WO2014015605A1 - 彩膜基板的制备方法、彩膜基板及半反半透式液晶显示装置 - Google Patents

彩膜基板的制备方法、彩膜基板及半反半透式液晶显示装置 Download PDF

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Publication number
WO2014015605A1
WO2014015605A1 PCT/CN2012/085700 CN2012085700W WO2014015605A1 WO 2014015605 A1 WO2014015605 A1 WO 2014015605A1 CN 2012085700 W CN2012085700 W CN 2012085700W WO 2014015605 A1 WO2014015605 A1 WO 2014015605A1
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WO
WIPO (PCT)
Prior art keywords
color filter
color film
black matrix
sub
light
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Application number
PCT/CN2012/085700
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English (en)
French (fr)
Inventor
惠官宝
张锋
崔承镇
Original Assignee
京东方科技集团股份有限公司
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Application filed by 京东方科技集团股份有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US14/125,545 priority Critical patent/US9158047B2/en
Publication of WO2014015605A1 publication Critical patent/WO2014015605A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00634—Production of filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/52—RGB geometrical arrangements

Definitions

  • Embodiments of the present invention relate to a method of fabricating a color filter substrate, a color filter substrate, and a transflective liquid crystal display device. Background technique
  • liquid crystal displays such as TFT-LCDs
  • TFT-LCDs liquid crystal displays
  • the transflective liquid crystal display can increase the contrast of the display device when it is displayed outdoors by increasing the reflectivity of the panel, so that the display can maintain excellent readability outdoors.
  • the pixel of the transflective liquid crystal display has a transmissive portion and a reflective portion, and its structure is as shown in FIG.
  • a light-transmitting light-passing hole is generally formed in the color film portion corresponding to the reflection region.
  • the light-passing holes 14 are usually left on the red, green and blue color films, so that when the reflected light 19 is emitted from each of the light-passing holes 14, the reflected light 19 passes only once.
  • Color film (as shown in Figure 1). If the apertures of each sub-pixel are set to the same size, the red, green, and blue color film preparation process can use the same mask, the process is simple, but the white color of the display will drift to the blue, resulting in display display. The color is colored.
  • the ratio of the red, green and blue light can be adjusted by adjusting the size of the light-passing holes on the masks of the red, green and blue color films.
  • the red, green, and blue color film reticle apertures are set to different sizes, which can ensure the display effect of the display without color shift.
  • the manufacturing cost of the color-film substrate is increased. Summary of the invention
  • the embodiment of the invention provides a method for preparing a color film substrate, a color film substrate and a transflective liquid crystal display device, which are used for reducing the color film base while ensuring that the display device does not exhibit color shift during display.
  • the production cost of the board is not limited.
  • a method for preparing a color filter substrate according to an embodiment of the present invention includes the following steps: preparing a mask of a black matrix, and providing a specific aperture filling pattern on a mask of a black matrix for a specific color sub-pixel;
  • a color filter substrate is prepared using the mask of the black matrix and the mask of the color film.
  • the method further comprises: forming an organic flat layer on the surface of the color film layer after the step of preparing the color filter substrate by using the mask of the black matrix and the mask of the color film.
  • the red sub-pixel color film of the color film substrate has an effective effective light-passing hole, an actual effective light-passing hole of the green sub-pixel color film, and an area of the actual effective light-passing hole of the blue sub-pixel color film.
  • the scale ranges from 1:0.9:0.8 to 1:6:2.
  • the area ratio of the actual effective light-passing hole of the red sub-pixel color film of the color film substrate, the actual effective light-passing hole of the green sub-pixel color film, and the actual effective light-passing hole of the blue sub-pixel color film It is 1:2:0.5.
  • the step S1 of preparing the black matrix mask and the steps of the steps of preparing the mask of the color film are sequentially interchanged.
  • the embodiment of the invention further provides a color filter substrate prepared by the method for preparing the color film substrate, comprising a color film layer and a black matrix layer, wherein the light aperture of the sub-pixel color film of a specific color is corresponding to the black matrix The aperture fill pattern is occluded.
  • an embodiment of the present invention further provides a transflective liquid crystal display device, including a display panel, wherein the display panel includes the color film substrate and the thin film transistor array substrate described above.
  • FIG. 1 is a schematic diagram of a structure of a conventional transflective liquid crystal display and an optical path therein;
  • FIG. 2 is a schematic structural view of a color filter substrate of a conventional transflective liquid crystal display;
  • 3 is a schematic diagram of a mask of a black matrix according to an embodiment of the present invention;
  • FIG. 4 is a schematic view of a mask of a color film according to an embodiment of the invention.
  • Figure 5 is a schematic view showing the structure of a transflective film substrate prepared by the method of the embodiment of the present invention.
  • Figure 6 is a schematic view of the optical path in a transflective liquid crystal display device prepared by the method of the embodiment of the present invention.
  • the effective light-passing hole of the color film substrate prepared by the method for preparing the color film substrate of the embodiment of the present invention is a light hole filling pattern of the color film layer through-hole and the black matrix of the black matrix layer formed by the mask of the color film. Superimposed formed.
  • the manufacturing process sequence may be: first forming a black matrix (BM) layer, and then forming a red (R), green (G), blue (B) color film layer.
