WO2019054217A1 - エポキシ樹脂組成物、及び電子部品装置 - Google Patents
エポキシ樹脂組成物、及び電子部品装置 Download PDFInfo
- Publication number
- WO2019054217A1 WO2019054217A1 PCT/JP2018/032497 JP2018032497W WO2019054217A1 WO 2019054217 A1 WO2019054217 A1 WO 2019054217A1 JP 2018032497 W JP2018032497 W JP 2018032497W WO 2019054217 A1 WO2019054217 A1 WO 2019054217A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- epoxy resin
- resin composition
- group
- inorganic filler
- mass
- Prior art date
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 208
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 208
- 239000000203 mixture Substances 0.000 title claims abstract description 153
- -1 silane compound Chemical class 0.000 claims abstract description 115
- 239000011256 inorganic filler Substances 0.000 claims abstract description 111
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 111
- 229910000077 silane Inorganic materials 0.000 claims abstract description 81
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 48
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 20
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 19
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 19
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 4
- 125000000524 functional group Chemical group 0.000 claims description 26
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 18
- 125000003545 alkoxy group Chemical group 0.000 claims description 18
- 125000003700 epoxy group Chemical group 0.000 claims description 16
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 15
- 229910052582 BN Inorganic materials 0.000 claims description 4
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 4
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 4
- 239000000395 magnesium oxide Substances 0.000 claims description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 4
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 4
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 4
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- 150000002430 hydrocarbons Chemical group 0.000 description 79
- 239000002245 particle Substances 0.000 description 45
- 239000007822 coupling agent Substances 0.000 description 34
- 238000000034 method Methods 0.000 description 29
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 28
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 24
- 229920005989 resin Polymers 0.000 description 24
- 239000011347 resin Substances 0.000 description 24
- 238000000465 moulding Methods 0.000 description 21
- 238000011049 filling Methods 0.000 description 15
- 238000011156 evaluation Methods 0.000 description 13
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 12
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 12
- 239000003063 flame retardant Substances 0.000 description 11
- 239000004065 semiconductor Substances 0.000 description 11
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 10
- 125000004429 atom Chemical group 0.000 description 10
- 238000000748 compression moulding Methods 0.000 description 10
- 239000005011 phenolic resin Substances 0.000 description 10
- 150000002989 phenols Chemical class 0.000 description 10
- 150000004756 silanes Chemical class 0.000 description 10
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 9
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical class [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 239000007983 Tris buffer Substances 0.000 description 9
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 9
- 239000011342 resin composition Substances 0.000 description 9
- 238000007789 sealing Methods 0.000 description 9
- 238000001721 transfer moulding Methods 0.000 description 9
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 8
- 239000000654 additive Substances 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- 239000003086 colorant Substances 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 125000001424 substituent group Chemical group 0.000 description 8
- QYJYJTDXBIYRHH-UHFFFAOYSA-N trimethoxy-[8-(oxiran-2-ylmethoxy)octyl]silane Chemical compound C(C1CO1)OCCCCCCCC[Si](OC)(OC)OC QYJYJTDXBIYRHH-UHFFFAOYSA-N 0.000 description 8
- GAYWTJPBIQKDRC-UHFFFAOYSA-N 8-trimethoxysilyloctyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCCCCCCOC(=O)C(C)=C GAYWTJPBIQKDRC-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 6
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 6
- 238000009833 condensation Methods 0.000 description 6
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 6
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 6
- 229920003986 novolac Polymers 0.000 description 6
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 6
- 229960003493 octyltriethoxysilane Drugs 0.000 description 6
- 229920001568 phenolic resin Polymers 0.000 description 6
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 6
- 239000003566 sealing material Substances 0.000 description 6
- 229940005561 1,4-benzoquinone Drugs 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 5
- 230000002378 acidificating effect Effects 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000004848 polyfunctional curative Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 4
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 4
- NADHCXOXVRHBHC-UHFFFAOYSA-N 2,3-dimethoxycyclohexa-2,5-diene-1,4-dione Chemical compound COC1=C(OC)C(=O)C=CC1=O NADHCXOXVRHBHC-UHFFFAOYSA-N 0.000 description 4
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 4
- 230000005494 condensation Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000155 melt Substances 0.000 description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 4
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- 229910052724 xenon Inorganic materials 0.000 description 4
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 4
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 3
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 3
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000002723 alicyclic group Chemical group 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 150000001642 boronic acid derivatives Chemical class 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000006082 mold release agent Substances 0.000 description 3
- UTOPWMOLSKOLTQ-UHFFFAOYSA-N octacosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCCCC(O)=O UTOPWMOLSKOLTQ-UHFFFAOYSA-N 0.000 description 3
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 3
- 239000005060 rubber Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- ZEGDFCCYTFPECB-UHFFFAOYSA-N 2,3-dimethoxy-1,4-benzoquinone Natural products C1=CC=C2C(=O)C(OC)=C(OC)C(=O)C2=C1 ZEGDFCCYTFPECB-UHFFFAOYSA-N 0.000 description 2
- AIACLXROWHONEE-UHFFFAOYSA-N 2,3-dimethylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=C(C)C(=O)C=CC1=O AIACLXROWHONEE-UHFFFAOYSA-N 0.000 description 2
- SENUUPBBLQWHMF-UHFFFAOYSA-N 2,6-dimethylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=CC(=O)C=C(C)C1=O SENUUPBBLQWHMF-UHFFFAOYSA-N 0.000 description 2
- VTWDKFNVVLAELH-UHFFFAOYSA-N 2-methylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=CC(=O)C=CC1=O VTWDKFNVVLAELH-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- WCULYVVFGLYOBZ-UHFFFAOYSA-N 6-trimethoxysilylhexyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCCCCOC(=O)C=C WCULYVVFGLYOBZ-UHFFFAOYSA-N 0.000 description 2
- JOVCTEPPTIOAPX-UHFFFAOYSA-N 8-trimethoxysilyloctyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCCCCCCOC(=O)C=C JOVCTEPPTIOAPX-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 244000043261 Hevea brasiliensis Species 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 229920000459 Nitrile rubber Polymers 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- HVRYCOAMCFQMEY-UHFFFAOYSA-N [heptyl(dimethoxy)silyl]oxymethyl prop-2-enoate Chemical compound C(C=C)(=O)OCO[Si](OC)(OC)CCCCCCC HVRYCOAMCFQMEY-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001343 alkyl silanes Chemical class 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 229940125904 compound 1 Drugs 0.000 description 2
- 229940125782 compound 2 Drugs 0.000 description 2
- 229940126214 compound 3 Drugs 0.000 description 2
- 229940125898 compound 5 Drugs 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000000280 densification Methods 0.000 description 2
- GDVKFRBCXAPAQJ-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide Chemical class [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O GDVKFRBCXAPAQJ-UHFFFAOYSA-A 0.000 description 2
- CRGRWBQSZSQVIE-UHFFFAOYSA-N diazomethylbenzene Chemical compound [N-]=[N+]=CC1=CC=CC=C1 CRGRWBQSZSQVIE-UHFFFAOYSA-N 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- VRINOTYEGADLMW-UHFFFAOYSA-N heptyl(trimethoxy)silane Chemical compound CCCCCCC[Si](OC)(OC)OC VRINOTYEGADLMW-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 229910000000 metal hydroxide Inorganic materials 0.000 description 2
- 150000004692 metal hydroxides Chemical class 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 2
- 150000004780 naphthols Chemical class 0.000 description 2
- 229920003052 natural elastomer Polymers 0.000 description 2
- 229920001194 natural rubber Polymers 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- 150000003003 phosphines Chemical group 0.000 description 2
- 150000004714 phosphonium salts Chemical class 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000004053 quinones Chemical class 0.000 description 2
- 229960001755 resorcinol Drugs 0.000 description 2
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical compound NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 2
- 235000021286 stilbenes Nutrition 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 2
