WO2018207258A1 - ガスクロマトグラフ - Google Patents

ガスクロマトグラフ Download PDF

Info

Publication number
WO2018207258A1
WO2018207258A1 PCT/JP2017/017546 JP2017017546W WO2018207258A1 WO 2018207258 A1 WO2018207258 A1 WO 2018207258A1 JP 2017017546 W JP2017017546 W JP 2017017546W WO 2018207258 A1 WO2018207258 A1 WO 2018207258A1
Authority
WO
WIPO (PCT)
Prior art keywords
supply pipe
column
column oven
refrigerant
gas chromatograph
Prior art date
Application number
PCT/JP2017/017546
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
優輝 小森
茂暢 中野
昌之 岡田
Original Assignee
株式会社島津製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社島津製作所 filed Critical 株式会社島津製作所
Priority to CN201780090512.3A priority Critical patent/CN110621994B/zh
Priority to PCT/JP2017/017546 priority patent/WO2018207258A1/ja
Priority to JP2019516772A priority patent/JP6863457B2/ja
Publication of WO2018207258A1 publication Critical patent/WO2018207258A1/ja

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G01N30/50—Conditioning of the sorbent material or stationary liquid
    • G01N30/52—Physical parameters
    • G01N30/54—Temperature

Definitions

  • the present invention relates to a gas chromatograph provided with a cooling device for cooling the inside of a column oven.
  • a gas chromatograph equipped with a cooling device that introduces a refrigerant into the column oven and cools the inside of the column oven to a predetermined temperature has been used.
  • the analysis operation is performed, so that the inside of the column oven is heated by the heater to be in a high temperature state. Thereafter, for the next measurement, the inside of the column oven is cooled to a predetermined temperature by the cooling device.
  • the inside of the column oven is appropriately cooled by the cooling device, and the analysis operation is repeatedly performed (for example, see Patent Document 1 below).
  • a cooling gas supply pipe (supply line) is connected to a column oven.
  • the supply pipe is provided with a valve for adjusting the supply amount of the cooling gas. Then, by appropriately opening the valve, the cooling gas is introduced into the column oven through the supply pipe, and the inside of the column oven is cooled.
  • the conventional gas chromatograph described above has a problem that the temperature is difficult to stabilize when the inside of the column oven is cooled.
  • a sensor for detecting the temperature in the column oven is provided. Based on the temperature in the column oven detected by the sensor, cooling is performed in the column oven through the supply pipe. Gas is introduced. In this way, in the cooling device configured to cool the inside of the column oven only by the cooling gas introduced into the interior, the cooling gas is introduced until the ambient temperature around the sensor decreases due to the influence of the gas. There is a time lag between them.
  • the present invention has been made in view of the above circumstances, and an object thereof is to provide a gas chromatograph capable of accurately adjusting the temperature in a column oven.
  • a gas chromatograph according to the present invention includes a column oven and a cooling device.
  • the column oven contains a column therein.
  • the cooling device cools the inside of the column oven by discharging a refrigerant from the discharge port into the column oven.
  • the cooling device includes a supply pipe that extends to the vicinity of a region where the column is arranged in the column oven and supplies a refrigerant to the discharge port.
  • the inside of the column oven is cooled by the supply pipe containing the refrigerant therein. And the inside of a column oven is further cooled by supplying a refrigerant
  • the gas chromatograph may further include a heater.
  • the heater is provided in the column oven and heats the column oven.
  • the supply pipe may extend to a region between the heater and the column.
  • the region between the heater and the column can be cooled by the supply pipe containing the refrigerant inside.
  • the supply pipe may be formed in a curved shape in the vicinity of a region where the column is arranged.
  • the atmosphere around the column can be efficiently cooled by the supply pipe containing the refrigerant inside.
  • tube may be formed in the curved shape corresponding to the shape of the said column.
  • the column itself can be efficiently cooled by the supply pipe containing the refrigerant inside.
  • the cooling device may include a resistance pipe having a resistance portion having an inner diameter smaller than that of the supply pipe and communicating with the supply pipe on the upstream side of the supply pipe.
  • the refrigerant after passing through the resistance portion, the refrigerant passes through the supply pipe and is supplied into the column oven. Therefore, even if the supply pressure of the refrigerant is large, the flow rate can be adjusted by passing the resistance portion.
  • the gas chromatograph may further include a switching unit.
