WO2020155381A1 - 显示面板及显示装置 - Google Patents
显示面板及显示装置 Download PDFInfo
- Publication number
- WO2020155381A1 WO2020155381A1 PCT/CN2019/081797 CN2019081797W WO2020155381A1 WO 2020155381 A1 WO2020155381 A1 WO 2020155381A1 CN 2019081797 W CN2019081797 W CN 2019081797W WO 2020155381 A1 WO2020155381 A1 WO 2020155381A1
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- WO
- WIPO (PCT)
- Prior art keywords
- film
- layer
- area
- display panel
- width
- Prior art date
Links
- 239000010409 thin film Substances 0.000 claims description 76
- 239000010408 film Substances 0.000 claims description 67
- 239000000758 substrate Substances 0.000 claims description 29
- 238000005538 encapsulation Methods 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 14
- 238000004806 packaging method and process Methods 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 description 15
- 238000000034 method Methods 0.000 description 6
- 230000009286 beneficial effect Effects 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000003698 laser cutting Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/868—Arrangements for polarized light emission
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/873—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/60—OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes
- H10K59/65—OLEDs integrated with inorganic image sensors
Definitions
- the present invention relates to the field of display, in particular to a display panel and a display device.
- the non-display area on the display panel is compressed smaller and smaller.
- gaps ie, special-shaped areas
- FIG. 1 is a schematic top view of a conventional display panel.
- an outer frame 10 with a flat shape surrounds the display area 11, wherein the outer frame 10 is a non-display area, and a notch 12 is provided on the top of the display area 11, and devices such as a front camera and an earpiece (Not shown in the drawings) is set in the gap 12 to prevent the display area 11 from affecting the performance of the front camera, earpiece and other devices.
- the disadvantage of the above structure is that the display area needs to be set in a special shape to avoid devices such as front cameras and earpieces, which destroys the integrity of the display area and reduces the screen-to-body ratio of the display screen of the handheld device.
- the technical problem to be solved by the present invention is to provide a display panel and a display device, which do not need to set the display panel in a special shape to avoid the area where the functional device is located, which is beneficial to increase the screen-to-body ratio and enhance user experience.
- the present invention provides a display panel, which includes a display area and a light-transmitting area, the display area surrounds the light-transmitting area, the display panel includes a plurality of film layers, the plurality of At least one of the film layers has a non-film-forming area. In the direction perpendicular to the display panel, the orthographic projection of the non-film-forming area overlaps with the orthographic projection of the light-transmitting area.
- the film layer of the area includes a thin film transistor layer, an organic light emitting device layer disposed on the thin film transistor layer, and a thin film encapsulation layer covering the organic light emitting device layer.
- the organic light emitting device layer has no film forming area.
- the width is greater than the width of the non-film formation area of the thin film encapsulation layer, the width of the non-film formation area of the thin film encapsulation layer is greater than the width of the non-film formation area of the thin film transistor layer, and the display panel further includes a polarizer
- the polarizer is disposed on the plurality of film layers, and the polarizer has an opening. In a direction perpendicular to the display panel, the orthographic projection of the opening of the polarizer is aligned with the orthographic projection of the light-transmitting area.
- the display panel further includes a substrate, the substrate has an opening that is perpendicular to the display panel Direction, the orthographic projection of the opening of the substrate overlaps the orthographic projection of the light-transmitting area, and the width of the opening of the substrate is smaller than the width of the non-film-forming area of the thin film transistor layer.
- the present invention also provides a display panel, which includes a display area and a light-transmitting area, the display area surrounds the light-transmitting area, the display panel includes a plurality of film layers, the At least one of the film layers has a film-free area, and in a direction perpendicular to the display panel, the orthographic projection of the film-free area overlaps with the orthographic projection of the light-transmitting area.
- the film layer having the film-free region is an organic light emitting device layer.
- the film layer having the film-free area is an organic light-emitting device layer and a thin film packaging layer covering the organic light-emitting device layer, and the width of the film-free area of the organic light-emitting device layer It is larger than the width of the non-film forming area of the thin film encapsulation layer.
- the film layer having the film-free region is a thin film transistor layer, an organic light emitting device layer disposed on the thin film transistor layer, and a thin film encapsulation layer covering the organic light emitting device layer,
- the width of the film-free area of the organic light-emitting device layer is larger than the width of the film-free area of the thin film encapsulation layer.
- the width of the film-free area of the thin film encapsulation layer is greater than the width of the film-free area of the thin film transistor layer.
