WO2019090840A1 - 柔性显示组件、制作方法以及显示面板 - Google Patents

柔性显示组件、制作方法以及显示面板 Download PDF

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Publication number
WO2019090840A1
WO2019090840A1 PCT/CN2017/112599 CN2017112599W WO2019090840A1 WO 2019090840 A1 WO2019090840 A1 WO 2019090840A1 CN 2017112599 W CN2017112599 W CN 2017112599W WO 2019090840 A1 WO2019090840 A1 WO 2019090840A1
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Prior art keywords
layer
inorganic layer
inorganic
thickness
organic
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PCT/CN2017/112599
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English (en)
French (fr)
Inventor
赵宸
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武汉华星光电半导体显示技术有限公司
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Priority to US15/738,010 priority Critical patent/US10615351B2/en
Publication of WO2019090840A1 publication Critical patent/WO2019090840A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • H10K59/873—Encapsulations
    • H10K59/8731—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H10K77/111—Flexible substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present invention relates to the field of display, and in particular to a flexible display assembly, a method of fabricating the same, and a display panel.
  • the OLED display has the characteristics of high luminance, wide viewing angle, fast response, ultra-thin, light weight, and can be fabricated on a flexible substrate.
  • the biggest advantage of OLED is that it can be made into a flexible product.
  • researchers in the industry have done a lot of work on flexible substrates and flexible packaging.
  • Thin Film Encapsulation, TFE Thin Film Encapsulation
  • the inorganic film can be prepared to be very uniform and dense, and has good barrier properties of water and oxygen, and the organic film can absorb stress between the dispersed layer and the layer, avoiding cracks of the inorganic film due to its inherent brittleness and defects, and even causing delamination. Therefore, it can not play a role in blocking water oxygen.
  • the technical problem to be solved by the present invention is to provide a flexible display assembly, a manufacturing method, and a display panel, which can solve the problem that the display panel is easily broken during the bending process.
  • an embodiment of the present invention provides a flexible display assembly, including a display layer, a first film layer, and a second film layer.
  • the display layer comprises a non-bending area and a bending area.
  • the first film layer includes at least a first inorganic layer and a first organic layer sequentially formed on the bent region.
  • the second film layer includes at least a second inorganic layer and a second organic layer sequentially formed on the non-bending region.
  • a difference in modulus between the first inorganic layer and the display layer is smaller than a difference in modulus between the second inorganic layer and the display layer, and/or a thickness of the first inorganic layer is smaller than the second a thickness of the inorganic layer; the thickness of the first film layer is equal to the thickness of the second film layer.
  • the embodiment of the invention further provides a method for manufacturing a flexible display component, comprising:
  • the modulus of the first inorganic layer is less than the modulus of the second inorganic layer, and/or the thickness of the first inorganic layer is less than the thickness of the second inorganic layer; on the bending region
  • the thickness of at least the first inorganic layer and the first organic layer sequentially formed is equal to the thickness of at least the second inorganic layer and the second organic layer sequentially formed on the non-bending region.
  • the embodiment of the invention further provides a display panel, which comprises a flexible display assembly according to an embodiment of the invention.
  • the beneficial effects of the present invention are: adjusting the material and/or thickness parameters of the inorganic layer and the organic layer on different regions by dividing the display layer into the bending region and the non-bending region, wherein The difference in modulus between the first inorganic layer and the display layer is smaller than the difference in modulus between the second inorganic layer and the display layer, that is, the difference in modulus between the first inorganic layer and the display layer on the bent region is reduced, and/or The thickness of an inorganic layer is smaller than the thickness of the second inorganic layer, so that the first inorganic layer is more favorable for bending, so that the interface stress between the first inorganic layer and the display layer can be reduced during the bending of the display layer, and the display layer is improved.
  • the cracking phenomenon generated during the bending process improves the bending reliability of the display layer.
  • FIG. 1 is a schematic structural view of an embodiment of a flexible display assembly of the present invention
  • FIG. 2 is another schematic structural view of a flexible display assembly of the present invention.
  • FIG. 3 is another schematic structural view of a flexible display assembly of the present invention.
  • FIG. 4 is a schematic flow chart of an embodiment of a method for fabricating a flexible display assembly of the present invention
  • FIG. 5 is a schematic flow chart of a specific manufacturing step of an embodiment of a method for fabricating a flexible display assembly according to the present invention
  • FIG. 6 is a schematic flow chart of another specific manufacturing step of an embodiment of a method for fabricating a flexible display assembly according to the present invention.
