WO2019100558A1 - 一种蒸镀装置 - Google Patents

一种蒸镀装置 Download PDF

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Publication number
WO2019100558A1
WO2019100558A1 PCT/CN2018/072070 CN2018072070W WO2019100558A1 WO 2019100558 A1 WO2019100558 A1 WO 2019100558A1 CN 2018072070 W CN2018072070 W CN 2018072070W WO 2019100558 A1 WO2019100558 A1 WO 2019100558A1
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WO
WIPO (PCT)
Prior art keywords
vapor deposition
heating device
crucible body
weighing
bottom heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2018/072070
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English (en)
French (fr)
Inventor
谭伟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Application filed by Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
Publication of WO2019100558A1 publication Critical patent/WO2019100558A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition

Definitions

  • the present application relates to the field of vapor deposition technology, and in particular, to an evaporation device.
  • OLED Organic Light Emitting, Organic Light Emitting Diode
  • the main method of OLED device fabrication is to heat the evaporation coating, mainly using a heating container to heat the evaporation material in a vacuum environment, so that the sublimation type or the molten type evaporation material is vaporized at a high temperature and deposited in a TFT (Thin Film Transistor, thin film transistor) on the substrate of the structure or anode structure.
  • TFT Thin Film Transistor, thin film transistor
  • the conventional vapor deposition crucible includes a crucible body 101 and an upper cover 104 covering the opening of the crucible body 101; the crucible body 101 is placed inside the heating device 102, and the bottom portion is provided with a support plate 103 for the crucible body 101.
  • the upper cover 104 is provided with an exit hole 105 for containing the vapor deposition material.
  • the vapor deposition principle is that the vapor deposition crucible is heated by the heating device 102 to evaporate or sublimate the material to be vaporized to a certain temperature, and is ejected from the exit hole 105 to form a film on the surface of the substrate to be coated.
  • the technical problem to be solved by the present application is to provide an evaporation device capable of solving the problem that the conventional vapor deposition device is difficult to replace and the weighing step is cumbersome.
  • An evaporation apparatus comprising a crucible body, further comprising a side heating device disposed around the crucible body and a bottom heating device disposed below the crucible body; the bottom heating device being capable of being along the side heating device Moving in the height direction up and down, and supporting the raft body to rise above the position of the side heating device; the bottom of the side heating device is provided with an inwardly extending bottom wall, and the bottom heating device is supported on the bottom wall The extension of the bottom heating device is spaced from the inner wall of the side heating device.
  • An evaporation apparatus comprising a crucible body, further comprising a side heating device disposed around the crucible body and a bottom heating device disposed below the crucible body; the bottom heating device being capable of being along the side heating device The height direction moves up and down, and supports the crucible body to rise above the position of the side heating device.
  • the present application provides an evaporating crucible by providing a bottom heating device under the crucible body, and the crucible body can be heated along the side heating device under the support of the bottom heating device.
  • the direction is moved up and down, which improves the efficiency of maintenance, greatly shortens the maintenance time and reduces the unnecessary work procedures; at the same time, improves the quality of maintenance, avoids the personnel to operate the contaminated materials and the influence of the release on the thickness of the vapor deposition film.
  • FIG. 1 is a schematic structural view of a vapor deposition apparatus in the prior art of the present application
  • FIG. 2 is a schematic view of an embodiment of an evaporation device proposed by the present application.
  • FIG. 3 is a partially enlarged schematic view showing a portion of the frame A of FIG. 2 in an evaporation device according to the present application;
  • FIG. 4 is a schematic structural view of a lifting device in an evaporation device according to the present application.
  • FIG. 5 is a schematic structural view of another embodiment of an evaporation device according to the present application.
  • FIG. 6 is a schematic diagram of an apparatus of a control system in an evaporation apparatus proposed by the present application.
  • An evaporation device provided by the present application specifically includes a crucible body 201 and a side heating device 202 disposed around the crucible and a bottom heating device 203, a crucible body 201 and a side heating device 202. There are spaces between the side walls, and the spacing is arranged to enable the side heating device 202 to uniformly heat the crucible body 201. Preferably, the interval may be 1 to 5 cm. In this embodiment, the implementation manner of each heating device is not limited, and resistance heating or electromagnetic heating, or other heating methods may be used.
  • the bottom heating device 203 is disposed below the crucible body 201, and the surrounding side heating device 202 can uniformly heat the evaporating material in the crucible, thereby avoiding the evaporating material remaining at the bottom of the crucible body 201.
  • the bottom heating device 203 is movably attached to the side heating device 202.
  • FIG. 3 it is an embodiment of the bonding manner.
  • the edge of the bottom heating device 203 is provided with an extension portion 2031.
  • the length of the extension portion 2031 is slightly smaller than the inner diameter of the side heating device 202, and forms a gap 209 with the side wall of the side heating device 202, so that the bottom heating device 203 supports the When the crucible body 201 moves up and down along the height direction of the crucible, the frictional force is reduced.
  • the bottom inner wall of the side heating device 202 is further provided with a bottom wall 2021 which is folded inwardly.