- the display panel further includes a polarizer, the polarizer is disposed on the film layer, the polarizer has an opening, and in a direction perpendicular to the display panel, the opening is The orthographic projection overlaps the orthographic projection of the light-transmitting area, and the width of the opening is smaller than the width of the film-free area of the thin film transistor layer.
- the display panel further includes a substrate having an opening, and in a direction perpendicular to the display panel, the orthographic projection of the opening overlaps the orthographic projection of the light-transmitting area,
- the width of the opening is smaller than the width of the film-free area of the thin film transistor layer.
- the thin film transistor layer includes at least one metal layer, and the metal layer bypasses an area corresponding to the light-transmitting area to form a film-free area of the thin film transistor layer.
- the display panel further includes a cover plate, and the cover plate covers the film layer.
- the present invention also provides a display device, which includes the above-mentioned display panel and a functional device, the functional device is arranged on the non-light emitting surface side of the display panel, and the functional device faces a side of the display panel.
- the functional device has a lighting area, and in a direction perpendicular to the display panel, the orthographic projection of the light-transmitting area overlaps with the orthographic projection of the lighting area.
- the advantage of the present invention is that there is no need to set the display panel in a special shape to avoid the area where the functional device is located, which is beneficial to increase the screen-to-body ratio and enhance user experience.
- FIG. 1 is a schematic top view of a conventional display panel
- FIG. 2 is a schematic top view of the first embodiment of the display panel of the present invention.
- Figure 3 is a sectional view taken along line C-C in Figure 2;
- FIG. 4 is a cross-sectional view of the second embodiment of the display panel of the present invention.
- FIG. 5 is a cross-sectional view of a third embodiment of the display panel of the present invention.
- Fig. 6 is a schematic diagram of the structure of the display device of the present invention.
- the display panel 2 of the present invention includes a display area 20 and a light-transmitting area 30.
- the display area 20 refers to an area that can display pictures;
- the light-transmitting area 30 refers to an area that allows visible light to penetrate, that is, in the light-transmitting area 30, visible light can be irradiated from the light-emitting surface of the display panel 2 to the display Non-light emitting surface of panel 2.
- the display area 20 surrounds the light transmission area 30, that is, the boundary of the light transmission area 30 is independent of the boundary of the display area 20.
- the display panel 2 includes a plurality of film layers. At least one of the plurality of film layers has a non-film forming area.
- the display panel 2 includes a thin film transistor layer 21, an organic light emitting device layer 22 disposed on the thin film transistor layer 21, and a thin film encapsulation layer 23 covering the organic light emitting device layer 22, Wherein, the organic light emitting device layer 22 has a non-film forming area 22A.
- the film-forming-free region 22A means that the organic light emitting device layer is not formed in this region. Specifically, in the process of preparing the organic light-emitting device layer 22, the organic light-emitting device layer 22 is not formed in a predetermined area, which is the film-free area 22A.
- the orthographic projection of the non-film forming area overlaps with the orthographic projection of the light-transmitting area 30. That is, the orthographic projection of the light-transmitting area 30 is within the range of the orthographic projection of the non-film-forming area, that is, the orthographic projection of the non-film-forming area and the orthographic projection of the light-transmitting area 30 overlap or The edge of the orthographic projection of the non-film-forming area protrudes from the edge of the orthographic projection of the light-transmitting area 30.
- the orthographic projection of the non-film forming area 22A and the orthographic projection of the light-transmitting area 30 are.
- the overlap of the orthographic projection of the non-film-forming area 22A and the orthographic projection of the light-transmitting area 30 means that the orthographic projection of the non-film-forming area 22A coincides with the orthographic projection of the light-transmitting area 30 or the The edge of the orthographic projection of the film region 22A protrudes from the edge of the orthographic projection of the transparent region 30. Since the organic light-emitting device layer 22 is not formed in the region corresponding to the light-transmitting area 30, visible light can be irradiated from the light-emitting surface of the display panel 2 to the non-light-emitting surface of the display panel 2, so as to be the non-light-emitting side of the display panel.
- the functional device provides visible light.
- the display panel 2 further includes a polarizer 24.
- the polarizer 24 is disposed on the film layer. Specifically, the polarizer 24 is disposed on the thin film encapsulation layer 23.
- the polarizer 24 has an opening 24A. In the process of preparing the display panel 2, a laser cutting method can be used to form the opening 24A. In the direction perpendicular to the display panel 2, the orthographic projection of the opening 24A overlaps with the orthographic projection of the light-transmitting area 30.
- the orthographic projection of the opening 24A coincides with the orthographic projection of the light-transmitting area 30 or the edge of the orthographic projection of the opening 24A protrudes from the edge of the orthographic projection of the light-transmitting area 30 . That is, the light-transmitting area 30 is not blocked by the polarizer 24, and visible light can pass through the opening 24A of the polarizer 24.
