WO2019198484A1 - 光触媒転写フィルム及びその製造方法 - Google Patents
光触媒転写フィルム及びその製造方法 Download PDFInfo
- Publication number
- WO2019198484A1 WO2019198484A1 PCT/JP2019/012718 JP2019012718W WO2019198484A1 WO 2019198484 A1 WO2019198484 A1 WO 2019198484A1 JP 2019012718 W JP2019012718 W JP 2019012718W WO 2019198484 A1 WO2019198484 A1 WO 2019198484A1
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- WO
- WIPO (PCT)
- Prior art keywords
- photocatalyst
- titanium oxide
- film
- transfer film
- silicon compound
- Prior art date
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- 239000011941 photocatalyst Substances 0.000 title claims abstract description 186
- 238000012546 transfer Methods 0.000 title claims abstract description 105
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 title abstract description 54
- 239000002245 particle Substances 0.000 claims abstract description 247
- 239000000956 alloy Substances 0.000 claims abstract description 110
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 106
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 105
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 98
- 230000000844 anti-bacterial effect Effects 0.000 claims abstract description 84
- 150000003377 silicon compounds Chemical class 0.000 claims abstract description 68
- 229910052751 metal Inorganic materials 0.000 claims abstract description 62
- 239000002184 metal Substances 0.000 claims abstract description 62
- 238000000576 coating method Methods 0.000 claims abstract description 50
- 239000011248 coating agent Substances 0.000 claims abstract description 47
- 239000002612 dispersion medium Substances 0.000 claims abstract description 43
- 239000004094 surface-active agent Substances 0.000 claims abstract description 30
- 239000006185 dispersion Substances 0.000 claims description 110
- 239000010410 layer Substances 0.000 claims description 49
- 239000007788 liquid Substances 0.000 claims description 44
- 230000001699 photocatalysis Effects 0.000 claims description 29
- 239000000203 mixture Substances 0.000 claims description 17
- 239000011241 protective layer Substances 0.000 claims description 15
- 239000010949 copper Substances 0.000 claims description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 229910052709 silver Inorganic materials 0.000 claims description 10
- 239000004332 silver Substances 0.000 claims description 10
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 9
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 9
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 9
- 229910052725 zinc Inorganic materials 0.000 claims description 9
- 239000011701 zinc Substances 0.000 claims description 9
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 7
- 238000009826 distribution Methods 0.000 claims description 7
- 230000001186 cumulative effect Effects 0.000 claims description 6
- 150000003863 ammonium salts Chemical class 0.000 claims description 4
- 239000007859 condensation product Substances 0.000 claims description 2
- 238000000790 scattering method Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 27
- 238000012545 processing Methods 0.000 abstract description 9
- 238000001035 drying Methods 0.000 abstract description 5
- 230000001747 exhibiting effect Effects 0.000 abstract description 4
- 239000010408 film Substances 0.000 description 125
- 239000000243 solution Substances 0.000 description 64
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 59
- -1 titanium oxide Chemical class 0.000 description 58
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 33
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 33
- 239000002994 raw material Substances 0.000 description 33
- 150000002736 metal compounds Chemical class 0.000 description 31
- 239000000463 material Substances 0.000 description 30
- 239000002585 base Substances 0.000 description 27
- 239000000126 substance Substances 0.000 description 24
- 239000003638 chemical reducing agent Substances 0.000 description 20
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 19
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 19
- 238000002156 mixing Methods 0.000 description 19
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 18
- 239000003960 organic solvent Substances 0.000 description 18
- 239000002253 acid Substances 0.000 description 15
- 230000000843 anti-fungal effect Effects 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 14
- 238000002360 preparation method Methods 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 13
- 229940121375 antifungal agent Drugs 0.000 description 13
- 239000012528 membrane Substances 0.000 description 13
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 12
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 12
- 239000012046 mixed solvent Substances 0.000 description 12
- 150000003609 titanium compounds Chemical class 0.000 description 12
- 239000012535 impurity Substances 0.000 description 11
- 239000002904 solvent Substances 0.000 description 11
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 239000011230 binding agent Substances 0.000 description 8
- 229910010272 inorganic material Inorganic materials 0.000 description 8
- 239000011147 inorganic material Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 239000010936 titanium Substances 0.000 description 8
- 229920002799 BoPET Polymers 0.000 description 7
- 150000001298 alcohols Chemical class 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 7
- 150000007514 bases Chemical class 0.000 description 7
- 235000014113 dietary fatty acids Nutrition 0.000 description 7
- 239000000839 emulsion Substances 0.000 description 7
- 239000000194 fatty acid Substances 0.000 description 7
- 229930195729 fatty acid Natural products 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 6
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 6
- 239000003223 protective agent Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 6
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 5
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 5
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 5
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 5
- 239000004743 Polypropylene Substances 0.000 description 5
- 229910001069 Ti alloy Inorganic materials 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 5
- 239000003242 anti bacterial agent Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 5
- 229910021641 deionized water Inorganic materials 0.000 description 5
- 239000012153 distilled water Substances 0.000 description 5
- 235000019253 formic acid Nutrition 0.000 description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- 244000005700 microbiome Species 0.000 description 5
- 239000011259 mixed solution Substances 0.000 description 5
- 229920001155 polypropylene Polymers 0.000 description 5
- 229920002050 silicone resin Polymers 0.000 description 5
- 239000011135 tin Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 241000894006 Bacteria Species 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- 239000004698 Polyethylene Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- 239000003429 antifungal agent Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 235000015165 citric acid Nutrition 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000002296 dynamic light scattering Methods 0.000 description 4
- KVFVBPYVNUCWJX-UHFFFAOYSA-M ethyl(trimethyl)azanium;hydroxide Chemical compound [OH-].CC[N+](C)(C)C KVFVBPYVNUCWJX-UHFFFAOYSA-M 0.000 description 4
- 238000007756 gravure coating Methods 0.000 description 4
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine hydrate Chemical compound O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 4
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 238000005374 membrane filtration Methods 0.000 description 4
- 229910021645 metal ion Inorganic materials 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229920000573 polyethylene Polymers 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 239000011164 primary particle Substances 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 4
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 229910052718 tin Inorganic materials 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 3
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 241000233866 Fungi Species 0.000 description 3
- 229920000877 Melamine resin Polymers 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 3
- 239000003125 aqueous solvent Substances 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000001877 deodorizing effect Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 3
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 3
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229940093915 gynecological organic acid Drugs 0.000 description 3
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000004310 lactic acid Substances 0.000 description 3
- 235000014655 lactic acid Nutrition 0.000 description 3
- 239000002105 nanoparticle Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 3
- 239000002736 nonionic surfactant Substances 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- 235000006408 oxalic acid Nutrition 0.000 description 3
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 3
- 238000013032 photocatalytic reaction Methods 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 3
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 3
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- XUDUTRMKKYUAKI-UHFFFAOYSA-N 3-[1-(1-phenylethyl)piperidin-4-yl]-1h-benzimidazol-2-one Chemical compound C1CC(N2C(NC3=CC=CC=C32)=O)CCN1C(C)C1=CC=CC=C1 XUDUTRMKKYUAKI-UHFFFAOYSA-N 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 241000588724 Escherichia coli Species 0.000 description 2
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- 239000004640 Melamine resin Substances 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 2
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 2
- 229920000459 Nitrile rubber Polymers 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- 239000004697 Polyetherimide Substances 0.000 description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 229930006000 Sucrose Natural products 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- NEIHULKJZQTQKJ-UHFFFAOYSA-N [Cu].[Ag] Chemical compound [Cu].[Ag] NEIHULKJZQTQKJ-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 150000003973 alkyl amines Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000003093 cationic surfactant Substances 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- 229960002887 deanol Drugs 0.000 description 2
- 238000002242 deionisation method Methods 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 description 2
- 238000007607 die coating method Methods 0.000 description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical class OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 239000005038 ethylene vinyl acetate Substances 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- JEUXZUSUYIHGNL-UHFFFAOYSA-N n,n-diethylethanamine;hydrate Chemical compound O.CCN(CC)CC JEUXZUSUYIHGNL-UHFFFAOYSA-N 0.000 description 2
- 150000002823 nitrates Chemical class 0.000 description 2
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- 229920001601 polyetherimide Polymers 0.000 description 2
- 239000011112 polyethylene naphthalate Substances 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229960003975 potassium Drugs 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- 229910001961 silver nitrate Inorganic materials 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000005720 sucrose Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 2
- 238000000108 ultra-filtration Methods 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- FJLUATLTXUNBOT-UHFFFAOYSA-N 1-Hexadecylamine Chemical compound CCCCCCCCCCCCCCCCN FJLUATLTXUNBOT-UHFFFAOYSA-N 0.000 description 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- OWEGMIWEEQEYGQ-UHFFFAOYSA-N 100676-05-9 Natural products OC1C(O)C(O)C(CO)OC1OCC1C(O)C(O)C(O)C(OC2C(OC(O)C(O)C2O)CO)O1 OWEGMIWEEQEYGQ-UHFFFAOYSA-N 0.000 description 1
- BFSVOASYOCHEOV-UHFFFAOYSA-N 2-diethylaminoethanol Chemical compound CCN(CC)CCO BFSVOASYOCHEOV-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- LPUBRQWGZPPVBS-UHFFFAOYSA-N 3-butoxypropan-1-amine Chemical compound CCCCOCCCN LPUBRQWGZPPVBS-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- WQZGKKKJIJFFOK-QTVWNMPRSA-N D-mannopyranose Chemical compound OC[C@H]1OC(O)[C@@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-QTVWNMPRSA-N 0.000 description 1
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229930091371 Fructose Natural products 0.000 description 1
- 239000005715 Fructose Substances 0.000 description 1
- RFSUNEUAIZKAJO-ARQDHWQXSA-N Fructose Chemical compound OC[C@H]1O[C@](O)(CO)[C@@H](O)[C@@H]1O RFSUNEUAIZKAJO-ARQDHWQXSA-N 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- WJYIASZWHGOTOU-UHFFFAOYSA-N Heptylamine Chemical compound CCCCCCCN WJYIASZWHGOTOU-UHFFFAOYSA-N 0.000 description 1
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 239000012448 Lithium borohydride Substances 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- GUBGYTABKSRVRQ-PICCSMPSSA-N Maltose Natural products O[C@@H]1[C@@H](O)[C@H](O)[C@@H](CO)O[C@@H]1O[C@@H]1[C@@H](CO)OC(O)[C@H](O)[C@H]1O GUBGYTABKSRVRQ-PICCSMPSSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052773 Promethium Inorganic materials 0.000 description 1
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N Propanolamine Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 description 1
- MUPFEKGTMRGPLJ-RMMQSMQOSA-N Raffinose Natural products O(C[C@H]1[C@@H](O)[C@H](O)[C@@H](O)[C@@H](O[C@@]2(CO)[C@H](O)[C@@H](O)[C@@H](CO)O2)O1)[C@@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 MUPFEKGTMRGPLJ-RMMQSMQOSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- UQZIYBXSHAGNOE-USOSMYMVSA-N Stachyose Natural products O(C[C@H]1[C@@H](O)[C@H](O)[C@H](O)[C@@H](O[C@@]2(CO)[C@H](O)[C@@H](O)[C@@H](CO)O2)O1)[C@@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@H](CO[C@@H]2[C@@H](O)[C@@H](O)[C@@H](O)[C@H](CO)O2)O1 UQZIYBXSHAGNOE-USOSMYMVSA-N 0.000 description 1
- 241000191967 Staphylococcus aureus Species 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- MUPFEKGTMRGPLJ-UHFFFAOYSA-N UNPD196149 Natural products OC1C(O)C(CO)OC1(CO)OC1C(O)C(O)C(O)C(COC2C(C(O)C(O)C(CO)O2)O)O1 MUPFEKGTMRGPLJ-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- IHWJXGQYRBHUIF-UHFFFAOYSA-N [Ag].[Pt] Chemical compound [Ag].[Pt] IHWJXGQYRBHUIF-UHFFFAOYSA-N 0.000 description 1
- NTSDHVIXFWZYSM-UHFFFAOYSA-N [Ag].[Sb].[Sn] Chemical compound [Ag].[Sb].[Sn] NTSDHVIXFWZYSM-UHFFFAOYSA-N 0.000 description 1
- QCEUXSAXTBNJGO-UHFFFAOYSA-N [Ag].[Sn] Chemical compound [Ag].[Sn] QCEUXSAXTBNJGO-UHFFFAOYSA-N 0.000 description 1
- PQIJHIWFHSVPMH-UHFFFAOYSA-N [Cu].[Ag].[Sn] Chemical compound [Cu].[Ag].[Sn] PQIJHIWFHSVPMH-UHFFFAOYSA-N 0.000 description 1
- MPLZHWQMZBPGKJ-UHFFFAOYSA-N [Cu].[Sn].[Au] Chemical compound [Cu].[Sn].[Au] MPLZHWQMZBPGKJ-UHFFFAOYSA-N 0.000 description 1
- NZWXMOTXTNDNLK-UHFFFAOYSA-N [Cu].[Zn].[Ag] Chemical compound [Cu].[Zn].[Ag] NZWXMOTXTNDNLK-UHFFFAOYSA-N 0.000 description 1
- PGTXKIZLOWULDJ-UHFFFAOYSA-N [Mg].[Zn] Chemical compound [Mg].[Zn] PGTXKIZLOWULDJ-UHFFFAOYSA-N 0.000 description 1
- WRAOBLMTWFEINP-UHFFFAOYSA-N [Sn].[Ag].[Ni] Chemical compound [Sn].[Ag].[Ni] WRAOBLMTWFEINP-UHFFFAOYSA-N 0.000 description 1
- 229960000583 acetic acid Drugs 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 229910052767 actinium Inorganic materials 0.000 description 1
- QQINRWTZWGJFDB-UHFFFAOYSA-N actinium atom Chemical compound [Ac] QQINRWTZWGJFDB-UHFFFAOYSA-N 0.000 description 1
- 230000004931 aggregating effect Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000005211 alkyl trimethyl ammonium group Chemical group 0.000 description 1
- WQZGKKKJIJFFOK-PHYPRBDBSA-N alpha-D-galactose Chemical compound OC[C@H]1O[C@H](O)[C@H](O)[C@@H](O)[C@H]1O WQZGKKKJIJFFOK-PHYPRBDBSA-N 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- LGFYIAWZICUNLK-UHFFFAOYSA-N antimony silver Chemical compound [Ag].[Sb] LGFYIAWZICUNLK-UHFFFAOYSA-N 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- ZFSFDELZPURLKD-UHFFFAOYSA-N azanium;hydroxide;hydrate Chemical compound N.O.O ZFSFDELZPURLKD-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 description 1