  • the extension portion 2031 of the bottom heating device 203 is supported on the bottom wall 2021, and the bottom wall 2021 is used for supporting the bottom heating device 203, and ensures The side heating device 202 and the bottom heating device 203 are seamlessly bonded during heating.
  • the lower surface of the extending portion of the edge of the bottom heating device 203 can be arranged in a stepped structure, and the upper surface of the bottom wall 2021 is also provided with a stepped structure matched thereto to achieve seamless fitting and prevent evaporation.
  • thermal energy leaks from the gap 209 between the bottom heating device 203 and the side heating device 202, thereby affecting the temperature control during the evaporation process.
  • other structures such as a zigzag type, a wave shape, and the like, as long as the seamless fit of the lower surface of the extension portion 2031 and the upper surface of the bottom portion 2021 can be achieved, are within the scope of the present application.
  • the upper portion of the body 201 is open at the upper portion, and a cover 204 is provided at the opening, and the cover 204 is used to restrict the evaporated vapor deposition material inside the body 201.
  • the vapor deposition apparatus of the present application further includes a heat insulating cover 205 for maintaining the temperature of the crucible body 201, and the heat insulating cover 205 further includes a sealing member 206 for filling between the crucible cover 204 and the side heating device 202.
  • the structure of the sealing member 206 and the connection form between the thermal insulation cover 205 and the crucible main body 201 are not specifically limited.
  • the sealing member 206 may be made of a rubber material to isolate moisture and further provide better sealing and heat preservation effects.
  • the present application does not limit the manner in which the main body 201 and the lid 204 are closed, and the opening of the body 201 can be closed.
  • an external thread may be provided on the outer surface of the opening of the body 201, and an inner thread matching the external thread may be provided on the inner surface of the lid 204.
  • the cover of the lid 204 and the body 201 is Threaded.
  • the material of the lid 204 cannot react with the material to be vaporized.
  • the bottom plate of the main body 201 is of a multi-stage inner convex type, and the bottom heating device 203 is matched with the shape of the bottom of the crucible body 201, and the multi-stage inner convex structure simultaneously serves to increase the thermal contact area and support the crucible body 201.
  • the crucible body 201 When the crucible body 201 is placed on the bottom heating device 203, the crucible body 201 can be prevented from being released, affecting the evaporation efficiency, and facilitating the pick-and-place of the crucible body 201.
  • the cover 204 and the heat insulating cover 205 are provided with an exit hole 207 for discharging the vapor evaporated by the vapor deposition material in a specified direction, and thus, for the distance between the heat insulating cover 205 and the cover 204,
  • the vapor deposition material capable of evaporating in a gaseous state may be emitted from the exit hole 207.
  • the aperture of the exit hole 207 is larger than the outer diameter of the crucible body 201, it may happen that the vapor deposition material evaporated to the gaseous state reaches the top end of the crucible body 201 and is directly ejected from the edge position of the exit hole 207, thereby failing to cause vaporization of the gaseous state.
  • the aperture of the exit hole 207 should be smaller than the outer diameter of the crucible body 201. Further, in the embodiment of the present application, the aperture and the number of the exit holes 207 are not limited, and the evaporated gas can be led out and is not easily clogged.
  • the main body 201 and the material are not limited, and the high temperature resistance and the thermal conductivity are good and the deformation is not easy.
  • the material of the main body 201 may be selected from titanium, copper, aluminum, etc., and materials such as quartz and ceramic may also be used.
  • the lifting device includes an expansion and contraction portion 212 and a transmission portion 211 nested in the expansion and contraction portion 212 .
  • One end of the expansion and contraction portion 212 is connected with a power device such as a stepping motor or the like.
  • the transmission portion 211 is for supporting the crucible body 201 to move up and down within the heating device.
  • a weighing device 210 is further disposed between the transmission portion 211 and the bottom heating device 203, and the weighing device 210 can be connected to the display screen to display the weight information on the screen in real time. on.
  • the weighing apparatus 210 in the present application can be a series of devices having a value for converting pressure into weight, such as an electronic scale.
  • the weighing device 210 has a convex shape and cooperates with the inner convex structure of the bottom heating device.
  • the shape of the weighing device 210 should be identical to the bottom heating device 203 and the crucible body 201, so that in addition to the convex shape, other structures that cooperate with the bottom heating device are equally applicable.
  • Insulation materials can be selected from traditional insulation materials such as fiberglass, asbestos, rock wool, silicates, etc., or new insulation materials such as aerogel felts, vacuum panels, and the like.
  • the arrangement of the lifting device is not particularly limited, and it is not necessary to add or clean the vapor deposition material to the crucible body 201, and it can be placed on the holder.
  • the bottom of the body 201 needs to be provided with a weighing device 210, and there is enough space for the lifting device to enter.
  • the expansion and contraction portion 212 may be a screw, and the transmission portion 211 may be screwed on the screw and supported by the thread of the screw, wherein the transmission portion 211 does not rotate in the radial direction.
  • the transmission portion 211 moves up and down with respect to the screw by the transmission effect of the screw.
  • the expansion and contraction portion 212 moves the transmission portion 211 up and down by means of screw driving, the body 201 may automatically rotate downward with the expansion and contraction portion 212 due to the weight of the body 201 itself.