- the width W1 of the opening 24A of the polarizer 24 is smaller than the width W2 of the non-film forming area 22A of the organic light-emitting device layer 22, so that the organic light-emitting device layer 22 can be further avoided. Blocking the light-transmitting area 30.
- the display panel 2 further includes a substrate 25 and a cover plate 26, the substrate 25 is disposed under the thin film transistor layer 21, and the cover plate 26 covers the film layer. Specifically, in this embodiment, the cover plate 26 covers the polarizer 25.
- the substrate 25 is a conventional substrate, such as a PI substrate, and the cover plate 26 is a transparent cover plate, such as a glass cover plate.
- At least one of the multiple film layers is arranged in a non-film forming area in the light-transmitting area 30. Due to the lack of a film layer in the light-transmitting area 30, the transmittance of visible light is greatly increased, thereby facilitating The functional device on the non-light emitting side of the display panel receives light.
- the display panel 2 includes a thin film transistor layer 21, an organic light emitting device layer 22 disposed on the thin film transistor layer 21, and an organic light emitting device layer 22 covering the organic light emitting device layer 22 Film encapsulation layer 23.
- the organic light emitting device layer 22 has a non-film formation area 22A
- the thin film encapsulation layer 23 has a non-film formation area 23A.
- the non-film formation area 22A refers to the area where the organic light emitting device layer 22 is not formed
- the non-film formation area 23A refers to the area where the thin film encapsulation layer 23 is not formed.
- the width W2 of the non-film formation area 22A of the organic light emitting device layer 22 is greater than the width W4 of the non-film formation area 23A of the thin film encapsulation layer 23.
- the thin film encapsulation layer 23 can cover the surface of the organic light emitting device layer 22 and the edge facing the non-film forming area 22A, so as to protect the structure in the organic light emitting device layer 22 from being corroded by water vapor and oxygen in the air. .
- the display panel 2 includes a thin film transistor layer 21, an organic light emitting device layer 22 disposed on the thin film transistor layer 21, and an organic light emitting device layer 22 covering the organic light emitting device layer 22 Film encapsulation layer 23.
- the organic light emitting device layer 22 has a non-film formation area 22A
- the thin film encapsulation layer 23 has a non-film formation area 23A
- the thin film transistor layer 21 has a non-film formation area 23A.
- Film forming area 21A is a cross-sectional view of the third embodiment of the display panel of the present invention.
- the display panel 2 includes a thin film transistor layer 21, an organic light emitting device layer 22 disposed on the thin film transistor layer 21, and an organic light emitting device layer 22 covering the organic light emitting device layer 22 Film encapsulation layer 23.
- the organic light emitting device layer 22 has a non-film formation area 22A
- the thin film encapsulation layer 23 has a non-film formation area 23A
- the thin film transistor layer 21 has a non
- the non-film formation area 22A refers to the area where the organic light emitting device layer 22 is not formed
- the non-film formation area 23A refers to the area where the thin film encapsulation layer 23 is not formed
- the region 21A means that the thin film transistor layer 21 is not formed in this region.
- the width W2 of the non-film-forming area 22A of the organic light-emitting device layer 22 is greater than the width W4 of the non-film-forming area 23A of the thin-film encapsulation layer 23.
- the width W4 of the film region 23A is greater than the width W5 of the film-free region 21A of the thin film transistor layer 21.
- the display panel 2 further includes a substrate 25.
- the substrate 25 is disposed under the thin film transistor layer 21.
- the substrate 25 has an opening 25A.
- the orthographic projection of the opening 25A of the substrate 25 overlaps the orthographic projection of the light-transmitting area 30.
- the orthographic projection of the opening 25A of the substrate 25 coincides with the orthographic projection of the light-transmitting area 30 or the edge of the orthographic projection of the opening 25A of the substrate 25 protrudes At the edge of the orthographic projection of the transparent region 30. That is, the transparent region 30 is not blocked by the substrate 25, and visible light can pass through the opening 25A of the substrate 25.
- the width W1 of the opening 24A of the polarizer 24 is smaller than the width W2 of the non-film-forming area 22A of the organic light-emitting device layer 22, so as to further prevent the organic light-emitting device layer 22 from contacting the The shielding of the light-transmitting area 30.
- the width W3 of the opening 25A of the substrate 25 is smaller than the width W2 of the non-film-forming area 22A of the organic light-emitting device layer 22, so that the light-transmitting area 30 can be further prevented from being blocked by the organic light-emitting device layer 22.