  • a mask of a black matrix is prepared, and a specific aperture fill pattern is provided on the mask of the black matrix for a specific color sub-pixel.
  • a black matrix layer can be formed by the mask of the black matrix.
  • a mask for preparing a color film wherein the color masks of the prepared color film are provided with light-passing holes 17 of the same size for different color sub-pixels, as shown in FIG. 4 .
  • a color film layer can be formed by a mask of a color film.
  • the red, green, and blue color film preparation processes can use the same color film mask.
  • a black matrix layer is prepared by using the mask of the black matrix
  • a color film layer is prepared by using a mask of a color film
  • other layers of the color filter substrate are prepared according to a conventional process, thereby preparing a color filter substrate.
  • a mask of a black matrix of three sub-pixels is shown (the strip pattern 15 is only provided in the mask of the conventional black matrix without a specific aperture filling pattern 16).
  • the strip pattern 15 and a different aperture filling pattern 16 on the mask of the black matrix for the red, green, and blue sub-pixels
  • the light passing through the mask on the same color film is prepared for different color sub-pixels.
  • a hole 17, and a position of the light-passing hole 17 on the mask of the color film corresponds to a position of the light-filling pattern 16, so that a mask of a color film can be formed into three colors of red, green and blue.
  • Sub-pixel color film is shown in FIG. 3, a mask of a black matrix of three sub-pixels.
  • the method of the embodiment of the invention can set the actual effective light-passing hole of the red sub-pixel color film of the color film substrate, the actual effective light-passing hole of the green sub-pixel color film, and the blue sub-pixel color film.
  • the area ratio of the actual effective light-passing holes ranges from 1:0.9:0.8 to 1:6:2.
  • the method of the embodiment of the present invention can specifically achieve different sizes of actual effective light-passing holes formed in the sub-pixel color film of the color filter substrate by separately adjusting the size of the specific light hole filling pattern on the mask of the black matrix. That is, the area ratio of the actual effective light-passing hole of the red sub-pixel color film, the actual effective light-passing hole of the green sub-pixel color film, and the actual effective light-passing hole of the blue sub-pixel color film is
  • the red sub-pixel color film of the color film substrate is actually effective through hole
  • the green sub-pixel color film is actually effective through hole
  • the blue sub-pixel color film The area ratio of the actual effective light-passing holes may be, for example, 1:2:0.5.
  • the specific solution may be: for the red sub-pixel, a light hole filling pattern of half of the light-passing hole area of the mask on the color film is provided on the mask of the prepared black matrix;
  • the prepared black matrix mask is not provided with a light hole filling pattern;
  • for the blue sub-pixel a light shielding hole area of 3/4 of the mask on the color film is provided on the prepared black matrix mask plate.
  • Hole fill pattern Therefore, the light-passing holes 14 of the color film are blocked by the aperture-filling pattern 16' of the corresponding black matrix, so that the actual light-passing holes form the above-mentioned ratio of 1:2:0.5, as shown in FIG.
  • the method of the embodiment of the present invention may further comprise the step of forming an organic flat layer on the surface of the color film layer after the step S3.
  • the organic flat layer formed by the method of the embodiment of the present invention may have a flattening effect in addition to the color filter layer.
  • a specific light hole filling pattern 16 is disposed on a mask of a black matrix prepared for a specific color sub-pixel, and a mask for color films for different color sub-pixels is provided.
  • the light-passing holes 17 of the same size are prepared on the template, and the positions of the light-passing holes 17 on the mask plate of the color film correspond to the positions of the light-hole filling patterns 16, thereby passing the mask of the black matrix
  • the mask and the mask of the color film form a color film substrate.
  • the light hole filling pattern 16 corresponds to the light hole filling pattern 16 of the black matrix, and may partially cover the light passing holes 17 of the mask on the color film, respectively, thereby enabling use.
  • a color film mask is used to prepare red, green, and blue sub-pixel color films having different effective apertures 14 to ensure that the color filter substrate prepared by the method of the embodiment of the present invention is applied to a display device. The color shift does not occur during display, and the production cost of the color filter substrate is lowered.
  • the embodiment of the invention further provides a color filter substrate, which can be specifically prepared by the method described in the first embodiment.
  • the color filter substrate of the embodiment of the present invention includes a color film layer and a black matrix layer, wherein a light hole filling pattern 16 of a specific black matrix is disposed for the light passing holes 14 of the sub-pixel color film of a specific color.
  • the color film substrate of the embodiment of the invention can be applied to a transflective liquid crystal display device.
  • the color film substrate (also referred to as the upper substrate) may specifically include an upper glass substrate 1, a black matrix layer located under the upper glass substrate 1, and a color film layer 2 located under the black matrix layer.
  • the color film layer 2 specifically includes red, green, and blue color films, and the red, green, and blue color films have the same size of the light-passing holes 14 which can pass through a color film mask having the light-passing holes 17 as shown in FIG. A plate 18 is formed.
  • the upper substrate may further include an organic flat layer 3 for protecting the color film layer, preventing the color film layer from contaminating the liquid crystal, and also functioning as a flattening.
  • the black matrix layer may include a stripe pattern 15 of a black matrix (i.e., a specific pattern of the black matrix layer 10 in the prior art shown in Fig. 1) and a light hole filling pattern 16' of the black matrix.
