WO2020039989A1 - 電子部品及び電子部品の製造方法 - Google Patents
電子部品及び電子部品の製造方法 Download PDFInfo
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- WO2020039989A1 WO2020039989A1 PCT/JP2019/031746 JP2019031746W WO2020039989A1 WO 2020039989 A1 WO2020039989 A1 WO 2020039989A1 JP 2019031746 W JP2019031746 W JP 2019031746W WO 2020039989 A1 WO2020039989 A1 WO 2020039989A1
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- Prior art keywords
- glass
- layer
- electronic component
- alloy layer
- alloy
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- 238000000034 method Methods 0.000 title claims abstract description 36
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 26
- 239000011521 glass Substances 0.000 claims abstract description 120
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 116
- 239000000956 alloy Substances 0.000 claims abstract description 116
- 229910015363 Au—Sn Inorganic materials 0.000 claims abstract description 110
- 239000000919 ceramic Substances 0.000 claims abstract description 41
- 230000005496 eutectics Effects 0.000 claims abstract description 8
- 229910052737 gold Inorganic materials 0.000 claims description 16
- 229910052718 tin Inorganic materials 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 10
- 238000000151 deposition Methods 0.000 claims description 2
- 239000010931 gold Substances 0.000 description 152
- 239000000843 powder Substances 0.000 description 25
- 238000005304 joining Methods 0.000 description 19
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 17
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- 239000002184 metal Substances 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 9
- 239000012298 atmosphere Substances 0.000 description 8
- 230000004907 flux Effects 0.000 description 8
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- 239000002270 dispersing agent Substances 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
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- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
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- 238000001704 evaporation Methods 0.000 description 3
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- 238000002156 mixing Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
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- 239000011248 coating agent Substances 0.000 description 2
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- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
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- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
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- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
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- 238000007711 solidification Methods 0.000 description 1
- VSAISIQCTGDGPU-UHFFFAOYSA-N tetraphosphorus hexaoxide Chemical compound O1P(O2)OP3OP1OP2O3 VSAISIQCTGDGPU-UHFFFAOYSA-N 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Images
Classifications
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- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/061—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of metal
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- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
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- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
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- C04B41/90—Coating or impregnation for obtaining at least two superposed coatings having different compositions at least one coating being a metal
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- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
- H01C17/06506—Precursor compositions therefor, e.g. pastes, inks, glass frits
- H01C17/06513—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/008—Thermistors
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- H01—ELECTRIC ELEMENTS
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- H01C7/02—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having positive temperature coefficient
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- H01C7/02—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having positive temperature coefficient
- H01C7/021—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having positive temperature coefficient formed as one or more layers or coatings
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- H—ELECTRICITY
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- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F27/00—Details of transformers or inductances, in general
- H01F27/06—Mounting, supporting or suspending transformers, reactors or choke coils not being of the signal type
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G13/00—Apparatus specially adapted for manufacturing capacitors; Processes specially adapted for manufacturing capacitors not provided for in groups H01G4/00 - H01G11/00
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- H01G2/00—Details of capacitors not covered by a single one of groups H01G4/00-H01G11/00
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- H01G2/06—Mountings specially adapted for mounting on a printed-circuit support
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
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- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
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- H01C7/04—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having negative temperature coefficient
Definitions
- the present invention relates to an electronic component such as a thermistor and a capacitor, and a method for manufacturing the electronic component.
- This application claims priority based on Japanese Patent Application No. 2018-154404 for which it applied on August 21, 2018, and uses the content here.
- Such an electronic component is bonded to a bonding target such as a substrate using an Au-Sn sheet-shaped preform.
- a bonding target such as a substrate using an Au-Sn sheet-shaped preform.
- vacuum suction is performed from a suction port formed on the surface of the electronic component to suck the Au-Sn sheet-shaped preform onto the surface of the electronic component. It describes that after an object to be joined is placed on an Au-Sn sheet-shaped preform, the Au-Sn sheet-shaped preform is heated and melted to join the electronic component and the object to be joined.
- various metallized layers are formed on an element such as an LED by a sputtering method, a vapor deposition method or a plating method, an Au-Sn paste is printed on the Au metallized layer on the outermost surface, and a heat treatment (reflow treatment) is performed.
- a technique for forming a Sn alloy layer is known.
- Patent Literature 3 discloses that an Au—Sn alloy solder paste is applied on a device with the bonding surface of the device facing upward, and the Au—Sn alloy solder paste is melted by reflow treatment in a non-oxidizing atmosphere. Is cooled and solidified to form a solidified Au—Sn alloy solder layer, and the element having the solidified Au—Sn alloy solder layer is inverted to solidify the Au—Sn alloy solder layer. The device is placed on the substrate such that the Sn alloy solder layer is in contact with the substrate, and in this state, the device is reflowed in a non-oxidizing atmosphere to remove the device through the void-free Au-Sn alloy solder joint. It is described that it is bonded to a substrate.