- a laser cutting method can be used to form the opening 25A of the substrate and the opening 24A of the polarizer in the same process, and the width W3 of the opening 25A of the substrate is the same as the width W3 of the polarizer.
- the width W1 of the opening 24A of the sheet is equal.
- the width W1 of the opening 24A of the polarizer 24 is smaller than the width W5 of the non-film forming area 21A of the thin film transistor layer 21, and the width W3 of the opening 25A of the substrate 25 is smaller than The width W5 of the non-film-forming area 21A of the thin film transistor layer 21 is to prevent each film layer of the display panel 2 from blocking the light-transmitting area 30.
- the structure of the thin film transistor layer 21 is a conventional structure, which can be formed by at least one metal layer (not shown in the drawing) and at least one insulating layer (not shown in the drawing).
- the metal layer bypasses the area corresponding to the light-transmitting area 30 to form the film-free area 21A of the thin film transistor layer 21.
- the insulating layer is made of a transparent material, which allows visible light to pass through, but the metal layer does not allow visible light to pass, the insulating layer can be provided in the non-film-forming area 21A without the metal layer, thereby Avoid shielding of visible light by the metal layer.
- neither the metal layer nor the insulating layer is provided in the film-free region 21A, thereby further increasing the visible light transmittance of the light-transmitting region 30.
- the invention also provides a display device.
- Fig. 6 is a schematic diagram of the structure of the display device of the present invention. Please refer to FIG. 6, the display device of the present invention includes the above-mentioned display panel 2 and a functional device 3.
- the functional device 3 is arranged on the non-light emitting surface side of the display panel 2.
- the functional device 3 On the side of the functional device 3 facing the display panel 2, the functional device 3 has a lighting area 3A. In the direction perpendicular to the display panel 2, the orthographic projection of the light-transmitting area 30 overlaps with the orthographic projection of the lighting area 3A.