  • a black matrix i.e., a specific pattern of the black matrix layer 10 in the prior art shown in Fig. 1
  • a light hole filling pattern 16' of the black matrix i.e., a specific pattern of the black matrix layer 10 in the prior art shown in Fig.
  • the red, green, and blue light are adjusted by adjusting the size of the actual effective light-passing holes of the red, green, and blue color films. proportion.
  • the area ratio of the actual effective light-passing hole of the red sub-pixel color film of the color film substrate, the actual effective light-passing hole of the green sub-pixel color film, and the actual effective light-passing hole of the blue sub-pixel color film may be 1:0.9:0.8 to 1: The range of 6:2.
  • the actual effective light-passing hole ratio ranges from 1:0.9:0.8 to 1. :6:2, which can be achieved by separately adjusting the size of the specific aperture fill pattern 16 on the mask of the black matrix.
  • the white color coordinate of the panel display can be kept at (0.33, 0.33)
  • the color film substrate is ensured to be applied to the display effect of the display device so that the display does not cause color shift.
  • the ratio of the actual effective light-passing holes on the red, green, and blue sub-pixel color film layers may be 1:2:0.5. Since the light-passing holes 14 of the red, green, and blue color film layers of the color film layer 2 have the same size, the black matrix layer can be disposed at a position of the light-passing hole 14 to form a hole-filling pattern 16 of a black matrix of a specific size. The above ratio of 1: 2: 0.5.
  • the specific solution may be for a red sub-pixel, and a mask fill pattern of half the light-passing aperture area of the mask of the color film may be disposed on the mask of the prepared black matrix;
  • the mask of the prepared black matrix may not be provided with a light hole filling pattern; for the blue sub-pixel, the aperture of the mask of the color film may be provided on the mask of the prepared black matrix by 3/4.
  • the aperture fill pattern therefore, the light-passing aperture of the mask of the color film is filled by the apertures 16 of the corresponding black matrix, so that the remaining effective light-passing portions form the above 1:2:0.5 Proportion, as shown in Figure 5.
  • the color filter substrate of the embodiment of the present invention may specifically be any color film substrate prepared by the method of the embodiment of the present invention.
  • Embodiment 3 The embodiment of the invention further provides a transflective liquid crystal display device comprising the color filter substrate of the second embodiment.
  • the transflective liquid crystal display device of the embodiment of the present invention may specifically be a display device such as a television, a computer display, or a mobile phone.
  • the transflective liquid crystal display device of the embodiment of the invention may include a display panel, and the display panel includes an upper substrate (also referred to as a color film substrate) and a lower substrate (which may be a TFT array substrate).
  • the display panel includes an upper substrate (also referred to as a color film substrate) and a lower substrate (which may be a TFT array substrate).
  • the lower substrate may specifically include a lower glass substrate 6, a gate metal layer 7 on the lower glass substrate 6, an insulating layer 5 on the gate metal layer 7, an organic layer 4 on the upper surface of the insulating layer 5, and a metal on the organic layer 4.
  • the upper substrate may include an upper glass substrate 1, a black matrix layer located under the upper glass substrate 1, and a color film layer 2 located under the black matrix layer.
  • the color film layer 2 specifically includes red, green, and blue color films, and the red, green, and blue color films have the same size of the light holes 14 .
  • a red, green, and blue color film can be formed by a color filter mask 18 (shown in Fig. 4) of a light-passing aperture 17 of a mask having a color film.
  • the upper substrate may further include an organic flat layer 3 for protecting the color film layer, preventing the color film layer from contaminating the liquid crystal, and also functioning as a flattening.
  • the black matrix layer may include a stripe pattern 15 of a black matrix (i.e., a specific pattern of the black matrix layer 10 in the prior art shown in Fig. 1) and a light hole filling pattern 16' of the black matrix.
  • a black matrix i.e., a specific pattern of the black matrix layer 10 in the prior art shown in Fig. 1
  • a light hole filling pattern 16' of the black matrix i.e., a specific pattern of the black matrix layer 10 in the prior art shown in Fig.
  • the ratio of the red, green, and blue light of the emitted light can be adjusted by adjusting the size of the actual effective light-passing holes of the red, green, and blue color films.
  • the area ratio of the actual effective light-passing hole of the red sub-pixel color film of the color film substrate, the actual effective light-passing hole of the green sub-pixel color film, and the actual effective light-passing hole of the blue sub-pixel color film may be 1:0.9:0.8 to 1: The range of 6:2.
  • the effective effective light-passing hole area ratio is 1:0.9:0.8 to 1.
  • the range of 6:2 can be achieved by separately adjusting the size of the specific aperture fill pattern 16 on the mask of the black matrix.
  • Red Since the size ratio of the actual effective light-passing holes of the red, green, and blue sub-pixel color film is set as: Red: The color film substrate is ensured to be applied to the display effect of the display device.
  • the light-passing holes 14 of the red, green and blue color film layers of the color film layer 2 have the same size, in order to ensure that the white light color coordinates of the panel display are maintained at (0.33, 0.33), red, green and blue sub-pixels
  • the area ratio of the light-passing holes on the upper side may be 1:2:0.5.