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 2
- 150000003609 titanium compounds Chemical class 0.000 description 2
- SAWDTKLQESXBDN-UHFFFAOYSA-N triethoxy(heptyl)silane Chemical compound CCCCCCC[Si](OCC)(OCC)OCC SAWDTKLQESXBDN-UHFFFAOYSA-N 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 2
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 2
- VRHBBGAASHNPHT-UHFFFAOYSA-N trimethoxy-[6-(oxiran-2-ylmethoxy)hexyl]silane Chemical compound CO[Si](OC)(OC)CCCCCCOCC1CO1 VRHBBGAASHNPHT-UHFFFAOYSA-N 0.000 description 2
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 2
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical group C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 2
- WXAZIUYTQHYBFW-UHFFFAOYSA-N tris(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-N 0.000 description 2
- UIXPTCZPFCVOQF-UHFFFAOYSA-N ubiquinone-0 Chemical compound COC1=C(OC)C(=O)C(C)=CC1=O UIXPTCZPFCVOQF-UHFFFAOYSA-N 0.000 description 2
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- 150000003739 xylenols Chemical class 0.000 description 2
- 150000003755 zirconium compounds Chemical class 0.000 description 2
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 2
- QJIMTLTYXBDJFC-UHFFFAOYSA-N (4-methylphenyl)-diphenylphosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QJIMTLTYXBDJFC-UHFFFAOYSA-N 0.000 description 1
- QKUSYGZVIAWWPY-UHFFFAOYSA-N 1,3-dioxane;7-oxabicyclo[4.1.0]heptane Chemical compound C1COCOC1.C1CCCC2OC21 QKUSYGZVIAWWPY-UHFFFAOYSA-N 0.000 description 1
- MODAACUAXYPNJH-UHFFFAOYSA-N 1-(methoxymethyl)-4-[4-(methoxymethyl)phenyl]benzene Chemical group C1=CC(COC)=CC=C1C1=CC=C(COC)C=C1 MODAACUAXYPNJH-UHFFFAOYSA-N 0.000 description 1
- FQJZPYXGPYJJIH-UHFFFAOYSA-N 1-bromonaphthalen-2-ol Chemical class C1=CC=CC2=C(Br)C(O)=CC=C21 FQJZPYXGPYJJIH-UHFFFAOYSA-N 0.000 description 1
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- VADKRMSMGWJZCF-UHFFFAOYSA-N 2-bromophenol Chemical compound OC1=CC=CC=C1Br VADKRMSMGWJZCF-UHFFFAOYSA-N 0.000 description 1
- ISPYQTSUDJAMAB-UHFFFAOYSA-N 2-chlorophenol Chemical compound OC1=CC=CC=C1Cl ISPYQTSUDJAMAB-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- KQDJTBPASNJQFQ-UHFFFAOYSA-N 2-iodophenol Chemical compound OC1=CC=CC=C1I KQDJTBPASNJQFQ-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- RLQZIECDMISZHS-UHFFFAOYSA-N 2-phenylcyclohexa-2,5-diene-1,4-dione Chemical compound O=C1C=CC(=O)C(C=2C=CC=CC=2)=C1 RLQZIECDMISZHS-UHFFFAOYSA-N 0.000 description 1
- MNOJRWOWILAHAV-UHFFFAOYSA-N 3-bromophenol Chemical compound OC1=CC=CC(Br)=C1 MNOJRWOWILAHAV-UHFFFAOYSA-N 0.000 description 1
- HORNXRXVQWOLPJ-UHFFFAOYSA-N 3-chlorophenol Chemical compound OC1=CC=CC(Cl)=C1 HORNXRXVQWOLPJ-UHFFFAOYSA-N 0.000 description 1
- FXTKWBZFNQHAAO-UHFFFAOYSA-N 3-iodophenol Chemical compound OC1=CC=CC(I)=C1 FXTKWBZFNQHAAO-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- ARUBXNBYMCVENE-UHFFFAOYSA-N 4-(4-bromophenyl)phenol Chemical class C1=CC(O)=CC=C1C1=CC=C(Br)C=C1 ARUBXNBYMCVENE-UHFFFAOYSA-N 0.000 description 1
- ZLVFYUORUHNMBO-UHFFFAOYSA-N 4-bromo-2,6-dimethylphenol Chemical compound CC1=CC(Br)=CC(C)=C1O ZLVFYUORUHNMBO-UHFFFAOYSA-N 0.000 description 1
- IWJGMJHAIUBWKT-UHFFFAOYSA-N 4-bromo-2-methylphenol Chemical compound CC1=CC(Br)=CC=C1O IWJGMJHAIUBWKT-UHFFFAOYSA-N 0.000 description 1
- WMUWDPLTTLJNPE-UHFFFAOYSA-N 4-bromo-3,5-dimethylphenol Chemical compound CC1=CC(O)=CC(C)=C1Br WMUWDPLTTLJNPE-UHFFFAOYSA-N 0.000 description 1
- GPOQODYGMUTOQL-UHFFFAOYSA-N 4-bromo-3-methylphenol Chemical compound CC1=CC(O)=CC=C1Br GPOQODYGMUTOQL-UHFFFAOYSA-N 0.000 description 1
- GZFGOTFRPZRKDS-UHFFFAOYSA-N 4-bromophenol Chemical compound OC1=CC=C(Br)C=C1 GZFGOTFRPZRKDS-UHFFFAOYSA-N 0.000 description 1
- LVSPDZAGCBEQAV-UHFFFAOYSA-N 4-chloronaphthalen-1-ol Chemical class C1=CC=C2C(O)=CC=C(Cl)C2=C1 LVSPDZAGCBEQAV-UHFFFAOYSA-N 0.000 description 1
- WXNZTHHGJRFXKQ-UHFFFAOYSA-N 4-chlorophenol Chemical compound OC1=CC=C(Cl)C=C1 WXNZTHHGJRFXKQ-UHFFFAOYSA-N 0.000 description 1
- VSMDINRNYYEDRN-UHFFFAOYSA-N 4-iodophenol Chemical compound OC1=CC=C(I)C=C1 VSMDINRNYYEDRN-UHFFFAOYSA-N 0.000 description 1
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- YLDFTMJPQJXGSS-UHFFFAOYSA-N 6-bromo-2-naphthol Chemical class C1=C(Br)C=CC2=CC(O)=CC=C21 YLDFTMJPQJXGSS-UHFFFAOYSA-N 0.000 description 1
- NHJIDZUQMHKGRE-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-yl 2-(7-oxabicyclo[4.1.0]heptan-4-yl)acetate Chemical compound C1CC2OC2CC1OC(=O)CC1CC2OC2CC1 NHJIDZUQMHKGRE-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 235000010893 Bischofia javanica Nutrition 0.000 description 1
- 240000005220 Bischofia javanica Species 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 229920006311 Urethane elastomer Polymers 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 239000004844 aliphatic epoxy resin Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000005036 alkoxyphenyl group Chemical group 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical group [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000007771 core particle Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- 125000001891 dimethoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229910052839 forsterite Inorganic materials 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- ARRNBPCNZJXHRJ-UHFFFAOYSA-M hydron;tetrabutylazanium;phosphate Chemical compound OP(O)([O-])=O.CCCC[N+](CCCC)(CCCC)CCCC ARRNBPCNZJXHRJ-UHFFFAOYSA-M 0.000 description 1
- 229910001701 hydrotalcite Inorganic materials 0.000 description 1
- 229960001545 hydrotalcite Drugs 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 239000004206 montan acid ester Substances 0.000 description 1
- 235000013872 montan acid ester Nutrition 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000003826 tablet Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- MCZDHTKJGDCTAE-UHFFFAOYSA-M tetrabutylazanium;acetate Chemical compound CC([O-])=O.CCCC[N+](CCCC)(CCCC)CCCC MCZDHTKJGDCTAE-UHFFFAOYSA-M 0.000 description 1
- GTCDARUMAMVCRO-UHFFFAOYSA-M tetraethylazanium;acetate Chemical compound CC([O-])=O.CC[N+](CC)(CC)CC GTCDARUMAMVCRO-UHFFFAOYSA-M 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
- C08K5/5419—Silicon-containing compounds containing oxygen containing at least one Si—O bond containing at least one Si—C bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5425—Silicon-containing compounds containing oxygen containing at least one C=C bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5435—Silicon-containing compounds containing oxygen containing oxygen in a ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/295—Organic, e.g. plastic containing a filler
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2227—Oxides; Hydroxides of metals of aluminium
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2203/00—Applications
- C08L2203/20—Applications use in electrical or conductive gadgets
- C08L2203/206—Applications use in electrical or conductive gadgets use in coating or encapsulating of electronic parts
Definitions
- the present disclosure relates to an epoxy resin composition and an electronic component device.
- a compression molding method and the like can be mentioned in addition to a transfer molding method which is usually used (for example, see Patent Document 1).
- the powdery particulate resin composition is supplied to be opposed to the object to be sealed (such as a substrate provided with an electronic element such as a semiconductor chip) held in a mold, and the object to be sealed is It is the method of resin-sealing by compressing with a granular resin composition.
- the wire to be incorporated is thinned along with the multifunctionalization of the package, it is an issue to suppress the generation of the wire flow and the like in the transfer molding generally used as a sealing method. On the other hand, it is also desired to suppress the viscosity from the viewpoint of the filling property and the like even by the compression molding method.
- the amount of heat generation tends to increase with the miniaturization and densification of electronic component devices, and how to dissipate heat is an important issue. Therefore, the heat conductivity is enhanced by mixing an inorganic filler having a high heat conductivity with the sealing material.
- the viscosity of the sealing material increases as the amount thereof increases, and the flowability may decrease, which may cause problems such as filling failure and wire flow.
- liquidity of a sealing material is proposed by using a specific phosphorus compound as a hardening accelerator (for example, refer patent document 2).
- JP 2008-279599 A Japanese Patent Laid-Open No. 9-157497
- a resin composition which can be used as a sealing material in which an increase in viscosity is suppressed while maintaining thermal conductivity at a higher level. Is desired.
- the first embodiment of the present disclosure has an object to provide an electronic component device including an epoxy resin composition having a low viscosity and an element sealed by the epoxy resin composition.
- a second embodiment of the present disclosure is to provide an epoxy resin composition having high thermal conductivity and suppressing an increase in viscosity, and an electronic component device provided with a device sealed therewith. It will be an issue.
- Embodiments of the present disclosure include the following aspects.
- ⁇ 2> The epoxy resin composition according to ⁇ 1>, wherein the linear hydrocarbon group has at least one functional group selected from a (meth) acryloyl group, an epoxy group, and an alkoxy group.
- ⁇ 3> The epoxy resin composition according to ⁇ 1> or ⁇ 2>, wherein the linear hydrocarbon group has a (meth) acryloyl group.