- the functional device 3 is a camera assembly
- the lighting area 3A is a lens of the camera assembly
- the orthographic projection of the light-transmitting area 30 is opposite to that of the lighting area 3A.
- the projections are overlapped to ensure that the lens of the camera assembly can be completely located in the light-transmitting area 30, thereby ensuring the intensity of visible light entering the lens of the camera assembly.
- the functional device 3 may also be other structures requiring visible light, which is not limited in the present invention.
- the subject of this application can be manufactured and used in industry and has industrial applicability.
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Abstract
本发明提供一种显示面板及显示装置,本发明的优点在于,无需将显示面板设置为特殊的形状以避开功能器件所在区域,有利于提高屏占比,提升用户体验。
Description
本发明涉及显示领域,尤其涉及一种显示面板及显示装置。
为了提高电子产品的屏占比,显示面板上的非显示区域被压缩得越来越小。例如,在手机等手持终端的显示屏中,为了尽量压缩非显示区域,已经出现在显示区域上端设置缺口(即异形区),将手持终端的前置摄像头和听筒等装置设置在缺口中的技术。
图1为现有的显示面板的一俯视示意图。请参阅图1,平板外形的外框10包围所述显示区11,其中,所述外框10为非显示区,在所述显示区11的顶部设置有缺口12,前置摄像头和听筒等装置(附图中未绘示)设置在所述缺口12中,以避免显示区11影响所述前置摄像头和听筒等装置的性能。
上述结构的缺点在于,显示区需设置为特殊形状,以避开前置摄像头和听筒等装置,其破坏了显示区的完整性,且降低了手持装置的显示屏的屏占比。
如何保持显示区的完整性及进一步提高产品的屏占比,是目前需要解决的技术问题。
本发明所要解决的技术问题是,提供一种显示面板及显示装置,其无需将显示面板设置为特殊的形状以避开功能器件所在区域,有利于提高屏占比,提升用户体验。
为了解决上述问题,本发明提供了一种显示面板,其包括一显示区及一透光区,所述显示区包围所述透光区,所述显示面板包括多个膜层,所述多个膜层中的至少一膜层具有一无成膜区,在垂直所述显示面板的方向,所述无成膜区的正投影与所述透光区的正投影重叠,具有所述无成膜区的膜层包括一薄膜晶体管层、一设置在所述薄膜晶体管层上的有机发光器件层及一覆盖所述有机发光器件层的薄膜封装层,所述有机发光器件层的无成膜区的宽度大于所述薄膜封装层的无成膜区的宽度,所述薄膜封装层的无成膜区的宽度大于所述薄膜晶体管层的无成膜区的宽度,所述显示面板还包括一偏光片,所述偏光片设置在所述多个膜层之上,所述偏光片具有一开口,在垂直所述显示面板的方向,所述偏光片的开口的正投影与所述透光区的正投影重叠,所述偏光片的开口的宽度小于所述薄膜晶体管层的无成膜区的宽度,所述显示面板还包括一衬底,所述衬底具有一开口,在垂直所述显示面板的方向,所述衬底的开口的正投影与所述透光区的正投影重叠,所述衬底的开口的宽度小于所述薄膜晶体管层的无成膜区的宽度。
为了解决上述问题,本发明还提供了一种显示面板,其包括一显示区及一透光区,所述显示区包围所述透光区,所述显示面板包括多个膜层,所述多个膜层中的至少一膜层具有一无成膜区,在垂直所述显示面板的方向,所述无成膜区的正投影与所述透光区的正投影重叠。
在一实施例中,具有所述无成膜区的膜层为一有机发光器件层。
在一实施例中,具有所述无成膜区的膜层为一有机发光器件层及一覆盖所述有机发光器件层的薄膜封装层,所述有机发光器件层的的无成膜区的宽度大于所述薄膜封装层的无成膜区的宽度。
在一实施例中,具有所述无成膜区的膜层为一薄膜晶体管层、设置在所述薄膜晶体管层上的一有机发光器件层及一覆盖所述有机发光器件层的薄膜封装层,所述有机发光器件层的的无成膜区的宽度大于所述薄膜封装层的无成膜区的宽度。
