)が、光重合性モノマー(A2)を含まない場合、樹脂(A1)がエチレン性不飽和二重結合を有する光重合性樹脂(A1-1)を含む。
光重合開始剤(B)は、フォスフィンオキサイド化合物(B1)と、オキシムエステル化合物(B2)とを組み合わせて含む。
フォスフィンオキサイド化合物(B1)の質量W1とオキシムエステル化合物(B2)の質量W2との合計に対する、オキシムエステル化合物(B2)の質量W2の質量の比率は、35質量%以上である。
感光性組成は、感光性組成物に賦形性を付与する基材成分(A)を含む。基材成分(A)は、樹脂(A1)及び光重合性モノマー(A2)の少なくとも一方を含む。
基材成分(A)が、光重合性モノマー(A2)を含まない場合、樹脂(A1)がエチレン性不飽和二重結合を有する光重合性樹脂(A1-1)を含む。
樹脂(A1)は、透明であり、且つ感光性組成物に成膜性等の賦形性を与える樹脂材料であれば特に限定されない。かかる樹脂材料の具体例としては、ポリアセタール樹脂、ポリアミド樹脂、ポリカーボネート樹脂、ポリエステル樹脂(ポリブチレンテレフタレート、ポリエチレンテレフタレート、ポリアリレート等)、FR-AS樹脂、FR-ABS樹脂、AS樹脂、ABS樹脂、ポリフェニレンオキサイド樹脂、ポリフェニレンサルファイド樹脂、ポリスルホン樹脂、ポリエーテルスルホン樹脂、ポリエーテルエーテルケトン樹脂、フッ素系樹脂、ポリイミド樹脂、ポリアミドイミド樹脂、ポリアミドビスマレイミド樹脂、ポリエーテルイミド樹脂、ポリベンゾオキサゾール樹脂、ポリベンゾチアゾール樹脂、ポリベンゾイミダゾール樹脂、シリコーン樹脂、BT樹脂、ポリメチルペンテン、超高分子量ポリエチレン、FR-ポリプロピレン、(メタ)アクリル樹脂(ポリメチルメタクリレート等)、及びポリスチレン等が挙げられる。
これらの樹脂(A1)の構造は、本発明の目的を阻害しない範囲で特に限定されない。直鎖状であっても、分岐鎖状であっても、網目状であってもよい。また、樹脂(A1)がシリコーン樹脂である場合、当該シリコーン樹脂は、所謂シルセスキオキサン樹脂であってもよい。シルセスキオキサン樹脂の構造は、特に限定されず、かご型、不完全かご型、ラダー型、ランダム型等、従来知られるいずれの構造であってもよい。
これらの樹脂材料は、2種以上を組み合わせて使用されてもよい。
感光性組成物を用いて硬化物を形成する際に、フォトリソグラフィー法によるパターニングが容易であることから、樹脂(A1)はアルカリ可溶性樹脂(A1-2)を含むのが好ましい。
なお、樹脂(A1)としての樹脂材料が、光重合性樹脂(A1-1)と、アルカリ可溶性樹脂(A1-2)の双方に該当する場合がある。
アルカリ可溶性樹脂(A1-2)としてカルド構造を有する樹脂(a-1)を用いる場合、解像性に優れる感光性組成物を得やすく、感光性組成物を用いて加熱により過度にフローしにくい硬化物を形成しやすい。このため、所望する形状の硬化物を形成しやすい。
カルド構造を有する樹脂(a-1)としては、その構造中にカルド構造を有し、所定のアルカリ可溶性を有する樹脂を用いることができる。カルド構造とは、第1の環状構造を構成している1つの環炭素原子に、第2の環状構造と第3の環状構造とが結合した構造をいう。なお、第2の環状構造と、第3の環状構造とは、同一の構造であっても異なった構造であってもよい。
カルド構造の代表的な例としては、フルオレン環の9位の炭素原子に2つの芳香環(例えばベンゼン環)が結合した構造が挙げられる。
脂肪族環としては、モノシクロアルカン、ビシクロアルカン、トリシクロアルカン、テトラシクロアルカン等が挙げられる。
具体的には、シクロペンタン、シクロヘキサン、シクロヘプタン、シクロオクタン等のモノシクロアルカンや、アダマンタン、ノルボルナン、イソボルナン、トリシクロデカン、テトラシクロドデカンが挙げられる。
脂肪族環に縮合してもよい芳香族環は、芳香族炭化水素環でも芳香族複素環でもよく、芳香族炭化水素環が好ましい。具体的にはベンゼン環、及びナフタレン環が好ましい。
まず、下記式(a-2b)で表されるジオール化合物が有するフェノール性水酸基中の水素原子を、必要に応じて、常法に従って、-Ra3-OHで表される基に置換した後、エピクロルヒドリン等を用いてグリシジル化して、下記式(a-2c)で表されるエポキシ化合物を得る。
次いで、式(a-2c)で表されるエポキシ化合物を、アクリル酸又はメタクリル酸と反応させることにより、式(a-2a)で表されるジオール化合物が得られる。
式(a-2b)及び式(a-2c)中、Ra1、Ra3、及びt2は、式(a-2)について説明した通りである。式(a-2b)及び式(a-2c)中の環Aについては、式(a-3)について説明した通りである。
なお、式(a-2a)で表されるジオール化合物の製造方法は、上記の方法に限定されない。
上記式(a-1)中、t1は、0以上20以下の整数を示す。
Ra4がアルキル基である場合、当該アルキル基は直鎖状でも分岐鎖状でもよい。