- ⁇ 4> The epoxy resin composition according to any one of ⁇ 1> to ⁇ 3>, wherein the content of the inorganic filler is 30% by volume to 99% by volume.
- ⁇ 5> The epoxy resin composition according to any one of ⁇ 1> to ⁇ 4>, wherein the thermal conductivity of the inorganic filler is 20 W / (m ⁇ K) or more.
- the inorganic filler having a thermal conductivity of 20 W / (m ⁇ K) or more is at least one selected from the group consisting of alumina, silicon nitride, boron nitride, aluminum nitride, magnesium oxide, and silicon carbide
- the epoxy resin composition as described in ⁇ 5> containing.
- ⁇ 7> An electronic component device comprising an element sealed with the epoxy resin composition according to any one of ⁇ 1> to ⁇ 6>.
- an electronic component device comprising a low viscosity epoxy resin composition and a device sealed with the epoxy resin composition.
- an epoxy resin composition having high thermal conductivity and suppressing an increase in viscosity, and an electronic component device provided with a device sealed therewith. Ru.
- a numerical range indicated by using “to” indicates a range including numerical values described before and after “to” as the minimum value and the maximum value, respectively.
- the upper limit value or the lower limit value described in one numerical value range may be replaced with the upper limit value or the lower limit value of the other stepwise description numerical value range in the numerical value range described stepwise in the present disclosure. .
- each component may contain a plurality of corresponding substances.
- the content or content of each component is the total content or content of the plurality of substances present in the composition unless otherwise specified.
- particles corresponding to each component may contain a plurality of types.
- the particle diameter of each component means the value for the mixture of the plurality of particles present in the composition unless otherwise specified.
- the (meth) acryloyl group means at least one of an acryloyl group and a methacryloyl group.
- the epoxy resin composition according to the first embodiment contains an epoxy resin, a curing agent, an inorganic filler, and a silane compound having a structure in which a chain hydrocarbon group having 6 or more carbon atoms is bonded to a silicon atom. Do.
- a silane compound having a structure in which a chain hydrocarbon group having 6 or more carbon atoms is bonded to a silicon atom is also referred to as a “specific silane compound”.
- the epoxy resin composition according to the first embodiment may contain other components as needed.
- the epoxy resin composition according to the first embodiment contains an epoxy resin.
- the type of epoxy resin is not particularly limited as long as it has an epoxy group in the molecule.
- the epoxy resin is at least one selected from the group consisting of phenol compounds such as phenol, cresol, xylenol, resorcine, catechol, bisphenol A, bisphenol F and naphthol compounds such as ⁇ -naphthol, ⁇ -naphthol and dihydroxynaphthalene.
- Novolak type epoxy resin (phenol novolac type epoxy resin) which is obtained by epoxidizing a novolac resin obtained by condensation or cocondensation of a phenolic compound of the type with an aliphatic aldehyde compound such as formaldehyde, acetaldehyde or propionaldehyde under acidic catalyst Epoxy resin, ortho cresol novolac epoxy resin, etc.); condensation of the above-mentioned phenolic compound with an aromatic aldehyde compound such as benzaldehyde or salicylaldehyde under an acidic catalyst Is a triphenylmethane type epoxy resin obtained by epoxidizing a triphenylmethane type phenol resin obtained by cocondensation; a novolak obtained by cocondensing the above-mentioned phenol compound and naphthol compound with an aldehyde compound under an acidic catalyst Copolymer-type epoxy resin which is obtained by epoxidizing resin; diphenyl
- the epoxy equivalent (molecular weight / epoxy group number) of the epoxy resin is not particularly limited. From the viewpoint of the balance of various properties such as moldability, reflow resistance and electrical reliability, it is preferably 100 g / eq to 1000 g / eq, and more preferably 150 g / eq to 500 g / eq.
- the temperature is preferably 40 ° C. to 180 ° C. from the viewpoint of moldability and reflow resistance, and more preferably 50 ° C. to 130 ° C. from the viewpoint of handleability in preparation of the epoxy resin composition.
- the melting point of the epoxy resin is a value measured by differential scanning calorimetry (DSC), and the softening point of the epoxy resin is a value measured by a method (ring and ball method) according to JIS K 7234: 1986.
- the content of the epoxy resin in the epoxy resin composition is preferably 0.5% by mass to 50% by mass, and preferably 2% by mass to 30% by mass, in view of strength, fluidity, heat resistance, moldability, etc.
- the content is more preferably 2% by mass to 20% by mass.
- the epoxy resin composition according to the first embodiment contains a curing agent.
- the type of curing agent is not particularly limited, and can be selected according to the type of resin, the desired properties of the epoxy resin composition, and the like.
- a curing agent a phenol curing agent, an amine curing agent, an acid anhydride curing agent, a polymercaptan curing agent, a polyaminoamide curing agent, an isocyanate curing agent, a blocked isocyanate curing agent and the like can be mentioned.
- the curing agent is preferably one having a phenolic hydroxyl group in the molecule (phenol curing agent).
- phenolic curing agents polyhydric phenol compounds such as resorcin, catechol, bisphenol A, bisphenol F, and substituted or unsubstituted biphenols; phenol, cresol, xylenol, resorcin, catechol, bisphenol A, bisphenol F, phenylphenol And at least one phenolic compound selected from the group consisting of phenol compounds such as aminophenol and naphthol compounds such as .alpha.-naphthol, .beta.-naphthol, dihydroxynaphthalene and aldehydes such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde and salicylaldehyde
- phenol compounds such as resorcin, catechol, bisphenol A, bisphenol F, and substituted or unsubstituted biphenols
- phenol curing agents may be used alone or in combination of two or more.
- the functional group equivalent of the curing agent (hydroxyl equivalent in the case of a phenol curing agent) is not particularly limited. From the viewpoint of the balance of various properties such as moldability, reflow resistance, electrical reliability, etc., 70 g / eq to 1000 g / eq is preferable, and 80 g / eq to 500 g / eq is more preferable.
- the functional group equivalent of the curing agent is a value measured by a method according to JIS K 0070: 1992.
- the temperature is preferably 40 ° C. to 180 ° C., and from the viewpoint of handleability at the time of production of the epoxy resin composition, it is more preferably 50 ° C. to 130 ° C.
- the melting point or softening point of the curing agent is a value measured in the same manner as the melting point or softening point of the epoxy resin.
- the equivalent ratio of the epoxy resin to the curing agent is not particularly limited.
- the ratio is preferably in the range of 0.5 to 2.0, and more preferably in the range of 0.6 to 1.3. It is more preferable to set in the range of 0.8 to 1.2 from the viewpoint of moldability and reflow resistance.
- the epoxy resin composition according to the first embodiment contains an inorganic filler.
- the material of the inorganic filler is not particularly limited. Specifically as the material of the inorganic filler, fused silica, crystalline silica, glass, alumina, calcium carbonate, zirconium silicate, calcium silicate, silicon silicate, silicon nitride, aluminum nitride, boron nitride, magnesium oxide, silicon carbide, beryllia, zirconia And inorganic materials such as zircon, forsterite, steatite, spinel, mullite, titania, talc, clay and mica. You may use the inorganic filler which has a flame-retardant effect.
- Examples of the inorganic filler having a flame retardant effect include composite metal hydroxides such as aluminum hydroxide, magnesium hydroxide, a composite hydroxide of magnesium and zinc, zinc borate and the like.
- silica such as fused silica is preferable from the viewpoint of reducing the linear expansion coefficient, and alumina is preferable from the viewpoint of high thermal conductivity.
- the shape of the inorganic filler is not particularly limited, and is preferably spherical in terms of the filling property and the mold abradability.
- the inorganic filler may be used alone or in combination of two or more.
- two or more types of inorganic fillers are used in combination
- two inorganic fillers having the same average particle size but different components are used.
- the case where it uses more than a kind and the case where two or more kinds of inorganic fillers from which an average particle diameter and a kind differ differ are mentioned.
- the content of the inorganic filler in the epoxy resin composition according to the first embodiment is not particularly limited. From the viewpoint of further improving the properties such as the thermal expansion coefficient, thermal conductivity, and elastic modulus of the cured product, the content of the inorganic filler is preferably 30% by volume or more of the entire epoxy resin composition, and 35% by volume The above is more preferable, 40% by volume or more is further preferable, 45% by volume or more is particularly preferable, and 50% by volume or more is extremely preferable.
- the content of the inorganic filler is preferably 99% by volume or less, preferably 98% by volume or less, of the entire epoxy resin composition, and 97% by volume It is more preferable that
- the content of the inorganic filler may be 70% by volume to 99% by volume of the entire epoxy resin composition, and 80% by volume to 99% by volume. It may be 83% by volume to 99% by volume, or 85% by volume to 99% by volume.
- the content of the inorganic filler in the epoxy resin composition is measured as follows. First, the total mass of the cured product (epoxy resin molded product) of the epoxy resin composition is measured, and the epoxy resin molded product is calcined at 400 ° C. for 2 hours and then at 700 ° C. for 3 hours to evaporate the resin component and leave it Measure the mass of the inorganic filler. The volume is calculated from each mass obtained and each specific gravity, and the ratio of the volume of the inorganic filler to the total volume of the epoxy resin molded product is obtained as the content of the inorganic filler.
- the inorganic filler When the inorganic filler is particulate, its average particle size is not particularly limited.