在一实施例中,所述薄膜封装层的无成膜区的宽度大于所述薄膜晶体管层的无成膜区的宽度。
在一实施例中,所述显示面板还包括一偏光片,所述偏光片设置在所述膜层之上,所述偏光片具有一开口,在垂直所述显示面板的方向,所述开口的正投影与所述透光区的正投影重叠,所述开口的宽度小于所述薄膜晶体管层的无成膜区的宽度。
在一实施例中,所述显示面板还包括一衬底,所述衬底具有一开口,在垂直所述显示面板的方向,所述开口的正投影与所述透光区的正投影重叠,所述开口的宽度小于所述薄膜晶体管层的无成膜区的宽度。
在一实施例中,所述薄膜晶体管层包括至少一金属层,所述金属层绕过与所述透光区对应的区域,以形成所述薄膜晶体管层的无成膜区。
在一实施例中,所述显示面板还包括一盖板,所述盖板覆盖所述膜层。
本发明还提供一种显示装置,其包括如上所述的显示面板及一功能器件,所述功能器件设置在所述显示面板的非出光面侧,在所述功能器件朝向所述显示面板的一侧,所述功能器件具有一采光区,在垂直所述显示面板的方向,所述透光区的正投影与所述采光区的正投影重叠。
本发明的优点在于,无需将显示面板设置为特殊的形状以避开功能器件所在区域,有利于提高屏占比,提升用户体验。
图1为现有的显示面板的一俯视示意图;
图2是本发明显示面板的第一实施例的俯视示意图;
图3是沿图2中C-C线的剖视图;
图4是本发明显示面板的第二实施例的剖视图;
图5是本发明显示面板的第三实施例的剖视图;
图6是本发明显示装置的结构示意图。
下面结合附图对本发明提供的显示面板及显示装置的具体实施方式做详细说明。
图2是本发明显示面板的第一实施例的俯视示意图,图3是沿图2中C-C线的剖视图。请参阅图2及图3,本发明显示面板2包括一显示区20及一透光区30。所述显示区20指的是能够显示画面的区域;所述透光区30指的是能够允许可见光穿透的区域,即在透光区30,可见光能够自显示面板2的出光面照射至显示面板2的非出光面。所述显示区20包围所述透光区30,即所述透光区30的边界独立于所述显示区20的边界。
所述显示面板2包括多个膜层。所述多个膜层中的至少一膜层具有一无成膜区。在本实施例中,所述显示面板2包括一薄膜晶体管层21、设置在所述薄膜晶体管层21上的一有机发光器件层22及覆盖所述有机发光器件层22的一薄膜封装层23,其中,所述有机发光器件层22具有一无成膜区22A。所述无成膜区22A指的是在该区域不形成所述有机发光器件层。具体地说,在制备所述有机发光器件层22的工艺中,在一预定区域不形成有机发光器件层22,该预定区域即为所述无成膜区22A。
在垂直所述显示面板2的方向,所述无成膜区的正投影与所述透光区30的正投影重叠。也就是说,所述透光区30的正投影在所述无成膜区的正投影的范围内,即所述无成膜区的正投影与所述透光区30的正投影重合或者所述无成膜区的正投影的边缘突出于所述透光区30的正投影的边缘。具体地说,在本实施例中,在Y方向上,所述无成膜区22A的正投影与所述透光区30的正投影。所述无成膜区22A的正投影与所述透光区30的正投影重叠指的是所述无成膜区22A的正投影与所述透光区30的正投影重合或者所述无成膜区22A的正投影的边缘突出于所述透光区30的正投影的边缘。由于在所述透光区30对应的区域并未形成所述有机发光器件层22,则可见光能够自显示面板2的出光面照射至显示面板2的非出光面,从而能够为显示面板非出光侧的功能器件提供可见光。
可选地,在本实施例中,所述显示面板2还包括一偏光片24。所述偏光片24设置在所述膜层之上。具体地说,所述偏光片24设置在所述薄膜封装层23之上。所述偏光片24具有一开口24A,其中,在制备显示面板2的工艺中,可采用激光切割的方法形成所述开口24A。在垂直所述显示面板2的方向,所述开口24A的正投影与所述透光区30的正投影重叠。也即是说,在Y方向,所述开口24A的正投影与所述透光区30的正投影重合或者所述开口24A的正投影的边缘突出于所述透光区30的正投影的边缘。即所述透光区30并未被所述偏光片24遮挡,可见光能够自所述偏光片24的开口24A穿过。
其中,在本实施例中,所述偏光片24的所述开口24A的宽度W1小于所述有机发光器件层22的无成膜区22A的宽度W2,从而可进一步避免所述有机发光器件层22对所述透光区30的遮挡。
所述显示面板2还包括一衬底25及一盖板26,所述衬底25设置在所述薄膜晶体管层21之下,所述盖板26覆盖所述膜层。具体地说,在本实施例中,所述盖板26覆盖所述偏光片25。所述衬底25为常规的衬底,例如PI衬底,所述盖板26为透光盖板,例如玻璃盖板。
本发明显示面板在透光区30将多个膜层中的至少一膜层设置无成膜区,由于在透光区30缺少一膜层的遮挡,其可见光的透光率大大增加,从而便于位于显示面板非出光侧的功能器件采光。
图4是本发明显示面板的第二实施例的剖视图。请参阅图4,在该实施例中,所述显示面板2包括一薄膜晶体管层21、设置在所述薄膜晶体管层21上的一有机发光器件层22及覆盖所述有机发光器件层22的一薄膜封装层23。本实施例与第一实施例的区别在于,所述有机发光器件层22具有一无成膜区22A,所述薄膜封装层23具有一无成膜区23A。所述无成膜区22A指的是在该区域不形成所述有机发光器件层22,所述无成膜区23A指的是在该区域不形成所述薄膜封装层23。