  • a groove (not shown) may be opened in the side heating device 202, and the extension portion 2031 of the bottom heating device 203 is further provided with a fixing portion (not shown) into which the fixing portion is inserted.
  • the groove is moved up and down to fix the bottom heating device 203 in the radial direction to prevent the bottom heating device 203 from rotating in the warp direction.
  • the bottom surface of the weighing device 210 is provided as a rough surface to increase the frictional force with the transmission portion 211.
  • the crucible body 201 is fixed in the radial direction when the telescopic portion 212 is stopped.
  • the telescopic portion 212 and the transmission portion 211 can also be fixedly coupled together.
  • the bottom end of the telescopic portion 212 can be provided with a toothed structure, and the toothed structure is matched with a gear driven by the circuit device, as long as the gear is controlled.
  • the expansion and contraction portion 212 and the transmission portion 211 fixed to the expansion and contraction portion 212 can be moved up and down, and the crucible body 201 can be raised and lowered to ascend and descend along the height direction of the crucible body 201.
  • the power unit may be an electric motor or a hydraulic pump, and since the lifting device is used to support the main body to move up and down during operation, the power unit connected to the telescopic portion 212 needs to be fixed to the ground or the support.
  • the upper surface of the transmission portion 211 may be provided with a structure for positioning, such as setting the width of the transmission portion 211 slightly larger than the width of the weighing device 210, and the edge is also slightly higher than other surfaces, so that The weighing device 210 is completely restrained, further reinforcing the entire vapor deposition device.
  • the Shutter of each evaporation source in the cavity is opened on the operation interface of the vapor deposition device, so that the thermal insulation cover 305 is sequentially opened. Cover 304. It is worth noting that due to the action of the sealing member 306, it is necessary to wait until the inside of the vapor deposition device is in an atmospheric state to open the respective covers.
  • the power unit is controlled to raise the entire vapor deposition device; the expansion and contraction portion 312 of the vapor deposition device is fixedly rotated by the servo motor, and the transmission portion 311 is driven by the screw.
  • the transmission portion 311 moves upward relative to the expansion and contraction portion 312 and is located at the transmission portion 311.
  • the weighing device 310, the bottom heating device 303, and the crucible body 301 are raised to the set position. After the transmission portion 311 is stopped and has no contact with the surrounding heating device 302, the weighing is started, and the weighing device 310 displays the weight information on the operation interface in real time. After the weighing is completed, the long rod clamp is inserted into the cavity to clamp out the material that needs to be added and needs to be replaced. After the loading is completed, the crucible body 301 is placed into the vapor deposition device by the long rod clamp. Then, the telescopic portion 312 in the vapor deposition device is reversely rotated by the servo motor, and the entire crucible body is lowered by the transmission portion 311. Maintenance and feeding. The entire maintenance process does not require people to enter the cavity, nor need to contact the evaporation device to reduce safety hazards and avoid material contamination.
  • the embodiment of the present application further includes a control system for controlling the operation of the vapor deposition device.
  • the control system includes a control device 401.
  • the control device 401 is a central processing unit CPU, and the control of the vapor deposition device can be realized by a form developed by the single chip microcomputer.
  • the weighing device 403 transmits the weight data of the crucible body to the control device 401 in real time through the data transmission device 405, and the control device 401 receives the weight data and displays it on the display device 404.
  • the weighing device 403 can be implemented by an electronic scale and a Tianping device.
  • the display device 404 may be an LCD screen or a capacitive screen or a resistive screen; further, the data transmission device may be a wired transmission, such as a network cable, a data line, or the like, or may be a wireless transmission, such as a WIFI transmitter, a Bluetooth transmitter, etc.; In the display device 404, a touch screen can also be added, and the operation action can be recorded and returned to the control device 401; the control device 401 can further transmit the control data to the power control device 402 through the data transmission device 405, thereby realizing the power device such as the rotation speed.
  • the steering control device 402 can also transmit the operating state of the power unit to the control device 401 via the data transmission device 405 and display it on the display device 404.
  • control system in this embodiment can be integrated into the control system of the entire vapor deposition device, and the display device 404 can also be directly displayed on the operation interface.