  • FIG. 7 is a schematic structural view of an embodiment of a display panel of the present invention.
  • an embodiment of a flexible display assembly of the present invention includes a display layer 10, a first film layer 11 and a second film layer 12.
  • the display layer 10 includes a non-bent area 101 and a bent area 102.
  • the first thin film layer 11 includes at least a first inorganic layer 111 and a first organic layer 112 which are sequentially formed on the bent region 102.
  • the second film layer 12 includes at least a second inorganic layer 121 and a second organic layer 122 which are sequentially formed on the non-bending region 101.
  • the difference in modulus between the first inorganic layer 111 and the display layer 10 is smaller than the difference in modulus between the second inorganic layer 121 and the display layer 10, and/or the thickness d of the first inorganic layer 111 is smaller than that of the second inorganic layer 121.
  • Thickness D is equal to the thickness of the second film layer 12, that is, the thickness of all the inorganic layer and the organic layer of the first film layer 11 and the thickness of all the organic layer and the inorganic layer of the second film layer 12.
  • the display layer 10 is used to provide a display function.
  • the display layer 10 in the OLED display panel includes an organic light-emitting material coating, a substrate, an anode, a cathode, an electron transport layer, a hole injection layer, and the like, since the display layer 10 is a flexible OLED.
  • An important part of the display panel also hopes to improve the bending performance of the flexible display panel while ensuring the blocking of water oxygen.
  • the display layer 10 is divided into a bending area 102 which is an area that can be used for bending, and a non-bending area 101 which is an area which is generally not bent.
  • the materials such as the material and/or the thickness of the inorganic layer and the organic layer are adjusted on different regions to improve the bending reliability on the bending region 102, wherein the difference in modulus between the first inorganic layer 111 and the display layer 10 means The absolute value of the difference between the two, the difference between the modulus of the second inorganic layer 121 and the display layer 10 is also the absolute value of the difference between the two.
  • the modulus difference between the first inorganic layer 111 and the display layer 10 is smaller than the modulus difference between the second inorganic layer 121 and the display layer 10, that is, the modulus difference between the first inorganic layer 111 and the display layer 10 on the bending region 102.
  • the interface stress between the first inorganic layer 111 and the display layer 10 is lowered, the cracking phenomenon of the display layer 10 during the bending process is improved, and the bending reliability of the display layer 10 is improved.
  • the thickness d of the first inorganic layer 111 is smaller than the thickness D of the second inorganic layer 121, and by reducing the thickness of the first inorganic layer 111, the first inorganic layer 111 can be more easily bent, thereby reducing the first inorganic layer 111.
  • the stress generated during the bending process improves the cracking phenomenon of the display layer 10 during the bending process and improves the bending reliability of the display layer 10.
  • the material of the first inorganic layer 111 includes at least one of silicon oxide, aluminum oxide, and silicon nitride.
  • the material of the first inorganic layer 111 is silicon oxide.
  • the modulus of silicon oxide is the lowest, which is approximately 70 GPa
  • the modulus of silicon nitride is approximately 220 GPa
  • the modulus of alumina is approximately 300 GPa.
  • the modulus generally refers to the modulus of elasticity, which is a physical quantity used to measure the stiffness of the material. The greater the modulus of the material, the greater the stiffness of the material and the less likely it is to bend.
  • the modulus of the material the greater the toughness of the material and the easier it is to bend.
  • the content of the first inorganic layer 111 is 50% to 98%, for example, silicon oxide, aluminum oxide, silicon nitride are mixed, and the silicon oxide content accounts for the first inorganic layer.
  • the total amount of material of layer 111 is 50% to 95%, optionally 60 to 90%, and of course less than 50%.
  • the material of the second inorganic layer 121 includes at least one of silicon oxide, aluminum oxide, and silicon nitride.
  • the modulus difference between the first inorganic layer 111 and the display layer 10 is smaller than the modulus difference between the second inorganic layer 121 and the display layer 10, for example, when the modulus of the inorganic material is larger than the modulus of the display layer 10, It is ensured that the modulus of the first inorganic layer 111 is smaller than the modulus of the second inorganic layer 121.
  • the thickness of the first inorganic layer 111 is less than 500 nm. Alternatively, the thickness of the first inorganic layer 111 is less than 450 nm, or less than 300 nm. In this embodiment, the thickness selection of the first inorganic layer generally requires both water blocking oxygen resistance and bending properties.