- Patent Document 4 discloses that an Au—Sn alloy powder containing Sn: 20 to 25 wt%, the balance being Au, having a particle size of 10 ⁇ m or less, and an RA flux of 15 to 30 wt%.
- the mixed Au-Sn-containing alloy paste is screen-printed on a predetermined region on the Au metallized layer, and then the Au-Sn alloy powder is heated and melted and then solidified to have a thickness of 5 ⁇ m or less, and It is described that an Au—Sn alloy thin film having at least a eutectic structure is formed.
- Patent Documents 3 and 4 are troublesome and costly.
- the Au-Sn sheet described in Patent Document 2 is a hard and brittle material, and it takes time to process the preform into various shapes. Further, since the Au-Sn sheet-shaped preform is thin and small, it is difficult to position between the electronic component and a bonding target such as a substrate, and the positioning operation is complicated.
- the present invention has been made in view of such circumstances, and an object of the present invention is to provide an electronic component that can be easily joined to an object to be joined and a method of manufacturing the electronic component.
- the electronic component according to the present invention includes a ceramic element, a glass-containing Au layer formed on both surfaces of the ceramic element, and an Au-Sn alloy layer formed on at least one of the glass-containing Au layers. Prepare.
- the Au—Sn alloy layer is formed on at least one of the glass-containing Au layers formed on both surfaces of the ceramic element.
- the electronic component can be easily joined to the joining object only by heating in a state where the electronic component is brought into contact with the electronic component. Further, since there is no need to position the sheet-shaped preform between the electronic component and the object to be joined, the joining operation between the electronic component and the object to be joined can be simplified.
- a pure Au layer may be provided between the glass-containing Au layer and the Au—Sn alloy layer.
- the glass exposed on the surface of the glass-containing Au layer repels Au—Sn, so that the glass is exposed on the surface of the Au—Sn alloy layer. Irregularities may occur.
- the exposed portion of the glass or the uneven portion weakens the joining with the joining target, and may lower the joining strength between the electronic component and the joining target and the thermal conductivity between the electronic component and the joining target.
- the pure Au layer formed between the Au—Sn alloy layer and the glass-containing Au layer covers the entire surface of the glass-containing Au layer including the exposed glass, Since no irregularities are formed on the surface of the Au—Sn alloy layer formed thereon and the glass is not exposed, the electronic component can be reliably bonded to the bonding target. Therefore, it is possible to suppress a decrease in the bonding strength with the bonding target and the thermal conductivity to the bonding target.
- the Au—Sn alloy layer preferably has a eutectic structure of Au and Sn.
- the Au—Sn alloy layer has a eutectic structure of Au and Sn generated by solidification after melting, that is, since the Au—Sn alloy layer is in a solidified state after being melted.
- the method for manufacturing an electronic component according to the present invention includes a glass-containing Au layer forming step of forming glass-containing Au layers on both surfaces of a ceramic element, and at least one of the glass-containing Au layers formed in the glass-containing Au layer forming step. Forming an Au—Sn alloy layer thereon.
- a glass-containing Au layer is formed on both surfaces of a ceramic element, and then an Au—Sn alloy layer is formed on at least one of the glass-containing Au layers. Electronic parts that can be joined can be manufactured.
- the method further includes, before the alloy layer forming step, a pure Au layer forming step of forming a pure Au layer on the glass-containing Au layer.
- the glass in the glass-containing Au layer is hardly wetted and repels Au and Sn, so that the surface of the Au—Sn alloy layer is likely to have irregularities.
- the portion where the glass is exposed or the uneven portion is weakly bonded to the bonding target, and the bonding strength of the electronic component to the bonding target and the thermal conductivity between the electronic component and the bonding target may be reduced.
- the Au—Sn alloy layer is formed by depositing an Au—Sn alloy on at least one of the glass-containing Au layers. Good to do.
- the Au—Sn alloy layer is formed by evaporating the Au—Sn alloy, so that the thickness of the Au—Sn alloy layer can be extremely small.
- the Au—Sn alloy layer includes an Au—Sn alloy containing Au and Sn on at least one of the glass-containing Au layers. It is preferable that the Au—Sn alloy layer is formed by applying a layer paste, heating and melting, and then solidifying.
- the thickness of the Au—Sn alloy layer can be freely set only by changing the thickness of the applied Au—Sn alloy layer paste.
