WO2020118888A1 - 掩膜板组件及膜层制作方法 - Google Patents

掩膜板组件及膜层制作方法 Download PDF

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Publication number
WO2020118888A1
WO2020118888A1 PCT/CN2019/075030 CN2019075030W WO2020118888A1 WO 2020118888 A1 WO2020118888 A1 WO 2020118888A1 CN 2019075030 W CN2019075030 W CN 2019075030W WO 2020118888 A1 WO2020118888 A1 WO 2020118888A1
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WIPO (PCT)
Prior art keywords
area
mask
light
display area
transmitting
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Application number
PCT/CN2019/075030
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English (en)
French (fr)
Inventor
周思思
Original Assignee
武汉华星光电半导体显示技术有限公司
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Application filed by 武汉华星光电半导体显示技术有限公司 filed Critical 武汉华星光电半导体显示技术有限公司
Priority to US16/485,442 priority Critical patent/US20210355573A1/en
Publication of WO2020118888A1 publication Critical patent/WO2020118888A1/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Definitions

  • the present application relates to the technical field of display panels, and in particular, to a mask assembly, a method for manufacturing a film layer using the mask assembly, and a display panel using the film layer.
  • the non-display area on the display panel has been compressed to become smaller and smaller.
  • the mobile phone display 1 shown in FIGS. 1A and 1B has a display area 11 and a binding area 12.
  • a notch (shaped area) 13 is provided at the upper end of the display area 11 shown in FIGS. 1A and 1B, and the device such as the front camera of the mobile phone and the earpiece is arranged in the notch 13 in.
  • the purpose of the present application is to provide a mask plate assembly.
  • a film layer can be formed in a display area having at least one light-transmitting area, so that the films The layer is only formed in an area of the display area that does not include the light-transmitting area to increase the screen-to-body ratio.
  • the present application provides a mask assembly for forming a film layer of a display area including at least a light-transmitting area and a non-light-transmitting area.
  • the light transmission area is a closed figure, and the boundary of the light transmission area is independent of the boundary with the display area.
  • the mask plate assembly includes two mask plates, and each of the mask plates has an opening area.
  • the opening areas of the two mask plates are complementary in shape, and the non-light-transmitting area of the display area is formed after splicing.
  • the shapes of the opening areas of the two mask plates have overlapping parts.
  • the sum of the area of the opening areas of the two mask plates is larger than the area of the non-transmissive area of the display area.
  • the present application also provides a mask plate assembly for forming a film layer in a display area.
  • the display area includes at least one light-transmitting area and a non-light-transmitting area.
  • the mask plate assembly includes at least two mask plates, and each of the mask plates has an opening area; wherein, the opening areas of the mask plates are complementary in shape, and after splicing, they form a non-transparent area of the display area Light area; and, the shape of the opening area of each of the mask plates has coincident portions.
  • the light-transmitting area is a closed figure, and the boundary of the light-transmitting area is independent of the boundary with the display area.
  • the total area of the opening areas of the mask plates is larger than the area of the non-transmissive area of the display area.
  • the mask plate assembly includes two mask plates.
  • the present application also provides a method for manufacturing a film layer.
  • the manufacturing method uses any one of the above mask plate assemblies, and uses each mask plate as a shielding layer to perform vapor deposition of the same material to form at least one light-transmitting area The vapor deposition film of the display area.
  • the vapor-deposited film layer is a cathode layer or a thin film encapsulation functional layer.
  • the present application also provides a display panel having a display area and a light-transmitting area formed in the display area.
  • the light transmission area is a closed figure, and the boundary of the light transmission area is independent of the boundary with the display area.
  • the present application also provides a method for manufacturing the above display panel, including using any one of the above mask plate assemblies, using each mask plate as a shielding layer to vaporize the same material to form a display area having at least one light-transmitting area A vapor-deposited film layer; wherein, the vapor-deposited film layer is a cathode layer or a thin film encapsulation functional layer.
  • the purpose of vaporizing the functional layer in the display area of the display panel and not in the light-transmitting area can be achieved by using multi-step evaporation of the same material, thereby further improving the display The screen ratio of the panel.
  • FIG. 1A and 1B are schematic structural diagrams of a mobile phone display screen in the prior art
  • FIG. 2 is a schematic structural diagram of a display panel according to an embodiment of the present application.
  • 3A and 3B are schematic structural diagrams of a mask assembly according to an embodiment of the present application.