- GUBGYTABKSRVRQ-QUYVBRFLSA-N beta-maltose Chemical compound OC[C@H]1O[C@H](O[C@H]2[C@H](O)[C@@H](O)[C@H](O)O[C@@H]2CO)[C@H](O)[C@@H](O)[C@@H]1O GUBGYTABKSRVRQ-QUYVBRFLSA-N 0.000 description 1
- SIPUZPBQZHNSDW-UHFFFAOYSA-N bis(2-methylpropyl)aluminum Chemical compound CC(C)C[Al]CC(C)C SIPUZPBQZHNSDW-UHFFFAOYSA-N 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 239000011449 brick Substances 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 210000000170 cell membrane Anatomy 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229960004106 citric acid Drugs 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- RYTYSMSQNNBZDP-UHFFFAOYSA-N cobalt copper Chemical compound [Co].[Cu] RYTYSMSQNNBZDP-UHFFFAOYSA-N 0.000 description 1
- 238000001246 colloidal dispersion Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- QRJOYPHTNNOAOJ-UHFFFAOYSA-N copper gold Chemical compound [Cu].[Au] QRJOYPHTNNOAOJ-UHFFFAOYSA-N 0.000 description 1
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 1
- SXTLQDJHRPXDSB-UHFFFAOYSA-N copper;dinitrate;trihydrate Chemical compound O.O.O.[Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O SXTLQDJHRPXDSB-UHFFFAOYSA-N 0.000 description 1
- 238000009295 crossflow filtration Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000004332 deodorization Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 229960005215 dichloroacetic acid Drugs 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- YPTUAQWMBNZZRN-UHFFFAOYSA-N dimethylaminoboron Chemical compound [B]N(C)C YPTUAQWMBNZZRN-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- RDYMFSUJUZBWLH-UHFFFAOYSA-N endosulfan Chemical compound C12COS(=O)OCC2C2(Cl)C(Cl)=C(Cl)C1(Cl)C2(Cl)Cl RDYMFSUJUZBWLH-UHFFFAOYSA-N 0.000 description 1
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004715 ethylene vinyl alcohol Substances 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 238000009408 flooring Methods 0.000 description 1
- 229940013688 formic acid Drugs 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 229930182830 galactose Natural products 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- 229930182478 glucoside Natural products 0.000 description 1
- 230000009036 growth inhibition Effects 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 239000012510 hollow fiber Substances 0.000 description 1
- ZGCHATBSUIJLRL-UHFFFAOYSA-N hydrazine sulfate Chemical compound NN.OS(O)(=O)=O ZGCHATBSUIJLRL-UHFFFAOYSA-N 0.000 description 1
- 229910000377 hydrazine sulfate Inorganic materials 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 1
- 238000001027 hydrothermal synthesis Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000011254 layer-forming composition Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000012280 lithium aluminium hydride Substances 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- IGOJMROYPFZEOR-UHFFFAOYSA-N manganese platinum Chemical compound [Mn].[Pt] IGOJMROYPFZEOR-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 238000001471 micro-filtration Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- DILRJUIACXKSQE-UHFFFAOYSA-N n',n'-dimethylethane-1,2-diamine Chemical compound CN(C)CCN DILRJUIACXKSQE-UHFFFAOYSA-N 0.000 description 1
- 238000001728 nano-filtration Methods 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- MOFOBJHOKRNACT-UHFFFAOYSA-N nickel silver Chemical compound [Ni].[Ag] MOFOBJHOKRNACT-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- FJDUDHYHRVPMJZ-UHFFFAOYSA-N nonan-1-amine Chemical compound CCCCCCCCCN FJDUDHYHRVPMJZ-UHFFFAOYSA-N 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 229940116315 oxalic acid Drugs 0.000 description 1
- 238000010525 oxidative degradation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- GTNIFOACFLTSCQ-UHFFFAOYSA-N palladium;dihydrate Chemical compound O.O.[Pd] GTNIFOACFLTSCQ-UHFFFAOYSA-N 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- HKOOXMFOFWEVGF-UHFFFAOYSA-N phenylhydrazine Chemical compound NNC1=CC=CC=C1 HKOOXMFOFWEVGF-UHFFFAOYSA-N 0.000 description 1
- 229940067157 phenylhydrazine Drugs 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 229910052699 polonium Inorganic materials 0.000 description 1
- HZEBHPIOVYHPMT-UHFFFAOYSA-N polonium atom Chemical compound [Po] HZEBHPIOVYHPMT-UHFFFAOYSA-N 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- CUQOHAYJWVTKDE-UHFFFAOYSA-N potassium;butan-1-olate Chemical compound [K+].CCCC[O-] CUQOHAYJWVTKDE-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000011085 pressure filtration Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- VQMWBBYLQSCNPO-UHFFFAOYSA-N promethium atom Chemical compound [Pm] VQMWBBYLQSCNPO-UHFFFAOYSA-N 0.000 description 1
- 150000004040 pyrrolidinones Chemical class 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 229910052705 radium Inorganic materials 0.000 description 1
- HCWPIIXVSYCSAN-UHFFFAOYSA-N radium atom Chemical compound [Ra] HCWPIIXVSYCSAN-UHFFFAOYSA-N 0.000 description 1
- MUPFEKGTMRGPLJ-ZQSKZDJDSA-N raffinose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO[C@@H]2[C@@H]([C@@H](O)[C@@H](O)[C@@H](CO)O2)O)O1 MUPFEKGTMRGPLJ-ZQSKZDJDSA-N 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- MZFIXCCGFYSQSS-UHFFFAOYSA-N silver titanium Chemical compound [Ti].[Ag] MZFIXCCGFYSQSS-UHFFFAOYSA-N 0.000 description 1
- BSWGGJHLVUUXTL-UHFFFAOYSA-N silver zinc Chemical compound [Zn].[Ag] BSWGGJHLVUUXTL-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- UQZIYBXSHAGNOE-XNSRJBNMSA-N stachyose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO[C@@H]2[C@@H]([C@@H](O)[C@@H](O)[C@@H](CO[C@@H]3[C@@H]([C@@H](O)[C@@H](O)[C@@H](CO)O3)O)O2)O)O1 UQZIYBXSHAGNOE-XNSRJBNMSA-N 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000005846 sugar alcohols Chemical class 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 229960001367 tartaric acid Drugs 0.000 description 1
- 229910052713 technetium Inorganic materials 0.000 description 1
- GKLVYJBZJHMRIY-UHFFFAOYSA-N technetium atom Chemical compound [Tc] GKLVYJBZJHMRIY-UHFFFAOYSA-N 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- DBGVGMSCBYYSLD-UHFFFAOYSA-N tributylstannane Chemical compound CCCC[SnH](CCCC)CCCC DBGVGMSCBYYSLD-UHFFFAOYSA-N 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical compound [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 238000004846 x-ray emission Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/06—Coating with compositions not containing macromolecular substances
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L9/00—Disinfection, sterilisation or deodorisation of air
- A61L9/16—Disinfection, sterilisation or deodorisation of air using physical phenomena
- A61L9/18—Radiation
- A61L9/20—Ultraviolet radiation
- A61L9/205—Ultraviolet radiation using a photocatalyst or photosensitiser
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/063—Titanium; Oxides or hydroxides thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/54—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/66—Silver or gold
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
- B05D1/286—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers using a temporary backing to which the coating has been applied
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
- B05D5/061—Special surface effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
- B05D7/04—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber to surfaces of films or sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
- B32B27/283—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polysiloxanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/02—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by a sequence of laminating steps, e.g. by adding new layers at consecutive laminating stations
- B32B37/025—Transfer laminating
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/042—Coating with two or more layers, where at least one layer of a composition contains a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/056—Forming hydrophilic coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/015—Biocides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/544—Silicon-containing compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/14—Paints containing biocides, e.g. fungicides, insecticides or pesticides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/16—Antifouling paints; Underwater paints
- C09D5/1606—Antifouling paints; Underwater paints characterised by the anti-fouling agent
- C09D5/1612—Non-macromolecular compounds
- C09D5/1618—Non-macromolecular compounds inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/16—Antifouling paints; Underwater paints
- C09D5/1693—Antifouling paints; Underwater paints as part of a multilayer system
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
- B01J35/39—Photocatalytic properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2201/00—Polymeric substrate or laminate
- B05D2201/02—Polymeric substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2401/00—Form of the coating product, e.g. solution, water dispersion, powders or the like
- B05D2401/20—Aqueous dispersion or solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2601/00—Inorganic fillers
- B05D2601/20—Inorganic fillers used for non-pigmentation effect
- B05D2601/22—Silica
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2601/00—Inorganic fillers
- B05D2601/20—Inorganic fillers used for non-pigmentation effect
- B05D2601/24—Titanium dioxide, e.g. rutile
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2601/00—Inorganic fillers
- B05D2601/20—Inorganic fillers used for non-pigmentation effect
- B05D2601/28—Metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2264/00—Composition or properties of particles which form a particulate layer or are present as additives
- B32B2264/10—Inorganic particles
- B32B2264/102—Oxide or hydroxide
- B32B2264/1022—Titania
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2264/00—Composition or properties of particles which form a particulate layer or are present as additives
- B32B2264/10—Inorganic particles
- B32B2264/105—Metal
- B32B2264/1051—Silver or gold
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2264/00—Composition or properties of particles which form a particulate layer or are present as additives
- B32B2264/30—Particles characterised by physical dimension
- B32B2264/301—Average diameter smaller than 100 nm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/412—Transparent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/714—Inert, i.e. inert to chemical degradation, corrosion
- B32B2307/7145—Rot proof, resistant to bacteria, mildew, mould, fungi
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2309/00—Parameters for the laminating or treatment process; Apparatus details
- B32B2309/02—Temperature
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2311/00—Metals, their alloys or their compounds
- B32B2311/02—Noble metals
- B32B2311/08—Silver
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2367/00—Polyesters, e.g. PET, i.e. polyethylene terephthalate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2383/00—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
- C08J2483/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/08—Metals
- C08K2003/0806—Silver
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2237—Oxides; Hydroxides of metals of titanium
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2237—Oxides; Hydroxides of metals of titanium
- C08K2003/2241—Titanium dioxide
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/08—Metals
Definitions
- the present invention relates to a transfer film used for production of a substrate having a photocatalyst on the surface and a method for producing the same, and more particularly to a photocatalyst transfer film which gives a highly transparent photocatalytic thin film exhibiting antibacterial properties and the like.
- the photocatalytic film laminated on the surface of the substrate cleans the surface of the substrate because the photocatalytic metal compound, such as titanium oxide, decomposes the organic matter and exhibits hydrophilicity when irradiated with ultraviolet rays and visible rays. It is used for deodorizing and antibacterial applications.
- the photocatalytic metal compound such as titanium oxide
- photocatalytic materials have attracted attention as inorganic antibacterial and antifungal agents, and are being put to practical use in applications such as cleaning of the substrate surface, deodorization, and antibacterial.
- the photocatalytic reaction is a reaction caused by excited electrons and holes generated when a photocatalytic metal compound such as titanium oxide absorbs light.
- the mechanism that acts as an antibacterial agent is that the excited species and holes generated on the photocatalytic metal compound surface by the photocatalytic reaction undergo an oxidation-reduction reaction with oxygen or water adsorbed on the photocatalytic metal compound surface, and the generated active species Is considered to be caused by the action of microorganisms, causing cell membrane damage and killing, and the action of a long time eventually leading to the decomposition of microorganisms. Therefore, it can be said that the photocatalyst material can exert its effect on a wide variety of microorganisms including molds, has a low possibility of causing resistant bacteria, and has almost no deterioration over time. .
- the photocatalytic reaction is caused by irradiation with light in the ultraviolet region (wavelength of 10 to 400 nm) or light in the visible region (wavelength of 400 to 800 nm), so in principle in the dark where there is no natural light or artificial light. The effect cannot be obtained.
- bacteria and fungi grow even without light, products that require long-lasting performance, such as antibacterial and antifungal products, are not exposed to light.
- photocatalytic materials that exhibit antibacterial and antifungal properties.
- photocatalyst materials that complement the functions of the photocatalyst by using a photocatalyst and an antibacterial / antifungal agent other than the photocatalyst have been studied. Since the photocatalyst decomposes organic substances, it is appropriate to use an inorganic antibacterial / antifungal agent in combination with an antibacterial / antifungal agent other than the photocatalyst.
- Patent Documents 1 and 2 titanium oxide is added as a photocatalyst, and silver or copper is added as an antibacterial / antifungal component. It discloses that antibacterial and antifungal properties are acquired.
- photocatalysts are used by dispersing photocatalyst particles in a solvent, mixing the film-forming components, coating the resulting material, and applying it to the substrate.
- metal components such as silver, copper, and zinc
- practical problems often occur. That is, when a metal raw material is reacted with a photocatalyst particle powder as a method for supporting a metal such as silver, copper, or zinc or a compound thereof, a great amount of labor is required to disperse it in a solvent later.
- the dispersion stability of the photocatalyst particles is disturbed to cause aggregation, and this photocatalyst thin film is applied to various substrates. It was often difficult to obtain the transparency required for practical use when forming.
- the method of obtaining photocatalyst particles containing antibacterial / antifungal metals by adding a metal such as silver, copper, zinc or the like to the photocatalyst raw material and then heat treating it reduces the crystallinity of the photocatalyst particles.
- the photocatalytic function obtained is reduced, and a part of the antibacterial / antifungal metal is covered with titanium oxide and does not come out on the surface, so that the obtained antibacterial / antifungal property is also reduced. .
- the photocatalyst layer is a nanoparticle, the film-forming property is low, and it is difficult to maintain the surface film.