- the thickness can be reduced to about 4 ⁇ m.
- the Au—Sn alloy layer paste is heated and melted, and then solidified (reflowed) to form a eutectic structure.
- the melting property of the alloy layer can be improved.
- the method for manufacturing an electronic component according to the present invention includes a glass-containing Au layer forming step of forming a glass-containing Au layer on both surfaces of a ceramic base material (undivided material) having a size that can be divided into a plurality of ceramic elements; An alloy layer forming step of forming an Au—Sn alloy layer on at least one of the glass-containing Au layers formed in the Au layer forming step; and dividing the ceramic base material into a plurality of pieces after the alloy layer forming step. An individualizing step of individualizing the ceramic element.
- each process can be performed more easily than in the case where each layer is formed on each singulated ceramic element.
- the formation speed can be improved. Therefore, the manufacturing cost of the electronic component can be reduced.
- the electronic component can be easily joined to the joining object, and the production cost of the electronic component can be reduced.
- FIG. 1 is a cross-sectional view illustrating an electronic component according to an embodiment of the present invention.
- 4 is a flowchart illustrating a method for manufacturing an electronic component according to the embodiment.
- FIG. 4 is a cross-sectional view showing a state in which a glass-containing Au paste is applied to both surfaces of a ceramic element in a manufacturing process of the electronic component in the embodiment.
- FIG. 3 is a cross-sectional view showing a state in which a pure Au film is formed on a glass-containing Au layer in a manufacturing process of the electronic component in the embodiment.
- FIG. 4 is a cross-sectional view showing a state in which a paste for an Au—Sn alloy layer is applied on a pure Au layer in a manufacturing process of the electronic component in the embodiment.
- FIG. 9 is a cross-sectional view showing an electronic component in which an Au—Sn alloy layer is provided on both surfaces of a ceramic element according to another embodiment of the present invention.
- FIG. 7 is a cross-sectional view showing an electronic component in which a pure Au layer is not provided and an Au—Sn alloy layer is directly formed on a glass-containing Au layer according to another embodiment of the present invention.
- FIG. 1 is a cross-sectional view illustrating an electronic component 1 of the present embodiment.
- an electronic component 1 used as a thermistor or a capacitor includes a ceramic element 11, glass-containing Au layers 12A and 12B formed on both surfaces of the ceramic element 11, and glass-containing Au layers 12A and 12B. It has pure Au layers 13A and 13B formed thereon, and an Au—Sn alloy layer 14 formed on the pure Au layer 13B.
- the electronic component 1 is fixed to a joining target such as a substrate (not shown). Specifically, the Au—Sn alloy layer 14 of the electronic component 1 is placed on the joining surface to be joined and heated, and the molten Au—Sn alloy layer 14 is cooled and solidified to join the electronic component 1. The object is joined.
- a wire can be connected to the pure Au layer 13A on which the Au—Sn alloy layer 14 is not laminated by wire bonding or the like.
- the ceramic element 11 is, for example, a thermistor element such as an oxide of one or more metals selected from Mn, Co, Fe, Ni, Cu, Al, and the like, is formed in a rectangular plate shape, and has a thickness of 100 ⁇ m. It is set to ⁇ 500 ⁇ m. For example, when the ceramic element 11 is a flake (flake-shaped) thermistor element, the thickness is set to 0.6 mm ⁇ 0.6 mm and the thickness is 150 ⁇ m in plan view.
- the glass-containing Au layers 12A and 12B are formed by applying a paste in which a glass frit (glass powder) and a gold powder are mixed (hereinafter, referred to as a glass-containing Au paste) and performing a heat treatment at 350 ° C. to 950 ° C. can get. During the heat treatment, the glass frit softens and the gold powder sinters.
- the glass-containing Au layers 12A and 12B are made of a sintered body of gold (Au), and glass frit is dispersed in the glass-containing Au layers 12A and 12B.
- the thickness of the glass-containing Au layers 12A and 12B is set to 1 ⁇ m to 20 ⁇ m, preferably 4 ⁇ m to 15 ⁇ m, and more preferably 4 ⁇ m to 9 ⁇ m.
- Pure Au layers 13A and 13B are preferably formed on the glass-containing Au layers 12A and 12B, that is, on the surfaces of the glass-containing Au layers 12A and 12B opposite to the ceramic element 11.
- the pure Au layers 13A and 13B are made of gold having a purity of 97.00% by mass or more.
- the thickness of the pure Au layers 13A and 13B is set to, for example, 0.01 ⁇ m to 10 ⁇ m, preferably 2 ⁇ m to 8 ⁇ m, and more preferably 2 ⁇ m to 6 ⁇ m.