式(a-4)中の複数のRa4は、高純度のテトラカルボン酸二無水物の調製が容易であることから、同一の基であるのが好ましい。
テトラカルボン酸二無水物の精製が容易である点から、t3の上限は5が好ましく、3がより好ましい。
テトラカルボン酸二無水物の化学的安定性の点から、t3の下限は1が好ましく、2がより好ましい。
式(a-4)中のt3は、2又は3が特に好ましい。
Ra5、及びRa6は、テトラカルボン酸二無水物の精製が容易である点から、水素原子、又は炭素原子数1以上10以下(好ましくは1以上6以下、より好ましくは1以上5以下、さらに好ましくは1以上4以下、特に好ましくは1以上3以下)のアルキル基であるのが好ましく、水素原子又はメチル基であるのが特に好ましい。
アルカリ可溶性樹脂(A1-2)は、加熱による硬化物の過度の熱フローを抑制する観点から、ノボラック樹脂(a-2)を含むのも好ましい。
ノボラック樹脂(a-2)としては、従来から感光性組成物に配合されている種々のノボラック樹脂を用いることができる。ノボラック樹脂(a-2)としては、フェノール性水酸基を有する芳香族化合物(以下、単に「フェノール類」という。)とアルデヒド類とを酸触媒下で付加縮合させることにより得られる樹脂が好ましい。
ノボラック樹脂(a-2)を作製する際に用いられるフェノール類としては、例えば、フェノール;o-クレゾール、m-クレゾール、p-クレゾール等のクレゾール類;2,3-キシレノール、2,4-キシレノール、2,5-キシレノール、2,6-キシレノール、3,4-キシレノール、3,5-キシレノール等のキシレノール類;o-エチルフェノール、m-エチルフェノール、p-エチルフェノール等のエチルフェノール類;2-イソプロピルフェノール、3-イソプロピルフェノール、4-イソプロピルフェノール、o-ブチルフェノール、m-ブチルフェノール、p-ブチルフェノール、並びにp-tert-ブチルフェノール等のアルキルフェノール類;2,3,5-トリメチルフェノール、及び3,4,5-トリメチルフェノール等のトリアルキルフェノール類;レゾルシノール、カテコール、ハイドロキノン、ハイドロキノンモノメチルエーテル、ピロガロール、及びフロログリシノール等の多価フェノール類;アルキルレゾルシン、アルキルカテコール、及びアルキルハイドロキノン等のアルキル多価フェノール類(いずれのアルキル基も炭素原子数1以上4以下である。);α-ナフトール;β-ナフトール;ヒドロキシジフェニル;並びにビスフェノールA等が挙げられる。これらのフェノール類は、単独で用いてもよく、2種以上を組み合わせて用いてもよい。
m-クレゾールとp-クレゾールの配合割合は特に限定されないが、m-クレゾール/p-クレゾールのモル比で、3/7以上8/2以下が好ましい。m-クレゾール及びp-クレゾールをかかる範囲の比率で用いることにより、耐熱性に優れる硬化物を形成可能な感光性組成物を得やすい。
m-クレゾールと2,3,5-トリメチルフェノールの配合割合は特に限定されないが、m-クレゾール/2,3,5-トリメチルフェノールのモル比で、70/30以上95/5以下が好ましい。
ノボラック樹脂(a-2)を作製する際に用いられるアルデヒド類としては、例えば、ホルムアルデヒド、パラホルムアルデヒド、フルフラール、ベンズアルデヒド、ニトロベンズアルデヒド、及びアセトアルデヒド等が挙げられる。これらのアルデヒド類は、単独で用いてもよく、2種以上を組み合わせて用いてもよい。
ノボラック樹脂(a-2)を作製する際に用いられる酸触媒としては、例えば、塩酸、硫酸、硝酸、リン酸、及び亜リン酸等の無機酸類;蟻酸、シュウ酸、酢酸、ジエチル硫酸、及びパラトルエンスルホン酸等の有機酸類;並びに酢酸亜鉛等の金属塩類等が挙げられる。これらの酸触媒は、単独で用いてもよく、2種以上を組み合わせて用いてもよい。
ノボラック樹脂(a-2)のポリスチレン換算の重量平均分子量(Mw;以下、単に「重量平均分子量」ともいう。)は、感光性組成物を用いて形成される硬化物の加熱によるフローに対する耐性の観点から、下限値として2000が好ましく、5000がより好ましく、10000が特に好ましく、15000がさらに好ましく、20000が最も好ましく、上限値として50000が好ましく、45000がより好ましく、40000がさらに好ましく、35000が最も好ましい。
アルカリ可溶性樹脂(A1-2)としては、加熱により変形しにくく、高い耐水性を有する硬化物を形成しやすい点から、エポキシ化合物(a-3a)と不飽和基含有カルボン酸(a-3b)との反応物に、多塩基酸無水物(a-3c)が付加した付加体を含んでいてもよい。かかる付加体について、「変性エポキシ樹脂(a-3)」とも記す。
なお、本出願の明細書及び特許請求の範囲において、上記の定義に該当する化合物であって、前述のカルド構造を有する樹脂(a-1)に該当しない化合物を、変性エポキシ樹脂(a-3)とする。
変性エポキシ樹脂(a-3)は、不飽和基含有カルボン酸(a-3b)に由来する不飽和着を有するため、光重合性樹脂(A1-1)にも該当する。