  • the switching unit switches to a first supply state in which the refrigerant is supplied to the supply pipe via the resistance unit, or a second supply state in which the refrigerant is supplied to the supply pipe without going through the resistance unit.
  • the refrigerant can be supplied into the column oven in an appropriate supply state (supply path) by appropriately switching the supply state by the switching unit.
  • the cooling device may include a flow rate adjusting valve.
  • the flow rate adjusting valve adjusts the flow rate of the refrigerant supplied to the supply pipe on the upstream side of the supply pipe.
  • the flow rate of the refrigerant can be adjusted by the resistance portion after the flow rate of the refrigerant is adjusted by the flow rate adjusting valve. Therefore, the flow rate of the refrigerant can be adjusted appropriately.
  • the inside of the column oven is cooled in stages by the supply pipe itself and the refrigerant supplied from the supply pipe. Therefore, the temperature inside the column oven can be accurately controlled.
  • FIG. 1 is a schematic diagram showing a configuration example of a gas chromatograph 1 according to the first embodiment of the present invention.
  • the gas chromatograph 1 is for performing analysis by supplying a sample gas together with a carrier gas into the column 2.
  • the container 7 and the cooling device 8 are provided.
  • the column 2 is accommodated in the column oven 3.
  • the column 2 is composed of, for example, a capillary column.
  • the column oven 3 is formed in a box shape.
  • the heater 4 is for heating the inside of the column oven 3 and is arranged in the column oven 3.
  • the heater 4 is disposed at a distance from the column 2.
  • a partition plate 9 is provided between the column 2 and the heater 4.
  • the partition plate 9 is formed with a hole through which air passes and a hole through which a part of the cooling device 8 is inserted.
  • the fan 5 is disposed in the column oven 3.
  • the fan 5 is provided on the opposite side of the column 2 with respect to the heater 4.
  • the side on which the fan 5 is provided is the rear side, and the side on which the column 2 is provided is the front side.
  • the sample introduction unit 6 is for introducing a carrier gas and a sample gas into the column 2, and a sample vaporizing chamber (not shown) is formed therein.
  • a liquid sample is injected into the sample vaporization chamber, and the sample vaporized in the sample vaporization chamber is introduced into the column 2 together with the carrier gas.
  • a gas supply channel 11 and a split channel 12 communicate with the sample vaporizing chamber.
  • the gas supply channel 11 is a channel for supplying a carrier gas into the sample vaporization chamber of the sample introduction unit 6.
  • the split flow path 12 is configured so that a part of the gas in the sample vaporization chamber (mixed gas of the carrier gas and the sample gas) is externally supplied at a predetermined split ratio. This is a flow path for discharging the water.
  • the detector 7 is composed of, for example, a flame ionization detector (FID) or a flame photometric detector (FPD). The detector 7 sequentially detects each sample component contained in the carrier gas introduced from the column 2.
  • FID flame ionization detector
  • FPD flame photometric detector
  • the cooling device 8 is a device for cooling the inside of the column oven 3 by discharging a refrigerant into the column oven 3.
  • the refrigerant discharged from the cooling device 8 is, for example, a cooling gas such as N2 gas or CO2 gas.
  • a part of the cooling device 8 is disposed in the column oven 3. The detailed configuration of the cooling device 8 will be described later.
  • the temperature in the column oven 3 is lowered to a set temperature (room temperature or lower) using the cooling device 8.
  • a sample to be analyzed is injected into the sample introduction unit 6.
  • the sample is vaporized in the sample vaporization chamber.
  • a carrier gas is supplied to the sample vaporization chamber of the sample introduction unit 6 via the gas supply channel 11.
  • the sample vaporized in the sample vaporization chamber is introduced into the column 2 together with the carrier gas. After the sample is introduced into the column 2, the heater 4 and the fan 5 are driven to heat the inside of the column oven 3, thereby gradually increasing the temperature in the column oven 3. Each sample component contained in the sample is separated in the process of passing through the column 2 and sequentially introduced into the detector 7.
  • the detector 7 sequentially detects each sample component contained in the carrier gas introduced from the column 2.
  • a chromatogram is generated based on the detection signal of the detector 7.
  • the user confirms the obtained chromatogram and performs various analyses.
  • the inside of the column oven 3 is cooled to the initial temperature by discharging hot air out of the system.
  • the refrigerant is discharged from the cooling device 8 into the column oven 3. Thereby, the inside of the column oven 3 is cooled to a predetermined temperature (target temperature). Then, the above analysis operation is repeated. As described above, in the gas chromatograph 1, when the analysis operation is repeatedly performed, the temperature control by the cooling device 8 is appropriately performed.