  • a light hole filling pattern of half the light-passing area of the mask on the color film can be provided on the mask of the prepared black matrix; for the green sub-pixel, in the prepared black matrix There may be no light hole filling pattern on the mask plate; for the blue sub-pixel, a light hole filling pattern of 3/4 of the light-emitting aperture area on the mask of the color film may be provided on the prepared black matrix mask plate. Therefore, the light-passing holes on the mask of the color film are blocked by the corresponding hole filling pattern, so that the remaining effective light-passing portions form the above-mentioned ratio of 1:2:0.5, as shown in FIG.
  • the optical path diagram of the display device is as shown in FIG. 6. Compared with the conventional display device shown in FIG. 1, the light-passing hole 14 of the color film layer in FIG. 6 is partially blocked by the optical hole filling pattern 16' of the black matrix. .
  • the above is only an exemplary embodiment of the present invention, and is not intended to limit the scope of the present invention. The scope of the present invention is defined by the appended claims.

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  • Optics & Photonics (AREA)
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  • Crystallography & Structural Chemistry (AREA)
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Abstract

一种彩膜基板的制备方法，包括：制备黑矩阵的掩模板，针对特定颜色亚像素在黑矩阵的掩模板上设有特定的光孔填充图案（16）。制备彩膜的掩模板（18），针对不同颜色亚像素在制备的彩膜的掩模板（18）上设有大小相同的通光孔（17）。通光孔（17）的位置与光孔填充图案（16）的位置对应。利用黑矩阵的掩模板和彩膜的掩模板（18）制备彩膜基板。

Description

彩膜基板的制备方法、 彩膜基板及半反半透式液晶显示装置 技术领域
本发明实施例涉及一种彩膜基板的制备方法、 彩膜基板及半反半透式液 晶显示装置。 背景技术
近几年来， 液晶显示器（如 TFT-LCD )在户外的移动性产品，例如手机、 PDA, 平板电脑市场的应用越来越广。 但是普通的液晶显示器件在户外太阳 光下使用时， 对比度较差， 使得屏幕的可读性不佳。 而半透半反式液晶显示 器通过增加面板的反光率， 能够增加显示器件在室外显示时的对比度， 使得 显示器在室外也可以保持优良的可读性能。
半反半透式液晶显示器的像素中有透射部分和反射部分， 其结构如图 1 所示。 为了增加光反射效率， 一般在对应于反射区的彩膜部分会做出透光的 通光孔。在现有技术中，如图 2所示通常在红、绿、蓝彩膜上留出通光孔 14, 使得反射光 19从每个通光孔 14中射出时，反射光 19就只经过一次彩膜（如 图 1所示） 。 如果每个亚像素的通光孔设置成一样大小， 红、 绿、 蓝彩膜制 备工艺可以釆用同一个掩膜板，工艺简单，但显示的白光色度会向蓝色漂移， 导致显示器显示颜色发生色偏。
为了防止显示器显示颜色发生色偏， 可以通过调整红、 绿、 蓝彩膜的掩 模板上通光孔的大小来调整出射光红、 绿、 蓝光的比例。 一般情况下， 将红、 绿、 蓝彩膜的掩模板上通光孔设置不同的尺寸， 这样可以保证显示器的显示 效果， 不发生色偏。 然而， 在这种情况下， 由于在红、 绿、 蓝各亚像素中设 置不同大小的通光孔就需要使用红、 绿、 蓝三个掩膜板， 因此增加了彩膜基 板的制造成本。 发明内容