  • embodiments of the present application provide an evaporation apparatus including a crucible body, a surrounding heating device, and a bottom heating device; by providing a bottom structure of the crucible body in a multi-stage structure, and providing a bottom heating device below the crucible body, Improve the quality of the product, avoid the repeated heating of the bottom material of the crucible and deteriorate the quality; improve the maintenance efficiency by setting the lifting device, greatly shorten the maintenance time and reduce the redundant work procedure; at the same time, improve the quality of maintenance and avoid the personnel to operate the contaminated material. And let go affect the thickness of the vapor deposition film.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

一种蒸镀装置，所述蒸镀装置包括坩埚主体(201)，以及设置在所述坩埚主体(201)四周的侧面加热装置(202)和设置在所述坩埚主体(201)下方的底部加热装置(203)；所述底部加热装置(203)能够沿着所述侧面加热装置(202)的高度方向上下移动，并支撑所述坩埚主体(201)上升至高于所述侧面加热装置(202)的位置。通过底部设置加热装置，使得坩埚主体(201)能够上下移动，提高保养效率，缩短保养时间，减少多余的工作程序。

Description

一种蒸镀装置
【技术领域】
本申请涉及蒸镀技术领域，尤其涉及一种蒸镀装置。
【背景技术】
OLED(有机发光二极管，Organic Light Emitting Diode)具有全固态、超薄、无视角限制、快速响应、室温工作、易于实现柔性显示和3D显示等优点，一致被公认为是下一代显示的主流技术。目前OLED器件制作的主要方式是加热蒸发镀膜，主要是使用加热容器在真空环境下加热蒸镀材料，使升华型或者熔融型的蒸镀材料在高温状态下气化，沉积在有TFT（Thin Film Transistor，薄膜晶体管）结构或者阳极结构的基板上。
如图1所示，传统蒸镀坩埚包括坩埚主体101和盖在坩埚主体101的开口处的上盖104；坩埚主体101被放置在加热装置102内部，底部设有支撑板103，坩埚主体101用于盛放待蒸镀材料，上盖104设有出射孔105。其蒸镀原理为：通过加热装置102对蒸镀坩埚进行加热使待蒸镀材料加热到一定温度发生蒸发或升华，从出射孔105射出，从而凝聚沉积在待镀膜的基板表面形成薄膜。
然而，在保养设备、更换材料、更换坩埚等工艺流程都需要取出坩埚，称重材料，保养完后再放入加材料的坩埚，取装坩埚需要操作人员进入狭小的腔体，并且要用到卡夹或手指垫无尘布，保养取出坩埚称重材料然后加料。上述繁琐的操作步骤，造成了以下问题：1.每次取出坩埚称重，需要的才加新料，不需要加的在重新放回，有不需要的工作量，影响效率；2.蒸发源底部没有加热，如多次使用每次底部材料都是后升华，会造成底部材料多次循环加热而劣质化变质。
【发明内容】
本申请主要解决的技术问题是提供一种蒸镀装置，能够解决传统蒸镀设备不易更换坩埚及称重步骤繁琐的问题。
为解决上述技术问题，本申请采用的一个技术方案是：
一种蒸镀装置，包括坩埚主体，还包括设置在所述坩埚主体四周的侧面加热装置和设置在所述坩埚主体下方的底部加热装置；所述底部加热装置能够沿着所述侧面加热装置的高度方向上下移动，并支撑所述坩埚主体上升至高于所述侧面加热装置的位置；所述侧面加热装置底部设有向内延伸的底壁，所述底部加热装置承托于所述底壁上，所述底部加热装置的延伸部与所述侧面加热装置的内壁之间具有间隔。
为解决上述技术问题，本申请采用的一个技术方案是：
一种蒸镀装置，包括坩埚主体，还包括设置在所述坩埚主体四周的侧面加热装置和设置在所述坩埚主体下方的底部加热装置；所述底部加热装置能够沿着所述侧面加热装置的高度方向上下移动，并支撑所述坩埚主体上升至高于所述侧面加热装置的位置。
本申请的有益效果是：区别于现有技术，本申请提供一种蒸镀坩埚，通过在坩埚主体下方设置底部加热装置，且坩埚主体能够在底部加热装置的支撑下沿着侧面加热装置的高度方向上下移动，从而提高了坩埚保养时效率，大大缩短保养时间，减少多余的工作程序；同时，提高保养的质量，避免人员操作污染材料和放歪坩埚影响蒸镀膜厚度。
【附图说明】
图1是本申请的现有技术中蒸镀装置结构示意图；
图2是本申请提出的一种蒸镀装置的一个实施例示意图；
图3是本申请提出的一种蒸镀装置中图2中的A框部分局部放大示意图；
图4是本申请提出的一种蒸镀装置中的升降装置结构示意图；