  • the second inorganic layer 121 has a thickness of 500 nm to 2 um.
  • the second inorganic layer 121 has a thickness of 550 nm to 1.5 um, and optionally 700 nm to 1 um.
  • the thickness of the second inorganic layer 121 may also be less than 500 nm, while the thickness of the first inorganic layer 111 is smaller than that of the second inorganic layer 121.
  • the first thin film layer 11 further includes a third inorganic layer 113 formed on the first organic layer 112.
  • the second thin film layer 12 further includes a fourth inorganic layer 123 formed on the second organic layer 122.
  • the modulus of the third inorganic layer 113 is less than or equal to the modulus of the fourth inorganic layer 123, and/or the thickness of the third inorganic layer 113 is less than or equal to the thickness of the fourth inorganic layer 123.
  • the modulus of the third inorganic layer 113 is less than or equal to the modulus of the fourth inorganic layer 123, and/or the thickness of the third inorganic layer 113 is less than the thickness of the fourth inorganic layer 123
  • the first film can be further ensured.
  • the modulus of the third inorganic layer 113 may be greater than the modulus of the fourth inorganic layer 123, and/or the thickness of the third inorganic layer 113 is greater than the thickness of the fourth inorganic layer 123, but the ratio of the first thin film layer 11 should be ensured.
  • the second film layer 12 is easily bent.
  • the first thin film layer 11 may include a plurality of inorganic layers and a plurality of organic layers, for example, three inorganic layers and two organic layers, and the first inorganic layer 111 is sequentially formed on the bent region 102, The first organic layer 112, the third inorganic layer 113, the third organic layer (not shown), and the fifth inorganic layer (not shown).
  • the material and/or thickness between the first inorganic layer 111, the third inorganic layer 113, and the fifth inorganic layer may be the same or different, and the materials and/or thicknesses of the first organic layer 112 and the third organic layer may be The same is also different.
  • the second film layer 12 may further include a plurality of inorganic layers and a plurality of organic layers, for example, three inorganic layers and two organic layers, and the second inorganic layer 121 and the second organic layer 122 are sequentially formed on the bent region 102. a fourth inorganic layer 123, a fourth organic layer (not shown), and a sixth inorganic layer (not shown).
  • the material and/or thickness between the second inorganic layer 121, the fourth inorganic layer 123 and the sixth inorganic layer may be the same or different, and the materials and/or thicknesses of the second organic layer 122 and the fourth organic layer may be the same. Can be different.
  • the number of inorganic layers and organic layers of the first thin film layer 11 is greater than or equal to the number of inorganic layers and organic layers of the second thin film layer 12.
  • the number of inorganic layers and organic layers of the first thin film layer 11 is greater than the number of inorganic layers and organic layers of the second thin film layer 12, for example, the first thin film layer 11 includes three inorganic layers and two organic layers. a first inorganic layer 111, a first organic layer 112, a third inorganic layer 113, a third organic layer, and a fifth inorganic layer which are sequentially formed on the bent region 102, and have thicknesses of 400 nm, 2 um, 450 nm, 2 um, respectively. 600nm.
  • the second film layer 12 includes two inorganic layers and an organic layer, and the second inorganic layer 121, the second organic layer 122, and the fourth inorganic layer 123 are sequentially formed on the non-bending region 101, and have a thickness of 1.2 um, respectively. 3um, 1.25um.
  • the thickness of the first film layer 11 is equal to the thickness of the second film layer 12.
  • the number of the inorganic layer and the organic layer of the first film layer 11 is greater than the number of the inorganic layer and the organic layer of the second film layer 12, and not only the bending property of the first film layer 11 on the bending region 102 but also the bending property of the first film layer 11 can be ensured. It is ensured that the display layer 10 has a good packaging effect.
  • the first organic layer 112 includes at least one of polymethyl methacrylate (PMMA) and hexamethyldisiloxane (HMDSO).
  • PMMA polymethyl methacrylate
  • HMDSO hexamethyldisiloxane
  • the second organic layer 122 comprises at least one of polymethyl methacrylate and hexamethyldisiloxane.
  • the first organic layer 112 has a thickness of 1 um to 10 um.
  • the second organic layer 122 has a thickness of 1 um to 10 um.
  • connection between the bending region 102 and the adjacent organic layer of the non-bending region 101 or between the adjacent inorganic layers may be integrally formed in the actual production, and may or may be interlaced.