其中,所述有机发光器件层22的无成膜区22A的宽度W2大于所述薄膜封装层23的无成膜区23A的宽度W4。具体地说,所述薄膜封装层23能够覆盖所述有机发光器件层22的表面及朝向无成膜区22A的边缘,以保护有机发光器件层22中的结构不受空气中的水汽和氧气侵蚀。
图5是本发明显示面板的第三实施例的剖视图。请参阅图5,在该实施例中,所述显示面板2包括一薄膜晶体管层21、设置在所述薄膜晶体管层21上的一有机发光器件层22及一覆盖所述有机发光器件层22的薄膜封装层23。本实施例与第一实施例的区别在于,所述有机发光器件层22具有一无成膜区22A,所述薄膜封装层23具有一无成膜区23A,所述薄膜晶体管层21具有一无成膜区21A。所述无成膜区22A指的是在该区域不形成所述有机发光器件层22,所述无成膜区23A指的是在该区域不形成所述薄膜封装层23,所述无成膜区21A指的是在该区域不形成所述薄膜晶体管层21。
其中,在本实施例中,所述有机发光器件层22的无成膜区22A的宽度W2大于所述薄膜封装层23的无成膜区23A的宽度W4,所述薄膜封装层23的无成膜区23A的宽度W4大于所述薄膜晶体管层21的无成膜区21A的宽度W5。从而使得所述有机发光器件层22上表面、下表面及边缘均被包围,以保护有机发光器件层22中的结构不受空气中的水汽和氧气侵蚀。
可选地,在本实施例中,所述显示面板2还包括一衬底25。所述衬底25设置在所述薄膜晶体管层21之下。所述衬底25具有一开口25A,在垂直所述显示面板2的方向,所述衬底25的所述开口25A的正投影与所述透光区30的正投影重叠。也即是说,在Y方向,所述衬底25的所述开口25A的正投影与所述透光区30的正投影重合或者所述衬底25的所述开口25A的正投影的边缘突出于所述透光区30的正投影的边缘。即所述透光区30并未被所述衬底25遮挡,可见光可自所述衬底25的开口25A穿过。
其中,在本实施例中,所述偏光片24的开口24A的宽度W1小于所述有机发光器件层22的无成膜区22A的宽度W2,从而可进一步避免所述有机发光器件层22对所述透光区30的遮挡。所述衬底25的开口25A的宽度W3小于所述有机发光器件层22的无成膜区22A的宽度W2,从而可进一步避免所述有机发光器件层22对所述透光区30的遮挡,在制备所述显示面板时,可在同一工序中采用激光切割的方法形成所述衬底的开口25A及所述偏光片的开口24A,则所述衬底的开口25A的宽度W3与所述偏光片的开口24A的宽度W1相等。
可选地,在本实施例中,所述偏光片24的开口24A的宽度W1小于所述薄膜晶体管层21的无成膜区21A的宽度W5,所述衬底25的开口25A的宽度W3小于所述薄膜晶体管层21的无成膜区21A的宽度W5,从而避免显示面板2的各个膜层遮挡所述透光区30。
所述薄膜晶体管层21的结构为常规结构,其可由至少一金属层(附图中未绘示)及至少一绝缘层(附图中未绘示)形成。在本实施例中,所述金属层绕过与所述透光区30对应的区域,以形成所述薄膜晶体管层21的无成膜区21A。由于所述绝缘层为透明材质制成,其允许可见光通过,而金属层不允许可见光通过,则在所述无成膜区21A可设置有所述绝缘层,而未设置所述金属层,从而避免所述金属层对可见光的遮挡。在本发明另一实施例中,在所述无成膜区21A既没有设置所述金属层,也没有设置所述绝缘层,从而进一步增加透光区30的可见光透光率。
本发明还提供一种显示装置。图6是本发明显示装置的结构示意图。请参阅图6,本发明显示装置包括上述的显示面板2及一功能器件3。所述功能器件3设置在所述显示面板2的非出光面侧。在所述功能器件3朝向所述显示面板2的一侧,所述功能器件3具有一采光区3A。在垂直所述显示面板2的方向,所述透光区30的正投影与所述采光区3A的正投影重叠。具体地说,在本实施例中,所述功能器件3为一摄像头组件,所述采光区3A为所述摄像头组件的镜头,所述透光区30的正投影与所述采光区3A的正投影重叠,以保证所述摄像头组件的镜头能够完全位于透光区30,从而保证进入所述摄像头组件的镜头的可见光的强度。在本发明其他实施例中,所述功能器件3也可以为其他需要可见光的结构,本发明对此不进行限定。
以上所述仅是本发明的优选实施方式,应当指出,对于本技术领域的普通技术人员,在不脱离本发明原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本发明的保护范围。
本申请的主题可以在工业中制造和使用,具备工业实用性。
Claims (20)