- the organic binder component is also decomposed by the oxidative degradation effect of the photocatalyst, and the durability of the film of the photocatalyst There was an inferior problem.
- smoothness is small depending on the base material, it is difficult to form a uniform film of the photocatalyst on the base material.
- Patent Document 3 discloses a transfer film in which a photocatalyst layer, an inorganic protective layer, and an organic adhesive layer are laminated and integrated on a base film.
- Patent Document 4 discloses a transfer film or sheet in which a photocatalyst layer and an adhesive layer are laminated on the surface of a film or sheet substrate.
- these transfer sheets or transfer films need to be laminated in three or more layers, and there is a problem that the productivity of the transfer sheet or film is inferior.
- the photocatalyst is required to have a small change in appearance after film formation on the substrate, and it is desired to use a highly transparent photocatalyst dispersion.
- Japanese Patent Application Laid-Open No. 2005-131552 (Patent Document 5) describes a transfer sheet made of a transparent photocatalyst layer forming composition.
- the photocatalyst coating liquid which is a highly transparent aqueous dispersion, is difficult to apply onto the organic film due to the effect of surface tension, and the surface tension of the liquid is reduced by mixing the solvent.
- photocatalyst particles may be deposited and the transparency may be reduced, or in the actual manufacturing process, the coating film may shrink evenly during drying due to the difference in the evaporation rate of the liquid mixture.
- an object of the present invention is to provide a highly transparent photocatalytic thin film exhibiting antibacterial properties even in the dark, and to provide a photocatalyst transfer film having good moldability and a method for producing the same.
- the present inventors have succeeded in producing a photocatalyst film that is uniform, highly transparent, and antibacterial on the surface of various substrates by the following photocatalyst transfer film.
- antibacterial may refer to growth inhibition of microorganisms including bacteria and fungi.
- this invention provides the photocatalyst transfer film shown below and its manufacturing method.
- the photocatalyst transfer film which has a photocatalyst layer containing the photocatalyst containing a titanium oxide particle, the alloy particle containing an antibacterial metal, a silicon compound, and surfactant on a base film.
- the surfactant is an acetylene surfactant.
- the dispersion particle diameter of two kinds of particle mixture of titanium oxide particles and alloy particles containing an antibacterial metal is a volume-based 50% cumulative distribution diameter (D 50) measured by a dynamic scattering method using laser light.
- Photocatalyst transfer film according to any one of [1] to [9], wherein a protective layer containing a silicon compound is further laminated on the photocatalyst layer.
- Photocatalyst transfer characterized in that a photocatalyst coating liquid containing titanium oxide particles, an alloy particle containing an antibacterial metal, a silicon compound, a surfactant and an aqueous dispersion medium is applied onto a base film and dried. A method for producing a film.
- a photocatalyst layer that is uniform, highly transparent, and exhibits antibacterial properties in a dark place can be transferred onto the surface of various substrates.
- a known base film for transfer can be used, for example, polyethylene terephthalate (PET) film, polyethylene naphthalate (PEN) film, polyethylene (PE) film, polyimide film.
- PET polyethylene terephthalate
- PEN polyethylene naphthalate
- PE polyethylene
- polyimide film examples thereof include plastic films such as acrylic film, polyvinyl chloride film, unstretched polypropylene (CPP) film, biaxially stretched polypropylene (OPP) film, and polyamide film, and PET film and OPP film are particularly preferable.
- the base film is particularly preferably a plastic film that has not been surface-treated.
- the base film preferably has an arithmetic average roughness Ra value measured by a 3D laser microscope of 0.01 ⁇ m to 3 ⁇ m, more preferably 0.01 ⁇ m to 1 ⁇ m. If the Ra value of the base film is less than 0.01 ⁇ m, it is difficult to form a uniform film, and if it exceeds 3 ⁇ m, the photocatalytic effect after transfer tends to decrease and the appearance also decreases.
- the photocatalyst layer of the photocatalyst transfer film of the present invention contains a photocatalyst containing titanium oxide particles, alloy particles containing an antibacterial metal, a silicon compound, and a surfactant.
- a photocatalyst layer can be formed by applying a photocatalyst containing a titanium oxide particle, an alloy particle containing an antibacterial metal, a silicon compound, a surfactant and an aqueous dispersion medium. .
- Photocatalyst containing titanium oxide particles It is preferable to use a photocatalyst excellent in transparency in consideration of design properties after processing.
- the photocatalyst refers to a generic name of substances that exhibit photocatalytic action when irradiated with light having energy of a predetermined band gap or more. Examples of such a substance include known metal oxide semiconductors such as titanium oxide, tungsten oxide, zinc oxide, tin oxide, iron oxide, bismuth oxide, bismuth vanadate, and strontium titanate.
- particles of these substances can be used alone or in combination of two or more.
- rutile type As the crystal phase of titanium oxide particles, three types of rutile type, anatase type, and brookite type are generally known, but it is mainly preferable to use anatase type or rutile type titanium oxide particles.
- the term “mainly” as used herein refers to generally 50% by mass or more of the entire titanium oxide particle crystal, preferably 70% by mass or more, more preferably 90% by mass or more, and 100% by mass. Also good.
- titanium oxide particles supported with metal compounds such as platinum, gold, palladium, iron, copper, nickel, tin, nitrogen, sulfur, carbon, transition What doped elements, such as a metal, can also be used. It is preferable to use a titanium oxide particle doped with the above-mentioned element because a particle size can be easily controlled and a film having excellent transparency can be obtained.
- a titanium oxide particle dispersion for the photocatalyst coating liquid for forming the photocatalyst layer.
- an aqueous solvent is usually used, and a water, a water-soluble organic solvent that can be mixed with water, or a mixed solvent in which water and a water-soluble organic solvent are mixed at an arbitrary ratio is used. It is preferable.
- water for example, deionized water, distilled water, pure water and the like are preferable.
- water-soluble organic solvent examples include alcohols such as methanol, ethanol and isopropanol; glycols such as ethylene glycol; glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether and propylene glycol-n-propyl ether.
- alcohols such as methanol, ethanol and isopropanol
- glycols such as ethylene glycol
- glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether and propylene glycol-n-propyl ether.
- the aqueous dispersion medium may be used alone or in combination of two or more thereof. In the case of a mixed solvent, the ratio of the water-soluble organic solvent to water is preferably 1/10 to 15/10.
- the titanium oxide particles in the titanium oxide particle dispersion are preferably fine particles, and the dispersed particle diameter of the titanium oxide particles is 50% cumulative distribution based on volume measured by a dynamic light scattering method using laser light.
- the diameter (D 50 ) (hereinafter sometimes referred to as “average particle diameter”) is preferably 5 to 30 nm, more preferably 5 to 20 nm. This is because when the average particle size is less than 5 nm, the photocatalytic activity may be insufficient, and when it exceeds 30 nm, the dispersion may become opaque.
- ELSZ-2000ZS manufactured by Otsuka Electronics Co., Ltd.
- Nanotrack UPA-EX150 manufactured by Nikkiso Co., Ltd.
- LA-910 manufactured by Horiba Seisakusho
- the concentration of the titanium oxide particles in the titanium oxide particle dispersion is preferably from 0.01 to 30% by mass, particularly from 0.3 to 30% from the viewpoint of easy production of a photocatalyst / alloy thin film having a required thickness described later. 20 mass% is preferable.
- the alloy particle is composed of two or more metal components including at least one antibacterial metal.
- An “antibacterial metal” refers to a metal that is harmful to microorganisms such as bacteria and fungi, but is relatively harmless to the human body.
- a film is coated with metal component particles, and JIS When standard test of Z 2801 antibacterial processed product is performed, decrease in viable count of Staphylococcus aureus and Escherichia coli is confirmed.
- Silver, copper, zinc, platinum, palladium, nickel, aluminum, titanium, cobalt, zirconium, molybdenum And tungsten (the following references 1 and 2).
- the alloy particles used in the photocatalyst transfer film of the present invention are preferably alloys containing at least one of these metals, and particularly alloys containing at least one of silver, copper, and zinc. Is preferred.
- An alloy particle containing a combination of metal components such as tin, cobalt copper, zinc magnesium, silver zinc, copper zinc, and silver copper zinc can be given.
- Components other than the antibacterial metal in the alloy particles are not particularly limited.
- the content of the antibacterial metal in the alloy particles is 1 to 100% by mass, preferably 10 to 100% by mass, more preferably 50 to 100% by mass with respect to the total mass of the alloy particles. This is because when the antibacterial metal is less than 1% by mass with respect to the total mass of the alloy particles, the antibacterial / antifungal performance may not be sufficiently exhibited.
- an alloy particle dispersion for the photocatalyst coating liquid for forming the photocatalyst layer is preferable.
- an aqueous solvent is usually used, and water, a water-soluble organic solvent that can be mixed with water, or a mixed solvent in which water and a water-soluble organic solvent are mixed at an arbitrary ratio is used. Is preferred.
- water for example, deionized water, distilled water, pure water and the like are preferable.
- water-soluble organic solvent examples include alcohols such as methanol, ethanol, n-propanol, 2-propanol, n-butanol, 2-butanol, tert-butanol, ethylene glycol, diethylene glycol, and polyethylene glycol; ethylene glycol monomethyl Glycol ethers such as ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol-n-propyl ether; ketones such as acetone and methyl ethyl ketone; 2-pyrrolidone Water-soluble nitrogen-containing compounds such as N-methylpyrrolidone; It is may be used singly or in combination of two or more kinds thereof.
- alcohols such as methanol, ethanol, n-propanol, 2-propanol, n-butanol, 2-but
- the alloy particles in the alloy particle dispersion are preferably fine particles, and the dispersed particle diameter of the alloy particles is a volume-based 50% cumulative distribution diameter (D) measured by a dynamic light scattering method using laser light.
- 50 (hereinafter sometimes referred to as “average particle diameter”) is preferably 200 nm or less, more preferably 100 nm or less, and even more preferably 70 nm or less.
- the lower limit of the average particle size is not particularly limited, and theoretically, even the smallest particle size that can have antibacterial / antifungal properties can be used, but in practice it is preferably 1 nm or more.
- the dispersion may become opaque, which is not preferable.
- ELSZ-2000ZS manufactured by Otsuka Electronics Co., Ltd.
- Nanotrack UPA-EX150 manufactured by Nikkiso Co., Ltd.
- LA-910 manufactured by Horiba Seisakusho
- the concentration of the alloy particles in the alloy particle dispersion is not particularly limited, but generally the lower the concentration, the better the dispersion stability, so 0.0001 to 10% by mass is preferable, more preferably 0.001 to 5% by mass, and further Preferably, the content is 0.01 to 1% by mass. If it is less than 0.0001% by mass, the productivity of the photocatalyst transfer film is remarkably lowered, which is not preferable.
- Silicon compound The silicon compound contained in the photocatalyst layer of the photocatalyst transfer film of the present invention is used as a binder in the photocatalyst layer.
- the silicon compound-based binder is a colloidal dispersion, solution or emulsion of a silicon compound containing a solid or liquid silicon compound in an aqueous dispersion medium.
- the silicon compound binder include colloidal silica (preferably an average particle size of 1 to 150 nm); silicate solutions; silane, siloxane hydrolyzate emulsion; silicone resin emulsion; silicone-acrylic resin copolymer; An emulsion of a copolymer of a silicone resin such as a silicone-urethane resin copolymer and another resin can be given.
- a silicate solution obtained by hydrolytic condensation of a tetrafunctional silicon compound under a basic compound.
- the tetrafunctional silicon compound include amorphous silica, silicon tetrachloride, tetraethoxysilane, and tetramethoxylane.
- the basic compound is preferably an organic ammonium salt, and specifically, tetramethylammonium hydroxide, triethylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, and the like are preferable.
- the hydrolysis and condensation of the tetrafunctional silicon compound is preferably 1 to 20% by mass, more preferably 1 to 15% by mass of the above tetrafunctional silicon compound as a raw material with respect to the reaction system (raw material mixture). In the presence of a basic compound, it is carried out at room temperature to 170 ° C.
- the addition amount of the basic compound is preferably 100 mol% or more, more preferably 100 to 500 mol% with respect to the tetrafunctional silicon compound.
- the tetrafunctional silicon compound is silica
- a raw material mixture is prepared in which the SiO 2 concentration is 1 to 15% by mass, the basic compound concentration is 2 to 25% by mass, and the balance is water. It is preferable to heat and stir at 130 ° C.
- surfactant contained in the photocatalyst layer of the photocatalyst transfer film of the present invention for example, anions such as fatty acid sodium salt, alkylbenzene sulfonate, higher alcohol sulfate, polyoxyethylene alkyl ether sulfate, etc.
- cationic surfactant such as alkyltrimethylammonium salt, dialkyldimethylammonium salt, alkyldimethylbenzylammonium salt, quaternary ammonium salt
- amphoteric surfactant such as alkylamino fatty acid salt, alkylbetaine, alkylamine oxide Polyoxyethylene alkyl ether, polyoxyethylene alkyl phenol ether, alkyl glucoside, polyoxyethylene fatty acid ester, sucrose fatty acid ester, sorbitan fatty acid ester, polyoxy Nonionic surfactants such as ethylene sorbitan fatty acid esters, fatty acid alkanolamides, and acetylene surfactants can be exemplified.
- nonionic surfactants are preferred from the viewpoint of the stability of the coating solution.
- the surfactant preferably has an HLB of 7 to 18, more preferably 10 to 15.
- acetylene surfactants are preferable, and those represented by the following general formula are more preferable.
- R 1 —C ⁇ C—R 2 R 1 and R 2 are, independently of each other, a monovalent organic group, preferably a hydrocarbon group having 1 to 20 carbon atoms in which some of the hydrogen atoms are substituted with OH groups.
- R 1 and R 2 may be a group in which a part of the hydrocarbon group having 1 to 20 carbon atoms has an ether bond.
- Examples of the acetylene-based surfactant include Olphine EXP4001, EXP4200, EXP4123, EXP4300 (manufactured by Nissin Chemical Industry Co., Ltd.) and the like.
- the photocatalyst coating liquid for forming the photocatalyst layer of the photocatalyst transfer film of the present invention is a mixture of two types of particle dispersions, the titanium oxide particle dispersion and the alloy particle dispersion described above. It can be prepared by adding a silicon compound and a surfactant.