图5是本申请提出的一种蒸镀装置中的另一个实施例结构示意图；
图6是本申请提出的一种蒸镀装置中的控制系统的装置示意图。
【具体实施方式】
下面将对本申请实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
值得注意的是，本申请中所提到的方向用语，例如，“上”、“下”、“前”、“后”、“左”、“右”、“内”、“外”、“侧面”等，仅是参考附加图式的方向，因此，使用的方向用语是为了更好、更清楚地说明及理解本申请，而不是指示或暗指所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。
为了更详细说明本申请，下面结合附图对本申请提出的一种蒸镀装置进行说明。
本申请提供的一种蒸镀装置，如图2所示，蒸镀装置具体包括坩埚主体201和设置在坩埚四周的侧面加热装置202和下方的底部加热装置203，坩埚主体201和侧面加热装置202的侧壁之间具有间隔，间隔的设置能使侧面加热装置202对坩埚主体201起到均匀加热的作用，优选地，间隔可以为1～5cm。其中，本实施例中不对各加热装置的实现方式做限定，可以电阻加热或电磁加热，或者其他加热方式均可。
这样，坩埚主体201的下方设置了底部加热装置203，结合四周的侧面加热装置202，能够对坩埚内的蒸发物起到均匀加热的作用，避免了蒸发物在坩埚主体201底部残留的情况。
值得注意的是，在本实施例中，底部加热装置203的与侧面加热装置202活动贴合，请参阅图3，为贴合方式的一个实施例。可以看出，底部加热装置203边缘设有延伸部2031，延伸部2031的长度略小于侧面加热装置202的内径，并与侧面加热装置202的侧壁形成间隙209，可以使得底部加热装置203支撑这坩埚主体201沿着坩埚高度方向上下移动时减少摩擦力。而侧面加热装置202底部内周还设有向内收合的底壁2021，底部加热装置203的延伸部2031承托于底壁2021上，底壁2021用于承托底部加热装置203，并确保加热时侧面加热装置202与底部加热装置203之间无缝贴合。具体地，可以通过在底部加热装置203边缘的延伸部的下表面设置为阶梯型结构，底壁2021的上表面同样设有与之配合的阶梯型结构，以实现无缝贴合，防止蒸镀装置在工作的时候，热能从底部加热装置203与侧面加热装置202之间的间隙209漏出，进而影响蒸镀过程中对温度的控制。同样，其他诸如锯齿型，波浪形等结构，只要能够实现延伸部2031下表面与底部2021上表面的无缝贴合，均在本申请的保护范围内。
进一步，坩埚主体201上部开口，开口处设有坩埚盖204，坩埚盖204用于将蒸发出的蒸镀材料限制在坩埚主体201内部。进一步，本申请的蒸镀装置还设有保温盖205，保温盖205用于维持坩埚主体201的温度，保温盖205还包括密封件206，用于填充坩埚盖204与侧面加热装置202之间的空隙，并且能够起到固定坩埚主体201的作用。
需要说明的是，本申请对密封件206的结构以及保温盖205与坩埚主体201之间连接形式不作具体限定。例如，密封件206可以为橡胶材质，能够起到隔绝水汽，进一步起到更好的密封和保温效果。同时，本申请也不对坩埚主体201和坩埚盖204盖合方式进行限定，能够盖紧坩埚主体201的开口即可。例如，可以在坩埚主体201的开口处的外表面设有外螺纹，在坩埚盖204的内表面设有与所述外螺纹相匹配的内螺纹，坩埚盖204与坩埚主体201的盖合方式为螺纹拧合。当然，坩埚盖204的材料不能与待蒸镀材料发生反应。
进一步，坩埚主体201底板为多级内凸型，底部加热装置203与坩埚主体201底部的形状契合，多级内凸型结构同时起到了增加热接触面积和支撑坩埚主体201的作用。当坩埚主体201放置在底部加热装置203上，可以避免坩埚主体201放歪，影响蒸发效率，便于坩埚主体201的取放。当然，为了实现上述的技术效果，诸如将坩埚主体201底部设置为倒V型、多级锯齿结构等同样在本申请的保护范围内。
进一步，坩埚盖204和保温盖205上设有出射孔207，出射孔207用于将蒸镀材料受热蒸发的蒸汽朝着指定方向排出，因而，对于保温盖205和坩埚盖204之间的距离，以能使蒸发为气态的蒸镀材料从出射孔207中出射即可。考虑到如果出射孔207的孔径大于坩埚主体201的外径，可能会出现蒸发为气态的蒸镀材料到达坩埚主体201顶端后直接从出射孔207的边缘位置处喷出，而无法使得气态的蒸镀材料均匀喷出，而影响蒸镀的均匀性。因此，优选出射孔207的孔径应小于坩埚主体201的外径。且，本申请的实施例中对于出射孔207的孔径和个数均不进行限定，能够使蒸发后的气体导出且不易堵塞即可。
值得注意的是，在本申请的实施例中，不对坩埚主体201和材料进行限定，满足耐高温、导热性能好且不易形变即可。例如：坩埚主体201的材料可选用钛、铜、铝等金属，也可以选用石英、陶瓷等材料。
本申请的实施例中，还包括一升降装置。请参阅图4，在本申请的一个实施例中，升降装置包括伸缩部212和嵌套于伸缩部212的传动部211，伸缩部212的一端连接有动力装置，如步进电机等，动力装置用于为传动部211提供移动的动力，传动部211用于支撑所述坩埚主体201在加热装置内上下移动。