  • the cooling device 8 includes a flow rate adjusting valve 80, an external supply pipe 81, a resistance pipe 82, and an internal supply pipe 83.
  • the flow rate adjustment valve 80 is provided on the side wall (rear wall) of the column oven 3.
  • the flow rate adjusting valve 80 is a valve for adjusting the flow rate of the refrigerant.
  • An external supply pipe 81 and a resistance pipe 82 are connected to the flow rate adjusting valve 80. That is, the flow rate adjusting valve 80 is interposed between the external supply pipe 81 and the resistance pipe 82.
  • the opening degree of the flow rate adjusting valve 80 is adjusted by a control unit (not shown). Note that the flow rate adjusting valve 80 may be configured so that its opening degree is manually adjusted.
  • the external supply pipe 81 is disposed outside the column oven 3.
  • the external supply pipe 81 has a downstream end connected to the flow rate adjusting valve 80.
  • the upstream end of the external supply pipe 81 is connected to a reservoir such as a cylinder in which the refrigerant is stored. And a refrigerant
  • coolant is supplied from this storage part.
  • the resistance tube 82 is disposed inside the column oven 3.
  • the resistance tube 82 has an upstream end connected to the flow rate adjusting valve 80.
  • the resistance tube 82 is a tubular member having a flow path resistance corresponding to its length.
  • the inner diameter of the resistance tube 82 is smaller than the inner diameter of the internal supply tube 83.
  • the resistance tube 82 is a detachable member.
  • the resistance tube 82 is an example of a resistance portion.
  • the internal supply pipe 83 is disposed inside the column oven 3. Specifically, the internal supply pipe 83 is disposed (extends) in a region between the column 2 and the heater 4, and more specifically, between the column 2 and the partition plate 9. It is arranged (extends).
  • the internal supply pipe 83 is an example of the supply pipe.
  • FIG. 3 is a front view showing the internal supply pipe 83.
  • the internal supply pipe 83 is formed in a curved shape (arc shape).
  • the internal supply pipe 83 includes a tubular portion 831 and a connection portion 832.
  • the tubular portion 831 is formed in a tubular shape.
  • the tubular portion 831 is curved in an arc shape from the upstream end portion to the central portion, and a portion from the central portion (slightly downstream portion from the central portion) to the downstream end portion is linearly extended. . That is, the tubular portion 831 includes a portion formed in an arc shape and a portion formed in a straight line shape.
  • the inner space of the downstream end portion (the tip portion of the straight portion) of the tubular portion 831 is the discharge port 83A.
  • a central portion of the tubular portion 831 is held by the fixing member 20.
  • a connection portion 832 is attached to the upstream end portion of the tubular portion 831.
  • the connecting portion 832 is formed in a cylindrical shape.
  • the internal space of the connection portion 832 communicates with the internal space of the tubular portion 831.
  • the distal end portion (upstream end portion) of the connection portion 832 has a configuration in which the resistance tube 82 can be attached.
  • the fixing member 20 is attached to the partition plate 9.
  • the internal supply pipe 83 (tubular portion 831) is held by the fixing member 20.
  • the internal supply pipe 83 is held in a state of being arranged between the partition plate 9 and the column 2.
  • the downstream end portion of the internal supply pipe 83 is disposed at a lower portion in the column oven 3.
  • the discharge port 83A of the internal supply pipe 83 is oriented in the horizontal direction.
  • the refrigerant discharged from the discharge port 83 ⁇ / b> A is not directly injected onto the column 2, but hits the inner wall of the column oven 3 and diffuses.
  • the internal supply pipe 83 is provided in the vicinity of the region where the column 2 is arranged in a state where it is held in the column oven 3. Specifically, the internal supply pipe 83 is disposed behind the column 2 with a space therebetween.
  • the shape of the internal supply pipe 83 corresponds to the shape of the column 2. Specifically, the size of the outer shape of the internal supply pipe 83 is approximately the same as the size of the outer shape of the column 2, and the internal supply pipe 83 and the column 2 overlap when viewed in the front-rear direction.
  • a resistance tube 82 having an appropriate length (resistance tube 82 having an appropriate flow path resistance) corresponding to the usage state of the gas chromatograph 1 is selected, and the resistance tube 82 is used.
  • the user selects a resistance tube 82 having a long length (large flow path resistance), and connects the resistance tube 82 to the internal supply tube 83 and the flow rate adjusting valve 80.