本发明实施例提供一种彩膜基板的制备方法、 彩膜基板及半反半透式液 晶显示装置， 用于在保证显示装置在显示时不发生色偏的同时， 降低彩膜基 板的生产成本。
根据本发明实施例的一种彩膜基板的制备方法， 包括以下步骤： 制备黑矩阵的掩模板， 针对特定颜色亚像素在黑矩阵的掩模板上设有特 定的光孔填充图案；
制备彩膜的掩模板， 针对不同颜色亚像素在制备的彩膜的掩模板上设有 大小相同的通光孔；且所述通光孔的位置与所述光孔填充图案的位置相对应； 利用所述黑矩阵的掩模板和所述彩膜的掩模板制备彩膜基板。
在本发明一个实施例中， 所述方法在所述利用所述黑矩阵的掩模板和所 述彩膜的掩模板制备彩膜基板的步骤之后还包括在彩膜层表面生成有机平坦 层。
在本发明一个实施例中， 所述彩膜基板的红色亚像素彩膜实际有效通光 孔、 绿色亚像素彩膜实际有效通光孔和蓝色亚像素彩膜实际有效通光孔的面 积、比例范围为 1 :0.9:0.8至 1 :6:2。
在本发明一个实施例中， 所述彩膜基板的红色亚像素彩膜实际有效通光 孔、 绿色亚像素彩膜实际有效通光孔和蓝色亚像素彩膜实际有效通光孔的面 积比例为 1 :2:0.5。
在本发明一个实施例中， 所述制备黑矩阵的掩模板的步骤 S1 和所述制 备彩膜的掩模板的步骤的执行顺序互换。
本发明实施例还提供了一种通过所述彩膜基板的制备方法制备的彩膜基 板， 包括彩膜层和黑矩阵层， 对于特定颜色的亚像素彩膜的通光孔被对应的 黑矩阵的光孔填充图案遮挡。
进一步， 本发明实施例还提供一种半反半透式液晶显示装置， 包括显示 面板， 所述显示面板包括以上所述彩膜基板和薄膜晶体管阵列基板。 附图说明
为了更清楚地说明本发明实施例的技术方案， 下面将对实施例的附图作 简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例， 而非对本发明的限制。
图 1是现有半透半反液晶显示器的结构及在其中的光路示意图； 图 2是现有半透半反液晶显示器的彩膜基板的结构示意图； 图 3是本发明实施例所述的黑矩阵的掩膜板示意图；
图 4是本发明实施例所述的彩膜的掩膜板示意图；
图 5 是用本发明实施例所述的方法制备的半透半反彩膜基板结构示意 图；
图 6是用本发明实施例所述的方法制备的半透半反液晶显示装置中的光 路示意图。
其中， 1 上玻璃基板； 2彩膜层； 3 有机平坦层； 4有机层； 5 绝缘层； 6 下玻璃基板； 7栅金属层； 8像素电极层； 9金属反射层； 10 黑矩阵层； 11 有机彩膜层透射区域； 12有机彩膜层反射区域； 13. 黑矩阵条状图案区 域； 14通光孔； 15 条状图案； 16 光孔填充图案； 15， 黑矩阵的条状图案； 16， 矩阵的光孔填充图案； 17 彩膜的掩模板上的通光孔； 18彩膜的掩模板； 19反射光； 20透射光。 具体实施方式
为使本发明实施例的目的、 技术方案和优点更加清楚， 下面将结合本发 明实施例的附图，对本发明实施例的技术方案进行清楚、 完整地描述。显然， 所描述的实施例是本发明的一部分实施例， 而不是全部的实施例。 基于所描 述的本发明的实施例， 本领域普通技术人员在无需创造性劳动的前提下所获 得的所有其他实施例， 都属于本发明保护的范围。
实施例一
本发明实施例的彩膜基板的制备方法所制备的彩膜基板的有效通光孔， 是通过彩膜的掩模板形成的彩膜层通光孔与黑矩阵层的黑矩阵的光孔填充图 案叠加形成的。 制造工艺顺序可以是： 先形成黑矩阵（BM )层， 再形成红 ( R ) 、 绿（G ) 、 蓝（B )彩膜层。
本发明实施例提供的一种彩膜基板的制备方法，具体可以包括以下步骤：
51、 制备黑矩阵的掩模板， 针对特定颜色亚像素在黑矩阵的掩模板上设 有特定的光孔填充图案。
通过所述黑矩阵的掩模板可以形成黑矩阵层。
52、 制备彩膜的掩模板， 针对不同颜色亚像素在制备的彩膜的掩模板上 设有大小相同的通光孔 17 , 如图 4所示。 通过彩膜的掩模板可以形成彩膜层。
由于针对不同颜色亚像素制备大小相同的彩膜的掩模板上的通光孔 17, 因此红、 绿、 蓝彩膜制备工艺可以釆用同一个彩膜掩膜板。
S3、 利用所述黑矩阵的掩模板和所述彩膜的掩模板制备彩膜基板。
具体工艺， 利用所述黑矩阵的掩模板制备黑矩阵层， 利用彩膜的掩模板 制备彩膜层，按照现有的工序制备彩膜基板的其它层，从而制备出彩膜基板。
以上步骤 Sl、 S2的执行顺序可以互换。
如图 3所示， 显示出了 3个亚像素的黑矩阵的掩模板 (现有的黑矩阵的 掩模板中仅设置条状图案 15,而没有特定的光孔填充图案 16 )。通过针对红、 绿、蓝亚像素，在黑矩阵的掩模板上设置条状图案 15和不同的光孔填充图案 16, 同时针对不同颜色亚像素制备大小相同的彩膜的掩模板上的通光孔 17, 且所述彩膜的掩模板上的通光孔 17的位置与所述光孔填充图案 16的位置相 对应， 使得一个彩膜的掩模板可形成红、 绿、 蓝三种颜色的亚像素彩膜。 时显示颜色发生色偏， 本发明实施例的所述方法可以设定彩膜基板的红色亚 像素彩膜实际有效通光孔、 绿色亚像素彩膜实际有效通光孔和蓝色亚像素彩 膜实际有效通光孔的面积比例范围为 1 :0.9:0.8至 1 :6:2。
本发明实施例的所述方法具体可以通过分别调整黑矩阵的掩模板上特定 的光孔填充图案的大小， 来实现形成在彩膜基板的亚像素彩膜中的实际有效 通光孔尺寸不同， 即， 红色亚像素彩膜的实际有效通光孔、 绿色亚像素彩膜 的实际有效通光孔和蓝色亚像素彩膜的实际有效通光孔的面积比例范围为