  • FIGS. 4A and 4B are schematic structural diagrams of a mask assembly according to another embodiment of the present application.
  • 5A and 5B are schematic structural diagrams of a mask assembly according to another embodiment of the present application.
  • 6A and 6B are schematic structural diagrams of a film manufacturing process according to an embodiment of the present application.
  • the first feature "above” or “below” the second feature may include the direct contact of the first and second features, or may include the first and second features Contact not directly but through another feature between them.
  • the first feature is “above”, “above” and “above” the second feature includes that the first feature is directly above and obliquely above the second feature, or simply means that the first feature is higher in level than the second feature.
  • the first feature is “below”, “below” and “below” the second feature includes that the first feature is directly below and obliquely below the second feature, or simply means that the first feature is less horizontal than the second feature.
  • this embodiment provides a display panel as shown in FIG. 2.
  • the display panel 2 has a display area 21, and a light-transmitting area 210 is formed in the display area 21 for setting a front camera.
  • the light-transmitting area 210 is a closed figure, and the boundary of the light-transmitting area 210 is independent of the boundary with the display area 21, so that the display area 21 is divided into the light-transmitting area 210 ⁇ 211.
  • the light-transmitting area 210 may be circular, rectangular, or shaped.
  • the circular light-transmitting area 210 shown in FIG. 2 is only an example, and is not used to limit the shape of the light-transmitting area 210.
  • the light-transmitting area 210 may be located at any position within the display area 21, and is not limited to the upper left corner position shown in FIG. 2.
  • the display area 21 may further include a plurality of light-transmitting areas 210.
  • the display panel 2 shown in FIG. 2 is taken as an example to explain in detail the mask assembly provided by the present application and the application of the mask assembly to obtain a film layer forming a display area with a sealed and independent light-transmitting area.
  • the shapes of the display area 21 and the light-transmitting area 210 are not limited to the shapes shown in the drawings, and the position of the light-transmitting area 210 in the display area 21 It is not limited by the position shown in the drawing.
  • this embodiment provides a mask assembly 10.
  • the mask assembly 10 includes a first mask 110 as shown in FIG. 3A and a second mask 120 as shown in FIG. 3B.
  • the first mask 110 has a first opening area 111
  • the second mask 120 has a second opening area 121.
  • the first opening area 111 is complementary to the second opening area 121, and after splicing, the non-light-transmitting area 211 of the display area 21 shown in FIG. 2 is formed.
  • the shapes of the first opening area 111 and the second opening area 121 have overlapping portions (131a, 131b).
  • the sum of the areas of the first opening area 111 and the second opening area 121 is actually larger than the area of the non-light-transmitting area 211 shown in FIG. 2 (that is, the area of the display area 21 and the light-transmitting area 210 Difference in area).
  • the vertical projections of the first opening area 111 and the second opening area 121 are complementary, and can form the non-light-transmitting area 211 shown in FIG. 2 (that is, the display area 21 removes the light-transmitting area The remaining area after 210).
  • the vertical projections of the first opening area 111 and the second opening area 121 have overlapping portions (131a, 131b), so that a complete and continuous film layer can be obtained in the film layer manufacturing process which will be described in detail below .
  • the overlapping portions (131a, 131b) may be located in the first opening area 111 shown in FIG. 3A, and of course may also be located in the second opening area 121 shown in FIG. 3B. Or, the first opening area 111 and the second opening area 121 respectively have an overlapping portion.
  • the non-light-transmitting area 211 of the display area 21 may be sufficient, and may not be limited to the shapes shown in FIGS. 3A and 3B, or may be the shapes shown in FIGS. 4A and 4B and FIGS. 5A and 5B.
  • the first mask 110 and the second mask 120 may also have a first frame 112 and a second frame 122, respectively.
  • the film layer manufacturing process of the display panel 2 shown in FIG. 2 is explained: the first of the mask assembly 10 shown in FIG. 3A
  • the mask plate 110 is a shielding layer, and is vapor-deposited on a film-forming substrate 30 to obtain a first partial film layer 41 as shown in FIG. 6A; and then the second part of the mask plate assembly 10 shown in FIG. 3B
  • the mask plate 120 is vapor-deposited as a shielding layer to obtain a second partial film layer 42 in the same layer as the first partial film layer 41, as shown in FIG. 6B.