  • the supply pressure of the refrigerant becomes small. Therefore, in such a case, the user selects a resistance tube 82 having a short length (low flow path resistance) and connects the resistance tube 82 to the internal supply tube 83 and the flow rate adjustment valve 80.
  • the resistance pipe 82 has a downstream end connected to the connection portion 832 of the internal supply pipe 83 and an upstream end connected to the flow rate adjusting valve 80.
  • the resistance pipe 82 and the internal supply pipe 83 communicate with each other through the connection portion 832, and the resistance pipe 82 and the external supply pipe 81 communicate with each other through the flow rate adjustment valve 80.
  • the resistance tube 82 is disposed on the upstream side with respect to the internal supply tube 83.
  • the flow rate adjusting valve 80 is arranged on the upstream side with respect to the resistance pipe 82 and the internal supply pipe 83.
  • the refrigerant When cooling the inside of the column oven 3, the refrigerant is supplied from the external supply pipe 81 toward the inside of the column oven 3.
  • the refrigerant that has passed through the external supply pipe 81 passes through the flow rate adjustment valve 80 and flows into the resistance pipe 82. Then, after passing through the resistance tube 82, the refrigerant flows into the internal supply tube 83, and is then discharged from the discharge port 83 ⁇ / b> A to the lower part in the column oven 3.
  • the refrigerant is discharged from the discharge port 83A of the internal supply tube 83.
  • the inside of the column oven 3 (column 2) is cooled by the refrigerant.
  • the inside of the column oven 3 is cooled not only by the refrigerant but also by the internal supply pipe 83 that contains the refrigerant inside. That is, the column oven 3 is cooled in stages by the internal supply pipe 83 and the refrigerant.
  • the opening degree of the flow rate adjusting valve 80 is adjusted, and the refrigerant The flow rate is adjusted. Thereby, the flow rate of the refrigerant can be adjusted without changing the type of the resistance tube 82.
  • the flow rate of the refrigerant is adjusted by the resistance tube 82 and the flow rate adjusting valve 80.
  • the cooling device 8 of the gas chromatograph 1 includes the internal supply pipe 83.
  • the internal supply pipe 83 extends to the vicinity of the area where the column 2 is arranged in the column oven 3.
  • the inside of the column oven 3 is cooled by the internal supply pipe 83 containing the refrigerant therein, and further cooled by being supplied with the refrigerant through the internal supply pipe 83. That is, the inside of the column oven 3 is cooled in stages by the internal supply pipe 83 itself and the refrigerant supplied from the internal supply pipe 83. As a result, the inside of the column oven 3 can be accurately controlled by the cooling device 8.
  • the internal supply pipe 83 extends to a region between the heater 4 and the column 2.
  • the region between the heater 4 and the column 2 can be cooled by the internal supply pipe 83 containing the refrigerant inside.
  • the internal supply pipe 83 is formed in a curved shape in the vicinity of the region where the column 2 is disposed.
  • the atmosphere around the column 2 can be efficiently cooled by the internal supply pipe 83 containing the refrigerant inside.
  • the internal supply pipe 83 is formed in a curved shape corresponding to the shape of the column 2.
  • the size of the outer shape of the internal supply pipe 83 is approximately the same as the size of the outer shape of the column 2, and the internal supply pipe 83 and the column 2 overlap when viewed in the front-rear direction.
  • the column 2 itself can be efficiently cooled by the internal supply pipe 83 containing the refrigerant inside.
  • the cooling device 8 includes the resistance tube 82.
  • the resistance tube 82 is disposed upstream of the internal supply tube 83 and communicates with the internal supply tube 83.
  • the refrigerant supplied through the external supply pipe 81 passes through the resistance pipe 82 and then passes through the supply pipe and is discharged into the column oven 3.
  • the flow rate can be adjusted by passing the resistance tube 82.
  • the cooling device 8 includes the flow rate adjusting valve 80.
  • the flow rate adjusting valve 80 adjusts the flow rate of the refrigerant on the upstream side with respect to the internal supply pipe 83 and the resistance pipe 82.
  • the flow rate of the refrigerant can be adjusted by the resistance tube 82 after the flow rate of the refrigerant is adjusted by the flow rate adjusting valve 80. As a result, the flow rate of the refrigerant can be adjusted appropriately.
  • FIG. 3 is a front view showing an internal supply pipe 85 used in the cooling device 8 of the gas chromatograph 1 according to the second embodiment of the present invention.
  • an internal supply pipe 85 is used instead of the internal supply pipe 83 described above.
  • the internal supply pipe 85 has a shape different from the shape of the internal supply pipe 83 of the first embodiment.