- the volume average particle diameter of the whole inorganic filler is preferably 80 ⁇ m or less, may be 50 ⁇ m or less, may be 40 ⁇ m or less, may be 30 ⁇ m or less, or 25 ⁇ m or less. It may be 20 ⁇ m or less, or 15 ⁇ m.
- the volume average particle diameter of the entire inorganic filler is preferably 0.1 ⁇ m or more, more preferably 0.2 ⁇ m or more, and still more preferably 0.3 ⁇ m or more. When the volume average particle diameter of the inorganic filler is 0.1 ⁇ m or more, the increase in the viscosity of the epoxy resin composition tends to be further suppressed.
- the volume average particle size of the inorganic filler should be measured as the particle size (D50) at which the accumulation from the small diameter side becomes 50% in the volume-based particle size distribution measured by the laser scattering diffraction particle size distribution measuring apparatus. Can.
- the maximum particle diameter (cut point) of the inorganic filler is controlled from the viewpoint of the improvement of the filling property in the narrow gap when the epoxy resin composition is used for a mold underfill or the like.
- the maximum particle size of the inorganic filler may be appropriately adjusted, and from the viewpoint of the filling property is preferably 105 ⁇ m or less, more preferably 75 ⁇ m or less, and may be 60 ⁇ m or less, 40 ⁇ m or less May be
- the maximum particle diameter can be measured by a laser diffraction particle size distribution analyzer (manufactured by Horiba, Ltd., trade name: LA920).
- the epoxy resin composition according to the first embodiment contains a specific silane compound.
- the specific silane compound has a structure in which a chain hydrocarbon group having 6 or more carbon atoms (hereinafter, a chain hydrocarbon group having 6 or more carbon atoms is also simply referred to as a chain hydrocarbon group) is bonded to a silicon atom.
- the chain hydrocarbon group may be branched or may have a substituent.
- the number of carbon atoms of the chain hydrocarbon group means the number of carbon atoms of branched or substituted carbon atoms.
- the chain hydrocarbon group may or may not contain unsaturated bonds, and preferably does not contain unsaturated bonds.
- the specific silane compound is considered to function as a coupling agent of the inorganic filler in the epoxy resin composition.
- the number of chain hydrocarbon groups bonded to a silicon atom may be 1 to 4, preferably 1 to 3, more preferably 1 or 2, and 1 Is more preferred.
- the atoms or atom groups other than chain hydrocarbon groups bonded to a silicon atom are not particularly limited, and are independent of each other.
- one or more alkoxy is preferably bonded in addition to the chain hydrocarbon group, and one chain hydrocarbon group and three alkoxy groups are bonded to a silicon atom. More preferable.
- the carbon number of the chain hydrocarbon group in the specific silane compound is 6 or more, preferably 7 or more, and more preferably 8 or more, from the viewpoint of suppressing the viscosity.
- the substituent is not particularly limited.
- the substituent may be present at the end of the chain hydrocarbon group, or may be present at the side chain of the chain hydrocarbon group.
- the chain hydrocarbon group preferably has at least one functional group (hereinafter also referred to as a specific functional group) selected from (meth) acryloyl group, epoxy group and alkoxy group, and (meth) acryloyl group and epoxy It is more preferable to have at least one functional group selected from groups, and it is further preferable to have a (meth) acryloyl group.
- the specific functional group may be present at the end of the chain hydrocarbon group, or may be present at the side chain of the chain hydrocarbon group. From the viewpoint of suppressing the viscosity, the specific functional group is preferably present at the end of the chain hydrocarbon group.
- the viscosity of the epoxy resin composition tends to further decrease. Although this reason is not necessarily clear, when the chain hydrocarbon group of the specific silane compound has the specific functional group, the compatibility between the specific functional group and the epoxy resin is enhanced, and the dispersibility of the epoxy resin and the inorganic filler is improved. It is presumed that it is to do.
- the (meth) acryloyl group may be directly bonded to the chain hydrocarbon group, or may be bonded via another atom or atomic group .
- the chain hydrocarbon group may have a (meth) acryloyloxy group.
- the chain hydrocarbon group preferably has a methacryloyloxy group.
- the chain hydrocarbon group has an epoxy group
- the epoxy group may be directly bonded to the chain hydrocarbon group, or may be bonded via another atom or atomic group.
- the chain hydrocarbon group may have a glycidyloxy group, an alicyclic epoxy group, and the like.
- the chain hydrocarbon group preferably has a glycidyloxy group.
- the alkoxy group may be directly bonded to the chain hydrocarbon group, or may be bonded via another atom or atomic group, and the chain hydrocarbon group Preferably it is directly attached to
- the alkoxy group is not particularly limited, and may be a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group or the like. Among them, from the viewpoint of easy availability, it is preferable that the chain hydrocarbon group has a methoxy group.
- the equivalent (molecular weight / number of functional groups) of at least one functional group selected from the (meth) acryloyl group, the epoxy group, and the alkoxy group in the specific silane compound is not particularly limited. From the viewpoint of lowering the viscosity of the epoxy resin composition, it is preferably 200 g / eq to 420 g / eq, more preferably 210 g / eq to 405 g / eq, and 230 g / eq to 390 g / eq. More preferable.
- silane compounds include hexyltrimethoxysilane, heptyltrimethoxysilane, octyltrimethoxysilane, hexyltriethoxysilane, heptyltriethoxysilane, octyltriethoxysilane, 6-glycidoxyhexyltrimethoxysilane, 7-glycid Xiheptyl trimethoxysilane, 8-glycidoxyoctyl trimethoxysilane, 6- (meth) acryloxyhexyl trimethoxysilane, 7- (meth) acryloxy heptyl trimethoxysilane, 8- (meth) acryloxyoctyl trimethoxy Silane, decyltrimethoxysilane and the like can be mentioned.
- 8-glycidoxyoctyltrimethoxysilane and 8-methacryloxyoctyltrimethoxysilane are preferable from the viewpoint of lowering the viscosity of the epoxy resin composition.
- the specific silane compounds may be used alone or in combination of two or more.
- the specific silane compounds may be synthesized or those commercially available.
- Specific silane compounds commercially available include Shin-Etsu Chemical Co., Ltd. KBM-3063 (Hexyltrimethoxysilane), KBE-3063 (Hexyltriethoxysilane), KBE-3083 (Octyltriethoxysilane), KBM-4803 8-glycidoxyoctyltrimethoxysilane), KBM-5803 (8-methacryloxyoctyltrimethoxysilane), KBM-3103C (decyltrimethoxysilane), and the like.
- the content of the specific silane compound in the epoxy resin composition according to the first embodiment is not particularly limited.
- the content of the specific silane compound may be 0.01 parts by mass or more, and may be 0.02 parts by mass or more with respect to 100 parts by mass of the inorganic filler. Further, the content of the specific silane compound is preferably 5 parts by mass or less, and more preferably 2.5 parts by mass or less with respect to 100 parts by mass of the inorganic filler.
- the content of the specific silane compound is 0.01 parts by mass or more based on 100 parts by mass of the inorganic filler, a composition having a low viscosity tends to be obtained.
- the content of the specific silane compound is 5 parts by mass or less with respect to 100 parts by mass of the inorganic filler, the moldability of the package tends to be further improved.
- the epoxy resin composition according to the first embodiment may further contain another coupling agent in addition to the specific silane compound.
- Other coupling agents are not particularly limited as long as they are generally used in epoxy resin compositions.
- Other coupling agents include silane compounds such as epoxysilane, mercaptosilane, aminosilane, alkylsilane, ureidosilane, vinylsilane (except for specific silane compounds), titanium compounds, aluminum chelate compounds, aluminum / zirconium compounds, etc.
- Known coupling agents may be used alone or in combination of two or more.
- the total content of the specific silane compound and the other coupling agent is 100 parts by mass of the inorganic filler. It may be 0.01 parts by mass or more, and may be 0.02 parts by mass or more.
- the total content of the specific silane compound and the other coupling agent is preferably 5 parts by mass or less, and more preferably 2.5 parts by mass or less with respect to 100 parts by mass of the inorganic filler.
- the total content of the specific silane compound and the other coupling agent is 0.01 parts by mass or more with respect to 100 parts by mass of the inorganic filler, a composition having a low viscosity tends to be obtained.
- the total content of the specific silane compound and the other coupling agent is 5 parts by mass or less with respect to 100 parts by mass of the inorganic filler, the moldability of the package tends to be further improved.
- the epoxy resin composition according to the first embodiment contains another coupling agent other than the specific silane compound, the specific silane compound and the other coupling agent from the viewpoint of exhibiting the function of the specific silane compound well.
- the content of the other coupling agent to the total amount is preferably 90% by mass or less, more preferably 70% by mass or less, and still more preferably 50% by mass or less.
- the epoxy resin composition according to the first embodiment may contain a curing accelerator.
- the type of curing accelerator is not particularly limited, and can be selected according to the type of epoxy resin, the desired properties of the epoxy resin composition, and the like.
- diazabicycloalkenes such as 1,5-diazabicyclo [4.3.0] nonene-5 (DBN), 1,8-diazabicyclo [5.4.0] undecene-7 (DBU), etc.