- the Au—Sn alloy layer 14 is formed on the pure Au layer 13B among the pure Au layers 13A and 13B.
- the glass in the glass-containing Au layer 12B repels Au and Sn in a molten state, so that the surface of the Au—Sn alloy layer 14 has irregularities.
- Cheap In the surface of the glass-containing Au layer 12B, a portion where glass is exposed and a concavo-convex portion are weakened in bonding with a bonding target, and thus there is a possibility that bonding strength with the bonding target and thermal conductivity to the bonding target may be reduced.
- the Au—Sn alloy layer 14 is a joining layer formed by melting and solidifying a metal powder in an Au—Sn alloy layer paste described later, for joining the electronic component 1 and an object to be joined.
- the Au—Sn alloy layer 14 is reflowed after the Au—Sn alloy layer paste is applied on the glass-containing Au layer 12B or the pure Au layer 13B (in this embodiment, on the pure Au layer 13B). (Solidified after heating and melting).
- the Au—Sn alloy layer 14 is formed on the pure Au layer 13B.
- the Au-Sn alloy layer 14 has a eutectic structure of Au and Sn since it is in a state of being solidified after being melted by reflow.
- the thickness of the Au—Sn alloy layer 14 is set, for example, to 3 ⁇ m or more and 30 ⁇ m or less, more preferably 5 ⁇ m or more and 25 ⁇ m or less, and still more preferably 10 ⁇ m or more and 15 ⁇ m or less.
- the method for manufacturing the electronic component 1 includes a glass-containing Au layer forming step of forming the glass-containing Au layers 12A and 12B on the ceramic element 11 and a pure Au layer 13A and 13B on the glass-containing Au layers 12A and 12B.
- the method includes an Au layer forming step and an alloy layer forming step of forming the Au—Sn alloy layer 14 on the pure Au layer 13B on the glass-containing Au layer 12B.
- the pure Au layer forming step is performed, but the pure Au layer forming step is not an essential step.
- the steps will be described in order.
- the glass-containing Au layer forming step includes a glass-containing Au paste application step (S11), a drying step (S12), and a firing step (S13) shown in FIG.
- Glass-containing Au paste application step First, as shown in FIG. 3A, glass-containing Au pastes 121 and 122 are applied to both surfaces of the ceramic element 11 (S11). When applying the glass-containing Au pastes 121 and 122, a screen printing method or the like can be adopted.
- the coating thickness may be in the range of 1 ⁇ m to 25 ⁇ m, preferably 6 ⁇ m to 20 ⁇ m, more preferably 6 ⁇ m to 18 ⁇ m.
- the glass-containing Au pastes 121 and 122 contain gold powder, glass powder (glass frit), other oxide powder, resin, solvent, dispersant, and plasticizer.
- the content of a powder component composed of a gold powder, a glass powder, and another oxide powder is 30% by mass or more and 90% by mass or less of the entire glass-containing Au paste; Dispersant and plasticizer.
- the particle size of the glass powder is 0.01 ⁇ m or more and 10 ⁇ m or less, preferably 1 ⁇ m to 10 ⁇ m, more preferably 1 ⁇ m to 5 ⁇ m.
- the glass powder contains, for example, any one or more of lead oxide, zinc oxide, silicon oxide, boron oxide, phosphorus oxide, and bismuth oxide, and has a glass transition temperature of 300 ° C to 700 ° C and a softening temperature of 800 ° C or less. ° C or lower, and the crystallization temperature is 900 ° C or higher.
- the solvent is preferably a solvent having a boiling point of 200 ° C. or higher, particularly an organic solvent.
- a solvent having a boiling point of 200 ° C. or higher particularly an organic solvent.
- the resin is used for adjusting the viscosity of the glass-containing Au paste, and is preferably decomposed at a temperature of 200 ° C. or higher, particularly an organic resin, and it is preferable to use ethyl cellulose.
- a dicarboxylic acid-based dispersant is added, but a glass-containing Au paste may be formed without adding a dispersant.
- CuAs other oxide powder for example, CuO or the like can be used.
- plasticizer for example, DOP (Doctyl @ phtalate / dioctyl phthalate), DOA (Doctyl @ adipate / Dioctyl adipate) and the like can be used.
- This glass-containing Au paste is premixed with a mixer together with a mixed powder obtained by mixing a gold powder, a glass powder and another oxide powder, and an organic mixture obtained by mixing a solvent and a resin together with a dispersant and a plasticizer, After mixing the obtained preliminary mixture while kneading it with a roll mill, the obtained kneaded product is filtrated with a paste filter to produce the mixture.