- the titanium oxide / alloy particle dispersion of the present invention comprises two types of particle dispersions, which are separately composed of a titanium oxide particle dispersion and an alloy particle dispersion containing an antibacterial / antifungal metal. It is obtained by mixing.
- Two types of particle dispersions that is, a titanium oxide particle dispersion and an alloy particle dispersion containing an antibacterial / antifungal metal, can be produced by a method including the following steps (1) to (6).
- the peroxotitanic acid solution produced in the step (1) is subjected to pressure control. Step of heating at 80 to 250 ° C.
- Step 3 Step of producing a solution containing a raw material antibacterial metal compound and a solution containing a reducing agent for reducing the metal compound (4) Step (5) for producing an alloy particle dispersion by mixing a solution containing the raw material antibacterial metal compound produced in the step (3) and a solution containing a reducing agent for reducing the metal compound (5) Step 4) Washing the alloy particle dispersion produced in step 4 with an aqueous dispersion medium by membrane filtration method (6) Mixing the titanium oxide particle dispersion obtained in (2) and (5) with the alloy particle dispersion Process
- Steps (1) and (2) are steps for producing a titanium oxide particle dispersion.
- Steps (3) to (5) are steps for producing an alloy particle dispersion.
- the liquid phase reduction method which is one of the superior chemical methods, is used.
- alloy particles are precipitated by mixing a reducing agent in a solution containing two or more kinds of metal ions that are used as raw materials for the alloy.
- the dispersibility of the alloy particles in the solvent can be further improved by coexisting a protective agent for the alloy particles in the reaction system.
- step (6) the titanium oxide particle dispersion obtained in step (2) and the alloy particle dispersion obtained in step (5) are mixed to finally have deodorizing and antibacterial properties. It is a manufacturing process of a titanium oxide / alloy particle mixed dispersion. Details of each step will be described below.
- step (1) a peroxotitanic acid solution is produced by reacting a raw material titanium compound, a basic substance, and hydrogen peroxide in an aqueous dispersion medium.
- a basic substance is added to a raw material titanium compound in an aqueous dispersion medium to form titanium hydroxide, impurity ions other than the contained metal ions are removed, and hydrogen peroxide is added.
- hydrogen peroxide is added to the raw material titanium compound, and then a basic substance is added to form peroxotitanium hydrate, impurities other than the contained metal ions are removed, and hydrogen peroxide is further added.
- a method of adding peroxotitanic acid may be used.
- the raw material titanium compound for example, inorganic acid salts such as titanium chloride, nitrate and sulfate; organic acid salts such as formic acid, citric acid, succinic acid, lactic acid and glycolic acid; and alkalis are added to these aqueous solutions And titanium hydroxide deposited by hydrolysis, and one or two or more of these may be used in combination.
- inorganic acid salts such as titanium chloride, nitrate and sulfate
- organic acid salts such as formic acid, citric acid, succinic acid, lactic acid and glycolic acid
- alkalis alkalis
- titanium hydroxide deposited by hydrolysis it is preferable to use titanium chloride (TiCl 3 , TiCl 4 ) as the raw material titanium compound.
- the aqueous dispersion medium those similar to the aqueous dispersion medium in the above-mentioned titanium oxide particle dispersion are used so as to have the above-mentioned composition.
- concentration of the raw material titanium compound aqueous solution formed from a raw material titanium compound and an aqueous dispersion medium is 60 mass% or less, especially 30 mass% or less.
- concentration is selected suitably, it is preferable that it is 1 mass% or more normally.
- the basic substance is for making the raw material titanium compound into titanium hydroxide smoothly.
- hydroxide of alkali metal or alkaline earth metal such as sodium hydroxide or potassium hydroxide; ammonia, alkanolamine, alkyl Examples include amine compounds such as amines.
- the basic substance is used after being added in such an amount that the pH of the raw material titanium compound aqueous solution becomes 7 or more, particularly pH 7-10.
- the basic substance may be used in the form of an aqueous solution having an appropriate concentration together with the aqueous dispersion medium.
- Hydrogen peroxide is used to convert the above raw material titanium compound or titanium hydroxide into peroxotitanium, that is, a titanium oxide compound containing a Ti—O—O—Ti bond, and is usually used in the form of hydrogen peroxide water. Is done.
- the amount of hydrogen peroxide added is preferably 1.5 to 20 times the molar amount of titanium.
- the reaction temperature is preferably 5 to 80 ° C., and the reaction time is 30 minutes to 24 hours. preferable.
- the peroxotitanic acid solution thus obtained may contain an alkaline substance or an acidic substance for pH adjustment or the like.
- examples of the alkaline substance include ammonia, sodium hydroxide, calcium hydroxide, and alkylamine.
- examples of the acidic substance include sulfuric acid, nitric acid, hydrochloric acid, carbonic acid, phosphoric acid, and hydrogen peroxide.
- the obtained peroxotitanic acid solution is preferably pH 1 to 9, particularly pH 4 to 7, from the viewpoint of handling safety.
- step (2) the peroxotitanic acid solution obtained in step (1) is subjected to a hydrothermal reaction for 0.01 to 24 hours at a temperature of 80 to 250 ° C., preferably 100 to 250 ° C. under pressure control. .
- the reaction temperature is appropriately 80 to 250 ° C. from the viewpoint of reaction efficiency and reaction controllability, and as a result, peroxotitanic acid is converted into titanium oxide particles.
- under pressure control means that when the reaction temperature exceeds the boiling point of the dispersion medium, the reaction temperature is appropriately maintained to maintain the reaction temperature so that the reaction temperature can be maintained. This includes the case of controlling at atmospheric pressure when the temperature is lower than the boiling point.
- the pressure is usually about 0.12 to 4.5 MPa, preferably about 0.15 to 4.5 MPa, more preferably 0.20 to 4.5 MPa.
- the reaction time is preferably 1 minute to 24 hours.
- the particle diameter of the titanium oxide particles obtained here is preferably in the range as already described, but it is possible to control the particle diameter by adjusting the reaction conditions, for example, the reaction time and the temperature raising time. It is possible to reduce the particle diameter by shortening.
- step (3) a solution in which the raw material antibacterial metal compound is dissolved in an aqueous dispersion medium and a solution in which a reducing agent for reducing the raw material antibacterial metal compound is dissolved in the aqueous dispersion medium are produced. .
- the method for producing these solutions may be a method in which a raw material antibacterial metal compound and a reducing agent for reducing the raw material antibacterial metal compound are separately added to an aqueous dispersion medium and dissolved by stirring.
- the stirring method is not particularly limited as long as it can be uniformly dissolved in the aqueous dispersion medium, and a generally available stirrer can be used.
- various antibacterial metal compounds can be used.
- inorganic acid salts such as chlorides, nitrates and sulfates of antibacterial metals; formic acid, citric acid, oxalic acid, lactic acid, Organic acid salts such as glycolic acid; complex salts such as ammine complexes, cyano complexes, halogeno complexes, and hydroxy complexes may be used, and one or more of these may be used in combination.
- inorganic acid salts such as chlorides, nitrates and sulfates.
- the reducing agent is not particularly limited, and any of various reducing agents capable of reducing metal ions constituting the raw material antibacterial metal compound can be used.
- the reducing agent include hydrazines such as hydrazine, hydrazine monohydrate, phenylhydrazine and hydrazinium sulfate; amines such as dimethylaminoethanol, triethylamine, octylamine and dimethylaminoborane; citric acid, ascorbic acid, tartaric acid, Organic acids such as malic acid, malonic acid, formic acid; alcohols such as methanol, ethanol, isopropyl alcohol, ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, benzotriazole; sodium borohydride, lithium borohydride, hydrogen Lithium triethylborohydride, lithium aluminum hydride, diisobutylaluminum hydride, tributyltin hydride, lithium tri
- a protective agent may be added to a solution obtained by dissolving a reducing agent in an aqueous dispersion medium.
- the protective agent is not particularly limited as long as it can prevent the reduction-precipitated alloy particles from aggregating, and a surfactant or an organic compound having the ability as a dispersant can be used.
- the protective agent include surfactants such as anionic surfactants, cationic surfactants and nonionic surfactants; polyvinylpyrrolidone, polyvinyl alcohol, polyethyleneimine, polyethylene oxide, polyacrylic acid, Water-soluble polymer compounds such as methylcellulose; aliphatic amine compounds such as ethanolamine, diethanolamine, triethanolamine, propanolamine; butylamine, dibutylamine, hexylamine, cyclohexylamine, heptylamine, 3-butoxypropylamine, octylamine, Primary amine compounds such as nonylamine, decylamine, dodecylamine, hexadecylamine, oleylamine, octadecylamine; N, N-dimethylethylenediamine, NN-diethylethylenedi Diamine compounds such as amine; and a carboxylic acid compound such as oleic acid.
- surfactants such as anionic
- aqueous dispersion medium aqueous solvent
- water a water-soluble organic solvent that can be mixed with water, or a mixed solvent in which water and a water-soluble organic solvent are mixed at an arbitrary ratio.
- water for example, deionized water, distilled water, pure water and the like are preferable.
- water-soluble organic solvent examples include alcohols such as methanol, ethanol, isopropanol, n-propanol, 2-propanol, n-butanol, 2-butanol, tert-butanol, ethylene glycol and diethylene glycol; ethylene glycol monomethyl ether Glycol ethers such as ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol-n-propyl ether; ketones such as acetone and methyl ethyl ketone; 2-pyrrolidone, Water-soluble nitrogen-containing compounds such as N-methylpyrrolidone; and ethyl acetate .
- the aqueous dispersion medium may be used alone or in combination of two or more thereof.
- Basic substances include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide; alkali metal carbonates such as sodium carbonate and potassium carbonate; alkali metal hydrogen carbonates such as sodium hydrogen carbonate and potassium hydrogen carbonate; tert- Alkali metal alkoxides such as butoxy potassium, sodium methoxide and sodium ethoxide; alkali metal salts of aliphatic hydrocarbons such as butyl lithium; amines such as triethylamine, diethylaminoethanol and diethylamine.
- the acidic substance examples include inorganic acids such as aqua regia, hydrochloric acid, nitric acid, and sulfuric acid; organic acids such as formic acid, acetic acid, chloroacetic acid, dichloroacetic acid, oxalic acid, trifluoroacetic acid, and trichloroacetic acid.
- inorganic acids such as aqua regia, hydrochloric acid, nitric acid, and sulfuric acid
- organic acids such as formic acid, acetic acid, chloroacetic acid, dichloroacetic acid, oxalic acid, trifluoroacetic acid, and trichloroacetic acid.
- the concentration of the solution in which the raw material antibacterial metal compound is dissolved in the aqueous dispersion medium and the concentration of the solution in which the reducing agent for reducing the raw material antibacterial metal compound is dissolved in the aqueous dispersion medium is not particularly limited, In general, the lower the concentration, the smaller the primary particle size of the individual alloy particles formed. Therefore, it is preferable to set a suitable concentration range according to the intended primary particle size range.
- the pH of the solution in which the raw material antibacterial metal compound is dissolved in the aqueous dispersion medium and the pH of the solution in which the reducing agent for reducing the raw material antibacterial metal compound is dissolved in the aqueous dispersion medium are not particularly limited.
- the solution is preferably adjusted to a suitable pH according to the molar ratio of metals in the target alloy particles, the primary particle diameter, and the like.
- step (4) the solution prepared in step (3) in which the raw material antibacterial metal compound is dissolved in the aqueous dispersion medium and the reducing agent for reducing the raw material antibacterial metal compound are contained in the aqueous dispersion medium.
- the dissolved solution is mixed to produce an alloy particle dispersion.
- the method of mixing these two solutions is not particularly limited as long as these two solutions can be mixed uniformly.
- a method of stirring and mixing a metal compound solution and a reducing agent solution in a reaction vessel For example, a method of stirring and mixing a metal compound solution and a reducing agent solution in a reaction vessel. , A method in which a reducing agent solution is dropped while stirring a metal compound solution placed in a reaction vessel, and agitation and mixing, a method in which a metal compound solution is dropped and stirred and agitation is performed in a reaction vessel, a metal Examples thereof include a method in which a compound solution and a reducing agent solution are continuously supplied in a fixed amount and mixed in a reaction vessel or a microreactor.
- the temperature at the time of mixing is not particularly limited, and is preferably adjusted to a suitable temperature according to the molar ratio of the metal in the target alloy particles, the primary particle diameter, and the like.
- step (5) the alloy particle dispersion produced in step (4) is washed with an aqueous dispersion medium by a membrane filtration method.
- aqueous dispersion medium it is preferable to use water, a water-soluble organic solvent that can be mixed with water, or a mixed solvent in which water and a water-soluble organic solvent are mixed at an arbitrary ratio.
- water for example, deionized water, distilled water, pure water and the like are preferable.
- water-soluble organic solvent examples include alcohols such as methanol, ethanol, isopropanol, n-propanol, 2-propanol, n-butanol, 2-butanol, tert-butanol, ethylene glycol and diethylene glycol; ethylene glycol monomethyl ether Glycol ethers such as ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol-n-propyl ether; ketones such as acetone and methyl ethyl ketone; 2-pyrrolidone, Water-soluble nitrogen-containing compounds such as N-methylpyrrolidone; and ethyl acetate . You may use a water-soluble organic solvent combining these 1 type (s) or 2 or more types.
- non-volatile impurities other than alloy particles for example, components other than metal in the raw metal compound, reducing agent, protective agent, from the alloy particle dispersion by the membrane filtration method produced in step (4) Wash / separate etc. Washing is preferably performed until the mass ratio of alloy particles to nonvolatile impurities (alloy particles / nonvolatile impurities) in the alloy particle dispersion becomes 0.01 to 10, more preferably 0.05 to 5, and even more. Preferably it is 0.1-1. If the mass ratio is less than 0.01, the amount of impurities to the alloy particles is large, and the resulting antibacterial / antifungal properties and deodorizing performance may not be fully exhibited. This is not preferable because the properties may be lowered.