  • the internal supply pipe 85 includes a tubular portion 851 and a connection portion 852.
  • the tubular portion 851 is formed in a tubular shape and is formed in a spiral shape. Specifically, the tubular portion 851 is curved so as to turn from the upstream end toward the downstream, and is formed in a shape that becomes farther from the center as it goes downstream. The downstream end of the tubular portion 851 extends linearly downward. An inner space of the downstream end portion (the tip portion of the straight portion) of the tubular portion 851 is the discharge port 85A. An intermediate portion of the tubular portion 851 is held by the fixing member 20. A connecting portion 852 is attached to the upstream end portion of the tubular portion 851.
  • the connecting portion 852 is formed in a long cylindrical shape.
  • the internal space of the connecting portion 852 communicates with the internal space of the tubular portion 851.
  • a resistance tube 82 is attached to the distal end portion (upstream end portion) of the connection portion 852.
  • the fixing member 20 is attached to the partition plate 9 (see FIG. 1) in the column oven 3. Then, the internal supply pipe 85 (tubular portion 851) is held by the fixing member 20. In this state, the discharge port 85A of the internal supply pipe 85 is directed downward. Thereby, the refrigerant discharged from the discharge port 85 ⁇ / b> A is not directly injected to the column 2, but hits the bottom wall of the column oven 3 and diffuses.
  • the internal supply pipe 83 is provided in the vicinity of the region where the column 2 is arranged in a state where it is held in the column oven 3. Specifically, the tubular portion 851 of the internal supply pipe 83 faces the column 2 and is disposed in the column oven 3 along the column 2.
  • the refrigerant that has passed through the external supply pipe 81 passes through the flow rate adjustment valve 80 and the resistance pipe 82, and then passes through the internal supply pipe 83. It passes through and is discharged toward the bottom wall in the column oven 3 from the discharge port 83A.
  • the tubular portion 851 of the internal supply pipe 85 is formed in a spiral shape. Therefore, in the column oven 3, the tubular portion 851 of the internal supply pipe 83 can be disposed along the column 2 so as to face the column 2. As a result, the column 2 can be efficiently cooled by the internal supply pipe 85.
  • FIG. 4 is the schematic which showed the structural example of the gas chromatograph 1 which concerns on 3rd Embodiment of this invention.
  • the third embodiment is different from the first embodiment in that the supply path of the refrigerant supplied to the internal supply pipe 83 can be changed as appropriate.
  • a flow path switching valve 90 and a bypass pipe 91 are provided. Further, the flow rate adjusting valve 80 is provided so as to be interposed slightly upstream of the downstream end of the external supply pipe 81.
  • the flow path switching valve 90 is interposed at the downstream end of the external supply pipe 81. That is, the flow path switching valve 90 is disposed downstream of the flow rate adjustment valve 80. The upstream end of the resistance tube 82 and the upstream end of the bypass tube 91 are connected to the flow path switching valve 90.
  • the flow path switching valve 90 is a valve that can switch the supply path of the refrigerant supplied to the external supply pipe 81 to one of the resistance pipe 82 and the bypass pipe 91.
  • the bypass pipe 91 has an inner diameter larger than the inner diameter of the resistance pipe 82, and the flow path resistance is smaller than that of the resistance pipe 82.
  • the downstream end of the bypass pipe 91 is connected to the connection portion 832.
  • the refrigerant supplied to the external supply pipe 81 flows into the internal supply pipe 83 via the resistance pipe 82 (first supply state), or the resistance pipe 82. Without passing through the bypass pipe 91, it can be discharged into the column oven 3 through one of the paths (second supply state) that flows into the internal supply pipe 83 through the bypass pipe 91.
  • the refrigerant can be supplied into the column oven 3 in an appropriate supply state by appropriately switching the supply state (supply path) by the flow path switching valve 90. 7).
  • the gas chromatograph 1 has been described on the assumption that the resistance pipe 82 is interposed between the internal supply pipe 83 and the flow rate adjustment valve 80.
  • the gas chromatograph 1 may be configured such that the upstream end of the internal supply pipe 83 is connected to the flow rate adjusting valve 80 without providing the resistance pipe 82.
  • the internal supply pipes 83 and 85 are provided in the vicinity of the column 2, and specifically, are provided in the rear of the column 2 (region between the column 2 and the heater 4). As explained. However, the internal supply pipes 83 and 85 may be provided in the vicinity of the column 2 and in front of the column 2 (on the side opposite to the heater 4 with respect to the column 2).