- the temperature is changed from 350 ° C. to 950 ° C., preferably from 350 ° C. to 850 ° C., more preferably from 750 ° C. to 850 ° C., for 5 minutes to 120 minutes, preferably 10 minutes to 120 minutes, more preferably Is held for 10 to 40 minutes.
- the firing can be performed in the air, in a vacuum, or in an inert atmosphere such as N 2 or Ar.
- the glass-containing Au layers 12A and 12B are formed on both surfaces of the ceramic element 11 by the firing step S13.
- the adhesion of the glass-containing Au layers 12a and 12B to the ceramic element 11 is good.
- Examples of the method for forming the pure Au layers 13A and 13B include a method using an Au paste, a vapor deposition method, a sputtering method, an electrolytic plating method, and an electroless plating method.
- a method of forming by an evaporation method and a method of forming by using an Au paste are described.
- Pure Au films 131 and 132 are formed on the surfaces of the glass-containing Au layers 12A and 12B, as shown in FIG. 3B.
- the formation of the pure Au films 131 and 132 is performed, for example, by heating and vaporizing pure gold having a purity of 99.00% by mass or more in a vacuum vessel and adhering to the surfaces of the glass-containing Au layers 12A and 12B placed at remote positions. This is performed by forming a thin film.
- pure Au layers 13A and 13B are formed on glass-containing Au layers 12A and 12B. That is, a pure Au layer 13B is formed between the glass-containing Au layer 12B and the Au—Sn alloy layer 14.
- Au paste (Method of forming using Au paste) A gold paste (hereinafter, referred to as an Au paste) is applied to the surfaces of the glass-containing Au layers 12A and 12B, and heated at 350 to 950 ° C. to sinter the gold powder, thereby forming a pure gold sintered body.
- Au layers 13A and 13B are formed.
- Au paste is a mixture of gold powder, resin and solvent.
- As the gold powder a powder having a particle size of 0.6 ⁇ m to 10 ⁇ m can be used, and as the resin and the solvent, those similar to the above-mentioned glass-containing Au paste can be used. Further, a dispersant or the like may be added as necessary.
- the content of the gold powder in the Au paste is preferably 50% by mass to 90% by mass.
- the alloy layer forming step includes an Au—Sn alloy layer paste application step (S15) and a reflow step (S16) shown in FIG.
- a paste 141 for an Au—Sn alloy layer is applied on the pure Au layer 13B (S15).
- a screen printing method or the like can be adopted.
- the coating thickness may be 1 ⁇ m or more and 25 ⁇ m or less, preferably 5 ⁇ m to 20 ⁇ m, more preferably 10 ⁇ m to 15 ⁇ m.
- Au—Sn alloy layer paste 141 is composed of metal powder and flux.
- the metal powder is a gold-tin alloy powder, a mixed powder of gold powder and tin powder, or a mixed powder of two or more of these three powders (gold-tin alloy powder, gold powder, and tin powder). is there.
- the average particle size of the metal powder is set to, for example, 0.02 ⁇ m or more and 15.0 ⁇ m, preferably 0.2 ⁇ m to 15 ⁇ m, and more preferably 2 ⁇ m to 11 ⁇ m.
- the Au—Sn alloy layer paste 141 contains, for example, 70% by mass to 95% by mass of metal powder and 5% by mass to 30% by mass of flux.
- the metal powder preferably has a composition of 21% to 23% by mass of gold and the balance of tin when the metal powder is 100% by mass.
- a general flux for example, a flux containing a rosin, an activator, a solvent, a thickener, and the like
- a weakly active (RMA) type flux or an active (RA) type flux for example, a weakly active (RMA) type flux or an active (RA) type flux.
- the Au—Sn alloy layer paste 141 printed and applied to the pure Au layer 13B is heated and melted and solidified (reflow) (S16).
- the reflow step for example, at a temperature of 290 ° C to 330 ° C, preferably 295 ° C to 320 ° C, more preferably 300 ° C to 310 ° C, 10 seconds to 180 seconds, preferably 20 seconds to 90 seconds More preferably, the holding time is maintained for 30 seconds or more and 60 seconds or less, and the Au—Sn alloy layer paste 141 is melted, and then cooled and solidified.
- the atmosphere during the reflow is not particularly limited, and the reflow can be performed in an inert atmosphere such as a nitrogen atmosphere, an air atmosphere, or a reducing atmosphere using a mixed gas of nitrogen and hydrogen.
- the Au—Sn alloy layer 14 is formed on the pure Au layer 13B (or the glass-containing Au layer 12B when the pure Au layers 13A and 13B are not formed).