进一步，请继续参阅图4，为了实现自动称重，在传动部211与底部加热装置203之间还设有称重装置210，称重装置210可以与显示屏幕相连，将重量信息实时显示在屏幕上。本申请中的称重装置210可以为一系列具有将压力转化为重量数值的装置，如电子秤。本实施例中，称重装置210的形状为上凸型，与底部加热装置的内凸型结构配合。当然，称重装置210的形状应当与底部加热装置203和坩埚主体201一致，所以除了上凸型，其他与底部加热装置配合的结构同样适用。同时，由于称重装置210表面放置的是底部加热装置203，为了防止高温损坏称重装置210，在底部加热装置203与称重装置210之间还有隔热材料（未示出），提出，隔热材料可以选择传统绝热材料，如玻璃纤维、石棉、岩棉、硅酸盐等，或者新型绝热材料，如气凝胶毡、真空板等。
进一步，本申请对升降装置的设置位于不作具体限定，不需要对坩埚主体201进行蒸镀材料的添加或者清洗时，可以将其放置在支架上。当然，坩埚主体201的底部需要设置称重装置210，且留有足够的空间便于升降装置进入。
在本申请的实施例中，针对升降装置，伸缩部212可以为螺杆，而传动部211可以旋套在螺杆上，通过螺杆的螺纹支撑，其中传动部211在径向方向不发生转动。螺杆转动时，通过螺纹的传动效果，传动部211相对螺杆上下移动。值得注意的是，当伸缩部212采用螺杆传动的方式实现传动部211上下移动时，由于坩埚主体201自身的重量，可能会出现坩埚主体201随着伸缩部212自动旋转向下的情况。针对这种情况，可以通过在侧面加热装置202开设沟槽（未示出），底部加热装置203的延伸部2031进一步设有固定部（未示出），固定部插入到沟槽中，可以沿着沟槽上下移动，从而在径向方向固定底部加热装置203，防止底部加热装置203在经向方向旋转。进一步，为了防止称重装置210与传动部211之间在径向方向产生相对滑动，称重装置210底面设置成粗糙表面，以增加与传动部211的摩擦力。这样，结合底部加热装置与称重装置之间隔热材料，以及传动部211与称重装置210的摩擦作用，从而实现坩埚主体201在伸缩部212停止工作时，在径向方向固定不动。
当然，伸缩部212与传动部211还可以固定地连接在一起，在一些实施例中，伸缩部212底端可以通过设置齿状结构，齿状结构与由电路装置带动的齿轮配合，只要控制齿轮的转向，就可以带动伸缩部212及固定在伸缩部212上的传动部211上下移动，进而带动坩埚主体201上升下降，沿着坩埚主体201的高度方向升降即可。当然，动力装置可以为电动机或液压泵，且由于升降装置在工作时用于支撑坩埚主体上下移动，因此，与伸缩部212连接的动力装置需要固定在地面或支撑物上。
为了进一步固定称重装置210，传动部211的上表面可以设置有用于定位的结构，如将传动部211的宽度设置略大于称重装置210的宽度，并边缘也略高于其他表面，这样可以将称重装置210完全限制住，进一步加固了整个蒸镀装置。
下面，结合图5，对本申请提出的一种蒸镀装置的工作过程作具体说明。
本申请实施例中的一种蒸镀装置，当蒸镀装置需要保养时，在蒸镀装置的操作界面上打开腔体里的每个蒸发源的Shutter（闸门），使得依次打开保温盖305和坩埚盖304。值得注意的是，由于密封件306的作用，需要等到蒸镀装置内部为大气状态，才能打开各个盖子。控制动力装置，使得整个蒸镀装置上升；蒸镀装置中的伸缩部312在伺服电机的带动下固定旋转，通过螺纹带动传动部311，传动部311相对伸缩部312向上运动，将位于传动部311的称重装置310、底部加热装置303以及坩埚主体301上升到设定位置。传动部311停转与四周加热装置302无接触后，开始称重，称重装置310实时将重量信息显示在操作界面上。称重完成后，用长杆夹伸入腔体夹出需要添加材料和需要更换的坩埚即可。装完料后用长杆夹将坩埚主体301放入至蒸镀装置中，随后，蒸镀装置中的伸缩部312在伺服电机的带动下反向旋转，通过传动部311带动整个坩埚主体下降完成保养和加料。整个保养过程人不需要进入腔体，也不需要接触蒸镀装置，降低安全隐患，避免材料污染。
进一步，本申请的实施例中还包括控制系统，用于控制蒸镀装置的运行。如图6所示，控制系统包括控制装置401，控制装置401为中央处理器CPU，可以通过单片机开发的形式实现对蒸镀装置的控制。进一步，称重装置403将坩埚主体的重量数据通过数据传输装置405实时传输到控制装置401，控制装置401接收重量数据并显示在显示装置404上。当然，称重装置403可以为电子秤、天平等装置实现。
其中，显示装置404可以为LCD屏幕或电容屏、电阻屏；进一步，数据传输装置可以为有线传输，如网线、数据线等，也可以为无线传输，如WIFI发射器、蓝牙发射器等；在显示装置404中，还可以添加触摸屏，可以记录操作动作，并返回到控制装置401中；控制装置401可以进一步将控制数据通过数据传输装置405传输到动力控制装置402中，实现对动力装置诸如转速、转向的控制；而动力控制装置402也能够将动力装置的工作状态通过数据传输装置405传输给控制装置401，并在显示装置404上显示。
当然，本实施例中的控制系统可以整合到整个蒸镀装置的控制系统中，显示装置404也可以直接显示在操作界面上。
综上所述，本申请的实施例提供一种蒸镀装置，包括坩埚主体，四周加热装置和底部加热装置；通过将坩埚主体底部设置成多级结构，并且在坩埚主体下方设置底部加热装置，提升产品的品质，避免坩埚底部材料多次重复加热而劣质化；通过设置升降装置，提高保养的效率，大大缩短保养时间，减少多余的工作程序；同时，提高保养的质量，避免人员操作污染材料和放歪坩埚影响蒸镀膜厚。
以上所述，仅为本申请的具体实施方式，但本申请的保护范围并不局限于此，任何熟悉本技术领域的技术人员在本申请揭露的技术范围内，可轻易想到变化或替换，都应涵盖在本申请的保护范围之内。因此，本申请的保护范围应以所述权利要求的保护范围为准。