  • a layer, such as a second organic layer 122, may extend above the junction of the first inorganic layer 111 and the second inorganic layer 121 to provide a better encapsulation effect.
  • the joints are tightly connected to form an effective packaging effect, and Figures 1-3 are only schematic views.
  • an embodiment of a method for fabricating a flexible display assembly of the present invention includes the following steps:
  • the display layer 10 is divided into a non-bent area 101 and a bent area 102.
  • the region that can be bent is divided into the bending region 102.
  • the middle portion of the display panel can be bent, and the central portion of the corresponding display layer 10 is divided into the bending region 102, and the others are It is a non-bending area 101.
  • At least a first inorganic layer 111 and a first organic layer 112 are sequentially formed, for example, on the bent region 102.
  • at least the second inorganic layer 121 and the second organic layer 122 are sequentially formed on the non-bending region 101. That is, the inorganic layer and the organic layer on the bent region 102 are formed first, and the inorganic layer and the organic layer on the non-bent region 101 are formed. Alternatively, an inorganic layer and an organic layer are formed on the non-bending region 101, and then an inorganic layer or an organic layer is formed on the bent region 102.
  • the first inorganic layer 111 is formed on the bent region 102, then the second inorganic layer 121 is formed on the non-bent region 101, and then at least formed on the first inorganic layer 111 of the bent region 102.
  • the second inorganic layer 121 of the non-bent region 101 may be formed first, and then in the bent region 102.
  • the first inorganic layer 111 is formed thereon, then the second organic layer 122 is formed on the second inorganic layer 121 of the non-bent region 101, and then the first organic layer 112 is formed on the first inorganic layer 111 of the bent region 102.
  • the order of forming the inorganic layer and the organic layer of the bending region 102 and the non-bending region 101 is not limited.
  • the inorganic layer and the organic layer of the non-bending region 101 may be formed first, and then the bending region may be formed.
  • the inorganic layer of 102 has several layers.
  • the difference in modulus between the first inorganic layer 111 and the display layer 10 is smaller than the difference in modulus between the second inorganic layer 121 and the display layer 10, and/or the thickness d of the first inorganic layer 111 is smaller than that of the second inorganic layer 121.
  • a thickness D a thickness of at least the first inorganic layer 111, the first organic layer 112 sequentially formed on the bent region 102, and a thickness of at least the second inorganic layer 121 and the second organic layer 122 sequentially formed on the non-bent region 101 equal.
  • the display panel 2 of the display panel embodiment of the present invention includes the flexible display assembly 1 of the flexible display assembly embodiment of the present invention.
  • the first inorganic layer 111 and the display layer The modulus difference of 10 is smaller than the modulus difference between the second inorganic layer 121 and the display layer 10, that is, the difference in modulus between the first inorganic layer 111 and the display layer 10 on the bent region 102 is reduced, and/or the first The thickness d of the inorganic layer 111 is smaller than the thickness D of the second inorganic layer 121, so that the first inorganic layer 111 is more favorable for bending, and the bending between the first inorganic layer 111 and the display layer 10 can be reduced during the bending of the display layer 10.
  • the interface stress improves the cracking phenomenon of the display layer 10 during the bending process and improves the bending reliability of the display layer 10.