  • the first opening area 111 is complementary to the second opening area 121 and can constitute the non-light-transmitting area 211 shown in FIG. 2 (that is, the remaining area of the display area 21 after the light-transmitting area 210 is removed) . Therefore, the obtained first partial film layer 41 and second partial film layer 42 shown in FIG. 6B can completely cover the non-light-transmitting area 211 shown in FIG. 2 (ie, the display area 21 removes the light-transmitting area The remaining area after 210). Moreover, since the vertical projections of the first opening area 111 of the first mask 110 and the second opening area 121 of the second mask 120 have overlapping portions (131a, 131b in FIG.
  • the first A part of the film layer 41 and the second part of the film layer 42 have overlapping portions (43a, 43b in FIG. 6B).
  • a film that completely covers the display area 21 of the display panel 2 and removes the light-transmitting area 210 can be obtained Layer 40.
  • the film layer 40 may be a cathode layer or a thin-film encapsulation functional layer, and those skilled in the art should know that a complete thin-film transistor and light-emitting layer structure has been formed on the film-forming substrate 30, or any other known functional layer .
  • the subject of this application can be manufactured and used in industry, with industrial applicability.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

本申请提供一种掩膜板组件，用于形成显示区膜层。所述显示区包括至少一透光区和非透光区。所述掩膜板组件包括至少两块掩膜板，每一所述掩膜板具有一开口区；其中，各所述掩膜板的开口区形状互补，拼接后构成所述显示区的非透光区；并且，各所述掩膜板的开口区的形状具有重合部分。

Description

掩膜板组件及膜层制作方法 技术领域
本申请涉及显示面板技术领域，特别涉及一种掩膜板组件及使用该掩膜板组件膜层制作方法和使用该种膜层的显示面板。
 背景技术
近年来，为了提高电子产品的屏占比，显示面板上的非显示区域被压缩得越来越小。例如，在图1A和图1B所示的手机显示屏1中，具有一显示区11和一绑定区12。为了尽量减小非显示区面积，在图1A和图1B所示的显示区11的上端设置一缺口（异形区）13，用于将手机的前置摄像头和听筒等装置设置在所述缺口13中。
 技术问题
然而，在显示区域设置缺口影响了显示区域的规则性和完整性，因此也无法实现电子设备的全屏显示。
因而，需要一种新的显示面板的结构，以提高电子产品的屏占比，从而实现全屏显示。
 技术解决方案
本申请的目的在于提供一种掩膜板组件，通过多块掩膜板及各掩膜板的开口区设计，可以在一具有至少一透光区的显示区内形成膜层，使得该些膜层仅形成于所述显示区中不包含所述透光区的区域内，以提高屏占比。
为了达到上述目的，本申请提供一种掩膜板组件，用于形成包括至少一透光区及一非透光区的显示区的膜层。所述透光区为一封闭图形，并且所述透光区的边界独立于与所述显示区的边界。所述掩膜板组件包括两块掩膜板，每一所述掩膜板具有一开口区。所述两块掩膜板的开口区形状互补，拼接后构成所述显示区的非透光区。所述两块掩膜板的开口区的形状具有重合部分。并且，所述两块掩膜板的开口区的面积之和大于所述显示区的所述非透光区的面积。