- Cyclic amidine compounds such as 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-heptadecylimidazole; derivatives of the cyclic amidine compounds; phenol novolac salts of the cyclic amidine compounds or derivatives thereof; Of maleic anhydride, 1,4-benzoquinone, 2,5-toluquinone, 1,4-naphthoquinone, 2,3-dimethylbenzoquinone, 2,6-dimethylbenzoquinone, 2,3-dimethoxy-5-methyl-1 , 4-benzoquinone, 2,3-dimethoxy-1,4-benzoquinone, phenyl-1, Compounds having an intramolecular polarization formed by addition of compounds having a ⁇ bond such as quinone compounds such as -benzoquinone and diazophenylmethane; tetraphenyl borate salts of DBU, tetraphen
- tertiary amine compounds tetra-n-butylammonium acetate, tetra-n-butylammonium phosphate, tetraethylammonium acetate, tetra-n-hexyl benzoate
- Ammonium salt compounds such as ammonium sulfate and tetrapropylammonium hydroxide; triphenylphosphine, diphenyl (p-tolyl) phosphine, tris (alkylphenyl) phosphine, tris (alkoxyphenyl) phosphine, tris (alkyl alkoxyphenyl) phosphine, tris (Dialkylphenyl) phosphine, tris (trialkylphenyl) phosphine, tris (tetraalkylphenyl) phosphine, tris (dialkoxyphenyl)
- Sphin compounds Sphin compounds; said tertiary phosphine or said phosphine compound and maleic anhydride, 1,4-benzoquinone, 2,5-toluquinone, 1,4-naphthoquinone, 2,3-dimethylbenzoquinone, 2,6-dimethylbenzoquinone, 2, Quinone compounds such as 3-dimethoxy-5-methyl-1,4-benzoquinone, 2,3-dimethoxy-1,4-benzoquinone, phenyl-1,4-benzoquinone, and compounds having a ⁇ bond such as diazophenylmethane
- a compound having an internal polarization obtained through the step of dehydrohalogenation tetra-substituted phosphonium such as tetraphenyl phosphonium; tetra-substituted phosphonium having no phenyl group bonded to a boron atom such as tetra-p-tolylborate Tetrasubstituted borates; salts of tetraphenylphosphonium with a phenol compound and the like can be mentioned.
- the curing accelerator may be used alone or in combination of two or more.
- the amount is 0.1 parts by mass to 30 parts by mass with respect to 100 parts by mass of the resin component (that is, the total of the resin and the curing agent). It is preferably part, and more preferably 1 part by mass to 15 parts by mass. If the amount of the curing accelerator is 0.1 parts by mass or more with respect to 100 parts by mass of the resin component, it tends to be cured well in a short time. If the amount of the curing accelerator is 30 parts by mass or less with respect to 100 parts by mass of the resin component, the curing rate tends to be too fast to obtain a good molded product.
- the epoxy resin composition according to the first embodiment contains various additives such as an ion exchanger, a mold release agent, a flame retardant, a colorant, and a stress relaxation agent, which are exemplified below, in addition to the components described above. It is also good.
- the epoxy resin composition according to the first embodiment may contain various additives well known in the art, as needed, in addition to the additives exemplified below.
- the epoxy resin composition according to the first embodiment may contain an ion exchanger.
- ion exchange is performed from the viewpoint of improving the moisture resistance and high-temperature storage characteristics of the electronic component device provided with the element to be sealed. It is preferable to contain a body.
- the ion exchanger is not particularly limited, and conventionally known ones can be used. Specific examples thereof include hydrotalcite compounds and hydrous oxides of at least one element selected from the group consisting of magnesium, aluminum, titanium, zirconium and bismuth.
- the ion exchangers may be used alone or in combination of two or more. Among them, hydrotalcite represented by the following general formula (A) is preferable.
- the content thereof is not particularly limited as long as it is an amount sufficient to capture ions such as halogen ions.
- the amount is preferably 0.1 parts by mass to 30 parts by mass, and more preferably 1 part by mass to 10 parts by mass with respect to 100 parts by mass of the resin component.
- the epoxy resin composition according to the first embodiment may contain a release agent from the viewpoint of obtaining good releasability with the mold at the time of molding.
- the release agent is not particularly limited, and conventionally known ones can be used. Specific examples thereof include carnauba wax, higher fatty acids such as montanic acid and stearic acid, higher fatty acid metal salts, ester waxes such as montanic acid esters, and polyolefin waxes such as oxidized polyethylene and non-oxidized polyethylene.
- the mold release agent may be used alone or in combination of two or more.
- the amount thereof is preferably 0.01 parts by mass to 10 parts by mass with respect to 100 parts by mass of the resin component, and 0.1 parts by mass to 5 parts The parts by mass are more preferred.
- the amount of the release agent is 0.01 parts by mass or more based on 100 parts by mass of the resin component, the releasability tends to be sufficiently obtained. If it is 10 parts by mass or less, better adhesion and curability tend to be obtained.
- the epoxy resin composition according to the first embodiment may contain a flame retardant.
- the flame retardant is not particularly limited, and conventionally known flame retardants can be used. Specifically, organic or inorganic compounds containing a halogen atom, an antimony atom, a nitrogen atom or a phosphorus atom, metal hydroxides and the like can be mentioned.
- the flame retardant may be used alone or in combination of two or more.
- the amount thereof is not particularly limited as long as it is an amount sufficient to obtain a desired flame retardant effect.
- the amount is preferably 1 part by mass to 30 parts by mass, and more preferably 2 parts by mass to 20 parts by mass with respect to 100 parts by mass of the resin component.
- the epoxy resin composition according to the first embodiment may further contain a colorant.
- colorants include known colorants such as carbon black, organic dyes, organic pigments, titanium oxide, red lead, red iron oxide and the like.
- the content of the coloring agent can be appropriately selected according to the purpose and the like.
- the colorants may be used alone or in combination of two or more.
- the epoxy resin composition according to the first embodiment may contain a stress relaxation agent such as silicone oil or silicone rubber particles. By containing a stress relaxation agent, warpage of the package and occurrence of package cracks can be further reduced.
- the stress relieving agent includes known stress relieving agents (flexible agents) generally used.
- thermoplastic elastomers such as silicone, styrene, olefin, urethane, polyester, polyether, polyamide, and polybutadiene, NR (natural rubber), NBR (acrylonitrile-butadiene rubber), acrylic Core particles such as rubber particles such as rubber, urethane rubber and silicone powder, methyl methacrylate-styrene-butadiene copolymer (MBS), methyl methacrylate-silicone copolymer and methyl methacrylate-butyl acrylate copolymer
- MBS methyl methacrylate-styrene-butadiene copolymer
- MVS methyl methacrylate-silicone copolymer
- methyl methacrylate-butyl acrylate copolymer The rubber particle etc. which have a structure are mentioned.
- the stress relaxation agents may be used alone or in combination of two or more.
- the epoxy resin composition according to the second embodiment includes an epoxy resin, a curing agent, an inorganic filler having a thermal conductivity of 20 W / (m ⁇ K) or more, and a chain hydrocarbon group having 6 or more carbon atoms. And a silane compound (specific silane compound) having a structure bonded to a silicon atom.
- the thermal conductivity of the inorganic filler in the present disclosure is the thermal conductivity at room temperature (25 ° C.).
- the epoxy resin composition according to the second embodiment may contain other components as needed.
- the epoxy resin composition according to the second embodiment exhibits the above effect is not necessarily clear, but is presumed as follows.
- a low molecular weight coupling agent such as a silane compound having a propyl group is used in the sealing resin composition to improve the dispersibility of the inorganic filler.
- a silane compound having a longer chain hydrocarbon group is used, the compatibility of the inorganic filler with the resin is improved, and it is considered that the frictional resistance between the inorganic fillers is reduced.
- Epoxy resin The epoxy resin composition according to the second embodiment contains an epoxy resin.
- the details of the epoxy resin are the same as the details of the epoxy resin used in the epoxy resin composition according to the first embodiment.
- the epoxy resin composition according to the second embodiment contains a curing agent.
- the details of the curing agent are the same as the details of the curing agent used in the epoxy resin composition according to the first embodiment.
- the epoxy resin composition according to the second embodiment contains an inorganic filler having a thermal conductivity of 20 W / (m ⁇ K) or more.
- the material of the inorganic filler is not particularly limited as long as it has the above-described thermal conductivity.
- an inorganic filler having a thermal conductivity of 20 W / (m ⁇ K) or more is an inorganic filler composed of a material having a thermal conductivity of 20 W / (m ⁇ K) or more at room temperature (25 ° C.).
- the thermal conductivity of the inorganic filler can be obtained by measuring the thermal conductivity of the material constituting the inorganic filler by the xenon flash (Xe-flash) method or the heat ray method.
- the thermal conductivity of the inorganic filler is 20 W / (m ⁇ K) or more, and preferably 25 W / (m ⁇ K) or more from the viewpoint of heat radiation when it is a cured product.
- the upper limit of the thermal conductivity of the inorganic filler is not particularly limited, and may be 500 W / (m ⁇ K) or less, and may be 300 W / (m ⁇ K) or less.
- the material of the inorganic filler having the thermal conductivity include alumina, silicon nitride, boron nitride, aluminum nitride, magnesium oxide and silicon carbide.
- alumina is preferable from the viewpoints of sphericity, moisture resistance and the like.
- the shape of the inorganic filler is not particularly limited, and is preferably spherical in terms of the filling property and the mold abradability.
- the inorganic filler may be used alone or in combination of two or more.
- two or more types of inorganic fillers are used in combination
- two inorganic fillers having the same average particle size but different components are used.