- the Au—Sn alloy layer 14 is formed on the glass-containing Au layer 12B of the glass-containing Au layers 12A and 12B in which the electronic component 1 is formed on both surfaces of the ceramic element 11, so that the Au— The electronic component 1 can be easily joined to the joining object only by heating while the Sn alloy layer 14 is in contact with the joining object. Further, since there is no need to position the sheet-shaped preform between the electronic component 1 and the joining target, the joining operation between the electronic component 1 and the joining target can be simplified.
- the pure Au layer 13B is formed between the Au—Sn alloy layer 14 and the glass-containing Au layer 12B, no irregularities are formed on the surface of the Au—Sn alloy layer 14, so that the bonding is performed. Can be securely joined to the target. Therefore, it is possible to suppress a decrease in the bonding strength with the bonding target and the thermal conductivity to the bonding target.
- the Au—Sn alloy layer 14 has a eutectic structure of Au and Sn, that is, the Au—Sn alloy layer 14 is in a solidified state after being melted, Can be improved when it is heated again and melted at the time of joining.
- the thickness of the Au—Sn alloy layer 14 can be freely set only by changing the thickness of the Au—Sn alloy layer paste 141 applied to the glass-containing Au layer 12.
- the Au—Sn alloy layer 14 is formed by applying the Au—Sn alloy layer paste 141 on the upper surface of the pure Au layer 13B and then performing reflow.
- an Au—Sn alloy may be formed on the upper surface of the pure Au layer 13B by vapor deposition or Au—Sn alloy plating.
- the above manufacturing method can also be applied to a ceramic base material (undivided material) having a size that can be divided into a plurality of semiconductor elements (ceramic elements).
- a singulation step of singulating the ceramic base material is performed. If executed, a large number of electronic components 1 can be manufactured at once, and the manufacturing cost of the electronic components 1 can be reduced.
- the glass-containing Au layers 12A and 12B and the pure Au layers 13A and 13B are formed on both surfaces of the ceramic element 11, and the Au—Sn alloy layer 14 is formed only on one surface.
- the present invention is not limited to this. As shown in FIG. 4, an Au—Sn alloy layer 14 may be formed on each of the glass-containing Au layers 12A and 12B.
- the Au—Sn alloy layer 14 may be formed directly on the glass-containing Au layer 12B without performing the pure Au layer forming step, as shown in FIG.
- the electronic component 1 is described as being a thermistor or a capacitor.
- the application field of the electronic component 1 is not limited to the thermistor or the capacitor, and the electronic component 1 is also used for electric appliances, containers, mechanical parts, and the like. Can be used.
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Abstract
Description
図1は、本実施形態の電子部品1を示す断面図である。