本申请还提供一种掩膜板组件，用于形成显示区膜层，所述显示区包括至少一透光区和非透光区。所述掩膜板组件包括至少两块掩膜板，每一所述掩膜板具有一开口区；其中，各所述掩膜板的开口区形状互补，拼接后构成所述显示区的非透光区；并且，各所述掩膜板的开口区的形状具有重合部分。
在一实施例中，所述透光区为一封闭图形，并且所述透光区的边界独立于与所述显示区的边界。
在一实施例中，各所述掩膜板的开口区的面积之和大于所述显示区的所述非透光区的面积。
在一实施例中，所述掩膜板组件包括两块掩膜板。
本申请还提供一种膜层的制作方法，所述制作方法使用上述任意一种掩膜板组件，以各掩膜板作为遮挡层进行同一材料的蒸镀，用以形成具有至少一透光区的显示区的蒸镀膜层。
在一实施例中，所述蒸镀膜层为阴极层或薄膜封装功能层。
本申请还提供一种显示面板，具有一显示区和形成于所述显示区内的一透光区。所述透光区为一封闭图形，并且所述透光区的边界独立于与所述显示区的边界。
本申请还提供上述显示面板的制作方法，包括使用上述任意一种掩膜板组件，以各掩膜板作为遮挡层进行同一材料的蒸镀，用以形成具有至少一透光区的显示区的蒸镀膜层；其中，所述蒸镀膜层为阴极层或薄膜封装功能层。
 有益效果
在本申请中，通过多块掩膜板的结构设计，可以通过利用多步蒸镀同一材料实现在显示面板的显示区内且不在透光区上蒸镀功能层的目的，从而进一步提高了显示面板的屏占比。
 附图说明
为了更清楚地说明本申请实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1A和图1B为现有技术中手机显示屏的结构示意图；
图2为根据本申请一实施例的显示面板的结构示意图；
图3A和图3B为根据本申请一实施例的掩膜板组件的结构示意图；
图4A和图4B为根据本申请另一实施例的掩膜板组件的结构示意图；
图5A和图5B为根据本申请另一实施例的掩膜板组件的结构示意图；
图6A和图6B为根据本申请一实施例的膜层制作过程的结构示意图。
 本发明的实施方式
下面详细描述本发明的实施方式，所述实施方式的示例在附图中示出，其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施方式是示例性的，仅用于解释本发明，而不能理解为对本发明的限制。
在本发明中，除非另有明确的规定和限定，第一特征在第二特征之“上”或之“下”可以包括第一和第二特征直接接触，也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且，第一特征在第二特征“之上”、“上方”和“上面”包括第一特征在第二特征正上方和斜上方，或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”包括第一特征在第二特征正下方和斜下方，或仅仅表示第一特征水平高度小于第二特征。
下文的公开提供了许多不同的实施方式或例子用来实现本发明的不同结构。为了简化本发明的公开，下文中对特定例子的部件和设置进行描述。当然，它们仅仅为示例，并且目的不在于限制本发明。此外，本发明可以在不同例子中重复参考数字和/或参考字母，这种重复是为了简化和清楚的目的，其本身不指示所讨论各种实施方式和/或设置之间的关系。此外，本发明提供了的各种特定的工艺和材料的例子，但是本领域普通技术人员可以意识到其他工艺的应用和/或其他材料的使用。
为了实现电子设备的全屏显示，本实施例中提供了一种如图2所示的显示面板。如图2所示，在显示面板2中具有一显示区21，在所述显示区21内形成一透光区210，用于设置一前置摄像头。如图2所示，所述透光区210为一封闭图形，并且所述透光区210的边界独立于与所述显示区21的边界，因而使得所述显示区21分为透光区210和非透光区211。所述透光区210可以为圆形，也可以为矩形或异形，图2中所示的圆形透光区210仅作为一范例，不用于限制所述透光区210的形状。此外，所述透光区210可以位于所述显示区21内的任意位置，不限于图2中所显示的左上角位置。再者，所述显示区21内还可以包括多个所述透光区210。
以下，以图2所示的显示面板2作为范例，详细解释本申请提供的掩膜板组件及应用该掩膜板组件获得一形成一密封且边界独立的透光区的显示区的膜层。本领域技术人员可以理解的是，所述显示区21和所述透光区210的形状不以附图所示的形状为限制，并且所述透光区210在所述显示区21内的位置也不以附图所示的位置为限制。
再者，本领域技术人员可以理解的是，本申请所述的掩膜板组件的开口区位置及形状根据所述显示区21和透光区210的形状及相对位置的不同而不同，附图中所示的所述掩膜板组件的形状仅作为一范例，而非限制本申请所述掩膜板组件。
如图3A和3B所示，本实施例提供一种掩膜板组件10。所述掩膜板组件10包括一如图3A所示的第一掩膜板110和一如图3B所示的第二掩膜板120。所述第一掩膜板110具有一第一开口区111，所述第二掩膜板120具有一第二开口区121。所述第一开口区111与所述第二开口区121互补，拼接后构成图2中所示的所述显示区21的非透光区211。并且，所述第一开口区111与所述第二开口区121的形状有重合部分（131a、131b）。即，所述第一开口区111与第二开口区121的面积之和实际上大于图2中所示的非透光区211的面积（即所述显示区21与所述透光区210的面积之差）。