エポキシ化合物(a-3a)は、エポキシ基を有する化合物であれば特に限定されず、芳香族基を有する芳香族エポキシ化合物であっても、芳香族基を含まない脂肪族エポキシ化合物であってもよく、芳香族基を有する芳香族エポキシ化合物が好ましい。
エポキシ化合物(a-3a)は、単官能エポキシ化合物であっても、2官能以上の多官能エポキシ化合物であってもよく、多官能エポキシ化合物が好ましい。
ビフェニル骨格を有するエポキシ化合物は、主鎖に下記式(a-3a-1)で表されるビフェニル骨格を少なくとも1つ以上有するのが好ましい。
ビフェニル骨格を有するエポキシ化合物は、2以上のエポキシ基を有する多官能エポキシ化合物であるのが好ましい。
ビフェニル骨格を有するエポキシ化合物を用いることにより、感度と現像性とのバランスに優れ、基板への密着性に優れた硬化物を形成できる感光性組成物を得やすい。
置換基の例としては、炭素原子数1以上4以下のアルキル基、炭素原子数1以上4以下のアルコキシ基、炭素原子数2以上4以下の脂肪族アシル基、ハロゲン原子、シアノ基、及びニトロ基が挙げられる。
変性エポキシ化合物(a-3)と調製するにあたって、エポキシ化合物(a-3a)と、不飽和基含有カルボン酸(a-3b)とを反応させる。
不飽和基含有カルボン酸(a-3b)としては、分子中にアクリル基やメタクリル基等の反応性の不飽和二重結合を含有するモノカルボン酸が好ましい。このような不飽和基含有カルボン酸としては、例えば、アクリル酸、メタクリル酸、β-スチリルアクリル酸、β-フルフリルアクリル酸、α-シアノ桂皮酸、桂皮酸等を挙げることができる。また、不飽和基含有カルボン酸(a-3b)は、単独又は2種類以上を組み合わせて用いてもよい。
エポキシ化合物(a-3a)の使用量と不飽和基含有カルボン酸(a-3b)の使用量との比率が、前記の当量比で1:0.5~1:2であると、架橋効率が向上する傾向があり好ましい。
多塩基酸無水物(a-3c)は、2個以上のカルボキシ基を有するカルボン酸の無水物である。
多塩基酸無水物(a-3c)としては、特に限定されないが、例えば、無水マレイン酸、無水コハク酸、無水イタコン酸、無水フタル酸、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、無水トリメリット酸、無水ピロメリット酸、ベンゾフェノンテトラカルボン酸二無水物、3-メチルヘキサヒドロフタル酸無水物、4-メチルヘキサヒドロ無水フタル酸、3-エチルヘキサヒドロ無水フタル酸、4-エチルヘキサヒドロ無水フタル酸、テトラヒドロ無水フタル酸、3-メチルテトラヒドロ無水フタル酸、4-メチルテトラヒドロ無水フタル酸、3-エチルテトラヒドロ無水フタル酸、4-エチルテトラヒドロ無水フタル酸、下記式(a-3c-1)で表される化合物、及び下記式(a-3c-2)で表される化合物を挙げることができる。また、多塩基酸無水物(a-3c)は、単独又は2種類以上を組み合わせて用いてもよい。
また、使用量比は、エポキシ化合物(a-3a)と不飽和基含有カルボン酸(a-3b)との反応後の成分中のOH基のモル数と、多塩基酸無水物(a-3c)の酸無水物基の当量比で、通常1:1~1:0.1であり、好ましくは1:0.8~1:0.2である。上記範囲とすることにより、現像性が良好である感光性組成物を得やすい。
アクリル系樹脂(a-4)もまたアルカリ可溶性樹脂(A1-2)を構成する成分として好ましい。
アクリル系樹脂(a-4)としては、(メタ)アクリル酸に由来する構成単位、及び/又は(メタ)アクリル酸エステル等の他のモノマーに由来する構成単位を含む樹脂を用いることができる。(メタ)アクリル酸は、アクリル酸、又はメタクリル酸である。(メタ)アクリル酸エステルは、下記式(a-4-1)で表される化合物であって、本発明の目的を阻害しない限り特に限定されない。
アクリロイルオキシ基やメタアクリロイルオキシ基等の、不飽和二重結合を有するアシル基は、例えば、エポキシ基を有する構成単位を含むアクリル系樹脂(a-4)における、エポキシ基の少なくとも一部に、アクリル酸やメタクリル酸等の不飽和カルボン酸を反応させることにより製造することができる。
エポキシ基の少なくとも一部に、不飽和カルボン酸を反応させた後に、反応により生成した基に多塩基酸無水物を反応させてもよい。
アクリル系樹脂(a-4)が、上記の範囲内の量の不飽和二重結合を有する構成単位を含むことにより、アクリル系樹脂をレジスト膜内の架橋反応に取り込んで均一化できるため硬化膜の耐熱性、機械特性の向上に有効である。
感光性組成物は、単独で、又は前述の樹脂(A1)と組み合わせて、光重合性モノマー(A2)を含んでいてもよい。光重合性モノマー(A2)としては、従来より感光性組成物に配合されている化合物を特に制限なく用いることができる。