セラミックス素子11は、例えば、Mn,Co,Fe,Ni,Cu,Al等から選択される1種以上の金属の酸化物などのサーミスタ素子であり、矩形板状に形成され、その厚さが100μm~500μmに設定されている。例えば、セラミックス素子11が、フレーク(薄片状)のサーミスタ素子である場合、平面視において0.6mm×0.6mm、厚さ150μmに設定される。
ガラス含有Au層12A,12Bは、ガラスフリット(ガラス粉末)と金粉末等とが混合されたペースト(以下、ガラス含有Auペーストという。)を塗布し、350℃~950℃で加熱処理することで得られる。加熱処理の際、ガラスフリットが軟化するとともに、金粉末が焼結する。ガラス含有Au層12A,12Bは金(Au)の焼結体により構成され、ガラス含有Au層12A,12B中にはガラスフリットが分散している。このガラス含有Au層12A,12Bは、その厚さが1μm~20μm、好ましくは4μm~15μm、より好ましくは4μm~9μmに設定されている。
ガラス含有Au層12A,12Bの上、すなわち、ガラス含有Au層12A,12Bのセラミックス素子11とは反対側の面には、純Au層13A,13Bが形成されていることが好ましい。
Au-Sn合金層14は、後述するAu-Sn合金層用ペースト中の金属粉末が溶融して固化することで形成される、電子部品1と接合対象とを接合するための接合層である。このAu-Sn合金層14は、Au-Sn合金層用ペーストが、ガラス含有Au層12Bまたは純Au層13Bの上(本実施形態では純Au層13B上)に塗布された後、リフローされる(加熱溶融後、固化)ことにより形成される。
次に、本実施形態の電子部品1の製造方法について説明する。
ガラス含有Au層形成工程は、図2に示すガラス含有Auペースト塗布工程(S11)、乾燥工程(S12)及び焼成工程(S13)からなる。
まず、ガラス含有Auペースト121,122を、図3Aに示すように、セラミックス素子11の両面に塗布する(S11)。ガラス含有Auペースト121,122を塗布する際には、スクリーン印刷法等を採用できる。塗布厚さは、1μm以上25μm以下、好ましくは6μm~20μm、より好ましくは6μm~18μmの範囲内とするとよい。
次に、ガラス含有Auペースト塗布工程によりセラミックス素子11の両面に塗布されたガラス含有Auペースト121,122を乾燥させる(S12)。
乾燥工程後、加熱処理を行い、ガラス含有Auペースト121,122を焼成する(S13)。
ガラス含有Au層12A,12B上に純Au層13A,13Bを形成する場合、純Au層形成工程(S14)を行う。
ガラス含有Au層12A,12Bの表面に対して、図3Bに示すように、純Au膜131,132を形成する。純Au膜131,132の形成は、例えば、真空容器内で純度99.00質量%以上の純金を加熱し気化させて、離れた位置に置かれたガラス含有Au層12A,12Bの表面に付着させ、薄膜を形成することにより行われる。
金ペースト(以下、Auペーストという。)をガラス含有Au層12A,12Bの表面に塗布し、350~950℃で加熱処理することで、金粉末が焼結し、金の焼結体からなる純Au層13A,13Bが形成される。Auペーストは金粉末と樹脂と溶剤との混合物である。金粉末としては、粒径0.6μm~10μmの粉末を用いることができ、樹脂及び溶剤は、前述したガラス含有Auペーストと同様のものを用いることができる。また、必要に応じて分散剤などを添加してもよい。Auペーストにおける金粉末の含有量は50質量%~90質量%とするとよい。
合金層形成工程は、図2に示すAu-Sn合金層用ペースト塗布工程(S15)及びリフロー工程(S16)とからなる。
純Au層13B上に、図3Cに示すように、Au-Sn合金層用ペースト141を塗布する(S15)。Au-Sn合金層用ペースト141を塗布する際には、スクリーン印刷法等を採用できる。塗布厚さは、1μm以上25μm以下、好ましくは5μm~20μm、より好ましくは10μm~15μmの範囲内とするとよい。
次に、純Au層13Bに印刷塗布されたAu-Sn合金層用ペースト141を加熱溶融、固化(リフロー)する(S16)。リフロー工程では、例えば、290℃以上330℃以下、好ましくは295℃以上320℃以下、より好ましくは300℃以上310℃以下の温度で、10秒以上180秒以下、好ましくは20秒以上90秒以下、より好ましくは30秒以上60秒以下保持し、Au-Sn合金層用ペースト141を溶融させてその後冷却して固化させる。リフロー時の雰囲気は特に限定されず、窒素雰囲気などの不活性雰囲気下、大気雰囲気下、窒素と水素の混合ガスなどによる還元雰囲気下、などで行うことができる。
11 セラミックス素子
12A 12B ガラス含有Au層
13A 13B 純Au層
14 Au-Sn合金層
121 122 ガラス含有Auペースト
131 132 純Au膜
141 Au-Sn合金層用ペースト
Claims (8)
- セラミックス素子と、
前記セラミックス素子の両面に形成されたガラス含有Au層と、
各前記ガラス含有Au層の少なくともいずれかの上に形成されたAu-Sn合金層と、を備えることを特徴とする電子部品。 - 前記ガラス含有Au層と前記Au-Sn合金層との間に純Au層を備えることを特徴とする請求項1に記載の電子部品。
- 前記Au-Sn合金層は、AuとSnとの共晶組織を有していることを特徴とする請求項1又は2に記載の電子部品。
- セラミックス素子の両面にガラス含有Au層を形成するガラス含有Au層形成工程と、
前記ガラス含有Au層形成工程により形成された各前記ガラス含有Au層の少なくともいずれかの上にAu-Sn合金層を形成する合金層形成工程と、を備えることを特徴とする電子部品の製造方法。 - 前記合金層形成工程の前に、前記ガラス含有Au層の上に純Au層を形成する純Au層形成工程をさらに備えることを特徴とする請求項4に記載の電子部品の製造方法。
- 前記合金層形成工程では、少なくともいずれかの前記ガラス含有Au層の上にAu-Sn合金を蒸着することにより前記Au-Sn合金層を形成することを特徴とする請求項4または5に記載の電子部品の製造方法。
- 前記合金層形成工程では、少なくともいずれかの前記ガラス含有Au層の上にAu及びSnを含有するAu-Sn合金層用ペーストを塗布し、加熱溶融後、固化させることにより前記Au-Sn合金層を形成することを特徴とする請求項4または5に記載の電子部品の製造方法。
- 複数のセラミックス素子に分割可能な大きさのセラミックス母材の両面にガラス含有Au層を形成するガラス含有Au層形成工程と、
前記ガラス含有Au層形成工程により形成された各前記ガラス含有Au層の少なくともいずれかの上にAu-Sn合金層を形成する合金層形成工程と、
前記合金層形成工程後に前記セラミックス母材を分割して前記セラミックス素子に個片化する個片化工程と、
を備えることを特徴とする電子部品の製造方法。
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PCT/JP2019/031746 WO2020039989A1 (ja) | 2018-08-21 | 2019-08-09 | 電子部品及び電子部品の製造方法 |