1 :0.9:0.8至 1 :6:2。
将红、绿、蓝亚像素彩膜的实际通光孔的尺寸比例设置为： 红： 绿： 蓝 = 1 : 2: 0.5, 这样就可以保证面板显示的白光色坐标保持在（0.33,0.33 ) , 从 而保证所述彩膜基板应用于显示装置的显示效果， 使其不发生色偏。
为了保证面板显示的白光色坐标保持在（ 0.33,0.33 ) , 所述彩膜基板的 红色亚像素彩膜实际有效通光孔、 绿色亚像素彩膜实际有效通光孔和蓝色亚 像素彩膜实际有效通光孔的面积比例例如可以为 1 :2 :0.5。
具体方案可以为： 针对红色亚像素， 在所制备的黑矩阵的掩模板上设有 占彩膜的掩模板上通光孔面积一半的光孔填充图案； 针对绿色亚像素， 所在 制备的黑矩阵的掩模板上不设有光孔填充图案； 针对蓝色亚像素， 在所制备 的黑矩阵的掩模板上设有占彩膜的掩模板上通光孔面积 3/4 的光孔填充图 案。 因此， 彩膜的通光孔 14被对应的黑矩阵的光孔填充图案 16'所遮挡， 使 得实际通光孔形成上述的 1 :2:0.5比例， 如图 5所示。
本发明实施例的所述方法为了保护彩膜层， 防止彩膜层污染液晶， 在步 骤 S3后还可以包括在彩膜层表面形成有机平坦层的步骤。
通过本发明实施例的所述方法形成的有机平坦层除了保护彩膜层外还可 以具有平坦化的作用。
本发明实施例的所述彩膜基板的制备方法， 在针对特定颜色亚像素制备 的黑矩阵的掩模板上设有特定的光孔填充图案 16,而在针对不同颜色亚像素 的彩膜的掩模板上制备大小相同的通光孔 17,且所述彩膜的掩模板上的通光 孔 17的位置与所述光孔填充图案 16的位置相对应， 由此， 通过所述黑矩阵 的掩膜板和彩膜的掩膜板形成彩膜基板。 由于形成黑矩阵层时， 所述光孔填 充图案 16对应的是黑矩阵的光孔填充图案 16， ， 并且可以分别部分覆盖所 述彩膜的掩模板上的通光孔 17, 因此可以实现使用一个彩膜的掩膜板制备具 有不同尺寸的实际有效通光孔 14的红、绿、蓝亚像素彩膜，从而保证通过本 发明实施例的所述方法制备的彩膜基板应用于显示装置， 使得显示时不发生 色偏， 而且降低了彩膜基板的生产成本。
实施例二
本发明实施例还提供了一种彩膜基板， 具体可以利用实施例一所述方法 制备。
本发明实施例的所述彩膜基板包括彩膜层和黑矩阵层， 其中， 对于特定 颜色的亚像素彩膜的通光孔 14设置有特定的黑矩阵的光孔填充图案 16， 。
为了便于本领域技术人员的理解， 下面结合图 6具体说明本发明实施例 的所述彩膜基板的结构。
本发明实施例的所述彩膜基板可以应用于半反半透式液晶显示装置中。 所述彩膜基板（也称上基板）具体可以包括上玻璃基板 1、 位于上玻璃 基板 1下层的黑矩阵层、 位于黑矩阵层下层的彩膜层 2。 彩膜层 2具体包括 红、 绿、 蓝彩膜， 红、 绿、 蓝彩膜具有尺寸相同的通光孔 14, 其可以通过一 个参见图 4所示的具有通光孔 17的彩膜掩膜板 18形成。 在彩膜层 2下层， 上基板还可以包括有机平坦层 3 , 用于保护彩膜层， 防止彩膜层污染液晶， 另外还可以起到平坦化的作用。
所述黑矩阵层可以包括黑矩阵的条状图案 15， （即图 1所示现有技术中 的黑矩阵层 10的具体图案）和黑矩阵的光孔填充图案 16'。
为了防止半反半透式液晶显示装置显示颜色发生色偏， 在本发明实施例 中， 通过调整红、 绿、 蓝彩膜的实际有效通光孔的大小来调整出射光红、 绿、 蓝光的比例。 彩膜基板的红色亚像素彩膜实际有效通光孔、 绿色亚像素彩膜 实际有效通光孔和蓝色亚像素彩膜实际有效通光孔的面积比例可以为 1 :0.9:0.8至 1 :6:2的范围。
为了实现彩膜基板的红色亚像素彩膜实际有效通光孔、 绿色亚像素彩膜 实际有效通光孔和蓝色亚像素彩膜实际有效通光孔的比例范围为 1 :0.9:0.8至 1 :6:2, 可以通过分别调整黑矩阵的掩模板上特定的光孔填充图案 16 的大小 来实现。
由于将红、绿、蓝亚像素彩膜的实际有效通光孔的尺寸比例设置为： 红： 绿： 蓝= 1 : 2: 0.5, 可以保证面板显示的白光色坐标保持在（0.33,0.33 ) , 保证所述彩膜基板应用于显示装置的显示效果， 使得显示不发生色偏。
为了保证显示面板显示的白光色坐标保持在（0.33,0.33 ) , 红、 绿、 蓝 亚像素彩膜层上的实际有效通光孔的比例可以为 1 :2:0.5。由于彩膜层 2的红、 绿、 蓝彩膜层的通光孔 14具有相同尺寸， 因此黑矩阵层在通光孔 14位置就 可以设置特定尺寸的黑矩阵的光孔填充图案 16，以实现上述 1 : 2: 0.5的比例。
因此， 具体的方案可以是针对红色亚像素， 在所制备的黑矩阵的掩模板 上可以设有占彩膜的掩模板的通光孔面积一半的光孔填充图案； 针对绿色亚 像素， 在所制备的黑矩阵的掩模板上可以不设有光孔填充图案； 针对蓝色亚 像素， 在所制备的黑矩阵的掩模板上可以设有占彩膜的掩模板的通光孔面积 3/4 的光孔填充图案， 因此， 彩膜的掩模板的通光孔就会被对应的黑矩阵的 光孔填充图案 16，所遮挡，使得剩下的有效通光部分形成上述的 1 :2:0.5比例， 如图 5所示。
本发明实施例的所述彩膜基板， 具体可以是本发明实施例的所述方法制 备的任何一种彩膜基板。
实施例三 本发明实施例还提供了一种半反半透式液晶显示装置， 包括实施例二所 述的彩膜基板。 本发明实施例的所述半反半透式液晶显示装置具体可以是电 视、 电脑显示器、 手机等显示装置。