式(a-02)中、環Z01は芳香族炭化水素環を示し、X01は単結合又は-S-で示される基を示し、R01は単結合、炭素原子数1以上4以下のアルキレン基、又は、水酸基で置換されていてもよい炭素原子数が1以上4以下であるアルキレンオキシ基を示し、R01がアルキレンオキシ基である場合、アルキレンオキシ基中の酸素原子が環Z01と結合し、R02は、1価炭化水素基、水酸基、-OR4Aで示される基、-SR4Bで示される基、アシル基、アルコキシカルボニル基、ハロゲン原子、ニトロ基、シアノ基、メルカプト基、カルボキシ基、アミノ基、カルバモイル基、-NHR4Cで示される基、-N(R4D)2で示される基、スルホ基、又は1価炭化水素基、-OR4Aで示される基、-SR4Bで示される基、アシル基、アルコキシカルボニル基、-NHR4Cで示される基、若しくは-N(R4D)2で示される基に含まれる炭素原子に結合した水素原子の少なくとも一部が1価炭化水素基、水酸基、-OR4aで示される基、-SR4Bで示される基、アシル基、アルコキシカルボニル基、ハロゲン原子、ニトロ基、シアノ基、メルカプト基、カルボキシ基、アミノ基、カルバモイル基、-NHR4Cで示される基、-N(R4D)2で示される基、メシルオキシ基、若しくはスルホ基で置換された基を示し、R4A~R4Dは独立に1価炭化水素基を示し、Mは0以上の整数を示し、R03は、水素原子、ビニル基、又は(メタ)アクリロイル基であり、2つのR03のうちの少なくとも1つがビニル基又は(メタ)アクリロイル基であり、
W01とW02との双方がR03として水素原子を有することはなく、
環Y01及び環Y02は同一の又は異なる芳香族炭化水素環を示し、R00は単結合、置換基を有してもよいメチレン基、置換基を有してもよく、2個の炭素原子間にヘテロ原子を含んでもよいエチレン基、-O-で示される基、-NH-で示される基、又は-S-で示される基を示し、R3A及びR3Bは独立にシアノ基、ハロゲン原子、又は1価炭化水素基を示し、N1及びN2は独立に0~4の整数を示す。)
で表される化合物を含むのも好ましい。
さらに、上記式(a-01)で表される化合物は、高い硬度を有する硬化物を与える。
スルフィド化合物(A2-1)は、下記式(a2-1)で表される化合物である。
(メタ)アクリレート化合物(A2-2)は、下記式(a2-2)で表される化合物である。
アルコキシ基の具体例としては、メトキシ基、エトキシ基、n-プロピルオキシ基、イソプロピルオキシ基、n-ブチルオキシ基、イソブチルオキシ基、sec-ブチルオキシ基、及びtert-ブチルオキシ基が挙げられる。これらの中では、メトキシ基、及びエトキシ基が好ましく、メトキシ基がより好ましい。
m1は、0以上5以下の整数であり、0又は1が好ましく、0がより好ましい。
感光性組成物は、光重合開始剤(B)として、フォスフィンオキサイド化合物(B1)と、オキシムエステル化合物(B2)とを組み合わせて含む。フォスフィンオキサイド化合物(B1)の質量W1とオキシムエステル化合物(B2)の質量W2との合計に対する、オキシムエステル化合物(B2)の質量W2の質量の比率が35質量%以上である。
かかる光重合開始剤(B)を用いることにより、感光性組成物を用いて、高い屈折率と高い透明性とを兼ね備える硬化物を形成できる。フォスフィンオキサイド化合物(B1)と、オキシムエステル化合物(B2)とを組み合わせて含む光重合開始剤(B)は、特に硬化物の透明性に寄与する。
所望する効果を得やすい点から、光重合開始剤(B)の質量に対する、フォスフィンオキサイド化合物(B1)の質量と、オキシムエステル化合物(B2)の質量との合計の比率は、80質量%以上が好ましく、90質量%以上がより好ましく、95質量%以上がさらに好ましく、100質量%が特に好ましい。
フォスフィンオキサイド化合物(B1)は、P=O結合を有する5価リン化合物である。フォスフィンオキサイド化合物(B1)として、従来より光重合開始剤として使用されているP=O結合を有する5価リン化合物を特に制限なく用いることができる。
フォスフィンオキサイド化合物の例としては、下記式(b-I)で表される部分構造を有する化合物が挙げられる。
アルキル基の具体例としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基、n-ペンチル基、イソペンチル基、tert-ペンチル基、n-ヘキシル基、n-ヘプチル基、n-オクチル基、2,4,4,-トリメチルペンチル基、2-エチルヘキシル基、n-ノニル基、n-デシル基、n-ウンデシル基、及びn-ドデシル基が挙げられる。
脂肪族アシル基の具体例としては、アセチル基、プロピオニル基、ブタノイル基、ペンタノイル基、ヘキサノイル基、ヘプタノイル基、オクタノイル基、ノナノイル基、デカノイル基、ウンデカノイル基、ドデカノイル基、トリデカノイル基、テトラデカノイル基、ペンタデカノイル基、ヘキサデカノイル基、ヘプタデカノイル基、オクタデカノイル基、ノナデカノイル基、及びイコサノイル基が挙げられる。
オキシムエステル化合物(B2)は、>C=N-O-CO-で表される結合を有する化合物である。オキシムエステル化合物(B2)として、従来より光重合開始剤として使用されている、>C=N-O-CO-で表される結合を有する化合物を特に制限なく用いることができる。