Claims (19)

  1. 一种蒸镀装置，包括坩埚主体，其特征在于，还包括设置在所述坩埚主体四周的侧面加热装置和设置在所述坩埚主体下方的底部加热装置；所述底部加热装置能够沿着所述侧面加热装置的高度方向上下移动，并支撑所述坩埚主体上升至高于所述侧面加热装置的位置；所述侧面加热装置底部设有向内延伸的底壁，所述底部加热装置承托于所述底壁上，所述底部加热装置的延伸部与所述侧面加热装置的内壁之间具有间隔。
  2. 根据权利要求1所述的蒸镀装置，其特征在于，所述底部加热装置边缘设有延伸部，所述延伸部的下表面与所述底壁的上表面相接触，以实现底部加热装置与侧面加热装置的无缝贴合。
  3. 根据权利要求2所述的蒸镀装置，其特征在于，所述延伸部的下表面与所述底部的上表面设有相互匹配的阶梯状结构。
  4. 根据权利要求3所述的蒸镀装置，其特征在于，所述蒸镀装置还包括一升降装置，所述升降装置设置于所述坩埚主体和所述底部加热装置的下方，用于带动所述坩埚主体沿所述坩埚主体的高度方向上下移动。
  5. 根据权利要求4所述的蒸镀装置，其特征在于，所述升降装置包括伸缩部和传动部，所述伸缩部与动力装置相连，用于为传动部提供移动的动力；所述传动部用于支撑所述坩埚主体在加热装置内上下移动。
  6. 根据权利要求5所述的蒸镀装置，其特征在于，所述蒸镀装置还包括一称重装置，所述称重装置位于所述传动部和所述底部加热装置之间；所述称重装置与一显示屏幕相连，用于实时将重量信息传输并显示在所述显示屏幕上。
  7. 根据权利要求6所述的蒸镀装置，其特征在于，所述底部加热装置呈多级内凸设置，所述坩埚主体底部的形状与所述底部加热装置契合。
  8. 根据权利要求7所述的蒸镀装置，其特征在于，所述称重装置与所述底部加热装置的形状相配合；所述称重装置与所述加热装置之间还设有隔热材料。
  9. 根据权利要求8所述的蒸镀装置，其特征在于，所述蒸镀装置还包括一控制系统，所述控制系统包括控制装置、数据传输装置、显示装置和动力控制装置；所述控制装置通过数据传输装置与所述称重装置相连，所述控制装置接收所述称重装置记录重量数据，并将重量数据显示在所述显示装置上；所述控制装置通过数据传输装置与动力控制装置相连，所述动力控制装置与所述动力装置相连，控制所述动力装置的转动速度和方向。
  10. 一种蒸镀装置，包括坩埚主体，其特征在于，还包括设置在所述坩埚主体四周的侧面加热装置和设置在所述坩埚主体下方的底部加热装置；所述底部加热装置能够沿着所述侧面加热装置的高度方向上下移动，并支撑所述坩埚主体上升至高于所述侧面加热装置的位置。
  11. 根据权利要求10所述的蒸镀装置，其特征在于，所述侧面加热装置底部设有向内延伸的底壁，所述底部加热装置承托于所述底壁上。
  12. 根据权利要求11所述的蒸镀装置，其特征在于，所述底部加热装置边缘设有延伸部，所述延伸部的下表面与所述底壁的上表面相接触，以实现底部加热装置与侧面加热装置的无缝贴合。
  13. 根据权利要求12所述的蒸镀装置，其特征在于，所述延伸部的下表面与所述底部的上表面设有相互匹配的阶梯状结构。
  14. 根据权利要求10所述的蒸镀装置，其特征在于，所述底部加热装置的延伸部与所述侧面加热装置的内壁之间具有间隔。
  15. 根据权利要求10所述的蒸镀装置，其特征在于，所述蒸镀装置还包括一升降装置，所述升降装置设置于所述坩埚主体和所述底部加热装置的下方，用于带动所述坩埚主体沿所述坩埚主体的高度方向上下移动。
  16. 根据权利要求15所述的蒸镀装置，其特征在于，所述升降装置包括伸缩部和传动部，所述伸缩部与动力装置相连，用于为传动部提供移动的动力；所述传动部用于支撑所述坩埚主体在加热装置内上下移动。
  17. 根据权利要求16所述的蒸镀装置，其特征在于，所述蒸镀装置还包括一称重装置，所述称重装置位于所述传动部和所述底部加热装置之间；所述称重装置与一显示屏幕相连，用于实时将重量信息传输并显示在所述显示屏幕上。
  18. 根据权利要求17所述的蒸镀装置，其特征在于，所述底部加热装置呈多级内凸设置，所述坩埚主体底部的形状与所述底部加热装置契合；所述称重装置与所述底部加热装置的形状相匹配。
  19. 根据权利要求18所述的蒸镀装置，其特征在于，所述蒸镀装置还包括一控制系统，所述控制系统包括控制装置、数据传输装置、显示装置和动力控制装置；所述控制装置通过数据传输装置与所述称重装置相连，所述控制装置接收所述称重装置记录重量数据，并将重量数据显示在所述显示装置上；所述控制装置通过数据传输装置与动力控制装置相连，所述动力控制装置与所述动力装置相连，控制所述动力装置的转动速度和方向。
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230304144A1 (en) * 2020-11-13 2023-09-28 Shincron Co., Ltd. Film formation device
DE102024100838A1 (de) * 2024-01-12 2025-07-17 VON ARDENNE Asset GmbH & Co. KG Tiegelhaltevorrichtung, Verdampfungssystem, Verfahren und Verwendung

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109468594A (zh) * 2018-12-17 2019-03-15 武汉华星光电半导体显示技术有限公司 用于制作有机发光二极管的蒸镀装置