也就是说，所述第一开口区111与第二开口区121的垂直投影是互补的，可以构成图2所示的非透光区211（即，所述显示区21去除所述透光区210后的剩余区域）。并且，所述第一开口区111与所述第二开口区121的垂直投影具有重合部分（131a、131b），这样，可以在下文将详细描述的膜层制作过程中获得完整且连续的膜层。
本领域技术人员可以知晓的是，所述重合部分（131a、131b）可以是位于如图3A所示的第一开口区111中，当然也可以位于图3B所示的第二开口区121中，或是所述第一开口区111与第二开口区121分别具有一重合部分。当然，出于显示面板的厚度、膜层平坦度等考量，所述重合部分（131a、131b）的面积越小越好。
当然，所述第一掩膜板110的所述第一开口区111与所述第二掩膜板120的所述第二开口区121的形状只要满足互补且拼接后构成图2中所示的所述显示区21的非透光区211即可，可以不限于图3A和3B所示的形状，也可以是如图4A和4B、图5A和5B所示的形状。当然，所述第一掩膜板110和所述第二掩膜板120还可以分别具有一第一框架112和一第二框架122。
以下，以图3A和图3B所示的掩膜板组件10为例，阐述图2所示的显示面板2的膜层制作过程：以图3A所示的所述掩膜板组件10的第一掩膜板110为遮挡层，在一成膜基板30上进行蒸镀，获得如图6A所示的第一部分膜层41；随后再以图3B所示的所述掩膜板组件10的第二掩膜板120为遮挡层进行蒸镀，获得与所述第一部分膜层41同层的第二部分膜层42，如图6B所示。
由于所述第一开口区111与所述第二开口区121互补且可以构成图2所示的非透光区211（即，所述显示区21去除所述透光区210后的剩余区域）。因此，图6B中所示的所获得的第一部分膜层41与第二部分膜层42可以完整覆盖图2所示的非透光区211（即，所述显示区21去除所述透光区210后的剩余区域）。并且，由于所述第一掩膜板110的第一开口区111与第二掩膜板120的第二开口区121的垂直投影具有重合部分（图3A中131a、131b），因此，所述第一部分膜层41与第二部分膜层42之间具有重叠部分（图6B中43a、43b）。由此，利用本申请所述的掩膜板组件10，可以获得如图6B及图2所示的，完整覆盖所述显示面板2的所述显示区21且去除所述透光区210的膜层40。所述膜层40可以是阴极层或薄膜封装功能层，而本领域技术人员应当知晓的是，所述成膜基板30上已经形成完整薄膜晶体管及发光层结构，或者其他任何已知的功能层。
本申请已由上述相关实施例加以描述，然而上述实施例仅为实施本申请的范例。必需指出的是，已公开的实施例并未限制本申请的范围。相反地，包含于权利要求书的精神及范围的修改及均等设置均包括于本申请的范围内。
 工业实用性
本申请的主体可以在工业中制造和使用，具备工业实用性。

Claims (10)

  1. 一种掩膜板组件，用于形成包括至少一透光区和非透光区的显示区的膜层，其中，
    所述透光区为一封闭图形，并且所述透光区的边界独立于与所述显示区的边界；
    所述掩膜板组件包括两块掩膜板，每一所述掩膜板具有一开口区；
    所述两块掩膜板的开口区形状互补，拼接后构成所述显示区的非透光区；
    所述两块掩膜板的开口区的形状具有重合部分，并且，
    所述两块掩膜板的开口区的面积之和大于所述显示区的所述非透光区的面积。
  2. 如权利要求1所述的掩膜板组件，其特征在于，所述两块掩膜板均具有一框架。
  3. 一种掩膜板组件，用于形成显示区膜层，所述显示区包括至少一透光区和非透光区，其中，所述掩膜板组件包括至少两块掩膜板，每一所述掩膜板具有一开口区；
    各所述掩膜板的开口区形状互补，拼接后构成所述显示区的非透光区；并且，
    各所述掩膜板的开口区的形状具有重合部分。
  4. 如权利要求3所述的掩膜板组件，其中，所述透光区为一封闭图形，并且所述透光区的边界独立于与所述显示区的边界。
  5. 如权利要求3所述的掩膜板组件，其中，各所述掩膜板的开口区的面积之和大于所述显示区的所述非透光区的面积。
  6. 如权利要求3所述的掩膜板组件，其中，每一所述掩膜板还具有一框架。
  7. 如权利要求3所述的掩膜板组件，其中，所述掩膜板组件包括两块掩膜板。
  8. 一种膜层的制作方法，所述制作方法使用如利要求1所述的掩膜板组件，以各掩膜板作为遮挡层进行同一材料的蒸镀，用以形成具有至少一透光区的显示区的蒸镀膜层。
  9. 如权利要求8所述的制作方法，其中，所述透光区为一封闭图形，并且所述透光区的边界独立于与所述显示区的边界。
  10. 如权利要求6所述的制作方法，其中，所述蒸镀膜层为阴极层或薄膜封装功能层。
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