为了便于本领域技术人员的理解， 下面结合图 6具体说明本发明实施例 的所述半反半透式液晶显示装置的结构。
本发明实施例的所述半反半透式液晶显示装置可以包括显示面板， 所述 显示面板包括上基板（也称彩膜基板）和下基板（可以是 TFT阵列基板） 。
下基板具体可以包括下玻璃基板 6、位于下玻璃基板 6上面的栅金属层 7、 位于栅金属层 7上面的绝缘层 5、 位于绝缘层 5上面的有机层 4和位于有机 层 4上面的金属反射层 9和位于有机层 4上面的源漏金属层（图中未示出）， 以及与金属放射层 9和源漏金属层相连的像素电极层 8。
上基板（彩膜基板）可以包括上玻璃基板 1、 位于上玻璃基板 1下面的 黑矩阵层、 位于黑矩阵层下面的彩膜层 2。
彩膜层 2具体包括红、 绿、 蓝彩膜， 红、 绿、 蓝彩膜具有大小相同的通 光孔 14。 例如， 可以通过一个具有彩膜的掩膜板的通光孔 17的彩膜掩膜板 18 (参见图 4所示）制成红、 绿、 蓝彩膜。
在彩膜层 2下面， 上基板还可以包括有机平坦层 3 , 用于保护彩膜层， 防止彩膜层污染液晶， 另外还可以起到平坦化的作用。
所述黑矩阵层可以包括黑矩阵的条状图案 15， （即图 1所示现有技术中 的黑矩阵层 10的具体图案）和黑矩阵的光孔填充图案 16'。
为了防止半反半透式液晶显示装置显示颜色发生色偏，可以通过调整红、 绿、 蓝彩膜的实际有效通光孔的大小来调整出射光红、 绿、 蓝光的比例。 彩 膜基板的红色亚像素彩膜实际有效通光孔、 绿色亚像素彩膜实际有效通光孔 和蓝色亚像素彩膜实际有效通光孔的面积比例可以为 1 :0.9:0.8至 1 :6:2的范 围。
为了实现彩膜基板的红色亚像素彩膜实际有效通光孔、 绿色亚像素彩膜 实际有效通光孔和蓝色亚像素彩膜实际有效通光孔的面积比例为 1 :0.9:0.8至 1 :6:2 的范围， 可以通过分别调整黑矩阵的掩模板上特定的光孔填充图案 16 的大小来实现。
由于将红、绿、蓝亚像素彩膜的实际有效通光孔的尺寸比例设置为： 红： 保证所述彩膜基板应用于显示装置的显示效果。
进一步的方案， 由于彩膜层 2的红、绿、蓝彩膜层的通光孔 14具有相同 尺寸， 为了保证面板显示的白光色坐标保持在（0.33,0.33 ) , 红、 绿、 蓝亚 像素上的通光孔的面积比例可以为 1 :2:0.5。 因此， 针对红色亚像素， 在所制 备的黑矩阵的掩模板上可以设有占彩膜的掩模板上通光孔面积一半的光孔填 充图案； 针对绿色亚像素， 在所制备的黑矩阵的掩模板上可以不设有光孔填 充图案； 针对蓝色亚像素， 在所制备的黑矩阵的掩模板上可以设有占彩膜的 掩模板上通光孔面积 3/4的光孔填充图案， 因此， 彩膜的掩模板上通光孔就 会被对应的光孔填充图案所遮挡， 使得剩下的有效通光部分形成上述的 1 :2:0.5比例， 如图 5所示。
该显示装置的光路示意图如图 6所示， 与图 1所显示的现有显示装置相 比， 图 6中的彩膜层的通光孔 14通过黑矩阵的光孔填充图案 16'实现部分遮 挡。 以上所述仅是本发明的示范性实施方式， 而非用于限制本发明的保护范 围， 本发明的保护范围由所附的权利要求确定。

Claims

权利要求书
1、 一种彩膜基板的制备方法， 包括以下步骤：
制备黑矩阵的掩模板， 针对特定颜色亚像素在黑矩阵的掩模板上设有特 定的光孔填充图案；
制备彩膜的掩模板， 针对不同颜色亚像素在制备的彩膜的掩模板上设有 大小相同的通光孔；且所述通光孔的位置与所述光孔填充图案的位置相对应； 利用所述黑矩阵的掩模板和所述彩膜的掩模板制备彩膜基板。
2、如权利要求 1所述的方法， 其中， 所述方法在所述利用所述黑矩阵的 掩模板和所述彩膜的掩模板制备彩膜基板的步骤之后还包括在彩膜层表面形 成有机平坦层。
3、如权利要求 1或 2所述的方法， 其中， 所述彩膜基板的红色亚像素彩 膜实际有效通光孔、 绿色亚像素彩膜实际有效通光孔和蓝色亚像素彩膜实际 有效通光孔的面积比例范围为 1 :0.9:0.8至 1 :6:2。
4、如权利要求 3所述的方法， 其中， 所述彩膜基板的红色亚像素彩膜实 际有效通光孔、 绿色亚像素彩膜实际有效通光孔和蓝色亚像素彩膜实际有效 通光孔的面积比例为 1 :2:0.5。
5、如权利要求 1至 4中任一所述的方法， 其中， 所述制备黑矩阵的掩模 板的步骤和所述制备彩膜的掩模板的步骤的执行顺序互换。
6、一种利用权利要求 1至 5任一所述的方法制备的彩膜基板， 其中， 包 括彩膜层和黑矩阵层， 对于特定颜色的亚像素彩膜通光孔被对应的黑矩阵的 光孔填充图案遮挡。
7、 一种半反半透式液晶显示装置， 其中， 所述显示装置包括显示面板， 所述显示面板包括薄膜晶体管阵列基板和权利要求 8所述的彩膜基板。
PCT/CN2012/085700 2012-07-27 2012-11-30 彩膜基板的制备方法、彩膜基板及半反半透式液晶显示装置 WO2014015605A1 (zh)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10324590B2 (en) 2014-09-02 2019-06-18 Apple Inc. Reduced size configuration interface