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Sampling And Sample Adjustment (AREA)
PCT/JP2017/017546 2017-05-09 2017-05-09 ガスクロマトグラフ WO2018207258A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN201780090512.3A CN110621994B (zh) 2017-05-09 2017-05-09 气相色谱仪
PCT/JP2017/017546 WO2018207258A1 (ja) 2017-05-09 2017-05-09 ガスクロマトグラフ
JP2019516772A JP6863457B2 (ja) 2017-05-09 2017-05-09 ガスクロマトグラフ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2017/017546 WO2018207258A1 (ja) 2017-05-09 2017-05-09 ガスクロマトグラフ

Publications (1)

Publication Number Publication Date
WO2018207258A1 true WO2018207258A1 (ja) 2018-11-15

Family

ID=64104603

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2017/017546 WO2018207258A1 (ja) 2017-05-09 2017-05-09 ガスクロマトグラフ

Country Status (3)

Country Link
JP (1) JP6863457B2 (zh)
CN (1) CN110621994B (zh)
WO (1) WO2018207258A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111693637A (zh) * 2019-03-13 2020-09-22 株式会社岛津制作所 管柱烘箱及色谱仪
CN113702528A (zh) * 2021-08-27 2021-11-26 深圳市华科达检测有限公司 气相色谱仪

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63156068U (zh) * 1987-03-31 1988-10-13
JPH02290551A (ja) * 1988-12-22 1990-11-30 Univ Dayton 改良されたガスクロマトグラフィー法及びその装置
JPH1144680A (ja) * 1997-07-28 1999-02-16 Horiba Ltd オーブン冷却装置
JP2005283317A (ja) * 2004-03-30 2005-10-13 Shimadzu Corp ガス分析装置
JP2007183252A (ja) * 2005-12-09 2007-07-19 Taiyo Nippon Sanso Corp 分析装置用冷却装置、ガスクロマトグラフ装置およびガスクロマトグラフィー方法
JP2009121937A (ja) * 2007-11-14 2009-06-04 Fuji Xerox Co Ltd クロマトグラフ装置及びセンサ
WO2011099079A1 (ja) * 2010-02-12 2011-08-18 ジーエルサイエンス株式会社 試料の捕集方法およびその捕集装置
JP2017509904A (ja) * 2014-03-26 2017-04-06 ブーカー, ペーターBOEKER, Peter 流れ場誘発性温度勾配ガスクロマトグラフィー