- the case where it uses more than a kind and the case where two or more kinds of inorganic fillers from which an average particle diameter and a kind differ differ are mentioned.
- the content of the inorganic filler in the epoxy resin composition according to the second embodiment is not particularly limited. From the viewpoint of further improving the properties such as the thermal expansion coefficient, thermal conductivity, and elastic modulus of the cured product, the content of the inorganic filler is preferably 30% by volume or more of the entire epoxy resin composition, and 35% by volume The above is more preferable, 40% by volume or more is further preferable, 45% by volume or more is particularly preferable, and 50% by volume or more is extremely preferable.
- the content of the inorganic filler is preferably 99% by volume or less, preferably 98% by volume or less, of the entire epoxy resin composition, and 97% by volume It is more preferable that The content of the inorganic filler in the epoxy resin composition according to the second embodiment is preferably 30% by volume to 99% by volume, more preferably 35% by volume to 99% by volume, and 40% by volume It is more preferably ⁇ 98 volume%, particularly preferably 45 volume% to 97 volume%, and most preferably 50 volume% to 97 volume%.
- the content of the inorganic filler in the epoxy resin composition is measured as follows. First, the total mass of the cured product (epoxy resin molded product) of the epoxy resin composition is measured, and the epoxy resin molded product is calcined at 400 ° C. for 2 hours and then at 700 ° C. for 3 hours to evaporate the resin component and leave it Measure the mass of the inorganic filler. The volume is calculated from each mass obtained and each specific gravity, and the ratio of the volume of the inorganic filler to the total volume of the epoxy resin molded product is obtained to be the content of the inorganic filler.
- the inorganic filler When the inorganic filler is particulate, its average particle size is not particularly limited.
- the volume average particle diameter of the whole inorganic filler is preferably 80 ⁇ m or less, may be 50 ⁇ m or less, may be 40 ⁇ m or less, may be 30 ⁇ m or less, or 25 ⁇ m or less. It may be 20 ⁇ m or less, or 15 ⁇ m.
- the volume average particle diameter of the entire inorganic filler is preferably 0.1 ⁇ m or more, more preferably 0.2 ⁇ m or more, and still more preferably 0.3 ⁇ m or more. When the volume average particle diameter of the inorganic filler is 0.1 ⁇ m or more, the increase in the viscosity of the epoxy resin composition tends to be further suppressed.
- the volume average particle size of the inorganic filler should be measured as the particle size (D50) at which the accumulation from the small diameter side becomes 50% in the volume-based particle size distribution measured by the laser scattering diffraction particle size distribution measuring apparatus. Can.
- the maximum particle diameter (cut point) of the inorganic filler is controlled from the viewpoint of the improvement of the filling property in the narrow gap when the epoxy resin composition is used for a mold underfill or the like.
- the maximum particle size of the inorganic filler may be appropriately adjusted, and from the viewpoint of the filling property is preferably 105 ⁇ m or less, more preferably 75 ⁇ m or less, and may be 60 ⁇ m or less, 40 ⁇ m or less May be
- the maximum particle diameter can be measured by a laser diffraction particle size distribution analyzer (manufactured by Horiba, Ltd., trade name: LA920).
- the epoxy resin composition according to the second embodiment contains a specific silane compound.
- the specific silane compound has a structure in which a chain hydrocarbon group having 6 or more carbon atoms (hereinafter, a chain hydrocarbon group having 6 or more carbon atoms is also simply referred to as a chain hydrocarbon group) is bonded to a silicon atom.
- the chain hydrocarbon group may be branched or may have a substituent.
- the number of carbon atoms of the chain hydrocarbon group means the number of carbon atoms of branched or substituted carbon atoms.
- the chain hydrocarbon group may or may not contain unsaturated bonds, and preferably does not contain unsaturated bonds.
- the specific silane compound is considered to function as a coupling agent of the inorganic filler in the epoxy resin composition.
- the atom or atomic group other than the chain hydrocarbon group which is bonded to the silicon atom is not particularly limited, and each of them is independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group, an aryl group, an aryloxy group or the like It may be. Among them, one or more alkoxy groups are preferably bonded in addition to a chain hydrocarbon group, and one chain hydrocarbon group and three alkoxy groups are bonded to a silicon atom. Is more preferred.
- the carbon number of the chain hydrocarbon group in the specific silane compound is 6 or more, preferably 7 or more, and more preferably 8 or more, from the viewpoint of suppressing the viscosity.
- the substituent is not particularly limited.
- the substituent may be present at the end of the chain hydrocarbon group, or may be present at the side chain of the chain hydrocarbon group.
- the chain hydrocarbon group preferably has at least one functional group (hereinafter also referred to as a specific functional group) selected from (meth) acryloyl group, epoxy group and alkoxy group, and (meth) acryloyl group and epoxy It is more preferable to have at least one functional group selected from groups, and it is further preferable to have a (meth) acryloyl group.
- the specific functional group may be present at the end of the chain hydrocarbon group, or may be present at the side chain of the chain hydrocarbon group. From the viewpoint of suppressing the viscosity, the specific functional group is preferably present at the end of the chain hydrocarbon group.
- the viscosity of the epoxy resin composition tends to further decrease. Although this reason is not necessarily clear, when the chain hydrocarbon group of the specific silane compound has the specific functional group, the compatibility between the specific functional group and the epoxy resin is enhanced, and the dispersibility of the epoxy resin and the inorganic filler is improved. It is presumed that it is to do.
- the (meth) acryloyl group may be directly bonded to the chain hydrocarbon group, or may be bonded via another atom or atomic group .
- the chain hydrocarbon group may have a (meth) acryloyloxy group.
- the chain hydrocarbon group preferably has a methacryloyloxy group.
- the chain hydrocarbon group has an epoxy group
- the epoxy group may be directly bonded to the chain hydrocarbon group, or may be bonded via another atom or atomic group.
- the chain hydrocarbon group may have a glycidyloxy group, an alicyclic epoxy group, and the like.
- the chain hydrocarbon group preferably has a glycidyloxy group.
- the alkoxy group may be directly bonded to the chain hydrocarbon group, or may be bonded via another atom or atomic group, and the chain hydrocarbon group Preferably it is directly attached to
- the alkoxy group is not particularly limited, and may be a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group or the like. Among them, from the viewpoint of easy availability, it is preferable that the chain hydrocarbon group has a methoxy group.
- the equivalent (molecular weight / number of functional groups) of at least one functional group selected from the (meth) acryloyl group, the epoxy group, and the alkoxy group in the specific silane compound is not particularly limited. From the viewpoint of lowering the viscosity of the epoxy resin composition, it is preferably 200 g / eq to 420 g / eq, more preferably 210 g / eq to 405 g / eq, and 230 g / eq to 390 g / eq. More preferable.
- silane compounds include hexyltrimethoxysilane, heptyltrimethoxysilane, octyltrimethoxysilane, hexyltriethoxysilane, heptyltriethoxysilane, octyltriethoxysilane, 6-glycidoxyhexyltrimethoxysilane, 7-glycid Xiheptyl trimethoxysilane, 8-glycidoxyoctyl trimethoxysilane, 6- (meth) acryloxyhexyl trimethoxysilane, 7- (meth) acryloxy heptyl trimethoxysilane, 8- (meth) acryloxyoctyl trimethoxy Silane, decyltrimethoxysilane and the like can be mentioned.
- 8-glycidoxyoctyltrimethoxysilane and 8-methacryloxyoctyltrimethoxysilane are preferable from the viewpoint of lowering the viscosity of the epoxy resin composition.
- the specific silane compounds may be used alone or in combination of two or more.
- the specific silane compounds may be synthesized or those commercially available.
- Specific silane compounds commercially available include Shin-Etsu Chemical Co., Ltd. KBM-3063 (Hexyltrimethoxysilane), KBE-3063 (Hexyltriethoxysilane), KBE-3083 (Octyltriethoxysilane), KBM-4803 8-glycidoxyoctyltrimethoxysilane), KBM-5803 (8-methacryloxyoctyltrimethoxysilane), KBM-3103C (decyltrimethoxysilane), and the like.
- the content of the specific silane compound in the epoxy resin composition according to the second embodiment is not particularly limited.
- the content of the specific silane compound may be 0.01 parts by mass or more, and may be 0.02 parts by mass or more with respect to 100 parts by mass of the inorganic filler. Further, the content of the specific silane compound is preferably 5 parts by mass or less, and more preferably 2.5 parts by mass or less with respect to 100 parts by mass of the inorganic filler.
- the content of the specific silane compound is 0.01 parts by mass or more based on 100 parts by mass of the inorganic filler, a composition having a low viscosity tends to be obtained.
- the content of the specific silane compound is 5 parts by mass or less with respect to 100 parts by mass of the inorganic filler, the moldability of the package tends to be further improved.
- the epoxy resin composition according to the second embodiment may further contain another coupling agent in addition to the specific silane compound.
- Other coupling agents are not particularly limited as long as they are generally used in epoxy resin compositions.
- Other coupling agents include silane compounds such as epoxysilane, mercaptosilane, aminosilane, alkylsilane, ureidosilane, vinylsilane (except for specific silane compounds), titanium compounds, aluminum chelate compounds, aluminum / zirconium compounds, etc.
- Known coupling agents may be used alone or in combination of two or more.
- the total content of the specific silane compound and the other coupling agent is 100 parts by mass of the inorganic filler. It may be 0.01 parts by mass or more, and may be 0.02 parts by mass or more.