- Nonvolatile impurity concentration (%) [nonvolatile content mass (g) / mass of alloy particle dispersion before heating (g)] ⁇ 100—metal component concentration in alloy particle dispersion (%)
- the membrane used in the membrane filtration method is not particularly limited as long as it can separate the alloy particles and non-volatile impurities other than the alloy particles from the alloy particle dispersion, but, for example, a microfiltration membrane, an ultrafiltration membrane, or the like. And nanofiltration membranes. Of these, filtration can be performed using a membrane having an appropriate pore size.
- any method such as centrifugal filtration, pressure filtration, or cross flow filtration can be employed.
- the shape of the filtration membrane those having an appropriate form such as a hollow fiber type, a spiral type, a tubular type, and a flat membrane type can be used.
- the material of the filtration membrane is not particularly limited as long as it is durable to the alloy particle dispersion, and is made of polyethylene, tetrafluoroethylene, difluoroethylene, polypropylene, cellulose acetate, polyacrylonitrile, polyimide, polysulfone.
- Organic membranes such as polyethersulfone; inorganic membranes such as silica, alumina, zirconia, and titania can be appropriately selected and used.
- filtration membranes as described above include: Microza (manufactured by Asahi Kasei Chemicals Corporation), Amicon Ultra (manufactured by Merck Millipore Corporation), Ultra Filter (Advantech Toyo Co., Ltd.), MEMBRAOX (Nihon Pole ( Co.)).
- step (6) the titanium oxide particle dispersion obtained in the step (2) and the alloy particle dispersion obtained in the step (5) are mixed to deodorize and have antibacterial properties. A particle mixed dispersion is obtained.
- the mixing method is not particularly limited as long as the two dispersions are uniformly mixed.
- the mixing can be performed by stirring using a generally available stirrer.
- the mixing ratio of the titanium oxide particle dispersion and the alloy particle dispersion in the photocatalyst coating liquid is such that the mass ratio of the titanium oxide particles and the alloy particles in each dispersion (titanium oxide particles / alloy particles) is 1 to 100. , Preferably 10 to 10,000, more preferably 20 to 1,000. When the mass ratio is less than 1, it is not preferable because the photocatalytic performance is not sufficiently exhibited, and when it exceeds 100,000, the antibacterial / antifungal performance is not sufficiently exhibited.
- the dispersion particle diameter of the mixture of the titanium oxide particles in the titanium oxide / alloy particle dispersion and the alloy particles containing the antibacterial / antifungal metal is measured by a dynamic light scattering method using laser light.
- the volume-based 50% cumulative distribution diameter (D 50 ) (hereinafter sometimes referred to as “average particle diameter”) is 5 to 100 nm, preferably 5 to 30 nm, and more preferably 5 to 20 nm. This is because when the average particle size is less than 5 nm, the photocatalytic activity may be insufficient, and when it exceeds 100 nm, the dispersion may become opaque.
- silicon is used in a mass ratio of silicon compound: titanium oxide particles of 1:99 to 99: 1, more preferably 10:90 to 90:10, still more preferably 30:70 to 70:30. It is preferable to add a compound.
- the titanium oxide / alloy particle dispersion containing the silicon compound is diluted with an aqueous dispersion medium so that the concentration of titanium oxide and the silicon compound is 0.1 to 10% by mass, preferably 0.3 to 5% by mass.
- an aqueous dispersion medium it is preferable to use water, a water-soluble organic solvent that can be mixed with water, or a mixed solvent in which water and a water-soluble organic solvent are mixed in an arbitrary ratio.
- water for example, deionized water, distilled water, pure water and the like are preferable.
- water-soluble organic solvent examples include alcohols such as methanol, ethanol and isopropanol; glycols such as ethylene glycol; glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether and propylene glycol-n-propyl ether. Are preferred. Alcohols are particularly preferred because they are easy to disperse.
- the weight ratio of the water-soluble organic solvent / water in the mixed solvent is preferably greater than 1/10 and not greater than 15/10, more preferably greater than 2/10 and not greater than 12/10.
- a surfactant is added to the titanium oxide / alloy particle dispersion containing the diluted silicon compound in a liquid weight ratio of 0.0005 mass% to 5 mass%, preferably 0.001 mass% to 1 mass%.
- a photocatalyst coating solution is obtained.
- the photocatalyst transfer film of the present invention may further have a protective layer formed from a silicon compound on the photocatalyst layer.
- the silicon compound used in the protective layer include those similar to the silicon compound blended in the photocatalyst layer as a binder. Specifically, colloidal silica (preferably having an average particle size of 1 to 150 nm); silicates Silane, siloxane hydrolyzate emulsion; silicone resin emulsion; emulsion of copolymer of silicone resin such as silicone-acrylic resin copolymer and silicone-urethane resin copolymer and other resins, etc. .
- a silicate solution obtained by hydrolytic condensation of a tetrafunctional silicon compound under a basic compound examples include amorphous silica, silicon tetrachloride, tetraethoxysilane, and tetramethoxylane.
- the basic compound is preferably an organic ammonium salt, and specifically, tetramethylammonium hydroxide, triethylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, and the like are preferable.
- the photocatalyst coating solution is applied onto a base film to form a photocatalyst layer film.
- the base film may be coated with a photocatalyst coating solution as long as it is a known technically established method. Specifically, a spray coating method, a wire bar method, a die coating method, a gravure coating method, or a micro gravure coating method.
- a film of a photocatalyst coating solution is formed using a method, an ink jet method, a spin coating method, a dip coating method, etc., and the coating film is dried at a temperature of 70 ° C. to 150 ° C., preferably 80 ° C. to 130 ° C.
- a photocatalytic transfer film can be obtained.
- the thickness of the photocatalyst layer after drying may be 20 nm to 300 nm, preferably 40 nm to 150 nm.
- the thickness of the photocatalyst layer is thinner than 20 nm, the photocatalytic effect may be reduced.
- the film thickness of a photocatalyst layer becomes thicker than 300 nm, it may not hold
- a protective layer containing a silicon compound may be further laminated on the photocatalyst layer, and the coating of the silicon compound contained in the aqueous dispersion medium may be any known technically established method.
- a silicon compound film is formed using a spray coating method, a wire bar method, a die coating method, a gravure coating method, a micro gravure coating method, an ink jet method, a spin coating method, a dip coating method, etc.
- the film is dried at a temperature of 70 ° C. to 150 ° C., preferably 80 ° C. to 130 ° C. to obtain a smooth photocatalytic transfer film having a protective layer containing a silicon compound laminated on the outermost surface.
- the thickness of the protective layer containing the silicon compound after drying may be 20 nm to 300 nm, preferably 40 nm to 150 nm.
- the thickness of the protective layer is less than 20 nm, the function as the protective layer may be insufficient. Further, when the thickness of the protective layer is greater than 300 nm, the protective layer may be easily broken and may not be retained as a film.
- the photocatalyst transfer film of the present invention can be used for forming a photocatalyst film on the surface of various base materials.
- various base materials are not particularly limited, but examples of the base material include organic materials and inorganic materials. These can have various shapes according to their respective purposes and applications.
- organic materials include vinyl chloride resin (PVC), polyethylene (PE), polypropylene (PP), polycarbonate (PC), acrylic resin, polyacetal, fluororesin, silicone resin, and ethylene-vinyl acetate copolymer (EVA).
- NBR Acrylonitrile-butadiene rubber
- PET polyethylene terephthalate
- PEN polyethylene naphthalate
- PVB polyvinyl butyral
- EVOH ethylene-vinyl alcohol copolymer
- PPS polyphenylene sulfide
- PEI polyether Imide
- PEEI polyetheretherimide
- PEEK polyetheretherketone
- ABS acrylonitrile-butadiene-styrene
- inorganic materials include non-metallic inorganic materials and metallic inorganic materials.
- non-metallic inorganic materials include glass, ceramics, and stone materials. These may be processed into various shapes such as tiles, glass, mirrors, walls, and design materials.
- the metal inorganic material include cast iron, steel material, iron, iron alloy, aluminum, aluminum alloy, nickel, nickel alloy, and zinc die cast. These may be plated with the metal inorganic material, may be coated with the organic material, or may be plated on the surface of the organic material or non-metallic inorganic material.
- a primer layer such as silicone or amine may be laminated on the surface of the substrate, and the primer layer facilitates transfer processing.
- Base materials with photocatalysts on the surface are used as indoor building materials such as building wall materials, wallpaper, ceiling materials, flooring materials, tiles, bricks, wood boards, resin plates, metal plates, tatami mats, bathroom members, melamine boards.
- the photocatalyst transfer film of the present invention can be transferred to the above-mentioned various substrates by a known method. However, since the photocatalyst layer can be uniformly transferred, a laminating method and a pressing method are preferable.
- the processing temperature depends on the characteristics of the transfer substrate, film formation is preferably performed at 110 ° C. to 170 ° C., particularly 120 ° C. to 160 ° C. for about 5 minutes to 2 hours. If the processing temperature is less than 110 ° C, the photocatalyst layer may not be transferred to the transfer substrate side. If the processing temperature exceeds 170 ° C, the base film of the photocatalyst transfer film is transferred to the transfer substrate side and covers the surface of the photocatalyst layer. In some cases, photocatalytic properties cannot be obtained.
- a protective film can be further formed on the surface of the photocatalyst layer or the surface of the protective layer formed on the base film.
- any film can be used as the protective film, but the above-described plastic film can be used as the protective film.
- the laminate on which such a protective film is formed can be easily transported and wound up by a roll.
- Average particle diameter D 50 The average particle diameter D 50 of the titanium oxide particle dispersion, the alloy particle dispersion, and the two types of particle mixture of titanium oxide particles and alloy particles is determined by laser light using ELSZ-2000ZS (manufactured by Otsuka Electronics Co., Ltd.). Was calculated as a volume-based 50% cumulative distribution diameter measured by a dynamic light scattering method.
- ⁇ Preparation of silicon compound-containing liquid ⁇ > Amorphous silica, water, and ethyl trimethylammonium hydroxide (20% by weight aqueous solution, Sechem Japan GK), silica: ethyltrimethylammonium hydroxide 1: 2 (molar ratio), silica in the system at the start of the reaction
- the mixture was mixed so that the content became 5% by mass, and heated and stirred at 110 ° C. for 2 hours.
- the resulting solution was diluted with water so that the solid content concentration was 0.5% by mass, and then adjusted to pH 7.0 with an ion exchange resin (trade name: Dowex 50W-X8, manufactured by Dow Corning).
- an ion exchange resin trade name: Dowex 50W-X8, manufactured by Dow Corning
- Titanium oxide particle dispersion A (nonvolatile content concentration 1.0% by mass, average particle size D 50 12 nm) was obtained.
- Liquid B nonvolatile content concentration 1.0% by mass, average particle size D 50 10 nm
- the obtained titanium oxide particle dispersions A and B were each dried at 105 ° C. for 3 hours, and recovered by powder X-ray diffraction (trade name “desktop X-ray diffractometer D2 PHASER”, Bruker A
- the crystal phase of the titanium oxide particles was identified by measuring XS Corporation.
- the titanium oxide crystal phase of the titanium oxide particle dispersion A was anatase type.
- the titanium oxide crystal phase of the titanium oxide particle dispersion B was a rutile type.
- a solution (ii) containing a reducing agent was obtained by mixing 10% by mass of polyvinylpyrrolidone as a reducing agent / protective agent.
- ⁇ Preparation of silver palladium alloy particle dispersion D> instead of the solution (i) containing the starting metal compound, ethylene glycol is used as a solvent, silver nitrate is used so that the concentration as Ag is 4.00 mmol / L, and nitric acid is used so that the concentration as Pd is 1.00 mmol / L. 0.1% by mass of alloy particles containing pure water as a dispersion medium in the same manner as in the preparation of the alloy particle dispersion C except that a solution (iii) containing a raw metal compound in which palladium dihydrate is dissolved is used. Dispersion D (average particle diameter D 50 53 nm, proportion of antibacterial metal in alloy particles 100% by mass) was obtained.
- Titanium oxide particle dispersion A (average particle size 12 nm) and alloy particle dispersion C are mixed so that the mass ratio of particles in each dispersion (titanium oxide particles / alloy particles) is 1,000.
- the silicon compound-containing liquid ⁇ was mixed so that the titanium oxide: silicon compound was 1: 1 (mass ratio).
- a mixed solvent of water / isopropyl alcohol (weight ratio 6/4) is added as a dispersion medium so that the concentration of titanium oxide and silicon compound is 0.5% by mass to the mixed solution, thereby oxidizing the silicon compound.
- a dispersion of titanium particles and alloy particles was prepared.
- the average particle diameter D 50 of the two types of particle mixture of titanium oxide particles and alloy particles in this dispersion was 18 nm.
- a photocatalyst coating solution E was obtained by adding and mixing 0.02% by mass of an acetylene-based surfactant (Orphine EXP4200 HLB 10 to 13 manufactured by Nissin Chemical Co., Ltd.) in a weight ratio to the dispersion.
- Titanium oxide particle dispersion B (average particle diameter 10 nm) and alloy particle dispersion D are mixed so that the mass ratio of particles in each dispersion (titanium oxide particles / alloy particles) is 1,000, and the mixture
- the silicon compound-containing liquid ⁇ was mixed so that the titanium oxide: silicon compound was 1: 1 (mass ratio).
- a mixed solvent of water / isopropyl alcohol (weight ratio 5/5) is added as a dispersion medium so that the concentration of titanium oxide and silicon compound is 0.4% by mass in the mixed solution, thereby oxidizing the silicon compound.
- a dispersion of titanium particles and alloy particles was prepared.
- the average particle diameter D 50 of the two types of particle mixture of titanium oxide particles and alloy particles in this dispersion was 16 nm.
- An acetylene-based surfactant (Olfin EXP4200 HLB 10 to 13 manufactured by Nissin Chemical Co., Ltd.) was added to and mixed with 0.03% by mass of the dispersion in the dispersion to obtain a photocatalyst coating solution F.
- a photocatalyst coating solution G was obtained in the same manner as the photocatalyst coating solution F, except that the silicon compound-containing solution ⁇ was used and the concentrations of titanium oxide and silicon compound were 0.7% by mass.
- ⁇ Preparation of photocatalyst coating liquid H> (for comparative example)
- the silicon compound-containing liquid ⁇ was mixed with the titanium oxide particle dispersion A (average particle size 12 nm) so that the titanium oxide / silicon compound was 1: 1 (mass ratio).
- a mixed solvent of water / isopropyl alcohol (weight ratio 6/4) is added as a dispersion medium so that the concentration of titanium oxide and silicon compound is 0.5% by mass in the mixed solution, and titanium oxide containing a silicon compound.
- a dispersion of particles was prepared.
- the photocatalyst coating liquid H was obtained by adding and mixing 0.02% by mass of an acetylene-based surfactant (Olfin EXP4200 HLB 10-13 manufactured by Nissin Chemical Co., Ltd.) with respect to the dispersion.
- an acetylene-based surfactant Oletylene-based surfactant (Olfin EXP4200 HLB 10-13 manufactured by Nissin Chemical Co., Ltd.) with respect to the dispersion.
- Titanium oxide particle dispersion A (average particle diameter 12 nm) and alloy particle dispersion C were mixed so that the mass ratio of particles in each dispersion (titanium oxide particles / alloy particles) was 1,000.
- a mixed solvent of water / isopropyl alcohol (weight ratio 6/4) is added as a dispersion medium so that the concentration of titanium oxide is 0.5% by mass to the mixed solution to obtain a dispersion of titanium oxide particles and alloy particles.
- the average particle diameter D 50 of the two types of particle mixture of titanium oxide particles and alloy particles in this dispersion was 18 nm.
- a photocatalyst coating liquid I was obtained by adding and mixing 0.02% by mass of an acetylene-based surfactant (Orphine EXP4200 HLB 10 to 13 manufactured by Nissin Chemical Co., Ltd.) with respect to the dispersion.
- an acetylene-based surfactant Orphine EXP4200 HLB 10 to 13 manufactured by Nissin Chemical Co., Ltd.
- Titanium oxide particle dispersion A (average particle size 12 nm) and alloy particle dispersion C are mixed so that the mass ratio of particles in each dispersion (titanium oxide particles / alloy particles) is 1,000.
- the silicon compound-containing liquid was mixed so that the titanium oxide: silicon compound was 1: 1 (mass ratio).
- a mixed solvent of water / isopropyl alcohol (weight ratio 6/4) is added as a dispersion medium so that the concentration of titanium oxide and silicon compound is 0.5% by mass to the mixed solution, and titanium oxide particles and alloy particles are added.
- a photocatalyst coating liquid J was obtained.
- Example 1 The photocatalyst coating liquid E was applied to a PET film (T60 50 ⁇ m, manufactured by TORAY, Inc.) as a base film with a wire bar, and water and isopropyl alcohol were dried and removed in a dryer at 90 ° C. for 10 minutes to obtain a thickness of 50 nm. A photocatalyst transfer film having a photocatalyst layer was prepared. Next, in order to evaluate transferability, a photocatalyst transfer film is used as a transfer group on a PET film (A4300, manufactured by Toyobo Co., Ltd.) as a transfer substrate using a laminate roll under conditions of 160 ° C. and 1 m / min.
- a PET film A4300, manufactured by Toyobo Co., Ltd.
- the PET film that is the base film of the photocatalyst transfer film was peeled off to produce a transfer substrate PET film (Sample E-1) onto which the photocatalyst layer was transferred.
- a transfer substrate PET film (Sample E-1) onto which the photocatalyst layer was transferred.
- Each evaluation was performed on sample E-1 to which the photocatalyst layer was transferred, and the results are shown in Table 1.
- Example 2 A sample E-2 was prepared in the same manner as in Example 1 except that the base film and the transfer substrate were PET films (S10, manufactured by TORAY), and each evaluation was performed.
- the base film and the transfer substrate were PET films (S10, manufactured by TORAY), and each evaluation was performed.
- Sample E-3 was prepared in the same manner as in Example 1 except that the transfer substrate was a melamine resin plate, and each evaluation was performed.
- Sample E-4 was prepared and evaluated in the same manner as in Example 1 except that the base film was an OPP film (Treffan 60 ⁇ m manufactured by TORAY) and the laminating temperature during transfer processing was 140 ° C.
- the base film was an OPP film (Treffan 60 ⁇ m manufactured by TORAY) and the laminating temperature during transfer processing was 140 ° C.
- Example 5 A photocatalyst transfer film and a sample F-1 after transfer were prepared and evaluated in the same manner as in Example 1 except that the photocatalyst coating liquid F was used as the coating liquid.
- Example 6 A photocatalyst transfer film in which a photocatalyst layer having a thickness of 90 nm was laminated was produced in the same manner as in Example 5 except that the photocatalyst coating liquid G was used as the coating liquid and the OPP film (Treffan 60 ⁇ m manufactured by TORAY) was used as the base film. Further, a sample G-1 after transfer was prepared in the same manner as in Example 5, and each evaluation was performed.
- Example 7 On the photocatalyst layer of the photocatalyst transfer film produced in the same manner as in Example 5 except that an OPP film (Trayfan 60 ⁇ m manufactured by TORAY) was used as the base film, a silicon compound-containing liquid ⁇ was further coated with a wire bar. Water was removed by drying in a dryer at 90 ° C. for 10 minutes to prepare a photocatalyst transfer film in which a protective layer of a silicon compound having a thickness of 50 nm was laminated on the photocatalyst layer. Sample F-2 was prepared and evaluated.
- OPP film Trayfan 60 ⁇ m manufactured by TORAY
- Example 1 A photocatalyst transfer film and a sample H-1 after transfer were prepared in the same manner as in Example 1 except that the coating liquid was a photocatalyst coating liquid H containing no antibacterial metal-containing alloy particles. went.
- Example 2 A photocatalyst transfer film and a sample I-1 after transfer were prepared in the same manner as in Example 1 except that the coating solution was a photocatalyst coating solution I containing no silicon compound. Each appearance could not be evaluated because the appearance was extremely poor.
- Comparative Example 1 the photocatalyst alone was found to have insufficient antibacterial performance in the dark. Further, when the photocatalyst layer does not contain a silicon compound from Comparative Example 2, the film becomes unstable and the appearance after transfer is remarkably deteriorated, and when Comparative Example 3 is used a coating solution containing no surfactant is uniform. It was found that film formation becomes difficult.
- a photocatalyst transfer film having a photocatalyst layer produced from a photocatalyst containing titanium oxide particles, alloy particles containing antibacterial metal, a coating solution containing a silicon compound and a surfactant was found to be capable of transferring a photocatalyst layer exhibiting good transfer processability to various transfer substrates, high transparency and excellent design after transfer, and antibacterial properties in the dark.
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Abstract
Description
また、光触媒の原料に銀、銅、亜鉛などの金属やその化合物を添加した後に熱処理を行い、抗菌・抗カビ性金属を含有した光触媒粒子を得る方法では、光触媒粒子の結晶性が低下するために、得られる光触媒機能が低下し、また、抗菌・抗カビ性金属の一部は酸化チタンに覆われて表面に出てこなくなるため、得られる抗菌・抗カビ性も低下するという問題があった。