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US (1) | US11396164B2 (ja) |
JP (1) | JP6659003B1 (ja) |
KR (1) | KR102282259B1 (ja) |
CN (1) | CN112585702A (ja) |
TW (1) | TWI729460B (ja) |
WO (1) | WO2020039989A1 (ja) |
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JP2014054653A (ja) * | 2012-09-12 | 2014-03-27 | Mitsubishi Materials Corp | Au−Sn合金含有ペースト、Au−Sn合金薄膜及びその成膜方法 |
JP2016136614A (ja) * | 2015-01-15 | 2016-07-28 | 株式会社村田製作所 | 電子部品及び電子部品の実装構造体 |
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JPH0677004A (ja) | 1992-08-26 | 1994-03-18 | Nippondenso Co Ltd | 正特性サーミスタ装置 |
JP2007281400A (ja) * | 2006-04-04 | 2007-10-25 | Taiyo Yuden Co Ltd | 表面実装型セラミック電子部品 |
JP4924920B2 (ja) | 2006-06-28 | 2012-04-25 | 三菱マテリアル株式会社 | Au−Sn合金はんだペーストを用いて素子の接合面全面を基板に接合する方法 |
JP2008034581A (ja) * | 2006-07-28 | 2008-02-14 | Kyocera Corp | サブマウント |
WO2008063620A1 (en) * | 2006-11-20 | 2008-05-29 | New York University | Graded glass/ceramic/glass structures for damage resistant ceramic dental and orthopedic prostheses |
US8728092B2 (en) | 2008-08-14 | 2014-05-20 | Monteris Medical Corporation | Stereotactic drive system |
JP2011119436A (ja) | 2009-12-03 | 2011-06-16 | Toyoda Gosei Co Ltd | 基板実装装置の接合方法 |
US8482015B2 (en) | 2009-12-03 | 2013-07-09 | Toyoda Gosei Co., Ltd. | LED light emitting apparatus and vehicle headlamp using the same |
JP2013021299A (ja) * | 2011-06-16 | 2013-01-31 | Murata Mfg Co Ltd | 積層セラミック電子部品 |
US10840008B2 (en) * | 2015-01-15 | 2020-11-17 | Murata Manufacturing Co., Ltd. | Electronic component and electronic component-mounted structure |
US10395827B2 (en) | 2016-09-28 | 2019-08-27 | Murata Manufacturing Co., Ltd. | Electronic component |
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2019
- 2019-08-09 WO PCT/JP2019/031746 patent/WO2020039989A1/ja active Application Filing
- 2019-08-09 US US17/264,004 patent/US11396164B2/en active Active
- 2019-08-09 KR KR1020217003108A patent/KR102282259B1/ko active IP Right Grant
- 2019-08-09 JP JP2019566368A patent/JP6659003B1/ja active Active
- 2019-08-09 CN CN201980054623.8A patent/CN112585702A/zh active Pending
- 2019-08-19 TW TW108129407A patent/TWI729460B/zh active
Patent Citations (4)
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JPH10261507A (ja) * | 1997-03-18 | 1998-09-29 | Murata Mfg Co Ltd | サーミスタ素子 |
JP2002083737A (ja) * | 2000-09-07 | 2002-03-22 | Murata Mfg Co Ltd | 非線形誘電体素子 |
JP2014054653A (ja) * | 2012-09-12 | 2014-03-27 | Mitsubishi Materials Corp | Au−Sn合金含有ペースト、Au−Sn合金薄膜及びその成膜方法 |
JP2016136614A (ja) * | 2015-01-15 | 2016-07-28 | 株式会社村田製作所 | 電子部品及び電子部品の実装構造体 |
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US20210260853A1 (en) | 2021-08-26 |
JPWO2020039989A1 (ja) | 2020-08-27 |
KR20210016637A (ko) | 2021-02-16 |
CN112585702A (zh) | 2021-03-30 |
TW202018874A (zh) | 2020-05-16 |
JP6659003B1 (ja) | 2020-03-04 |
KR102282259B1 (ko) | 2021-07-26 |
TWI729460B (zh) | 2021-06-01 |
US11396164B2 (en) | 2022-07-26 |
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