アルキル基が炭素原子上に有してもよい好適な置換基の例としては、炭素原子数1以上20以下のアルコキシ基、炭素原子数3以上10以下のシクロアルキル基、炭素原子数3以上10以下のシクロアルコキシ基、炭素原子数2以上20以下の飽和脂肪族アシル基、炭素原子数2以上20以下のアルコキシカルボニル基、炭素原子数2以上20以下の飽和脂肪族アシルオキシ基、置換基を有してもよいフェニル基、置換基を有してもよいフェノキシ基、置換基を有してもよいフェニルチオ基、置換基を有してもよいベンゾイル基、置換基を有してもよいフェノキシカルボニル基、置換基を有してもよいベンゾイルオキシ基、置換基を有してもよい炭素原子数7以上20以下のフェニルアルキル基、置換基を有してもよいナフチル基、置換基を有してもよいナフトキシ基、置換基を有してもよいナフトイル基、置換基を有してもよいナフトキシカルボニル基、置換基を有してもよいナフトイルオキシ基、置換基を有してもよい炭素原子数11以上20以下のナフチルアルキル基、置換基を有してもよいヘテロシクリル基、置換基を有してもよいヘテロシクリルカルボニル基、アミノ基、1又は2の有機基で置換されたアミノ基、モルホリン-1-イル基、及びピペラジン-1-イル基、ハロゲン、ニトロ基、及びシアノ基等が挙げられる。
フェニル基が炭素原子上に有してもよい好適な置換基の例としては、アルキル基が炭素原子上に有してもよい好適な置換基として上記で例示した基に加えて、炭素原子数1以上20以下のアルキル基が挙げられる。
また、Rb1が水素原子であると、透明性が良好となる傾向があり好ましい。なお、Rb1が水素原子であり且つRb4が後述の式(1a)又は(1b)で表される基であると透明性はより良好となる傾向がある。
アルキル基が有してもよい置換基は、本発明の目的を阻害しない範囲で特に限定されない。置換基の好適な例としては、シアノ基、ハロゲン原子、環状有機基、及びアルコキシカルボニル基が挙げられる。ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子が挙げられる。これらの中では、フッ素原子、塩素原子、臭素原子が好ましい。環状有機基としては、シクロアルキル基、芳香族炭化水素基、ヘテロシクリル基が挙げられる。シクロアルキル基の具体例としては、Rb1がシクロアルキル基である場合の好適な例と同様である。芳香族炭化水素基の具体例としては、フェニル基、ナフチル基、ビフェニリル基、アントリル基、及びフェナントリル基等が挙げられる。ヘテロシクリル基の具体例としては、Rb1がヘテロシクリル基である場合の好適な例と同様である。Rb1がアルコキシカルボニル基である場合、アルコキシカルボニル基に含まれるアルコキシ基は、直鎖状でも分岐鎖状でもよく、直鎖状が好ましい。アルコキシカルボニル基に含まれるアルコキシ基の炭素原子数は、1以上10以下が好ましく、1以上6以下がより好ましい。
その他の光重合開始剤(B3)として具体的には、1-ヒドロキシシクロヘキシルフェニルケトン、2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン、1-〔4-(2-ヒドロキシエトキシ)フェニル〕-2-ヒドロキシ-2-メチル-1-プロパン-1-オン、1-(4-イソプロピルフェニル)-2-ヒドロキシ-2-メチルプロパン-1-オン、1-(4-ドデシルフェニル)-2-ヒドロキシ-2-メチルプロパン-1-オン、2,2-ジメトキシ-1,2-ジフェニルエタン-1-オン、ビス(4-ジメチルアミノフェニル)ケトン、2-メチル-1-〔4-(メチルチオ)フェニル〕-2-モルフォリノプロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルフォリノフェニル)-ブタン-1-オン、4-ベンゾイル-4’-メチルジメチルスルフィド、4-ジメチルアミノ安息香酸、4-ジメチルアミノ安息香酸メチル、4-ジメチルアミノ安息香酸エチル、4-ジメチルアミノ安息香酸ブチル、4-ジメチルアミノ-2-エチルヘキシル安息香酸、4-ジメチルアミノ-2-イソアミル安息香酸、ベンジル-β-メトキシエチルアセタール、ベンジルジメチルケタール、1-フェニル-1,2-プロパンジオン-2-(O-エトキシカルボニル)オキシム、o-ベンゾイル安息香酸メチル、2,4-ジエチルチオキサントン、2-クロロチオキサントン、2,4-ジメチルチオキサントン、1-クロロ-4-プロポキシチオキサントン、チオキサンテン、2-クロロチオキサンテン、2,4-ジエチルチオキサンテン、2-メチルチオキサンテン、2-イソプロピルチオキサンテン、2-エチルアントラキノン、オクタメチルアントラキノン、1,2-ベンズアントラキノン、2,3-ジフェニルアントラキノン、アゾビスイソブチロニトリル、ベンゾイルパーオキシド、クメンヒドロペルオキシド、2-メルカプトベンゾイミダゾール、2-メルカプトベンゾオキサゾール、2-メルカプトベンゾチアゾール、2-(o-クロロフェニル)-4,5-ジ(m-メトキシフェニル)-イミダゾリル二量体、ベンゾフェノン、2-クロロベンゾフェノン、p,p’-ビスジメチルアミノベンゾフェノン、4,4’-ビスジエチルアミノベンゾフェノン、4,4’-ジクロロベンゾフェノン、3,3-ジメチル-4-メトキシベンゾフェノン、ベンジル、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾイン-n-ブチルエーテル、ベンゾインイソブチルエーテル、ベンゾインブチルエーテル、アセトフェノン、2,2-ジエトキシアセトフェノン、p-ジメチルアセトフェノン、p-ジメチルアミノプロピオフェノン、ジクロロアセトフェノン、トリクロロアセトフェノン、p-tert-ブチルアセトフェノン、p-ジメチルアミノアセトフェノン、p-tert-ブチルトリクロロアセトフェノン、p-tert-ブチルジクロロアセトフェノン、α,α-ジクロロ-4-フェノキシアセトフェノン、チオキサントン、2-メチルチオキサントン、2-イソプロピルチオキサントン、ジベンゾスベロン、ペンチル-4-ジメチルアミノベンゾエート、9-フェニルアクリジン、1,7-ビス-(9-アクリジニル)ヘプタン、1,5-ビス-(9-アクリジニル)ペンタン、1,3-ビス-(9-アクリジニル)プロパン、p-メトキシトリアジン、2,4,6-トリス(トリクロロメチル)-s-トリアジン、2-メチル-4,6-ビス(トリクロロメチル)-s-トリアジン、2-[2-(5-メチルフラン-2-イル)エテニル]-4,6-ビス(トリクロロメチル)-s-トリアジン、2-[2-(フラン-2-イル)エテニル]-4,6-ビス(トリクロロメチル)-s-トリアジン、2-[2-(4-ジエチルアミノ-2-メチルフェニル)エテニル]-4,6-ビス(トリクロロメチル)-s-トリアジン、2-[2-(3,4-ジメトキシフェニル)エテニル]-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(4-メトキシフェニル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(4-エトキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(4-n-ブトキシフェニル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2,4-ビス-トリクロロメチル-6-(3-ブロモ-4-メトキシ)フェニル-s-トリアジン、2,4-ビス-トリクロロメチル-6-(2-ブロモ-4-メトキシ)フェニル-s-トリアジン、2,4-ビス-トリクロロメチル-6-(3-ブロモ-4-メトキシ)スチリルフェニル-s-トリアジン、2,4-ビス-トリクロロメチル-6-(2-ブロモ-4-メトキシ)スチリルフェニル-s-トリアジン等が挙げられる。
感光性組成物は、塗布性の調整の目的等で溶媒(S)を含んでいてもよい。溶媒(S)の種類は特に限定されないが、典型的には有機溶媒である。
また、感光性組成物が溶媒(S)を含む場合、感光性組成物における溶媒(S)の含有量は、1質量%以上でもよく、5質量%以上でもよく、10質量%以上でもよく、20質量%以上でもよく、30質量%以上でもよい。
この場合、ディスプレイパネルを構成する種々の部材にダメージを与えないために、高屈折率膜形成時の溶媒(S)の揮発や、高屈折率膜に残留する溶媒(S)に由来するアウトガスの発生が少ないことが望まれる。
溶媒(S)の揮発やアウトガスの問題は、感光性組成物における溶媒(S)の含有量を低減することにより解消され得る。しかし、一般的には、感光性組成物等において溶媒の含有量を低減する場合、組成物の塗布性が著しく損なわれ、特にインクジェット法等の塗布方法への適用が困難である。
感光性組成物の粘度は、例えば、基材成分(A)、及び溶媒(S)等の含有量を調整すること等によって調整することができる。
溶媒(S)の揮発やアウトガスの問題を考慮する場合、感光性組成物は、溶媒(S)を実質的に含まないのが最も好ましい。感光性組成物が溶媒(S)を実質的に含まないとは、原料等に付随してごく少量の溶媒(S)が不可避的に感光性組成物に持ち込まれる他、感光性組成物に意図的に溶媒(S)が加えられていないことを言う。
感光性組成物が溶媒(S)を実質的に含まない場合の、感光性組成物の溶媒(S)の含有量は、例えば0.2質量%以下であり、0.15質量%以下が好ましく、0.1質量%以下がより好ましく、0.05質量%以下がさらに好ましい。
感光性組成物は、本発明の目的を阻害しない範囲で、以上説明した成分の他に、従来から感光性組成物に配合されている種々の添加剤を含んでいてもよい。感光性組成物に配合される好ましい添加剤としては、分散剤、シランカップリング剤等の密着促進剤、酸化防止剤、凝集防止剤、消泡剤、界面活性剤等が挙げられる。界面活性剤としては、特に限定されず、フッ素系界面活性剤、シリコン系界面活性剤等の公知の成分を用いることができる。