一方、あらかじめ光触媒層を形成させた転写シート又は転写フィルムを用いた転写方法は生産性に優れ、また、基材表面への追随性が高く均一な膜の形成が可能になることが知られている。
特開2001-260597号公報(特許文献3)には、ベースフィルムの上に光触媒層と無機保護層と有機系接着剤層が積層一体化されてなる転写フィルムが開示されている。また、国際公開第01-025362号(特許文献4)には、フィルム状又はシート状基材表面に光触媒層、接着層が積層されてなる転写フィルム又はシートが開示されている。
しかし、転写性を良くするために、これらの転写シート又は転写フィルムは3層以上の積層が必要であり、転写シート又はフィルムの生産性に劣る問題があった。
なお、本明細書において、「抗菌性」とは、細菌、真菌(カビ)を含む微生物の増殖抑制をいう場合がある。
〔1〕
ベースフィルム上に、酸化チタン粒子を含む光触媒、抗菌性金属を含有する合金粒子、ケイ素化合物及び界面活性剤を含有する光触媒層を有する、光触媒転写フィルム。
〔2〕
ケイ素化合物が4官能性ケイ素化合物の有機アンモニウム塩による加水分解縮合物である〔1〕に記載の光触媒転写フィルム。
〔3〕
界面活性剤がアセチレン系界面活性剤であることを特徴とする〔1〕又は〔2〕に記載の光触媒転写フィルム。
〔4〕
抗菌性金属を含有する合金粒子に含有される抗菌性金属が、銀、銅及び亜鉛からなる群から選ばれる少なくとも1種類の金属である〔1〕~〔3〕のいずれかに記載の光触媒転写フィルム。
〔5〕
抗菌性金属を含有する合金粒子が、少なくとも銀を含有する合金粒子である〔1〕~〔4〕のいずれかに記載の光触媒転写フィルム。
〔6〕
抗菌性金属を含有する合金粒子に含有される抗菌性金属が、合金粒子の全質量に対して1~100質量%である〔1〕~〔5〕のいずれかに記載の光触媒転写フィルム。
〔7〕
酸化チタン粒子と、抗菌性金属を含有する合金粒子との2種類の粒子混合物の分散粒子径が、レーザー光を用いた動的散乱法により測定される体積基準の50%累積分布径(D50)で、5~100nmである〔1〕~〔6〕のいずれかに記載の光触媒転写フィルム。
〔8〕
光触媒層の厚みが20~300nmである〔1〕~〔7〕のいずれかに記載の光触媒転写フィルム。
〔9〕
ベースフィルムの厚みが12.5~100μmである〔1〕~〔8〕のいずれかに記載の光触媒転写フィルム。
〔10〕
光触媒層の上にさらにケイ素化合物を含有する保護層が積層された〔1〕~〔9〕のいずれかに記載の光触媒転写フィルム。
〔11〕
酸化チタン粒子を含む光触媒、抗菌性金属を含有する合金粒子、ケイ素化合物、界面活性剤及び水性分散媒を含む光触媒塗工液を、ベースフィルム上に塗布し、乾燥することを特徴とする光触媒転写フィルムの製造方法。
<ベースフィルム>
本発明の光触媒転写フィルムに使用されるベースフィルムは転写用のベースフィルムとして公知のものを使用でき、例えばポリエチレンテレフタレート(PET)フィルム、ポリエチレンナフタレート(PEN)フィルム、ポリエチレン(PE)フィルム、ポリイミドフィルム、アクリルフィルム、塩ビフィルム、無延伸ポリプロピレン(CPP)フィルム、二軸延伸ポリプロピレン(OPP)フィルム、ポリアミドフィルム等のプラスチックフィルムを挙げることができるが、特にPETフィルム及びOPPフィルムが好ましい。
転写加工後の外観及び光触媒効果の観点からベースフィルムは表面処理がなされていないプラスチックフィルムが特に好ましい。
また、ベースフィルムは3Dレーザー顕微鏡で測定した算術平均粗さRa値が0.01μm~3μmであるものが好ましく、0.01μm~1μmであるものがさらに好ましい。ベースフィルムのRaの値が0.01μm未満であると均一な膜を作ることが困難になり、3μmを超えると転写後の光触媒効果が低下しやすくなり、外観も低下するため好ましくない。
本発明の光触媒転写フィルムが有する光触媒層は酸化チタン粒子を含む光触媒、抗菌性金属を含有する合金粒子、ケイ素化合物及び界面活性剤を含有する。このような光触媒層は、酸化チタン粒子を含む光触媒、抗菌性金属を含有する合金粒子、ケイ素化合物、界面活性剤及び水性分散媒を含有する光触媒塗工液を塗布することにより形成することができる。
光触媒は加工後の意匠性を考慮すると透明性に優れた光触媒を使用することが好ましい。
本明細書において、光触媒とは、所定のバンドギャップ以上のエネルギーを持つ光を照射することにより、光触媒作用を示す物質の総称を指す。このような物質として、酸化チタン、酸化タングステン、酸化亜鉛、酸化スズ、酸化鉄、酸化ビスマス、バナジン酸ビスマス、チタン酸ストロンチウムなどの公知の金属酸化物半導体が挙げられる。本発明の光触媒転写フィルムに用いられる光触媒として、これらの物質の粒子を1種又は2種類以上を組み合わせて使用することができる。中でも、波長400nm以下(好ましくは280~380nm)の紫外光を含む光線の照射下で、特に高い光触媒作用を有し、化学的に安定で、ナノサイズ粒子の合成やそのナノサイズ粒子の溶媒への分散が比較的容易である酸化チタン粒子を使用することが好ましい。
酸化チタン粒子分散液の濃度(質量%)=〔不揮発分質量(g)/加熱前の酸化チタン粒子分散液質量(g)〕×100
本発明において、合金粒子は、抗菌性金属を少なくとも1種含んだ、2種以上の金属成分からなるものである。
「抗菌性金属」とは、細菌や真菌(カビ)などの微生物には有害であるが、人体には比較的害の少ない金属のことを指し、例えば、フィルムに金属成分粒子をコーティングし、JIS Z 2801 抗菌加工製品の規格試験を行った場合、黄色ブドウ球菌や大腸菌の生菌数の減少が確認される、銀、銅、亜鉛、白金、パラジウム、ニッケル、アルミニウム、チタン、コバルト、ジルコニウム、モリブデン、タングステンなどが挙げられる(下記参考文献1、2)。
本発明の光触媒転写フィルムに用いられる合金粒子は、これらのうち少なくとも1種の金属を含む合金であることが好ましく、特に、銀、銅、亜鉛のうち少なくとも1種の金属を含む合金であることが好ましい。
参考文献2:H.Kawakami、ISIJ Intern.,48(2008)9, 1299-1304
本発明の光触媒転写フィルムの光触媒層に含まれるケイ素化合物は光触媒層中にバインダーとして使われる。
ここで、ケイ素化合物系バインダーとは、固体状又は液体状のケイ素化合物を水性分散媒中に含んでなるケイ素化合物の、コロイド分散液、溶液又はエマルジョンである。ケイ素化合物系バインダーとしては、具体的には、コロイダルシリカ(好ましくは平均粒子径1~150nm);ケイ酸塩類溶液;シラン、シロキサン加水分解物エマルジョン;シリコーン樹脂エマルジョン;シリコーン-アクリル樹脂共重合体、シリコーン-ウレタン樹脂共重合体等のシリコーン樹脂と他の樹脂との共重合体のエマルジョン等を挙げることができる。特に、4官能性ケイ素化合物を塩基性化合物の下、加水分解縮合されたケイ酸塩類溶液を使用することが好ましい。4官能性ケイ素化合物としては、非晶質シリカ、四塩化ケイ素、テトラエトキシシラン、テトラメトキシラン等が挙げられる。また、塩基性化合物が有機アンモニウム塩であることが好ましく、具体的にはテトラメチルアンモニウムヒドロキシド、トリエチルアンモニウムヒドロキシド、テトラブチルアンモニウムヒドロキシド、エチルトリメチルアンモニウムヒドロキシド等が好ましい。
4官能性ケイ素化合物の加水分解縮合としては、反応系(原料混合液)に対し好ましくは1~20質量%、より好ましくは1~15質量%の上記4官能性ケイ素化合物を原料として、水性媒体中で塩基性化合物の存在下、常温~170℃にて行われる。塩基性化合物の添加量は前記4官能性ケイ素化合物に対して好ましくは100モル%以上、より好ましくは100~500モル%である。
4官能性ケイ素化合物がシリカである場合、SiO2濃度が1~15質量%、塩基性化合物濃度が2~25質量%、残分が水である原料混合液を作製し、これを80℃~130℃にて加熱攪拌することが好適である。
本発明の光触媒転写フィルムの光触媒層中に含有する界面活性剤としては、例えば、脂肪酸ナトリウム塩、アルキルベンゼンスルホン酸塩、高級アルコール硫酸エステル塩、ポリオキシエチレンアルキルエーテル硫酸塩などの陰イオン界面活性剤;アルキルトリメチルアンモニウム塩、ジアルキルジメチルアンモニウム塩、アルキルジメチルベンジルアンモニウム塩、第四級アンモニウム塩などの陽イオン界面活性剤;アルキルアミノ脂肪酸塩、アルキルベタイン、アルキルアミンオキシドなどの両性界面活性剤;ポリオキシエチレンアルキルエーテル、ポリオキシエチレンアルキルフェノールエーテル、アルキルグルコシド、ポリオキシエチレン脂肪酸エステル、ショ糖脂肪酸エステル、ソルビタン脂肪酸エステル、ポリオキシエチレンソルビタン脂肪酸エステル、脂肪酸アルカノールアミド、アセチレン系界面活性剤などの非イオン界面活性剤などを挙げることができる。中でも塗工液の安定性の観点から非イオン界面活性剤が好ましい。
また、界面活性剤のHLBが7~18であるものが好ましく、更に10~15であるものが好ましい。このうち、分散性の観点からアセチレン系界面活性剤が好ましく、以下の一般式で表されるものがより好ましい。
R1-C≡C-R2
R1及びR2は、互いに独立に、一価の有機基であり、好ましくは水素原子の一部がOH基で置換された炭素数1~20の炭化水素基である。また、R1及びR2は、炭素数1~20の炭化水素基中の一部がエーテル結合を有する基であってもよい。アセチレン系界面活性剤としてはオルフィンEXP4001、EXP4200、EXP4123、EXP4300(日信化学工業株式会社製)等が挙げられる。
本発明の光触媒転写フィルムの光触媒層を形成する光触媒塗工液は、上述した酸化チタン粒子分散液と合金粒子分散液との2種類の粒子分散液を混合し、これにケイ素化合物及び界面活性剤を添加することで調製することができる。
本発明の酸化チタン・合金粒子分散液は、上述の通り、別々に構成された、酸化チタン粒子分散液と抗菌・抗カビ性金属を含有する合金粒子分散液との2種類の粒子分散液を混合することによって得られるものである。
(1)原料チタン化合物、塩基性物質、過酸化水素及び水性分散媒から、ペルオキソチタン酸溶液を製造する工程
(2)上記(1)の工程で製造したペルオキソチタン酸溶液を、圧力制御下、80~250℃で加熱し、酸化チタン粒子分散液を得る工程
(3)原料抗菌性金属化合物を含む溶液と、該金属化合物を還元するための還元剤を含む溶液とを製造する工程
(4)上記(3)の工程で製造した原料抗菌性金属化合物を含む溶液と、該金属化合物を還元するための還元剤を含む溶液とを混合して合金粒子分散液を製造する工程
(5)上記(4)の工程で製造した合金粒子分散液を膜ろ過法により水性分散媒で洗浄する工程
(6)(2)と(5)で得られた酸化チタン粒子分散液と合金粒子分散液とを混合する工程
工程(3)~(5)は、合金粒子分散液の製造工程である。該製造工程は、物理的方法や化学的方法がある中、特に、合成条件の調整が容易で、組成、粒径・粒度分布などの制御可能範囲が広く、合金粒子の生産性の観点から、優位性がある化学的方法の一つである液相還元法を利用するものである。該液相還元法では、合金の原料になる2種類以上の金属イオンを含んだ溶液に還元剤を混合することで、合金粒子を析出させる。このとき、反応系内に合金粒子の保護剤を共存させることで、合金粒子の溶媒への分散性を更に向上させることもできる。
工程(6)は、工程(2)で得られた酸化チタン粒子分散液と、工程(5)で得られた合金粒子分散液とを混合して、最終的に消臭性・抗菌性を有する酸化チタン・合金粒子混合分散液の製造工程である。
以下、各工程についての詳細を述べる。
工程(1)では、原料チタン化合物、塩基性物質及び過酸化水素を水性分散媒中で反応させることにより、ペルオキソチタン酸溶液を製造する。
工程(2)では、上記工程(1)で得られたペルオキソチタン酸溶液を、圧力制御下、80~250℃、好ましくは100~250℃の温度において0.01~24時間水熱反応に供する。反応温度は、反応効率と反応の制御性の観点から80~250℃が適切であり、その結果、ペルオキソチタン酸は酸化チタン粒子に変換される。なお、ここで「圧力制御下」とは、反応温度が分散媒の沸点を超える場合には、反応温度が維持できるように、適宜加圧を行い、反応温度を維持することをいい、分散媒の沸点以下の温度とする場合に大気圧で制御する場合を含む。ここで、圧力は、通常0.12~4.5MPa程度、好ましくは0.15~4.5MPa程度、より好ましくは0.20~4.5MPaである。反応時間は、1分~24時間であることが好ましい。この工程(2)により、酸化チタン粒子分散液が得られる。
工程(3)では、原料抗菌性金属化合物を水性分散媒中に溶解させた溶液と、該原料抗菌性金属化合物を還元するための還元剤を水性分散媒中に溶解させた溶液とを製造する。
工程(4)では、工程(3)で調製した、原料抗菌性金属化合物を水性分散媒中に溶解させた溶液と、該原料抗菌性金属化合物を還元するための還元剤を水性分散媒中に溶解させた溶液とを混合し、合金粒子分散液を製造する。
工程(5)では、工程(4)で製造した合金粒子分散液を膜ろ過法により水性分散媒で洗浄する。
合金粒子分散液中の合金粒子と不揮発性の不純物との質量比(合金粒子/不揮発性不純物)が0.01~10となるまで洗浄することが好ましく、より好ましくは0.05~5、更に好ましくは0.1~1である。質量比が0.01未満の場合は、合金粒子に対する不純物量が多く、得られる抗菌・抗カビ性や消臭性能が十分に発揮されないことがあり、10超過の場合は、合金粒子の分散安定性が低下することがあるため好ましくない。
合金粒子分散液中の金属成分濃度は、合金粒子分散液を純水で適宜希釈し、誘導結合プラズマ発光分光分析装置(商品名“Agilent 5110 ICP-OES”、アジレント・テクノロジー(株))に導入して測定することができる。
ここで、合金粒子分散液の金属成分以外の不揮発性不純物濃度は、合金粒子分散液の一部をサンプリングし、105℃で3時間加熱して溶媒を揮発させた後の不揮発分(合金粒子+不揮発性不純物)の質量と、サンプリングした加熱前の合金粒子分散液の質量とから算出した不揮発分濃度から、上記ICP-OESで定量した金属成分濃度を引くことで算出することができる。
不揮発性不純物濃度(%)=〔不揮発分質量(g)/加熱前の合金粒子分散液質量(g)〕×100-合金粒子分散液中の金属成分濃度(%)
工程(6)では、工程(2)で得られた酸化チタン粒子分散液と、工程(5)で得られた合金粒子分散液とを混合し、消臭性・抗菌性を有する酸化チタン・合金粒子混合分散液を得る。
水性分散媒としては、水、水と混合可能な水溶性有機溶媒、水と水溶性有機溶媒とを任意の割合で混合した混合溶媒を用いることが好ましい。水としては、例えば、脱イオン水、蒸留水、純水等が好ましい。また、水溶性有機溶媒としては、例えば、メタノール、エタノール、イソプロパノール等のアルコール類;エチレングリコール等のグリコール類;エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、プロピレングリコール-n-プロピルエーテル等のグリコールエーテル類が好ましい。分散性が安定しやすいことからアルコール類が特に好ましい。混合溶媒中の水溶性有機溶媒/水の重量の割合は1/10より大きく、15/10以下であることが好ましく、より好ましくは2/10より大きく12/10以下である。
本発明の光触媒転写フィルムは、光触媒層の上にさらにケイ素化合物から形成される保護層を有していてもよい。保護層に使用されるケイ素化合物としては、光触媒層にバインダーとして配合されるケイ素化合物と同様のものが挙げられ、具体的には、コロイダルシリカ(好ましくは平均粒子径1~150nm);ケイ酸塩類溶液;シラン、シロキサン加水分解物エマルジョン;シリコーン樹脂エマルジョン;シリコーン-アクリル樹脂共重合体、シリコーン-ウレタン樹脂共重合体等のシリコーン樹脂と他の樹脂との共重合体のエマルジョン等を挙げることができる。特に、4官能性ケイ素化合物を塩基性化合物の下、加水分解縮合されたケイ酸塩類溶液を使用することが好ましい。4官能性ケイ素化合物としては、非晶質シリカ、4塩化ケイ素、テトラエトキシシラン、テトラメトキシラン等が挙げられる。また、塩基性化合物は有機アンモニウム塩であることが好ましく、具体的にはテトラメチルアンモニウムヒドロキシド、トリエチルアンモニウムヒドロキシド、テトラブチルアンモニウムヒドロキシド、エチルトリメチルアンモニウムヒドロキシド等が好ましい。
本発明において、光触媒転写フィルムの製造方法としては、上記光触媒塗工液をベースフィルム上に塗工し、光触媒層の膜を形成してなる。
ベースフィルムへの光触媒塗工液のコーティングは、既知の技術的に確立している方法であればよく、具体的にはスプレーコーティング法、ワイヤーバー法、ダイコーティング法、グラビアコーティング法、マイクログラビアコーティング法、インクジェット法、スピンコーティング法、ディップコーティング法等を利用して光触媒塗工液の膜を形成し、塗膜を70℃~150℃、好ましくは80℃~130℃の温度で乾燥し、平滑な光触媒転写フィルムが得られる。