- the total content of the specific silane compound and the other coupling agent is preferably 5 parts by mass or less, and more preferably 2.5 parts by mass or less with respect to 100 parts by mass of the inorganic filler.
- the total content of the specific silane compound and the other coupling agent is 0.01 parts by mass or more with respect to 100 parts by mass of the inorganic filler, a composition having a low viscosity tends to be obtained.
- the total content of the specific silane compound and the other coupling agent is 5 parts by mass or less with respect to 100 parts by mass of the inorganic filler, the moldability of the package tends to be further improved.
- the epoxy resin composition according to the second embodiment contains another coupling agent other than the specific silane compound, the specific silane compound and the other coupling agent from the viewpoint of exerting the function of the specific silane compound well.
- the content of the other coupling agent to the total amount is preferably 90% by mass or less, more preferably 70% by mass or less, and still more preferably 50% by mass or less.
- the epoxy resin composition according to the second embodiment may contain a curing accelerator.
- the details of the curing accelerator are the same as the details of the curing accelerator used in the epoxy resin composition according to the first embodiment.
- the epoxy resin composition according to the second embodiment may contain, in addition to the components described above, various additives such as an ion exchanger, a mold release agent, a flame retardant, a colorant, and a stress relaxation agent.
- various additives such as an ion exchanger, a mold release agent, a flame retardant, a colorant, and a stress relaxation agent.
- the details of the various additives are the same as the details of the various additives used in the epoxy resin composition according to the first embodiment.
- the viscosity of the epoxy resin composition is not particularly limited. Since the likelihood of wire flow during molding varies depending on the molding method, the composition of the epoxy resin composition, and the like, it is preferable to adjust the viscosity to a desired viscosity according to the molding method, the composition of the epoxy resin composition, and the like. For example, in the case of molding an epoxy resin composition by a compression molding method, it is preferably 200 Pa ⁇ s or less at 175 ° C., more preferably 150 Pa ⁇ s or less, from the viewpoint of reducing wire flow, and 100 Pa ⁇ s.
- the following is more preferable, 50 Pa ⁇ s or less is particularly preferable, 16 Pa ⁇ s or less, and 10 Pa ⁇ s or less.
- the lower limit value of the viscosity is not particularly limited, and may be, for example, 5 Pa ⁇ s or more.
- it is preferably 200 Pa ⁇ s or less at 175 ° C., more preferably 150 Pa ⁇ s or less, and 100 Pa -It is further preferable that it is s or less, 68 Pa-s or less may be sufficient, and 54 Pa-s or less may be sufficient.
- the lower limit value of the viscosity is not particularly limited, and may be, for example, 5 Pa ⁇ s or more.
- the viscosity of the epoxy resin composition can be measured by using a Koka flow tester (manufactured by Shimadzu Corporation).
- the thermal conductivity of the epoxy resin composition as a cured product is not particularly limited. From the viewpoint of obtaining the desired heat dissipation, it may be 3.0 W / (m ⁇ K) or more, 4.0 W / (m ⁇ K) or more at room temperature (25 ° C.), or 5 .0 W / (m ⁇ K) or more, 6.0 W / (m ⁇ K) or more, 7.0 W / (m ⁇ K) or more, 8.0 W It may be / (m ⁇ K) or more.
- the upper limit of the thermal conductivity is not particularly limited, and may be 9.0 W / (m ⁇ K).
- the thermal conductivity of the cured product can be measured by a xenon flash (Xe-flash) method (manufactured by NETZSCH, trade name LFA 467 Hyper Flash device).
- the method for preparing the epoxy resin composition according to the first embodiment and the second embodiment is not particularly limited.
- a general method there is a method in which the respective components are sufficiently mixed by a mixer or the like, then melt-kneaded by a mixing roll, an extruder or the like, cooled, and pulverized. More specifically, there can be mentioned, for example, a method of stirring and mixing the above-mentioned components, kneading with a kneader, roll, extruder or the like which has been heated to 70 ° C. to 140 ° C. in advance, cooling and grinding. .
- the epoxy resin composition may be solid or liquid at normal temperature and normal pressure (for example, 25 ° C., atmospheric pressure), and is preferably solid.
- the shape in the case where the epoxy resin composition is solid is not particularly limited, and examples thereof include powder, granules, tablets and the like. It is preferable from the viewpoint of handleability that the dimensions and mass when the epoxy resin composition is in the form of a tablet be such that the dimensions and mass meet the molding conditions of the package.
- An electronic component device includes a device sealed by the epoxy resin composition according to the first and second embodiments described above.
- a support member such as a lead frame, a wired tape carrier, a wiring board, glass, a silicon wafer, an organic substrate or the like, an element (an active element such as a semiconductor chip, a transistor, a diode or a thyristor, a capacitor, a resistor)
- an element part obtained by mounting a passive element such as a coil, etc. is sealed with an epoxy resin composition.
- the element is fixed on a lead frame, and the terminal portion and the lead portion of the element such as a bonding pad are connected by wire bonding, bumps or the like, and then sealed by transfer molding using an epoxy resin composition.
- Inlined Package DIP
- Plastic Leaded Chip Carrier PLCC
- Quad Flat Package QFP
- Small Outline Package SOP
- Small Outline J-lead package SOJ
- Thin Small Outline Package TSOP
- General resin-sealed type IC such as TQFP (Thin Quad Flat Package)
- a TCP (Tape Carrier Package) having a structure sealed with a resin composition; a device connected by wire bonding, flip chip bonding, solder or the like to a wiring formed on a support member is sealed with an epoxy resin composition Chip-on-board (COB) modules, hybrid ICs, multi-chip modules, etc.
- COB Chip-on-board
- a BGA All Grid Array
- CSP Chip Size Package
- MCP Multi Chip Package
- an epoxy resin composition can be used suitably also in a printed wiring board.
- H1 H-4 (trade name) manufactured by Meiwa Kasei Co., Ltd.
- H2 Harddener 2 (H2)] SN-485 (trade name) manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.
- H3 Harddener 3 (H3)] MEH-8151 SS (trade name) manufactured by Meiwa Chemical Co., Ltd.
- Table 1 and Table 2 were blended in the amounts shown in the same table (unit: mass parts), thoroughly mixed by a mixer, and then melt-kneaded at 100 ° C. for 2 minutes using a twin-screw kneader. Next, the melt was cooled, and then solidified to obtain a powdery epoxy resin composition by grinding into a powder.
- the blank indicates that the component is not blended, and "-" indicates that the evaluation has not been performed.
- the produced epoxy resin composition was evaluated by the various tests shown below. The evaluation results are shown in Tables 1 and 2.
- molding of the epoxy resin composition as described in Examples A-1 to A-7 and Comparative Examples A-1 to A-3 uses a compression molding machine, and Examples A-8 to A-17 and Comparative Example A are used.
- a transfer molding machine was used for the molding of -4 to A-5.
- the molding temperature is 175 ° C. by a transfer molding machine (manual press Y-1 manufactured by TOWA Co., Ltd.)
- the package was sealed under a molding condition of 120 seconds and post-cured at 175 ° C. for 5 hours to obtain a semiconductor device.
- This semiconductor device is a ball grid array (BGA) package (resin-encapsulated portion size: 50 mm ⁇ 50 mm ⁇ thickness 0.7 mm), and the chip size is 7.5 mm ⁇ 7.5 mm.
- BGA ball grid array
- the wire has a gold wire diameter of 22 ⁇ m and an average gold wire length of 3 mm. Then, using the soft X-ray analyzer, the produced package was observed for the deformed state of the gold wire, and the presence or absence of the deformation was examined.
- the flip chip bump size is 60 ⁇ m which is a total of 45 ⁇ m of Cu pillars and 15 ⁇ m of solder bumps.
- a material having a good filling property is A
- a material having an unfilled portion such as a void is C.
- the epoxy resin composition of the example containing a silane compound having a structure in which a chain hydrocarbon group having 6 or more carbon atoms is bonded to a silicon atom has a lower viscosity than the comparative example. It was found that the incidence of wire flow was reduced.
- the epoxy resin composition of the example containing a silane compound having a structure in which a chain hydrocarbon group having 6 or more carbon atoms is bonded to a silicon atom has a filling property when it is used for a mold underfill by a compression molding method. It turned out that it is excellent. Further, in particular, when the carbon number of the chain hydrocarbon group is 8 or more, the heat conductivity of the cured product tends to be excellent.
- Example according to the second embodiment >> ⁇ Production of Resin Composition> First, each component shown below was prepared.
- the thermal conductivity of the inorganic fillers 1 to 3 is all 20 W / (m ⁇ K) or more.
- Table 3 and Table 4 were blended in the amounts shown in the same table (unit: mass parts), sufficiently mixed by a mixer, and then melt-kneaded at 100 ° C. for 2 minutes using a twin-screw kneader. Next, the melt was cooled, and then solidified to obtain a powdery epoxy resin composition by grinding into a powder.
- the blank indicates that the component is not blended, and "-" indicates that the evaluation has not been performed.
- the produced epoxy resin composition was evaluated by the various tests shown below. The evaluation results are shown in Tables 3 and 4.
- a transfer molding machine was used for molding of Examples B-1 to B-10 and Comparative Examples B-1 to B-2.
- the package is sealed with a transfer molding machine (manual press Y-1 manufactured by TOWA Co., Ltd.) at a molding temperature of 175 ° C. and a molding time of 120 seconds, 175 ° C.