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3305000A (en) * 1965-02-08 1967-02-21 Barber Colman Co Temperature control system for chromatographs
GB2248318B (en) * 1990-09-06 1994-11-02 Perkin Elmer Ltd Temperature control systems
JPH05126817A (ja) * 1991-10-31 1993-05-21 Shimadzu Corp ガスクロマトグラフ
JP3200787U (ja) * 2015-08-25 2015-11-05 株式会社島津製作所 ガスクロマトグラフ

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63156068U (zh) * 1987-03-31 1988-10-13
JPH02290551A (ja) * 1988-12-22 1990-11-30 Univ Dayton 改良されたガスクロマトグラフィー法及びその装置
JPH1144680A (ja) * 1997-07-28 1999-02-16 Horiba Ltd オーブン冷却装置
JP2005283317A (ja) * 2004-03-30 2005-10-13 Shimadzu Corp ガス分析装置
JP2007183252A (ja) * 2005-12-09 2007-07-19 Taiyo Nippon Sanso Corp 分析装置用冷却装置、ガスクロマトグラフ装置およびガスクロマトグラフィー方法
JP2009121937A (ja) * 2007-11-14 2009-06-04 Fuji Xerox Co Ltd クロマトグラフ装置及びセンサ
WO2011099079A1 (ja) * 2010-02-12 2011-08-18 ジーエルサイエンス株式会社 試料の捕集方法およびその捕集装置
JP2017509904A (ja) * 2014-03-26 2017-04-06 ブーカー, ペーターBOEKER, Peter 流れ場誘発性温度勾配ガスクロマトグラフィー

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
CONTRERAS A JESSE: "PEAK SWEEPING AND GATING USING THERMAL GRADIENT GAS CHROMATOGRAPHY", JOURNAL OF CHROMATOGRAPHY A, vol. 1278, 9 January 2013 (2013-01-09), pages 160 - 165, XP055200232 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111693637A (zh) * 2019-03-13 2020-09-22 株式会社岛津制作所 管柱烘箱及色谱仪
CN113702528A (zh) * 2021-08-27 2021-11-26 深圳市华科达检测有限公司 气相色谱仪

Also Published As

Publication number Publication date
JP6863457B2 (ja) 2021-04-21
JPWO2018207258A1 (ja) 2019-12-26
CN110621994B (zh) 2023-03-10
CN110621994A (zh) 2019-12-27

Similar Documents

Publication Publication Date Title
JP4495215B2 (ja) 熱脱離ユニットからクロマトグラフィーカラムへのインターフェース
US7911609B2 (en) Evaporative light scattering detector
US20160103105A1 (en) Thermal conductivity detector and gas chromatograph
JP5930049B2 (ja) ヘッドスペース試料導入装置とそれを備えたガスクロマトグラフ
WO2018207258A1 (ja) ガスクロマトグラフ
TWI687685B (zh) 產生氣體分析裝置及產生氣體分析方法
JP4779807B2 (ja) Ｉｃｐ発光分光分析装置
CN107430099B (zh) 超临界流体装置
JPH0933502A (ja) ガスクロマトグラフ装置
CN109283266B (zh) 冷媒导入装置以及气相色谱仪
JP4179189B2 (ja) ガスクロマトグラフ装置
US11754583B2 (en) Methods and apparatuses for generating trace vapors
US11213650B2 (en) Process as well as gas heater for heating a carrier gas stream
JP2007192704A (ja) 濃縮管およびその濃縮管を用いたガスクロマトグラフ測定方法およびガスクロマトグラフ測定装置
JP6406358B2 (ja) 試料回収機構及びその試料回収機構を備えた超臨界流体装置
WO2021224613A1 (en) A control system
JP2007024781A (ja) ガスクロマトグラフ装置
JP4504721B2 (ja) 液体クロマトグラフィー装置
JP6281450B2 (ja) ガスクロマトグラフ及びこれに用いられる流量制御装置
JP2004226353A (ja) ガスクロマトグラフ質量分析装置
CN104637778B (zh) 一种质谱仪反吹气方法
JP2004170209A (ja) ガスクロマトグラフ用試料導入装置
WO2021224616A1 (en) An atmospheric pressure ionisation source
CN104637777B (zh) 一种质谱仪反吹气结构
JP2007263670A (ja) 濃縮分離装置及び方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17908828

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2019516772

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 17908828

Country of ref document: EP

Kind code of ref document: A1