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102778781B (zh) * 2012-07-27 2015-05-20 京东方科技集团股份有限公司 彩膜基板的制备方法、彩膜基板及半反半透式液晶显示装置
CN102819057B (zh) 2012-08-24 2014-09-03 京东方科技集团股份有限公司 一种显示装置、彩色滤光片及其制作方法
CN103197462B (zh) 2013-03-26 2016-05-25 京东方科技集团股份有限公司 一种彩膜基板、显示面板及显示装置
CN105976784B (zh) * 2016-07-21 2018-10-16 武汉华星光电技术有限公司 显示亮度调整方法
CN106773258A (zh) * 2017-01-03 2017-05-31 京东方科技集团股份有限公司 显示面板、显示装置
CN113540158A (zh) * 2020-04-15 2021-10-22 华为技术有限公司 Oled显示面板及终端设备
CN111816114B (zh) * 2020-08-17 2023-09-29 京东方科技集团股份有限公司 显示面板调光装置及调光方法、显示面板及其驱动方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1492265A (zh) * 2002-10-25 2004-04-28 三星电子株式会社 滤色板、其制造方法及包括滤色板的液晶显示器
US20070224524A1 (en) * 2006-03-24 2007-09-27 Innolux Display Corp. Method for manufacturing color filter of transflective liquid crystal display
JP2009251581A (ja) * 2008-04-11 2009-10-29 V Technology Co Ltd 露光用マスク及び露光装置
CN101738778A (zh) * 2008-11-07 2010-06-16 上海天马微电子有限公司 半反半透液晶显示装置及其上基板的制造方法
JP2010271462A (ja) * 2009-05-20 2010-12-02 Toppan Printing Co Ltd カラーフィルタ用フォトマスク、カラーフィルタの製造方法、及び半透過型液晶表示装置用カラーフィルタ
CN102778781A (zh) * 2012-07-27 2012-11-14 京东方科技集团股份有限公司 彩膜基板的制备方法、彩膜基板及半反半透式液晶显示装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4162880B2 (ja) * 2001-07-12 2008-10-08 ティーピーオー ホンコン ホールディング リミテッド カラーフィルタ及びこれを用いた液晶表示装置の製造方法
KR101012494B1 (ko) * 2003-04-04 2011-02-08 엘지디스플레이 주식회사 반사투과형 액정표시장치
KR100524621B1 (ko) * 2003-05-23 2005-10-28 엘지.필립스 엘시디 주식회사 반사투과형 액정표시장치 및 그 제조방법
JP2005148216A (ja) * 2003-11-12 2005-06-09 Seiko Epson Corp カラーフィルタ基板、及びそのカラーフィルタ基板を備える電気光学装置並びに電子機器

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1492265A (zh) * 2002-10-25 2004-04-28 三星电子株式会社 滤色板、其制造方法及包括滤色板的液晶显示器
US20070224524A1 (en) * 2006-03-24 2007-09-27 Innolux Display Corp. Method for manufacturing color filter of transflective liquid crystal display
JP2009251581A (ja) * 2008-04-11 2009-10-29 V Technology Co Ltd 露光用マスク及び露光装置
CN101738778A (zh) * 2008-11-07 2010-06-16 上海天马微电子有限公司 半反半透液晶显示装置及其上基板的制造方法
JP2010271462A (ja) * 2009-05-20 2010-12-02 Toppan Printing Co Ltd カラーフィルタ用フォトマスク、カラーフィルタの製造方法、及び半透過型液晶表示装置用カラーフィルタ
CN102778781A (zh) * 2012-07-27 2012-11-14 京东方科技集团股份有限公司 彩膜基板的制备方法、彩膜基板及半反半透式液晶显示装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10324590B2 (en) 2014-09-02 2019-06-18 Apple Inc. Reduced size configuration interface

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