KR102221960B1 (ko) * 2019-03-25 2021-03-04 엘지전자 주식회사 증착 장치
CN113388815A (zh) * 2021-07-27 2021-09-14 福建华佳彩有限公司 一种适用于坩埚的面蒸发源结构
CN114182209A (zh) * 2022-01-18 2022-03-15 福建华佳彩有限公司 一种oled材料蒸镀坩埚装置及其使用方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007270261A (ja) * 2006-03-31 2007-10-18 Kyocera Corp 蒸着装置、蒸着方法、有機ｅｌ装置の製造方法、及び蒸着用セル
CN104213080A (zh) * 2014-08-20 2014-12-17 京东方科技集团股份有限公司 蒸发源装置和蒸镀设备
CN104233197A (zh) * 2014-09-30 2014-12-24 苏州普京真空技术有限公司 一种新型坩埚
CN104603321A (zh) * 2012-08-29 2015-05-06 佳能特机株式会社 蒸发源
CN105441878A (zh) * 2016-01-05 2016-03-30 京东方科技集团股份有限公司 用于蒸镀的加热装置和蒸镀设备
CN106148899A (zh) * 2016-06-30 2016-11-23 京东方科技集团股份有限公司 一种蒸镀坩埚及蒸发源装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01208453A (ja) * 1988-02-17 1989-08-22 Matsushita Electric Ind Co Ltd 金属薄膜の製造法
JPH04348022A (ja) * 1991-05-24 1992-12-03 Mitsubishi Electric Corp 分子線エピタキシー用セル
EP1560468B1 (en) * 2002-07-19 2018-03-21 LG Display Co., Ltd. Source for thermal physical vapor deposition of organic electroluminescent layers
KR100889759B1 (ko) * 2002-09-03 2009-03-24 삼성모바일디스플레이주식회사 유기박막 형성장치 및 그 가열용기
CN101532172A (zh) * 2009-04-17 2009-09-16 江苏华盛天龙机械股份有限公司 一种生长硅单晶的热装置
JP6139423B2 (ja) * 2014-01-29 2017-05-31 シャープ株式会社 蒸着装置、蒸着方法、及び、有機エレクトロルミネッセンス素子の製造方法
CN104762600B (zh) * 2015-04-20 2017-05-10 京东方科技集团股份有限公司 蒸镀坩埚和蒸镀装置
CN105239154A (zh) * 2015-09-10 2016-01-13 上海超硅半导体有限公司 提拉法单晶硅生长流场控制技术
CN106929805B (zh) * 2015-12-31 2022-02-25 中国建材国际工程集团有限公司 容纳并加热材料的坩埚以及包括坩埚和加热器布置的系统
CN106929802B (zh) * 2015-12-31 2021-06-04 中国建材国际工程集团有限公司 用于加热坩埚的加热器设备和用于蒸发或升华材料的系统

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007270261A (ja) * 2006-03-31 2007-10-18 Kyocera Corp 蒸着装置、蒸着方法、有機ｅｌ装置の製造方法、及び蒸着用セル
CN104603321A (zh) * 2012-08-29 2015-05-06 佳能特机株式会社 蒸发源
CN104213080A (zh) * 2014-08-20 2014-12-17 京东方科技集团股份有限公司 蒸发源装置和蒸镀设备
CN104233197A (zh) * 2014-09-30 2014-12-24 苏州普京真空技术有限公司 一种新型坩埚
CN105441878A (zh) * 2016-01-05 2016-03-30 京东方科技集团股份有限公司 用于蒸镀的加热装置和蒸镀设备
CN106148899A (zh) * 2016-06-30 2016-11-23 京东方科技集团股份有限公司 一种蒸镀坩埚及蒸发源装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230304144A1 (en) * 2020-11-13 2023-09-28 Shincron Co., Ltd. Film formation device
DE102024100838A1 (de) * 2024-01-12 2025-07-17 VON ARDENNE Asset GmbH & Co. KG Tiegelhaltevorrichtung, Verdampfungssystem, Verfahren und Verwendung

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