感光性組成物が、上記の金属化合物粒子を含む場合、高屈折率を示す硬化物の形成が特に容易である。
感光性組成物中の金属化合物粒子の含有量が上記の範囲内であることにより、低粘度の感光性組成物を得やすく、また、高屈折率の硬化物を形成しやすい。
以上説明した成分を、それぞれ所定量混合したのち、混合物を均一に撹拌することにより感光性組成物が得られる。
以上説明した感光性組成物は、典型的には、
感光性組成物を、形成される硬化物の形状に応じて成形することと、
成形された感光性組成物に対して露光することと、
を含む方法によって、硬化物とされる。
硬化物の形状がレンズ形状やプリズム形状等である場合には、硬化物の形状に応じた鋳型中に感光性組成物をスキージ等を用いて充填してもよい。
硬化物の形状がライン形状等である場合、硬化物の形状に応じて、基材上に感光性組成物を塗布すればよい。塗布方法としては、例えば、インクジェット法等の印刷法が挙げられる。
また、感光性組成物が、基材成分(A)としてアルカリ可溶性樹脂(A1-2)を含む場合、アルカリ現像液や有機溶媒を現像液として用いるフォトリソグラフィー法によって、ライン形状、ドット形状等の任意の形状にパターニングされた硬化物を形成することができる。
硬化物を膜形状に塗布する方法としては、ロールコータ、リバースコータ、バーコータ等の接触転写型塗布装置や、スピンナー(回転式塗布装置)、カーテンフローコータ等の非接触型塗布装置を用いる方法が挙げられる。また、インクジェット法等の印刷法によって感光性組成物を膜形状に塗布することもできる。
また、前述の感光性組成物を、3Dプリンティング法に適用して、インクジェット印刷と、露光による硬化とを繰り返して薄膜状の硬化物を積層することにより、所望する形状の硬化物を形成してもよい。
成形された感光性組成物に対する露光は、例えば、紫外線、エキシマレーザー光等の活性エネルギー線を照射して行われる。
現像液としては、モノエタノールアミン、ジエタノールアミン、トリエタノールアミン等の有機系の現像液や、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、アンモニア、4級アンモニウム塩等の水溶液が挙げられる。
現像処理を行う場合、現像後に加熱による乾燥等の方法により、現像液を十分に除去するのが好ましい。
また、前述の感光性組成物を用いて得られる硬化物は、耐屈曲性に優れ、折り曲げても割れにくいため、フレキシブルデバイスにおいて好適に用いられる。例えば、上記の硬化物からなる厚さ50nmのフィルムを、半径6mm、好ましくは半径2mmの円柱状のステンレス棒に巻き付けた場合に、割れが生じない。
(B1-1):ビス(2,4,6-トリメチルベンゾイル)-フェニルフォスフィンオキサイド。
(B1-2):2,4,6-トリメチルベンゾイル-ジフェニル-フォスフィンオキサイド
(B1-3):エチル(2,4,6-トリメチルベンゾイル)フェニルフォスフィネート
得られた感光性組成物の、25℃にて、E型粘度計を用いて測定した粘度を表1に記す。また、得られた感光性組成物を用いて形成された硬化膜の屈折率と、光透過性とを下記処方に従って測定した。屈折率の測定結果を表1に記す。
ガラス基板上にインクジェット装置を用いて、実施例1~5、及び比較例1~3の感光性組成物を塗布した。その後、395nmのUV-LED露光機を用いて、露光量2J/cm2で塗布膜を露光して硬化させ、厚さ3μmの硬化膜を得た。その膜についてMetricon社製プリズムカプラを用いて光線波長550nmでの屈折率を評価した。
屈折率測定で製膜された膜の光線透過率を、大塚電子製MCPD透過率計を用いて測定した。測定された光透過率に基づいて、以下の基準に従い、実施例1~5、及び比較例1~3の感光性組成物を用いて形成された硬化物の光透過率を評価した。
◎:光透過率が96%以上である。
〇:光透過率が95%以上96%未満である。
△:光透過率が93%以上95%未満である。
×:光透過率が93%未満である。
得られた感光性組成物の、25℃にて、E型粘度計を用いて測定した粘度を表2に記す。また、得られた感光性組成物を用いて形成された硬化膜の屈折率と、光透過性とを前述の処方に従って測定した。屈折率の測定結果を表2に記す。
実施例7~12、及び比較例6~10において、以下の調製例1で得たカルド樹脂である樹脂R1と、構造単位I~IVからなり、各構成単位の量が各単位についての括弧の右下の値(質量%)であるアクリル樹脂である樹脂R2と、メタクリル基を有するメタクリル変性シリコーン樹脂(モノマー組成として、2-(3-(トリエトキシシリルプロピル)カルバモイル)シクロヘキサンカルボン酸(40モル%)、メタクリル酸3-(トリメトキシシリル)プロピル(40モル%)、及びフェニルトリメトキシシラン(20モル%)を含むシルセスキオキサン樹脂)である樹脂R3とを、樹脂(A1)として用いた。樹脂R1と、樹脂R2とはアルカリ可溶性を有する。