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  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

本发明实施例提供柔性显示组件、柔性显示组件的制作方法以及显示面板，其中柔性显示组件包括显示层、第一薄膜层、第二薄膜层。其中显示层包括非弯折区域与弯折区域。第一薄膜层至少包括依次形成于弯折区域上的第一无机层、第一有机层。第二薄膜层至少包括依次形成于非弯折区域上的第二无机层、第二有机层。其中，第一无机层与显示层的模量差小于第二无机层与显示层的模量差，和/或第一无机层的厚度小于第二无机层的厚度；第一薄膜层的厚度与第二薄膜层的厚度相等。通过上述方式，本发明能够有效提升柔性显示组件的弯折可靠性。

Description

柔性显示组件、制作方法以及显示面板
【技术领域】
本发明涉及显示领域，特别是涉及柔性显示组件、制作方法以及显示面板。
【背景技术】
随着显示技术的发展，对色彩和轻便度要求越来越高，有源矩阵有机发光二极管（AMOLED）正在逐渐走进移动设备、电视机等消费电子市场。OLED显示器具有发光亮度高、视角广、响应速度快、超薄、质量轻、可制作在柔性衬底上等特点。与传统TFT-LCD技术相比，OLED最大的优势在于其可做成柔性产品。为实现OLED的可弯折/可卷曲特性，业内研究人员在柔性基板和柔性封装方面做了大量工作。对于柔性的封装技术主要是薄膜封装（Thin Film Encapsulation，TFE）。目前最常用的是通过多层有机-无机薄膜组合来形成封装的阻挡层。无机薄膜可以制备非常均匀致密，起到良好的阻隔水氧特性，而有机薄膜可以吸收与分散层与层之间的应力，避免无机薄膜因其固有的脆性和缺陷产生裂纹，甚至造成分层现象，从而无法起到阻隔水氧的作用。
在柔性屏幕弯折过程中，由于TFE与OLED层材料的模量差别极大，在弯折过程中TFE与OLED界面的应力会产生突变，在较大的应力作用下很容易导致TFE与OLED在弯折区出现破裂或剥离现象，使得整个屏幕显示出现问题甚至失效。
【发明 内容】
本发明主要解决的技术问题是提供一种柔性显示组件、制作方法以及显示面板，能够解决显示面板在弯折过程中容易破裂的问题。
为解决上述技术问题，本发明实施例提供一种柔性显示组件，包括显示层、第一薄膜层、第二薄膜层。其中所述显示层包括非弯折区域与弯折区域。所述第一薄膜层包括依次形成于所述弯折区域上的至少第一无机层、第一有机层。所述第二薄膜层包括依次形成于所述非弯折区域上的至少第二无机层、第二有机层。其中，所述第一无机层与所述显示层的模量差小于所述第二无机层与所述显示层的模量差，和/或所述第一无机层的厚度小于所述第二无机层的厚度；所述第一薄膜层的厚度与所述第二薄膜层的厚度相等。
本发明实施例还提供一种柔性显示组件的制作方法，包括：
将显示层划分为非弯折区域与弯折区域；
在所述弯折区域上依次形成至少第一无机层、第一有机层，且在所述非弯折区域上依次形成至少第二无机层、第二有机层；
其中，所述第一无机层的模量小于所述第二无机层的模量，和/或所述第一无机层的厚度小于所述第二无机层的厚度；在所述弯折区域上依次形成的至少第一无机层、第一有机层的厚度与在所述非弯折区域上依次形成的至少第二无机层、第二有机层厚度相等。
本发明实施例还提供一种显示面板，包括本发明实施例提供柔性显示组件。
与现有技术相比，本发明的有益效果是：通过将显示层分为弯折区域以及非弯折区域，在不同的区域上调控无机层和有机层的材料和/或厚度等参数，其中第一无机层与显示层的模量差值小于第二无机层与显示层的模量差值，即弯折区域上的第一无机层与显示层的模量差别减小，和/或第一无机层的厚度小于第二无机层的厚度，使第一无机层更有利于弯折，如此能够在显示层弯折过程中降低第一无机层与显示层之间界面应力，改善显示层在弯折过程中产生的破裂现象，提升显示层的弯折可靠性。
【附图说明】
图1是本发明柔性显示组件实施例的结构示意图；
图2是本发明柔性显示组件的另一结构示意图；
图3是本发明柔性显示组件的又一结构示意图；
图4是本发明柔性显示组件制作方法实施例的流程示意图；
图5是本发明柔性显示组件制作方法实施例的具体制作步骤流程示意图；
图6是本发明柔性显示组件制作方法实施例的另一具体制作步骤流程示意图；
图7是本发明显示面板实施例的结构示意图；
【具体实施方式】
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅是本发明的一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