<光触媒を表面に有する基材>
本発明の光触媒転写フィルムは、各種基材の表面に光触媒膜を形成させるために使用することができる。ここで、各種基材は、特に制限されないが、基材の材料としては、例えば、有機材料、無機材料が挙げられる。これらは、それぞれの目的、用途に応じた様々な形状を有することができる。
有機材料としては、例えば、塩化ビニル樹脂(PVC)、ポリエチレン(PE)、ポリプロピレン(PP)、ポリカーボネート(PC)、アクリル樹脂、ポリアセタール、フッ素樹脂、シリコーン樹脂、エチレン-酢酸ビニル共重合体(EVA)、アクリロニトリル-ブタジエンゴム(NBR)、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)、ポリビニルブチラール(PVB)、エチレン-ビニルアルコール共重合体(EVOH)、ポリイミド樹脂、ポリフェニレンサルファイド(PPS)、ポリエーテルイミド(PEI)、ポリエーテルエーテルイミド(PEEI)、ポリエーテルエーテルケトン(PEEK)、メラミン樹脂、フェノール樹脂、アクリロニトリル-ブタジエン-スチレン(ABS)樹脂等の合成樹脂材料;天然ゴム等の天然材料;及び上記合成樹脂材料と天然材料との半合成材料が挙げられる。これらは、フィルム、シート、その他の成型品、積層体等の所要の形状、構成に加工されていてもよい。
無機材料としては、例えば、非金属無機材料、金属無機材料が包含される。
非金属無機材料としては、例えば、ガラス、セラミック、石材等が挙げられる。これらは、タイル、硝子、ミラー、壁、意匠材等の様々な形に加工されていてもよい。
金属無機材料としては、例えば、鋳鉄、鋼材、鉄、鉄合金、アルミニウム、アルミニウム合金、ニッケル、ニッケル合金、亜鉛ダイキャスト等が挙げられる。これらは、上記金属無機材料のメッキが施されていてもよいし、上記有機材料が塗布されていてもよいし、上記有機材料又は非金属無機材料の表面に施すメッキであってもよい。
また、基材表面にシリコーン系、アミン系等のプライマー層が積層されてもよく、プライマー層により、転写加工が容易になる。
本発明の光触媒転写フィルムを上述した各種基材に公知の方法により転写加工することができるが、均一に光触媒層の転写ができることからラミネート法、プレス法が好ましい。加工温度は転写基材側の特性にもよるが、110℃~170℃で、特に120℃~160℃で、5分から2時間程度の成膜加工が好ましい。加工温度が110℃未満だと、転写基材側に光触媒層が転写されなくなる場合があり、170℃を超えると光触媒転写フィルムのベースフィルムが転写基材側に転写し、光触媒層表面を覆うために光触媒特性が得られなくなる場合がある。
その際は、保護フィルムとして任意のフィルムを使用できるが、前記したプラスチックフィルムを保護フィルムとして用いることが可能である。
このような保護フィルムが形成された積層体は、ロールにより巻き取り成形された搬送等が容易になる。
光触媒層の転写基材側への転写を確認するために、以下の実施例及び比較例で得られた各サンプルを5cm角にカットしてエネルギー分散型蛍光X線分析装置(XRF、株式会社島津製作所製 EDX-7000)を使用して、転写基材上のTi元素及びSi元素についてそれぞれ蛍光X線分析を行った。各元素が検出された場合を「〇」、検出されなかった場合を「-」と評価して、その結果を表1に示した。
光触媒の効果を確認するために、以下の実施例及び比較例で得られた各サンプルに対して紫外線を照射後、接触角計(協和界面科学株式会社 DM-501)を使用し、各サンプルの水接触角の測定を行い、結果を表1に示した。
以下の実施例及び比較例で得られた各サンプルの外観を目視により確認し、不均一転写による白濁が確認された場合を「×」、透明性が維持されているものについて「〇」として、結果を表1に示した。
光触媒転写フィルムのベースフィル表面の算術平均粗さRaを、3Dレーザー顕微鏡(NIKON社製 OLS-4000)を使用して測定し、n=3の平均値を表1に示した。
以下の実施例及び比較例で得られた各サンプルについて、日本工業規格JIS R 1702:2012「ファインセラミックス-光触媒抗菌加工製品の抗菌性試験方法・抗菌効果」のハイブリッド光触媒加工平板状製品の試験方法に準拠した方法で試験し、抗菌活性値を算出し、次の基準で評価した。
・非常に良好(Aと表示)・・・抗菌活性値が4.0以上の場合
・良好(Bと表示)・・・抗菌活性値が2.0以上の場合
・不良(Cと表示)・・・抗菌活性値2.0未満がある場合
酸化チタン粒子分散液、合金粒子分散液及び酸化チタン粒子と合金粒子との2種類の粒子混合物の平均粒子径D50は、ELSZ-2000ZS(大塚電子(株)製)を使用して、レーザー光を用いた動的光散乱法により測定される体積基準の50%累積分布径として算出した。
非晶質シリカ、水及びエチルトリメチルアンモニウムヒドロキシド(20質量%水溶液、セイケムジャパン合同会社)を、シリカ:エチルトリメチルアンモニウムヒドロキシド=1:2(モル比)、反応開始時の系においてシリカの含有量が5質量%となるように混合し、110℃にて2時間加熱撹拌した。得られた溶液を、固形分濃度が0.5質量%になるように水で希釈した後、イオン交換樹脂(商品名:ダウエックス50W-X8、ダウコーニング社製)にてpH7.0に調整し、ケイ素化合物含有液αを得た。
ケイ素化合物含有液αの調製において、固形分濃度が1.0質量%になるように調整した以外は同様にしてケイ素化合物含有液βを得た。
36質量%の塩化チタン(IV)水溶液を純水で10倍に希釈した後、10質量%のアンモニア水を徐々に添加して中和、加水分解することにより、水酸化チタンの沈殿物を得た。このときの溶液はpH9であった。得られた沈殿物を、純水の添加とデカンテーションとを繰り返して脱イオン処理した。この脱イオン処理後の、水酸化チタン沈殿物にH2O2/Ti(モル比)が5となるように35質量%過酸化水素水を添加し、その後室温で一昼夜撹拌して十分に反応させ、黄色透明のペルオキソチタン酸溶液(a)を得た。
36質量%の塩化チタン(IV)水溶液に塩化スズ(IV)をTi/Sn(モル比)が20となるように添加・溶解したこと以外は酸化チタン粒子分散液Aの調製と同様にして、スズをドープした黄色透明のペルオキソチタン酸溶液(b)を得た。
酸化チタン粒子分散液Aの酸化チタンの結晶相はアナターゼ型であった。酸化チタン粒子分散液Bの酸化チタンの結晶相はルチル型であった。
エチレングリコールを溶媒とし、Agとしての濃度が2.50mmol/Lとなるように硝酸銀、Cuとしての濃度が2.50mmol/Lとなるように硝酸銅三水和物を溶解して原料金属化合物を含む溶液(i)を得た。
原料金属化合物を含む溶液(i)の代わりに、エチレングリコールを溶媒とし、Agとしての濃度が4.00mmol/Lとなるように硝酸銀、Pdとしての濃度が1.00mmol/Lとなるように硝酸パラジウム二水和物を溶解した原料金属化合物を含む溶液(iii)を使用したこと以外は合金粒子分散液Cの調製と同様にして、純水を分散媒とする0.1質量%の合金粒子分散液D(平均粒子径D50 53nm、合金粒子中の抗菌性金属の割合100質量%)を得た。
酸化チタン粒子分散液A(平均粒子径 12nm)と合金粒子分散液Cを各分散液中の粒子の質量比(酸化チタン粒子/合金粒子)が1,000となるように混合し、該混合液にさらにケイ素化合物含有液αを酸化チタン:ケイ素化合物が1:1(質量比)になるように混合した。さらに該混合液に酸化チタン及びケイ素化合物の濃度が0.5質量%となるように、水/イソプロピルアルコール(重量比6/4)の混合溶媒を分散媒として添加して、ケイ素化合物を含む酸化チタン粒子及び合金粒子の分散液を調製した。この分散液中の酸化チタン粒子と合金粒子との2種類の粒子混合物の平均粒子径D50は18nmであった。
該分散液に対しアセチレン系界面活性剤(日信化学社製オルフィンEXP4200 HLB 10~13)を液重量比で0.02質量%添加・混合して光触媒塗工液Eを得た。
酸化チタン粒子分散液B(平均粒子径 10nm)と合金粒子分散液Dを各分散液中の粒子の質量比(酸化チタン粒子/合金粒子)が1,000となるように混合し、該混合液にケイ素化合物含有液αを酸化チタン:ケイ素化合物が1:1(質量比)になるように混合した。さらに該混合液に酸化チタン及びケイ素化合物の濃度が0.4質量%となるように、水/イソプロピルアルコール(重量比5/5)の混合溶媒を分散媒として添加して、ケイ素化合物を含む酸化チタン粒子及び合金粒子の分散液を調製した。この分散液中の酸化チタン粒子と合金粒子との2種類の粒子混合物の平均粒子径D50は16nmであった。
該分散液に対しアセチレン系界面活性剤(日信化学社製オルフィンEXP4200 HLB 10~13)を液重量比で0.03質量%添加・混合して光触媒塗工液Fを得た。
ケイ素化合物含有液βを用い、酸化チタン及びケイ素化合物の濃度を0.7質量%としたこと以外は光触媒塗工液Fと同様にして光触媒塗工液Gを得た。
酸化チタン粒子分散液A(平均粒子径 12nm)にケイ素化合物含有液αを、酸化チタン/ケイ素化合物が1:1(質量比)になるように混合した。さらに該混合液に酸化チタン及びケイ素化合物の濃度が0.5質量%となるように、水/イソプロピルアルコール(重量比6/4)の混合溶媒を分散媒として添加してケイ素化合物を含む酸化チタン粒子の分散液を調製した。
該分散液に対しアセチレン系界面活性剤(日信化学社製オルフィンEXP4200 HLB 10~13)を液重量比で0.02質量%添加・混合して光触媒塗工液Hを得た。
酸化チタン粒子分散液A(平均粒子径 12nm)と合金粒子分散液Cを各分散液中の粒子の質量比(酸化チタン粒子/合金粒子)が1,000となるように混合した。
該混合液に酸化チタンの濃度が0.5質量%となるように、水/イソプロピルアルコール(重量比6/4)の混合溶媒を分散媒として添加して酸化チタン粒子及び合金粒子の分散液を調製した。この分散液中の酸化チタン粒子と合金粒子の2種類の粒子混合物の平均粒子径D50は18nmであった。
該分散液に対しアセチレン系界面活性剤(日信化学社製オルフィンEXP4200 HLB 10~13)を液重量比で0.02質量%添加・混合して光触媒塗工液Iを得た。
酸化チタン粒子分散液A(平均粒子径 12nm)と合金粒子分散液Cを各分散液中の粒子の質量比(酸化チタン粒子/合金粒子)が1,000となるように混合し、該混合液にさらにケイ素化合物含有液を酸化チタン:ケイ素化合物が1:1(質量比)になるように混合した。さらに該混合液に酸化チタン及びケイ素化合物の濃度が0.5質量%となるように水/イソプロピルアルコール(重量比6/4)の混合溶媒を分散媒として添加して、酸化チタン粒子及び合金粒子の分散液として光触媒塗工液Jを得た。
光触媒塗工液EをベースフィルムとしてのPETフィルム(TORAY社製 T60 50μm)にワイヤーバーで塗工し、90℃、10分間乾燥機の中で水とイソプロピルアルコールを乾燥除去して、厚み50nmの光触媒層を有する光触媒転写フィルムを作製した。
次に、転写性を評価するために、160℃、1m/minの条件でラミネートロールを使用して、転写基材としてのPETフィルム(東洋紡社製 A4300)に光触媒転写フィルムを光触媒層が転写基材のPETフィルムと接するように積層した。光触媒転写フィルムのベースフィルムであるPETフィルムを剥がして光触媒層が転写された転写基材PETフィルム(サンプルE-1)を作製した。光触媒層が転写されたサンプルE-1について各評価を行い、その結果を表1に示した。
ベースフィルム及び転写基材をPETフィルム(TORAY社製 S10)とした以外は実施例1と同様にサンプルE-2を作製し、各評価を行った。
転写基材をメラミン樹脂板とした以外は実施例1と同様にサンプルE-3を作製し、各評価を行った。
ベースフィルムをOPPフィルム(TORAY社製 トレファン 60μm)とし、転写加工時のラミネート温度を140℃とした以外は実施例1と同様にしてサンプルE-4を作製し、各評価を行った。
塗工液を光触媒塗工液Fとした以外は実施例1と同様にして光触媒転写フィルム及び転写後のサンプルF-1を作製し、各評価を行った。
塗工液を光触媒塗工液G、ベースフィルムをOPPフィルム(TORAY社製 トレファン 60μm)とした以外は実施例5と同様にして厚み90nmの光触媒層が積層された光触媒転写フィルムを作製した。さらに実施例5と同様にして転写後のサンプルG-1を作製し、各評価を行った。
ベースフィルムとしてOPPフィルム(TORAY社製 トレファン 60μm)を使用した以外は実施例5と同様に作製した光触媒転写フィルムの光触媒層の上に、さらにケイ素化合物含有液αをワイヤーバーで塗工し、90℃、10分間乾燥機の中で水を乾燥除去させて、光触媒層上に厚さ50nmのケイ素化合物の保護層が積層された光触媒転写フィルムを作製し、実施例5と同様に転写後のサンプルF-2を作製し、各評価を行った。
塗工液を、抗菌性金属を含有する合金粒子を含まない光触媒塗工液Hとした以外は実施例1と同様にして光触媒転写フィルム及び転写後のサンプルH-1を作製し、各評価を行った。
塗工液を、ケイ素化合物を含まない光触媒塗工液Iとした以外は実施例1と同様にして光触媒転写フィルム及び転写後のサンプルI-1を作製したが、転写後のサンプルの表面性及び外観が著しく不良のため、各評価を行えなかった。
塗工液を、界面活性剤を含まない光触媒塗工液Jとした以外は実施例1と同様にして光触媒転写フィルムを作製しようとしたが、乾燥時にフィルム表面に液だまりが発生し、塗工膜が白濁し、均一な膜とならなかったため、転写及び転写後の各評価を行えなかった。
Claims (11)
- ベースフィルム上に、酸化チタン粒子を含む光触媒、抗菌性金属を含有する合金粒子、ケイ素化合物及び界面活性剤を含有する光触媒層を有する、光触媒転写フィルム。
- ケイ素化合物が4官能性ケイ素化合物の有機アンモニウム塩による加水分解縮合物である請求項1に記載の光触媒転写フィルム。
- 界面活性剤がアセチレン系界面活性剤である請求項1又は2に記載の光触媒転写フィルム。
- 抗菌性金属を含有する合金粒子に含有される抗菌性金属が、銀、銅及び亜鉛からなる群から選ばれる少なくとも1種類の金属である請求項1~3のいずれか1項に記載の光触媒転写フィルム。
- 抗菌性金属を含有する合金粒子が、少なくとも銀を含有する合金粒子である請求項1~4のいずれか1項に記載の光触媒転写フィルム。
- 抗菌性金属を含有する合金粒子に含有される抗菌性金属が、合金粒子の全質量に対して1~100質量%である請求項1~5のいずれか1項に記載の光触媒転写フィルム。
- 酸化チタン粒子と、抗菌性金属を含有する合金粒子との2種類の粒子混合物の分散粒子径が、レーザー光を用いた動的散乱法により測定される体積基準の50%累積分布径D50で、5~100nmである請求項1~6のいずれか1項に記載の光触媒転写フィルム。
- 光触媒層の厚みが20~300nmである請求項1~7のいずれか1項に記載の光触媒転写フィルム。
- ベースフィルムの厚みが12.5~100μmである請求項1~8のいずれか1項に記載の光触媒転写フィルム。
- 光触媒層の上にさらにケイ素化合物を含有する保護層が積層された請求項1~9のいずれか1項に記載の光触媒転写フィルム。
- 酸化チタン粒子を含む光触媒、抗菌性金属を含有する合金粒子、ケイ素化合物、界面活性剤及び水性分散媒を含む光触媒塗工液を、ベースフィルム上に塗布し、乾燥することを特徴とする光触媒転写フィルムの製造方法。
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JP2021175696A (ja) * | 2020-05-01 | 2021-11-04 | 信越化学工業株式会社 | 酸化チタン粒子、その分散液、光触媒薄膜、光触媒薄膜を表面に有する部材及び酸化チタン粒子分散液の製造方法 |
JP7362224B2 (ja) | 2020-05-01 | 2023-10-17 | 信越化学工業株式会社 | 酸化チタン粒子、その分散液、光触媒薄膜、光触媒薄膜を表面に有する部材及び酸化チタン粒子分散液の製造方法 |
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US20210053029A1 (en) | 2021-02-25 |
KR20200143714A (ko) | 2020-12-24 |
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CN111971331A (zh) | 2020-11-20 |
US11319422B2 (en) | 2022-05-03 |
JP7014292B2 (ja) | 2022-02-01 |
TW201943555A (zh) | 2019-11-16 |
CN111971331B (zh) | 2023-02-24 |
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