- 一种显示面板,其包括一显示区及一透光区,所述显示区包围所述透光区,所述显示面板包括多个膜层,所述多个膜层中的至少一膜层具有一无成膜区,在垂直所述显示面板的方向,所述无成膜区的正投影与所述透光区的正投影重叠,具有所述无成膜区的膜层包括一薄膜晶体管层、一设置在所述薄膜晶体管层上的有机发光器件层及一覆盖所述有机发光器件层的薄膜封装层,所述有机发光器件层的无成膜区的宽度大于所述薄膜封装层的无成膜区的宽度,所述薄膜封装层的无成膜区的宽度大于所述薄膜晶体管层的无成膜区的宽度,所述显示面板还包括一偏光片,所述偏光片设置在所述多个膜层之上,所述偏光片具有一开口,在垂直所述显示面板的方向,所述偏光片的开口的正投影与所述透光区的正投影重叠,所述偏光片的开口的宽度小于所述薄膜晶体管层的无成膜区的宽度,所述显示面板还包括一衬底,所述衬底具有一开口,在垂直所述显示面板的方向,所述衬底的开口的正投影与所述透光区的正投影重叠,所述衬底的开口的宽度小于所述薄膜晶体管层的无成膜区的宽度。
- 根据权利要求1所述的显示面板,其中所述薄膜晶体管层包括至少一金属层,所述金属层绕过与所述透光区对应的区域,以形成所述薄膜晶体管层的无成膜区。
- 根据权利要求1所述的显示面板,其中所述显示面板还包括一盖板,所述盖板覆盖所述多个膜层。
- 一种显示面板,其包括一显示区及一透光区,所述显示区包围所述透光区,所述显示面板包括多个膜层,所述多个膜层中的至少一膜层具有一无成膜区,在垂直所述显示面板的方向,所述无成膜区的正投影与所述透光区的正投影重叠。
- 根据权利要求4所述的显示面板,其中具有所述无成膜区的膜层为一有机发光器件层。
- 根据权利要求4所述的显示面板,其中具有所述无成膜区的膜层包括一有机发光器件层及一覆盖所述有机发光器件层的薄膜封装层,所述有机发光器件层的无成膜区的宽度大于所述薄膜封装层的无成膜区的宽度。
- 根据权利要求4所述的显示面板,其中具有所述无成膜区的膜层包括一薄膜晶体管层、一设置在所述薄膜晶体管层上的有机发光器件层及一覆盖所述有机发光器件层的薄膜封装层,所述有机发光器件层的无成膜区的宽度大于所述薄膜封装层的无成膜区的宽度。
- 根据权利要求7所述的显示面板,其中所述薄膜封装层的无成膜区的宽度大于所述薄膜晶体管层的无成膜区的宽度。
- 根据权利要求8所述的显示面板,其中所述显示面板还包括一偏光片,所述偏光片设置在所述多个膜层之上,所述偏光片具有一开口,在垂直所述显示面板的方向,所述开口的正投影覆盖所述透光区的正投影,所述开口的宽度小于所述薄膜晶体管层的无成膜区的宽度。
- 根据权利要求8所述的显示面板,其中所述显示面板还包括一衬底,所述衬底具有一开口,在垂直所述显示面板的方向,所述开口的正投影与所述透光区的正投影重叠,所述开口的宽度小于所述薄膜晶体管层的无成膜区的宽度。
- 根据权利要求7所述的显示面板,其中所述薄膜晶体管层包括至少一金属层,所述金属层绕过与所述透光区对应的区域,以形成所述薄膜晶体管层的无成膜区。
- 根据权利要求4所述的显示面板,其中所述显示面板还包括一盖板,所述盖板覆盖所述多个膜层。
- 一种显示装置,其包括如权利要求4所述的显示面板及一功能器件,所述功能器件设置在所述显示面板的非出光面侧,在所述功能器件朝向所述显示面板的一侧,所述功能器件具有一采光区,在垂直所述显示面板的方向,所述透光区的正投影与所述采光区的正投影重叠。
- 根据权利要求13所述的显示装置,其中具有所述无成膜区的膜层为一有机发光器件层。
- 根据权利要求13所述的显示装置,其中具有所述无成膜区的膜层包括一有机发光器件层及一覆盖所述有机发光器件层的薄膜封装层,所述有机发光器件层的无成膜区的宽度大于所述薄膜封装层的无成膜区的宽度。
- 根据权利要求13所述的显示装置,其中具有所述无成膜区的膜层包括一薄膜晶体管层、一设置在所述薄膜晶体管层上的有机发光器件层及一覆盖所述有机发光器件层的薄膜封装层,所述有机发光器件层的无成膜区的宽度大于所述薄膜封装层的无成膜区的宽度。
- 根据权利要求16所述的显示装置,其中所述薄膜封装层的无成膜区的宽度大于所述薄膜晶体管层的无成膜区的宽度。
- 根据权利要求17所述的显示面板,其中所述显示面板还包括一偏光片,所述偏光片设置在所述多个膜层之上,所述偏光片具有一开口,在垂直所述显示面板的方向,所述开口的正投影覆盖所述透光区的正投影,所述开口的宽度小于所述薄膜晶体管层的无成膜区的宽度。
- 根据权利要求17所述的显示面板,其中所述显示面板还包括一衬底,所述衬底具有一开口,在垂直所述显示面板的方向,所述开口的正投影与所述透光区的正投影重叠,所述开口的宽度小于所述薄膜晶体管层的无成膜区的宽度。
- 根据权利要求16所述的显示面板,其中所述薄膜晶体管层包括至少一金属层,所述金属层绕过与所述透光区对应的区域,以形成所述薄膜晶体管层的无成膜区。
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CN110244495B (zh) * | 2019-06-17 | 2021-11-23 | 武汉华星光电技术有限公司 | 液晶显示面板及液晶显示装置 |
CN112185993A (zh) * | 2019-07-04 | 2021-01-05 | 上海和辉光电有限公司 | 显示装置、显示面板及其制作方法 |
CN110571253A (zh) * | 2019-08-29 | 2019-12-13 | 武汉华星光电半导体显示技术有限公司 | 一种显示面板及掩膜板 |
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