参阅图1，本发明柔性显示组件实施例，包括显示层10，第一薄膜层11以及第二薄膜层12。其中显示层10包括非弯折区域101与弯折区域102。第一薄膜层11包括依次形成于弯折区域102上的至少第一无机层111、第一有机层112。第二薄膜层12包括依次形成于非弯折区域101上的至少第二无机层121、第二有机层122。
其中，第一无机层111与显示层10的模量差值小于第二无机层121与显示层10的模量差值，和/或第一无机层111的厚度d小于第二无机层121的厚度D。第一薄膜层11的厚度与第二薄膜层12的厚度相等，也即第一薄膜层11的所有无机层与有机层厚度和与第二薄膜层12的所有有机层与无机层的厚度相等。
一般，显示层10是用于提供显示功能，例如OLED显示面板中显示层10包括有机发光材料涂层、基板、阳极、阴极、电子传递层、空穴注入层等，由于显示层10是柔性OLED显示面板的重要部分，在保证阻隔水氧的情况下同时也希望提高柔性显示面板的弯折性能。在本实施例中，将显示层10分为弯折区域102以及非弯折区域101，弯折区域102是能够用于弯折的区域，非弯折区域101是一般不进行弯折的区域，在不同的区域上调控无机层和有机层的材料和/或厚度等参数，以改善弯折区域102上的弯折可靠性，其中第一无机层111与显示层10的模量差值是指两者差值的绝对值，同理第二无机层121与显示层10的模量差值也是两者差值的绝对值。第一无机层111与显示层10的模量差值小于第二无机层121与显示层10的模量差值，即弯折区域102上的第一无机层111与显示层10的模量差缩小，在显示层10弯折过程中，降低第一无机层111与显示层10之间界面应力，改善显示层10在弯折过程中产生的破裂现象，提升显示层10的弯折可靠性。并且/或者，第一无机层111的厚度d小于第二无机层121的厚度D，通过减少第一无机层111的厚度，能够使得第一无机层111更易弯折，从而减少第一无机层111在弯折过程中产生的应力，以此改善显示层10在弯折过程中产生的破裂现象，提升显示层10的弯折可靠性。
可选的是，第一无机层111的材料包括氧化硅、氧化铝、氮化硅的至少一种。可选的是，第一无机层111的材料为氧化硅。在氧化硅、氧化铝、氮化硅三者中，氧化硅的模量最低，大致为70GPa，氮化硅的模量大致为220GPa，氧化铝的模量大致为300GPa。在本实施例中，模量一般指弹性模量，是用于衡量材料刚度的物理量。材料的模量越大，材料的刚度越大，越不容易弯折。反之，材料的模量越小，材料的韧性越大，易弯折。当第一无机层111是由混合材料制成，第一无机层111含量占比50%~98%，例如氧化硅、氧化铝、氮化硅三者混合制成，氧化硅含量占第一无机层111的材料总量50%~95%，可选的是60~90%，当然也可以低于50%。
可选的是，第二无机层121的材料包括氧化硅、氧化铝、氮化硅的至少一种。但是要保证第一无机层111与显示层10的模量差值小于第二无机层121与显示层10的模量差值，例如无机材料的模量比显示层10的模量大时，要保证第一无机层111的模量小于第二无机层121的模量。
可选的是，第一无机层111的厚度小于500nm。可选的是，第一无机层111的厚度小于450nm，或者小于300nm。在本实施例中，第一无机层的厚度选取一般需要兼顾阻隔水氧以及弯折性能。
可选的是，第二无机层121的厚度为500nm~2um。可选的是，第二无机层121的厚度为550nm~1.5um，可选的是700nm~1um。当然，第二无机层121的厚度也可以小于500nm，同时第一无机层111的厚度小于第二无机层121。
参阅图2，可选的是，第一薄膜层11进一步包括第三无机层113，形成于第一有机层112上。第二薄膜层12进一步包括第四无机层123，形成于第二有机层122上。其中第三无机层113的模量小于或者等于第四无机层123的模量，和/或第三无机层113的厚度小于或者等于第四无机层123的厚度。可选的是，其中第三无机层113的模量小于等于第四无机层123的模量，和/或第三无机层113的厚度小于第四无机层123的厚度，能够进一步保证第一薄膜层11的弯折性能。当然第三无机层113的模量可以大于第四无机层123的模量，和/或第三无机层113的厚度大于第四无机层123的厚度，但应保证第一薄膜层11的比第二薄膜层12易弯折。