まず、500mL四つ口フラスコ中に、ビスフェノールフルオレン型エポキシ樹脂(エポキシ当量235)235g、テトラメチルアンモニウムクロライド110mg、2,6-ジ-tert-ブチル-4-メチルフェノール100mg、及びアクリル酸72.0gを仕込み、これに25mL/分の速度で空気を吹き込みながら90~100℃で加熱溶解した。次に、溶液が白濁した状態のまま徐々に昇温し、120℃に加熱して完全溶解させた。この際、溶液は次第に透明粘稠になったが、そのまま撹拌を継続した。この間、酸価を測定し、1.0mgKOH/g未満になるまで加熱撹拌を続けた。酸価が目標値に達するまで12時間を要した。そして室温まで冷却し、無色透明で固体状の下記式で表されるビスフェノールフルオレン型エポキシアクリレートを得た。
得られた感光性組成物の感度と、得られた感光性組成物を用いて形成された硬化膜の光透過性とを下記処方に従って測定した。これらの測定結果を表2に記す。
ガラス基板上に実施例及び比較例の感光性組成物スピンコートし、100℃2分で乾燥させた。その後395nmのUV-LED露光機を用いて露光し、塗膜を得た。得られた膜をTMAH(水酸化テトラメチルアンモニウム)の濃度2.38質量%の水溶液に浸漬し、2分後ガラス基板を取り出した。その後、純粋でリンスし、乾燥させた後膜厚を測定する。その時のTMAH浸漬後の膜厚が、TMAH浸漬前の膜厚の90%以上である露光量が200mJ/cm2以下である場合を◎と判定し、200mJ/cm2超1J/cm2以下である場合を○と判定した。また、露光量1J/cm2でも硬化しない場合を×として判定した。
ガラス基板上に、実施例7~12、及び比較例6~10の感光性組成物をスピンコートし、100℃2分で乾燥した。その後、395nmのUV-LED露光機を用いて、露光量2J/cm2で塗布膜を露光して硬化させ、厚さ3μmの硬化膜を得た。
得られた硬化膜の光線透過率を、大塚電子製MCPD透過率計を用いて測定した。測定された光透過率に基づいて、以下の基準に従い、実施例5~10、及び比較例6~10の感光性組成物を用いて形成された硬化物の光透過率を評価した。
◎:光透過率が95%以上である。
〇:光透過率が93%以上95%未満である。
×:光透過率が93%未満である。
Claims (7)
- 基材成分(A)と、光重合開始剤(B)とを含む、感光性組成物であって、
前記基材成分(A)が、樹脂(A1)及び光重合性モノマー(A2)の少なくとも一方を含み、
前記基材成分(A)が、前記光重合性モノマー(A2)を含まない場合、前記樹脂(A1)がエチレン性不飽和二重結合を有する光重合性樹脂(A1-1)を含み、
前記光重合開始剤(B)が、フォスフィンオキサイド化合物(B1)と、オキシムエステル化合物(B2)とを組み合わせて含み、
前記フォスフィンオキサイド化合物(B1)の質量W1と前記オキシムエステル化合物(B2)の質量W2との合計に対する、前記オキシムエステル化合物(B2)の質量W2の質量の比率が35質量%以上である、感光性組成物。 - 前記オキシムエステル化合物(B2)が、吸光スペクトルにおいて、320nm以上400nm未満の波長域においてピークを有し、且つ、400nm以上の波長域のいずれかの波長において10以上のグラム吸光係数を示す化合物を含まない、請求項1に記載の感光性組成物。
- 前記基材成分(A)が、前記樹脂(A1)及び前記光重合性モノマー(A2)を含む、請求項1~3のいずれか1項に記載の感光性組成物。
- 前記基材成分(A)が、前記樹脂(A1)を含み、
前記樹脂(A1)が、アルカリ可溶性を有する、請求項1~4のいずれか1項に記載の感光性組成物。 - 請求項1~5のいずれか1項に記載の感光性組成物の硬化物。
- 請求項1~5のいずれか1項に記載の感光性組成物を、形成される硬化物の形状に応じて成形することと、
成形された前記感光性組成物に対して露光することと、
を含む硬化物の製造方法。
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JP2014115545A (ja) * | 2012-12-12 | 2014-06-26 | Toyo Ink Sc Holdings Co Ltd | 感光性着色組成物、およびカラーフィルタ |
JP2015067733A (ja) * | 2013-09-30 | 2015-04-13 | 大日本印刷株式会社 | 樹脂組成物、それを用いたタッチパネル用透明膜およびタッチパネル |
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JP2017211650A (ja) * | 2016-05-24 | 2017-11-30 | 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. | 感光性樹脂組成物及びそれから製造される光硬化パターン |
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