- the semiconductor device was obtained by post-curing for 5 hours.
- This semiconductor device is a ball grid array (BGA) package (resin-encapsulated portion size: 50 mm ⁇ 50 mm ⁇ thickness 0.7 mm), and the chip size is 7.5 mm ⁇ 7.5 mm.
- the wire has a gold wire diameter of 22 ⁇ m and an average gold wire length of 3 mm. Then, using the soft X-ray analyzer, the produced package was observed for the deformed state of the gold wire, and the presence or absence of the deformation was examined.
- the epoxy resin composition of the examples containing alumina and a silane compound having a structure in which a linear hydrocarbon group having 6 or more carbon atoms is bonded to a silicon atom has a low viscosity and a cured product. It was found that the thermal conductivity was excellent when In particular, when the carbon number of the chain hydrocarbon group is 8 or more, the thermal conductivity of the cured product is improved.
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Epoxy Resins (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201880059554.5A CN111094450A (zh) | 2017-09-15 | 2018-08-31 | 环氧树脂组合物和电子部件装置 |
JP2019542000A JP7375541B2 (ja) | 2017-09-15 | 2018-08-31 | エポキシ樹脂組成物、及び電子部品装置 |
MYPI2020001352A MY198096A (en) | 2017-09-15 | 2018-08-31 | Epoxy resin composition and electronic component device |
CN202310717825.4A CN116751438A (zh) | 2017-09-15 | 2018-08-31 | 环氧树脂组合物和电子部件装置 |
JP2023184277A JP2024012392A (ja) | 2017-09-15 | 2023-10-26 | エポキシ樹脂組成物、及び電子部品装置 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017-178299 | 2017-09-15 | ||
JP2017178299 | 2017-09-15 | ||
JP2017178300 | 2017-09-15 | ||
JP2017-178300 | 2017-09-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2019054217A1 true WO2019054217A1 (ja) | 2019-03-21 |
Family
ID=65722750
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2018/032497 WO2019054217A1 (ja) | 2017-09-15 | 2018-08-31 | エポキシ樹脂組成物、及び電子部品装置 |
Country Status (5)
Country | Link |
---|---|
JP (2) | JP7375541B2 (zh) |
CN (2) | CN116751438A (zh) |
MY (1) | MY198096A (zh) |
TW (1) | TWI839335B (zh) |
WO (1) | WO2019054217A1 (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020080069A1 (ja) * | 2018-10-16 | 2020-04-23 | 日東シンコー株式会社 | 樹脂組成物 |
WO2022050170A1 (ja) * | 2020-09-03 | 2022-03-10 | 昭和電工マテリアルズ株式会社 | コンパウンド、成形体、及びコンパウンドの硬化物 |
JP7518246B2 (ja) | 2023-07-04 | 2024-07-17 | 株式会社Adeka | 組成物 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI772106B (zh) * | 2021-07-14 | 2022-07-21 | 福思材料股份有限公司 | 導熱材料 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010084939A1 (ja) * | 2009-01-23 | 2010-07-29 | 味の素株式会社 | 樹脂組成物 |
JP2012077172A (ja) * | 2010-09-30 | 2012-04-19 | Sekisui Chem Co Ltd | 樹脂組成物、樹脂シート及び積層構造体 |
JP2015044898A (ja) * | 2013-08-27 | 2015-03-12 | 日立化成株式会社 | 半導体封止用エポキシ樹脂組成物及びそれを用いた樹脂封止型半導体装置 |
JP2016219600A (ja) * | 2015-05-20 | 2016-12-22 | 京セラ株式会社 | 半導体用ダイアタッチペースト及び半導体装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004292591A (ja) | 2003-03-26 | 2004-10-21 | Matsushita Electric Works Ltd | 光半導体用樹脂組成物及び光半導体装置 |
CN101522792B (zh) * | 2006-10-02 | 2013-01-09 | 日立化成工业株式会社 | 密封用环氧树脂成形材料以及电子零件装置 |
US20140128505A1 (en) * | 2011-05-13 | 2014-05-08 | Hitachi Chemical Company, Ltd. | Epoxy resin molding material for sealing and electronic component device |
JP6672630B2 (ja) * | 2015-08-07 | 2020-03-25 | 味の素株式会社 | 樹脂組成物 |
WO2017191801A1 (ja) | 2016-05-06 | 2017-11-09 | Dic株式会社 | 樹脂組成物、成形体、積層体及び接着剤 |
-
2018
- 2018-08-31 CN CN202310717825.4A patent/CN116751438A/zh active Pending
- 2018-08-31 MY MYPI2020001352A patent/MY198096A/en unknown
- 2018-08-31 CN CN201880059554.5A patent/CN111094450A/zh active Pending
- 2018-08-31 WO PCT/JP2018/032497 patent/WO2019054217A1/ja active Application Filing
- 2018-08-31 JP JP2019542000A patent/JP7375541B2/ja active Active
- 2018-09-10 TW TW107131759A patent/TWI839335B/zh active
-
2023
- 2023-10-26 JP JP2023184277A patent/JP2024012392A/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010084939A1 (ja) * | 2009-01-23 | 2010-07-29 | 味の素株式会社 | 樹脂組成物 |
JP2012077172A (ja) * | 2010-09-30 | 2012-04-19 | Sekisui Chem Co Ltd | 樹脂組成物、樹脂シート及び積層構造体 |
JP2015044898A (ja) * | 2013-08-27 | 2015-03-12 | 日立化成株式会社 | 半導体封止用エポキシ樹脂組成物及びそれを用いた樹脂封止型半導体装置 |
JP2016219600A (ja) * | 2015-05-20 | 2016-12-22 | 京セラ株式会社 | 半導体用ダイアタッチペースト及び半導体装置 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020080069A1 (ja) * | 2018-10-16 | 2020-04-23 | 日東シンコー株式会社 | 樹脂組成物 |
WO2022050170A1 (ja) * | 2020-09-03 | 2022-03-10 | 昭和電工マテリアルズ株式会社 | コンパウンド、成形体、及びコンパウンドの硬化物 |
JP7518246B2 (ja) | 2023-07-04 | 2024-07-17 | 株式会社Adeka | 組成物 |
Also Published As
Publication number | Publication date |
---|---|
CN116751438A (zh) | 2023-09-15 |
CN111094450A (zh) | 2020-05-01 |
JP2024012392A (ja) | 2024-01-30 |
JP7375541B2 (ja) | 2023-11-08 |
JPWO2019054217A1 (ja) | 2020-10-29 |
MY198096A (en) | 2023-07-31 |
TW201920450A (zh) | 2019-06-01 |
TWI839335B (zh) | 2024-04-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4892164B2 (ja) | 液状エポキシ樹脂組成物及び電子部品装置 | |
JP7287281B2 (ja) | ボールグリッドアレイパッケージ封止用エポキシ樹脂組成物、エポキシ樹脂硬化物及び電子部品装置 | |
JP2024012392A (ja) | エポキシ樹脂組成物、及び電子部品装置 | |
WO2019240079A1 (ja) | 硬化性樹脂組成物及び電子部品装置 | |
JP4792768B2 (ja) | 封止用エポキシ樹脂組成物及び電子部品装置 | |
JP2015193851A (ja) | 液状エポキシ樹脂組成物及び電子部品装置 | |
JP2024092000A (ja) | 硬化性樹脂組成物及び電子部品装置 | |
JP2023076548A (ja) | エポキシ樹脂組成物、及び電子部品装置 | |
WO2020129248A1 (ja) | 封止用樹脂組成物及び電子部品装置 | |
WO2018181813A1 (ja) | エポキシ樹脂組成物及び電子部品装置 | |
WO2018181384A1 (ja) | エポキシ樹脂組成物、硬化性樹脂組成物、及び電子部品装置 | |
JP2018104603A (ja) | 硬化性樹脂組成物及び電子部品装置 | |
JP5708666B2 (ja) | 液状エポキシ樹脂組成物及び電子部品装置 | |
WO2021049645A1 (ja) | 圧縮成形用封止材及び電子部品装置 | |
JP2015180760A (ja) | 液状エポキシ樹脂組成物及び電子部品装置 | |
JP2015110803A (ja) | 液状エポキシ樹脂組成物及び電子部品装置 | |
WO2020129249A1 (ja) | 封止用樹脂組成物及び電子部品装置 | |
WO2022149594A1 (ja) | 熱硬化性樹脂組成物の製造方法、熱硬化性樹脂組成物、及び電子部品装置 | |
JP2024096265A (ja) | 樹脂組成物及び電子部品装置 | |
JP2015180759A (ja) | 液状エポキシ樹脂組成物及び電子部品装置 | |
WO2018123745A1 (ja) | 樹脂組成物及び電子部品装置 | |
JP2014196521A (ja) | 液状エポキシ樹脂組成物及び電子部品装置 | |
JP2022107373A (ja) | 熱硬化性樹脂組成物の製造方法、熱硬化性樹脂組成物、及び電子部品装置 | |
JP5804479B2 (ja) | 樹脂封止型半導体装置の製造方法及び樹脂封止型半導体装置 | |
WO2020171004A1 (ja) | 硬化性樹脂組成物及び電子部品装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 18856171 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2019542000 Country of ref document: JP Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 18856171 Country of ref document: EP Kind code of ref document: A1 |