在本实施例中，第一薄膜层11上可以包括多层无机层以及多层有机层，例如三层无机层以及两层有机层，依次形成在弯折区域102上的第一无机层111、第一有机层112、第三无机层113、第三有机层（图未示）、第五无机层（图未示）。其中，第一无机层111、第三无机层113、第五无机层之间的材料和/或厚度可以相同也可以不相同，第一有机层112与第三有机层的材料和/或厚度可以相同也不同。第二薄膜层12上也可以包括多层无机层以及多层有机层，例如三层无机层以及两层有机层，依次形成在弯折区域102上的第二无机层121、第二有机层122、第四无机层123、第四有机层（图未示）、第六无机层（图未示）。其中第二无机层121、第四无机层123与第六无机层之间的材料和/或厚度可以相同也可以不同，第二有机层122与第四有机层的材料和/或厚度可以相同也可以不同。
参阅图3，可选的是，第一薄膜层11的无机层与有机层的数量多于或等于第二薄膜层12的无机层与有机层的数量。可选的是，第一薄膜层11的无机层与有机层的数量多于第二薄膜层12的无机层与有机层的数量，例如第一薄膜层11包括三层无机层以及两层有机层，依次形成在弯折区域102上的第一无机层111、第一有机层112、第三无机层113、第三有机层、第五无机层，其厚度分别为400nm、2um、450nm、2um、600nm。第二薄膜层12包括两层无机层以及一层有机层，依次形成于非弯折区域101上的第二无机层121、第二有机层122、第四无机层123，厚度分别为1.2um、3um、1.25um。第一薄膜层11的厚度与第二薄膜层12的厚度相等。第一薄膜层11的无机层与有机层的数量多于第二薄膜层12的无机层与有机层的数量，不仅可以保证弯折区域102上的第一薄膜层11的弯折性能，同时可以保证显示层10具有良好的封装效果。
可选的是，第一有机层112包括聚甲基丙烯酸甲酯（PMMA）、六甲基二硅氧烷（HMDSO）中的至少一种。
可选的是，第二有机层122包括聚甲基丙烯酸甲酯、六甲基二硅氧烷中的至少一种。
可选的是，第一有机层112的厚度为1um~10um。
可选的是，第二有机层122的厚度为1um~10um。
在本实施例中，弯折区域102与非弯折区域101的相邻有机层之间或者相邻无机层之间的连接处在实际制作中可以制作连接为一体，可以或者还可以采用交错叠层，譬如第二有机层122可以延伸至第一无机层111与第二无机层121连接处上方，使之具备更好的封装效果。总之，各连接处都是紧密连接而形成有效的封装效果，图1-3仅为示意图。
参阅图4，本发明柔性显示组件的制作方法实施例包括以下步骤：
S1：将显示层10划分为非弯折区域101与弯折区域102。
具体地，在显示面板实际制作中，能够进行弯折的区域划为弯折区域102，例如显示面板中部可以进行弯折，其对应的显示层10的中部就划分为弯折区域102，其他则为非弯折区域101。
S2：在弯折区域102上依次形成至少第一无机层111、第一有机层112，且在非弯折区域101上依次形成至少第二无机层121、第二有机层122。
参阅图5，例如在弯折区域102上依次形成至少第一无机层111、第一有机层112。接着在非弯折区域101上依次形成至少第二无机层121、第二有机层122。也即，先形成弯折区域102上的无机层与有机层，再形成非弯折区域101上的无机层与有机层。或者先在非弯折区域101上形成无机层与有机层，接着在弯折区域102上形成无机层或者有机层。
或者，参阅图6，在弯折区域102上形成第一无机层111，接着在非弯折区域101上形成第二无机层121，然后在弯折区域102的第一无机层111上形成至少第一有机层112，接着在非弯折区域101上的第二无机层121形成至少第二有机层122。即在弯折区域102与非弯折区域101上交替形成无机层与有机层，当然在其他实施例中，还可以先形成非弯折区域101的第二无机层121，再在弯折区域102上形成第一无机层111，然后在非弯折区域101的第二无机层121上形成第二有机层122，接着在弯折区域102的第一无机层111上形成第一有机层112。
在本实施例中，并不限定弯折区域102以及非弯折区域101的无机层与有机层的形成顺序，例如可以先形成非弯折区域101的无机层与有机层，再形成弯折区域102的无机层与有几层。
其中，第一无机层111与显示层10的模量差值小于第二无机层121与显示层10的模量差值，和/或第一无机层111的厚度d小于第二无机层121的厚度D；在弯折区域102上依次形成的至少第一无机层111、第一有机层112的厚度与在非弯折区域101上依次形成的至少第二无机层121、第二有机层122厚度相等。
参阅图7，本发明显示面板实施例所述的显示面板2，包括本发明柔性显示组件实施例中的柔性显示组件1。
综上，通过将显示层10分为弯折区域102以及非弯折区域101，在不同的区域上调控无机层和有机层的材料和/或厚度等参数，其中第一无机层111与显示层10的模量差值小于第二无机层121与显示层10的模量差值，即弯折区域102上的第一无机层111与显示层10的模量差别减小，和/或第一无机层111的厚度d小于第二无机层121的厚度D，使第一无机层111更有利于弯折，在显示层10弯折过程中，能够降低第一无机层111与显示层10之间界面应力，改善显示层10在弯折过程中产生的破裂现象，提升显示层10的弯折可靠性。
以上所述仅为本发明的实施方式，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (17)

  1. 一种柔性显示组件，包括：
    显示层，包括非弯折区域与弯折区域；
    第一薄膜层，至少包括依次形成于所述弯折区域上的第一无机层、第一有机层；
    第二薄膜层，至少包括依次形成于所述非弯折区域上的第二无机层、第二有机层；
    其中，所述第一无机层与所述显示层的模量差小于所述第二无机层与所述显示层的模量差，和/或所述第一无机层的厚度小于所述第二无机层的厚度；所述第一薄膜层的厚度与所述第二薄膜层的厚度相等。
  2. 根据权利要求1所述的组件，其中，所述第一薄膜层进一步包括第三无机层，形成于所述第一有机层上；所述第二薄膜层进一步包括第四无机层，形成于所述第二有机层上；其中所述第三无机层的模量小于或者等于所述第四无机层的模量，和/或所述第三无机层的厚度小于或者等于所述第四无机层的厚度。
  3. 根据权利要求2所述的组件，其中，所述第一无机层的材料包括氧化硅、氧化铝、氮化硅的至少一种；和/或，
    所述第二无机层的材料包括氧化硅、氧化铝、氮化硅的至少一种。
  4. 根据权利要求3所述的组件，其特征在于：所述第一无机层的材料中，氧化硅含量占所述第一无机层的材料总量50%~100%。
  5. 根据权利要求1所述的组件，其特征在于：所述第一无机层的厚度小于500nm；和/或，
    所述第二无机层的厚度为500nm~2um。
  6. 根据权利要求1所述的组件，其中，所述第一有机层包括聚甲基丙烯酸甲酯、六甲基二硅氧烷中的至少一种；和/或，
    所述第二有机层包括聚甲基丙烯酸甲酯、六甲基二硅氧烷中的至少一种。
  7. 根据权利要求1所述的组件，其中，所述第一有机层的厚度为1um~10um；和/或，
    所述第二有机层的厚度为1um~10um。
  8. 根据权利要求1所述的组件，其中，所述第一薄膜层的无机层与有机层的数量多于或等于所述第二薄膜层的无机层与有机层的数量。
  9. 一种柔性显示组件的制作方法，包括：
    将显示层划分为非弯折区域与弯折区域；
    在所述弯折区域上至少依次形成第一无机层、第一有机层，且在所述非弯折区域上至少依次形成第二无机层、第二有机层；
    其中，所述第一无机层的模量小于所述第二无机层的模量，和/或所述第一无机层的厚度小于所述第二无机层的厚度；在所述弯折区域上依次形成的至少第一无机层、第一有机层的厚度与在所述非弯折区域上依次形成的至少第二无机层、第二有机层厚度相等。
  10. 根据权利要求9所述的方法，其中，所述方法进一步包括在所述弯折区域上的所述第一有机层上形成第三无机层，且进一步在所述非弯折区域上的所述第二有机层上形成第四无机层；其中所述第三无机层的模量小于或者等于所述第四无机层的模量，和/或所述第三无机层的厚度小于或者等于所述第四无机层的厚度。
  11. 根据权利要求10所述的方法，其中，所述第一无机层的材料包括氧化硅、氧化铝、氮化硅的至少一种；和/或，
    所述第二无机层的材料包括氧化硅、氧化铝、氮化硅的至少一种。
  12. 根据权利要求11所述的方法，其特征在于：所述第一无机层的材料中，氧化硅含量占所述第一无机层的材料总量50%~100%。
  13. 根据权利要求9所述的组件，其特征在于：所述第一无机层的厚度小于500nm；和/或，
    所述第二无机层的厚度为500nm~2um。
  14. 根据权利要求9所述的方法，其中，所述第一有机层包括聚甲基丙烯酸甲酯、六甲基二硅氧烷中的至少一种；和/或，
    所述第二有机层包括聚甲基丙烯酸甲酯、六甲基二硅氧烷中的至少一种。
  15. 根据权利要求9所述的方法，其中，所述第一有机层的厚度为1um~10um；和/或，
    所述第二有机层的厚度为1um~10um。
  16. 根据权利要求9所述的方法，其中，所述第一薄膜层的无机层与有机层的数量多于或等于所述第二薄膜层的无机层与有机层的数量。
  17. 一种显示面板，包括如权利要求1所述的柔性显示组件。
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